CN102182023A - Light-free T-shaped stitch for embroidery and embroidering method - Google Patents
Light-free T-shaped stitch for embroidery and embroidering method Download PDFInfo
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- CN102182023A CN102182023A CN2011101140034A CN201110114003A CN102182023A CN 102182023 A CN102182023 A CN 102182023A CN 2011101140034 A CN2011101140034 A CN 2011101140034A CN 201110114003 A CN201110114003 A CN 201110114003A CN 102182023 A CN102182023 A CN 102182023A
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Abstract
The invention discloses a light-free T-shaped stitch for embroidery and an embroidering method. At least three layers of embroidering stitches are embroidered from top to bottom on the front face of an embroidered cloth through an embroidering needle and an embroidering thread, wherein each layer of embroidering stitches is formed by adjacently arranging a group of T-shaped embroidering stitch units with stitches having approximately the same length on the front face of the embroidered cloth; when any T-shaped embroidering stitch unit serves as a standard, the tightly adjacent T-shaped embroidering stitch units around the T-shaped embroidering stitch unit are arranged at angles; the lengths of needle feet of the T-shaped embroidering stitch units in each layer of embroidering stitches are gradually reduced from top to bottom; the stitch of the T-shaped embroidering stitch units consists of first needle feet and second needle feet; the first needle feet and the second needle feet are arranged in a shape of 'T' on the front face of the embroidered cloth; an included angle between the first needle feet and the second needle feet is in a range of between 60 and 90 degrees in the shape of 'T'; and the ratio of the length of the first needle feet to the length of the second needle feet is in a range of between 1:0.7 and 1:1.3. The problem that faces and limbs of characters reflect light because of inherent thread light and thread textures of silk threads is solved through the T-shaped stitch and the embroidering method, so breakthrough and innovation are made in Suzhou (a province in China) embroidery in the embroidering method for portraits.
Description
Technical field
The present invention relates to embroidery stitching method and embroidering method, particularly a kind of embroidering method of exempting from the light T shape skill of handling needles and utilizing this skill of handling needles performance character facial or each position of limbs.
Background technology
Embroidery is a kind ofly to draw multi-color cord with the embroidery pin, embroider on textiles by the decorative pattern of design and handles the needle, to embroider a kind of technology of mark formation floral designs.The anglicanum of China has more than 2000 year history, and wherein, Suzhou embroidery, Guangdong embroidery, Hunan embroidery and Sichuan embroidery are collectively referred to as " the four famous embroideries " of China.
Embroidering method is to utilize to embroider pin and embroider line, adopts one or more skill of handling needles in the method for embroidering the floral designs of embroidering out on the cloth, and wherein the skill of handling needles is meant the method for handling the needle in the embroidery, also is the organizational form of stitch in the embroidery.Embroidery stitching method has tens of kinds in traditional Suzhou embroidery, but really is used to show the face of personal portrait or the skill of handling needles of limbs only limits to straight random pin, oblique random pin, uncommon pin etc.The random pin skill of handling needles is the image that shows embroidery face floral designs with the cross one another stitch lines of length, particularly when face that shows personal portrait or limbs, adopt these skill of handling needles all can't avoid managing the concentrated reflective phenomenon of combination results because of silk thread intrinsic linear light and silk thread silk.From embroidery art,, very popular because the reflex of silk thread linear light makes general embroidery have distinctive skin texture texture.If but embroider repeatedly with the lines of a direction, have concentrated reflective, in this reflective face and limbs position that appears at personal portrait, the personal portrait appearance is come and go, cause the imaging instability, promptly see to produce effect very much, but a direction effect is just fully different slightly partially in certain angle.All the time, portrait embroidery all be the concentrated reflective problem worries of linear light endlessly, also be the technical barrier of Suzhou embroidery personage Xiao Xiangzhong in the last hundred years.
Summary of the invention
The invention provides a kind of be used to embroider exempt from the light T shape skill of handling needles and embroidering method, its objective is will solve in the personal portrait embroidery, particularly the reflective problem of personage's face and limbs.
For achieving the above object, the technical scheme that embroidery stitching method of the present invention adopts is: a kind of be used to embroider exempt from the light T shape skill of handling needles, its innovation is: this skill of handling needles is made up of first stitch and second stitch, wherein, first stitch and second stitch are "T"-shaped layout in embroidery cloth front, the angle angle of relative second stitch of first stitch in "T"-shaped is 60 ° ~ 90 ° scopes, and the ratio of first stitch lengths and second stitch lengths is in 1:0.7 to 1:1.3 scope.
Related content in the technique scheme is explained as follows:
1. so-called embroidery is will embroider line with pin to puncture on embroidery cloth with certain floral designs and color, constitutes the general name of various patterns with the embroidery mark.In the embroidery field, the skill of handling needles is meant the method for handling the needle in the embroidery, also is the organizational form of stitch lines in the embroidery, and each skill of handling needles all has certain organization rule and unique expression effect.And stitch is meant the embroidery line lines of embroidering out between two pinpricks.Stitch lengths is meant the length of embroidering the line lines between two pinpricks.
2. in the such scheme, described first stitch in "T"-shaped contacts with second stitch or arranges at interval.That is to say "T"-shaped in the eedles pin can contact with perpendicular stitch, also can be at interval, but principle is not intersected (except the situations of indivedual intersections).
3. in the such scheme, it is better that the angle angle of described relative second stitch of first stitch in "T"-shaped is controlled at 60 ° ~ 70 ° scopes.
4. such scheme is applicable to hand embroidering, also is applicable to machine embroidery.
For achieving the above object, the technical scheme that embroidering method of the present invention adopts is: a kind of embroidering method that is used to show character facial or limbs, its innovation is: at character facial or limbs, utilize and embroider pin and embroider line at the embroidery mark of embroidering at least three layers of the embroidery successively from bottom to top of cloth front and being layering, wherein, embroider mark for every layer and embroidering the positive adjacent layout formation of cloth by one group of roughly the same T shape stitch unit of stitch lengths, embroidering in the mark with any one T shape stitch unit at every layer is the center, the T shape stitch unit at relative center on the embroidery face, Jin Lin T shape stitch unit is in tilted layout on every side, the stitch lengths of T shape stitch unit is successively decreased gradually in each layer embroidery mark from bottom to top, it is embroidered that the light T shape skill of handling needles is exempted from the employing of described T shape stitch unit, this skill of handling needles is made up of first stitch and second stitch, wherein, first stitch and second stitch are "T"-shaped layout in embroidery cloth front, the angle angle of relative second stitch of first stitch in "T"-shaped is 60 ° ~ 90 ° scopes, and the ratio of first stitch lengths and second stitch lengths is in 1:0.7 to 1:1.3 scope.
Related content in the technique scheme is explained as follows:
1. in the such scheme, described each layer from bottom to top embroidered in the mark stitch lengths of T shape stitch unit and is decremented to evenly gradually and successively decreases, and just stitch lengths roughly is equal difference and successively decreases.
2. in the such scheme, the stitch lengths of T shape stitch unit in the mark is embroidered 1 ~ 8 millimeter scope by the superiors.
3. in the such scheme, described each layer from bottom to top embroidered in the mark, and the T shape stitch unit on upper strata is filled in the gap that forms between each T shape stitch unit of lower floor.But the lines on permission upper strata exist with the lines of lower floor and intersect.
4. in the such scheme, described each layer from bottom to top embroidered in the mark, embroiders the thickness transition gradually from coarse to fine of pin.
5. such scheme is applicable to hand embroidering, also is applicable to machine embroidery.
Because the technique scheme utilization, the present invention compared with prior art has following advantage and effect:
1. the present invention exempts from the principle of distributing that the light T shape skill of handling needles and embroidering method have used the silk thread mercerising flexibly, multi-angle utilization by the silk thread lines in every layer of embroidery mark disperses a part of silk thread linear light fall, adopt the mode of being layering to utilize the upper strata lines that lower floor's linear light is pushed down then, make the strip linear light of lower floor become the point-like linear light, especially in personal portrait embroidery, avoid the concentrated reflective phenomenon of personage's face and limbs, overcome the technical barrier of Suzhou embroidery personage Xiao Xiangzhong in the last hundred years.Why embroidery is liked by people, is because it has unique characteristic, and that is exactly unique U.S. that the silk quality sense brings.The present invention exempts from the light T shape skill of handling needles and embroidering method had both kept the distinctive linear light characteristic of embroidery, avoided concentrated reflective phenomenon again, the embroidery that goes to view and admire the making of utilization the inventive method from multi-angle can not produce the deviation of look and the deviation of shape, Suzhou embroidery is embroidered at personal portrait obtained on the skill and technique breaking through and innovation.
2. the present invention exempts from light T shape skill of handling needles employing short-term composition T font and tilts 60 ° ~ 90 ° and embroider work, and is different with random stitch embroidery.The random pin skill of handling needles adopts the cross one another stitch lines of length, and is arbitrarily rough, and exempts from the stitch lines that the light T shape skill of handling needles adopts T shape, not only arbitrarily but also certain rule arranged, disorderly in order, stitch intersects few, feel very fine and smooth, color sense, stereovision are arranged, be fit to the details of performance character facial.
3. can lacking layer also with the line look when adopting the embroidered works of embroidering method of the present invention, but multilayer superposes, and be layering very regularly, chromatography layer by layer, stack by line and line appears the line eye, line look under making and top colo(u)r streak combine together very naturally, so the embroidery color is abundant especially, with the stippling painting skill part that plays the same tune on different musical instruments.In addition, the present invention can avoid the effect of linear light, surround lighting to greatest extent, influences the relationship between light and dark of character facial, color relations, so that the whole embroidery effect of last influence.
4. embroidering method of the present invention forms certain thickness owing to thicker at the bottom embroidery yarn, and past more surface is thin more with line, and is gradually thin layer by layer, not only makes works have certain big and heavy sense, and the characteristics of the smooth exquisiteness of traditional Suzhou embroidery are also arranged simultaneously, and thickness causes.When particularly being used in the yellowish pink texture of performance character facial, the lines calmness, do not float on the surface, can show facial texture thickness well.It is many to be fit to very much the performance male sex, the elderly, black race, brown race and the variation of facial light sensation, and the personal portrait that color is relatively abundanter is vivid true to nature.
Description of drawings
Accompanying drawing 1 is exempted from light T shape skill of handling needles schematic diagram for the present invention;
Accompanying drawing 2 is embroidered the mark schematic diagram for the ground floor embroidery of embroidering method embodiment lip of the present invention;
Accompanying drawing 3 is embroidered the mark schematic diagram for the second layer embroidery of embroidering method embodiment lip of the present invention;
Accompanying drawing 4 is embroidered the mark schematic diagram for the 3rd layer of embroidery of embroidering method embodiment lip of the present invention;
Accompanying drawing 5 is embroidered the mark schematic diagram for the 4th layer of embroidery of embroidering method embodiment lip of the present invention;
Accompanying drawing 6 is embroidered the mark schematic diagram for the layer 5 embroidery of embroidering method embodiment lip of the present invention;
Accompanying drawing 7 is the five stacked schematic diagrames that add of embroidering method embodiment lip of the present invention;
Accompanying drawing 8 is design sketch of the present invention.
In the above accompanying drawing: 1. first stitch; 2. second stitch.
The specific embodiment
Below in conjunction with drawings and Examples the present invention is further described:
Embodiment 1: a kind of be used to embroider exempt from the light T shape skill of handling needles
As shown in Figure 1, this skill of handling needles is made up of first stitch 1 and second stitch 2, wherein, first stitch 1 and second stitch 2 are "T"-shaped layout in embroidery cloth front, first stitch 1 in "T"-shaped contacts with second stitch 2 or the interval, that is to say "T"-shaped in the eedles pin can contact with perpendicular stitch, also can the interval, but can not intersect.The angle angle beta of first stitch, 1 relative second stitch 2 in "T"-shaped is 60 ° ~ 90 ° scopes, and is preferable 60 ° ~ 70 ° scopes.The ratio of first stitch, 1 length and second stitch, 2 length is 1:0.7 to 1:1.3 scope (stitch lengths is meant the length of embroidering the line lines between two pinpricks).Exempt from the light T shape skill of handling needles and be applicable to hand embroidering, also be applicable to machine embroidery.
Embodiment 2: a kind of embroidering method of personage's lip
Fig. 2 ~ 6 are respectively personage's lip ground floor and embroider the mark schematic diagram to the embroidery of layer 5, and Fig. 7 is the five stacked schematic diagrames that add of personage's lip.The embroidering method of present embodiment personage lip is: at personage's lip, utilize to embroider pin and embroider line and embroidering the cloth front by accompanying drawing ground floor to the order of layer 5 and the requirement five stacked embroidery marks that add of successively embroidering, wherein, every layer of embroidery mark embroidered the positive adjacent layout formation of cloth by one group of roughly the same T shape stitch unit of stitch lengths.Embroidering in the mark with any one T shape stitch unit at every layer is the center, and the T shape stitch unit at relative center on the embroidery face, Jin Lin T shape stitch unit is in tilted layout on every side.Embroider in the mark at each layer from bottom to top, the stitch lengths of T shape stitch unit is successively decreased gradually, and is wherein good evenly to be decremented to.Embroider in the mark at each layer from bottom to top, embroider the thickness transition gradually from coarse to fine of pin.Layer 5 is embroidered the stitch lengths of T shape stitch unit in the mark 1 ~ 8 millimeter scope.Embroider in the mark at each layer from bottom to top, the T shape stitch unit on upper strata is filled in the gap that forms between each T shape stitch unit of lower floor, and the lines that wherein allow the upper strata intersect with the lines existence of lower floor.It is embroidered that the light T shape skill of handling needles is exempted from the employing of described T shape stitch unit, see shown in Figure 1, this skill of handling needles is made up of first stitch 1 and second stitch 2, wherein, first stitch 1 and second stitch 2 are "T"-shaped layout embroidering the cloth front, and first stitch 1 in "T"-shaped contact with second stitch 2 or the interval, that is to say that "T"-shaped middle eedles pin can contact with perpendicular stitch, also can be at interval, but can not intersect.The angle angle of first stitch, 1 relative second stitch 2 in "T"-shaped is 60 ° ~ 90 ° scopes, and is preferable 60 ° ~ 70 ° scopes.The ratio of first stitch lengths 1 and second stitch lengths 2 is in 1:0.7 to 1:1.3 scope.
Present embodiment adopts the five stacked forms that add, but obtaining easily adopting under the present invention enlightenment three stackedly adds, four stackedly add, six stacked adding, even more multi-layered stack all can realize.Present embodiment is that example illustrates embroidering method of the present invention with personage's lip.This embroidering method is particularly suitable for showing face and each position of limbs of personal portrait.Fig. 8 is the partial result figure of personal portrait face, as can be seen from Figure 8, the invention solves character facial because of silk thread intrinsic linear light and silk thread lineation produce reflective problem, Suzhou embroidery is embroidered at personal portrait obtained on the skill and technique breaking through and innovation.Embroidering method of the present invention is applicable to hand embroidering, also is applicable to machine embroidery.
The foregoing description only is explanation technical conceive of the present invention and characteristics, and its purpose is to allow the personage who is familiar with this technology can understand content of the present invention and enforcement according to this, can not limit protection scope of the present invention with this.All equivalences that spirit essence is done according to the present invention change or modify, and all should be encompassed within protection scope of the present invention.
Claims (8)
- One kind be used to embroider exempt from the light T shape skill of handling needles, it is characterized in that: this skill of handling needles is made up of first stitch and second stitch, wherein, first stitch and second stitch are "T"-shaped layout in embroidery cloth front, the angle angle of relative second stitch of first stitch in "T"-shaped is 60 ° ~ 90 ° scopes, and the ratio of first stitch lengths and second stitch lengths is in 1:0.7 to 1:1.3 scope.
- 2. the light T shape skill of handling needles of exempting from according to claim 1 is characterized in that: described first stitch in "T"-shaped contacts with second stitch or arranges at interval.
- 3. the light T shape skill of handling needles of exempting from according to claim 1 is characterized in that: the angle angle of described relative second stitch of first stitch in "T"-shaped is 60 ° ~ 70 ° scopes.
- 4. embroidering method that is used to show character facial or limbs, it is characterized in that: at character facial or limbs, utilize and embroider pin and embroider line at the embroidery mark of embroidering at least three layers of the embroidery successively from bottom to top of cloth front and being layering, wherein, embroider mark for every layer and embroidering the positive adjacent layout formation of cloth by one group of roughly the same T shape stitch unit of stitch lengths, embroidering in the mark with any one T shape stitch unit at every layer is the center, the T shape stitch unit at relative center on the embroidery face, Jin Lin T shape stitch unit is in tilted layout on every side, the stitch lengths of T shape stitch unit is successively decreased gradually in each layer embroidery mark from bottom to top, it is embroidered that the light T shape skill of handling needles is exempted from the employing of described T shape stitch unit, this skill of handling needles is made up of first stitch and second stitch, wherein, first stitch and second stitch are "T"-shaped layout in embroidery cloth front, the angle angle of relative second stitch of first stitch in "T"-shaped is 60 ° ~ 90 ° scopes, and the ratio of first stitch lengths and second stitch lengths is in 1:0.7 to 1:1.3 scope.
- 5. embroidering method according to claim 4 is characterized in that: the stitch lengths of T shape stitch unit is decremented to evenly gradually and successively decreases in the described embroidery of each layer from bottom to top mark.
- 6. embroidering method according to claim 4 is characterized in that: the stitch lengths of T shape stitch unit in the mark is embroidered 1 ~ 8 millimeter scope by the superiors.
- 7. embroidering method according to claim 4 is characterized in that: described each layer from bottom to top embroidered in the mark, and the T shape stitch unit on upper strata is filled in the gap that forms between each T shape stitch unit of lower floor.
- 8. embroidering method according to claim 4 is characterized in that: described each layer from bottom to top embroidered in the mark, embroiders the thickness transition gradually from coarse to fine of pin.
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| CN 201110114003 CN102182023B (en) | 2011-05-04 | 2011-05-04 | Light-free T-shaped stitch for embroidery and embroidering method |
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| CN 201110114003 CN102182023B (en) | 2011-05-04 | 2011-05-04 | Light-free T-shaped stitch for embroidery and embroidering method |
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| CN102182023B CN102182023B (en) | 2012-12-26 |
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Cited By (20)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN102587052A (en) * | 2012-03-02 | 2012-07-18 | 苏州姚建萍刺绣艺术有限公司 | Rhyming light needling method for embroidery and embroidery method |
| CN102619039A (en) * | 2012-04-27 | 2012-08-01 | 郁丽勤 | *-shaped knitting method and embroidery method for embroidery |
| CN102720015A (en) * | 2012-06-08 | 2012-10-10 | 杜梅 | Chinese painting freehand brushwork embroidery stitch |
| CN102747559A (en) * | 2012-07-03 | 2012-10-24 | 周海云 | Three-stitch two-stitch combined random stitch method and embroidery method |
| CN102776735A (en) * | 2012-08-20 | 2012-11-14 | 王文兄 | Disorderly-needle double-faced three-different embroidery skill |
| CN103866507A (en) * | 2014-03-31 | 2014-06-18 | 湖南工艺美术职业学院 | Embroidery method for representing surface texture of object |
| CN103866508A (en) * | 2014-03-31 | 2014-06-18 | 湖南工艺美术职业学院 | Embroidery method for representing face of figure |
| CN103866509A (en) * | 2014-03-31 | 2014-06-18 | 湖南工艺美术职业学院 | Embroidery method for representing rope strand |
| CN104532495A (en) * | 2015-01-14 | 2015-04-22 | 顾金珍 | Improved and non-sparse embroidery product without light reflection and method |
| CN104975443A (en) * | 2014-04-10 | 2015-10-14 | 高新区镇湖顾金珍苏绣艺术工作室 | Zen-embroidery stitching method and embroidery method |
| CN105040299A (en) * | 2015-06-08 | 2015-11-11 | 浙江工贸职业技术学院 | Three-dimensional ou embroidery processing technology |
| CN105177884A (en) * | 2014-06-05 | 2015-12-23 | 苏州市叶绣工艺厂 | Oil painting disordered needlework embroidery process |
| CN105401357A (en) * | 2015-10-21 | 2016-03-16 | 马继芳 | Novel improved embroidering stitch and embroidering method thereof |
| CN105544113A (en) * | 2016-02-19 | 2016-05-04 | 太仓市鑫泰针织有限公司 | Crewel embroidery method |
| CN105544112A (en) * | 2016-02-19 | 2016-05-04 | 太仓市鑫泰针织有限公司 | Embroidery wave stitch |
| CN105603650A (en) * | 2016-03-15 | 2016-05-25 | 太仓市鑫泰针织有限公司 | Light-free Z-shaped stitch for embroidery and embroidery method |
| CN105734860A (en) * | 2016-03-02 | 2016-07-06 | 丹阳正则绣艺术有限公司 | Embroidery stitch for disordered needlework |
| CN106498639A (en) * | 2016-08-31 | 2017-03-15 | 纪慧娟 | A kind of pure hand embroidering method |
| CN108425192A (en) * | 2018-03-12 | 2018-08-21 | 威海职业学院 | The cross skill of handling needles that a kind of longitude and latitude for showing embroidery skin texture is mutually knitted |
| CN115948875A (en) * | 2023-02-08 | 2023-04-11 | 庞艳芳 | Good needle shape for embroidery and embroidery method |
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| CN102587052A (en) * | 2012-03-02 | 2012-07-18 | 苏州姚建萍刺绣艺术有限公司 | Rhyming light needling method for embroidery and embroidery method |
| CN102587052B (en) * | 2012-03-02 | 2013-07-03 | 苏州姚建萍刺绣艺术有限公司 | Rhyming light needling method for embroidery and embroidery method |
| CN102619039A (en) * | 2012-04-27 | 2012-08-01 | 郁丽勤 | *-shaped knitting method and embroidery method for embroidery |
| CN102720015A (en) * | 2012-06-08 | 2012-10-10 | 杜梅 | Chinese painting freehand brushwork embroidery stitch |
| CN102720015B (en) * | 2012-06-08 | 2014-03-12 | 杜梅 | Chinese painting freehand brushwork embroidery stitch |
| CN102747559A (en) * | 2012-07-03 | 2012-10-24 | 周海云 | Three-stitch two-stitch combined random stitch method and embroidery method |
| CN102747559B (en) * | 2012-07-03 | 2013-09-04 | 周海云 | Three-stitch two-stitch combined random stitch method and embroidery method |
| CN102776735A (en) * | 2012-08-20 | 2012-11-14 | 王文兄 | Disorderly-needle double-faced three-different embroidery skill |
| CN103866509A (en) * | 2014-03-31 | 2014-06-18 | 湖南工艺美术职业学院 | Embroidery method for representing rope strand |
| CN103866508A (en) * | 2014-03-31 | 2014-06-18 | 湖南工艺美术职业学院 | Embroidery method for representing face of figure |
| CN103866507A (en) * | 2014-03-31 | 2014-06-18 | 湖南工艺美术职业学院 | Embroidery method for representing surface texture of object |
| CN104975443A (en) * | 2014-04-10 | 2015-10-14 | 高新区镇湖顾金珍苏绣艺术工作室 | Zen-embroidery stitching method and embroidery method |
| CN105177884A (en) * | 2014-06-05 | 2015-12-23 | 苏州市叶绣工艺厂 | Oil painting disordered needlework embroidery process |
| CN104532495A (en) * | 2015-01-14 | 2015-04-22 | 顾金珍 | Improved and non-sparse embroidery product without light reflection and method |
| CN105040299A (en) * | 2015-06-08 | 2015-11-11 | 浙江工贸职业技术学院 | Three-dimensional ou embroidery processing technology |
| CN105401357A (en) * | 2015-10-21 | 2016-03-16 | 马继芳 | Novel improved embroidering stitch and embroidering method thereof |
| CN105544113A (en) * | 2016-02-19 | 2016-05-04 | 太仓市鑫泰针织有限公司 | Crewel embroidery method |
| CN105544112A (en) * | 2016-02-19 | 2016-05-04 | 太仓市鑫泰针织有限公司 | Embroidery wave stitch |
| CN105734860A (en) * | 2016-03-02 | 2016-07-06 | 丹阳正则绣艺术有限公司 | Embroidery stitch for disordered needlework |
| CN105603650A (en) * | 2016-03-15 | 2016-05-25 | 太仓市鑫泰针织有限公司 | Light-free Z-shaped stitch for embroidery and embroidery method |
| CN106498639A (en) * | 2016-08-31 | 2017-03-15 | 纪慧娟 | A kind of pure hand embroidering method |
| CN108425192A (en) * | 2018-03-12 | 2018-08-21 | 威海职业学院 | The cross skill of handling needles that a kind of longitude and latitude for showing embroidery skin texture is mutually knitted |
| CN115948875A (en) * | 2023-02-08 | 2023-04-11 | 庞艳芳 | Good needle shape for embroidery and embroidery method |
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