CN102101396A - Method for aligning metal grid line in solar cell metallization process - Google Patents

Method for aligning metal grid line in solar cell metallization process Download PDF

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Publication number
CN102101396A
CN102101396A CN2010105503530A CN201010550353A CN102101396A CN 102101396 A CN102101396 A CN 102101396A CN 2010105503530 A CN2010105503530 A CN 2010105503530A CN 201010550353 A CN201010550353 A CN 201010550353A CN 102101396 A CN102101396 A CN 102101396A
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main grid
solar cell
printing
square
cell metallization
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CN102101396B (en
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邢国强
周鹏宇
何恬
孙海平
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Altusvia Energy Taicang Co Ltd
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Altusvia Energy Taicang Co Ltd
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    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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Abstract

The invention discloses a method for aligning a metal grid line in a solar cell metallization process. The method comprises the following steps of: 1, designing a mark pattern at four top ends of a main grid design position of a silicon chip respectively in a diffusing process or other processes, wherein the mark patterns are required to form an overall circular shape or an overall concentric square shape or an overall circular and concentric square shape; and 2, analyzing each mark pattern by using aligning software installed on an Italy Baccini printer to accurately calculate the central position of the pattern and accurately calculate delta X (transverse offset-a coordinate parallel to the main grid) and delta Y (longitudinal offset-a coordinate vertical to the main grid) of a specific region and the center of a screen printing plate pattern, and adding compensation values according to the data in a printing process so as to meet the requirement on accurate printing.

Description

Metal grid lines alignment methods in a kind of solar cell metallization processes
Technical field
The present invention relates to the photovoltaic application field, be specifically related to metal grid lines alignment methods in a kind of solar cell metallization processes, make metal grid lines be printed onto the appointed area accurately.
Background technology
The selective emitter technology---under the metal wire of serigraphy, accurately make a severe doped n+zone, so that further reduce contact resistance, thus the raising of realization transformation efficiency.There are several technology in current making selective emitter zone, for example anti-carve emitter stage (as Merck, Schmid etc.), twice diffusion (as electricity in the Nanjing etc.) etc., but almost each all requires the multiple print steps of high accuracy and high duplication, metal wire must accurately directly be placed on the emitter region very much, otherwise, will lose its odds for effectiveness.Current domestic Sunpower Corp. generally uses the centrally aligned technology, and its shortcoming is that alignment precision is low, and poor repeatability causes realizing electric current the clear superiority of fill factor, curve factor and efficient.At present most of famous solar energy industries adopt twice printing technology or other high-efficiency batteries also must must very accurately directly be placed on first impression metal grid lines or the appointed area by metal wire in order to reach stable efficiency gain in addition.Therefore a kind of more advanced urgent most of high performance solar batteries manufacturing of quilt of grid line technique of alignment needs.
Summary of the invention
The objective of the invention is provides metal grid lines alignment methods in a kind of solar cell metallization processes in order to reach high maturity, high alignment precision, low cost and high-speed requirement, thereby realizes the print steps of high performance solar batteries in making.
The technical solution used in the present invention is: metal grid lines alignment methods in a kind of solar cell metallization processes, and this method may further comprise the steps:
The first step: by design an indicia patterns respectively on four tops of the main grid design attitude of silicon chip in diffusion or other process, requiring of this indicia patterns is as follows:
Be shaped as circular combination or the combination of concentric square or the combination of circle and concentric square;
Dimensional requirement: the main grid width is D (D〉0.4mm); For marked circle, radius of circle R is 0.2 mm≤R＜D/2; For concentric square, interior square length of side L 1Be 0.1 mm≤L 1＜D, outer square length of side L 2Be 0.2 mm≤L 3＜D;
Second step: by at Italian Baccini(Jonathan Bachini) analyzes this marker graphic on the aligning software that printing machine carries, can calculate the center of this figure accurately, thereby can accurately calculate the Δ X(lateral shift of appointed area and printing screen plate centre of figure-the be parallel to coordinate of main grid), Δ Y(vertical misalignment-perpendicular to the coordinate of main grid), Δ θ (angular deflection), in printing process, add offset according to these data, just can reach the requirement of accurate printing.
As preferably, radius of circle R is 0.4 mm in the first step of described step, the interior square length of side L of concentric square 1Be 0.6 mm, outer square length of side L 2Be 1mm.
Through the checking of a large amount of experiments, take circle or concentric square more to help in software, analyzing the center of figure, also be directly connected to the degree of accuracy of software analysis in addition in the size of figure.Use four high accuracy cameras to capture four top marker graphics of main grid on the silicon chip, thereby calculate the exact position of appointed area.Optimize every printing parameter then and comprise the net spacing, scraper spacing, squeegee pressure, route that scraper and feed back cutter and battery sheet relatively move or the like.
Beneficial effect: the present invention has adopted accurate location, has fundamentally solved high performance solar batteries metallization grid line and has aimed at difficult problem, guarantees that high-efficiency battery has the efficiency gain more than 0.5%.
Description of drawings
Fig. 1 is the embodiment of the invention 1 an indicia patterns schematic diagram;
Fig. 2 is the embodiment of the invention 2 indicia patterns schematic diagrames.
The specific embodiment
The invention will be further described below in conjunction with the drawings and specific embodiments:
Embodiment 1
Metal grid lines alignment methods in a kind of solar cell metallization processes, this method may further comprise the steps:
The first step: by design an indicia patterns respectively on four tops of the main grid design attitude of silicon chip in diffusion or other process, this indicia patterns is the combination of two circles and a concentric square;
The main grid width is 1.8mm; Circular radius R is 0.4 mm; The interior square length of side L of concentric square 1Be 0.6 mm, outer square length of side L 2Be 1 mm;
Second step: by at Italian Baccini(Jonathan Bachini) analyzes this marker graphic on the aligning software that printing machine carries, can calculate the center of this figure accurately, thereby can accurately calculate the Δ X(lateral shift of appointed area and printing screen plate centre of figure-the be parallel to coordinate of main grid), Δ Y(vertical misalignment-perpendicular to the coordinate of main grid), Δ θ (angular deflection), in printing process, add offset according to these data, just can reach the requirement of accurate printing.
Embodiment 2
Metal grid lines alignment methods in a kind of solar cell metallization processes, this method may further comprise the steps:
The first step: by design an indicia patterns respectively on four tops of the main grid design attitude of silicon chip in diffusion or other process, this indicia patterns is the combination of two concentric square;
The main grid width is 1.8mm; The interior square length of side L of concentric square 1Be 0.6 mm, outer square length of side L 3Be 1 mm;
Second step: by at Italian Baccini(Jonathan Bachini) analyzes this marker graphic on the aligning software that printing machine carries, can calculate the center of this figure accurately, thereby can accurately calculate the Δ X(lateral shift of appointed area and printing screen plate centre of figure-the be parallel to coordinate of main grid), Δ Y(vertical misalignment-perpendicular to the coordinate of main grid), Δ θ (angular deflection), in printing process, add offset according to these data, just can reach the requirement of accurate printing.
Embodiment 3
Metal grid lines alignment methods in a kind of solar cell metallization processes, this method may further comprise the steps:
The first step: by design an indicia patterns respectively on four tops of the main grid design attitude of silicon chip in diffusion or other process, this indicia patterns is two circular combinations;
The main grid width is 1.8mm; Great circle circular radius R is 0.8mm, and roundlet circular radius R is 0.2mm;
Second step: by at Italian Baccini(Jonathan Bachini) analyzes this marker graphic on the aligning software that printing machine carries, can calculate the center of this figure accurately, thereby can accurately calculate the Δ X(lateral shift of appointed area and printing screen plate centre of figure-the be parallel to coordinate of main grid), Δ Y(vertical misalignment-perpendicular to the coordinate of main grid), Δ θ (angular deflection), in printing process, add offset according to these data, just can reach the requirement of accurate printing.
Embodiment 4
Metal grid lines alignment methods in a kind of solar cell metallization processes, this method may further comprise the steps:
The first step: by design an indicia patterns respectively on four tops of the main grid design attitude of silicon chip in diffusion or other process, this indicia patterns is the combination of two concentric square;
The main grid width is 1.8mm; The interior square length of side L of concentric square 1Be 0.1 mm, outer square length of side L 2Be 0.2 mm;
Second step: by at Italian Baccini(Jonathan Bachini) analyzes this marker graphic on the aligning software that printing machine carries, can calculate the center of this figure accurately, thereby can accurately calculate the Δ X(lateral shift of appointed area and printing screen plate centre of figure-the be parallel to coordinate of main grid), Δ Y(vertical misalignment-perpendicular to the coordinate of main grid), Δ θ (angular deflection), in printing process, add offset according to these data, just can reach the requirement of accurate printing.
Embodiment 5
Metal grid lines alignment methods in a kind of solar cell metallization processes, this method may further comprise the steps:
The first step: by design an indicia patterns respectively on four tops of the main grid design attitude of silicon chip in diffusion or other process, this indicia patterns is the combination of two circles and a concentric square;
The main grid width is 1.8mm; Circular radius R is 0.2 mm; The interior square length of side L of concentric square 1Be 1.5 mm, outer square length of side L 2Be 1.7mm;
Second step: by at Italian Baccini(Jonathan Bachini) analyzes this marker graphic on the aligning software that printing machine carries, can calculate the center of this figure accurately, thereby can accurately calculate the Δ X(lateral shift of appointed area and printing screen plate centre of figure-the be parallel to coordinate of main grid), Δ Y(vertical misalignment-perpendicular to the coordinate of main grid), Δ θ (angular deflection), in printing process, add offset according to these data, just can reach the requirement of accurate printing.

Claims (3)

1. metal grid lines alignment methods in the solar cell metallization processes, it is characterized in that: this method may further comprise the steps:
The first step: by design an indicia patterns respectively on four tops of the main grid design attitude of silicon chip in diffusion or other process, requiring of this indicia patterns is as follows:
Be shaped as circular combination or the combination of concentric square or the combination of circle and concentric square;
Dimensional requirement: the main grid width is D (D〉0.4mm); For marked circle, radius of circle R is 0.2 mm≤R＜D/2; For concentric square, interior square length of side L 1Be 0.1 mm≤L 1＜D, outer square length of side L 2Be 0.2 mm≤L 3＜D;
Second step: by at Italian Baccini(Jonathan Bachini) analyzes this marker graphic on the aligning software that printing machine carries, can calculate the center of this figure accurately, thereby can accurately calculate the Δ X(lateral shift of appointed area and printing screen plate centre of figure-the be parallel to coordinate of main grid), Δ Y(vertical misalignment-perpendicular to the coordinate of main grid), Δ θ (angular deflection), in printing process, add offset according to these data, just can reach the requirement of accurate printing.
2. metal grid lines alignment methods in a kind of solar cell metallization processes according to claim 1 is characterized in that: radius of circle R is 0.4 mm in the first step of described step.
3. metal grid lines alignment methods in a kind of solar cell metallization processes according to claim 1 is characterized in that: the interior square length of side L of concentric square in the first step of described step 1Be 0.6 mm, outer square length of side L 2Be 1mm.
CN2010105503530A 2010-11-19 2010-11-19 Method for aligning metal grid line in solar cell metallization process Expired - Fee Related CN102101396B (en)

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Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102501592A (en) * 2011-10-28 2012-06-20 浙江鸿禧光伏科技股份有限公司 Method for measuring screen plate overlay accuracy of solar cell
CN102602183A (en) * 2012-03-06 2012-07-25 英利能源（中国）有限公司 Printing method for positive electrode of selective emitter cell
CN102810603A (en) * 2012-09-04 2012-12-05 镇江大全太阳能有限公司 Screen printing overprinting alignment detection method for solar cell electrodes
CN103612494A (en) * 2013-10-18 2014-03-05 浙江晶科能源有限公司 Method for correcting printing deviation of solar cell SE
CN103640349A (en) * 2013-11-26 2014-03-19 常州天合光能有限公司 Secondary printing alignment method of silicon solar cell
CN103855227A (en) * 2012-12-07 2014-06-11 茂迪股份有限公司 Solar battery and solar battery module
CN103855239A (en) * 2012-11-30 2014-06-11 联景光电股份有限公司 Positive electrode of solar cell and manufacturing method thereof
CN105437765A (en) * 2015-12-25 2016-03-30 江苏华宇印涂设备集团有限公司 Positioning adjusting method
CN105895741A (en) * 2016-05-26 2016-08-24 协鑫集成科技股份有限公司 Back surface overprinting method for photovoltaic cell
CN106133918A (en) * 2014-03-07 2016-11-16 法国原子能及替代能源委员会 The method manufacturing selective doping photovoltaic cell
CN111634133A (en) * 2020-05-09 2020-09-08 浙江爱旭太阳能科技有限公司 Method for adjusting solar cell grid line offset and application thereof
CN112172338A (en) * 2020-09-24 2021-01-05 山西潞安太阳能科技有限责任公司 Automatic positioning system for silk-screen printing Mark points

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CN1158011A (en) * 1995-11-22 1997-08-27 埃伯乐太阳能公司 Structure and fabrication process for aluminum alloy junction self-aligned back contact silicon solar cell
US20070169806A1 (en) * 2006-01-20 2007-07-26 Palo Alto Research Center Incorporated Solar cell production using non-contact patterning and direct-write metallization
CN101438207A (en) * 2006-03-31 2009-05-20 应用材料股份有限公司 Method for making an improved thin film solar cell interconnect using etch and deposition processes
WO2010068331A1 (en) * 2008-12-10 2010-06-17 Applied Materials, Inc. Enhanced vision system for screen printing pattern alignment
CN101853886A (en) * 2009-04-03 2010-10-06 上海晶龙光电科技有限公司 Electrode pattern of solar cell

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CN1158011A (en) * 1995-11-22 1997-08-27 埃伯乐太阳能公司 Structure and fabrication process for aluminum alloy junction self-aligned back contact silicon solar cell
US20070169806A1 (en) * 2006-01-20 2007-07-26 Palo Alto Research Center Incorporated Solar cell production using non-contact patterning and direct-write metallization
CN101438207A (en) * 2006-03-31 2009-05-20 应用材料股份有限公司 Method for making an improved thin film solar cell interconnect using etch and deposition processes
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Cited By (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102501592A (en) * 2011-10-28 2012-06-20 浙江鸿禧光伏科技股份有限公司 Method for measuring screen plate overlay accuracy of solar cell
CN102602183B (en) * 2012-03-06 2014-05-14 英利能源（中国）有限公司 Printing method for positive electrode of selective emitter cell
CN102602183A (en) * 2012-03-06 2012-07-25 英利能源（中国）有限公司 Printing method for positive electrode of selective emitter cell
CN102810603A (en) * 2012-09-04 2012-12-05 镇江大全太阳能有限公司 Screen printing overprinting alignment detection method for solar cell electrodes
CN102810603B (en) * 2012-09-04 2015-04-22 镇江大全太阳能有限公司 Screen printing overprinting alignment detection method for solar cell electrodes
CN103855239B (en) * 2012-11-30 2016-12-21 茂迪股份有限公司 The front electrode of solaode and manufacture method thereof
CN103855239A (en) * 2012-11-30 2014-06-11 联景光电股份有限公司 Positive electrode of solar cell and manufacturing method thereof
CN103855227A (en) * 2012-12-07 2014-06-11 茂迪股份有限公司 Solar battery and solar battery module
CN103612494A (en) * 2013-10-18 2014-03-05 浙江晶科能源有限公司 Method for correcting printing deviation of solar cell SE
CN103640349A (en) * 2013-11-26 2014-03-19 常州天合光能有限公司 Secondary printing alignment method of silicon solar cell
CN106133918A (en) * 2014-03-07 2016-11-16 法国原子能及替代能源委员会 The method manufacturing selective doping photovoltaic cell
CN106133918B (en) * 2014-03-07 2018-06-19 法国原子能及替代能源委员会 The method for manufacturing selective doping photovoltaic cell
CN105437765A (en) * 2015-12-25 2016-03-30 江苏华宇印涂设备集团有限公司 Positioning adjusting method
CN105895741A (en) * 2016-05-26 2016-08-24 协鑫集成科技股份有限公司 Back surface overprinting method for photovoltaic cell
CN111634133A (en) * 2020-05-09 2020-09-08 浙江爱旭太阳能科技有限公司 Method for adjusting solar cell grid line offset and application thereof
CN111634133B (en) * 2020-05-09 2022-04-29 浙江爱旭太阳能科技有限公司 Method for adjusting solar cell grid line offset and application thereof
CN112172338A (en) * 2020-09-24 2021-01-05 山西潞安太阳能科技有限责任公司 Automatic positioning system for silk-screen printing Mark points
CN112172338B (en) * 2020-09-24 2022-03-15 山西潞安太阳能科技有限责任公司 Automatic positioning system for silk-screen printing Mark points

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