CN102824864A

CN102824864A - Vaporization mixing unit

Info

Publication number: CN102824864A
Application number: CN2011101609206A
Authority: CN
Inventors: 孙恒裕; 刘建党
Original assignee: CSG Holding Co Ltd
Current assignee: CSG Holding Co Ltd
Priority date: 2011-06-15
Filing date: 2011-06-15
Publication date: 2012-12-19
Anticipated expiration: 2031-06-15
Also published as: CN102824864B

Abstract

A vaporization mixing unit comprises a cylindrical vaporizer and a liquid inlet pipe, a gas carrying pipe and an exit pipe which are arranged on the vaporizer. An orifice of the gas carrying pipe is close to and opposite to an orifice of the liquid inlet pipe, and the orifice of the gas carrying pipe is close to the inner wall of the vaporizer. As the orifice of the gas carrying pipe of the above vaporization mixing unit is close to and opposite to the orifice of the liquid inlet pipe, and the orifice of the gas carrying pipe is close to the inner wall of the vaporizer, a gas sprayed out from the gas carrying pipe can contact with a vaporized substance sprayed into the liquid inlet pipe at the first time, and the gas sprayed out from the gas carrying pipe flows along an arc-shaped tube wall of the vaporizer such that the gas and the vaporized substance sprayed into the liquid inlet pipe together form a rotary eddy current and uniform mixing of the gas and the vaporized substance is accelerated.

Description

The vaporization mixing arrangement

[technical field]

The present invention relates to the float glass field, especially relate to the vaporization mixing arrangement that the online CVD method of a kind of float glass process is produced the float glass process production line of coated glass.

[background technology]

On-line coating film of float glass is realized on floatation glass production line.Different according to the raw-material state of used plated film, the on-line coating technology can be divided into gaseous state coating technique, liquid coating technique and solid-state coating technique.The gaseous state coating technique can carry out production low-emission coated and sunlight control plated film product.Online low-emission coated, claim online low-E plated film again, rete technology glass tape surface deposition multi-layer doping or unadulterated metal oxide or metallic compound of the heat that refer on the float glass process production line, promptly moves.Wherein the sunlight of gaseous state is controlled plated film, and mainly referring to the gaseous silane is the coated glass of the metallic diaphragm of primary raw material.

Traditional filming equipment provides a controlled atmosphere cell at the tin bath outlet place; Be provided with the vaporization mixing arrangement in the controlled atmosphere cell; With silane, to contain the admixture of gas that oxygen source, ethene form be carrier with the inert gas; High speed deposition forms screen layer at the float glass belt surface, will contain Xi Yuan, antimony source, fluorine source, phosphorus source and catalyst, oxidant and stabilizing agent then and the proplastid admixture of gas that is mixed and made into, with nitrogen as carrier; To carry out pyrolysis at a high speed, be coated with the certain thickness rete of formation on the glass tape of screen layer with low radiance.

Yet; Traditional coating process process precursor as: the gasification mixing apparatus in Xi Yuan, antimony source, fluorine source, phosphorus source etc. often adopts the mode of bubbling or press atomization; The aforesaid way presoma with the transmission course of carrier gas because the influence of the stability that is under pressure; Cause mixed effect relatively poor easily, the uniformity of all gases is not high.

[summary of the invention]

Based on this, be necessary to provide a kind of mixed effect mixing arrangement of vaporizing preferably.

A kind of vaporization mixing arrangement comprises columniform vaporizer and is located at feed tube, carrier gas pipe and the escape pipe on this vaporizer, the mouth of pipe of this carrier gas pipe and the mouth of pipe of this feed tube near and relatively, and the mouth of pipe of this carrier gas pipe is near the inwall of this vaporizer.

In a preferred embodiment, this vaporizer comprises and the contacted contact site of gas that sprays in this carrier gas pipe, and circle is positioned at the tangent line of this contact site to the parallel axes of this carrier gas pipe in the cross section of this vaporizer.

In a preferred embodiment, the axis of this carrier gas pipe is vertical with the axis antarafacial of this vaporizer.

In a preferred embodiment, the distance of establishing between the axis of axis and this columniform vaporizer of this carrier gas pipe is D, and the internal diameter of this vaporizer is R, then: 0.86R≤D＜R.

In a preferred embodiment, the axis of this feed tube passes the center of circle of the cross section circle of this vaporizer, and the axis angulation of the axis of this carrier gas pipe and this feed tube is 55 °～65 °.

In a preferred embodiment, the mouth of pipe of establishing this feed tube is L to the distance in the center of circle of the cross section circle of this vaporizer, and the internal diameter of this vaporizer is R, then: 0.91R≤L≤R.

In a preferred embodiment, the parallel axes of the axis of this escape pipe and this carrier gas pipe, the axis of this escape pipe and the axes intersect of this vaporizer and vertical.

In a preferred embodiment; If the projector distance of axis on the axis of this vaporizer of the axis of this escape pipe and this carrier gas pipe is S, then: and S≤2R; Wherein, Q is the flow of carrier gas pipe, and r is the internal diameter of carrier gas pipe, and R is the internal diameter of vaporizer.

In a preferred embodiment, this vaporizer comprises inner chamber and the overcoat that is sheathed on this inner chamber, forms the container cavity that holds steam between this inner chamber and this overcoat, and this outer putting is provided with steam inlet duct and the steam waste pipe that communicates with this container cavity.

In a preferred embodiment, also comprise the observation ward that is located at this vaporizer one end.

The mouth of pipe of the carrier gas pipe of above-mentioned vaporization mixing arrangement and the mouth of pipe of this feed tube near and relatively; And the mouth of pipe of carrier gas pipe is near the inwall of this vaporizer; Therefore the gas of carrier gas pipe ejection can contact with the vaporizer that feed tube sprays into the very first time; And make the gas that sprays in the carrier gas pipe flow, thereby form the eddy current of rotation together, quicken even mixing the between gas and the vaporizer with the vaporizer that feed tube sprays into along the tube wall of the circular arc of vaporizer.

[description of drawings]

Through the more specifically explanation of the preferred embodiments of the present invention shown in the accompanying drawing, above-mentioned and other purpose, characteristic and advantage of the present invention will be more clear.Reference numeral identical in whole accompanying drawings is indicated identical part.Painstakingly do not draw accompanying drawing, focus on illustrating purport of the present invention by actual size equal proportion convergent-divergent.

Fig. 1 is the vertical view of the vaporization mixing arrangement of an embodiment;

Fig. 2 is the cutaway view along A-A line among Fig. 1;

Fig. 3 is the cutaway view along B-B line among Fig. 1.

[specific embodiment]

For make above-mentioned purpose of the present invention, feature and advantage can be more obviously understandable, does detailed explanation below in conjunction with the accompanying drawing specific embodiments of the invention.A lot of details have been set forth in the following description so that make much of the present invention.But the present invention can implement much to be different from alternate manner described here, and those skilled in the art can do similar improvement under the situation of intension of the present invention, so the present invention does not receive the restriction of following disclosed practical implementation.

Secondly, the present invention utilizes sketch map to be described in detail, when the embodiment of the invention is detailed; For ease of explanation; The profile of expression device architecture can be disobeyed general ratio and done local the amplification, and said sketch map is instance, and it should not limit the scope of the present invention's protection at this.The three dimensions size that in actual fabrication, should comprise in addition, length, width and the degree of depth.

Please consult Fig. 1 and Fig. 2 simultaneously, the vaporization mixing arrangement 100 of an embodiment comprises vaporizer 10, pedestal 20 and observation ward 30.Vaporizer 10 is roughly cylindrical, and pedestal 20 is located at the bottom of vaporizer 10, is used to support vaporizer 10.Observation ward 30 is located at an end of vaporizer 10, is used to observe situations such as vaporizer 10 interior liquid levels.

Vaporizer 10 horizontal positioned comprise being roughly columniform inner chamber 11 and the overcoat 12 that is sheathed on inner chamber 11.Form container cavity 111 between inner chamber 11 and the overcoat 12.The top of overcoat 12 is provided with steam inlet duct 121; The bottom of overcoat 12 is provided with steam waste pipe 122.Steam inlet duct 121 all communicates with container cavity 111 with steam waste pipe 122.Steam can get into container cavities 111 from steam inlet duct 121, discharge from steam waste pipe 122 then, and in this process heating bore 11 or inner chamber 11 kept higher temperature.In order to monitor the temperature of gas in the vaporizer 10, the top of vaporizer 10 also is provided with the thermocouple interface 123 that stretches into inner chamber 11.

Please consult Fig. 3 in the lump, also be provided with feed tube 40, carrier gas pipe 50 and escape pipe 60 on the vaporizer 10.

Feed tube 40 is located at the position near the below of vaporizer 10.The axis of feed tube 40 passes the axes O of vaporizer 10, and forms 55 °～65 ° angle with vertical direction, is preferably 60 °.It is shorter that feed tube 40 stretches into the position of inner chamber 11, so that vaporizer can flow out to inner chamber 11 bottoms quickly.Preferably, the mouth of pipe of establishing feed tube is L to the distance in the center of circle of the cross section circle of vaporizer 10, and the internal diameter of vaporizer is R, then: 0.91R≤L≤R.

Carrier gas pipe 50 is located at the position of vaporizer 10 near a lateral edges, and vertically extends, and promptly the axis 52 of carrier gas pipe 50 is vertical with the axes O of vaporizer 10.Carrier gas pipe 50 comprises the mouth of pipe 51 of wedge shape.The mouth of pipe 51 is near the inwall of inner chamber 11, and its edge court is away from the direction inclination of the inwall of inner chamber 11.The mouth of pipe 51 of the carrier gas pipe 50 of the mouth of pipe 51 and the mouth of pipe of feed tube 40 near and relatively, so the gas of carrier gas pipe 50 ejections can contact with the vaporizer that feed tube 40 sprays into the very first time.Inner chamber 11 comprises the contacted contact site 112 of gas with ejection in carrier gas pipe 50.The cross section circle that the axis 52 of carrier gas pipe 50 is parallel to inner chamber 11 is positioned at the tangent line of contact site 112.Preferably, the distance of establishing between the axes O of axis 52 and vaporizer 10 of carrier gas pipe is D, and the internal diameter of inner chamber 11 is R, then: 0.86R≤D＜R.Such design can make the gases of ejection in the carrier gas pipe 50 flow along the tube wall of the circular arc of inner chamber 11, thereby forms the eddy current of rotation as shown in Figure 3 together with the vaporizer that feed tube 40 sprays into, and quickens even mixing the between gas and the vaporizer.

Escape pipe 60 be located at vaporizer 10 directly over, and vertically extend, promptly parallel with carrier gas pipe 50.The axis normal of escape pipe 60 is passed the axes O of vaporizer 10.Distance outbalance in design between escape pipe 60 and the carrier gas pipe 50, if too short, just then gas would also mix outflow from escape pipe 60 fully; If oversize, increased equipment size first, second cause the unnecessary reaction of the long generation of gas incorporation time.Therefore; According to centrifugal mechanics and fluid mechanics principle; Utilize carrier gas to carrying out effective well-mixed purpose after the vaporization of liquid chemical material in the vaporizer for reaching; Consider that vaporizer and pipeline dependency structure size and fluid parameter calculate, and obtain following parameters relationship after the experimental verification of hydrodynamics analogue simulation: setting out the axis 61 of tracheae 60 and the projector distance of axis 52 on the axes O of vaporizer 10 of carrier gas pipe 50 is S, then:

Q = π r^{2} \sqrt{2 GS},

And S≤2R;

Wherein, Q is the flow of carrier gas pipe 50, and r is the internal diameter of carrier gas pipe 50, and g is an acceleration of gravity, and R is the internal diameter of vaporizer 10.

Observation ward 30 comprises first tube connector 31, clip 32, second tube connector 33, first seal 34, windowpane 35 and enclosing cover 36.

First tube connector 31 is located at an end of vaporizer 10, and second tube connector 33 links to each other through clip 32 with first tube connector 31.First seal 34 is processed by the material of corrosion-and high-temp-resistant, and it is located at second tube connector 33 and first tube connector, 31 contacted positions.Windowpane 35 is located at the end of second tube connector 33, and enclosing cover 36 is fixing with the windowpane 35 and second tube connector 33 through screw.Preferably, also be provided with second seal 37 between windowpane 35 and the enclosing cover 36.Second seal 37 is identical with the material of first seal 34.

Be appreciated that observation ward 30 also can omit.Vaporizer 10 can adopt other modes to heat, for example resistance wire etc.

The above embodiment has only expressed several kinds of embodiments of the present invention, and it describes comparatively concrete and detailed, but can not therefore be interpreted as the restriction to claim of the present invention.Should be pointed out that for the person of ordinary skill of the art under the prerequisite that does not break away from the present invention's design, can also make some distortion and improvement, these all belong to protection scope of the present invention.Therefore, the protection domain of patent of the present invention should be as the criterion with accompanying claims.

Claims

1. vaporization mixing arrangement; Comprise columniform vaporizer and be located at feed tube, carrier gas pipe and the escape pipe on this vaporizer; It is characterized in that: the mouth of pipe of this carrier gas pipe and the mouth of pipe of this feed tube near and relatively, and the mouth of pipe of this carrier gas pipe is near the inwall of this vaporizer.

2. vaporization mixing arrangement according to claim 1 is characterized in that: this vaporizer comprises and the contacted contact site of gas that sprays in this carrier gas pipe, and circle is positioned at the tangent line of this contact site to the parallel axes of this carrier gas pipe in the cross section of this vaporizer.

3. vaporization mixing arrangement according to claim 2 is characterized in that: the axis of this carrier gas pipe is vertical with the axis antarafacial of this vaporizer.

4. vaporization mixing arrangement according to claim 3 is characterized in that: the distance of establishing between the axis of axis and this columniform vaporizer of this carrier gas pipe is D, and the internal diameter of this vaporizer is R, then:

0.86R≤D＜R。

5. vaporization mixing arrangement according to claim 1 is characterized in that: the axis of this feed tube passes the center of circle of the cross section circle of this vaporizer, and the axis angulation of the axis of this carrier gas pipe and this feed tube is 55 °～65 °.

6. vaporization mixing arrangement according to claim 5 is characterized in that: the mouth of pipe of establishing this feed tube is L to the distance in the center of circle of the cross section circle of this vaporizer, and the internal diameter of this vaporizer is R, then:

0.91R≤L≤R。

7. vaporization mixing arrangement according to claim 3 is characterized in that: the parallel axes of the axis of this escape pipe and this carrier gas pipe, the axis of this escape pipe and the axes intersect of this vaporizer and vertical.

8. vaporization mixing arrangement according to claim 7 is characterized in that: establishing the axis of this escape pipe and the projector distance of axis on the axis of this vaporizer of this carrier gas pipe is S, then:

Q = π r^{2} \sqrt{2 GS},

And S≤2R;

Wherein, Q is the flow of carrier gas pipe, and r is the internal diameter of carrier gas pipe, and R is the internal diameter of vaporizer.

9. vaporization mixing arrangement according to claim 1; It is characterized in that: this vaporizer comprises inner chamber and the overcoat that is sheathed on this inner chamber; Form the container cavity that holds steam between this inner chamber and this overcoat, this outer putting is provided with steam inlet duct and the steam waste pipe that communicates with this container cavity.

10. vaporization mixing arrangement according to claim 1 is characterized in that: also comprise the observation ward that is located at this vaporizer one end.