CN102653880A - Casting device - Google Patents

Casting device Download PDF

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Publication number
CN102653880A
CN102653880A CN2012101187196A CN201210118719A CN102653880A CN 102653880 A CN102653880 A CN 102653880A CN 2012101187196 A CN2012101187196 A CN 2012101187196A CN 201210118719 A CN201210118719 A CN 201210118719A CN 102653880 A CN102653880 A CN 102653880A
Authority
CN
China
Prior art keywords
crucible
casting device
plate
protective plate
graphite protective
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN2012101187196A
Other languages
Chinese (zh)
Inventor
司荣进
袁志钟
王禄堡
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Zhenjiang Huantai Silicon Technology Co Ltd
Original Assignee
Zhenjiang Huantai Silicon Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zhenjiang Huantai Silicon Technology Co Ltd filed Critical Zhenjiang Huantai Silicon Technology Co Ltd
Priority to CN2012101187196A priority Critical patent/CN102653880A/en
Publication of CN102653880A publication Critical patent/CN102653880A/en
Pending legal-status Critical Current

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Abstract

The invention discloses a casting device which comprises a crucible and a graphite protective plate, wherein the graphite protective plate is arranged at the top part and outer side of the crucible; the casting device comprises a molybdenum plate isolating layer; and the molybdenum plate is arranged between the crucible and the graphite protective plate. By adding the molybdenum plate isolating layer between the crucible and the graphite protective plate, the carbon steam generated from the graphite protective plate at a high temperature is reduced from entering the silicon crystal in the crucible; the reaction of the crucible and the graphite protective plate at the high temperature is prevented; and the impurity in a polycrystal pipeline is prevented from entering the silicon material during argon backwash. As the further improvement of the casting device, the molybdenum plate is 0.5mm-5mm in thickness; the appearance of the molybdenum plate is the same as that of the graphite protective plate; and the molybdenum plate and the graphite protective plate are connected integrally, and the casting device is simple and convenient in practical operation.

Description

Casting device
Technical field
The invention belongs to the solar energy polycrystalline silicon casting technology field, relate in particular to a kind of method that reduces carbon content in the casting polycrystalline silicon.
Background technology
All the time, the energy is the human focus of paying close attention to the most all the time, traditional energy such as oil, and Sweet natural gas, Nonrenewable resources such as colliery constantly consume, and reserves sharply descend, and simultaneously, the use of traditional energy has also also produced negative influence to global environment.
Solar electrical energy generation has been come into people's life gradually as a kind of new forms of energy mode.As the base mateiral silicon wafer of solar cell, the photoelectric transformation efficiency of its material directly influences the generated output of this solar cell, how to improve the efficiency of conversion of sun silicon wafer, and reducing optical attenuation is each photovoltaic producer problem demanding prompt solution.Carbon is a kind of main impurity in the casting polycrystalline silicon, and its basic properties (comprising segregation coefficient, solid solubility, spread coefficient, measurement etc.) is identical with pulling of silicon single crystal.But, because the equipment thermal field of casting polycrystalline silicon is huge and complicated, in crystal casting or directional freeze process; There is a large amount of carbon evaporations in graphite under well heater high temperature, can pollute crystalline silicon, so; Carbon content in the casting polycrystalline silicon is higher, has had a strong impact on the quality of polysilicon chip.
Summary of the invention
To above-mentioned technical problem, the present invention provides the casting device of carbon content in a kind of effective reduction casting polycrystalline silicon.
The present invention is achieved through following technical scheme, and a kind of casting device comprises crucible and the graphite backplate that is positioned at the said crucible top and the outside, and said casting device comprises the molybdenum plate sealing coat, and said molybdenum plate is between crucible and graphite backplate.
The present invention reduces the carbon vapor that the graphite backplate produces under the high temperature and gets in the silicon crystal in the crucible through between crucible and graphite backplate, adding the molybdenum plate sealing coat; The reaction of crucible and graphite backplate under the prevention condition of high temperature; Stop the entering of the impurity in polycrystalline pipeline silicon material when backwashing argon gas.
As the further improvement of casting device of the present invention, said molybdenum plate thickness is 0.5mm-5mm, profile consistent with graphite backplate profile and both connect as one, simple and convenient when actually operating.
Description of drawings
Accompanying drawing is the molybdenum plate insulation layer structure synoptic diagram of casting device of the present invention.
Embodiment
Below in conjunction with accompanying drawing the present invention is made and to further specify.
According to position of mounting hole on the molybdenum plate top board 1, the processing mounting holes in graphite top board corresponding position, and remove the powdered graphite that remains in graphite top board surface when punching; With the graphite bolt molybdenum plate is fixed on the graphite top board; Using the same method wraps up lateral graphite backplate around the crucible with molybdenum plate side plate 2, before shove charge, with non-dust cloth wiping molybdenum plate surface; Remove the dust that is glued, the quartz crucible that silicon material, graphite backplate and molybdenum plate sealing coat are housed is dropped in the polycrystalline furnace.
Silicon material in the said crucible exceeds not touch molybdenum plate, can prevent that like this molybdenum plate is not damaged by silicon material institute corrode under the high temperature.The thickness of molybdenum plate is good with 0.5mm-5mm.
The description of above embodiment is comparatively concrete, detailed; But can not therefore be interpreted as restriction to scope; Should be pointed out that for the person of ordinary skill of the art, under the prerequisite that does not break away from the present invention's design; Can also make some distortion and improvement, these all belong to protection scope of the present invention.

Claims (3)

1. a casting device comprises crucible and the graphite backplate that is positioned at the said crucible top and the outside, and it is characterized in that: said casting device comprises the molybdenum plate sealing coat, and said molybdenum plate sealing coat is between crucible and graphite backplate.
2. casting device according to claim 1 is characterized in that: said molybdenum plate thickness is 0.5mm--5mm, profile consistent with graphite backplate profile and both connect as one.
3. casting device according to claim 2 is characterized in that: said molybdenum plate adopts bolt to be connected with the graphite backplate.
CN2012101187196A 2012-04-20 2012-04-20 Casting device Pending CN102653880A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN2012101187196A CN102653880A (en) 2012-04-20 2012-04-20 Casting device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN2012101187196A CN102653880A (en) 2012-04-20 2012-04-20 Casting device

Publications (1)

Publication Number Publication Date
CN102653880A true CN102653880A (en) 2012-09-05

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN2012101187196A Pending CN102653880A (en) 2012-04-20 2012-04-20 Casting device

Country Status (1)

Country Link
CN (1) CN102653880A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102995104A (en) * 2012-12-04 2013-03-27 江苏协鑫硅材料科技发展有限公司 Method and device for casting polycrystalline silicon or mono-like silicon
CN103255469A (en) * 2013-06-03 2013-08-21 英利能源(中国)有限公司 Graphite heater, graphite electrode and method for reducing carbon content in silicon wafer

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11116389A (en) * 1997-10-13 1999-04-27 Ibiden Co Ltd Apparatus for pulling single crystal
CN101812729A (en) * 2010-04-28 2010-08-25 江西赛维Ldk太阳能高科技有限公司 Polycrystalline silicon ingot with low carbon content and preparation method
CN101857970A (en) * 2010-04-16 2010-10-13 镇江市丹徒区黄墟润蓝晶体制造厂 Growing method of large-size flaky sapphire crystals
CN202039153U (en) * 2011-04-06 2011-11-16 天津市环欧半导体材料技术有限公司 Thermal system used for manufacture of heavily doped silicon single crystal
CN102409405A (en) * 2011-08-23 2012-04-11 周浪 Carbon contamination-preventing coating of carbon material for polysilicon ingot furnace and preparation process thereof
CN202913085U (en) * 2012-04-20 2013-05-01 镇江环太硅科技有限公司 Casting device

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11116389A (en) * 1997-10-13 1999-04-27 Ibiden Co Ltd Apparatus for pulling single crystal
CN101857970A (en) * 2010-04-16 2010-10-13 镇江市丹徒区黄墟润蓝晶体制造厂 Growing method of large-size flaky sapphire crystals
CN101812729A (en) * 2010-04-28 2010-08-25 江西赛维Ldk太阳能高科技有限公司 Polycrystalline silicon ingot with low carbon content and preparation method
CN202039153U (en) * 2011-04-06 2011-11-16 天津市环欧半导体材料技术有限公司 Thermal system used for manufacture of heavily doped silicon single crystal
CN102409405A (en) * 2011-08-23 2012-04-11 周浪 Carbon contamination-preventing coating of carbon material for polysilicon ingot furnace and preparation process thereof
CN202913085U (en) * 2012-04-20 2013-05-01 镇江环太硅科技有限公司 Casting device

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
F. SCHMID, ET AL.: "Origin of SiC Impurities in Silicon Crystals Grown from the Melt in Vacuum", 《J. ELECTROCHEM. SOC.: ELECTROCHEMICAL SCIENCE AND TECHNOLOGY》 *

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102995104A (en) * 2012-12-04 2013-03-27 江苏协鑫硅材料科技发展有限公司 Method and device for casting polycrystalline silicon or mono-like silicon
CN102995104B (en) * 2012-12-04 2016-01-20 江苏协鑫硅材料科技发展有限公司 A kind of method of casting polycrystalline silicon or quasi-monocrystalline silicon and device
CN103255469A (en) * 2013-06-03 2013-08-21 英利能源(中国)有限公司 Graphite heater, graphite electrode and method for reducing carbon content in silicon wafer

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Application publication date: 20120905