CN101930933A - 半导体装置的制造方法 - Google Patents

半导体装置的制造方法 Download PDF

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CN101930933A
CN101930933A CN200910179607XA CN200910179607A CN101930933A CN 101930933 A CN101930933 A CN 101930933A CN 200910179607X A CN200910179607X A CN 200910179607XA CN 200910179607 A CN200910179607 A CN 200910179607A CN 101930933 A CN101930933 A CN 101930933A
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die cavity
island
semiconductor device
resin
mould
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CN101930933B (zh
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吉羽茂治
福田浩和
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Sanyo Electric Co Ltd
System Solutions Co Ltd
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Sanyo Electric Co Ltd
Sanyo Semiconductor Co Ltd
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Abstract

本发明提供一种能够抑制树脂密封时岛移动的半导体装置的制造方法。灌封模具(30)由上模(32)和下模(34)构成,通过使两者抵接而构成模腔(36A)等以及浇道(38)。在下模(34)中设置供给口,将由固态的树脂构成的板收纳供给口(42)并加热熔化之后,通过柱塞加压熔化的密封树脂而将密封树脂供给到各模腔。具体地,从供给口(42)供给的密封树脂的流动的上游侧,按照模腔(36A)、(36B)、(36C)、(36D)、(36E)的顺序,从供给口(42)供给液状的密封树脂。各模腔通过浇道(38)连通。而且,连通模腔(36A)和模腔(36B)的浇道(38)相对于供给密封树脂(16)的路径倾斜地设置。

Description

半导体装置的制造方法
技术领域
本发明涉及半导体装置的制造方法。
背景技术
半导体装置的制造工序大体上分为:在半导体晶圆上组入所期望的元件的前工序;对分割半导体晶圆而得到的半导体元件进行封装的后工序。而且,在后工序中,还有用树脂密封半导体元件的工序。
参照图7说明该密封工序。该密封工序主要是由于如图7所示那样树脂绕到岛106的背面而导致树脂压力的平衡被破坏,有时产生各种不良。关于该点如下说明。
例如,图5所示的直浇口(through gate)方式是从供给口(pot)42通过浇道(runner)44串联有多个模腔(cavity)。因为能够缩短模腔间的距离,所以这是一种能大幅削减所消耗的灌封树脂且能增加模具单位面积的元件数量并提高生产率的优良方法。例如在日本特开平1-205432号公报中由左伯准一等人报告了这种方法。
图7图示了该方式中的两个模腔之间。参照图7(A),在灌封模具中设置有多个模腔100A、100B,模腔100A和模腔100B经由浇道102连通。在各模腔100A、100B中,收纳有上表面安装了半导体元件104的岛106。
参照图7(B),然后,向各模腔100A、100B注入密封树脂110。具体地,模腔100A的左侧连接有未图示的供给口,从供给口供给的液状的树脂首先被注入模腔100A,然后经由浇道102被供给到模腔100B。在该图中,用粗箭头表示密封树脂110的流动。被注入模腔100A的密封树脂110中的一部分被注入到岛106的下方,剩余的部分被注入到岛106的上方。此外,树脂很薄地进入岛106的背面,由于岛106无论如何都会被向上方挤压,因此设置推压销P。例如,在TO220的封装中,推压销P设置在图5所示的带叉的圆圈表示的部分。
而且,使用了上述灌封模具的树脂密封的方法被记载在例如以下的专利文献中。
专利文献:
日本特开2004-158539号公报
日本特开平1-205432号公报
发明内容
本发明提供一种能够通过在该直浇口方式中调整浇道102的安装位置来制造可靠性高的产品的方法。
但是,在上述密封树脂的注入方法中,存在因被注入到模腔100A中的树脂的注入压力使岛106移动的问题。
具体地,参照图7(B),通过剖视图进行说明,从浇口(gate)G2进入模腔100A的树脂110大致分为进入岛106的背面和下模之间的树脂、以及朝岛106的表面和上模之间注入的树脂这两部分树脂。而且,由于岛106的背面和下模之间的体积小,所以先被填充树脂,树脂对岛106施加朝上的力。但是,由于存在销P,所以能够抑制上升。
另一方面,岛106的表面和上模之间因体积大,所以树脂填充慢。但是,由于该浇口G2、G1配置在岛106的配置位置或该配置位置的稍下方,因此,在树脂被填充到岛的背面之后,被填充的树脂朝向排出口G1下降,结果如朝下的箭头AL1那样,在岛的右端施加朝下的力。也就是说,在图7(B)中,以左侧的销P的抵接点为支点,岛106的右侧朝向下方下降。
这样,覆盖岛106背面的密封树脂110的厚度变薄,不能够得到规定的耐压性。还带来耐湿性的恶化。
另外,图7(C)是用于说明通常的IC封装的图,这也是树脂被填充到岛106A的背面的情况。该情况下,有与图7(B)同样的树脂运动,接近G1的位置的金属细线FW被树脂压力向下方按下而变形,严重时,存在与芯片的角接触的情况。另外,也存在内引线(Inne rlead)变形的情况。
本发明是鉴于这些问题而做出的,通过下述方法来解决上述问题:利用图6(B)进行说明,以剖面观察时,将向模腔36A注入树脂的浇口P2的位置配置在与配置有岛12的面相同的面上,或配置在配置有岛12的面的附近,树脂的排出口P1配置在所述P2的位置的上方。
参照图6进行说明,然后,模腔36A中的树脂填埋岛12和上模之间。此时,在接近排出口P1的位置,由于树脂的量多,因此对岛12施加朝下的力。但是,将该排出口P1的位置配置在岛的上方,换言之,配置在浇口P1的位置的更上方,由此能够积极地将施加压力的量的树脂送出到下一个模腔。因此,通过减少这些量的树脂的压力,能够减小岛12的倾斜。
附图说明
图1是用于说明本发明的半导体装置的制造方法的图。
图2是表示由本发明制造的半导体装置的图,(A)是俯视图,(B)是剖视图。
图3是表示本发明的半导体装置的制造方法的图,(A)是俯视图,(B)是放大的俯视图。
图4是表示本发明的半导体装置的制造方法的俯视图。
图5是表示本发明的半导体装置的制造方法的俯视图。
图6是表示本发明的半导体装置的制造方法的图。
图7是表示背景技术的半导体装置的制造方法中的树脂密封工序的图。
图8是用于说明本发明的半导体装置的图。
图9是本发明的半导体装置的制造方法所使用的引线框架的图。
图10是表示本发明的半导体装置的制造方法的俯视图。
图11是用于说明本发明的半导体装置的图。
图12是本发明的半导体装置的制造方法所使用的引线框架的图。
图13是用于说明本发明的半导体装置的图。
具体实施方式
下面,对本发明进行说明。首先,参照图1对基本原理进行说明。图1是用于说明灌封模具的截面的示意图,(B)是俯视图,(C)是用于具体说明树脂的流动的图,(D)是表示从模具取出的半导体装置,尤其是表示出入口的浇口的切断痕迹。
模具由上模UD和下模LD构成,两者扣合而形成模腔36A、36B、......。该多个模腔从供给口42通过浇道串联。而且,收纳在供给口的小块(tablet)被柱塞(plunger)加热、加压,熔化的树脂从供给口42向浇道38、模腔36A、浇道38、模腔36B......流动。
来自供给口42的树脂的流动和模腔的连接方向如图1(B)所示。这里,以供给口42为中心连接的模腔列为两条且成为コ字形。但是,模腔列的条数至少为一条即可,在一条模腔列中,模腔的个数也可以是多个。而且,平面上的配置也可以是以供给口为中心呈放射状。
图1(C)是表示本发明的发明点的图。也就是说,模腔之间的浇道(也称为直浇口)以往是水平地配置,但本发明是倾斜地配置。具体地,从剖面观察第1模腔36A,比树脂的注入口P2的位置(高度)高地设置树脂的排出口P1的位置(高度)。在模腔36A和模腔36B之间的浇道观察,左侧的排出口P1设置得比右侧的注入口P2高,对于树脂的流动而言,上游比下游高地倾斜配置。
如图1(D)所示,假设一个被灌封的半导体装置10为具有上表面、背面、四个侧面的六面体,其相面对的侧面上形成的浇口痕迹P2、P1的位置不同,排出口P1的高度形成得比注入口P2的高度高。
模腔36A中图示了岛12,模腔36B中图示了引线L。本来在这二个模腔中密封了相同的元件,这里,为了方便,在图中表示了不同的元件。
这两种类型可以是图2所示的TO220那样的分立(discrete)型的封装,也可以是图8所示的IC封装。
两种封装都是具有岛且该岛的背面被密封的类型。因此,岛12的背面和下模LD之间间隙窄,为了不产生未填充部分,注入口P2位于与岛12的高度大致相同或与岛12之间具有±100μm的高度差。另外,在背面有间隙的情况下,岛12自身容易根据间隙的厚度而向下方变动。
因此,使树脂的排出口P1比P2的高度高。或者,将P1设置在比岛12的高度高的位置,能够抑制因树脂压力产生的变动。也就是说,能够在树脂将要向岛施加压力时排出树脂,由此能够维持岛的水平度。另外,内引线L能够分别位于大致相同位置。另外,能够抑制与内引线L连接的金属细线的变形。
实施例1
参照图2,对实施例1进行说明。图2中,(A)是表示半导体装置10的俯视图,(B)是(A)的B-B’剖视图。
半导体装置10是树脂覆盖在岛12的背面上的分立型的晶体管,例如是3端子型的封装、TO220等的封装。该半导体装置10主要具有:岛12;安装在岛12的上表面的半导体元件20;起到外部连接端子的作用的引线14;一体地覆盖岛12、半导体元件20以及引线14并机械支承它们的密封树脂16。引线14B与岛12一体地延伸,成为电流的流出侧(或流入侧)电极,引线14A以及14C中的一个是控制电极,另一个是电流的流入侧(或流出侧)电极。具体地,半导体元件20是BIP型的Tr、MOS型的Tr、IGBT、GTBT等,14B、14A、14BC是集电极、基极、发射极,成为源极、栅极、漏极等。
封装的形状如图13所示,大致说明的话,由以下部分构成:岛12;与岛12一体的引线14B;位于所述引线14B的两侧,相对于所述岛12独立的引线14A、14C;设置在岛12上的半导体元件20;与所述半导体元件和所述引线14A、14B相连的金属细线24;覆盖所述岛12背面的至少一部分、且覆盖岛表面、半导体元件、金属细线的密封树脂。
而且,图13(A1)、(A2)是上表面以及侧面图,绝缘树脂的外形为六面体,外引线部从树脂封装露出。另外,图13(B1)、(B2)中,绝缘树脂的外形是六面体,岛12的头部从树脂封装露出,外引线部从树脂封装露出,而且,在图13(C1)、(C2)中,实质上与图2的形状相同,图13(B1)的露出的岛很薄地被绝缘树脂覆盖。另外,也可以根据需要设置螺纹固定部件等。
作为一例,用TO220进行说明,岛12由厚度为0.5mm~0.6mm左右的铜为主材料的金属构成,通过蚀刻加工或冲压加工成形。岛12是例如长×宽=12.0mm×14.0mm左右的矩形,将图中的上侧的侧边切出半圆形的形状。这样,在呈切出的形状的部分形成了供固定用的螺钉穿过的贯通孔22。引线14B从岛12下侧的侧边的中央部与岛12一体地与外部连接而延伸。参照图2(B),为了使岛12与外部绝缘,岛12的背面(下表面)被密封树脂16覆盖。另外,覆盖岛12的背面的密封树脂16的厚度非常薄,所以,因半导体元件20工作而产生的热经由岛12以及薄的密封树脂16良好地被放出到外部。
引线14通过内引线部与内置的半导体元件20电连接,一部分作为外引线露到外部并起到外部连接端子的作用。另外,半导体装置10被安装到安装基板等时,通过将引线14的前端部***设置在安装基板上的孔而将半导体装置10***安装到安装基板等上。另外,作为面安装用,也有如图13(D)所示地将外引线部弯折成Z字形。
半导体元件20是背面具有主电极的半导体元件,具体地,可以采用MOSFET(Metal-Oxide Semiconductor Field EffectTransistor)、双极性晶体管、IGBT(Insulated Gate BipolarTransistor)。作为一例,将MOSFET用作半导体元件20时,下表面的漏极通过导电性固定材料被连接在岛12的上表面,上表面的栅极经由金属细线24与引线14A连接,上表面的源极经由金属细线24与引线14C连接。
实施例2
以下,参照图3~图6,说明半导体装置的制造方法。
参照图3(A),引线框架50的外形为长方形,在框状的外框52的内部以矩阵状形成有多个单元56。
图3中,(B)是局部放大(A)表示的俯视图。这里,为了使上侧的外框52和下侧的外框52连续而延伸有连结杆(tie bar)58。在图中,左侧配置有一列单元56A~56D并通过连结杆58连结,右侧配置有一列单元56E~56H并通过连结杆58连结。各单元由岛12、引线14A、14B、14C构成。而且,引线14A、14C的一端接近岛12,并且引线14B与岛12一体地导出。单元56A的引线14A、14B、14C的中间部以及端部与连结杆58连续。同样,其他单元56B~56D也与连结杆58连续。另外,右侧配置的一列单元56E~56H的引线也通过连结杆58连结。这里,横向相邻的单元的引线也可以配置成交错状。该情况下,例如,单元56A的引线14A~14C和单元56E的引线14A~14C相面对地配置成交错状。
无论是怎样设置,岛12都被作为细颈的引线14B支承。由此,因后来的工序的树脂注入而施加压力时,发生变形。
参照图4,然后,将半导体元件20连接到各单元。参照单元56A时,将半导体元件20安装到岛12的上表面。半导体元件20是通过使用了焊锡或Ag膏等导电性固定材料的连接或共晶键合(eutectic bonding),使背面的电极电连接到岛12的上表面。此外,半导体元件20的上表面的电极经由金属细线24与引线14A以及引线14C连接。这里,代替金属细线24,也可以使用由铜、Al等金属构成的板状的金属连接板。
以下,分别用树脂密封各单元。参照图5的(A),在本工序中,分别将各单元收纳在模腔36中,并进行注射模塑成形。在一个模腔36A中收纳有引线14A、14B、14C的一部分、岛12、半导体元件20。而且,将液状的密封树脂从设置在模腔侧面的浇口P2注入模腔36的内部,对该密封树脂进行加热固化,从而进行树脂密封的工序。这里,在图中,左侧整列地配置有模腔36A~模腔36D,这些模腔经由浇道38连通。这样的浇道被称为直浇口。此外,在图中,右侧整列地配置有模腔36E~36H,这些模腔也经由浇道38连通。此外,在这些模腔中,经由浇道44与供给口42连接,在进行树脂密封时,从供给口42依次向这些模腔供给液状的密封树脂。
图5的(B)是呈蜿蜒曲折状的情况,是取出了图5的(A)的模腔36A、36B的位置。也就是说,如果从浇道44与模腔36A连接的注入口P2位于模腔侧面的右侧(或左侧),则排出口P1被设置在与之相面对的侧面的左侧。而且,在模腔36B中,注入口P2被设置在模腔侧面的左侧(或右侧),排出口P1被设置在与之相面对的侧面的右侧(或左侧),树脂蜿蜒曲折地流动。
这可以是图5的(A)或图5的(B)的任意一种。
参照图6(A),说明本工序中使用的灌封模具30的结构。灌封模具30由上模32和下模34构成,通过使两者抵接而构成模腔36A~36E以及浇道38。在模具34上设置有供给口42,将由固态树脂构成的小块收纳在供给口42并加热熔化后,利用柱塞40对熔化的密封树脂进行加压,由此密封树脂被供给到各模腔。具体地,从由供给口42供给的密封树脂的流动的上游侧,按照模腔36A、36B、36C、36D、36E的顺序,从供给口42供给液状的密封树脂。如上所述,各模腔通过浇道38相连通。
参照图6的(B),在各模腔36A、36B的内部收纳有上表面固定有半导体元件20的岛12。而且,从上模的内壁向下方突出的推压部68(图5的附图标记P所示的销)的前端接触岛12的上表面。利用与岛的前端的两侧抵接的两个销一体地构成的引线14B,即使熔化树脂流过来,也能够防止岛12向上方移动。推压部68是可在上下方向上移动的销,在密封树脂16被注入的阶段,推压部68的下端与岛12的上表面接触;在密封树脂16被填充固化的阶段中,推压部68上升并从岛12的上表面离开。
本发明的发明点是,使连通模腔36A和模腔36B的浇道38相对于被供给密封树脂16的路径倾斜地设置。
具体地,模腔36A的排气通道(air vent)和浇道38的连接位置(排出口)P1是设置在模腔36A的厚度方向上的中央部附近。而且,该连接位置P1设置在安装有半导体元件20的岛12的上方。而浇道38和模腔36B的浇口之间的连接位置(注入口)P2配置在连接位置P1的下方,配置在与岛12相同的高度的位置或配置在岛12的下方。
通过将P 1设置在岛12的上方,抑制因被注入的密封树脂16的压力使岛12向下方移动。
从P2进入的熔化树脂被注入下模和岛12之间、以及岛和上模之间,这里,进入下模和岛12之间的树脂作用使岛12向上移动的力。但是,岛12由上述的两个销和引线14B压住。而且,被注入岛和上模之间的熔化树脂在覆盖了岛背面之后,向排出口P1靠近。以往,由于该P1的高度与P2的高度为相同程度,所以,在P1附近作用使岛向下倾斜的力(参照图7(B)及其说明)。
但是,在本发明中,该P1与以往相比被靠上,熔化树脂在向岛12作用力之前,射向相邻的模腔36B。由此,密封树脂16对岛12施加的压力降低,结果,岛12向下方的移动被抑制。
而且,这里,将浇道38和模腔36B的连接位置P2配置在上述P1的下方(相对于模腔36A的厚度方向靠近端部)。这样,将经由浇道38被注入模腔36B的密封树脂16能够优先向岛12下方的空间供给。其结果,充分地对岛12的下方区域供给密封树脂16而抑制在该区域产生空隙。通过优先将密封树脂16填充到岛12的下方空间,从而作用使岛12向上方抬起的压力,但由于岛12的上表面被推压部68支承,所以能够抑制因该压力导致岛12向上方的移动。通过以上方式,即使为了薄型化而使岛12和模腔36B的下表面之间的间隙成为例如40μm以下这么小,也能够没有空隙地将密封树脂16填充到该间隙。
而且,在本工序中,浇道38从上方向下方侧倾斜地配置。因此,从浇道38向模腔36B供给的密封树脂16朝向半导体元件20的下方区域注射,而优先地填充到该区域。而且,此外,通过从浇道38供给的密封树脂16被优先地填充到岛12的下方,由此能够抑制被填充到岛12的上方的密封树脂16的量。由此,利用被填充的密封树脂16降低了向下方推压岛12的压力,从而抑制树脂密封的工序中的岛12向下方的移动。
此外,图6的(B)、(C)的粗线表示上模和下模的分型面。
通过上述工序,将密封树脂16填充到各模腔36A~36E之后,使被填充的密封树脂16加热固化,从模具30取出引线。
而且,此外,通过切断图3所示的引线框架50的连结杆,将各单元56的引线14从引线框架50的外框52分离。
图6的(C)表示从模具取出的密封树脂16。这里,覆盖各岛12的密封树脂16通过被填充到浇道38的树脂而相连续。而且,通过切断浇道38的密封树脂,使各电路装置的密封树脂16彼此分离。
被填充到浇道38的密封树脂的分离,可以通过冲头的冲压进行,也可以通过对密封树脂16和浇道38的连接部分照射激光来进行。
在本工序中,通过除去浇道38的密封树脂而生成的切除痕迹残留在密封树脂16的外表面。该切除痕迹位于左右非对称的位置,在图中,在密封树脂16的左侧的面上生成的切除痕迹形成在右侧的面上形成的切除痕迹上方1mm左右的位置。这在图1的(D)中也已经简单说明了。
经过以上的工序,制造出图2所示的结构的半导体装置10。
实施例3
接着,使用图8~图12,说明适用于IC的情况。图8的(A)是省略了绝缘树脂的半导体装置,图8的(B)是由绝缘树脂106密封后的半导体装置的剖视图,其是由以下部分构成:矩形的岛100;一端接近岛100的左右侧边的各个引线群101......、101......;从岛100的上下侧边向外侧延伸并一体地保持在岛100上的上、下悬垂引线(hanging lead)102;固定在岛100之上的IC芯片103;使芯片103的芯片焊盘104和引线101电连接起来的金属细线105。在上述部分中,除了所述引线的与外引线相当的部分之外,全部被绝缘树脂106覆盖。这里,示出了保持引线102为两条,但至少为一条即可。此外,如本发明的发明点那样,岛100的背面被绝缘树脂106覆盖。
图9是表示以矩阵状配置有图8所示的元件的搭载部111的引线框架110,整体呈长方形。而且,设置有狭缝112、分度(index)孔113等。而且,根据说明,上侧和下侧的连结条带114与图8的保持引线102一体地设置。因此,上方的第1搭载部和下方的第2搭载部的岛成为一体,在这两个岛之间至少有一个另外的岛利用悬垂引线与它们成为一体。
而且,一体地保持沿岛的左右延伸的引线101的连结杆115与上和下的连结条带114成为一体,另外,在搭载部和与该搭载部左右相邻的搭载部之间、在上下相邻的搭载部之间设置有第2连结条带116,由此岛的左右的引线框架、岛上下的保持引线利用连结条带成为一体。
图10是表示将该引线框架110配置在模具上时的平面配置的图。这是图5(B)所说明的蜿蜒曲折配置。作为一例,图示了120A~120C这三个模腔,树脂从浇口部121的注入口P2进入模腔120A,并从排出口P 1排出。这里,着眼于在排出口侧位于岛的左右侧边(或位于岛的下侧边)的引线A、B、C。以往,与该引线相当的部分的排出口P1的高度如图7(C)那样与岛的高度相同,或位于注入口的下方,从而使内引线的前端受到向下方的压力。另外,导致与该部分连接的金属细线发生变形或断裂。上述问题在以下情况下也会显著地呈现:由于使半导体封装的轻薄短小化而使引线、岛的厚度变薄,金属细线也变细,另外除金以外,也采用Al或Cu等细线。因此,根据图6(B)所示的那样的浇道结构,能够降低其树脂压力。
实施例4
图11是被称为ECH的封装,在矩形的岛130的一个长侧边具有与岛一体的多个引线131,在另一侧边具有相对于岛130独立的多条引线132,在岛之上固定有半导体芯片133,通过内引线132和金属细线134与岛连接。而且,利用虚线表示的绝缘树脂135进行密封,密封也包含岛的背面。
图12是该半导体装置采用的引线框架140,虚线表示模腔,位于其中的岛130、引线131、132是搭载部,箭头表示树脂的流动。这也与前实施例同样地能够抑制内引线132的变动以及金属细线的变形。
也就是说,树脂从第1岛130A的左侧的浇道通过注入口进入模腔,从排出口通过直浇口进入右边相邻的模腔。
这里,接近排出口的位置的内引线或岛受到来自上方的树脂的压力而变形,但是如图6那样,由于使排出口比注入口高(比岛的高度高),所以能够减轻该注入树脂的压力。
此外,在所有的实施例中,上下的关系也可以完全相反。因此,本发明的示出权利要求书由一方和另一方模具描述。
本发明能够适用于以直浇口方式将绝缘树脂覆盖在岛背面的半导体封装。

Claims (15)

1.一种半导体装置的制造方法,准备从供给口通过浇道至少串联有多个模腔的、由一方模具和另一方模具构成的模具,在各模腔配置有搭载部,该搭载部至少具有岛以及一端配置在所述岛上的引线,在所述岛的一侧固定有半导体元件,并且在所述引线和所述半导体元件由金属细线电连接的状态下,在所述模具上配置引线框架,从所述供给口通过所述浇道至少向所述多个模腔注入熔化树脂,所述熔化树脂也注入所述岛的另一侧和所述一方模具之间,其特征在于,
将所述模腔的所述熔化树脂的排出口的位置,设置在比所述模腔的所述熔化树脂注入口靠所述一方侧的位置,抑制所述排出口附近的岛、所述排出口附近的内引线或所述排出口附近的金属细线位移。
2.如权利要求1所述的半导体装置的制造方法,其特征在于,俯视所述模腔时,所述模腔呈由四个侧边构成的矩形,所述排出口和所述注入口设置在相对的所述侧边所处的侧面。
3.如权利要求2所述的半导体装置的制造方法,其特征在于,所述熔化树脂固化,从所述模具取出被所述树脂密封的半导体装置,除去被填充到所述浇道的所述树脂,在所述半导体装置的侧面设置切除痕迹。
4.如权利要求3所述的半导体装置的制造方法,其特征在于,所述注入口设置在比所述模腔中收纳的所述岛靠所述一方侧的位置。
5.如权利要求4所述的半导体装置的制造方法,其特征在于,在所述注入工序中,使所述模具上设置的推压部的另一侧的端部与所述岛的一侧的面接触。
6.一种半导体装置,其由权利要求1~5的任一项所述的制造方法制造出,其特征在于,
通过除去被填充到所述浇道的所述树脂,在半导体装置的侧面上形成有切除痕迹,
一侧面上形成的所述切除痕迹、和与所述一侧面相面对的另一侧面上形成的切除痕迹配置成非对称。
7.一种灌封模具,设置多个用于收纳并用树脂密封安装有半导体元件的岛的模腔,其特征在于,
该灌封模具具有:第1模腔;第2模腔,配置在相对于供给液状的密封树脂的路径比所述第1模腔靠下游侧的位置;浇道,一端与所述第1模腔连接,另一端与所述第2模腔连接,
与所述浇道和所述第1模腔连接的位置相比,所述浇道和所述第2模腔连接的位置配置在相对于所述模腔的厚度方向更靠近端部的位置。
8.如权利要求7所述的灌封模具,其特征在于,所述浇道相对于被注入的密封树脂的行进方向倾斜地配置。
9.如权利要求8所述的灌封模具,其特征在于,还具有与所述岛的上表面接触的推压部。
10.如权利要求1~5中任一项所述的半导体装置的制造方法,其特征在于,所述一方模具是上模或下模,所述另一方模具是下模或上模。
11.一种半导体装置的制造方法,准备从供给口通过浇道至少串联有多个模腔的、由一方模具和另一方模具构成的模具,在各模腔配置有搭载部,该搭载部具有:由相对的第1侧边以及第2侧边、相对的第3侧边以及第4侧边构成的矩形的岛;与所述模腔的注入口以及排出口接近的第1侧边以及第2侧边上设置的保持引线;一端配置在与所述第1侧边交叉的第3侧边以及第4侧边上的多个引线,
在所述岛的一侧固定有半导体元件,并且在所述引线和所述半导体元件由金属细线电连接的状态下,在所述模具上配置引线框架,
从所述供给口通过所述浇道至少向所述多个模腔注入熔化树脂,所述熔化树脂也注入所述岛的另一侧的面和所述一方模具之间,其特征在于,
将所述模腔的所述熔化树脂的排出口的位置设置在比所述模腔的注入口的位置靠所述一方侧的位置,抑制所述排出口附近的岛、所述排出口附近的内引线或所述排出口附近的金属细线位移。
12.如权利要求11所述的半导体装置的制造方法,其特征在于,俯视所述多个模腔内的第1模腔,注入口位于所述第1侧边的一侧,排出口位于所述第2侧边的另一侧,俯视与所述第1模腔相邻的第2模腔,注入口位于所述第1侧边的另一侧,排出口位于所述第2侧边的一侧,通过所述第1模腔和所述第2模腔的熔化树脂蜿蜒曲折地被注入。
13.如权利要求12所述的半导体装置的制造方法,其特征在于,所述熔化树脂固化后,从所述模具取出所述半导体装置,除去被填充到所述浇道的所述树脂,在所述半导体装置的侧面设置切除痕迹。
14.如权利要求13所述的半导体装置的制造方法,其特征在于,所述注入口被设置在所述模腔中收纳的所述岛的上方。
15.如权利要求11~14任一项所述的半导体装置的制造方法,其特征在于,所述一方模具为上模或下模,所述另一方模具为下模或上模。
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