CN102623513B - 用于快速开关的带有可控注入效率的二极管结构 - Google Patents
用于快速开关的带有可控注入效率的二极管结构 Download PDFInfo
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- CN102623513B CN102623513B CN201210026972.9A CN201210026972A CN102623513B CN 102623513 B CN102623513 B CN 102623513B CN 201210026972 A CN201210026972 A CN 201210026972A CN 102623513 B CN102623513 B CN 102623513B
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- semiconductor layer
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- injection efficiency
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- 239000007924 injection Substances 0.000 title claims abstract description 49
- 239000004065 semiconductor Substances 0.000 claims abstract description 130
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- 238000000576 coating method Methods 0.000 claims description 59
- 239000011248 coating agent Substances 0.000 claims description 58
- 238000002360 preparation method Methods 0.000 claims description 22
- 229910052751 metal Inorganic materials 0.000 claims description 21
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- 238000000034 method Methods 0.000 claims description 19
- 230000003139 buffering effect Effects 0.000 claims description 14
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- 238000007667 floating Methods 0.000 claims description 9
- 230000005611 electricity Effects 0.000 claims description 6
- 239000002019 doping agent Substances 0.000 claims description 2
- 235000012431 wafers Nutrition 0.000 description 9
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 6
- 229920005591 polysilicon Polymers 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 5
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- 238000006243 chemical reaction Methods 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
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- 230000000694 effects Effects 0.000 description 2
- 230000005669 field effect Effects 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 238000000137 annealing Methods 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
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- 238000013461 design Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 239000007943 implant Substances 0.000 description 1
- 238000002513 implantation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/70—Bipolar devices
- H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
- H01L29/739—Transistor-type devices, i.e. able to continuously respond to applied control signals controlled by field-effect, e.g. bipolar static induction transistors [BSIT]
- H01L29/7391—Gated diode structures
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Electrodes Of Semiconductors (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Abstract
Description
Claims (13)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/931,429 US8933506B2 (en) | 2011-01-31 | 2011-01-31 | Diode structures with controlled injection efficiency for fast switching |
US12/931,429 | 2011-01-31 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN102623513A CN102623513A (zh) | 2012-08-01 |
CN102623513B true CN102623513B (zh) | 2014-10-15 |
Family
ID=46563311
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201210026972.9A Active CN102623513B (zh) | 2011-01-31 | 2012-01-18 | 用于快速开关的带有可控注入效率的二极管结构 |
Country Status (3)
Country | Link |
---|---|
US (1) | US8933506B2 (zh) |
CN (1) | CN102623513B (zh) |
TW (1) | TWI453919B (zh) |
Families Citing this family (42)
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US9666666B2 (en) | 2015-05-14 | 2017-05-30 | Alpha And Omega Semiconductor Incorporated | Dual-gate trench IGBT with buried floating P-type shield |
US9685523B2 (en) * | 2014-12-17 | 2017-06-20 | Alpha And Omega Semiconductor Incorporated | Diode structures with controlled injection efficiency for fast switching |
JP5937413B2 (ja) * | 2011-06-15 | 2016-06-22 | 株式会社デンソー | 半導体装置 |
US20160372542A9 (en) * | 2011-07-19 | 2016-12-22 | Yeeheng Lee | Termination of high voltage (hv) devices with new configurations and methods |
DE102012201911B4 (de) * | 2012-02-09 | 2022-09-22 | Robert Bosch Gmbh | Super-Junction-Schottky-Oxid-PiN-Diode mit dünnen p-Schichten unter dem Schottky-Kontakt |
US8618576B1 (en) * | 2012-08-27 | 2013-12-31 | Infineon Technologies Ag | Semiconductor device with back side metal structure |
US8710585B1 (en) * | 2013-02-25 | 2014-04-29 | Alpha And Omega Semiconductor Incorporated | High voltage fast recovery trench diode |
CN103208532B (zh) * | 2013-02-28 | 2015-06-10 | 溧阳市宏达电机有限公司 | 一种鳍型pin二极管 |
US9773884B2 (en) | 2013-03-15 | 2017-09-26 | Hrl Laboratories, Llc | III-nitride transistor with engineered substrate |
CN104969360B (zh) * | 2013-03-25 | 2018-04-20 | 富士电机株式会社 | 半导体装置 |
US10446700B2 (en) | 2013-05-22 | 2019-10-15 | W&Wsens Devices, Inc. | Microstructure enhanced absorption photosensitive devices |
US9496435B2 (en) * | 2013-05-22 | 2016-11-15 | W&Wsens Devices, Inc. | Microstructure enhanced absorption photosensitive devices |
US11121271B2 (en) | 2013-05-22 | 2021-09-14 | W&WSens, Devices, Inc. | Microstructure enhanced absorption photosensitive devices |
US10468543B2 (en) | 2013-05-22 | 2019-11-05 | W&Wsens Devices, Inc. | Microstructure enhanced absorption photosensitive devices |
US10700225B2 (en) | 2013-05-22 | 2020-06-30 | W&Wsens Devices, Inc. | Microstructure enhanced absorption photosensitive devices |
US9716151B2 (en) | 2013-09-24 | 2017-07-25 | Semiconductor Components Industries, Llc | Schottky device having conductive trenches and a multi-concentration doping profile therebetween |
US9093568B1 (en) | 2014-04-16 | 2015-07-28 | Infineon Technologies Ag | Semiconductor diode |
JP2016058654A (ja) * | 2014-09-11 | 2016-04-21 | 株式会社東芝 | 半導体装置 |
EP3221895A4 (en) | 2014-11-18 | 2018-08-15 | Shih-Yuan Wang | Microstructure enhanced absorption photosensitive devices |
JP2017022311A (ja) * | 2015-07-14 | 2017-01-26 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
TWI576920B (zh) * | 2015-11-20 | 2017-04-01 | 敦南科技股份有限公司 | 二極體元件及其製造方法 |
US9583586B1 (en) | 2015-12-22 | 2017-02-28 | Alpha And Omega Semiconductor Incorporated | Transient voltage suppressor (TVS) with reduced breakdown voltage |
CN107204336B (zh) * | 2016-03-16 | 2023-10-20 | 重庆中科渝芯电子有限公司 | 一种高效整流器及其制造方法 |
CN105870178B (zh) * | 2016-04-26 | 2018-11-09 | 电子科技大学 | 一种双向igbt器件及其制造方法 |
US10388781B2 (en) | 2016-05-20 | 2019-08-20 | Alpha And Omega Semiconductor Incorporated | Device structure having inter-digitated back to back MOSFETs |
US10446545B2 (en) | 2016-06-30 | 2019-10-15 | Alpha And Omega Semiconductor Incorporated | Bidirectional switch having back to back field effect transistors |
DE102016117723A1 (de) * | 2016-09-20 | 2018-03-22 | Infineon Technologies Ag | Diodenstruktur eines Leistungshalbleiterbauelements |
US10056461B2 (en) | 2016-09-30 | 2018-08-21 | Alpha And Omega Semiconductor Incorporated | Composite masking self-aligned trench MOSFET |
US10103140B2 (en) | 2016-10-14 | 2018-10-16 | Alpha And Omega Semiconductor Incorporated | Switch circuit with controllable phase node ringing |
US10199492B2 (en) | 2016-11-30 | 2019-02-05 | Alpha And Omega Semiconductor Incorporated | Folded channel trench MOSFET |
CN106876438B (zh) * | 2017-01-24 | 2023-08-08 | 杭州士兰集成电路有限公司 | 快恢复二极管及其制造方法 |
US10325908B2 (en) | 2017-04-26 | 2019-06-18 | Alpha And Omega Semiconductor Incorporated | Compact source ballast trench MOSFET and method of manufacturing |
US10211333B2 (en) | 2017-04-26 | 2019-02-19 | Alpha And Omega Semiconductor (Cayman) Ltd. | Scalable SGT structure with improved FOM |
CN107482051B (zh) * | 2017-08-22 | 2020-03-17 | 电子科技大学 | 一种变禁带宽度的超结vdmos器件 |
US10714580B2 (en) | 2018-02-07 | 2020-07-14 | Alpha And Omega Semiconductor (Cayman) Ltd. | Source ballasting for p-channel trench MOSFET |
US10608122B2 (en) | 2018-03-13 | 2020-03-31 | Semicondutor Components Industries, Llc | Schottky device and method of manufacture |
CN109390389A (zh) * | 2018-09-17 | 2019-02-26 | 西安理工大学 | 具有双侧调整区的高压快速软恢复二极管及其制备方法 |
CN109585572A (zh) * | 2018-12-29 | 2019-04-05 | 矽力杰半导体技术(杭州)有限公司 | 半导体器件及其制造方法 |
US11579645B2 (en) * | 2019-06-21 | 2023-02-14 | Wolfspeed, Inc. | Device design for short-circuitry protection circuitry within transistors |
CN111180511A (zh) * | 2020-01-03 | 2020-05-19 | 深圳市瑞联升科技有限公司 | 一种绝缘闸双极晶体管与整流器之整合结构的制造方法 |
CN112349772A (zh) * | 2020-11-05 | 2021-02-09 | 北京工业大学 | 累积型mos沟道二极管结构 |
CN115172472B (zh) * | 2022-08-12 | 2024-05-24 | 上海擎茂微电子科技有限公司 | 快恢复二极管 |
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CN1441968A (zh) * | 2000-06-26 | 2003-09-10 | 快捷半导体有限公司 | 软恢复功率二极管和相关方法 |
CN1309093C (zh) * | 2002-12-03 | 2007-04-04 | 株式会社东芝 | 半导体器件 |
CN101640222A (zh) * | 2008-07-31 | 2010-02-03 | 三菱电机株式会社 | 半导体装置及其制造方法 |
CN101946324A (zh) * | 2008-02-14 | 2011-01-12 | 丰田自动车株式会社 | 反向导通半导体元件的驱动方法和半导体装置以及供电装置 |
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US4982244A (en) * | 1982-12-20 | 1991-01-01 | National Semiconductor Corporation | Buried Schottky clamped transistor |
US5689128A (en) * | 1995-08-21 | 1997-11-18 | Siliconix Incorporated | High density trenched DMOS transistor |
US7345342B2 (en) * | 2001-01-30 | 2008-03-18 | Fairchild Semiconductor Corporation | Power semiconductor devices and methods of manufacture |
JP4097417B2 (ja) * | 2001-10-26 | 2008-06-11 | 株式会社ルネサステクノロジ | 半導体装置 |
ITMI20022700A1 (it) * | 2002-12-20 | 2004-06-21 | St Microelectronics Srl | Dispositivo integrato con diodo schottky e transitor mos |
US7465986B2 (en) * | 2004-08-27 | 2008-12-16 | International Rectifier Corporation | Power semiconductor device including insulated source electrodes inside trenches |
US7285822B2 (en) * | 2005-02-11 | 2007-10-23 | Alpha & Omega Semiconductor, Inc. | Power MOS device |
JP4843253B2 (ja) * | 2005-05-23 | 2011-12-21 | 株式会社東芝 | 電力用半導体装置 |
JP4599379B2 (ja) * | 2007-08-31 | 2010-12-15 | 株式会社東芝 | トレンチゲート型半導体装置 |
-
2011
- 2011-01-31 US US12/931,429 patent/US8933506B2/en active Active
-
2012
- 2012-01-18 CN CN201210026972.9A patent/CN102623513B/zh active Active
- 2012-01-18 TW TW101101872A patent/TWI453919B/zh active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1441968A (zh) * | 2000-06-26 | 2003-09-10 | 快捷半导体有限公司 | 软恢复功率二极管和相关方法 |
CN1309093C (zh) * | 2002-12-03 | 2007-04-04 | 株式会社东芝 | 半导体器件 |
CN101946324A (zh) * | 2008-02-14 | 2011-01-12 | 丰田自动车株式会社 | 反向导通半导体元件的驱动方法和半导体装置以及供电装置 |
CN101640222A (zh) * | 2008-07-31 | 2010-02-03 | 三菱电机株式会社 | 半导体装置及其制造方法 |
Also Published As
Publication number | Publication date |
---|---|
TW201232788A (en) | 2012-08-01 |
TWI453919B (zh) | 2014-09-21 |
US8933506B2 (en) | 2015-01-13 |
CN102623513A (zh) | 2012-08-01 |
US20120193676A1 (en) | 2012-08-02 |
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Address after: Bermuda Hamilton Church 2 Cola Lunden House Street Patentee after: ALPHA & OMEGA SEMICONDUCTOR, Ltd. Address before: No. 475 California Sunnyvale, oak Mead Avenue Patentee before: ALPHA & OMEGA SEMICONDUCTOR, Ltd. |
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Effective date of registration: 20160919 Address after: 400700 Chongqing city Beibei district and high tech Industrial Park the road No. 5 of 407 Patentee after: Chongqing Wanguo Semiconductor Technology Co.,Ltd. Address before: Bermuda Hamilton Church 2 Cola Lunden House Street Patentee before: ALPHA & OMEGA SEMICONDUCTOR, Ltd. |
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