CN102629586B - 一种阵列基板及其制作方法和显示装置 - Google Patents
一种阵列基板及其制作方法和显示装置 Download PDFInfo
- Publication number
- CN102629586B CN102629586B CN 201110378273 CN201110378273A CN102629586B CN 102629586 B CN102629586 B CN 102629586B CN 201110378273 CN201110378273 CN 201110378273 CN 201110378273 A CN201110378273 A CN 201110378273A CN 102629586 B CN102629586 B CN 102629586B
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- photoresist
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 34
- 239000000758 substrate Substances 0.000 title claims abstract description 19
- 229920002120 photoresistant polymer Polymers 0.000 claims abstract description 101
- 238000000034 method Methods 0.000 claims abstract description 50
- 238000005530 etching Methods 0.000 claims abstract description 49
- 239000011347 resin Substances 0.000 claims abstract description 16
- 229920005989 resin Polymers 0.000 claims abstract description 16
- 238000004380 ashing Methods 0.000 claims abstract description 15
- 239000011248 coating agent Substances 0.000 claims abstract description 8
- 238000000576 coating method Methods 0.000 claims abstract description 8
- 239000012212 insulator Substances 0.000 claims abstract description 8
- 239000000203 mixture Substances 0.000 claims abstract description 7
- 230000015572 biosynthetic process Effects 0.000 claims description 8
- 238000001039 wet etching Methods 0.000 claims description 4
- 238000001259 photo etching Methods 0.000 abstract description 17
- 239000004973 liquid crystal related substance Substances 0.000 abstract description 5
- 238000005516 engineering process Methods 0.000 abstract description 4
- 238000002360 preparation method Methods 0.000 description 6
- 238000003384 imaging method Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 239000010409 thin film Substances 0.000 description 4
- 229910052581 Si3N4 Inorganic materials 0.000 description 3
- 238000011161 development Methods 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 3
- 230000004888 barrier function Effects 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- MRNHPUHPBOKKQT-UHFFFAOYSA-N indium;tin;hydrate Chemical compound O.[In].[Sn] MRNHPUHPBOKKQT-UHFFFAOYSA-N 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/1259—Multistep manufacturing methods
- H01L27/1288—Multistep manufacturing methods employing particular masking sequences or specially adapted masks, e.g. half-tone mask
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- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Thin Film Transistor (AREA)
- Liquid Crystal (AREA)
Abstract
Description
Claims (9)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN 201110378273 CN102629586B (zh) | 2011-11-24 | 2011-11-24 | 一种阵列基板及其制作方法和显示装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN 201110378273 CN102629586B (zh) | 2011-11-24 | 2011-11-24 | 一种阵列基板及其制作方法和显示装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN102629586A CN102629586A (zh) | 2012-08-08 |
CN102629586B true CN102629586B (zh) | 2013-12-25 |
Family
ID=46587814
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN 201110378273 Expired - Fee Related CN102629586B (zh) | 2011-11-24 | 2011-11-24 | 一种阵列基板及其制作方法和显示装置 |
Country Status (1)
Country | Link |
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CN (1) | CN102629586B (zh) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103560088B (zh) * | 2013-11-05 | 2016-01-06 | 京东方科技集团股份有限公司 | 阵列基板的制作方法 |
CN109037151B (zh) * | 2018-07-25 | 2020-02-07 | 深圳市华星光电半导体显示技术有限公司 | 一种阵列基板的制备方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6337284B1 (en) * | 1999-05-27 | 2002-01-08 | Lg. Philips Lcd Co., Ltd. | Liquid crystal display device and method of manufacturing the same |
CN1591144A (zh) * | 2003-08-28 | 2005-03-09 | 三星电子株式会社 | 薄膜晶体管阵列面板及其制造方法 |
CN101752361A (zh) * | 2008-12-18 | 2010-06-23 | 乐金显示有限公司 | 用于显示设备的阵列基板及其制造方法 |
-
2011
- 2011-11-24 CN CN 201110378273 patent/CN102629586B/zh not_active Expired - Fee Related
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6337284B1 (en) * | 1999-05-27 | 2002-01-08 | Lg. Philips Lcd Co., Ltd. | Liquid crystal display device and method of manufacturing the same |
CN1591144A (zh) * | 2003-08-28 | 2005-03-09 | 三星电子株式会社 | 薄膜晶体管阵列面板及其制造方法 |
CN101752361A (zh) * | 2008-12-18 | 2010-06-23 | 乐金显示有限公司 | 用于显示设备的阵列基板及其制造方法 |
Also Published As
Publication number | Publication date |
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CN102629586A (zh) | 2012-08-08 |
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C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: JINGDONGFANG SCIENCE AND TECHNOLOGY GROUP CO., LTD Free format text: FORMER OWNER: BEIJING BOE PHOTOELECTRICITY SCIENCE + TECHNOLOGY CO., LTD. Effective date: 20150707 Owner name: BEIJING BOE PHOTOELECTRICITY SCIENCE + TECHNOLOGY Effective date: 20150707 |
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C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20150707 Address after: 100015 Jiuxianqiao Road, Beijing, No. 10, No. Patentee after: BOE Technology Group Co., Ltd. Patentee after: Beijing BOE Photoelectricity Science & Technology Co., Ltd. Address before: 100176 Beijing city in Western Daxing District economic and Technological Development Zone, Road No. 8 Patentee before: Beijing BOE Photoelectricity Science & Technology Co., Ltd. |
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CF01 | Termination of patent right due to non-payment of annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20131225 Termination date: 20201124 |