CN101898745A - 微机电***器件及其制造方法 - Google Patents
微机电***器件及其制造方法 Download PDFInfo
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- CN101898745A CN101898745A CN201010193859.0A CN201010193859A CN101898745A CN 101898745 A CN101898745 A CN 101898745A CN 201010193859 A CN201010193859 A CN 201010193859A CN 101898745 A CN101898745 A CN 101898745A
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
- B81C1/00222—Integrating an electronic processing unit with a micromechanical structure
- B81C1/00246—Monolithic integration, i.e. micromechanical structure and electronic processing unit are integrated on the same substrate
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
- B81C1/00134—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems comprising flexible or deformable structures
- B81C1/0015—Cantilevers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2203/00—Basic microelectromechanical structures
- B81B2203/01—Suspended structures, i.e. structures allowing a movement
- B81B2203/0118—Cantilevers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2203/00—Basic microelectromechanical structures
- B81B2203/03—Static structures
- B81B2203/0307—Anchors
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C2203/00—Forming microstructural systems
- B81C2203/07—Integrating an electronic processing unit with a micromechanical structure
- B81C2203/0707—Monolithic integration, i.e. the electronic processing unit is formed on or in the same substrate as the micromechanical structure
- B81C2203/0735—Post-CMOS, i.e. forming the micromechanical structure after the CMOS circuit
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- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
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Abstract
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Claims (12)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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US18182809P | 2009-05-28 | 2009-05-28 | |
US61/181,828 | 2009-05-28 |
Publications (2)
Publication Number | Publication Date |
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CN101898745A true CN101898745A (zh) | 2010-12-01 |
CN101898745B CN101898745B (zh) | 2012-06-06 |
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ID=43219263
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Application Number | Title | Priority Date | Filing Date |
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CN2010101938590A Active CN101898745B (zh) | 2009-05-28 | 2010-05-28 | 微机电***器件的制造方法 |
Country Status (2)
Country | Link |
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US (1) | US8389317B2 (zh) |
CN (1) | CN101898745B (zh) |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104313544A (zh) * | 2014-10-15 | 2015-01-28 | 西安交通大学 | Ecr离子/电子/离子交替照射工艺制备三明治碳膜及方法 |
CN104792583A (zh) * | 2014-01-17 | 2015-07-22 | 中芯国际集成电路制造(上海)有限公司 | 一种tem样品的制备方法 |
CN105217563A (zh) * | 2014-06-03 | 2016-01-06 | 联华电子股份有限公司 | 微机电元件的蚀刻方法 |
CN105692543A (zh) * | 2013-01-25 | 2016-06-22 | 英飞凌科技股份有限公司 | Mems器件和制造mems器件的方法 |
CN105217563B (zh) * | 2014-06-03 | 2016-11-30 | 联华电子股份有限公司 | 微机电元件的蚀刻方法 |
CN106454665A (zh) * | 2015-08-04 | 2017-02-22 | 英飞凌科技股份有限公司 | 用于多电极mems器件的***和方法 |
CN110316691A (zh) * | 2019-06-20 | 2019-10-11 | 清华大学 | 微型气动/液压驱动器及其加工方法 |
CN110357033A (zh) * | 2015-10-22 | 2019-10-22 | 艾克斯瑟乐普林特有限公司 | 用于控制可转移半导体结构的释放的结构及方法 |
CN111180381A (zh) * | 2014-06-18 | 2020-05-19 | 艾克斯瑟乐普林特有限公司 | 用于控制可转印半导体结构的释放的***及方法 |
CN111473805A (zh) * | 2020-04-17 | 2020-07-31 | 江苏多维科技有限公司 | 一种微机电环境传感器及其制备方法 |
CN116199183A (zh) * | 2023-04-28 | 2023-06-02 | 润芯感知科技(南昌)有限公司 | 一种半导体器件及其制造方法 |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8707734B2 (en) * | 2009-10-19 | 2014-04-29 | The Regents Of The University Of Michigan | Method of embedding material in a glass substrate |
US9120667B2 (en) | 2011-06-20 | 2015-09-01 | International Business Machines Corporation | Micro-electro-mechanical system (MEMS) and related actuator bumps, methods of manufacture and design structures |
US9446947B2 (en) | 2014-08-25 | 2016-09-20 | Texas Instruments Incorporated | Use of metal native oxide to control stress gradient and bending moment of a released MEMS structure |
US10106398B2 (en) | 2015-05-28 | 2018-10-23 | Infineon Technologies Ag | Micromechanical structure comprising carbon material and method for fabricating the same |
Citations (5)
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US20030058069A1 (en) * | 2001-09-21 | 2003-03-27 | Schwartz Robert N. | Stress bimorph MEMS switches and methods of making same |
US20050062565A1 (en) * | 2003-09-18 | 2005-03-24 | Chia-Shing Chou | Method of using a metal platform for making a highly reliable and reproducible metal contact micro-relay MEMS switch |
US20050184836A1 (en) * | 2004-02-20 | 2005-08-25 | Chia-Shing Chou | Microelectromechanical device having a common ground plane layer and a set of contact teeth and method for making the same |
US20070146095A1 (en) * | 2005-12-22 | 2007-06-28 | Tsung-Kuan Allen Chou | Micro-electromechanical system (MEMS) switch |
CN101388325A (zh) * | 2007-09-12 | 2009-03-18 | 海力士半导体有限公司 | 形成半导体器件中微图案的方法 |
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CA2065581C (en) * | 1991-04-22 | 2002-03-12 | Andal Corp. | Plasma enhancement apparatus and method for physical vapor deposition |
US6184053B1 (en) * | 1993-11-16 | 2001-02-06 | Formfactor, Inc. | Method of making microelectronic spring contact elements |
US8033838B2 (en) * | 1996-02-21 | 2011-10-11 | Formfactor, Inc. | Microelectronic contact structure |
US6625004B1 (en) * | 2001-08-31 | 2003-09-23 | Superconductor Technologies, Inc. | Electrostatic actuators with intrinsic stress gradient |
US7943412B2 (en) * | 2001-12-10 | 2011-05-17 | International Business Machines Corporation | Low temperature Bi-CMOS compatible process for MEMS RF resonators and filters |
US6657525B1 (en) * | 2002-05-31 | 2003-12-02 | Northrop Grumman Corporation | Microelectromechanical RF switch |
KR100627139B1 (ko) * | 2004-06-18 | 2006-09-25 | 한국전자통신연구원 | 미세기전 구조물 그 제조방법 |
US7356920B2 (en) * | 2004-11-12 | 2008-04-15 | Palo Alto Research Center Incorporated | Micro-machined structure production using encapsulation |
US7335611B2 (en) * | 2005-08-08 | 2008-02-26 | Applied Materials, Inc. | Copper conductor annealing process employing high speed optical annealing with a low temperature-deposited optical absorber layer |
CN100482379C (zh) * | 2005-10-27 | 2009-04-29 | 鸿富锦精密工业(深圳)有限公司 | 一种压铸模仁及其制备方法 |
GB0523715D0 (en) * | 2005-11-22 | 2005-12-28 | Cavendish Kinetics Ltd | Method of minimising contact area |
JP4918656B2 (ja) * | 2005-12-21 | 2012-04-18 | 株式会社リケン | 非晶質硬質炭素皮膜 |
JP2008132583A (ja) * | 2006-10-24 | 2008-06-12 | Seiko Epson Corp | Memsデバイス |
US7989329B2 (en) * | 2007-12-21 | 2011-08-02 | Applied Materials, Inc. | Removal of surface dopants from a substrate |
US8507385B2 (en) * | 2008-05-05 | 2013-08-13 | Shanghai Lexvu Opto Microelectronics Technology Co., Ltd. | Method for processing a thin film micro device on a substrate |
CN101924542B (zh) * | 2009-06-11 | 2012-06-13 | 江苏丽恒电子有限公司 | 电容式微机电***开关及其制造方法 |
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2010
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Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
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US20030058069A1 (en) * | 2001-09-21 | 2003-03-27 | Schwartz Robert N. | Stress bimorph MEMS switches and methods of making same |
US20050062565A1 (en) * | 2003-09-18 | 2005-03-24 | Chia-Shing Chou | Method of using a metal platform for making a highly reliable and reproducible metal contact micro-relay MEMS switch |
US20050184836A1 (en) * | 2004-02-20 | 2005-08-25 | Chia-Shing Chou | Microelectromechanical device having a common ground plane layer and a set of contact teeth and method for making the same |
CN101018734A (zh) * | 2004-02-20 | 2007-08-15 | 无线微机电有限公司 | 微机电***开关的制作方法和微机电器件及其制作方法 |
US20070146095A1 (en) * | 2005-12-22 | 2007-06-28 | Tsung-Kuan Allen Chou | Micro-electromechanical system (MEMS) switch |
CN101388325A (zh) * | 2007-09-12 | 2009-03-18 | 海力士半导体有限公司 | 形成半导体器件中微图案的方法 |
Cited By (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105692543A (zh) * | 2013-01-25 | 2016-06-22 | 英飞凌科技股份有限公司 | Mems器件和制造mems器件的方法 |
CN104792583A (zh) * | 2014-01-17 | 2015-07-22 | 中芯国际集成电路制造(上海)有限公司 | 一种tem样品的制备方法 |
CN105217563A (zh) * | 2014-06-03 | 2016-01-06 | 联华电子股份有限公司 | 微机电元件的蚀刻方法 |
CN105217563B (zh) * | 2014-06-03 | 2016-11-30 | 联华电子股份有限公司 | 微机电元件的蚀刻方法 |
CN111180381B (zh) * | 2014-06-18 | 2021-08-27 | 艾克斯展示公司技术有限公司 | 用于控制可转印半导体结构的释放的***及方法 |
CN111180381A (zh) * | 2014-06-18 | 2020-05-19 | 艾克斯瑟乐普林特有限公司 | 用于控制可转印半导体结构的释放的***及方法 |
CN104313544A (zh) * | 2014-10-15 | 2015-01-28 | 西安交通大学 | Ecr离子/电子/离子交替照射工艺制备三明治碳膜及方法 |
US10462579B2 (en) | 2015-08-04 | 2019-10-29 | Infineon Technologies Ag | System and method for a multi-electrode MEMS device |
CN106454665B (zh) * | 2015-08-04 | 2019-12-20 | 英飞凌科技股份有限公司 | 用于多电极mems器件的***和方法 |
CN106454665A (zh) * | 2015-08-04 | 2017-02-22 | 英飞凌科技股份有限公司 | 用于多电极mems器件的***和方法 |
CN110357033A (zh) * | 2015-10-22 | 2019-10-22 | 艾克斯瑟乐普林特有限公司 | 用于控制可转移半导体结构的释放的结构及方法 |
CN110357033B (zh) * | 2015-10-22 | 2020-10-09 | 艾克斯展示公司技术有限公司 | 用于控制可转移半导体结构的释放的结构及方法 |
CN110316691A (zh) * | 2019-06-20 | 2019-10-11 | 清华大学 | 微型气动/液压驱动器及其加工方法 |
CN110316691B (zh) * | 2019-06-20 | 2022-05-20 | 清华大学 | 微型气动/液压驱动器及其加工方法 |
CN111473805A (zh) * | 2020-04-17 | 2020-07-31 | 江苏多维科技有限公司 | 一种微机电环境传感器及其制备方法 |
CN111473805B (zh) * | 2020-04-17 | 2021-09-21 | 江苏多维科技有限公司 | 一种微机电环境传感器及其制备方法 |
CN116199183A (zh) * | 2023-04-28 | 2023-06-02 | 润芯感知科技(南昌)有限公司 | 一种半导体器件及其制造方法 |
Also Published As
Publication number | Publication date |
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US20100301430A1 (en) | 2010-12-02 |
US8389317B2 (en) | 2013-03-05 |
CN101898745B (zh) | 2012-06-06 |
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Owner name: SHANGHAI LIHENGGUANG MICROELECTRONICS TECHNOLOGY C Free format text: FORMER OWNER: JIANGSU LIHENG ELECTRONICS CO., LTD. Effective date: 20110113 |
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Free format text: CORRECT: ADDRESS; FROM: 212009 ROOM 211, NO. 668, JINGSHIER ROAD, NEW + HIGH TECHNOLOGY INDUSTRY DEVELOPMENT ZONE, ZHENJIANG, JIANGSU PROVINCE TO: 201203 ROOM 501B, BUILDING 5, NO. 3000, LONGDONG AVENUE, ZHANGJIANG HIGH-TECH. PARK, SHANGHAI |
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Effective date of registration: 20110113 Address after: 201203, Shanghai Zhangjiang hi tech park, 3000 East Road, No. 5 building, room 501B Applicant after: Shanghai Lexvu Opto Mircoelectrics Technology Co., Ltd. Address before: 212009 Zhenjiang hi tech Industrial Development Zone, Jiangsu Province, No. twelve, No. 211, room 668 Applicant before: Jiangsu Liheng Electronic Co., Ltd. |
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Effective date of registration: 20160407 Address after: 710075, arc building, No. 60, West Avenue, new industrial park, hi tech Zone, Shaanxi, Xi'an, 204 Patentee after: Xi'an Yisheng Photoelectric Technology Co., Ltd. Address before: 201203, Shanghai Zhangjiang hi tech park, 3000 East Road, No. 5 building, room 501B Patentee before: Shanghai Lexvu Opto Mircoelectrics Technology Co., Ltd. |