CN102654776B - Smoke denitration ammonia injection amount control method and device - Google Patents

Smoke denitration ammonia injection amount control method and device Download PDF

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CN102654776B
CN102654776B CN201210112475.0A CN201210112475A CN102654776B CN 102654776 B CN102654776 B CN 102654776B CN 201210112475 A CN201210112475 A CN 201210112475A CN 102654776 B CN102654776 B CN 102654776B
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ammonia
deviate
amount
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denitration efficiency
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CN102654776A (en
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冯彦杰
余瑞峰
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Beijing Huaneng Xinrui Control Technology Co Ltd
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Abstract

The invention discloses a smoke denitration ammonia injection amount control method and device. The smoke denitration ammonia injection amount control method comprises the following steps of: obtaining an offset value of denitration efficiency; calculating a first ammonia injection coefficient corresponding to the offset value of the denitration efficiency; obtaining an offset value of an ammonia escape amount; calculating a second ammonia injection coefficient corresponding to the offset value of the ammonia escape amount; and regulating the ammonia injection amount according to the first ammonia injection coefficient and the second ammonia injection coefficient. Through the smoke denitration ammonia injection amount control method and device, disclosed by the invention, a problem of the ammonia injection amount required by smoke denitration can not be exactly controlled is solved, thus the accuracy of liquid ammonia amount required by the smoke denitration and an effect of the precision are reached, and an effect of diagnosing whether the activity and the operation parameter of a catalyst are reasonable or not is also realized at the same time.

Description

Ammonia spraying amount control method and the device of denitrating flue gas
Technical field
The present invention relates to control field, in particular to a kind of ammonia spraying amount control method and device of denitrating flue gas.
Background technology
Denitrating flue gas is the another major fields of thermal power plant's Chinese Control Industrial Boiler pollutant emission after flue gas desulfurization, at present domestic more employings be SCR (Selective Catalytic Reduction is called for short SCR) gas denitrifying technology (being called for short SCR technology).In prior art, control the mode of denitrating flue gas for to spray liquefied ammonia in reactor, the regulating loop SAMA of this control mode schemes as shown in Figure 1, wherein,
Figure BDA0000153850180000011
Figure BDA0000153850180000012
A: set denitration efficiency (General Requirements is 70%);
B: output violent change (export-restriction that the setting value of outlet flue gas NOx content and measured value form regulating loop is between 0.7~1.3, as the modified value of ammonia spraying amount regulating loop);
C: reactor inlet NOx conversion concentration;
D: reactor outlet NOx conversion concentration.
But, the mode that this kind carries out denitrating flue gas forms (the boiler total blast volume that passes through having converts) because smoke gas flow value converts by boiler load, non-measured data, and the exhaust gas volumn in reactor is not divided equally, this deviation of 2 will cause theory to calculate misalignment to a certain extent, and directly impact needs the calculating of ammonia amount; SCR reactor inlet, outlet NOx concentration are flue gas automatic monitored control system (Continuous Emission Monitoring System, be called for short CEMS) table meter measured value, there is certain hysteresis quality in data acquisition, and there is error to a certain degree in CEMS table instrumentation amount, automatic adjusting is existed to certain impact; Distribute can be very uneven for flue gas flow rate in SCR reactor, so the sampling spot of CEMS instrument may not possess representativeness, automatic adjusting existed to certain impact yet.And, the ammonia (HN3) injecting is when bringing denitrating flue gas, also can produce negative effect, the catalyzer in device can also make the SO2 oxidation in flue gas generate SO3, and SO3 generates ammonium hydrogen sulfate (NH4HSO4) with ammonia (HN3 of the escape) reaction that in SCR denitrification process, participation is reacted.Ammonium hydrogen sulfate has viscosity, hydroscopicity and metal protection at low temperatures, under the NH4HSO4 of flue gas gaseous state below 180 ℃ time can be at the air preheater in downstream condenses on the heat transfer element of cold section, form salification and fouling, thereby affect normal operation and the life-span of air preheater, it also can also cause corrosion harmfulness etc. to catalytic bed metal supporting frames.Have research test result to show, HN3 escape amount reaches about 2ppm, its resistance increment approximately 30% after air preheater operation half a year; HN3 escape amount is increased to 3ppm, and its resistance increment approximately 50% after air preheater operation half a year, not only takes electricity but also have the allotted portion of life reduced by having or getting more than one deserves, and seriously increases production run, maintenance cost.
Therefore,, for the owner of application SCR denitration technology, how to use minimum (leveling off to 0) HN3 escape amount to meet to fall the problem of low NOx drainage very important; Concerning the reliability service of SCR unit, to the importance of the escaping of ammonia rate restriction not second to than the restriction of NOx conversion ratio.
For cannot accurately controlling the problem of the required ammonia spraying amount of denitrating flue gas in correlation technique, effective solution is not yet proposed at present.
Summary of the invention
Fundamental purpose of the present invention is to provide a kind of ammonia spraying amount control method and device of denitrating flue gas, to solve the problem that cannot accurately control the required ammonia spraying amount of denitrating flue gas in prior art.
To achieve these goals, according to an aspect of the present invention, provide a kind of ammonia spraying amount control method of denitrating flue gas, having comprised: the deviate of obtaining denitration efficiency; Calculate the first spray ammonia coefficient corresponding to deviate of denitration efficiency; Obtain the deviate of amount of ammonia slip; Calculate the second spray ammonia coefficient corresponding to deviate of amount of ammonia slip; And according to the first spray ammonia coefficient and the second spray ammonia coefficient adjustment ammonia spraying amount.
Further, the deviate of obtaining denitration efficiency comprises: detect the concentration of the oxides of nitrogen in flue gas denitration reactor exit, as the first concentration; Detect the concentration of the oxides of nitrogen of flue gas denitration reactor porch, as the second concentration; According to the first concentration and the second concentration, calculate actual denitration efficiency; And according to the deviate of actual denitration efficiency and target denitration efficiency calculating denitration efficiency.
Further, the deviate of obtaining amount of ammonia slip comprises: the actual amount of ammonia slip that detects flue gas denitration reactor exit; And according to the deviate of actual amount of ammonia slip and target amount of ammonia slip calculating amount of ammonia slip.
Further, the first spray ammonia coefficient corresponding to the deviate of calculating denitration efficiency comprises: the deviate of denitration efficiency is carried out to PI calculating, obtain the first spray ammonia coefficient.
Further, the second spray ammonia coefficient corresponding to the deviate of calculating amount of ammonia slip comprises: the deviate of amount of ammonia slip is carried out to PI calculating, obtain the second spray ammonia coefficient.
Further, according to the first spray ammonia coefficient and the second spray ammonia coefficient adjustment ammonia spraying amount, comprise: the product that calculates the first spray ammonia coefficient and the second spray ammonia coefficient; And regulate ammonia spraying amount according to the product calculating.
To achieve these goals, according to a further aspect in the invention, provide a kind of ammonia spraying amount control device of denitrating flue gas, this control device is for carrying out the ammonia spraying amount control method of any one denitrating flue gas that foregoing of the present invention provides.
To achieve these goals, according to a further aspect in the invention, provide a kind of ammonia spraying amount control device of denitrating flue gas, having comprised: the first acquiring unit, for obtaining the deviate of denitration efficiency; The first computing unit, is connected with the first acquiring unit, for calculating the first spray ammonia coefficient corresponding to deviate of denitration efficiency; Second acquisition unit, for obtaining the deviate of amount of ammonia slip; The second computing unit, is connected with second acquisition unit, for calculating the second spray ammonia coefficient corresponding to deviate of amount of ammonia slip; And control module, be connected respectively with the second computing unit with the first computing unit, for spraying ammonia coefficient adjustment ammonia spraying amount according to the first spray ammonia coefficient and second.
Further, the first acquiring unit comprises: the first detection sub-unit, for detection of the concentration of the oxides of nitrogen in flue gas denitration reactor exit, as the first concentration; The second detection sub-unit, for detection of the concentration of the oxides of nitrogen of flue gas denitration reactor porch, as the second concentration; The first computation subunit, is connected respectively with the second detection sub-unit with the first detection sub-unit, for calculating actual denitration efficiency according to the first concentration and the second concentration; And second computation subunit, be connected with the first computation subunit, for calculate the deviate of denitration efficiency according to actual denitration efficiency and target denitration efficiency.
Further, second acquisition unit comprises: the 3rd detection sub-unit, for detection of the actual amount of ammonia slip in flue gas denitration reactor exit; And the 3rd computation subunit, be connected with the 3rd detection sub-unit, for calculate the deviate of amount of ammonia slip according to actual amount of ammonia slip and target amount of ammonia slip.
Further, the first computing unit comprises: a PI computing module, for the deviate of denitration efficiency is carried out to PI calculating, obtains the first spray ammonia coefficient.
Further, the second computing unit comprises: the 2nd PI computing module, for the deviate of amount of ammonia slip is carried out to PI calculating, obtains the second spray ammonia coefficient.
Further, control module comprises: the 4th computation subunit, is connected respectively with the second computing unit with the first computing unit, for calculating the product of the first spray ammonia coefficient and the second spray ammonia coefficient; And adjusting subelement, be connected with the 4th computation subunit, for the product according to calculating, regulate ammonia spraying amount.
By the present invention, adopt the deviate of obtaining denitration efficiency, calculate the first spray ammonia coefficient corresponding to deviate of denitration efficiency, obtain the deviate of amount of ammonia slip, calculate the second spray ammonia coefficient corresponding to deviate of amount of ammonia slip, and according to the first spray ammonia coefficient and the second spray ammonia coefficient adjustment ammonia spraying amount, by calculate the first corresponding spray ammonia coefficient according to the denitration efficiency deviate of flue gas denitrification system, according to amount of ammonia slip, calculate the second corresponding spray ammonia coefficient, ammonia spraying amount is regulated according to the first spray ammonia coefficient and the second spray ammonia coefficient simultaneously, realized and guaranteed to control amount of ammonia slip when denitration efficiency meets the demands, solved and cannot accurately control the problem of the required ammonia spraying amount of denitrating flue gas in prior art, and then reached the effect of the accuracy and precision that improves the required liquefied ammonia amount of denitrating flue gas.
Accompanying drawing explanation
The accompanying drawing that forms the application's a part is used to provide a further understanding of the present invention, and schematic description and description of the present invention is used for explaining the present invention, does not form inappropriate limitation of the present invention.In the accompanying drawings:
Fig. 1 is the SAMA figure according to the denitrating flue gas regulating loop of correlation technique;
Fig. 2 is according to the schematic diagram of the ammonia spraying amount control device of the denitrating flue gas of the embodiment of the present invention;
Fig. 3 is according to the process flow diagram of the ammonia spraying amount control method of the denitrating flue gas of the embodiment of the present invention; And
Fig. 4 is the SAMA figure according to the denitrating flue gas regulating loop of the embodiment of the present invention.
Embodiment
It should be noted that, in the situation that not conflicting, embodiment and the feature in embodiment in the application can combine mutually.Describe below with reference to the accompanying drawings and in conjunction with the embodiments the present invention in detail.
The embodiment of the present invention provides a kind of ammonia spraying amount control device of denitrating flue gas, Fig. 2 is according to the schematic diagram of the ammonia spraying amount control device of the denitrating flue gas of the embodiment of the present invention, as shown in Figure 2, the control device of this embodiment comprises the first acquiring unit 10, the first computing unit 20, second acquisition unit 30, the second computing unit 40 and control module 50.
The first acquiring unit 10 is for obtaining the deviate of denitration efficiency and the target denitration efficiency of flue gas denitrification system, the first computing unit 20 is connected with the first acquiring unit 10, for calculate the spray ammonia coefficient corresponding to deviate of denitration efficiency when the first acquiring unit 10 gets the deviate of denitration efficiency, as the first spray ammonia coefficient; Second acquisition unit 30 is for obtaining the actual amount of ammonia slip of flue gas denitrification system and the deviate of target amount of ammonia slip, the second computing unit 40 is connected with second acquisition unit 30, for calculate the spray ammonia coefficient corresponding to deviate of amount of ammonia slip when second acquisition unit 30 gets the deviate of amount of ammonia slip, as the second spray ammonia coefficient; Control module 50 is connected respectively with the second computing unit 40 with the first computing unit 20, so that ammonia spraying amount control device issues steering order according to the first spray ammonia coefficient and the second spray ammonia coefficient to liquefied ammonia flusher in flue gas denitrification system automatically, the liquefied ammonia injected volume of liquefied ammonia flusher is regulated to control.
The control device of the embodiment of the present invention is by calculating the first corresponding spray ammonia coefficient according to the denitration efficiency deviate of flue gas denitrification system, according to amount of ammonia slip, calculate the second corresponding spray ammonia coefficient, ammonia spraying amount is regulated according to the first spray ammonia coefficient and the second spray ammonia coefficient simultaneously, realized and guaranteed to control amount of ammonia slip when denitration efficiency meets the demands, solved in prior art and cannot accurately control the problem of the required ammonia spraying amount of denitrating flue gas, and then reached the effect that improves the accuracy and precision of the required liquefied ammonia amount of denitrating flue gas.
Wherein, the first acquiring unit 10 comprises the first detection sub-unit, the second detection sub-unit, the first computation subunit and the second computation subunit, particularly, the first detection sub-unit is for detection of the concentration of the oxides of nitrogen in flue gas denitration reactor exit, as the first concentration; The second detection sub-unit is for detection of the concentration of the oxides of nitrogen of flue gas denitration reactor porch, as the second concentration; The first computation subunit is connected respectively with the second detection sub-unit with the first detection sub-unit, for calculating actual denitration efficiency by the first concentration and the second concentration,
Figure BDA0000153850180000051
the second computation subunit is connected with the first computation subunit, for when the first computation subunit calculates actual denitration efficiency, calculates the deviate of actual denitration efficiency and target denitration efficiency as denitration efficiency deviate; The first computing unit 20 can be pi regulator, by denitration efficiency deviate is carried out to PI calculating, obtains spray ammonia coefficient corresponding to denitration efficiency deviate, as the first spray ammonia coefficient.
Second acquisition unit 30 comprises the 3rd detection sub-unit and the 3rd computation subunit, particularly, the 3rd detection sub-unit is for detection of the actual amount of ammonia slip in flue gas denitration reactor exit, and the 3rd detection sub-unit can be used the LaserGasII SP Monitor monochromatic light road laser gas detector of Norway NEO company production; The 3rd computation subunit is connected with the 3rd detection sub-unit, for when the 3rd detection sub-unit detects actual amount of ammonia slip, calculates the deviate of actual amount of ammonia slip and target amount of ammonia slip as the deviate of amount of ammonia slip; The second computing unit 40 can be also pi regulator, by the deviate of amount of ammonia slip is carried out to PI calculating, obtains the spray ammonia coefficient corresponding to deviate of amount of ammonia slip, as the second spray ammonia coefficient.
Control module 50 can comprise the 4th computation subunit and regulate subelement, wherein, the 4th computation subunit be connected respectively with the second computing unit with the first computing unit (the 4th computation subunit can be to be also connected respectively with the pi regulator of the second computing unit with the pi regulator of the first computing unit), when calculating respectively the first spray ammonia coefficient and the second spray ammonia coefficient at the first computing unit and the second computing unit, calculate the product of the first spray ammonia coefficient and the second spray ammonia coefficient, then by regulating subelement to regulate ammonia spraying amount according to the product value calculating, illustrate, if spray liquefied ammonia according to a unit quantity in flue gas denitration reactor when the liquefied ammonia flusher of flue gas denitrification system is initial, when the first spray ammonia coefficient calculating is 1.2, the second spray ammonia coefficient is 0.8 o'clock, regulate subelement to issue the order of spraying liquefied ammonia according to 0.96 unit quantity to liquefied ammonia flusher, , liquefied ammonia flusher sprays liquefied ammonia according to 0.96 unit quantity in flue gas denitration reactor, realization is guaranteeing to control amount of ammonia slip when denitration efficiency meets the demands.
The embodiment of the present invention also provides a kind of ammonia spraying amount control method of denitrating flue gas, the control device that this control method can provide by the above embodiment of the present invention is carried out, Fig. 3 is according to the process flow diagram of the ammonia spraying amount control method of the denitrating flue gas of the embodiment of the present invention, as shown in Figure 3, the control method of this embodiment comprises the steps that S302 is to step S310:
S302: the deviate of obtaining denitration efficiency and the target denitration efficiency of flue gas denitrification system;
S304: calculate the spray ammonia coefficient corresponding to deviate of denitration efficiency when step S302 gets the deviate of denitration efficiency, as the first spray ammonia coefficient;
S306: obtain the actual amount of ammonia slip of flue gas denitrification system and the deviate of target amount of ammonia slip;
S308: calculate the spray ammonia coefficient corresponding to deviate of amount of ammonia slip when step S306 gets the deviate of amount of ammonia slip, as the second spray ammonia coefficient;
S310: the liquefied ammonia injected volume of liquefied ammonia flusher in flue gas denitrification system is regulated to control according to the first spray ammonia coefficient and the second spray ammonia coefficient.In this step S310, ammonia spraying amount control device issues steering order according to the first spray ammonia coefficient and the second spray ammonia coefficient to liquefied ammonia flusher in flue gas denitrification system automatically, and the liquefied ammonia injected volume of liquefied ammonia flusher is regulated to control.
The control method of the embodiment of the present invention is by calculating the first corresponding spray ammonia coefficient according to the denitration efficiency deviate of flue gas denitrification system, according to amount of ammonia slip, calculate the second corresponding spray ammonia coefficient, ammonia spraying amount is regulated according to the first spray ammonia coefficient and the second spray ammonia coefficient simultaneously, realized and guaranteed to control amount of ammonia slip when denitration efficiency meets the demands, solved in prior art and cannot accurately control the problem of the required ammonia spraying amount of denitrating flue gas, and then reached the effect that improves the accuracy and precision of the required liquefied ammonia amount of denitrating flue gas.
Wherein, step S302 can realize by following steps when obtaining the deviate of denitration efficiency:
By a nitrous oxides concentration detector, the concentration of the oxides of nitrogen in flue gas denitration reactor exit is detected, as the first concentration; By another nitrous oxides concentration detector, the concentration of the oxides of nitrogen of flue gas denitration reactor porch is detected, as the second concentration; According to following formula, calculate actual out of stock efficiency:
Figure BDA0000153850180000061
Finally, the deviate of calculating actual denitration efficiency and target denitration efficiency is as denitration efficiency deviate;
Step S304 can, by denitration efficiency deviate is carried out to PI calculating, obtain spray ammonia coefficient corresponding to denitration efficiency deviate, as the first spray ammonia coefficient.
Step S306 can realize by following steps when obtaining the deviate of amount of ammonia slip:
By amount of ammonia slip pick-up unit, the actual amount of ammonia slip in flue gas denitration reactor exit is detected the LaserGasII SPMonitor monochromatic light road laser gas detector that amount of ammonia slip pick-up unit can be used Norway NEO company to produce; When actual amount of ammonia slip being detected, calculate the deviate of actual amount of ammonia slip and target amount of ammonia slip as the deviate of amount of ammonia slip.
Step S308 can, by the deviate of amount of ammonia slip is carried out to PI calculating, obtain the spray ammonia coefficient corresponding to deviate of amount of ammonia slip, as the second spray ammonia coefficient.
Step S310 regulates and controls and can realize by following steps the liquefied ammonia injected volume of liquefied ammonia flusher in flue gas denitrification system according to the first spray ammonia coefficient and the second spray ammonia coefficient:
When step S304 and step S308 calculate respectively the first spray ammonia coefficient and the second spray ammonia coefficient, calculate the product of the first spray ammonia coefficient and the second spray ammonia coefficient, then by the product value according to calculating, regulate ammonia spraying amount, illustrate, if spray liquefied ammonia according to a unit quantity in flue gas denitration reactor when the liquefied ammonia flusher of flue gas denitrification system is initial, when the first spray ammonia coefficient calculating is 1.2, the second spray ammonia coefficient is 0.8 o'clock, can control liquefied ammonia flusher and in flue gas denitration reactor, spray liquefied ammonia according to 0.96 unit quantity, realization is guaranteeing to control amount of ammonia slip when denitration efficiency meets the demands.
Wherein, according to the SAMA figure of the denitrating flue gas regulating loop of the control method of the embodiment of the present invention as shown in Figure 4.
From above description, can find out, the present invention by controlling and regulate the injected volume of liquefied ammonia according to denitration efficiency deviate and amount of ammonia slip deviate simultaneously, realized and guaranteed when denitration efficiency meets the demands to control amount of ammonia slip within the scope of 0~2ppm, realize the input of automatic control liquefied ammonia simultaneously, improved the automatic control level of denitrating flue gas and the degree of accuracy that liquefied ammonia is thrown in.
Obviously, those skilled in the art should be understood that, above-mentioned each module of the present invention or each step can realize with general calculation element, they can concentrate on single calculation element, or be distributed on the network that a plurality of calculation elements form, alternatively, they can be realized with the executable program code of calculation element, thereby, they can be stored in memory storage and be carried out by calculation element, or they are made into respectively to each integrated circuit modules, or a plurality of modules in them or step are made into single integrated circuit module to be realized.Like this, the present invention is not restricted to any specific hardware and software combination.
The foregoing is only the preferred embodiments of the present invention, be not limited to the present invention, for a person skilled in the art, the present invention can have various modifications and variations.Within the spirit and principles in the present invention all, any modification of doing, be equal to replacement, improvement etc., within all should being included in protection scope of the present invention.

Claims (10)

1. an ammonia spraying amount control method for denitrating flue gas, is characterized in that, comprising:
Obtain the deviate of denitration efficiency;
Calculate the first spray ammonia coefficient corresponding to deviate of described denitration efficiency;
Obtain the deviate of amount of ammonia slip;
Calculate the second spray ammonia coefficient corresponding to deviate of described amount of ammonia slip; And
According to described the first spray ammonia coefficient and described the second spray ammonia coefficient adjustment ammonia spraying amount,
Wherein, calculating the first spray ammonia coefficient corresponding to the deviate of described denitration efficiency comprises: the deviate of described denitration efficiency is carried out to PI calculating, obtain described the first spray ammonia coefficient.
2. control method according to claim 1, is characterized in that, the deviate of obtaining denitration efficiency comprises:
Detect the concentration of the oxides of nitrogen in flue gas denitration reactor exit, as the first concentration;
Detect the concentration of the oxides of nitrogen of described flue gas denitration reactor porch, as the second concentration;
According to described the first concentration and described the second concentration, calculate actual denitration efficiency; And
According to described actual denitration efficiency and target denitration efficiency, calculate the deviate of described denitration efficiency.
3. control method according to claim 1, is characterized in that, the deviate of obtaining amount of ammonia slip comprises:
Detect the actual amount of ammonia slip in flue gas denitration reactor exit; And
According to described actual amount of ammonia slip and target amount of ammonia slip, calculate the deviate of described amount of ammonia slip.
4. control method according to claim 1, is characterized in that, the second spray ammonia coefficient corresponding to deviate that calculates described amount of ammonia slip comprises:
The deviate of described amount of ammonia slip is carried out to PI calculating, obtain described the second spray ammonia coefficient.
5. control method according to claim 1, is characterized in that, according to described the first spray ammonia coefficient and described the second spray ammonia coefficient adjustment ammonia spraying amount, comprises:
Calculate the product of described the first spray ammonia coefficient and described the second spray ammonia coefficient; And
According to the product calculating, regulate described ammonia spraying amount.
6. an ammonia spraying amount control device for denitrating flue gas, is characterized in that, comprising:
The first acquiring unit, for obtaining the deviate of denitration efficiency;
The first computing unit, is connected with described the first acquiring unit, for calculating the first spray ammonia coefficient corresponding to deviate of described denitration efficiency;
Second acquisition unit, for obtaining the deviate of amount of ammonia slip;
The second computing unit, is connected with described second acquisition unit, for calculating the second spray ammonia coefficient corresponding to deviate of described amount of ammonia slip; And
Control module, is connected respectively with described the second computing unit with described the first computing unit, for spraying ammonia coefficient adjustment ammonia spraying amount according to described the first spray ammonia coefficient and described second,
Wherein, described the first computing unit comprises: a PI computing module, for the deviate of described denitration efficiency is carried out to PI calculating, obtains described the first spray ammonia coefficient.
7. control device according to claim 6, is characterized in that, described the first acquiring unit comprises:
The first detection sub-unit, for detection of the concentration of the oxides of nitrogen in flue gas denitration reactor exit, as the first concentration;
The second detection sub-unit, for detection of the concentration of the oxides of nitrogen of described flue gas denitration reactor porch, as the second concentration;
The first computation subunit, is connected respectively with described the second detection sub-unit with described the first detection sub-unit, for calculating actual denitration efficiency according to described the first concentration and described the second concentration; And
The second computation subunit, is connected with described the first computation subunit, for calculate the deviate of described denitration efficiency according to described actual denitration efficiency and target denitration efficiency.
8. control device according to claim 6, is characterized in that, described second acquisition unit comprises:
The 3rd detection sub-unit, for detection of the actual amount of ammonia slip in flue gas denitration reactor exit; And
The 3rd computation subunit, is connected with described the 3rd detection sub-unit, for calculate the deviate of described amount of ammonia slip according to described actual amount of ammonia slip and target amount of ammonia slip.
9. control device according to claim 6, is characterized in that, described the second computing unit comprises:
The 2nd PI computing module, for the deviate of described amount of ammonia slip is carried out to PI calculating, obtains described the second spray ammonia coefficient.
10. control device according to claim 6, is characterized in that, described control module comprises:
The 4th computation subunit, is connected respectively with described the second computing unit with described the first computing unit, for calculating the product of described the first spray ammonia coefficient and described the second spray ammonia coefficient; And
Regulate subelement, be connected with described the 4th computation subunit, for the product according to calculating, regulate described ammonia spraying amount.
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