CN102254801B - Method for controlling doping density of doped region of semiconductor device accurately - Google Patents
Method for controlling doping density of doped region of semiconductor device accurately Download PDFInfo
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- CN102254801B CN102254801B CN 201110224158 CN201110224158A CN102254801B CN 102254801 B CN102254801 B CN 102254801B CN 201110224158 CN201110224158 CN 201110224158 CN 201110224158 A CN201110224158 A CN 201110224158A CN 102254801 B CN102254801 B CN 102254801B
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- boron
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CN 201110224158 CN102254801B (en) | 2011-08-06 | 2011-08-06 | Method for controlling doping density of doped region of semiconductor device accurately |
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CN 201110224158 CN102254801B (en) | 2011-08-06 | 2011-08-06 | Method for controlling doping density of doped region of semiconductor device accurately |
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CN102254801A CN102254801A (en) | 2011-11-23 |
CN102254801B true CN102254801B (en) | 2013-06-19 |
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Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
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CN103617948B (en) * | 2013-10-22 | 2016-09-28 | 溧阳市东大技术转移中心有限公司 | A kind of doping method of MOS device |
CN103594375B (en) * | 2013-10-22 | 2017-02-08 | 溧阳市东大技术转移中心有限公司 | Doping method of MOS device |
CN104505345A (en) * | 2014-12-19 | 2015-04-08 | 扬州国宇电子有限公司 | Method for preparing Schottky diode P+ type diffusion protection ring by use of CSD process |
CN116586265A (en) * | 2023-02-28 | 2023-08-15 | 浙江里阳半导体有限公司 | Latex source coating method and system, and latex source diffusion method and system |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4604150A (en) * | 1985-01-25 | 1986-08-05 | At&T Bell Laboratories | Controlled boron doping of silicon |
CN1057364A (en) * | 1990-11-24 | 1991-12-25 | 山东师范大学 | A kind of open tube aluminium-gallium diffusion process |
CN1555086A (en) * | 2003-12-26 | 2004-12-15 | 金小玲 | Method for preparing high power semiconductor device by phosphorus containing silicon dioxide latex source expansion |
CN101068003A (en) * | 2007-02-13 | 2007-11-07 | 江苏威斯特整流器有限公司 | Method for producing large power bidirectional thyratron transistor |
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2011
- 2011-08-06 CN CN 201110224158 patent/CN102254801B/en active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4604150A (en) * | 1985-01-25 | 1986-08-05 | At&T Bell Laboratories | Controlled boron doping of silicon |
CN1057364A (en) * | 1990-11-24 | 1991-12-25 | 山东师范大学 | A kind of open tube aluminium-gallium diffusion process |
CN1555086A (en) * | 2003-12-26 | 2004-12-15 | 金小玲 | Method for preparing high power semiconductor device by phosphorus containing silicon dioxide latex source expansion |
CN101068003A (en) * | 2007-02-13 | 2007-11-07 | 江苏威斯特整流器有限公司 | Method for producing large power bidirectional thyratron transistor |
Non-Patent Citations (2)
Title |
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李观启等.用一次扩散获得不同硼杂质浓度和结深的研究.《半导体技术》.1986,(第3期),第11页-第14页. |
用一次扩散获得不同硼杂质浓度和结深的研究;李观启等;《半导体技术》;19860630(第3期);第12页第1栏第1-4行,图1a,表1 * |
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CN102254801A (en) | 2011-11-23 |
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Application publication date: 20111123 Assignee: Shenzhen Jihua Micro Electronics Co. Ltd. Assignor: JILIN SINO-MICROELECTRONICS Co.,Ltd. Contract record no.: 2016990000372 Denomination of invention: Method for controlling doping density of doped region of semiconductor device accurately Granted publication date: 20130619 License type: Common License Record date: 20160902 |
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Assignee: Shenzhen Jihua Micro Electronics Co. Ltd. Assignor: JILIN SINO-MICROELECTRONICS Co.,Ltd. Contract record no.: 2016990000372 Date of cancellation: 20180920 |
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