CN102211772B - Polysilicon reduction furnace with concave mirror surfaces on inner wall and concave mirror surfaces for polysilicon reduction furnace - Google Patents
Polysilicon reduction furnace with concave mirror surfaces on inner wall and concave mirror surfaces for polysilicon reduction furnace Download PDFInfo
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- CN102211772B CN102211772B CN 201110096953 CN201110096953A CN102211772B CN 102211772 B CN102211772 B CN 102211772B CN 201110096953 CN201110096953 CN 201110096953 CN 201110096953 A CN201110096953 A CN 201110096953A CN 102211772 B CN102211772 B CN 102211772B
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Abstract
The invention discloses a polysilicon reduction furnace with concave mirror surfaces on an inner wall and the concave mirror surfaces for the polysilicon reduction furnace. The reduction furnace is characterized in that the concave mirror surfaces with a high polishing degree are installed on the inner wall of the reduction furnace; various concave mirror surfaces are tightly adjacent in turn and are fixed on the inner wall of the furnace body through bolts; the number of the installed mirror surfaces is equal to that of silicon rods at the outermost ring inside the furnace, the mirror surfaces are in one-to-one correspondence with the silicon rods at the outermost ring, and the axis of the concave surface of the mirror surface is coincided with the axis of the silicon rod corresponding to the mirror surface. Through the concave mirror surfaces with the high polishing degree, the energy which is radiated to the inner wall of the furnace body by virtue of the high temperature silicon rod is reflected back to the inside of the furnace, and the reflected energy is focused on the silicon rod, thus by using a photospot technique, the energy loss caused by the high temperature radiation of the silicon rod is further reduced on the basis of polishing the inner wall of the furnace body, and a complicated process that multi-polishing is carried out on the inner wall of the furnace body is avoided, thereby greatly reducing the production cost of the polysilicon reduction furnace.
Description
Technical field
The present invention relates to the production technical field of polysilicon, particularly a kind of polycrystalline silicon reducing furnace and polycrystalline silicon reducing furnace spill minute surface.
Background technology
At present, improved Siemens is mainly adopted in the production of polysilicon.In improved Siemens, the principal reaction that reduction workshop section occurs is that trichlorosilane is generated silicon and hydrogenchloride by hydrogen reducing, and this reaction is carried out in polycrystalline silicon reducing furnace.When reacting, polycrystalline silicon reducing furnace is in the energising condition of high temperature, temperature of reaction remains on about 1050～1150 ℃, body of heater chuck, chassis and the electrode etc. of reduction furnace locate all to be furnished with recirculating cooling water system simultaneously, come to carry out heat exchange to satisfy body of heater temperature requirement everywhere with the furnace high-temperature environment.
Existing polycrystalline silicon reducing furnace energy consumption is very large, can reach 60～100KWh/kg polysilicon, and the reduction power consumption of production of polysilicon accounts for about 70% of total cost.Simultaneously, also have serious power loss problem in the reduction furnace, the power loss major cause is the hyperthermia radiation loss of polycrystalline silicon rod.Polycrystalline silicon rod transfers energy on the reduction furnace inwall by hyperthermia radiation, then by the chuck water coolant heat is taken away.Usually the temperature of reduction furnace inwall is about 600 ℃, and the temperature of silicon rod is about 1050～1150 ℃, and silicon rod is very large to the power loss of reduction furnace inwall by hyperthermia radiation like this.The power loss that causes in order to reduce hyperthermia radiation, the manufacturer of some polysilicons carries out polished finish with the inwall of reduction furnace, in the energy reflection that the smooth finish that improves wall can be radiated a part inwall melts down, reduces power loss.Improve like this and reduced energy consumption, but also have some problems simultaneously.Because the trichlorosilane reduction reaction can produce the corrosive gasess such as hydrogenchloride, the inwall of polishing was often by heavy corrosion after reduction furnace was once produced and finished, and inboard wall of furnace body need to be polished again before next stove drives to produce.Will strengthen like this complicacy of production operation, improve production cost.Simultaneously, we wish to continue to improve production unit and the technology of polycrystalline silicon reducing furnace, further reduce energy consumption and save cost.
Summary of the invention
Inwall of the present invention is installed polycrystalline silicon reducing furnace and the polycrystalline silicon reducing furnace spill minute surface of spill minute surface, purpose is to overcome the above-mentioned shortcoming of prior art and equipment, a kind of polycrystalline silicon reducing furnace of mounting mirror planes on inner wall is provided, the minute surface of installing side in the stove be concave and carry out high polish, in the energy that the spill minute surface can make the high temperature silicon rod be radiated inboard wall of furnace body is reflected and melts down, and the energy that is reflected back is focused on the silicon rod, this optically focused technology can further reduce on the basis of inboard wall of furnace body polishing because the power loss that the silicon rod hyperthermia radiation causes, reduce energy consumption, and avoided inboard wall of furnace body is carried out repeatedly numerous and diverse operation of sanding and polishing, greatly reduced the production cost of polycrystalline silicon reducing furnace.
The present invention is achieved by the following technical solutions:
A kind of inwall of the present invention is installed the polycrystalline silicon reducing furnace of spill minute surface, and the polycrystalline silicon reducing furnace inwall is equipped with the spill minute surface, and each spill minute surface is closely adjacent and fix by bolt and inboard wall of furnace body in turn.
The quantity of minute surface that described inboard wall of furnace body is installed equals the quantity of outmost turns silicon rod in the stove, and minute surface is corresponding one by one with the outmost turns silicon rod, and the axle center of assurance minute surface concave surface follows the silicon rod shaft core position corresponding with it to overlap.
Polycrystalline silicon reducing furnace of the present invention spill minute surface is characterized in that minute surface one side is the plane, need not polishing, and the minute surface opposite side is concave and carries out high polish, and a side and the reduction furnace inwall on its plane are fixed, and concave surface one side is in stove.
Minute surface is stainless steel or silica glass material, and the thickness at the minimum concave surface of spill minute surface place is about 0.2～2mm.
Justify in the center of circle with each root outmost turns silicon rod, and do the circle with chassis of reducing furnace place circumference tangent, determine thus the position of each spill minute surface and the radius of concave surface, each circle of doing simultaneously intersects, and each position of intersecting point has then been determined the width of spill minute surface.
A kind of inwall of the present invention is installed the polycrystalline silicon reducing furnace of spill minute surface, and such as Fig. 1, shown in Figure 3, inboard wall of furnace body is equipped with press polished spill minute surface, and each spill minute surface is closely adjacent and fix by bolt and inboard wall of furnace body in turn.Bolt welding is fixed on the correct position of inboard wall of furnace body, opens bolt hole at individual spill minute surface correspondence position simultaneously, by the bolt and nut binding each spill minute surface is fixed on the reduction furnace inwall during installation.The quantity of the minute surface of installing equals the quantity of outmost turns silicon rod in the stove, and minute surface is corresponding one by one with the outmost turns silicon rod, and the axle center of assurance minute surface concave surface follows the silicon rod shaft core position corresponding with it to overlap.As shown in Figure 4, press polished minute surface can guarantee that the energy that the high temperature silicon rod is radiated inboard wall of furnace body is reflected in the stove, simultaneously because the shaft core position and the one by one corresponding coincidence of outmost turns silicon rod shaft core position of each spill minute surface, so that the energy that reflects by each spill mirror focusing on the silicon rod corresponding with it, can the high temperature energy in the stove be utilized more fully like this, greatly reduce the energy waste that causes owing to hyperthermia radiation, Decrease production cost.Simultaneously, each press polished spill minute surface can be produced specially by producer, and is convenient and swift.Before reduction furnace was driven, only needing minute surface fitted by production requirement be fixed on the inboard wall of furnace body, thereby avoided numerous and diverse inboard wall of furnace body was carried out the sanding and polishing operation.Like this, not only saved time shorten the production of polysilicon cycle, reduced production cost, and the high polish minute surface of professional production has higher level than manual polishing inboard wall of furnace body, further improved the effect that the inboard wall of furnace body reflected energy reduces power loss.
Polycrystalline silicon reducing furnace of the present invention is with recessed row minute surface, and as shown in Figure 3, minute surface one side is the plane, need not polishing, and the minute surface opposite side is concave and carries out high polish.The minute surface material is stainless steel or silica glass, and a side and the reduction furnace inwall on its plane are fixed, and concave surface one side is in stove.The quantity of stove minute surface that inwall is installed should equal the quantity of outmost turns silicon rod in the stove, and minute surface is corresponding one by one with the outmost turns silicon rod, and the axle center of assurance minute surface concave surface follows the silicon rod shaft core position corresponding with it to overlap.The thickness at the minimum concave surface of spill minute surface place is about 0.2～2mm, and the width of minute surface is then determined according to arranging of silicon rod position in different body of heater sizes and the stove with the radius of concave surface.As shown in Figure 3, justify with each root outmost turns silicon rod center of circle, and tangent with chassis of reducing furnace place circumference, the position of each spill minute surface and the radius of concave surface have so just been determined, each circle of doing simultaneously intersects, and each position of intersecting point has determined that then the size of spill minute surface is the width of minute surface.As shown in Figure 4, this press polished spill minute surface can with hyperthermia radiation to the energy reflection of inboard wall of furnace body in stove and focus on each root silicon rod corresponding with minute surface, take full advantage of energy, reduced energy consumption.Simultaneously, each press polished spill minute surface can be produced specially by producer, and is convenient and swift.Before reduction furnace is driven, only need minute surface is fixed on the inboard wall of furnace body by the production requirement applying, directly it is unloaded when needing cleaning or replacing, and after will cleaning or new minute surface be installed in inboard wall of furnace body and get final product, contaminated minute surface also can be cleaned by special messenger or specialized factory, afterwards can recycle.Can avoid like this before each the driving reduction furnace inwall being carried out numerous and diverse operation that manual polishing polishes, simplify Production Flow Chart, reduce production cost.
The invention is characterized in that the polycrystalline silicon reducing furnace inwall is equipped with press polished spill minute surface, the quantity of the minute surface of installing equals the quantity of outmost turns silicon rod in the stove, minute surface is corresponding one by one with the outmost turns silicon rod, and the axle center of assurance minute surface concave surface follows the silicon rod shaft core position corresponding with it to overlap.
Effect of the present invention and advantage are:
(1) in the press polished minute surface energy reflection that major part can be radiated inboard wall of furnace body melts down, simultaneously because the shaft core position and the one by one corresponding coincidence of outmost turns silicon rod shaft core position of each spill minute surface, so that the energy that reflects by each spill mirror focusing on the silicon rod corresponding with it, can the energy in the stove be utilized more fully like this, the reduction furnace of not processing with inboard wall of furnace body or only carrying out simple polished finish is compared and is greatly reduced the power loss that hyperthermia radiation causes, and has finally reduced production cost.
(2) press polished spill minute surface can be produced specially by producer, and is convenient and swift and have a higher level.Before reduction furnace is driven, only need minute surface is fixed on the inboard wall of furnace body by the production requirement applying, directly it is unloaded when needing cleaning or replacing, and after will cleaning or new minute surface be installed in inboard wall of furnace body and get final product, contaminated minute surface also can be cleaned by special messenger or specialized factory, afterwards can recycle.Can avoid like this before each the driving reduction furnace inwall being carried out numerous and diverse operation that manual polishing polishes, simplify Production Flow Chart, reduce production cost.
Description of drawings
Fig. 1 is the polycrystalline silicon reducing furnace master TV structure synoptic diagram that inwall of the present invention is installed the spill minute surface;
Fig. 2 is polycrystalline silicon reducing furnace of the present invention spill mirror surface structure synoptic diagram;
Fig. 3 is the polycrystalline silicon reducing furnace plan structure synoptic diagram that inwall of the present invention is installed the spill minute surface;
Fig. 4 is the polycrystalline silicon reducing furnace optically focused principle schematic that inwall of the present invention is installed the spill minute surface;
Wherein, 1-polysilicon reduction furnace body inwall, 2-silicon rod, 3-spill minute surface, 4-energy-ray.
Embodiment
The present invention is described in further detail with reference to the accompanying drawings for the below:
Such as Fig. 1, shown in Figure 3, inwall of the present invention is installed the polycrystalline silicon reducing furnace of spill minute surface, inboard wall of furnace body 1 is equipped with press polished spill minute surface 3, and polishing Du Keda Ra0.008 μ m, each spill minute surface 3 are closely adjacent and fix by bolt and inboard wall of furnace body in turn.Bolt welding is fixed on the correct position of inboard wall of furnace body, opens bolt hole at individual spill minute surface correspondence position simultaneously, by the bolt and nut binding each spill minute surface is fixed on the reduction furnace inwall during installation.The quantity that the stove inwall is installed spill minute surface 3 should equal the quantity of outmost turns silicon rod 2 in the stove, and minute surface is corresponding one by one with the outmost turns silicon rod, and the silicon rod shaft core position coincidence corresponding with it followed in the axle center of assurance minute surface 3 concave surfaces.As shown in Figure 2, minute surface 3 one sides are the plane, need not polishing, and the minute surface opposite side is concave and carries out high polish, polishing Du Keda Ra0.008 μ m.Minute surface is stainless steel or silica glass material, and a side and the applying of reduction furnace inwall on its plane is fixing, and concave surface one side is in stove.The thickness at the minimum concave surface of spill minute surface place is about 0.2～2mm, the width of minute surface and the radius of concave surface then according to silicon rod position in different body of heater sizes and the stove arranging determine.As shown in Figure 3, justify with each root outmost turns silicon rod center of circle, and do the circle with chassis of reducing furnace place circumference tangent, the position of each spill minute surface and the radius of concave surface have so just been determined, each circle of doing simultaneously intersects, and each position of intersecting point has determined that then the size of spill minute surface is the width of minute surface.
Polycrystalline silicon reducing furnace can be produced by special producer with the spill minute surface, and is convenient and swift.Before reduction furnace was driven, only needing minute surface fitted by production requirement be fixed on the inboard wall of furnace body, thereby avoided numerous and diverse inboard wall of furnace body was carried out the sanding and polishing operation.Like this, not only saved time shorten the production of polysilicon cycle, and the high polish minute surface of professional production has higher level than manual polishing inboard wall of furnace body, the manual polishing polishing generally can reach Ra0.4 μ m, can reach Ra0.008 μ m and carry out professional polishing by lathe, further improve the effect of inboard wall of furnace body reflected energy.
As shown in Figure 4, when reduction furnace is produced, silicon rod temperature in the stove reaches about 1050～1150 ℃, a large amount of energy is fitted owing to high temperature is radiated and is fixed on the spill minute surface of reduction furnace inwall, because minute surface is by high polish, in the energy reflection that most of radiation is come can being melted down, simultaneously because minute surface is concavity, and the silicon rod axis coinciding corresponding with it followed in the axle center of minute surface, the energy-ray 4 that is reflected back just focuses on the corresponding with it silicon rod, and energy can be fully utilized like this, has greatly reduced the loss that causes owing to radiation, reduce energy consumption, saved production cost.And be subject to polluting when need to clean or change when minute surface, directly it is unloaded from the stove inwall, after cleaning or change by the professional, fit again and be fixed on the reduction furnace inwall, carry out the production of polysilicon.
Arrange according to the different of silicon rod position in different reduction furnace sizes and the stove, the radius of minute surface quantity, width, concave surface and the technical parameters such as concrete arrangement mode of minute surface have different the variation.Person skilled obviously can be within not breaking away from content of the present invention, spirit and scope to operating system as herein described with working method is changed or suitably change and combination, realize the technology of the present invention.Special needs to be pointed out is, the replacement that all are similar and change apparent to those skilled in the artly, they are deemed to be included in spirit of the present invention, scope and the content.
Claims (4)
1. an inwall is installed the polycrystalline silicon reducing furnace of spill minute surface, it is characterized in that the polycrystalline silicon reducing furnace inwall is equipped with the spill minute surface, and each spill minute surface is closely adjacent and fix by bolt and inboard wall of furnace body in turn; Minute surface one side is the plane, need not polishing, and the minute surface opposite side is concave and carries out high polish, and the polishing degree reaches Ra0.008 μ m, and a side and the reduction furnace inwall on its plane are fixed, and concave surface one side is in stove.
2. polycrystalline silicon reducing furnace according to claim 1, it is characterized in that the quantity of minute surface that inboard wall of furnace body is installed equals the quantity of outmost turns silicon rod in the stove, minute surface is corresponding one by one with the outmost turns silicon rod, and the axle center of assurance minute surface concave surface follows the silicon rod shaft core position corresponding with it to overlap.
3. polycrystalline silicon reducing furnace according to claim 1 is characterized in that minute surface is stainless steel or silica glass material, and the thickness at the minimum concave surface of spill minute surface place is 0.2～2mm.
4. polycrystalline silicon reducing furnace according to claim 3, it is characterized in that justifying with the center of circle of each root outmost turns silicon rod, and do the circle with chassis of reducing furnace place circumference tangent, determine thus the position of each spill minute surface and the radius of concave surface, each circle of doing simultaneously intersects, and each position of intersecting point has then been determined the width of spill minute surface.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201110096953 CN102211772B (en) | 2011-04-18 | 2011-04-18 | Polysilicon reduction furnace with concave mirror surfaces on inner wall and concave mirror surfaces for polysilicon reduction furnace |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201110096953 CN102211772B (en) | 2011-04-18 | 2011-04-18 | Polysilicon reduction furnace with concave mirror surfaces on inner wall and concave mirror surfaces for polysilicon reduction furnace |
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| Publication Number | Publication Date |
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| CN102211772A CN102211772A (en) | 2011-10-12 |
| CN102211772B true CN102211772B (en) | 2013-02-06 |
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| CN 201110096953 Expired - Fee Related CN102211772B (en) | 2011-04-18 | 2011-04-18 | Polysilicon reduction furnace with concave mirror surfaces on inner wall and concave mirror surfaces for polysilicon reduction furnace |
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Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1559896A (en) * | 2004-03-08 | 2005-01-05 | 成都蜀菱贸易发展有限公司 | Reduction furnace of hydrogen for polysilicon |
| CN101870471A (en) * | 2010-07-08 | 2010-10-27 | 江苏中能硅业科技发展有限公司 | High-efficiency large polycrystalline silicon reducing furnace |
| CN201785198U (en) * | 2010-06-04 | 2011-04-06 | 成都蜀菱科技发展有限公司 | 30-pair-rod polysilicon reduction furnace |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11335114A (en) * | 1998-05-22 | 1999-12-07 | Kawasaki Steel Corp | Furnace body of heating furnace for purifying silicon |
| JP5059665B2 (en) * | 2008-03-14 | 2012-10-24 | 株式会社トクヤマ | Silicon production equipment |
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2011
- 2011-04-18 CN CN 201110096953 patent/CN102211772B/en not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1559896A (en) * | 2004-03-08 | 2005-01-05 | 成都蜀菱贸易发展有限公司 | Reduction furnace of hydrogen for polysilicon |
| CN201785198U (en) * | 2010-06-04 | 2011-04-06 | 成都蜀菱科技发展有限公司 | 30-pair-rod polysilicon reduction furnace |
| CN101870471A (en) * | 2010-07-08 | 2010-10-27 | 江苏中能硅业科技发展有限公司 | High-efficiency large polycrystalline silicon reducing furnace |
Non-Patent Citations (2)
| Title |
|---|
| JP特开2009-221034A 2009.10.01 |
| JP特开平11-335114A 1999.12.07 |
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