CN102373438A - Chemical vapor deposition device - Google Patents

Chemical vapor deposition device Download PDF

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Publication number
CN102373438A
CN102373438A CN201010249943XA CN201010249943A CN102373438A CN 102373438 A CN102373438 A CN 102373438A CN 201010249943X A CN201010249943X A CN 201010249943XA CN 201010249943 A CN201010249943 A CN 201010249943A CN 102373438 A CN102373438 A CN 102373438A
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CN
China
Prior art keywords
cavity
plated film
roller
chemical vapor
coated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201010249943XA
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Chinese (zh)
Inventor
许嘉麟
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hongfujin Precision Industry Shenzhen Co Ltd
Hon Hai Precision Industry Co Ltd
Original Assignee
Hongfujin Precision Industry Shenzhen Co Ltd
Hon Hai Precision Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hongfujin Precision Industry Shenzhen Co Ltd, Hon Hai Precision Industry Co Ltd filed Critical Hongfujin Precision Industry Shenzhen Co Ltd
Priority to CN201010249943XA priority Critical patent/CN102373438A/en
Publication of CN102373438A publication Critical patent/CN102373438A/en
Pending legal-status Critical Current

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Abstract

The invention relates to a chemical vapor deposition device. The device comprises a cavity, a gas introduction device, a gas pumping device, a heating device and a drive device. The cavity is provided with a first side, a second side and a coating area, wherein the first side and the second side are relatively arranged, the coating area is positioned between the first side and the second side, and is provided for placing a roller requiring coating. The gas introduction device is arranged inside the cavity, and is positioned above the first side. The gas introduction device is provided with a nozzle, and the nozzle is headed to the coating area to spray reaction gas to the coating area. The gas pumping device is arranged below the second side, and is provided for pumping the gas inside the cavity, such that the air flow is formed in the cavity, wherein the air flow flows from the first side to the second side, and passes through the coating area. The heating device is positioned below the coating area, and is arranged on the wall of the cavity, wherein the position of the heating device is relative to the coating area. The drive device is connected with the roller requiring coating to drive the roller requiring coating to rotate around the rotation shaft, wherein the roller requiring coating is placed inside the coating area.

Description

Chemical vapor depsotition equipment
Technical field
The present invention relates to a kind of chemical vapor depsotition equipment, relate in particular to a kind of chemical vapor depsotition equipment that is used for blooming piece impression roller surface plated film.
Background technology
In the course of processing of blooming piece, the impression roller is used for the microstructure on compression moulding blooming piece surface.The impression roller is processed like stainless steel or iron basically by harder material.In order to obtain the microstructure that optical characteristics requires that satisfies on blooming piece surface, generally impression roller outer circumference surface is carried out precision sizing according to required microstructure.And, adopt liquid phase plated film such as galvanized mode again usually for the ease of precision sizing, and plate the rete of one deck prior to the outer circumference surface that impresses roller than softwood matter such as copper, then copper rete is carried out precision sizing and obtain required microstructure.
This by the impression roller that obtains microstructure than the processing of softwood matter such as copper in use; Influence in its surperficial particulate is subject to drop; And cause the defective of the impaired formation of micro-structure surface such as scratch and so on, finally influence the optical characteristics of the blooming piece surface micro-structure of compression moulding.For this reason, need plate the anti abrasive rete of one deck again, with the dropped influence of particulate on it of the surface of avoiding microstructure by the surface of the microstructure that obtains than the processing of softwood matter such as copper.But; When the liquid phase plated film mode of adopt electroplating once more type is coated with wear-resistant rete, the microstructure that has had in the impression roller will be unfavorable for controlling the thickness of wear-resistant rete, thus; Be prone to cause wear-resistant evenness of membranous layer inconsistent, the final required microstructure of influence.In addition, for more large-scale impression roller,, adopt the whole homogeneity of the more restive plated film rete of liquid phase plated film mode because its coated surface is bigger.
Summary of the invention
In view of this, be necessary to provide a kind of be easy to realize, chemical vapor depsotition equipment that can effectively solve the problem that exists in the prior art.
A kind of chemical vapor depsotition equipment comprises a cavity, a gas gatherer, an air extractor, a heating unit, and a drive unit.Said cavity has the first relative side and second side, and a plated film district that between said first side and said second side, is used to place roller to be coated.Said gas gatherer is arranged at said inside cavity and is positioned at the top of first side of said cavity, and said gas gatherer has a shower nozzle, said shower nozzle towards said plated film district with to said plated film district spray reactant gases.Said air extractor is arranged at the below of second side of said cavity, and said air extractor is used to extract the intravital gas in said chamber to be made and form in the said cavity from first effluent of said cavity to second side and through the air-flow in said plated film district.Said heating unit is positioned at the below in said plated film district and is arranged on the chamber wall in the corresponding plated film of said cavity district.Said drive unit connects the roller to be coated that is positioned over said plated film district and rotates around it the axle rotation to drive said roller to be coated.
With respect to prior art; Chemical vapor depsotition equipment provided by the invention has following advantage: one of which; Said chemical vapor depsotition equipment is applicable to more large-scale impression roller is carried out plated film; Through the ejection angle of control reactant gases, said chemical vapor depsotition equipment can be controlled the plated film scope effectively, satisfies the plated film demand on the big surface of large-scale impression roller.They are two years old; When adopting said chemical vapor depsotition equipment that the impression roller of the existing microstructure in surface is carried out plated film; Be difficult for being impressed the influence of the microstructure of roller surface, cooperate the rotation of control impression roller, can make the surface of impression roller obtain the preferable rete of whole homogeneity.Its three, said chemical vapor depsotition equipment structure is simpler, easy handling realizes that the rete of impression roller surface is coated with.
Description of drawings
Fig. 1 is the synoptic diagram of the chemical vapor depsotition equipment that provides of one embodiment of the invention.
Fig. 2 is a chemical vapor depsotition equipment shown in Figure 1 sectional view along the II-II direction.The main element nomenclature
Cavity 10
First side 11
Second side 12
Plated film district 13
Bearing 15
Extraction pipe 17
Gas gatherer 20
Shower nozzle 21
Air extractor 30
Extraction valve 31
Off-gas pump 33
Heating unit 40
Heater coil 41
Drive unit 50
Electro-motor 51
Belt 53
Plasma generation device 60
Roller 70 to be coated
Rotation axis 71
Chemical vapor depsotition equipment 100
Embodiment
To combine accompanying drawing and embodiment that the present technique scheme is done further explain below.
Please consult Fig. 1 and Fig. 2 in the lump, one embodiment of the invention provides a kind of chemical vapor depsotition equipment 100, and it comprises a cavity 10; 30, one heating units 40 of 20, one air extractors of a gas gatherer; A drive unit 50, and a plasma generation device 60.
Said gas gatherer 20 sprays to the roller to be coated 70 that is arranged in the said cavity 10 with the reactant gases that reactive deposition forms rete, forms required rete with the surface deposition at said roller 70 to be coated.Said air extractor 30 will extract the gas in the said cavity 10, and make in the said cavity 10 and form air-flow stably, and the surface of being convenient to said roller to be coated 70 forms rete uniformly.Said heating unit 40 is used to heat the plated film district 13 in the said cavity 10; Make the surface that is positioned over the roller to be coated 70 in the said plated film district 13 have certain temperature; And provide reactant gases suitable temperature of reaction, so that the surface deposition at said roller 70 to be coated forms required rete after the reactant gases after chemical reaction.Said drive unit 50 is used to drive said roller to be coated 70 to be realized rotating, so that form uniform rete at the surface deposition of said roller 70 to be coated.Said plasma generation device 60 is used in said cavity 10, producing plasma body, in the surf zone of said roller 70 to be coated, accelerates the chemical reaction velocity of reactant gases with the reactive ion in the concentrated reactant gases, realizes accelerating the speed of plated film.
Said cavity 10 is an enclosed housing, can make the inside of said cavity 10 form the required vacuum environment of plated film through vacuum pump joining with it (figure does not show), so that the reactant gases chemical reaction forms the rete on the surface that is deposited on said roller to be coated 70.Said cavity 10 has the first relative side 11 and second side 12, and a plated film district 13 that between said first side 11 and said second side 12, is used to place roller 70 to be coated.In the present embodiment, the bottom in said cavity 10 corresponding plated film districts 13 is a convex structure, and it is corresponding to the convex structure of said roller 70 to be coated, thus, be convenient to place said roller to be coated 70 and be provided with after the heating unit 40 stated.
Further, said chemical vapor depsotition equipment 100 comprises two bearings 15, and said two bearings 15 are used to support the rotation axis 71 of said roller to be coated 70.In the present embodiment, said two bearings 15 are arranged on the chamber wall in corresponding plated film district 13 in the said cavity 10 relatively and coaxially, and the axis normal of said two bearings 15 is in the line at the center of the center of first side 11 of said cavity 10 and second side 12.Thus,, promptly can said roller 70 to be coated be positioned in the plated film district 13 of said cavity 10, and can make said roller to be coated 70 rotate around it axle 71 rotations through the rotation axis 71 of said roller 70 to be coated and cooperating of said two bearings 15.
It is understandable that said two bearings 15 can be rolling bearing or sliding surface bearing, specifically can confirm like strained condition etc. according to the behaviour in service of two bearings 15 described in the use.Certainly, for roller to be coated 70, also the turning axle that matches with the axis hole of roller 70 to be coated can be set on the position of said two bearings 15 with axis hole.As long as it is interior and can make said roller to be coated 70 realization rotations to realize will said roller 70 to be coated being positioned over said plated film district 13.
Said gas gatherer 20 is arranged at that said cavity 10 is inner and be positioned at the top of first side 11 of said cavity 10, and said gas gatherer 20 has a shower nozzle 21, said shower nozzle 21 towards said plated film district 13 with to said plated film district 13 spray reactant gasess.Said gas gatherer 20 is connected with gas source (figure does not show), and gas source is delivered to said gas gatherer 20 with reactant gases, and is sprayed onto said plated film district 13 via said shower nozzle 21.In the present embodiment, said gas gatherer 20 be arranged at said cavity 10 first side 11 the top and near the position of central authorities.
Said reactant gases comprises can form silicon nitride (Si 3N 4) silane (SiH 4) and nitrogen (N 2), maybe can form the aluminum chloride (AlCl of aluminium nitride AlN (AlN) 3) and ammonia (NH 3), maybe can form the titanium chloride (TiCl of titanium nitride (TiN) 4) and nitrogen (N 2) and hydrogen (H 2), certainly,, can correspondingly dispose different reactive gas for obtaining the rete of differing materials.
It is understandable that; Different gas uniform mixing in said gas gatherer 20 in advance in the said reactant gases; Be sprayed onto said plated film district 13 via said shower nozzle 21 then; Also can not be pre-mixed, and be sprayed onto said plated film district 13 via said shower nozzle 21 respectively, concrete operations can be controlled according to the needs of different reactions and actual plated film.
Preferably; Said shower nozzle 21 has a plurality of tuyeres (figure does not indicate); Thus, both helped being pre-mixed uniform reactant gases and can be sprayed onto said plated film district 13 more equably, helped again being sprayed onto said plated film district 13 from different tuyeres respectively without the reactant gases that is pre-mixed.
Preferably; Said shower nozzle 21 can be along the axial change ejection angle of said roller 70 to be coated; Thus, can reactant gases be sprayed onto fully the different zones on the surface of said roller to be coated 70, be convenient to form uniform rete on the surface of said roller 70 to be coated.
Said air extractor 30 is arranged at the below of second side 12 of said cavity 10; Said air extractor 30 is used to extract the gas in the said cavity 10, so that form the air-flow that flows to second side 12 and the said plated film of process district 13 from first side 11 of said cavity 10 in the said cavity 10.Thus, both helped to make the reactant gases that is sprayed onto said plated film district 13 enlarge to cover the scope in said plated film district 13, helped again not have to react and unnecessary gas is discharged said cavity 10.In the present embodiment, said air extractor 30 be arranged at said cavity 10 second side 12 the below and near the position of central authorities.
Further, said chemical vapor depsotition equipment 100 comprises an extraction pipe 17 that is arranged at second side 12 of said cavity 10, and said air extractor 30 comprises an extraction valve 31 and an off-gas pump 33.Said extraction pipe 17 is communicated with the inside of said cavity 10 with outside, and said extraction valve 31 is arranged in the said extraction pipe 17, and said off-gas pump 33 is arranged in the said extraction pipe 17 and is positioned at the side of said extraction valve 31 towards the outside of said cavity 10.Thus, through said extraction valve 31 and said off-gas pump 33, promptly can control said air extractor 30 and extract the gas in the said cavity 10 or close said cavity 10 to keep the closure of said cavity 10.
Said heating unit 40 is positioned at the below in said plated film district 13 and is arranged on the chamber wall in said cavity 10 corresponding plated film districts 13.Thus; Said heating unit 40 can heat said plated film district 13; Make the surface that is positioned over the roller to be coated 70 in the said plated film district 13 have certain temperature; And can provide reactant gases suitable temperature of reaction, so that the surface deposition at said roller 70 to be coated forms required rete after the reactant gases after chemical reaction.In the present embodiment, said heating unit 40 is arranged at the outside of said cavity 10 and is positioned at the below in said plated film district 13.Said heating unit 40 comprises a plurality of resistance-type heater coils 41; Said a plurality of resistance-type heater coil 41 is according to the circular-arc bottom in said cavity 10 corresponding plated film districts 13; Bottom around said cavity 10 corresponding plated film districts 13 is provided with equably; Thus, said resistance-type heater coil 41 can heat said plated film district 13 equably, makes roller 70 to be coated have comparatively isostatic temperature near the surface of said heating unit 40.
Said drive unit 50 connects the roller to be coated 70 that is positioned in the said plated film district 13, rotates around it axle 71 and rotates to second side 12 from first side 11 of said cavity 10 to drive said roller to be coated 70.Thus, can control said roller to be coated 70 automatically and rotate, guarantee to form uniform rete on the surface of said roller 70 to be coated according to the needs of plated film.In the present embodiment, said drive unit 50 is arranged at the inside of said cavity 10 and near said air extractor 30, thus, in the time of can reducing said drive unit 50 runnings to the influence of the air-flow in the said cavity 10.Certainly, said drive unit 50 also can be arranged on the outside of said cavity 10 according to the use needs.Said drive unit 50 comprises an electro-motor 51 and a belt 53, and said electro-motor 51 is connected through said belt 53 with the rotation axis 71 of said roller 70 to be coated.
It is understandable that said electro-motor 51 also can be realized being connected with the rotation axis 71 of said roller 70 to be coated through gear mechanism or chain.
Said plasma generation device 60 is arranged at said cavity 10 inside and is positioned at the top in said plated film district 13, and said plasma generation device 60 is towards said plated film district 13.The plasma distribution that said plasma generation device 60 produces is in said plated film district 13; Thus; Can concentrate reactive ion in the reactant gases in the surf zone of said roller 70 to be coated, accelerate the chemical reaction velocity of reactant gases, promptly; Produce the plasma body that to concentrate reactive ion through said plasma generation device 60, can accelerate the speed of plated film.Further, through controlling the concentration of the plasma body that said plasma generation device 60 produces, can realize control to plated film speed.
In the present embodiment; Said plasma generation device 60 is a slab construction; It parallels with the rotation axis 71 that is positioned over the roller to be coated 70 in said plated film district 13, and the axial length of the said roller 70 to be coated in said plasma generation device 60 edges is greater than the axial length of said roller 70 to be coated.Thus, the plasma body that said plasma generation device 60 produces can be fully along the surface of the said roller 70 to be coated of axial covering of said roller 70 to be coated, be convenient to realize control to the plated film speed of the surperficial different zones of said roller 70 to be coated.
It is understandable that in the actual coating process, said plasma generation device 60 can feed different gas to produce different plasma bodys according to the needs of plated film, use rare gas element usually, produces argon ion as using argon gas.
It is understandable that said plasma generation device 60 can be electrically connected at the radio-frequency power supply (figure does not show) that is arranged at said cavity 10 outsides, thus, can guarantee that said plasma generation device 60 produces the power supply of plasma bodys.
When the roller to be coated 70 that uses 100 pairs of said chemical vapor depsotition equipments to be positioned over said plated film district 13 carries out surface coating, said roller 70 to be coated is connected with the electro-motor 51 of said drive unit 50; Start said electro-motor 51 drive said roller 70 to be coated rotate around it axle 71 from first side 11 of said cavity 10 to 12 rotations of second side; Open said heating unit 40, heat through 41 pairs of said plated films of said resistance-type heater coil district 13; Start said gas gatherer 20, through the to be coated roller 70 spray reactant gasess of said shower nozzle 21 in said plated film district 13; Open said air extractor 30, extract the gas in the said cavity 10, make and form the air-flow that flows to second side 12 and the said plated film of process district 13 from first side 11 of said cavity 10 in the said cavity 10 through said air extractor 30; Open said plasma generation device 60, and control the concentration of the plasma body of said plasma generation device 60 generations according to the plated film needs.Chemical reactions 13 take place in said plated film district in said reactant gases, form solid and are deposited on the surface of said roller to be coated 70, form required rete, like wear-resistant rete.
It is understandable that; In the whole coating process; The concentration of the velocity of rotation of ejection angle, roller to be coated 70 that can be through the control reactant gases, the plasma body that plasma generation device 60 produces; The homogeneity of the rete that the surface of roller 70 to be coated is formed is controlled, with the rete that obtains to meet the demands.
With respect to prior art; Chemical vapor depsotition equipment provided by the invention has following advantage: one of which; Said chemical vapor depsotition equipment is applicable to more large-scale impression roller is carried out plated film; Through the ejection angle of control reactant gases, said chemical vapor depsotition equipment can be controlled the plated film scope effectively, satisfies the plated film demand on the big surface of large-scale impression roller.They are two years old; When adopting said chemical vapor depsotition equipment that the impression roller of the existing microstructure in surface is carried out plated film; Be difficult for being impressed the influence of the microstructure of roller surface, cooperate the rotation of control impression roller, can make the surface of impression roller obtain the preferable rete of whole homogeneity.Its three, said chemical vapor depsotition equipment structure is simpler, easy handling realizes that the rete of impression roller surface is coated with.
In addition, those skilled in the art can also do other variation in spirit of the present invention, and certainly, these all should be included within the present invention's scope required for protection according to the variation that the present invention's spirit is done.

Claims (10)

1. chemical vapor depsotition equipment, it comprises:
A cavity, it has the first relative side and second side, and a plated film district that between said first side and said second side, is used to place roller to be coated;
A gas gatherer, it is arranged at said inside cavity and is positioned at the top of first side of said cavity, said gas gatherer has a shower nozzle, said shower nozzle towards said plated film district with to said plated film district spray reactant gases;
An air extractor, it is arranged at the below of second side of said cavity, and said air extractor is used to extract the intravital gas in said chamber to be made and forms in the said cavity from first effluent of said cavity to second side and through the air-flow in said plated film district;
A heating unit, it is positioned at the below in said plated film district and is arranged on the chamber wall in the corresponding plated film of said cavity district; And
The roller to be coated that a drive unit, its connection are positioned over said plated film district rotates around it the axle rotation to drive said roller to be coated.
2. chemical vapor depsotition equipment as claimed in claim 1 is characterized in that, said cavity is an enclosed housing, and the bottom in the corresponding plated film of said cavity district is the convex structure corresponding to roller structure to be coated.
3. chemical vapor depsotition equipment as claimed in claim 2; It is characterized in that; Said heating unit is arranged at said cavity outside and is positioned at the below in said plated film district; Said heating unit comprises a plurality of resistance-type heater coils, and said a plurality of resistance-type heater coils are provided with around the bottom in the corresponding plated film of said cavity district equably.
4. chemical vapor depsotition equipment as claimed in claim 1; It is characterized in that; Said chemical vapor depsotition equipment further comprises a plasma generation device; Said plasma generation device is arranged at said inside cavity and is positioned at the top in said plated film district, and said plasma generation device is towards said plated film district.
5. chemical vapor depsotition equipment as claimed in claim 4; It is characterized in that; Said plasma generation device is a slab construction; It parallels with the rotation axis that is positioned over the roller to be coated in said plated film district, and said plasma generation device along said roller shaft to be coated to length greater than the axial length of said roller to be coated.
6. chemical vapor depsotition equipment as claimed in claim 1 is characterized in that, said chemical vapor depsotition equipment further comprises an extraction pipe that is arranged at second side of said cavity, and said air extractor comprises an extraction valve and an off-gas pump; Said extraction pipe is communicated with the inside of said cavity with outside, and said extraction valve is arranged in the said extraction pipe, and said off-gas pump is arranged in the said extraction pipe and is positioned at said extraction valve towards the outside side of said cavity.
7. chemical vapor depsotition equipment as claimed in claim 1; It is characterized in that; Said chemical vapor depsotition equipment further comprises two bearings that are used to support the rotation axis of roller to be coated; Said two bearings are arranged on the chamber wall in corresponding plated film district in the said cavity relatively and coaxially, and the axis normal of said two bearings is in the line at the center of the center of first side of said cavity and second side.
8. chemical vapor depsotition equipment as claimed in claim 1 is characterized in that, said drive unit is arranged at the inside of said cavity and near said air extractor.
9. chemical vapor depsotition equipment as claimed in claim 8 is characterized in that, said drive unit comprises an electro-motor and a belt, and said electro-motor is connected through said belt with the rotation axis of said roller to be coated.
10. chemical vapor depsotition equipment as claimed in claim 1 is characterized in that said reactant gases comprises silane and nitrogen, or aluminum chloride and ammonia, or titanium chloride and nitrogen and hydrogen.
CN201010249943XA 2010-08-10 2010-08-10 Chemical vapor deposition device Pending CN102373438A (en)

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Application Number Priority Date Filing Date Title
CN201010249943XA CN102373438A (en) 2010-08-10 2010-08-10 Chemical vapor deposition device

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Application Number Priority Date Filing Date Title
CN201010249943XA CN102373438A (en) 2010-08-10 2010-08-10 Chemical vapor deposition device

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107034447A (en) * 2017-05-05 2017-08-11 宁波工程学院 The equipment that a kind of chemical vapor deposition is coated with diamond film
CN109839246A (en) * 2017-11-29 2019-06-04 丰田合成株式会社 The Withstand test device of inflator container

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020150684A1 (en) * 2001-04-16 2002-10-17 Jayatissa Ahalapitiya H. Method of forming carbon nanotubes and apparatus therefor
CN1302152C (en) * 2001-03-19 2007-02-28 株式会社Ips Chemical vapor depositing apparatus
CN101597749A (en) * 2008-06-03 2009-12-09 鸿富锦精密工业(深圳)有限公司 Automatic film coating device
CN101631901A (en) * 2007-02-24 2010-01-20 艾克斯特朗股份公司 Device and method for selectively depositing crystalline layers using MOCVD or HVPE

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1302152C (en) * 2001-03-19 2007-02-28 株式会社Ips Chemical vapor depositing apparatus
US20020150684A1 (en) * 2001-04-16 2002-10-17 Jayatissa Ahalapitiya H. Method of forming carbon nanotubes and apparatus therefor
CN101631901A (en) * 2007-02-24 2010-01-20 艾克斯特朗股份公司 Device and method for selectively depositing crystalline layers using MOCVD or HVPE
CN101597749A (en) * 2008-06-03 2009-12-09 鸿富锦精密工业(深圳)有限公司 Automatic film coating device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107034447A (en) * 2017-05-05 2017-08-11 宁波工程学院 The equipment that a kind of chemical vapor deposition is coated with diamond film
CN107034447B (en) * 2017-05-05 2023-09-15 宁波工程学院 Equipment for plating diamond film by chemical vapor deposition
CN109839246A (en) * 2017-11-29 2019-06-04 丰田合成株式会社 The Withstand test device of inflator container

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Application publication date: 20120314