CN102664204B - A kind of wear-resisting application type solar cell backboard - Google Patents
A kind of wear-resisting application type solar cell backboard Download PDFInfo
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- CN102664204B CN102664204B CN201210144210.9A CN201210144210A CN102664204B CN 102664204 B CN102664204 B CN 102664204B CN 201210144210 A CN201210144210 A CN 201210144210A CN 102664204 B CN102664204 B CN 102664204B
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
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Abstract
The invention provides a kind of wear-resisting application type solar cell backboard, comprise bottom, two fluoropolymer resin layers and polymeric layer.Two fluoropolymer resin layers are positioned at the filler and epoxy resin that bottom comprise and has reflectivity.Polymeric layer is between two fluoropolymer resin layers.Wear-resisting application type solar cell backboard of the present invention is adopted to have high reflectance and resistance to wear, and can be cost-saving.
Description
Technical field
The present invention relates to a kind of solar cell backboard, particularly relate to a kind of solar cell backboard with better resistance to wear and reflectivity.
Background technology
So-called solar photovoltaic generation system refers to the photovoltaic effect utilizing solar cell, solar radiation is directly changed into a kind of new power generating system of electric energy.Crystal silicon cell is one of core of solar photovoltaic generation system, if be directly exposed in air by crystal silicon cell, be subject to the impact of the meteorologic factors such as light, heat, rain, snow, the conversion efficiency of crystal silicon cell and useful life can reduce greatly.Therefore, adopt suitable package system to protect solar components, useful life and the conversion efficiency of battery can be improved.
Solar cell backboard, as the protective material of solar module, has compound backboard, application type backboard at present.Wherein, application type backboard cost is low, but there is the problem that coating easily comes off, resistance to wear is lower, especially solar components is arranged on the large area of dust storm, backboard easily drops by dust storm scraping, and the impact of climate is easily split, and has higher requirement to the resistance to wear of backboard.
Summary of the invention
For in prior art, solar cell backboard resistance to wear lower, easily come off this defect, the invention provides a kind of wear-resisting application type solar cell backboard.
According to the present invention, provide a kind of wear-resisting application type solar cell backboard, wherein, comprising:
One bottom;
Two fluoropolymer resin layers, are positioned on described bottom, and the masking liquid of fluoropolymer resin layer described in two comprises the filler and epoxy resin with reflectivity; And
One polymeric layer, described in two between fluoropolymer resin layer.
Preferably, calculate by percentage to the quality, described in two, the masking liquid of fluoropolymer resin layer comprises:
Fluorine resin 24.6 ~ 55.3%;
Epoxy resin 6.0 ~ 8.0%;
Curing agent 1.8 ~ 5.7%;
There is the filler 4.1 ~ 6.6% of reflectivity;
Catalyst 0.0002 ~ 0.0003%; And
Solvent 30.7 ~ 57.1%.
Preferably, the filler described in reflectivity comprises:
Base-material, comprising: the mixture of titanium dioxide, calcium carbonate, mica powder, talcum powder, clay, wollastonite in powder, quartz sand, metal oxide, graphite, porcelain powder, glass-cermic powder one of them or they; And
There is the material of reflectivity, comprising: the mixture of nano silicon, nano titanium oxide, nano magnesia, nano zine oxide, nano aluminium oxide, nano tin dioxide, nano antimony doped tin oxide, nano-lithium fluoride, nano calcium fluoride, nano magnesium fluoride, nanometer barium fluoride, nano-calcium carbonate, hollow ceramic microballon, hollow glass microbead one of them or they.
Preferably, described fluorine resin is: the mixture of pvdf resin, three fluorine-type resins, four fluorine-type resins one of them or they.
Preferably, described epoxy resin is the mixture of any one or they in bisphenol A type epoxy resin, bisphenol f type epoxy resin, polyphenol type glycidyl ether resin, aliphatic glycidyl ether resin.
Preferably, the thickness of each described fluoropolymer resin layer is 3 ~ 200 μm, and the thickness of described polymeric layer is 20 ~ 500 μm.
Preferably, the masking liquid of described bottom is calculated by percentage to the quality, comprising:
Underfill resin layer 20 ~ 73%;
Curing agent 0 ~ 18%;
Auxiliary agent 0 ~ 9%;
Catalyst 0 ~ 0.4%; And
Solvent 25 ~ 75%.
Preferably, the masking liquid of described bottom more comprises crosslinking agent, and described crosslinking agent comprises: the mixture of peroxyester, peroxy ketal, two alkanes peroxide one of them or they or the polymer of oxazoline group, urea resin, melmac, epoxy resin is a kind of or their mixture wherein.
Preferably, the masking liquid of described bottom more comprises auxiliary agent, and described auxiliary agent comprises: antioxidant, ultraviolet absorber, light stabilizer or tackifier.
Preferably, the thickness of described bottom is 1 ~ 10 μm.
Advantage of the present invention is adopted to be: by adding the material with reflectivity in the masking liquid of fluoropolymer resin layer, to make solar cell backboard have good light reflectivity.In addition, in the masking liquid of fluoropolymer resin layer, also add epoxy resin simultaneously, add the resistance to wear of solar cell backboard.
Accompanying drawing explanation
Reader, after having read the specific embodiment of the present invention with reference to accompanying drawing, will become apparent various aspects of the present invention.Wherein,
Fig. 1 shows the structural representation according to wear-resisting application type solar cell backboard of the present invention.
Embodiment:
With reference to the accompanying drawings, the specific embodiment of the present invention is described in further detail.
Fig. 1 shows the structural representation according to wear-resisting application type solar cell backboard of the present invention.With reference to Fig. 1, wear-resisting application type solar cell backboard 1 comprises: bottom 10, two fluoropolymer resin layer 20 and polymeric layer 30.Wherein, bottom 10 is bonded on the EVA layer of solar module, and its thickness is 1 ~ 10 μm.Two fluoropolymer resin layers 20 are arranged on bottom 10, and the thickness of each fluoropolymer resin layer 20 is 3 ~ 200 μm.The painting of two fluoropolymer resin layers 20 is interior containing filler and the epoxy resin with reflectivity for night.Polymeric layer 30 is between two fluoropolymer resin layers 20, and its thickness is 20 ~ 500 μm.
Calculate by percentage to the quality, the masking liquid of bottom comprises: underfill resin layer 20 ~ 73%, curing agent 0 ~ 18%, auxiliary agent 0 ~ 9%, catalyst 0 ~ 0.4% and solvent 25 ~ 75%.Wherein, underfill resin layer can be the mixture of high polymer one of them and polyvinyl alcohol of vinyl acetate, ethylene-vinyl acetate copolymer resin, mylar, acrylic resin, acrylamide resin, the mixture of high polymer one of them or they of hydroxy functional groups or carboxyl functional group or epoxy functionality or vinyl acetate, ethylene-vinyl acetate copolymer resin, mylar, acrylic resin, acrylamide resin, hydroxy functional groups or carboxyl functional group or epoxy functionality.Particularly, calculate by percentage to the quality, in ethylene-vinyl acetate copolymer resin, the content of vinyl acetate is 16% ~ 40%, the vitrification point of mylar is 30 ~ 90 DEG C, calculate with molar percentage, the saponification degree of polyvinyl alcohol is 70 ~ 90mol%, calculates by percentage to the quality, and the concentration of resin solution is 2% ~ 30%.The masking liquid of bottom 10 can also comprise: crosslinking agent and auxiliary agent.Wherein, crosslinking agent is: the mixture of peroxyester, peroxy ketal, two alkanes peroxide one of them or they or the polymer of oxazoline group, urea resin, melmac, epoxy resin is a kind of or their mixture wherein.Auxiliary agent is: antioxidant, ultraviolet absorber, light stabilizer or tackifier.
Calculate by percentage to the quality, the masking liquid of each fluoropolymer resin layer comprises: fluorine resin 24.6 ~ 55.3%, epoxy resin 6.0 ~ 8.0%, curing agent 1.8 ~ 5.7%, the filler 4.1 ~ 6.6% with reflectivity, catalyst 0.0002 ~ 0.0003% and solvent 30.7 ~ 57.1%.Fluorine resin can be the mixture of pvdf resin, three fluorine-type resins, four fluorine-type resins one of them or they.Particularly, three fluorine-type resins can be PVF-vinyl ether co-polymer or PVF-alicyclic vinyl copolymer.More specifically, four fluorine-type resins can be the mixture of tetrafluoroethene and alkyl vinyl ether co-polymer, also can be the mixture of tetrafluoroethene and alkyl vinyl ester copolymer.Wherein, alkyl vinyl ether can be the mixture of cyclohexyl vinyl ether, hydroxy butyl vinyl ether, ethyl vinyl ether, glycidyl vinyl ether one of them or they.Alkyl vinyl ester can be then the mixture of vinyl acetate, vinyl butyrate, vinyl caproate, pungent vinyl valerate, new vinyl pelargonate ester, pungent caprate one of them or they.
Epoxy resin can be the mixture of any one or they in bisphenol A type epoxy resin, bisphenol f type epoxy resin, polyphenol type glycidyl ether resin, aliphatic glycidyl ether resin.Curing agent can be the mixture of isocyanates, amino resins, blocked isocyanate, blocked isocyanate, melamine one of them or they.The filler with reflectivity comprises: base-material and have the material of reflectivity.Wherein, base-material is: the mixture of titanium dioxide, calcium carbonate, mica powder, talcum powder, clay, wollastonite in powder, quartz sand, metal oxide, graphite, porcelain powder, glass-cermic powder one of them or they.The material with reflectivity is: the mixture of nano silicon, nano titanium oxide, nano magnesia, nano zine oxide, nano aluminium oxide, nano tin dioxide, nano antimony doped tin oxide, nano-lithium fluoride, nano calcium fluoride, nano magnesium fluoride, nanometer barium fluoride, nano-calcium carbonate, hollow ceramic microballon, hollow glass microbead one of them or they.
The making material of polymeric layer 30 is: the combination of polyamide, polymethyl methacrylate, PETG, polybutylene terephthalate, polytrimethylene terephthalate, cyclohexanedimethanol's dimethyl ester, polystyrene, PEN one of them or they.
Specifically:
Fluoropolymer resin layer masking liquid A: calculate by percentage to the quality, in the container that agitating device is housed, add 200 parts of LF100 tri-fluorine-type resins and start to stir, add 40 parts of bisphenol A type epoxy resins, 125 parts of hexones, 85 parts of dimethylbenzene, 10 parts of R-105 titanium dioxide powders, 10 parts of VK-SP30 nano silicons, 5 parts of VK-T06 nano titanium oxides, 5 parts of VK-JS02 nano zine oxides, 0.01 part of dibutyl tin laurate, 20 parts of DesmodurN3390 curing agent successively, stir 40-60 minute, obtained fluoropolymer resin layer masking liquid A.
Fluoropolymer resin layer masking liquid B: manufacture method is identical with making fluoropolymer resin layer masking liquid A with use material, just 200 parts of LF100 tri-fluorine-type resin substitutions is become 200 parts of Zeffle GK570 tetra-fluorine-type resins, obtained fluoropolymer resin layer masking liquid B.
Fluoropolymer resin layer masking liquid C: manufacture method is identical with making fluoropolymer resin layer masking liquid A with use material, just 10 parts of R-105 titanium dioxide powders, 10 parts of VK-SP30 nano silicons, 5 parts of VK-T06 nano titanium oxides, 5 parts of VK-JS02 nano zine oxides are replaced as 30 parts of ceramic fine beads, obtained fluoropolymer resin layer masking liquid C.
Fluoropolymer resin layer masking liquid D: manufacture method is identical with making fluoropolymer resin layer masking liquid A with use material, just 40 parts of bisphenol A type epoxy resins is replaced as 40 parts of polyphenol type glycidyl ether resins, obtained fluoropolymer resin layer masking liquid D.
Bottom masking liquid A: by percentage to the quality, in 250 parts of ethylene-vinyl acetate copolymers (wherein VA content is 33%), add 10 parts of ultraviolet absorbers 2, 2 '-dihydroxy-4, 4 '-dimethoxy-benzophenone, 10 parts of hindered amine light stabilizers two (1, 2, 2, 6, 6-pentamethyl-4-piperidyl) sebacate/methyl isophthalic acid, 2, 2, 6, 6-pentamethyl-4-piperidinyl sebacate compound (mass ratio 1: 1), the antioxidant 1 of 15 parts, 3, 5-tri-(the 4-tert-butyl group-3-hydroxyl-2, 6-dimethyl benzyl)-1, 3, 5-triazine-2, 4, 6-(1H, 3H, 5H)-triketone/bis-(2, 4-dicumylphenyl) pentaerythritol diphosphites compound (mass ratio 1: 4), 7.5 parts of crosslinking and curing agent neighbours, o-tertiary pentyl-o-(2-ethylhexyl)-mono--peroxycarbonates and 1% tackifier gamma-aminopropyl-triethoxy-silane, and be dissolved in toluene, in the mixed solvent of isopropyl alcohol and dimethylbenzene (mol ratio 1: 1: 2), obtained bottom masking liquid A.
Bottom is coated with liquor B: by percentage to the quality, 250 parts of glycidyl ester type acrylic resin copolymers that are monomer with methyl methacrylate and N hydroxymethyl acrylamide, 30 parts of crosslinking agent bicyclopentadiene epoxides, 1 part of catalyst hydrogen peroxide, add 10 parts of hindered amine light stabilizer decanedioic acid two-2, 2, 6, 6-tetramethyl piperidine alcohol ester, the antioxidant 1 of 10 parts, 3, 5-tri-(the 4-tert-butyl group-3-hydroxyl-2, 6-dimethyl benzyl)-1, 3, 5-triazine-2, 4, 6-(1H, 3H, 5H)-triketone/bis-(2, 4-dicumylphenyl) pentaerythritol diphosphites compound (mass ratio 1: 4), 20 parts of ultraviolet absorbers 2, 2 '-dihydroxy-4, 4 '-dimethoxy-benzophenone, and be dissolved in toluene, in the mixed solvent of isopropyl alcohol (mol ratio 1: 1), obtain bottom masking liquid B.
Bottom is coated with liquor C: by percentage to the quality, 250 parts poly-2, 6-(ethylene naphthalate) resin, 40 parts of crosslinking agent 2-isopropenyl-4-methyl-2-oxazolines, 0.5 part of catalyst hydrogen peroxide, add 0.4 part of hindered amine light stabilizer two (1, 2, 2, 6, 6-pentamethyl-4-piperidyl) sebacate/methyl isophthalic acid, 2, 2, 6, 6-pentamethyl-4-piperidinyl sebacate compound (mass ratio 1: 1), the antioxidant 1 of 30 parts, 3, 5-tri-(the 4-tert-butyl group-3-hydroxyl-2, 6-dimethyl benzyl)-1, 3, 5-triazine-2, 4, 6-(1H, 3H, 5H)-triketone/tri-(2, 4-di-tert-butyl-phenyl) phosphite ester compound (mass ratio 1: 2), and be dissolved in phenol/tetrachloroethanes/isopropyl alcohol (mol ratio 2: 2: 1) mixed solvent, obtain bottom masking liquid C.
Embodiment 1
Use scraper for coating method to be coated on by fluoropolymer resin layer masking liquid A on 250 μm of thick PET basement membranes, by 120 DEG C of heated-air drying film forming, obtain having the coated film of 25 μm of thick one side fluoropolymer resin layers.Through same technique, opposite side fluoropolymer resin layer masking liquid A being coated on PET basement membrane obtains the coated film of double-side fluorine resin bed.Bottom masking liquid A is coated on the side of the coated film of double-side fluorine resin bed by same use scraper for coating method, obtains the coated film with 3 μm of thick bottoms.Heated-air drying 5min under the temperature conditions of 80 ± 5 DEG C, then through surface treatment, cut, coiling technique obtains solar cell backboard.
Embodiment 2
Backboard manufacture method is identical with embodiment 1 with use material, except fluoropolymer resin layer masking liquid A is replaced as fluoropolymer resin layer masking liquid B, its coating process, drying and forming-film, surface treatment, cut, coiling technique is with embodiment 1.
Embodiment 3
Backboard manufacture method is identical with embodiment 1 with use material, except fluoropolymer resin layer masking liquid A is replaced as fluoropolymer resin layer masking liquid C, its coating process, drying and forming-film, surface treatment, cut, coiling technique is with embodiment 1.
Embodiment 4
Backboard manufacture method is identical with embodiment 1 with use material, except fluoropolymer resin layer masking liquid A is replaced as fluoropolymer resin layer masking liquid D, its coating process, drying and forming-film, surface treatment, cut, coiling technique is with embodiment 1.
Embodiment 5
Backboard manufacture method is identical with embodiment 1 with use material, except bottom masking liquid A is replaced as bottom masking liquid B, its coating process, drying and forming-film, surface treatment, cut, coiling technique is with embodiment 1.
Embodiment 6
Backboard manufacture method is identical with embodiment 1 with use material, except bottom masking liquid A is replaced as bottom masking liquid C, its coating process, drying and forming-film, surface treatment, cut, coiling technique is same as embodiment 1.
Embodiment 7
Backboard manufacture method is identical with embodiment 1 with use material, except 250 μm of thick PET basement membranes (Li great electrical insulating material factory) being replaced as 250 μm of thick PA basement membranes (Quan Da plasthetics Co., Ltd), its coating process, drying and forming-film, surface treatment, cut, coiling technique is with embodiment 1.
Fluoropolymer resin layer masking liquid E: manufacture method is identical with making fluoropolymer resin layer masking liquid A with use material, is just removed by 40 parts of bisphenol A type epoxy resins, obtained fluoropolymer resin layer masking liquid E.
Fluoropolymer resin layer masking liquid F: manufacture method is identical with making fluoropolymer resin layer masking liquid A with use material, just 10 parts of VK-SP30 nano silicons, 5 parts of VK-T06 nano titanium oxides, 5 parts of VK-JS02 nano zine oxides are removed, obtained fluoropolymer resin layer masking liquid F.
Comparative example 1
Backboard is composited through adhesive is gluing by inside and outside two-layer to be 38 μm of thick PVF films and middle one deck be 200 μm of thick PET film.
Comparative example 2
Backboard manufacture method is identical with embodiment 1 with use material, except fluorine resin masking liquid A is replaced as fluorine resin masking liquid E, its coating process, drying and forming-film, surface treatment, cut, coiling technique is with embodiment 1.
Comparative example 3
Backboard manufacture method is identical with embodiment 1 with use material, except the technique without barrier coating masking liquid A, its coating process, drying and forming-film, surface treatment, cut, coiling technique is with embodiment 1.
Comparative example 4
Backboard manufacture method is identical with embodiment 1 with use material, except fluorine resin masking liquid A is replaced as fluorine resin masking liquid F, its coating process, drying and forming-film, surface treatment, cut, coiling technique is with embodiment 1.
Adopt the backboard that above method is obtained, performance index measure by the following method
1. light reflectivity
Test according to the Albedometer of GB/T 13452.3-92, GB/T 9270-88, GB/T 5211.17-88, ISO3906-80 standard design
2. resistance to wear
Wearability test is carried out according to GB/T1768-2006
3. with the peel strength of EVA
Peel strength test is carried out according to GB/T2790
4. UV weathering resistance
Ultraviolet irradiation burn-in test is carried out according to IEC IEC61215.
Experimental condition:
Specimen surface temperature 60 ± 5 DEG C
Wavelength is 280-385nm scope, and irradiation intensity is 15KWh/m
2.
Yellowness index analyzes by GB2409-80.
The results are shown in Table 1
Table 1
From properties test result, advantage of the present invention is adopted to be: by adding the material with reflectivity in the masking liquid of fluoropolymer resin layer, to make solar cell backboard have good light reflectivity.In addition, in the masking liquid of fluoropolymer resin layer, also add epoxy resin simultaneously, add the resistance to wear of solar cell backboard.
More than show and describe general principle of the present invention, principal character and advantage of the present invention.The technical staff of the industry should understand; the present invention is not restricted to the described embodiments; what describe in above-described embodiment and specification just illustrates principle of the present invention; the present invention also has various changes and modifications without departing from the spirit and scope of the present invention, and these changes and improvements all fall in the claimed scope of the invention.Application claims protection range is defined by appending claims and equivalent thereof.
Claims (9)
1. a wear-resisting application type solar cell backboard, is characterized in that, comprising:
One bottom;
Two fluoropolymer resin layers, are positioned on described bottom, and the masking liquid of fluoropolymer resin layer described in two comprises the filler and epoxy resin with reflectivity; And
One polymeric layer, described in two between fluoropolymer resin layer, described epoxy resin is the mixture of any one or they in bisphenol A type epoxy resin, bisphenol f type epoxy resin, polyphenol type glycidyl ether resin, aliphatic glycidyl ether resin.
2. wear-resisting application type solar cell backboard as claimed in claim 1, it is characterized in that, calculate by percentage to the quality, described in two, the masking liquid of fluoropolymer resin layer comprises:
Fluorine resin 24.6 ~ 55.3%;
Epoxy resin 6.0 ~ 8.0%;
Curing agent 1.8 ~ 5.7%;
There is the filler 4.1 ~ 6.6% of reflectivity;
Catalyst 0.0002 ~ 0.0003%; And
Solvent 30.7 ~ 57.1%.
3. wear-resisting application type solar cell backboard as claimed in claim 2, is characterized in that, described in there is reflectivity filler comprise:
Base-material, comprising: the mixture of titanium dioxide, calcium carbonate, mica powder, talcum powder, clay, wollastonite in powder, quartz sand, metal oxide, graphite, porcelain powder, glass-cermic powder one of them or they; And
There is the material of reflectivity, comprising: the mixture of nano silicon, nano titanium oxide, nano magnesia, nano zine oxide, nano aluminium oxide, nano tin dioxide, nano antimony doped tin oxide, nano-lithium fluoride, nano calcium fluoride, nano magnesium fluoride, nanometer barium fluoride, nano-calcium carbonate, hollow ceramic microballon, hollow glass microbead one of them or they.
4. wear-resisting application type solar cell backboard as claimed in claim 3, it is characterized in that, described fluorine resin is: the mixture of pvdf resin, three fluorine-type resins, four fluorine-type resins one of them or they.
5. wear-resisting application type solar cell backboard as claimed in claim 4, is characterized in that, the thickness of each described fluoropolymer resin layer is 3 ~ 200 μm, and the thickness of described polymeric layer is 20 ~ 500 μm.
6. wear-resisting application type solar cell backboard as claimed in claim 5, it is characterized in that, the masking liquid of described bottom is calculated by percentage to the quality, comprising:
Underfill resin layer 20 ~ 73%;
Curing agent 0 ~ 18%;
Auxiliary agent 0 ~ 9%;
Catalyst 0 ~ 0.4%; And
Solvent 25 ~ 75%.
7. wear-resisting application type solar cell backboard as claimed in claim 6, it is characterized in that, the masking liquid of described bottom more comprises crosslinking agent, and described crosslinking agent comprises: the mixture of peroxyester, peroxy ketal, two alkanes peroxide one of them or they or the polymer of oxazoline group, urea resin, melmac, epoxy resin is a kind of or their mixture wherein.
8. wear-resisting application type solar cell backboard as claimed in claim 7, it is characterized in that, the masking liquid of described bottom more comprises auxiliary agent, and described auxiliary agent comprises: antioxidant, ultraviolet absorber, light stabilizer or tackifier.
9. wear-resisting application type solar cell backboard as claimed in claim 8, is characterized in that, the thickness of described bottom is 1 ~ 10 μm.
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| CN102931263A (en) * | 2012-11-12 | 2013-02-13 | 乐凯胶片股份有限公司 | Solar battery back film and preparation method thereof |
| CN103897340A (en) * | 2012-12-31 | 2014-07-02 | 中原工学院 | Epoxy resin-base film for flexible or thin-film solar cells and preparation method thereof |
| CN103208549B (en) * | 2013-03-15 | 2015-07-08 | 苏州福斯特光伏材料有限公司 | Back membrane material of solar cell module |
| CN106048684A (en) * | 2016-05-26 | 2016-10-26 | 安徽金兑新材料科技有限公司 | Method for electroplating abrasion-resistant layer on photovoltaic back plate |
| CN106079773A (en) * | 2016-06-16 | 2016-11-09 | 杭州福斯特光伏材料股份有限公司 | A kind of power gain type solar energy back veneer material |
| CN106229368A (en) * | 2016-08-27 | 2016-12-14 | 无锡中洁能源技术有限公司 | A kind of application type solar cell backboard |
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| CN1410616A (en) * | 2001-10-09 | 2003-04-16 | 兄弟工业株式会社 | Sewing machine |
| CN101645465A (en) * | 2009-08-31 | 2010-02-10 | 苏州福斯特光伏材料有限公司 | Solar cell module back veneer material |
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| US8822811B2 (en) * | 2009-03-27 | 2014-09-02 | Lintec Corporation | Back protective sheet for solar cell module, production method of same and solar cell module |
| CN101931012B (en) * | 2009-06-26 | 2012-12-12 | 比亚迪股份有限公司 | Solar cell rear panel, preparation method thereof and solar cell module using rear panel |
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| CN1410616A (en) * | 2001-10-09 | 2003-04-16 | 兄弟工业株式会社 | Sewing machine |
| CN101645465A (en) * | 2009-08-31 | 2010-02-10 | 苏州福斯特光伏材料有限公司 | Solar cell module back veneer material |
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