CN102456478A - Magnet and processing method and magnetron sputtering source thereof - Google Patents
Magnet and processing method and magnetron sputtering source thereof Download PDFInfo
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- CN102456478A CN102456478A CN2010105230285A CN201010523028A CN102456478A CN 102456478 A CN102456478 A CN 102456478A CN 2010105230285 A CN2010105230285 A CN 2010105230285A CN 201010523028 A CN201010523028 A CN 201010523028A CN 102456478 A CN102456478 A CN 102456478A
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Abstract
The invention relates to a magnet as well as a processing method and a magnetron sputtering source thereof, wherein the processing method comprises the following steps: carrying out sintering and electroplating after the machine-shaping of magnetic powder to obtain an initial magnet; sleeving a non-magnetic sealing sleeve on the outer surface of the initial magnet; and magnetizing the initial magnet sleeved with the non-magnetic sealing sleeve to obtain the magnet. In the embodiment of the invention, the non-magnetic sealing sleeve is sleeved on the outer surface of the magnet to protect the magnet from corrosion or pollution of air or liquid outdoor, meanwhile, the mechanical strength and shock resistance of the magnet are improved, thereby prolonging the service life of the magnet; and the magnetizing is carried out after the high-temperature processes such as sintering, electroplating and welding, so that the magnet obtained by magnetizing does not need to be subjected to the high-temperature process, so as to keep the stability of the magnet.
Description
Technical field
The present invention relates to a kind of magnet technology of preparing, particularly a kind of magnet and processing method and controlled sputtering source.
Background technology
Magnetron sputtering apparatus is widely used in the manufacturing field of integrated circuit, LCD, thin film solar and LED thereof.In magnetron sputtering apparatus, electronics to the substrate motion, with the ar atmo collision, makes ar atmo ionization obtain the plasma and the secondary electron of positively charged argon ion in flying to the process of substrate under electric field action; Wherein, plasma obtains momentum in the process of the target direction accelerated motion with negative potential, and the bombardment target makes target generation sputter, and to generate sputtering particle, sputtering particle deposits on the substrate and forms and the essentially identical film of target character.
Magnetron sputtering apparatus comprises controlled sputtering source; Controlled sputtering source comprises at least one block of magnet; Near the installation controlled sputtering source target back side; Controlled sputtering source can also be connected with power source, and to drive the magnetron sputtering source movement, the magnetic field energy that controlled sputtering source produces prolongs the movement locus of secondary electron.In existing magnetron sputtering apparatus, usually need controlled sputtering source be placed in water or other liquid, cause the magnet in the controlled sputtering source to be subject to the corrosion of water or other liquid, thereby shorten the useful life of magnet.
Summary of the invention
The purpose of this invention is to provide a kind of magnet and processing method thereof and controlled sputtering source, be used for solving short problem of prior art magnet corrosion-vulnerable, useful life.
For addressing the above problem, the invention provides a kind of processing method of magnet, it comprises:
With carrying out sintering and electroplating processes after the magnetic machine-shaping, to obtain initial magnet;
Be nested with nonmagnetic airtight overcoat at said initial magnet outer surface;
Said initial magnet to being nested with nonmagnetic airtight overcoat magnetizes to obtain magnet.
Wherein, said airtight overcoat is made up of nickel, zinc, copper, aluminium or nonmagnetic stainless steel.
Wherein, saidly be nested with nonmagnetic airtight overcoat at initial magnet outer surface and comprise:
Make through welding manner that two included tubbiness assemblies of said airtight overcoat are airtight to be nested with said initial magnet, said two tubbiness assemblies dock to form confined space in opposite directions.
The present invention also provides a kind of magnet, and wherein, said magnet outer surface is nested with the airtight overcoat that one deck is made up of namagnetic substance.
Wherein, said namagnetic substance is nickel, zinc, copper, aluminium or nonmagnetic stainless steel.
Wherein, said airtight overcoat comprises two tubbiness assemblies, and said two tubbiness assemblies dock to form airtight overcoat through welding manner in opposite directions.
Present embodiment also provides a kind of controlled sputtering source, wherein, comprises strutting piece and any one above-mentioned magnet, and said strutting piece is used for fixing said magnet.
Wherein, said strutting piece is circle, annular or ellipse, and said magnet is fixed between two said strutting pieces.
Wherein, said strutting piece is circle, annular or ellipse, and said magnet is fixed on the said strutting piece.
The present invention has following beneficial effect:
Magnet processing method provided by the invention; Through with the airtight nonmagnetic airtight overcoat of one deck that is nested with of the outer surface of magnet, avoid the gas in the external world or the corrosion or the pollution of liquid with protection magnet, improve the mechanical strength and the impact resistance of magnet simultaneously; Thereby prolonged the useful life of magnet; And the operation that will magnetize is carried out after being set in high-temperature process such as accomplishing sintering, plating and welding, and the magnet that making magnetizes obtains does not need to experience high-temperature process again, thereby the magnetic of holding magnet is stable.
Magnet provided by the invention; The outer surface of magnet is nested with the nonmagnetic airtight overcoat of one deck; Avoid the gas in the external world or the corrosion or the pollution of liquid with protection magnet, and can improve the mechanical strength and the impact resistance of magnet, thereby prolonged the useful life of magnet; Through the airtight outer fixture that puts of magnet, can magnet be fixedly installed on the different processes equipment.
In addition; Controlled sputtering source provided by the invention; Through magnet being nested with in airtight overcoat; Can protect magnet to avoid the extraneous gas or the corrosion and the pollution of liquid, and can improve the mechanical strength and the impact resistance of magnet, thereby still have in water or the complicated gaseous environment long useful life even controlled sputtering source is installed in.In addition; Controlled sputtering source provided by the invention is fixedly installed to magnet on the strutting piece through the airtight outer fixture that puts of magnet; Thereby can as required a plurality of magnet be fixed together according to certain ordering; Make controlled sputtering source that the magnetic field of multiple different magnetic field intensity can be provided, but also can controlled sputtering source be fixedly installed on the different processes equipment, thus the scope of application of expansion controlled sputtering source.
Description of drawings
Fig. 1 is the flow chart of the processing method embodiment of magnet provided by the invention;
Fig. 2 is a magnet arrangement sketch map among the processing method embodiment of magnet provided by the invention;
Fig. 3 is the structural representation of tubbiness assembly among the processing method embodiment of magnet provided by the invention;
Fig. 4 is the structural representation of magnet embodiment provided by the invention;
Fig. 5 is first structural representation of fixture among the magnet embodiment provided by the invention;
Fig. 6 is second structural representation of fixture among the magnet embodiment provided by the invention;
Fig. 7 is the structural representation of controlled sputtering source embodiment provided by the invention.
Embodiment
Through accompanying drawing and embodiment, technical scheme of the present invention is done detailed description further below.
Fig. 1 is the flow chart of the processing method embodiment of magnet provided by the invention.As shown in Figure 1, the processing method of present embodiment magnet comprises following concrete steps:
Above-mentioned initial magnet obtains through magnetic is carried out processing and forming, specifically comprises: at first, make magnetic moulding according to reservation shape; Then, the magnetic after the moulding is carried out sintering processes in the environment of 1000 deg.c and obtain fine and close firm magnetic DB; At last, more coarse easily by the problem of ambient atmos or liquid corrosion in order to prevent this magnetic DB because of its surface ratio, be the electroplating film of zinc, nickel or analog in electroplating surface one deck material of this magnetic DB, thereby obtain ganoid initial magnet.In the present embodiment, the material of above-mentioned magnetic for example can adopt materials such as NdFeB.
The shape of initial magnet can be cylindrical, cylindrical shape, cube or other polyhedral shape.Fig. 2 is a magnet arrangement sketch map among the processing method embodiment of magnet provided by the invention.As shown in Figure 2; In the present embodiment; The shape of initial magnet 30 is that example is introduced technical scheme with cylindrical; Outer surface at initial magnet 30 is nested with nonmagnetic airtight overcoat then, and airtight overcoat seals initial magnet 30, and airtight overcoat can be combined closely to improve the mechanical strength of magnet with initial magnet 30.Airtight overcoat can be to be prepared from nonmagnetic stainless steel; For example be stainless steel 304, stainless steel 316 etc.; Also can be nonmagnetic metal such as nickel, zinc, copper or aluminium, the shape of airtight overcoat be suitable with the shape of initial magnet 30, with the initial magnet 30 of ability compact package.Fig. 3 is the structural representation of tubbiness assembly among the processing method embodiment of magnet provided by the invention.As shown in Figure 3; Airtight overcoat is that two the one airtight nonmagnetic stainless steel tubbiness assemblies 301 of end are formed; Two tubbiness assemblies 301 can dock to form confined space in opposite directions, and these two stainless steel tubbiness assemblies 301 are docked to be nested with on initial magnet 30 in opposite directions, carry out soldering then; These two stainless steel tubbiness assemblies 301 are nested with at initial magnet 30 outer surfaces relatively, form the airtight overcoat of the initial magnet 30 of parcel.
With the initial magnet 30 that the is equipped with non magnetic airtight overcoat processing of magnetizing, non magnetic airtight overcoat does not influence the processing of magnetizing of the initial magnet 30 of its enclosed package, to obtain being equipped with the magnet with stabilized magnetic of non magnetic airtight overcoat.
In the present embodiment; Through with the airtight nonmagnetic airtight overcoat of one deck that is nested with of the outer surface of magnet, avoid the gas in the external world or the corrosion or the pollution of liquid with protection magnet, improve the mechanical strength and the impact resistance of magnet simultaneously; Thereby prolonged the useful life of magnet; And the operation that will magnetize is carried out after being set in high-temperature process such as accomplishing sintering, plating and welding, and the magnet that making magnetizes obtains does not need to experience high-temperature process again, thereby the magnetic of holding magnet is stable.
Fig. 4 is the structural representation of magnet embodiment provided by the invention.As shown in Figure 4; In the present embodiment; Enclosed package has the nonmagnetic airtight overcoat of one deck on the magnet 40, and airtight overcoat can be welded by two tubbiness assemblies 301 as shown in Figure 3, and tubbiness assembly 301 constitutes for namagnetic substance; Namagnetic substance can be stainless steel 304, stainless steel 316; Also can be nonmagnetic metal such as nickel, zinc, copper or aluminium, an end that seals at tubbiness assembly 301 be provided with a fixture 302, and structure, shape and the length of fixture 302 can be set according to the purposes of magnet.
Fig. 5 is first structural representation of fixture among the magnet embodiment provided by the invention; As shown in Figure 5, the fixture 302 on the tubbiness assembly 301 is set to the structure of screw, easily magnet is fixed on the strutting piece of corresponding nut; Also can easily magnet be disassembled from strutting piece; Strutting piece is used for fixing at least one block of magnet of support, and at least one block of magnet on the support part is arranged according to certain arrangement mode, and at least one block of magnet on the strutting piece also can be used as a mass motion.Fig. 6 is second structural representation of fixture among the magnet embodiment provided by the invention; As shown in Figure 6; Fixture 302 on the tubbiness assembly 301 is by 2 triangular prisms; The relevant position of corresponding strutting piece then is provided with the prismatic groove of recessed support surface, and to hold the fixture 302 on the tubbiness assembly 301, the structure of fixture 302 shown in Figure 6 had both made things convenient for magnet 40 to insert strutting piece or extracted from strutting piece; And magnet more firmly is installed on the strutting piece, improve the stability of controlled sputtering source.
In the present embodiment; The outer surface of magnet is nested with the nonmagnetic airtight overcoat of one deck; Avoid the gas in the external world or the corrosion or the pollution of liquid with protection magnet, and can improve the mechanical strength and the impact resistance of magnet, thereby prolonged the useful life of magnet; Through the airtight outer fixture that puts of magnet, can magnet be fixedly installed on the different processes equipment.
Fig. 7 is the structural representation of controlled sputtering source embodiment provided by the invention.As shown in Figure 7, comprise magnet 40 and strutting piece 50 at the present embodiment controlled sputtering source, wherein; Magnet 40 can adopt columniform magnet 40 as shown in Figure 4; Controlled sputtering source comprises several magnet 40, and the two ends of the Seal Kit of magnet 40 are fixed between two strutting pieces 50 through fixture 302 respectively, and strutting piece 50 can be annular, circle, ellipse or heart etc.; Two strutting pieces 50 in the present embodiment are annular, fixing 4 magnet 40 between two strutting pieces 50.In practical application, the shape of magnet 40 and magnetic field intensity etc. can be set as required, and for the fixture 302 at the two ends of magnet 40, wherein the fixture 302 of an end adopts the structure of Fig. 5, and the fixture 302 of an other end adopts the structure of Fig. 6.Through fixture as shown in Figure 5 302 with on the magnet precession strutting piece 50 to be fixedly connected with strutting piece 50; This strutting piece 50 is provided with recessed its surperficial nut; Be inserted on another strutting piece 50 that has corresponding prismatic groove through fixture as shown in Figure 6 302; Two strutting pieces 50 are clamped to several magnet between the two, and magnet more stably is fixed on the strutting piece 50, improve the stability and the mechanical strength of controlled sputtering source; Make things convenient for magnet 40 to insert strutting pieces 50 again or extract from strutting piece 50, very easy to use.
In practical application; Also can only fix each magnet 40 with a strutting piece 50; This moment, magnet 40 was fixed on the strutting piece 50 through the screw that is arranged on the fixture 302; Also can be fixed on the strutting piece 50, avoid waiting the high-temperature operation mode that magnet 40 is fixed to 50 last times of strutting piece and cause the magnetic of magnet 40 impaired through welding through modes such as clamping, grafting.
In the present embodiment controlled sputtering source; Through magnet being nested with in airtight overcoat; Can protect magnet to avoid the gas in the external world or the corrosion and the pollution of liquid; And can improve the mechanical strength and the impact resistance of magnet, thereby still have in water or the complicated gaseous environment long useful life even controlled sputtering source is installed in.In addition; Controlled sputtering source provided by the invention is fixedly installed to magnet on the strutting piece through the airtight outer fixture that puts of magnet; Thereby can as required a plurality of magnet be fixed together according to certain ordering; Make controlled sputtering source that the magnetic field of multiple different magnetic field intensity can be provided, but also can controlled sputtering source be fixedly installed on the different processes equipment, thus the scope of application of expansion controlled sputtering source.
It is understandable that above execution mode only is the illustrative embodiments that adopts for principle of the present invention is described, yet the present invention is not limited thereto.For the one of ordinary skilled in the art, under the situation that does not break away from spirit of the present invention and essence, can make various modification and improvement, these modification also are regarded as protection scope of the present invention with improving.
Claims (9)
1. the processing method of a magnet is characterized in that, comprising:
With carrying out sintering and electroplating processes after the magnetic machine-shaping, to obtain initial magnet;
Be nested with nonmagnetic airtight overcoat at said initial magnet outer surface;
Said initial magnet to being nested with nonmagnetic airtight overcoat magnetizes to obtain magnet.
2. the processing method of magnet according to claim 1 is characterized in that, said airtight overcoat is made up of nickel, zinc, copper, aluminium or nonmagnetic stainless steel.
3. the processing method of magnet according to claim 1 is characterized in that, saidly is nested with nonmagnetic airtight overcoat at initial magnet outer surface and comprises:
Make through welding manner that two included tubbiness assemblies of said airtight overcoat are airtight to be nested with said initial magnet, said two tubbiness assemblies dock to form confined space in opposite directions.
4. a magnet is characterized in that, said magnet outer surface is nested with the airtight overcoat that one deck is made up of namagnetic substance.
5. magnet according to claim 4 is characterized in that, said namagnetic substance is nickel, zinc, copper, aluminium or nonmagnetic stainless steel.
6. magnet according to claim 4 is characterized in that, said airtight overcoat comprises two tubbiness assemblies, and said two tubbiness assemblies dock to form airtight overcoat through welding manner in opposite directions.
7. a controlled sputtering source is characterized in that, comprises any described magnet of strutting piece and claim 4-6, and said strutting piece is used for fixing said magnet.
8. controlled sputtering source according to claim 7 is characterized in that, said strutting piece is circle, annular or ellipse, and said magnet is fixed between two said strutting pieces.
9. controlled sputtering source according to claim 7 is characterized in that, said strutting piece is circle, annular or ellipse, and said magnet is fixed on the said strutting piece.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010105230285A CN102456478A (en) | 2010-10-22 | 2010-10-22 | Magnet and processing method and magnetron sputtering source thereof |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010105230285A CN102456478A (en) | 2010-10-22 | 2010-10-22 | Magnet and processing method and magnetron sputtering source thereof |
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| CN102456478A true CN102456478A (en) | 2012-05-16 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN2010105230285A Pending CN102456478A (en) | 2010-10-22 | 2010-10-22 | Magnet and processing method and magnetron sputtering source thereof |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110220048A (en) * | 2019-04-18 | 2019-09-10 | 厦门阿匹斯智能制造***有限公司 | A kind of adjustable magnet steel of magnetic field angle |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1043034A (en) * | 1988-10-17 | 1990-06-13 | 菲利浦光灯制造公司 | The manufacture method of permanent magnet |
| CN1062232A (en) * | 1990-12-04 | 1992-06-24 | 北京科技大学 | Produce the method for rare-earth iron-boron permanent magnetic material with the rare-earth iron-boron waste material |
| CN2159398Y (en) * | 1993-04-13 | 1994-03-23 | 昆明航天科发镀膜公司 | coaxial magnetron sputtering target |
| CN2172516Y (en) * | 1993-06-26 | 1994-07-20 | 张千 | Multipurpose magnetizer |
| CN2389150Y (en) * | 1999-09-20 | 2000-07-26 | 邹宝明 | Magnetic force ball |
| CN1416770A (en) * | 2001-11-09 | 2003-05-14 | 颜陶 | Magnet for temperature limiter of electric cooker and its production process |
| CN1799111A (en) * | 2003-06-27 | 2006-07-05 | Tdk株式会社 | R-T-B based permanent magnet |
| CN1944707A (en) * | 2006-09-27 | 2007-04-11 | 中国科学院上海光学精密机械研究所 | Permanent magnet gun target device of magnetron sputtering coating machine |
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2010
- 2010-10-22 CN CN2010105230285A patent/CN102456478A/en active Pending
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1043034A (en) * | 1988-10-17 | 1990-06-13 | 菲利浦光灯制造公司 | The manufacture method of permanent magnet |
| CN1062232A (en) * | 1990-12-04 | 1992-06-24 | 北京科技大学 | Produce the method for rare-earth iron-boron permanent magnetic material with the rare-earth iron-boron waste material |
| CN2159398Y (en) * | 1993-04-13 | 1994-03-23 | 昆明航天科发镀膜公司 | coaxial magnetron sputtering target |
| CN2172516Y (en) * | 1993-06-26 | 1994-07-20 | 张千 | Multipurpose magnetizer |
| CN2389150Y (en) * | 1999-09-20 | 2000-07-26 | 邹宝明 | Magnetic force ball |
| CN1416770A (en) * | 2001-11-09 | 2003-05-14 | 颜陶 | Magnet for temperature limiter of electric cooker and its production process |
| CN1799111A (en) * | 2003-06-27 | 2006-07-05 | Tdk株式会社 | R-T-B based permanent magnet |
| CN1944707A (en) * | 2006-09-27 | 2007-04-11 | 中国科学院上海光学精密机械研究所 | Permanent magnet gun target device of magnetron sputtering coating machine |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110220048A (en) * | 2019-04-18 | 2019-09-10 | 厦门阿匹斯智能制造***有限公司 | A kind of adjustable magnet steel of magnetic field angle |
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Application publication date: 20120516 |