CN102607819B - Full-light-field polarization aberration detection device and detection method - Google Patents
Full-light-field polarization aberration detection device and detection method Download PDFInfo
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- CN102607819B CN102607819B CN201210091180.XA CN201210091180A CN102607819B CN 102607819 B CN102607819 B CN 102607819B CN 201210091180 A CN201210091180 A CN 201210091180A CN 102607819 B CN102607819 B CN 102607819B
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Abstract
The invention discloses a full-light-field polarization aberration detection device and a full-light-field polarization aberration detection method. The device comprises a full polarization state generator (PSG), a full polarization state analyzer (PSA) and a signal processing and control system. The detection method comprises the following steps of: changing the magnitude of polarization control voltage applied to a Faraday rotator, and performing primary measurement; changing the magnitude of the polarization control voltage applied to the Faraday rotator, and performing secondary, tertiary and quaternary measurement; and processing primary, secondary, tertiary and quaternary measurement results according to an algorithm. The device and the method have the characteristics of simple device structure, optical coaxiality, stability, no need of mechanical rotation in measurement, simple algorithm, high spatial resolution and higher measurement speed.
Description
Technical field
The present invention relates to Polarization aberration detection field, particularly relate to a kind of all-optical field Polarization aberration pick-up unit and detection method.
Background technology
The use of the optical component such as large-numerical aperture projection objective in high-accuracy imaging system, incident wave is caused seriously to tilt from axle, make the transmissivity of TE with TM two kinds of polarized lights different, thus cause image contrast degradation, objectively the all-optical field Polarization aberration information of inevitable requirement to optical components such as large-numerical aperture projection objectives is extracted and is analyzed.
About the detection method of the information extraction of all-optical field Polarization aberration and analysis mainly based on the principle that all-optical field mueller matrix detects, by the detection to all-optical field stokes parameter before testing sample incidence and after outgoing, then the mueller matrix distribution of all-optical field is obtained according to corresponding algorithm, i.e. all-optical field Polarization aberration information, its device and detection method generally comprise two parts, that is: full polarization state generator PSG and full Polarization device PSA.
Full polarization state generator PSG part, traditional detection method is generally rotating element polarimetry (rotating element polarimetry), as at first technology 1[Hauge, P.S., Azzam, R.M.A., et al, " Mueller Matrix Polarimetry, " in Polarized Light, Dennis Goldstein. (Second Edition, Revised and Expanded, Marcel Dekker, Inc., 2003) .], but rotating element polarimetry needs rotatable polarizer or phase delay device, thus introduce larger measuring error, in traditional detection method, also have and use oscillating element polarimetry (oscillating element polarimetry), as at first technology 2[R.M.A.Azzam, " Simulation of mechanical rotation by optical rotation:Application to the design of a new Fourier photopolarimeter ", J.Opt.Soc.Am.68, 518-521 (1978) .] in device, Faraday rotator (4) and (6) are had in device, quarter wave plate (5) and substrate bias controller (15), but the voltage that the substrate bias controller (15) in device loads is Sine Modulated voltage, need to use bessel transform algorithm, complexity is large, two Faraday rotators (4) in device and the less and optically-active angle of the clear aperature of (6) must equal and opposite in direction direction contrary, all-optical field Polarization aberration information cannot be carried out to testing sample (7) and carry out moment detection fast, need to carry out point by point scanning.
Full Polarization device PSA part, traditional detection method generally comprises rotating element polarimetry (Rotating-element polarimeters) and phase-modulated polarized mensuration (Phase modulating polarimeters), but these detection methods are in order to measure the polarization information of a certain site-specific, need this some continuous detecting more than four times, if detect whole light field, pointwise is then needed to scan, therefore these detection methods cannot realize the fast speed real-time measurement of all-optical field polarization information, and some device needs precision rotating mechanism to rotate, thus introduce larger measuring error, at first technology 3[John E.Hubbs, Mark E.Gramer, et al, " Measurement of the Radiometric and Polarization Characteristics of a Micro-Grid Polarizer Infrared Focal Plane Array ", Proc.SPIE 6285, 62850C, 2006.] and at first technology 4[James K.Boger, et al, " Modeling Precision and Accuracy of a LWIR Microgrid Array Imaging Polarimeter ", Proc.SPIE 5777, 57770U, 2005.] the instantaneous multichannel measurement imaging polarization detection instrument proposed in is primarily of micro-polarization analyzer array (9), ccd detector array (10) and some other element formed, but wherein there is no compensator (8), the real-time detection of the full stokes parameter of all-optical field can be realized, and do not affect by environmental change, but but can only detect first three stokes parameter, the intensity information of dextrorotation or left-hand polarization light can not be extracted, therefore the 4th Stokes' parameter can not be extracted, incomplete to the detection of polarization information.
Summary of the invention
The object of the invention is: carry out to solve the precision rotating mechanism that needs existed in first technology 1 problem rotated, the problem of algorithm complexity when the on-load voltage existed in first technology 2 is Sine Modulated voltage, what exist in first technology 1 and 2 needs point-to-point measurement repeatedly and the problem scanned all-optical field and the not congruent problem of the detection to polarization information existed in first technology 3 and 4, a kind of all-optical field Polarization aberration pick-up unit and detection method are provided, apparatus structure should be had simple, common optical axis and stable, measure without the need to mechanical rotation, algorithm is simple, high spatial resolution and measuring speed feature faster.
Technical solution of the present invention is as follows:
A kind of all-optical field Polarization aberration pick-up unit, this device comprises full polarization state generator, full Polarization device and signal transacting and control system, and its feature is;
Described full polarization state generator comprises laser instrument, laser beam expander, the polarizer, the first Faraday rotator, quarter wave plate and the second Faraday rotator, described full Polarization device comprises compensator, micro-polarization analyzer array and ccd detector array, its position relationship is: along the Laser output direction of this laser instrument, is described laser beam expander, the polarizer, the first Faraday rotator, quarter wave plate, the second Faraday rotator, compensator (8), micro-polarization analyzer array and ccd detector array successively;
Described micro-polarization analyzer array is made up of the array of micro-polarization analyzer super-pixel, described micro-polarization analyzer super-pixel is made up of 0 degree of micro-analyzer of linear polarization, 45 degree of micro-analyzers of linear polarization, 90 degree of micro-analyzers of linear polarization and 135 degree of micro-analyzers of linear polarization, described ccd detector array is made up of the array of ccd detector super-pixel, and described ccd detector array super-pixel is made up of four identical ccd detector sub-pixels; Described micro-polarization analyzer array and described ccd detector array integrate, and described micro-polarization analyzer super-pixel array and ccd detector super-pixel array are aimed at one by one, are formed and aim at super-pixel array;
Described signal transacting and control system comprise amplifier, simultaneous data-acquisition, computing machine, the first substrate bias controller and the second substrate bias controller;
Described ccd detector array is connected with the input end of described computing machine through described amplifier, simultaneous data-acquisition, first substrate bias controller described in output termination of described computing machine and the input end of the second substrate bias controller, the control end of the compensator described in output termination of the first described substrate bias controller, first Faraday rotator described in output termination of the second described substrate bias controller and the control end of the second Faraday rotator.
The described polarizer is polaroid, polarizing prism or polarization phase mask.
Described first Faraday rotator is identical with the second Faraday rotator, and under the identical on-load voltage condition of described second substrate bias controller, produces two size is identical, direction is identical or direction is contrary and continuously adjustable optically-active angle.
Described quarter wave plate is crystalline material type quarter wave plate, multi-component compound quarter wave plate, reflection rib build quarter wave plate or birefringent film type quarter wave plate, and the scope of its phase-delay quantity is: 89 ° ~ 91 °.
Described compensator is light ball modulator, liquid crystal phase retardation device, lithium columbate crystal, produces optical element or the device of continuously adjustabe phase delay under the on-load voltage condition of described first substrate bias controller.
Described simultaneous data-acquisition is the multi-channel high-speed data capture card with A/D translation function.
Described computing machine is provided with the bias voltage control software of data processing, analysis software, the first substrate bias controller and the second substrate bias controller.
Described first substrate bias controller and the second substrate bias controller are continuously adjustable D.C. regulated power supplies.
Utilize above-mentioned all-optical field Polarization aberration pick-up unit to the all-optical field Polarization aberration detection method of testing sample, the method comprises the following steps:
1. described Faraday rotator is loaded and partially control voltage, carry out first time and measure;
Computing machine changes the size of control voltage partially on described first Faraday rotator and the second Faraday rotator by the second described substrate bias controller simultaneously, and the optically-active angle that described first Faraday rotator and the second Faraday rotator are produced is respectively γ
1with-γ
1after the laser beam that described laser instrument produces is expanded by described laser beam expander, be irradiated on the described polarizer, become linear polarization parallel beam, then by the modulation of described first Faraday rotator, quarter wave plate and the second Faraday rotator, the Stokes vector obtaining parallel beam is:
This parallel beam is through after described testing sample and compensator, parallelly be incident on above described micro-polarization analyzer super-pixel array, by described ccd detector super-pixel array, light intensity signal is detected, computing machine changes the size described compensator loading control voltage partially by described first substrate bias controller, the electro-optic delay that described compensator is produced is 2 π, now with four micro-analyzer sub-pixels in described micro-polarization analyzer super-pixel: 0 degree of micro-analyzer of linear polarization, 45 degree of micro-analyzers of linear polarization, 90 degree of micro-analyzers of linear polarization, the light intensity that the ccd detector sub-pixel that corresponding four of 135 degree of micro-analyzers of linear polarization are identical detects is followed successively by: I
0, I
45, I
90and I
135, and conjunction is write as a matrix, is referred to as the light intensity matrix super-pixel (1601) that electro-optic delay is 2 π, is expressed as:
Described electro-optic delay is that the light intensity matrix super-pixel array of 2 π closes and write as a larger matrix, is referred to as the light intensity matrix that electro-optic delay is 2 π:
When other conditions are constant, computing machine changes the upper size loading control voltage partially of described compensator (8) by described first substrate bias controller, the electro-optic delay that described compensator is produced is pi/2, now with four micro-analyzer sub-pixels in described micro-polarization analyzer super-pixel: 0 degree of micro-analyzer of linear polarization, 45 degree of micro-analyzers of linear polarization, the light intensity that the ccd detector sub-pixel that corresponding four of 90 degree of micro-analyzers of linear polarization, 135 degree of micro-analyzers of linear polarization are identical detects is followed successively by: I
r0, I
r45, I
r90and I
r135, close and write as a matrix, be referred to as the light intensity matrix super-pixel that electro-optic delay is pi/2:
This electro-optic delay is that the light intensity matrix super-pixel array of pi/2 closes and write as a larger matrix, is referred to as the light intensity matrix that electro-optic delay is pi/2:
Through the treatment and analysis of computing machine to electro-optic delay to be the light intensity matrix super-pixel of 2 π and electro-optic delay the be light intensity matrix super-pixel of pi/2, show that the Stokes vector of site-specific outgoing beam is:
2. computing machine changes the size of control voltage partially on described first Faraday rotator and the second Faraday rotator simultaneously by the second described substrate bias controller, and the optically-active angle that described first Faraday rotator and the second Faraday rotator are produced is respectively γ
2, γ
3, γ
4with-γ
2,-γ
3,-γ
4change size Faraday rotator loading control voltage partially, repeat step 1., carry out second and third respectively, measure for four times, after the modulation of described first Faraday rotator, quarter wave plate and the second Faraday rotator, the Stokes vector of parallel beam and the Stokes vector of site-specific outgoing beam are respectively accordingly:
3. according to algorithm, above-mentioned four measurement results are processed;
By in four measuring processes, by the Stokes vector of parallel beam after the modulation of described first Faraday rotator, quarter wave plate and the second Faraday rotator
and
conjunction is write as a matrix S
in, by the Stokes vector of outgoing beam
and
merge and write as a matrix S
out, then have: S
out=MS
in, that is:
Wherein: M is the mueller matrix of testing sample, works as S
inwhen being linear independence invertible matrix, matrix M can be obtained, that is:
M=S
out(S
in)
-1
Described matrix M is all-optical field Polarization aberration information.
Advantage of the present invention is:
1, algorithm is simple and without the need to mechanical rotation: in the present invention, second substrate bias controller of full polarization state generator PSG part is continuously adjustable D.C. regulated power supply, instead of Sine Modulated voltage to modulate the first Faraday rotator and the second Faraday rotator, algorithm is more simple, and in whole measuring process, only need to change the size loading control voltage partially above first and second Faraday rotator and compensator, do not need that machinery is carried out to optical element and rotate.
2, common optical axis and simple and stable structure, spatial resolution are high: in the present invention, each element common optical axis, system stability improves greatly, spatial resolution limited primarily of the super-pixel bin size in micro-polarization analyzer array and ccd detector array simultaneously, utilizes less super-pixel bin can obtain higher spatial resolution.
3, the Polarization aberration of all-optical field can be obtained: in the present invention, the light intensity matrix that light intensity matrix that four electro-optic delays are 2 π and four electro-optic delays are pi/2 is obtained by measure for four times, carry out corresponding algorithm process by these eight light intensity Input matrixes to computing machine, the Polarization aberration information of all-optical field can be obtained.
4, measuring speed is very fast: in the present invention, the size of the Faraday rotator anglec of rotation and the size of electro-optic delay, the inclined size controlling voltage can be controlled by computing machine to change, speed is quick, and due to the use of super-pixel array, do not need to carry out point by point scanning to all-optical field, therefore, can detect fast.
In a word, the present invention have that apparatus structure is simple, common optical axis and stablize, measure, high spatial resolution simple without the need to mechanical rotation, algorithm and measuring speed feature faster.
Accompanying drawing explanation
Fig. 1 is all-optical field Polarization aberration structure of the detecting device figure of the present invention;
Fig. 2 is the polarizer in the embodiment of the present invention, the first Faraday rotator, quarter wave plate and the second Faraday rotator displacement structure figure;
Fig. 3 is first and second Faraday rotator bias voltage control structural drawing in the invention process row;
Fig. 4 is Large LN Crystals displacement structure figure in the embodiment of the present invention;
Fig. 5 is Large LN Crystals bias voltage control structural drawing in the embodiment of the present invention;
Fig. 6 is that in the embodiment of the present invention, Large LN Crystals is placed and bias voltage control structural drawing;
Fig. 7 is micro-polarization analyzer array and ccd detector array align structures figure in the embodiment of the present invention;
Fig. 8 is the light intensity matrix align structures figure of electro-optic delay to be the light intensity matrix of 2 π and electro-optic delay be pi/2 in the embodiment of the present invention;
Fig. 9 is that all-optical field Polarization aberration of the present invention detects detection method process flow diagram.
Embodiment
Embodiments provide a kind of all-optical field Polarization aberration pick-up unit and detection method; the object of embodiment, technical scheme and advantage for a better understanding of the present invention; accompanying drawing below in conjunction with the embodiment of the present invention is illustrated; based on inventive embodiment, other embodiments that those of ordinary skill in the art obtain under the prerequisite not making creative work are all the scopes that the present invention protects.
Embodiment 1
In order to measure all-optical field Polarization aberration, provide a kind of all-optical field Polarization aberration pick-up unit in the embodiment of the present invention, see Fig. 1, this device comprises: full polarization state generator PSG, full Polarization device PSA and signal transacting and control system, described full polarization state generator PSG comprises laser instrument 1, laser beam expander 2, the polarizer 3, first Faraday rotator 4, quarter wave plate 5 and the second Faraday rotator 6, described full Polarization device PSA comprises compensator 8, micro-polarization analyzer array 9 and ccd detector array 10, described signal transacting and control system comprise amplifier 11, simultaneous data-acquisition 12, computing machine 13, first substrate bias controller 14 and the second substrate bias controller 15, its position relationship is: in the parallel entrance beam working direction that laser instrument 1 produces, and is described laser beam expander 2 successively, the polarizer 3, first Faraday rotator 4, quarter wave plate 5, second Faraday rotator 6, compensator 8, micro-polarization analyzer array 9 and ccd detector array 10, described ccd detector array 10 is through described amplifier 11, simultaneous data-acquisition 12 is connected with the input end of described computing machine 13, first substrate bias controller 14 described in output termination of described computing machine 13 and the input end of the second substrate bias controller 15, the control end of the compensator 8 described in output termination of the first described substrate bias controller 14, first Faraday rotator 4 described in output termination of the second described substrate bias controller 15 and the control end of the second Faraday rotator 6.
In the present embodiment
The described polarizer 3, first Faraday rotator 4, quarter wave plate 5 and the second Faraday rotator 6 displacement structure figure, see Fig. 2, z-axis is the direction of propagation that parallel entrance beam advances, the optical axis of the polarizer 3 is placed along the x-axis direction, the logical light face of the first Faraday rotator 4 and the second Faraday rotator 6 is perpendicular to systematic optical axis, and can modulate accurately optically-active angle under the control of the second substrate bias controller 15, the optical axis of quarter wave plate is perpendicular to systematic optical axis, and orientation angles can be optional.
First and second Faraday rotator bias voltage control structural drawing described, see Fig. 3, described substrate bias controller 15 is continuously adjustable D.C. regulated power supply, described first Faraday rotator 4 is identical or contrary with the second Faraday rotator 6 direction of winding, and can under the identical on-load voltage condition of described second substrate bias controller 15, size is identical, direction is identical or contrary and continuously adjustable optically-active angle to produce two.
Described compensator 8 is two pieces and makes identical Large LN Crystals, see Fig. 4, for Large LN Crystals displacement structure figure, z-axis is the direction of propagation that parallel entrance beam advances, optical axis 801 direction of the first Large LN Crystals is along x-axis, the optical axis 802 of the second Large LN Crystals along the y-axis direction, above 803 of first Large LN Crystals, 804 and second 805 and 806 be metal electrode layer below before Large LN Crystals below, see Fig. 5, for Large LN Crystals bias voltage control structural drawing, z-axis is the direction of propagation that parallel entrance beam advances, optical axis 801 direction of the first Large LN Crystals is along x-axis, the optical axis 802 of the second Large LN Crystals along the y-axis direction, first Large LN Crystals above 803 with 804 positive pole and negative poles being connected the first substrate bias controller 14 respectively below, before second Large LN Crystals 805 with 806 positive pole and negative poles being connected the first substrate bias controller 14 respectively below, first Large LN Crystals and the second Large LN Crystals produce continuously adjustable phase delay under the on-load voltage condition of formed objects.See Fig. 6, for Large LN Crystals is placed and the second way of bias voltage control, z-axis is the direction of propagation that parallel entrance beam advances, first, the optical axis direction 801 of two Large LN Crystals, 802 all along the x-axis direction, 803 and 806 and 804 and 805 be metal electrode layer below above, and 803 and 806 positive poles being all connected the first substrate bias controller 14 above, 804 and 805 negative poles all connecting the first substrate bias controller 14 below, one piece of 1/2 wave plate is placed between the first Large LN Crystals and the second Large LN Crystals, its optical axis is parallel or perpendicular to x-axis and places, first Large LN Crystals and the second Large LN Crystals produce continuously adjustable phase delay under the on-load voltage condition of formed objects.
See Fig. 7, for micro-polarization analyzer array and ccd detector array align structures figure, z-axis is the direction of propagation that parallel entrance beam advances, described micro-polarization analyzer array 9 is made up of the array of micro-polarization analyzer super-pixel 901, described micro-polarization analyzer super-pixel 901 is by 0 degree of micro-analyzer 902 of linear polarization, 45 degree of micro-analyzers 903 of linear polarization, 90 degree of micro-analyzers of linear polarization 904 and 135 degree of micro-analyzers 905 of linear polarization form, described ccd detector array 10 is made up of the array of ccd detector super-pixel 1001, described ccd detector array super-pixel 1001 is made up of four identical ccd detector sub-pixels, described micro-polarization analyzer array 9 and described ccd detector array 10 integrate, form high resolving power polarization imaging sensor (High Resolution Polarization Imaging Sensor), described micro-polarization analyzer super-pixel 901 array and ccd detector super-pixel 1001 array are aimed at one by one, are formed and aim at super-pixel array 901-1001,
Described simultaneous data-acquisition 12 is the multi-channel high-speed data capture cards with A/D translation function.
Described computing machine 13 is provided with the bias voltage control software of data processing, analysis software and the first substrate bias controller 14 and the second substrate bias controller 15.
Described first substrate bias controller 14 is the continuously adjustable D.C. regulated power supplies of 0V-6000V, and described second substrate bias controller 15 is the continuously adjustable D.C. regulated power supplies of 0V-1000V.
Concrete structure and the parameter of the embodiment of the present invention are as follows:
Described laser instrument 1 is the He-Ne laser instrument of 632.8nm, first Faraday rotator 4 and the second Faraday rotator 6 are large aperture Faraday rotator, clear aperature is 40mm ~ 100mm, use wavelength is 633nm, and extinction ratio is greater than 30dB, and transmitance is more than or equal to 97%, compensator 8 is Large LN Crystals, non-impurity-doped, the transmitance within the scope of 0.4 ~ 0.5 mum wavelength is up to 98%, and phase-delay quantity error is less than 0.3
0high resolving power polarization imaging sensor (High Resolution Polarization Imaging Sensor) after integrated both micro-polarization analyzer array 9 and ccd detector array 10 adopt, its resolution is 1000 × 1000, pel spacing is 7.4 μm, first substrate bias controller 14 adopts can provide 0V-6000V continuously adjustabe partially to control the D.C. regulated power supply of voltage, the D.C. regulated power supply of the second substrate bias controller 15 for 0V-1000V continuously adjustabe can be provided partially to control voltage.
Embodiment 2
In order to measure all-optical field Polarization aberration information, provide in the embodiment of the present invention based on the all-optical field Polarization aberration detection method of described all-optical field Polarization aberration pick-up unit to testing sample 7, see Fig. 9, it is characterized in that, this detection method comprises the following steps:
1. change size Faraday rotator loading control voltage partially, carry out first time and measure;
For the ease of reasoning and calculation, some ABCs first introducing polarization optics relevant are as follows:
Line phase delay device is α at quick shaft direction angle, and when phase delay is 6, its mueller matrix is:
Therefore, be 0 at quick shaft direction angle, when electro-optic delay is respectively 2 π, pi/2, its mueller matrix is respectively:
Quick shaft direction angle is the quarter wave plate 5 of α, and its mueller matrix is:
The linear polarization polarizer, analyzer are when its angle, polarization direction is β, and its mueller matrix is:
Therefore, the mueller matrix of the 0 degree of micro-analyzer of linear polarization 902,45 degree of micro-analyzers of linear polarization, 903,90 degree of micro-analyzer of linear polarization 904 and 135 degree of micro-analyzers 905 of linear polarization is respectively:
When wherein angle, the polarizer 3 polarization direction is 0 degree, its mueller matrix is identical with the mueller matrix of 0 degree of micro-analyzer of linear polarization 902,
Incident linearly polarized light is through after desirable Faraday rotator, emergent light electric vector vibration face (supposes that the direction of propagation in face of light is seen by rotating γ angle relative to incident light electric vector vibration face, the angle be rotated counterclockwise just is), then the mueller matrix of desirable Faraday rotator is:
Computing machine 13 changes the size of control voltage partially on described first Faraday rotator 4 and the second Faraday rotator 6 by the second described substrate bias controller 15 simultaneously, and the optically-active angle that described first Faraday rotator 4 and the second Faraday rotator 6 are produced is respectively γ
1with-γ
1after then this laser beam is expanded by described laser beam expander 2, be irradiated on the described polarizer 3, become linear polarization parallel beam, then by the modulation of described first Faraday rotator 4, quarter wave plate 5 and the second Faraday rotator 6, obtain parallel beam, if the Stokes vector of laser beam of laser instrument 1 generation and the Stokes vector of this parallel beam are respectively:
Make angle, the polarizer 3 polarization direction be β, the quick shaft direction angle of quarter wave plate 5 is that α then has:
This parallel beam is through after described testing sample 7 and compensator 8, parallelly be incident on above described micro-polarization analyzer super-pixel 901 array, by described ccd detector super-pixel 1001 array, light intensity signal is detected, computing machine 13 changes the size described compensator 8 loading control voltage partially by described first substrate bias controller 14, the electro-optic delay that described compensator 8 is produced is 2 π, now through four micro-analyzer sub-pixels in described micro-polarization analyzer super-pixel 901: 0 degree of micro-analyzer 902 of linear polarization, 45 degree of micro-analyzers 903 of linear polarization, the Stokes vector of four bundle parallel beams of 90 degree of micro-analyzers of linear polarization 904 and 135 degree of micro-analyzers 905 of linear polarization is set to successively:
with
to be measured +++ +++ on sample 7, the Stokes vector of the site-specific that four bundle parallel beams are corresponding is therewith
then there is lower relation of plane:
Due to four micro-analyzer sub-pixels in described micro-polarization analyzer super-pixel 901: 0 degree of micro-analyzer 902 of linear polarization, 45 degree of micro-analyzers 903 of linear polarization, corresponding four the identical CCD detectors of 90 degree of micro-analyzers of linear polarization, 904,135 degree of micro-analyzers of linear polarization 905 can only detect light intensity signal, can not detecting polarization state signal, therefore the signal that sub-detector detects is the light intensity through micro-analyzer sub-pixel, corresponding to first parameter of stokes parameter, be respectively:
After computing machine 13 treatment and analysis, first three stokes parameter of this micro-polarization analyzer array 9 super-pixel 901 outgoing beam polarization state can be obtained, be respectively:
These four light intensity: I
0, I
45, I
90and I
135, can close and be write as a matrix, be referred to as the light intensity matrix super-pixel 1601 that electro-optic delay is 2 π, can be expressed as:
This electro-optic delay is that light intensity matrix super-pixel 1601 array of 2 π can close and write as a larger matrix, is referred to as the light intensity matrix 16 that electro-optic delay is 2 π, can be expressed as:
When other conditions are constant, computing machine 13 changes the size described compensator 8 loading control voltage partially by described first substrate bias controller 14, the electro-optic delay that described compensator 8 is produced is pi/2, now through four micro-analyzer sub-pixels in described micro-polarization analyzer super-pixel 901: 0 degree of micro-analyzer 902 of linear polarization, the Stokes vector of four bundle parallel beams of 45 degree of micro-analyzers of linear polarization, 903,90 degree of micro-analyzers of linear polarization 904 and 135 degree of micro-analyzers 905 of linear polarization is set to successively:
with
then there is lower relation of plane:
Due to four micro-analyzer sub-pixels in described micro-polarization analyzer super-pixel 901: 0 degree of micro-analyzer 902 of linear polarization, 45 degree of micro-analyzers 903 of linear polarization, corresponding four the identical CCD detectors of 90 degree of micro-analyzers of linear polarization, 904,135 degree of micro-analyzers of linear polarization 905 can only detect light intensity signal, can not detecting polarization state signal, therefore the signal that sub-detector detects is the light intensity through micro-analyzer sub-pixel, corresponding to first parameter of stokes parameter, be respectively:
After computing machine 13 treatment and analysis, first and second and four these three stokes parameters of this micro-polarization analyzer array 9 super-pixel 901 outgoing beam polarization state can be obtained, be respectively:
These four light intensity: I
r0, I
r45, I
r90and I
r135, can close and be write as a matrix, be referred to as the light intensity matrix super-pixel 1701 that electro-optic delay is pi/2, can be expressed as:
Electro-optic delay is that light intensity matrix super-pixel 1701 array of pi/2 can close and write as a larger matrix, is referred to as the light intensity matrix 17 that electro-optic delay is pi/2, can be expressed as:
Through the treatment and analysis of computing machine 13 pairs of electro-optic delays to be the light intensity matrix super-pixel 1601 of 2 π and electro-optic delay be light intensity matrix super-pixel 1701 of pi/2, can show that the Stokes vector of site-specific outgoing beam is:
2. change size Faraday rotator loading control voltage partially, carry out second and third, measure for four times;
Computing machine 13 changes the size of control voltage partially on described first Faraday rotator 4 and the second Faraday rotator 6 by the second described substrate bias controller 15 simultaneously, and the optically-active angle that described first Faraday rotator 4 and the second Faraday rotator 6 are produced is respectively γ
2, γ
3, γ
4with-γ
2,-γ
3,-γ
4, repeat step 1. in work, then in three kinds of situations, after the modulation of described first Faraday rotator 4, quarter wave plate 5 and the second Faraday rotator 6, the Stokes vector of parallel beam and the Stokes vector of site-specific outgoing beam are respectively:
3. according to algorithm, four measurement results are processed;
In four measuring processes, modulated the Stokes vector of rear parallel beam polarization state by the first Faraday rotator 4, quarter wave plate 5, second Faraday rotator 6
with the Stokes vector of outgoing beam polarization state
there is following relation:
Wherein, M is the mueller matrix of testing sample 7, by four measuring processes, and the Stokes vector of parallel beam
and
conjunction is write as a matrix S
in, by the Stokes vector of outgoing beam
and
merge and write as a matrix S
out, that is:
Then have: S
out=MS
in, that is:
Work as S
inin γ
1, γ
2, γ
3and γ
4get four different values, make S
in(as γ when being linear independence invertible matrix
1, γ
2, γ
3and γ
4when getting 40 °, 75 °, 105 ° and 140 ° respectively, S
indeterminant of a matrix is-1.4741, is not equal to zero, is linear independence invertible matrix, and Matrix condition number is 3.3049, and matrix computations is very little to the susceptibility of error, and numerical stability is also very good), can matrix M be obtained, that is:
M=S
out(S
in)
-1
Because micro-polarization analyzer array 9 and ccd detector array 10 are made up of micro-polarization analyzer super-pixel 901 array and ccd detector super-pixel 1001 array respectively, therefore, by computing machine 13 to after four electro-optic delays to be the light intensity matrix 16 of 2 π and four electro-optic delays be light intensity matrix 17 treatment and analysis of pi/2, namely all-optical field Polarization aberration information can be drawn, i.e. the mueller matrix distribution of all-optical field.
Experiment shows, the present invention has that apparatus structure is simple, common optical axis and stablize, measure, high spatial resolution simple without the need to mechanical rotation, algorithm and measuring speed feature faster.
Claims (10)
1. an all-optical field Polarization aberration pick-up unit, this device comprises full polarization state generator, full Polarization device and signal transacting and control system, it is characterized in that;
Described full polarization state generator comprises laser instrument (1), laser beam expander (2), the polarizer (3), first Faraday rotator (4), quarter wave plate (5) and the second Faraday rotator (6), described full Polarization device comprises compensator (8), micro-polarization analyzer array (9) and ccd detector array (10), its position relationship is: along the Laser output direction of this laser instrument (1), described laser beam expander (2) successively, the polarizer (3), first Faraday rotator (4), quarter wave plate (5), compensator (8) described in second Faraday rotator (6), micro-polarization analyzer array (9) and ccd detector array (10),
Described micro-polarization analyzer array (9) is made up of the array of micro-polarization analyzer super-pixel (901), described micro-polarization analyzer super-pixel (901) is by 0 degree of micro-analyzer of linear polarization (902), 45 degree of micro-analyzers of linear polarization (903), 90 degree of micro-analyzers of linear polarization (904) and the 135 degree of micro-analyzer of linear polarization (905) compositions, described ccd detector array (10) is made up of the array of ccd detector super-pixel (1001), described ccd detector array super-pixel (1001) is made up of four identical ccd detector sub-pixels, described micro-polarization analyzer array (9) and described ccd detector array (10) integrate, described micro-polarization analyzer super-pixel (901) array and ccd detector super-pixel (1001) array are aimed at one by one, is formed and aim at super-pixel array (901-1001),
Described signal transacting and control system comprise amplifier (11), simultaneous data-acquisition (12), computing machine (13), the first substrate bias controller (14) and the second substrate bias controller (15);
Described ccd detector array (10) is through described amplifier (11), simultaneous data-acquisition (12) is connected with the input end of described computing machine (13), first substrate bias controller (14) described in output termination of described computing machine (13) and the input end of the second substrate bias controller (15), the control end of the compensator (8) described in output termination of described the first substrate bias controller (14), first Faraday rotator (4) described in output termination of described the second substrate bias controller (15) and the control end of the second Faraday rotator (6).
2. all-optical field Polarization aberration pick-up unit according to claim 1, is characterized in that: the described polarizer (3) is polaroid, polarizing prism or polarization phase mask.
3. all-optical field Polarization aberration pick-up unit according to claim 1, it is characterized in that: described first Faraday rotator (4) is identical with the second Faraday rotator (6), and under the identical on-load voltage condition of described second substrate bias controller (15), produce two size is identical, direction is identical or direction is contrary and continuously adjustable optically-active angle.
4. all-optical field Polarization aberration pick-up unit according to claim 1, it is characterized in that: described quarter wave plate (5) is crystalline material type quarter wave plate, multi-component compound quarter wave plate, reflection rib build quarter wave plate or birefringent film type quarter wave plate, and the scope of its phase-delay quantity is: 89 ° ~ 91 °.
5. all-optical field Polarization aberration pick-up unit according to claim 1, is characterized in that: described compensator (8) is light ball modulator, liquid crystal phase retardation device or lithium columbate crystal.
6. all-optical field Polarization aberration pick-up unit according to claim 1, is characterized in that: described compensator (8) is under the on-load voltage condition of described first substrate bias controller (14), produce continuously adjustabe phase delay optical element or device.
7. all-optical field Polarization aberration pick-up unit according to claim 1, is characterized in that: described simultaneous data-acquisition (12) is the multi-channel high-speed data capture card with A/D translation function.
8. all-optical field Polarization aberration pick-up unit according to claim 1, is characterized in that: described computing machine (13) is provided with the bias voltage control software of data processing, analysis software, the first substrate bias controller (14) and the second substrate bias controller (15).
9. all-optical field Polarization aberration pick-up unit according to claim 1, is characterized in that: described first substrate bias controller (14) and the second substrate bias controller (15) are continuously adjustable D.C. regulated power supplies.
10. utilize the all-optical field Polarization aberration pick-up unit described in claim 1 to the all-optical field Polarization aberration detection method of testing sample (7), it is characterized in that, the method comprises the following steps:
1. described Faraday rotator is loaded and partially control voltage, carry out first time and measure;
Computing machine (13) changes the size of described first Faraday rotator (4) and the second Faraday rotator (6) upper control partially voltage by described the second substrate bias controller (15) simultaneously, and the optically-active angle that described first Faraday rotator (4) and the second Faraday rotator (6) are produced is respectively γ
1with-γ
1after the laser beam that described laser instrument (1) produces is expanded by described laser beam expander (2), be irradiated on the described polarizer (3), become linear polarization parallel beam, then by the modulation of described first Faraday rotator (4), quarter wave plate (5) and the second Faraday rotator (6), the Stokes vector obtaining parallel beam is:
This parallel beam is through after described testing sample (7) and compensator (8), parallelly be incident on above described micro-polarization analyzer super-pixel (901) array, by described ccd detector super-pixel (1001) array, light intensity signal is detected, computing machine (13) changes the upper size loading control voltage partially of described compensator (8) by described first substrate bias controller (14), the electro-optic delay that described compensator (8) is produced is 2 π, now with four micro-analyzer sub-pixels in described micro-polarization analyzer super-pixel (901): 0 degree of micro-analyzer of linear polarization (902), 45 degree of micro-analyzers of linear polarization (903), 90 degree of micro-analyzers of linear polarization (904), the light intensity that four that 135 degree of micro-analyzers of linear polarization (905) are corresponding identical ccd detector sub-pixels detect is followed successively by: I
0, I
45, I
90and I
135, and conjunction is write as a matrix, is referred to as the light intensity matrix super-pixel (1601) that electro-optic delay is 2 π, is expressed as:
Described electro-optic delay is that light intensity matrix super-pixel (1601) array of 2 π closes and write as a larger matrix, is referred to as the light intensity matrix (16) that electro-optic delay is 2 π:
When other conditions are constant, computing machine (13) changes the upper size loading control voltage partially of described compensator (8) by described first substrate bias controller (14), the electro-optic delay that described compensator (8) is produced is pi/2, now with four micro-analyzer sub-pixels in described micro-polarization analyzer super-pixel (901): 0 degree of micro-analyzer of linear polarization (902), 45 degree of micro-analyzers of linear polarization (903), 90 degree of micro-analyzers of linear polarization (904), the light intensity that four that 135 degree of micro-analyzers of linear polarization (905) are corresponding identical ccd detector sub-pixels detect is followed successively by: I
r0, I
r45, I
r90and I
r135, close and write as a matrix, be referred to as the light intensity matrix super-pixel (1701) that electro-optic delay is pi/2:
This electro-optic delay is that light intensity matrix super-pixel (1701) array of pi/2 closes and write as a larger matrix, is referred to as the light intensity matrix (17) that electro-optic delay is pi/2:
Through the treatment and analysis of computing machine (13) to electro-optic delay to be the light intensity matrix super-pixel (1601) of 2 π and electro-optic delay the be light intensity matrix super-pixel (1701) of pi/2, show that the Stokes vector of site-specific outgoing beam is:
2. computing machine (13) changes the size of described first Faraday rotator (4) and the second Faraday rotator (6) upper control partially voltage simultaneously by described the second substrate bias controller (15), and the optically-active angle that described first Faraday rotator (4) and the second Faraday rotator (6) are produced is respectively γ
2, γ
3, γ
4with-γ
2,-γ
3,-γ
4change size Faraday rotator loading control voltage partially, repeat step 1., carry out second and third, measure for four times, after the modulation of described first Faraday rotator (4), quarter wave plate (5) and the second Faraday rotator (6), the Stokes vector of parallel beam and the Stokes vector of site-specific outgoing beam are respectively accordingly:
3. according to algorithm, four measurement results are processed;
By in four measuring processes, by the Stokes vector of parallel beam after the modulation of described first Faraday rotator (4), quarter wave plate (5) and the second Faraday rotator (6)
and
conjunction is write as a matrix S
in, by the Stokes vector of outgoing beam
and
merge and write as a matrix S
out, then have: S
out=MS
in, that is:
Wherein: M is the mueller matrix of testing sample (7), when Sin is linear independence invertible matrix time, matrix M can be obtained, that is:
M=S
out(S
in)
-1
Described matrix M is all-optical field Polarization aberration information.
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CN104931140B (en) * | 2015-06-09 | 2017-01-18 | 西安交通大学 | Parameter optimization method for quaternary measurement type full Stokes parameter polarimeter |
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