CN102231469B - Gas management apparatus and method for excimer laser - Google Patents
Gas management apparatus and method for excimer laser Download PDFInfo
- Publication number
- CN102231469B CN102231469B CN2011101325261A CN201110132526A CN102231469B CN 102231469 B CN102231469 B CN 102231469B CN 2011101325261 A CN2011101325261 A CN 2011101325261A CN 201110132526 A CN201110132526 A CN 201110132526A CN 102231469 B CN102231469 B CN 102231469B
- Authority
- CN
- China
- Prior art keywords
- gas
- electromagnetic valve
- laser
- controllable electromagnetic
- control module
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Landscapes
- Lasers (AREA)
Abstract
The invention relates to a gas management apparatus and a method for an excimer laser. The apparatus comprises: an excimer laser; a monitoring and controlling module; controllable electromagnetic valves that are used for controlling flow directions of laser working gases; gas injection tank that is used for matching laser working gases with different concentrations; a halogen gas processing apparatus and a vacuum pump that are used for discharging laser working gases; and a pressure transducer that is used for monitoring pressure intensities of the laser working gases. According to the invention, working parameters of an excimer laser are monitored, wherein the working parameters include a working voltage, pulse energy, a width of a spectral line, and a wavelength; consumption of laser working gas is estimated according to quantitative relations between the working parameters of the excimer laser and the concentration of the laser working gas, wherein the working parameters are measured by an experiment; changes of pressure intensity of the laser working gas within a laser cavity as well as openings and closures of the controllable electromagnetic valves are controlled by employing pressure monitoring and signal feed back methods, so that the laser working gas is injected with an accurate value into the laser cavity. According to the invention, stability for outputting laser pulse by an excimer laser can be improved; life of laser working gas can be effectively prolonged; and a gas change rate of the laser can be reduced.
Description
Technical field
The invention belongs to the PRK technical field, particularly a kind of device and method that is used for the excimer laser gas delivery.
Background technology
Excimer laser is widely used in industry, medical treatment and scientific research field, and particularly at the semiconductor lithography production field, excimer laser is as the light source of mask aligner.The KrF excimer laser is applied in the mask aligner earlier, and output wavelength 248nm is positioned at ultraviolet band, along with the continuous reduction of lithography node size, is replaced by short wavelength's 193nm ArF excimer laser more.KrF and ArF are the rare gas halide excimer lasers, and working gas comprises halogen gas F
2, inert gas Ar or Kr, buffer gas Ne, inert gas He.
F
2Chemical property very active, more active when especially being ionized to ionic state, although laser material through special processing, F
2Still can chemical reaction take place with laser chamber wall, electrode etc., generate metal fluoride and carbon fluoride, cause the F in the laser working gas
2Content reduces gradually, directly influences the stability of excimer laser output laser pulse, shortens the laser gas working life.Along with the development of photoetching technique, require excimer laser to have the laser output of high repetition frequency, narrow linewidth, high stability, prolonging the laser gas working life can enhance productivity, and reduces laser preventive maintenance time and number of times, reduces production costs.Therefore, the gas delivery technology become the PRK technical research emphasis it
When early stage excimer laser is worked; Do not have gas delivery technology such as gas injection, part ventilation, laser works is after a period of time, along with the decline gradually of output pulse energy; Need laser to quit work and take a breath fully, cause laser operating efficiency low.Propose the gas delivery technology in recent years, be used to prolong laser laser gas working life, reduced the number of times of ventilation fully.In the gas delivery technology early, utilize operating voltage and F
2The quantitative relationship of concentration keeps the stable output of pulsed laser energy, because F
2Concentration reduces during laser works gradually, needs to improve operating voltage this moment and keeps laser output constant in energy, when operational voltage value rises to certain limiting value, injects a certain amount of F
2Make F in the laser
2Concentration returns to initial value.Shortcoming is F
2Concentration and operating voltage excursion are bigger, are difficult to accurately control the F in the laser
2Concentration, the laser output stability is not high.Adopt F
2The gas delivery of concentration monitor technology can be monitored F during the laser works in real time
2Concentration change is controlled air inlet respectively and is gone out gas velocity through flow controller and pressure-control valve, keeps F in the laser
2Steady concentration is though this method can accurately be controlled F
2Concentration, but gas management device complex structure and cost are higher.
Summary of the invention
The technical problem that the present invention will solve is: overcome the deficiency of prior art, provide a kind of and can accurately control excimer laser F
2The device and method of concentration is through F
2The concentration control algolithm, F in the estimation laser
2Consumption, accurately the control gaseous management devices injects the F of trace
2Perhaps portion gas displacement keeps F in the laser
2Steady concentration reduces the accumulation of impurity, prolongs laser laser gas working life.
The technical solution adopted for the present invention to solve the technical problems is: a kind of excimer laser gas management device that is used for comprises excimer laser 1, monitoring modular 2, voltage control module 3, gas delivery control module 4, gas injection jar 5, vacuum pump 6, halogen gas processing unit 7, flow restricter 8, first pressure sensor 9, second pressure sensor 10, the first controllable electromagnetic valve 11, the second controllable electromagnetic valve 12, the 3rd controllable electromagnetic valve 13, the 4th controllable electromagnetic valve 14, the 5th controllable electromagnetic valve 15, the 6th controllable electromagnetic valve 16, the 7th controllable electromagnetic valve 17 and the 8th controllable electromagnetic valve 18; Laser working gas is by halogen gas F in the excimer laser 1
2, rare gas Ar, buffer gas Ne and four kinds of gas compositions of inert gas He; Excimer laser 1 output laser pulse; By monitoring modular 2 monitoring pulse energies, spectral line live width, wavelength related work parameter; And provide and feed back signal to voltage control module 3 and gas management control module 4, voltage control module 3 changes the size of operating voltage according to the pulse energy of monitoring, guarantees that excimer laser 1 is operated under the pattern of energy constant; Voltage control module 3 is given gas delivery control module 4 with the operating voltage signal feedback simultaneously, and gas delivery control module 4 comprises F
2The concentration control algolithm can be according to F in the excimer laser 1 running parameter estimation laser working gas of monitoring modular 2 and voltage control module 3 feedbacks
2Consumption; The first controllable electromagnetic valve 11 passes through the circulation that gas line links to each other with the gas cylinder that stores He and controls He; He is used for residual laser working gas in purge gas line and the excimer laser chamber, the second controllable electromagnetic valve 12, the 3rd controllable electromagnetic valve 13, the 4th controllable electromagnetic valve 14 through gas line respectively with store laser working gas F
2The continuous also circulation of control gaseous of the gas cylinder of/He mist, Ar, Ne; The 5th controllable electromagnetic valve 15 links to each other with gas injection jar 5 through gas line; The control laser working gas enters into gas injection jar 5; Gas injection jar 5 is used for the laser working gas of proportioning variable concentrations, and the 6th controllable electromagnetic valve 16 links to each other with excimer laser 1 through gas line with the 7th controllable electromagnetic valve 17, and the control laser working gas is entered in the laser cavity by gas cylinder or gas injection jar 5; Lay flow restricter 8 on the gas line at the 6th controllable electromagnetic valve 16 places; Flow restricter 8 is the non-electric control valve of the very little one-way flow of flow coefficient, is in opening usually, because F in the laser working gas
2Low with Ar concentration, flow restricter 8 is used to reduce F
2Get into the flow velocity of laser cavity with Ar, can accurately control F in the laser cavity
2Concentration with Ar; The 8th controllable electromagnetic valve 18, vacuum pump 6 and halogen gas processing unit 7 are placed on the gas line of exhaust; The 8th controllable electromagnetic valve 18 is used for the laser working gas in emission gases pipeline and the excimer laser chamber with vacuum pump 6, and halogen gas processing unit 7 is used for the F of filtering emission laser working gas
2The gas pressure intensity of first pressure sensor, 9 monitoring gas injection jars 5; And the pressure signal of monitoring fed back to gas delivery control module 4, gas delivery control module 4 is controlled the opening and closing of corresponding controllable electromagnetic valve according to the pressure signal of feedback, accomplishes the distribution operation of gas injection jar 5; Gas pressure intensity in second pressure sensor, 10 monitoring excimer lasers, 1 chamber; And the pressure signal of monitoring fed back to gas delivery control module 4, gas delivery control module 4 is controlled the opening and closing of corresponding controllable electromagnetic valve according to the pressure signal of feedback, accomplishes the ventilation fully of excimer laser 1 and operates with gas injection.
The present invention also provides a kind of excimer laser gas delivery method that is used for, and it is characterized in that performing step is following:
(1) through the best F of measuring excimer laser
2Concentration, optimum operating voltage, and running parameter and F such as surveying work voltage V, pulse energy E, spectral line live width E95, wavelength X
2The variation relation of concentration and proportionality coefficient k
i, confirm operating voltage V
REF, pulse energy E
REF, spectral line live width E95
REF, wavelength X
REFThe running parameter reference value is confirmed T blanking time of maximum working voltage Vmax and each gas injection;
(2) excimer laser operation output laser pulse; By monitoring module monitors pulse energy, spectral line live width and wavelength running parameter; And provide and feed back signal to voltage control module and gas management control module; Voltage control module is given gas delivery control module, gas delivery control module writing task voltage V, pulse energy E, spectral line live width E95, wavelength X and operating time t with excimer laser operating voltage signal feedback;
(3) when the operating voltage V that measures surpassed admissible maximum working voltage Vmax, excimer laser quit work and takes a breath fully, after the ventilation operation is accomplished fully, restarts excimer laser;
(4) if but operating voltage in allowed band, excimer laser continues operation, when operating time t equals gas injection T blanking time, the F in the gas delivery control module
2The concentration control algolithm needs according to F in the excimer laser running parameter estimation laser working gas that obtains
2Consumption can select for use one or several excimer laser running parameter to estimate, if select an excimer laser running parameter operating voltage V estimation F for use
2Consumption obtains F according to formula (1)
2Consumption
k
1(V-V
REF)＝ΔF
2 (1)
Wherein, k
1F for measuring
2Consumption Δ F
2With the proportionality coefficient of operating voltage V variation delta V, V
REFBe reference voltage level;
When selecting two excimer laser running parameter operating voltage V and spectral line live width E95 estimation F for use
2Consumption obtains F according to formula (2)
2Consumption
α
1k
1(V-V
REF)+α
2k
2(E95-E95
REF)＝ΔF
2 (2)
Wherein, k
2F for measuring
2Consumption Δ F
2With the proportionality coefficient of spectral line live width E95 variation delta E95, E95
REFFor with reference to line width values, α
1, α
2Be coefficient of relationship, α
1+ α
2=1,0＜α
1＜1,0＜α
2＜1;
Can select for use different excimer laser running parameters to F according to actual conditions
2Consumption is estimated;
(5) according to the F that estimates
2Consumption, the gas delivery control module is controlled the opening and closing of corresponding controllable electromagnetic valve, adopts the method for pressure monitoring and feedback to accomplish the gas injection operation, and the gas injection operation is divided into two kinds: a kind of micro-F of being
2Inject, another kind ofly be the portion gas displacement, when excimer laser is worked, can be at micro-F several times
2Carry out a portion gas displacement after injecting, to reduce the accumulation of impurity in the laser cavity.
The present invention compared with prior art has following characteristics:
(1) F among the present invention
2The concentration control algolithm makes full use of the running parameters such as operating voltage, pulse energy, spectral line live width, wavelength of monitoring, F in the estimation excimer laser
2Consumption figures, need not adopt special F
2Concentration monitor equipment makes simple in structurely, and cost reduces.
(2) gas management device among the present invention, the method for employing pressure monitoring and feedback can realize that the gas of accurate value injects.
(3) the gas injection mode among the present invention not only comprises the micro-F in the conventional method
2Inject, keep F in the excimer laser
2Steady concentration also comprises the portion gas displacement, reduces the accumulation of impurity, the working life that has prolonged laser inner laser gas effectively.
Description of drawings
Fig. 1 is a kind of excimer laser gas management device structural representation that is used for of the present invention;
Fig. 2 is a kind of excimer laser gas delivery method realization flow figure that is used for of the present invention;
Among the figure: 1 is excimer laser, and 2 is monitoring modular, and 3 is voltage control module, and 4 is the gas delivery control module; 5 are the gas injection jar, and 6 is vacuum pump, and 7 is the halogen gas processing unit, and 8 is flow restricter; 9 is first pressure sensor, and 10 is second pressure sensor, and 11 is the first controllable electromagnetic valve, and 12 is the second controllable electromagnetic valve; 13 is the 3rd controllable electromagnetic valve, and 14 is the 4th controllable electromagnetic valve, and 15 is the 5th controllable electromagnetic valve; 16 is the 6th controllable electromagnetic valve, and 17 is the 7th controllable electromagnetic valve, and 18 is the 8th controllable electromagnetic valve.
Embodiment
As shown in Figure 1, the excimer laser gas management device that the present invention provides comprises excimer laser 1, monitoring modular 2, voltage control module 3, gas delivery control module 4, gas injection jar 5, vacuum pump 6, halogen gas processing unit 7, flow restricter 8, first pressure sensor 9, second pressure sensor 10, the first controllable electromagnetic valve 11, the second controllable electromagnetic valve 12, the 3rd controllable electromagnetic valve 13, the 4th controllable electromagnetic valve 14, the 5th controllable electromagnetic valve 15, the 6th controllable electromagnetic valve 16, the 7th controllable electromagnetic valve 17 and the 8th controllable electromagnetic valve 18; Laser working gas is by halogen gas F in the excimer laser 1
2, rare gas Ar, buffer gas Ne and four kinds of gas compositions of inert gas He; Excimer laser 1 output laser pulse; By monitoring modular 2 monitoring pulse energies, spectral line live width, wavelength related work parameter; And provide and feed back signal to voltage control module 3 and gas management control module 4, voltage control module 3 changes the size of operating voltage according to the pulse energy of monitoring, guarantees that excimer laser 1 is operated under the pattern of energy constant; Voltage control module 3 is given gas delivery control module 4 with the operating voltage signal feedback simultaneously, and gas delivery control module 4 comprises F
2The concentration control algolithm can be according to F in the excimer laser 1 running parameter estimation laser working gas of monitoring modular 2 and voltage control module 3 feedbacks
2Consumption; The first controllable electromagnetic valve 11 passes through the circulation that gas line links to each other with the gas cylinder that stores He and controls He; He is used for residual laser working gas in purge gas line and the excimer laser chamber, the second controllable electromagnetic valve 12, the 3rd controllable electromagnetic valve 13, the 4th controllable electromagnetic valve 14 through gas line respectively with store laser working gas F
2The continuous also circulation of control gaseous of the gas cylinder of/He mist, Ar, Ne; The 5th controllable electromagnetic valve 15 links to each other with gas injection jar 5 through gas line; The control laser working gas enters into gas injection jar 5; Gas injection jar 5 is used for the laser working gas of proportioning variable concentrations, and the 6th controllable electromagnetic valve 16 links to each other with excimer laser 1 through gas line with the 7th controllable electromagnetic valve 17, and the control laser working gas is entered in the laser cavity by gas cylinder or gas injection jar 5; Lay flow restricter 8 on the gas line at the 6th controllable electromagnetic valve 16 places; Flow restricter 8 is the non-electric control valve of the very little one-way flow of flow coefficient, is in opening usually, because F in the laser working gas
2Low with Ar concentration, flow restricter 8 is used to reduce F
2Get into the flow velocity of laser cavity with Ar, can accurately control F in the laser cavity
2Concentration with Ar; The 8th controllable electromagnetic valve 18, vacuum pump 6 and halogen gas processing unit 7 are placed on the gas line of exhaust; The 8th controllable electromagnetic valve 18 is used for the laser working gas in emission gases pipeline and the excimer laser chamber with vacuum pump 6, and halogen gas processing unit 7 is used for the F of filtering emission laser working gas
2The gas pressure intensity of first pressure sensor, 9 monitoring gas injection jars 5; And the pressure signal of monitoring fed back to gas delivery control module 4, gas delivery control module 4 is controlled the opening and closing of corresponding controllable electromagnetic valve according to the pressure signal of feedback, accomplishes the distribution operation of gas injection jar 5; Gas pressure intensity in second pressure sensor, 10 monitoring excimer lasers, 1 chamber; And the pressure signal of monitoring fed back to gas delivery control module 4, gas delivery control module 4 is controlled the opening and closing of corresponding controllable electromagnetic valve according to the pressure signal of feedback, accomplishes the ventilation fully of excimer laser 1 and operates with gas injection.
As shown in Figure 1, gas injection jar 5 adopts the method for pressure monitoring and feedback to accomplish distribution operation, F in the laser working gas
2, He, Ar, Ne concentration ratio can be expressed as the pressure ratio, gas delivery control module 4 is opened the second controllable electromagnetic valve 12 and the 5th controllable electromagnetic valves 15, F
2/ He mist enters into gas pressure intensity in gas injection jar 5, the first pressure sensors 9 monitoring gas injection jars 5 by gas cylinder through gas line, and pressure signal is fed back to gas delivery control module 4, works as F
2After/He mixed gas pressure intensity reached set point, gas delivery control module 4 was closed the second controllable electromagnetic valve 12, opened the 3rd controllable electromagnetic valve 13; Ar enters into gas injection jar 5 by gas cylinder through gas line, and after Ar pressure reached set point, gas delivery control module 4 was closed the 3rd controllable electromagnetic valve 13; Open the 4th controllable electromagnetic valve 14; Ne enters into gas injection jar 5 by gas cylinder through gas line, and after Ne pressure reached set point, gas delivery control module 4 was closed the 4th controllable electromagnetic valve 14 and the 5th controllable electromagnetic valve 15; Gas injection jar 5 is accomplished the distribution operation, different pressure is set than the laser working gas that can prepare variable concentrations.
As shown in Figure 1; Excimer laser 1 operation of taking a breath fully; Earlier the laser working gas behind the task on the excimer laser 1 is discharged, gas delivery control module 4 is opened the 7th controllable electromagnetic valve 17, the 8th controllable electromagnetic valve 18 and vacuum pump 6, and laser working gas is discharged in the atmosphere; When gas pressure intensity is lower than set point in the laser cavity; Gas delivery control module 4 is closed the 7th controllable electromagnetic valve 17, the 8th controllable electromagnetic valve 18 and vacuum pump 6, in laser cavity, charges into new laser working gas again, adopts the method for pressure monitoring and feedback equally; Gas delivery control module 4 is opened the second controllable electromagnetic valve 12 and the 6th controllable electromagnetic valve 16, F
2/ He mist enters in excimer laser 1, the second pressure sensor 10 monitoring excimer lasers 1 gas pressure intensity through gas line through flow restricter 8 by gas cylinder, and pressure signal is fed back to gas delivery control module 4, works as F
2After/He mixed gas pressure intensity reaches set point; Gas delivery control module 4 is closed the second controllable electromagnetic valve 12; Open the 3rd controllable electromagnetic valve 13, Ar is got in the excimer laser 1, after Ar pressure reaches set point through flow restricter 8 through gas line by gas cylinder; Gas delivery control module 4 is closed the 3rd controllable electromagnetic valve 13 and the 6th controllable electromagnetic valve 16; Open the 4th controllable electromagnetic valve 14 and the 7th controllable electromagnetic valve 17, Ne enters into excimer laser 1 by gas cylinder through gas line, after Ne pressure reaches set point; Gas delivery control module 4 is closed the 4th controllable electromagnetic valve 14 and the 7th controllable electromagnetic valve 17, and excimer laser 1 is accomplished ventilation operation fully.
As shown in Figure 1, the gas injection operation of excimer laser 1 is divided into two kinds: a kind of micro-F of being
2Inject, excimer laser is after 1 work a period of time, because F in the laser working gas
2Concentration reduces, and needs to replenish F
2To keep laser steady operation, the F that gas delivery control module 4 comprises
2The concentration control algolithm is to F
2Consumption is estimated, F
2Consumption can represent that gas delivery control module 4 is opened the second controllable electromagnetic valve 12 and the 6th controllable electromagnetic valve 16, F with pressure
2/ He mist directly is injected in the excimer laser 1 through gas line, and the gas pressure intensity in second pressure sensor, 10 monitoring excimer lasers, 1 chamber is as pressure recruitment and F
2When consumption was identical, gas delivery control module 4 was closed the second controllable electromagnetic valve 12 and the 6th controllable electromagnetic valve 16; Another kind of is that portion gas is replaced; Be used to reduce the accumulation of impurity in the laser cavity; Gas delivery control module 4 is opened the 5th controllable electromagnetic valve 15 and the 7th controllable electromagnetic valve 17, and the part laser working gas is injected in the excimer laser 1 through gas line by gas injection jar 5, when the pressure recruitment reaches set point; Gas delivery control module 4 is closed the 5th controllable electromagnetic valve 15 and the 7th controllable electromagnetic valve 17; Treat excimer laser 1 after a period of stabilisation, gas delivery control module 4 is opened the 7th controllable electromagnetic valve 17, the 8th controllable electromagnetic valve 18 and vacuum pump 6, discharges the laser working gas of corresponding value; Gas pressure intensity returns to initial value in the excimer laser 1, accomplishes the portion gas displacement.
As shown in Figure 2, the excimer laser gas delivery method that the present invention proposes may further comprise the steps:
(1) through the best F of measuring excimer laser
2Concentration, optimum operating voltage, and surveying work voltage V, pulse energy E, spectral line live width E95, wavelength X running parameter and F
2The variation relation of concentration and proportionality coefficient k
i, confirm operating voltage V
REF, pulse energy E
REF, breadth of spectrum line E95
REF, wavelength X
REFThe running parameter reference value is confirmed T blanking time of maximum working voltage Vmax and each gas injection;
For example, when measuring F
2During the variation relation of concentration and operating voltage V, keep excimer laser output pulse energy E constant, change the F in the laser working gas
2Concentration is measured different F
2Operating voltage V under the concentration can draw out F
2The change curve of concentration and operating voltage V, k
1Be F
2Consumption Δ F
2Proportionality coefficient with operating voltage V variation delta V;
When measuring F
2During the variation relation of concentration and spectral line live width E95, as stated, keep excimer laser output pulse energy E constant, change the F in the laser working gas
2Concentration is measured different F
2The spectral line live width E95 of excimer laser output laser pulse can draw out F under the concentration
2The change curve of concentration and spectral line live width E95, k
2Be F
2Consumption Δ F
2Proportionality coefficient with spectral line live width E95 variation delta E95;
(2) excimer laser operation output laser pulse; By monitoring module monitors pulse energy, spectral line live width, wavelength running parameter; And provide and feed back signal to voltage control module and gas management control module; Voltage control module is given gas delivery control module, gas delivery control module writing task voltage V, pulse energy E, spectral line live width E95, wavelength X running parameter and operating time t with the laser operating voltage signal feedback;
(3) when the operating voltage V that measures surpassed admissible maximum working voltage Vmax, excimer laser quit work and takes a breath fully, after the ventilation operation is accomplished fully, restarts excimer laser, and the operating procedure of taking a breath fully is following:
(a) laser working gas after excimer laser work last time is discharged; The gas delivery control module is opened the 7th controllable electromagnetic valve, the 8th controllable electromagnetic valve and vacuum pump; Laser working gas is discharged in the atmosphere; When gas pressure intensity is lower than set point in the laser cavity, close the 7th controllable electromagnetic valve, the 8th controllable electromagnetic valve and vacuum pump;
(b) in the excimer laser chamber, charge into new laser working gas, adopt the method for pressure monitoring and feedback, the gas delivery control module is opened the second controllable electromagnetic valve and the 6th controllable electromagnetic valve, F
2/ He mist enters into excimer laser through gas line through flow restricter by gas cylinder, gas pressure intensity in the second pressure sensor monitoring excimer laser, and pressure signal fed back to the gas delivery control module, work as F
2After/He mixed gas pressure intensity reached set point, the gas delivery control module was closed the second controllable electromagnetic valve, and Ar charges into according to identical method with Ne, and different is that Ne enters into excimer laser through the 7th controllable electromagnetic valve;
(4) if but operating voltage in allowed band, excimer laser continues operation, when operating time t equals gas injection T blanking time, the F in the gas delivery control module
2The concentration control algolithm needs according to F in the excimer laser running parameter estimation laser working gas that obtains
2Consumption can select for use one or several excimer laser running parameter to estimate, if select an excimer laser running parameter operating voltage V estimation F for use
2Consumption is according to formula
(1) obtains F
2Consumption
k
1(V-V
REF)＝ΔF
2 (1)
Wherein, k
1F for measuring
2Consumption Δ F
2With the proportionality coefficient of operating voltage V variation delta V, V
REFBe reference voltage level;
When selecting two excimer laser running parameter operating voltage V and spectral line live width E95 estimation F for use
2Consumption obtains F according to formula (2)
2Consumption
α
1k
1(V-V
REF)+α
2k
2(E95-E95
REF)＝ΔF
2 (2)
Wherein, k
2F for measuring
2Consumption Δ F
2With the proportionality coefficient of spectral line live width E95 variation delta E95, E95
REFFor with reference to line width values, α
1, α
2Be coefficient of relationship, α
1+ α
2=1,0＜α
1＜1,0＜α
2＜1;
Can select for use different excimer laser running parameters to F according to actual conditions
2Consumption is estimated;
(5) according to the F that estimates
2Consumption, gas delivery control module are carried out the gas injection operation, and method of gas injection is divided into two kinds in excimer laser:
(a) micro-F
2Inject, the gas delivery control module is opened the second controllable electromagnetic valve and the 6th controllable electromagnetic valve, F
2/ He mist is injected in the excimer laser through flow restricter through gas line, and gas pressure intensity in the second pressure sensor monitoring excimer laser is as pressure recruitment and F
2When consumption is identical, close the second controllable electromagnetic valve and the 6th controllable electromagnetic valve;
(b) portion gas displacement; Be used to reduce the accumulation of impurity in the excimer laser chamber, the gas delivery control module is opened the 5th controllable electromagnetic valve and the 7th controllable electromagnetic valve, and the part laser working gas is injected in the excimer laser through gas line by the gas injection jar; When the pressure recruitment reaches set point; Close the 5th controllable electromagnetic valve and the 7th controllable electromagnetic valve, treat excimer laser after a period of stabilisation, open the 7th controllable electromagnetic valve, the 8th controllable electromagnetic valve and vacuum pump; Discharge the laser working gas of corresponding value; Gas pressure intensity returns to initial value in the excimer laser, closes the 7th controllable electromagnetic valve, the 8th controllable electromagnetic valve and vacuum pump then, the every separated micro-F several times of portion gas displacement
2Carry out once after the injection.
Claims (5)
1. one kind is used for the excimer laser gas management device, it is characterized in that: comprise excimer laser (1), monitoring modular (2), voltage control module (3), gas delivery control module (4), gas injection jar (5), vacuum pump (6), halogen gas processing unit (7), flow restricter (8), first pressure sensor (9), second pressure sensor (10), the first controllable electromagnetic valve (11), the second controllable electromagnetic valve (12), the 3rd controllable electromagnetic valve (13), the 4th controllable electromagnetic valve (14), the 5th controllable electromagnetic valve (15), the 6th controllable electromagnetic valve (16), the 7th controllable electromagnetic valve (17) and the 8th controllable electromagnetic valve (18); Laser working gas is by halogen gas F in the excimer laser (1)
2, rare gas Ar, buffer gas Ne and four kinds of gas compositions of inert gas He; Excimer laser (1) output laser pulse by monitoring modular (2) monitoring pulse energy, spectral line live width and wavelength related work parameter, and provides and feeds back signal to voltage control module (3) and gas management control module (4); Voltage control module (3) guarantees that according to the size of the pulse energy change operating voltage of monitoring excimer laser (1) is operated under the pattern of energy constant, and voltage control module (3) is given gas delivery control module (4) with the operating voltage signal feedback simultaneously; Gas delivery control module (4) comprises F
2The concentration control algolithm is according to F in excimer laser (1) the running parameter estimation laser working gas of monitoring modular (2) and voltage control module (3) feedback
2Consumption; The first controllable electromagnetic valve (11) passes through the circulation that gas line links to each other with the gas cylinder that stores He and controls He, and He is used for laser working gas residual in purge gas line and the laser cavity; The second controllable electromagnetic valve (12), the 3rd controllable electromagnetic valve (13) and the 4th controllable electromagnetic valve (14) through gas line respectively with store laser working gas F
2The gas cylinder of/He mist, Ar, Ne links to each other; And the circulation of control laser working gas; The 5th controllable electromagnetic valve (15) links to each other with gas injection jar (5) through gas line, and the control laser working gas enters into gas injection jar (5), and gas injection jar (5) is used for the laser working gas of proportioning variable concentrations; The 6th controllable electromagnetic valve (16) links to each other with excimer laser (1) through gas line with the 7th controllable electromagnetic valve (17); The control laser working gas is entered in the laser cavity by gas cylinder or gas injection jar (5); Lay flow restricter (8) on the gas line at the 6th controllable electromagnetic valve (16) place, because F in the laser working gas
2Low with Ar concentration, flow restricter (8) is used to reduce F
2Get into the flow velocity of laser cavity with Ar, can accurately control F in the laser cavity
2Concentration with Ar; The 8th controllable electromagnetic valve (18), vacuum pump (6) and halogen gas processing unit (7) are placed on the gas line of exhaust, and the 8th controllable electromagnetic valve (18) and vacuum pump (6) are used for the laser working gas in emission gases pipeline and excimer laser (1) chamber; Halogen gas processing unit (7) is used for the F of filtering emission laser working gas
2The gas pressure intensity of first pressure sensor (9) monitoring gas injection jar (5); And with the monitoring pressure signal feed back to gas delivery control module (4); Gas delivery control module (4) is controlled the opening and closing of corresponding controllable electromagnetic valve according to the pressure signal of feedback, accomplishes the distribution operation of gas injection jar (5); Gas pressure intensity in second pressure sensor (10) monitoring excimer laser (1) chamber; And with the monitoring pressure signal feed back to gas delivery control module (4); Gas delivery control module (4) is controlled opening and closing, the ventilation fully of completion excimer laser (1) and the gas injection operation of corresponding controllable electromagnetic valve according to the pressure signal of feedback.
2. a kind of excimer laser gas management device that is used for according to claim 1; It is characterized in that: the pressure signal that said gas delivery control module (4) is fed back according to first pressure sensor (9) is controlled the opening and closing of corresponding controllable electromagnetic valve, and the process of accomplishing the distribution operation of gas injection jar (5) is: F in the laser working gas
2, He, Ar, Ne concentration ratio can be expressed as the pressure ratio, gas delivery control module (4) is opened the second controllable electromagnetic valve (12) and the 5th controllable electromagnetic valve (15), F
2/ He mist enters into gas injection jar (5) by gas cylinder through gas line, and first pressure sensor (9) is monitored gas pressure intensity in the gas injection jar (5), and pressure signal is fed back to gas delivery control module (4), works as F
2After/He mixed gas pressure intensity reaches set point; Gas delivery control module (4) is closed the second controllable electromagnetic valve (12), opens the 3rd controllable electromagnetic valve (13), and Ar enters into gas injection jar (5) by gas cylinder through gas line; After Ar pressure reaches set point; Gas delivery control module (4) is closed the 3rd controllable electromagnetic valve (13), opens the 4th controllable electromagnetic valve (14), and Ne enters into gas injection jar (5) by gas cylinder through gas line; After Ne pressure reaches set point; Gas delivery control module (4) is closed the 4th controllable electromagnetic valve (14) and the 5th controllable electromagnetic valve (15), and gas injection jar (5) is accomplished the distribution operation, different pressure is set than the laser working gas that can prepare variable concentrations.
3. a kind of excimer laser gas management device that is used for according to claim 1; It is characterized in that: said gas delivery control module (4) is controlled the opening and closing of corresponding controllable electromagnetic valve according to the pressure signal of second pressure sensor (10) feedback; The operating process of ventilation fully of accomplishing excimer laser (1) is: first with the laser working gas discharge behind the last task of excimer laser (1); Gas delivery control module (4) is opened the 7th controllable electromagnetic valve (17), the 8th controllable electromagnetic valve (18) and vacuum pump (6); Laser working gas is discharged in the atmosphere, and when gas pressure intensity was lower than set point in the laser cavity, gas delivery control module (4) was closed the 7th controllable electromagnetic valve (17), the 8th controllable electromagnetic valve (18) and vacuum pump (6); In laser cavity, charge into new laser working gas again; The same method that adopts pressure monitoring and feedback, gas delivery control module (4) is opened the second controllable electromagnetic valve (12) and the 6th controllable electromagnetic valve (16), F
2/ He mist enters into excimer laser (1) through gas line through flow restricter (8) by gas cylinder, and second pressure sensor (10) is monitored the gas pressure intensity in excimer laser (1) chamber, and pressure signal is fed back to gas delivery control module (4), works as F
2After/He mixed gas pressure intensity reaches set point; Gas delivery control module (4) is closed the second controllable electromagnetic valve (12); Open the 3rd controllable electromagnetic valve (13), Ar is got in the excimer laser (1), after Ar pressure reaches set point through flow restricter (8) through gas line by gas cylinder; Gas delivery control module (4) is closed the 3rd controllable electromagnetic valve (13) and the 6th controllable electromagnetic valve (16); Open the 4th controllable electromagnetic valve (14) and the 7th controllable electromagnetic valve (17), Ne enters into excimer laser (1) by gas cylinder through gas line, after Ne pressure reaches set point; Gas delivery control module (4) is closed the 4th controllable electromagnetic valve (14) and the 7th controllable electromagnetic valve (17), and excimer laser (1) is accomplished ventilation operation fully.
4. a kind of excimer laser gas management device that is used for according to claim 1; It is characterized in that: the pressure signal that said gas delivery control module (4) is fed back according to second pressure sensor (10) is controlled the opening and closing of corresponding controllable electromagnetic valve, accomplishes excimer laser (1) gas injection operating process and is divided into two kinds: a kind of micro-F of being
2Inject, excimer laser (1) is after work a period of time, because F in the laser working gas
2Concentration reduces, and needs to replenish F
2To keep the laser steady operation, gas delivery control module (4) is to F
2Consumption is estimated, F
2Consumption can represent that gas delivery control module (4) is opened the second controllable electromagnetic valve (12) and the 6th controllable electromagnetic valve (16), F with pressure
2/ He mist is injected in the excimer laser (1) through gas line, and the gas pressure intensity in second pressure sensor (10) monitoring excimer laser (1) chamber is as pressure recruitment and F
2When consumption was identical, gas delivery control module (4) was closed the second controllable electromagnetic valve (12) and the 6th controllable electromagnetic valve (16); Another kind of is that portion gas is replaced; Be used to reduce the accumulation of impurity in the laser cavity; Gas delivery control module (4) is opened the 5th controllable electromagnetic valve (15) and the 7th controllable electromagnetic valve (17), and the part laser working gas is injected in the excimer laser (1), when the pressure recruitment reaches set point through gas line by gas injection jar (5); Gas delivery control module (4) is closed the 5th controllable electromagnetic valve (15) and the 7th controllable electromagnetic valve (17); Treat excimer laser (1) after a period of stabilisation, gas delivery control module (4) is opened the 7th controllable electromagnetic valve (17), the 8th controllable electromagnetic valve (18) and vacuum pump (6), discharges the laser working gas of corresponding value; Gas pressure intensity in excimer laser (1) chamber returns to initial value, accomplishes the portion gas displacement.
5. one kind is used for excimer laser gas delivery method, it is characterized in that performing step is following:
(1) through the best F of measuring excimer laser
2Concentration, optimum operating voltage, and surveying work voltage V, pulse energy E, spectral line live width E95 and wavelength X running parameter and F
2The variation relation of concentration and proportionality coefficient k
i, confirm reference work voltage V
REF, the reference pulse energy E
REF, with reference to spectral line live width E95
REF, reference wavelength λ
REFThe running parameter reference value is confirmed T blanking time of maximum working voltage Vmax and each gas injection;
(2) excimer laser brings into operation and output laser pulse; By monitoring module monitors pulse energy, spectral line live width and wavelength running parameter; And provide and feed back signal to voltage control module and gas management control module; Voltage control module is given gas delivery control module, gas delivery control module writing task voltage V, pulse energy E, spectral line live width E95, wavelength X and operating time t with excimer laser operating voltage signal feedback;
(3) when the operating voltage V that measures surpassed admissible maximum working voltage Vmax, excimer laser quit work and takes a breath fully, after the ventilation operation is accomplished fully, restarts excimer laser;
(4) if but operating voltage in allowed band, excimer laser continues operation, when operating time t equals gas injection T blanking time, the F in the gas delivery control module
2The concentration control algolithm needs according to F in the excimer laser running parameter estimation laser working gas that obtains
2Consumption can select for use one or several excimer laser running parameter to estimate, if select an excimer laser running parameter operating voltage V estimation F for use
2Consumption obtains F according to formula (1) formula
2Consumption
k
1(V-V
REF)＝ΔF
2 (1)
Wherein, k
1F for measuring
2Consumption Δ F
2With the proportionality coefficient of operating voltage V variation delta V, V
REFBe the reference work magnitude of voltage;
When selecting two excimer laser running parameter operating voltage V and spectral line live width E95 estimation F for use
2Consumption obtains according to formula (2)
α
1k
1(V-V
REF)+α
2k
2(E95-E95
REF)＝ΔF
2 (2)
Wherein, k
2F for measuring
2Consumption Δ F
2With the proportionality coefficient with reference to spectral line live width E95 variation delta E95, E95
REFFor with reference to spectral line line width values, α
1, α
2Be coefficient of relationship, α
1+ α
2=1,0＜α
1＜1,0＜α
2＜1;
Can select for use different excimer laser running parameters to F according to actual conditions
2Consumption is estimated;
(5) according to the F that estimates
2Consumption, the gas delivery control module is controlled the opening and closing of corresponding controllable electromagnetic valve, adopts the method for pressure monitoring and signal feedback to accomplish the gas injection operation, and the gas injection operation is divided into two kinds: a kind of micro-F of being
2Inject, another kind ofly be the portion gas displacement, when excimer laser is worked, can be at micro-F several times
2Carry out a portion gas displacement after injecting, to reduce the accumulation of impurity in the laser cavity.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011101325261A CN102231469B (en) | 2011-05-20 | 2011-05-20 | Gas management apparatus and method for excimer laser |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011101325261A CN102231469B (en) | 2011-05-20 | 2011-05-20 | Gas management apparatus and method for excimer laser |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102231469A CN102231469A (en) | 2011-11-02 |
| CN102231469B true CN102231469B (en) | 2012-07-04 |
Family
ID=44844016
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2011101325261A Expired - Fee Related CN102231469B (en) | 2011-05-20 | 2011-05-20 | Gas management apparatus and method for excimer laser |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN102231469B (en) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102790348B (en) * | 2012-04-10 | 2015-03-25 | 中国科学院安徽光学精密机械研究所 | High pulse repetition frequency ArF (argon fluoride) excimer laser pulse energy control system |
| CN104332806B (en) * | 2014-11-02 | 2017-06-13 | 中国科学院光电技术研究所 | A kind of gas delivery method for extending the excimer laser laser working gas life-span |
| WO2017081819A1 (en) * | 2015-11-13 | 2017-05-18 | ギガフォトン株式会社 | Laser gas purifying system and laser system |
| US9762023B2 (en) * | 2015-12-21 | 2017-09-12 | Cymer, Llc | Online calibration for repetition rate dependent performance variables |
| CN105846290B (en) * | 2016-06-22 | 2018-12-14 | 中国科学院光电研究院 | A kind of high-purity working gas delivery system of excimer laser and method |
| CN107706092B (en) | 2017-10-13 | 2021-01-26 | 京东方科技集团股份有限公司 | Excimer laser annealing equipment |
| CN109217080A (en) * | 2018-10-17 | 2019-01-15 | 广州市激光技术应用研究所有限公司 | A kind of excimer laser gas control method and device |
| CN109462134A (en) * | 2018-12-25 | 2019-03-12 | 中国科学院长春光学精密机械与物理研究所 | A kind of miniature laser chamber and gas laser |
| CN109638618A (en) * | 2019-01-27 | 2019-04-16 | 北京科益虹源光电技术有限公司 | A kind of multi-parameters sampling control system of excimer laser |
| TWI689680B (en) * | 2019-04-25 | 2020-04-01 | 華豐應用設備有限公司 | Device and method for automatically exhausting gas pipeline |
| CN114039262B (en) * | 2021-10-22 | 2023-10-20 | 中国科学院长春光学精密机械与物理研究所 | Miniaturized non-chained pulse DF/HF laser device and excitation method thereof |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5123983A (en) * | 1990-08-24 | 1992-06-23 | E. I. Du Pont De Nemours And Company | Gas management system for closely-spaced laydown jets |
| CN1494185A (en) * | 2003-08-22 | 2004-05-05 | 中国科学院上海光学精密机械研究所 | Gas laser having isolating valve |
| US7305019B2 (en) * | 2005-01-05 | 2007-12-04 | Intel Corporation | Excimer laser with electron emitters |
| CN102035132B (en) * | 2009-09-28 | 2012-05-23 | 中国科学院电子学研究所 | Hot capacity gas laser |
-
2011
- 2011-05-20 CN CN2011101325261A patent/CN102231469B/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| CN102231469A (en) | 2011-11-02 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN102231469B (en) | Gas management apparatus and method for excimer laser | |
| CN108604763B (en) | Gas mixture control in gas discharge light sources | |
| JP3572259B2 (en) | Fluorine control system for excimer laser | |
| US6151350A (en) | Gas laser | |
| JP4650881B2 (en) | Excimer laser device, laser gas exchange method and partial gas exchange amount calculation method | |
| EP3591096B1 (en) | Water electrolysis system and method of operating water electrolysis system | |
| CN101959594B (en) | Surface treatment apparatus | |
| CN111418103B (en) | Method for determining the operating state of an electrochemical system | |
| CN104332806B (en) | A kind of gas delivery method for extending the excimer laser laser working gas life-span | |
| TWI702631B (en) | Method of controlling power output by a power supply configured to supply power to a plasma torch in a gas treatment system and computer program to be executed by a processor | |
| CN102834549B (en) | Gas generation apparatus and gas generating processes | |
| JP4683977B2 (en) | Hydrogen peroxide injection control method and apparatus in accelerated oxidation water treatment method | |
| US11949202B2 (en) | Gas management system | |
| JPH0487388A (en) | Excimer laser | |
| KR20010051655A (en) | Excimer laser apparatus | |
| Dunstan et al. | Increased availability of lithography light sources using advanced gas management | |
| CN102025101A (en) | Operation method of quasimolecule laser system | |
| US20220094133A1 (en) | Excimer laser system with long service intervals | |
| JP3779010B2 (en) | Gas supply control device and gas supply control method for excimer laser device | |
| JPH10173273A (en) | Excimer laser device | |
| JPH03276686A (en) | Gas laser | |
| JPH10154842A (en) | Excimer laser | |
| JPH0316286A (en) | Light source for excimer laser | |
| KR200447662Y1 (en) | Nitrogen dilution system for semiconductor production | |
| JP2014126342A (en) | Abatement device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20120704 |