CN102433551A - Reaction chamber spraying system - Google Patents
Reaction chamber spraying system Download PDFInfo
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- CN102433551A CN102433551A CN2011104606731A CN201110460673A CN102433551A CN 102433551 A CN102433551 A CN 102433551A CN 2011104606731 A CN2011104606731 A CN 2011104606731A CN 201110460673 A CN201110460673 A CN 201110460673A CN 102433551 A CN102433551 A CN 102433551A
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- reaction chamber
- guide cylinder
- sprinkling system
- spray equipment
- sealing
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Abstract
The invention relates to a reaction chamber spraying system and particularly relates to a moveable spraying system of a low-pressure chemical vapor deposition reaction chamber. In the system, a set of mechanism which is capable of moving a spraying device up and down is fixed on the cavity cover of the reaction chamber; and a water inlet pipeline and a gas pipeline are connected with the spraying device through the mechanism. The structure of the system is relatively simple, thus the movement of the spraying device is realized, the quality of a coated film can be controlled through regulating the process distance, and the stability of production is improved; and simultaneously, a process gas is safely and reliably fed into the spraying system, thereby solving the problem that the process gas is difficulty introduced into the spraying system from the outside, improving the safety of the production and being easy to maintain.
Description
Technical field
The present invention relates to a kind of reaction chamber sprinkling system, relate to a kind of packaged type sprinkling system of low-pressure chemical vapor deposition reaction chamber specifically.
Background technology
The future market development of photovoltaic application, especially for the application of the photovoltaic power plant that links to each other with electrical network, key depends on the potentiality that reduce the manufacture of solar cells cost.Thin-film solar cells production process energy consumption is low, possesses the potentiality that reduce starting material and manufacturing cost significantly; Simultaneously, thin-film solar cells still can be generated electricity under low light condition.Therefore, existing market increases the demand of thin-film solar cells just gradually, and the technology of manufacturing thin-film solar cells more becomes hot research in recent years.
ZnO is a kind of N type direct band-gap semicondictor material, and energy gap Eg is 3.37eV under the room temperature.Because its abundant raw materials and nontoxic; Having high electricity leads and high permeability; And stable performance in the H plasma environment, therefore, in area of solar cell; ZnO can further improve the efficient and the stability of Si thin-film solar cells as transparent conductive oxide film, accelerates industrialization process.Seem particularly important as electrode and back reflector before the textured ZnO membrane of light trapping structure.
The growth method of ZnO has a lot; Comprise pulsed laser deposition, low pressure metal organic chemical vapor deposition, radio frequency/intermediate frequency/d.c. sputtering, electron beam and thermal response evaporation, plasma activated chemical vapour deposition, spraying thermolysis and sol-gel method etc., wherein comparatively sophisticated is low-pressure chemical vapor deposition process.
In the low-pressure chemical vapor deposition process process, pre-reaction material B
2H
6, H
2Or Ar, DEZ (g), H
2O (g) or C
2H
5OH, O
2Deng mixed gas (DEZ (g) is the steam of zinc ethyl); Shower plate through under the lid of process cavity chamber evenly divides gas; Mixed gas is placed on the glass substrate on the hot-plate, DEZ under the motivating force of temperature (g) and H under spraying to shower plate uniformly
2O (g) or C
2H
5The OH reaction generates ZnO film, B
2H
6Be doping agent, this is a typical gas-phase chemical reaction:
DEZ（g）+H
2O(g)?=?ZnO(s)+C
2H
6
B
2H
6+H
2O?=?B
2O
3（s）+?H
2
In this reaction process; Except temperature, pressure and the flow that reacts has a strong impact on the performance of rete; After process gas evenly sprays from spray header; The glass surface that need be diffused on the hot-plate just can be implemented in this process of growing film on glass, and this distance is referred to as technology distance, i.e. distance the upper surface from the shower plate surface to glass.The size of this distance influences the time that reactant gases is diffused into the hot-plate upper glass, influences the homogeneity of whole processing chamber gas field distribution; The former will influence the sedimentation rate of reaction, and the latter will influence the homogeneity of the film that is generated, and be a very important process adjustments parameter.
The equipment that common equipment supplier provides, sprinkling system is fixed on the chamber and covers, and the technology distance can't be regulated.In addition, the process gas of this equipment normally gets into the chamber lid through cavity wall and arrives sprinkling system, transfer passage more complicated again.Being connected between the lid of chamber sidewall and chamber be to accomplish sealing through O-ring seals of weight extruding of chamber lid.In the maintenance process of uncapping in later stage, be easy to gas leakage here, some contains severe toxicity in the process gas, and is abnormally dangerous, can't detect if drain in the cavity, and process adjustments is produced very big influence; If leak the personnel safety outside the chamber, understand the serious threat operator, the gas safety protector of board detects that reveal behind the gas can auto simultaneously, and what influence was produced normally carries out.
There is two large problems in existing technology: 1. the process gas sprinkling system of volume production equipment is fixed on the chamber and covers, and the technology distance can't be regulated.The adjustable testing installation complex structure of some technology distances can't reach the requirement of volume production machine; 2. process gas gets into the transfer passage more complicated of sprinkling system, and stability and poor stability need a safe and reliable process gas transfer passage in order to keep the safety in production.
Summary of the invention
The present invention provides a kind of reaction chamber sprinkling system, and its structure is simple relatively, has realized removableization of spray equipment, can control coating quality through regulating the technology distance, has improved the stability of producing; Simultaneously with process gas safe and reliable send into sprinkling system, solved process gas is linked into sprinkling system from the outside a difficult problem, improved the security of producing, and be easy to safeguard.
For solving the problems of the technologies described above, technical scheme of the present invention is following:
A kind of reaction chamber sprinkling system covers in the reaction chamber chamber and to be fixed with the mechanism that a cover can make spray equipment move up and down, and suction culvert and gas piping pass through this mechanism and be communicated with spray equipment.
The said mechanism that spray equipment is moved up and down comprises the support that is fixed on the reaction chamber chamber and covers, the guide cylinder that is fixedly connected with spray equipment and regulates the device that guide cylinder moves up and down.
The device that said adjusting guide cylinder moves up and down comprises the handwheel of being located at support top and by the screw mandrel of handwheel driven rotary, and screw mandrel and guide cylinder are put the beams in place and screwed and be connected through screwing nut.Because guide cylinder is fixedly connected with spray equipment, when work, rotate handwheel, rotate the drive spray equipment through screw mandrel and move up and down.
Said reaction chamber chamber covers and also is fixed with the orienting sleeve that guide cylinder is positioned and leads.Can control in vertical direction guide cylinder, in moving up and down, squint in order to avoid make guide cylinder drive spray equipment.
For the handiness that guarantees to lead and the exactness of sealing, cooperate for sealing-gap between said orienting sleeve and the guide cylinder.
It is that sealing groove is set on orienting sleeve that said sealing-gap cooperates, and is provided with the sealing-ring that is installed in the sealing groove between orienting sleeve and the guide cylinder.
The inwall of said rack side plate is provided with groove, and the guide fixed block with groove fit is housed on the guide cylinder, and this guide fixed block plays guiding and horizontal fixed effect, drives the guide cylinder rotation when preventing rotational lead screw.
The outer wall of said rack side plate is provided with self-locking handle, passes rack side plate and is connected with guide fixed block, and the groove that promptly passes on the rack side plate is connected with guide fixed block, can play the effect of fixed guide tube.When spray equipment is adjusted to the position that needs, rotates self-locking handle and pin guide cylinder, fixedly spray equipment; This moment, the main weight of spray equipment was born by self-locking handle, and screw mandrel is no longer born the weight of spray equipment, makes the bearing accuracy of total system more accurate, and structure is more reasonable, moves more steady.
Spray equipment is made up of gas distributor and mixed gas spray chamber etc., mixes gas blowout and drenches the distance abbreviation technology distance between chamber lower surface and the heating system upper surface.Move up and down through above-mentioned spray equipment integral body, be adjusted to suitable technology distance, with the quality of guaranteeing plated film and the stability of production.
Said guide cylinder is connected with the gas distributor on spray equipment top, and the gas distributor top is provided with water route interface and air-path interface, and guide cylinder top has the through hole that supplies suction culvert and gas piping to pass; Suction culvert and gas piping can adopt the flexible pipe of flexible materials, and suction culvert and gas piping are connected with water route interface and air-path interface respectively through above-mentioned through hole, and get into mixed gas spray chamber through gas distributor.
The connection portion of said guide cylinder and gas distributor is provided with sealing-ring, is used for completely cutting off process gas in outside atmosphere and the chamber.Like this, technology gas circuit and water route and mixed gas spray chamber form a whole, and are regulating the technology distance and are uncapping when safeguarding, can not be affected, and have solved process gas is linked into showerhead system from the outside a difficult problem.
Reaction chamber sprinkling system provided by the invention through the mechanism that a cover can make spray equipment move up and down is set, can be controlled coating quality through regulating the technology distance, has improved the stability of producing; Simultaneously through introducing water route and gas circuit from guide cylinder inside; With process gas safe and reliable send into sprinkling system, solved process gas is linked into showerhead system from the outside a difficult problem, improved the security of producing; The whole system structure is simple relatively, and is easy to safeguard.
Description of drawings
Fig. 1 is the whole cross-sectional view of reaction chamber of the present invention and removable sprinkling system;
Fig. 2 is a removable sprinkling system external structure synoptic diagram of the present invention;
Fig. 3 is the local structure for amplifying synoptic diagram of removable sprinkling system of the present invention.
Embodiment
Below in conjunction with accompanying drawing and embodiment the present invention is done further detailed explanation.
Embodiment 1
A kind of reaction chamber sprinkling system, as shown in Figure 1, on reaction chamber chamber lid 7, be fixed with the mechanism that a cover can make spray equipment move up and down, suction culvert 19 is communicated with spray equipment through this mechanism with gas piping 20.
As shown in Figure 2, the mechanism that spray equipment is moved up and down comprises support 4, the guide cylinder 2 that is fixedly connected with spray equipment that is fixed on the reaction chamber chamber lid 7 and regulates the device that guide cylinder 2 moves up and down.
Like Fig. 1, shown in 3, regulate that device that guide cylinder 2 moves up and down comprises the handwheel 14 of being located at support 4 tops and by the screw mandrel 15 of handwheel 14 driven rotary, screw mandrel 15 and guide cylinder 2 upper beams 13 screw and are connected through screwing nut 3.Because guide cylinder 2 is fixedly connected with spray equipment, when work, rotate handwheel 14, rotate the drive spray equipment through screw mandrel 15 and move up and down.
Also be fixed with the orienting sleeve 6 that guide cylinder 2 is positioned and leads on the reaction chamber chamber lid 7.Can control in vertical direction guide cylinder 2, in the process of moving up and down, squint in order to avoid make guide cylinder 2 drive spray equipment.
For the handiness that guarantees to lead and the exactness of sealing, cooperate for sealing-gap between orienting sleeve 6 and the guide cylinder 2.
It is on orienting sleeve 6, sealing groove to be set that sealing-gap cooperates, and is provided with the sealing-ring 12 that is installed in the sealing groove between orienting sleeve 6 and the guide cylinder 2.
The inwall of support 4 side plates is provided with groove, and the guide fixed block 5 with groove fit is housed on the guide cylinder 2, and this guide fixed block 5 plays guiding and horizontal fixed effect, drives the guide cylinder rotation when preventing rotational lead screw 15.
Like Fig. 1, shown in 3, the outer wall of support 4 side plates is provided with self-locking handle 16, passes support 4 side plates and is connected with guide fixed block 5, can play the effect of fixed guide tube 2.When spray equipment is adjusted to the position that needs, rotates self-locking handle 16 and pin guide cylinder 2, fixedly spray equipment; This moment, the main weight of spray equipment was born by self-locking handle 16, and screw mandrel 15 is no longer born the weight of spray equipment, and the structure that makes total system more rationally, operation is more steady.
Spray equipment is made up of gas distributor 10 and mixed gas spray chamber 8 grades, and the distance of mixing between gas spray chamber 8 surfaces and heating system 18 upper surfaces is called for short the technology distance, and heating system 18 upper surfaces can be placed glass to be coated 17.Move up and down through above-mentioned spray equipment integral body, be adjusted to suitable technology distance, with the quality of guaranteeing plated film and the stability of production.
Guide cylinder 2 is connected with the gas distributor 10 on spray equipment top, and gas distributor 10 tops are provided with water route interface and air-path interface 1, and guide cylinder top has the through hole 21 that supplies suction culvert 19 and gas piping 20 to pass, and is as shown in Figure 2; Suction culvert 19 adopts the flexible materials flexible pipe with gas piping 20, and with drag chain 9 regular and protection flexible pipes.Suction culvert 19 is connected with water route interface and air-path interface 1 respectively through above-mentioned through hole 21 with gas piping 20, and gets into mixed gas spray chamber 8 through gas distributor 10.
Guide cylinder 2 is provided with sealing-ring 11 with the connection portion of gas distributor 10, is used for completely cutting off process gas in outside atmosphere and the chamber.Like this, technology gas circuit and water route and mixed gas spray chamber 8 form a whole, and are regulating the technology distance and are uncapping when safeguarding, can not be affected, and have solved process gas is linked into showerhead system from the outside a difficult problem.
Claims (10)
1. reaction chamber sprinkling system is characterized in that covering in the reaction chamber chamber and is fixed with the mechanism that a cover can make spray equipment move up and down, and suction culvert and gas piping pass through this mechanism and be communicated with spray equipment.
2. reaction chamber sprinkling system according to claim 1 is characterized in that the said mechanism that spray equipment is moved up and down comprises the support that is fixed on the reaction chamber chamber and covers, the guide cylinder that is fixedly connected with spray equipment and regulates the device that guide cylinder moves up and down.
3. reaction chamber sprinkling system according to claim 2 is characterized in that device that said adjusting guide cylinder moves up and down comprises the handwheel of being located at support top and by the screw mandrel of handwheel driven rotary, and screw mandrel and guide cylinder are put the beams in place and screwed and be connected through screwing nut.
4. according to claim 2 or 3 described reaction chamber sprinkling systems, it is characterized in that said reaction chamber chamber covers also to be fixed with the orienting sleeve that guide cylinder is positioned and leads.
5. reaction chamber sprinkling system according to claim 4 is characterized in that cooperating for sealing-gap between said orienting sleeve and the guide cylinder.
6. reaction chamber sprinkling system according to claim 5 is characterized in that it is that sealing groove is set that said sealing-gap cooperates, and is provided with the sealing-ring that is installed in the sealing groove between orienting sleeve and the guide cylinder on orienting sleeve.
7. reaction chamber sprinkling system according to claim 2 is characterized in that the inwall of said rack side plate is provided with groove, and the guide fixed block with groove fit is housed on the guide cylinder.
8. reaction chamber sprinkling system according to claim 7 is characterized in that the outer wall of said rack side plate is provided with self-locking handle, passes rack side plate and is connected with guide fixed block.
9. reaction chamber sprinkling system according to claim 2; It is characterized in that said guide cylinder is connected with the gas distributor on spray equipment top; The gas distributor top is provided with water route interface and air-path interface, and guide cylinder top has the through hole that supplies suction culvert and gas piping to pass; Suction culvert and gas piping are connected with water route interface and air-path interface respectively through this through hole.
10. reaction chamber sprinkling system according to claim 9 is characterized in that the connection portion of said guide cylinder and gas distributor is provided with sealing-ring.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011104606731A CN102433551A (en) | 2011-12-31 | 2011-12-31 | Reaction chamber spraying system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011104606731A CN102433551A (en) | 2011-12-31 | 2011-12-31 | Reaction chamber spraying system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN102433551A true CN102433551A (en) | 2012-05-02 |
Family
ID=45981893
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2011104606731A Pending CN102433551A (en) | 2011-12-31 | 2011-12-31 | Reaction chamber spraying system |
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|---|---|
| CN (1) | CN102433551A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103305809A (en) * | 2013-06-26 | 2013-09-18 | 中国科学院苏州纳米技术与纳米仿生研究所 | Spraying head capable of continuously adjusting temperature |
| CN111778552A (en) * | 2020-08-03 | 2020-10-16 | 中国科学院长春光学精密机械与物理研究所 | MOCVD (Metal organic chemical vapor deposition) combined spray header and MOCVD equipment |
| CN115418626A (en) * | 2022-08-22 | 2022-12-02 | 江苏微导纳米科技股份有限公司 | Film coating equipment |
Citations (5)
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|---|---|---|---|---|
| WO2002007193A1 (en) * | 2000-06-29 | 2002-01-24 | Motorola, Inc. | Method for heating a semiconductor wafer in a process chamber, and process chamber |
| KR20020037131A (en) * | 2000-11-13 | 2002-05-18 | 윤종용 | Shower Head of Chemical Vapor Deposition Apparatus having Height Adjust Ability |
| CN1669796A (en) * | 2004-02-23 | 2005-09-21 | 周星工程股份有限公司 | Device for manufacturing display basic board and blow head combination assemblaging therein |
| CN101098981A (en) * | 2005-05-10 | 2008-01-02 | 株式会社爱发科 | Winding plasma cvd apparatus |
| CN202440548U (en) * | 2011-12-31 | 2012-09-19 | 汉能科技有限公司 | Reaction chamber spraying system |
-
2011
- 2011-12-31 CN CN2011104606731A patent/CN102433551A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2002007193A1 (en) * | 2000-06-29 | 2002-01-24 | Motorola, Inc. | Method for heating a semiconductor wafer in a process chamber, and process chamber |
| KR20020037131A (en) * | 2000-11-13 | 2002-05-18 | 윤종용 | Shower Head of Chemical Vapor Deposition Apparatus having Height Adjust Ability |
| CN1669796A (en) * | 2004-02-23 | 2005-09-21 | 周星工程股份有限公司 | Device for manufacturing display basic board and blow head combination assemblaging therein |
| CN101098981A (en) * | 2005-05-10 | 2008-01-02 | 株式会社爱发科 | Winding plasma cvd apparatus |
| CN202440548U (en) * | 2011-12-31 | 2012-09-19 | 汉能科技有限公司 | Reaction chamber spraying system |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103305809A (en) * | 2013-06-26 | 2013-09-18 | 中国科学院苏州纳米技术与纳米仿生研究所 | Spraying head capable of continuously adjusting temperature |
| CN103305809B (en) * | 2013-06-26 | 2016-08-10 | 中国科学院苏州纳米技术与纳米仿生研究所 | A kind of continuously adjustable spray head of temperature |
| CN111778552A (en) * | 2020-08-03 | 2020-10-16 | 中国科学院长春光学精密机械与物理研究所 | MOCVD (Metal organic chemical vapor deposition) combined spray header and MOCVD equipment |
| CN111778552B (en) * | 2020-08-03 | 2021-10-08 | 中国科学院长春光学精密机械与物理研究所 | MOCVD (Metal organic chemical vapor deposition) combined spray header and MOCVD equipment |
| CN115418626A (en) * | 2022-08-22 | 2022-12-02 | 江苏微导纳米科技股份有限公司 | Film coating equipment |
| CN115418626B (en) * | 2022-08-22 | 2024-04-05 | 江苏微导纳米科技股份有限公司 | Coating equipment |
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| C53 | Correction of patent of invention or patent application | ||
| CB02 | Change of applicant information |
Address after: 100107 Beijing Chaoyang District Anli Road No. 0-A Applicant after: Hanenergy Solar Photovoltaic Technology Co.,Ltd Address before: 102209 Beijing city Changping District town Beiqijia Hongfu Pioneer Park No. 15 hospital Applicant before: Hanergy Technology Co., Ltd. |
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Free format text: CORRECT: APPLICANT; FROM: HANERGY TECHNOLOGY CO., LTD. TO: HANERGY SOLAR PHOTOVOLTAIC TECHNOLOGY LIMITED |
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Application publication date: 20120502 |