The implementation method of source metal lining path in the radio frequency LDMOS device
Technical field
The present invention relates to the implementation method of source metal lining path in a kind of radio frequency LDMOS device.
Background technology
LDMOS is one of device commonly used in the present RF radio frequency technology.Can form low cost based on LDMOS, the RFLDMOS device of high-performance high integration is applied to the HF communication field and other are for the very high application of rate request.In order to improve the response frequency of device, how to improve operating frequency, reduction source lining via resistance is a very difficult problem, be to add the method that pushes away trap by injection, this need carry out the injection of high-energy and high dose, and after high temperature pushes away trap, the charge carrier horizontal proliferation has increased size, and the technology controlling and process precision is difficult to hold, and for the polycrystalline that mixes, does not have metal low though resistance also can reduce.
Summary of the invention
The technical problem to be solved in the present invention provides a kind of implementation method of source metal lining path, and it can realize the source metal lining path of low-resistance.
For solving the problems of the technologies described above, the implementation method of source metal lining path of the present invention after the deposit ground floor insulating barrier, comprises the steps: on the device after forming grid
1) adopt photoetching process to define the position of source lining contact through hole, the ground floor insulating barrier of this position of etching is removed photoresist to grid oxygen afterwards;
2) follow further etching epitaxial loayer to substrate, formation source lining contact through hole;
3) adopt photoetching process to define the position of the contact hole between active area and the ground floor metal afterwards, etching ground floor insulating barrier forms contact hole;
4) depositing metal is with complete filling source lining contact through hole and contact hole;
5) employing CMP technology is removed the metal on the ground floor insulating barrier.
Implementation method of the present invention is carried out the etching that the source serves as a contrast contact through hole by autoregistration, can reduce the width of contact through hole greatly, improves the density of device, increases the gain of device.Owing to as the path between the lining of source, greatly reduced resistance and the heat radiation that helps device between the lining of source with metal.Improved the reliability of device simultaneously, and this method integrated the technology that forms of the contact hole of active area and ground floor metal level, only need a minor metal deposit just to form the interconnect architecture of low impedance path and active area and ground floor metal between the lining of source simultaneously.
Description of drawings
The present invention is further detailed explanation below in conjunction with accompanying drawing and embodiment:
Fig. 1 is the schematic flow sheet of implementation method of the present invention;
Fig. 2 is the structural representation behind the formation grid in an example of the present invention;
Fig. 3 is the structural representation behind the deposit ground floor insulating barrier in an example of the present invention;
Fig. 4 serves as a contrast the position of contact through hole and the structural representation behind etching first insulating barrier for defining the source in an example of the present invention;
Fig. 5 is the structural representation behind the etching formation source lining contact through hole in an example of the present invention;
Fig. 6 is formed with the structural representation behind the contact hole of source region and ground floor metalwork for etching in an example of the present invention;
Fig. 7 is the structural representation behind the depositing metal in an example of the present invention;
Fig. 8 is the structural representation behind the CMP removal excess metal in an example of the present invention.
Embodiment
The implementation method of source metal lining path in the radio frequency LDMOS device of the present invention, it be on the device of (see figure 2) behind the formation grid after the deposit ground floor insulating barrier (see figure 3), comprises the steps (see figure 1):
1) adopt photoetching process to define the position of source lining contact through hole, the ground floor insulating barrier of this position of etching is removed the photoresist (see figure 4) to grid oxygen afterwards.
2) follow further etching epitaxial loayer to substrate, formation source lining contact through hole (see figure 5).The hole of source lining contact through hole is wide to can be 0.2~1 micron.
3) adopt photoetching process to define the position of the contact hole between active area and the ground floor metal afterwards, etching ground floor insulating barrier forms the contact hole (see figure 6).The process of the Kong Kuanwei routine of contact hole can be 0.2~1 micron in the instantiation.In photoetching, photoresist can cover the source lining contact through hole that forms above.Etching forms after the contact hole, removes remaining photoresist.
4) depositing metal is with complete filling source lining contact through hole and contact hole (see figure 7).Optional tungsten of above-mentioned metal or copper adopt the physical sputtering sedimentation to carry out deposit.
5) employing CMP technology is removed the metal (see figure 8) on the ground floor insulating barrier.
Implementation method of the present invention is carried out the etching that the source serves as a contrast contact through hole by autoregistration, can reduce the width of contact through hole greatly, improves the density of device, increases the gain of device.Owing to as the path between the lining of source, greatly reduced resistance and the heat radiation that helps device between the lining of source with metal.Improved the reliability of device simultaneously, and this method integrated the technology that forms of the contact hole of active area and ground floor metal level, only need a minor metal deposit just to form the interconnection structure of low impedance path and active area and ground floor metal between the lining of source simultaneously.