CN101894883A - Novel light-transmitting micromorph silicon-based thin film solar battery laser scribing process - Google Patents
Novel light-transmitting micromorph silicon-based thin film solar battery laser scribing process Download PDFInfo
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- CN101894883A CN101894883A CN2010101914810A CN201010191481A CN101894883A CN 101894883 A CN101894883 A CN 101894883A CN 2010101914810 A CN2010101914810 A CN 2010101914810A CN 201010191481 A CN201010191481 A CN 201010191481A CN 101894883 A CN101894883 A CN 101894883A
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Abstract
The invention provides a novel light-transmitting micromorph silicon-based thin film solar battery laser scribing process. A micromorph silicon-based thin film solar battery is used as a base body, and thin films with different structures are scribed by laser so as to achieve the serial connection in the thin film solar battery and the transparency of the nontransparent substrate. Moreover, in the laser scribing process, only one kind of laser equipment with the wavelength of 1,064nm is adopted, replaces a green laser with the wavelength of 532nm, which usually scribes an absorption layer and a back reflection metal layer in the micromorph silicon-based thin film solar battery laser scribing process, and is used for scribing light-transmitting solar batteries. The novel light-transmitting micromorph silicon-based thin film solar battery laser scribing process has the advantages of greatly reducing the production cost of the whole solar battery and contributing to the development of domestic solar battery enterprises and laser equipment suppliers.
Description
Technical field
The present invention belongs to the photoelectric material technical field of new energies, relates to laser grooving and scribing technology and laser process equipment laser type selecting among the thin film solar cell preparation technology, particularly with non-/ little laminated silicon-base film solar cell laser grooving and scribing technology.
Background technology
Present stage is the protection environment, and the whole world starts the green economy tide, and each state of west all holds the big flag of " low-carbon economy " high.China is developing country, and the economic pace development is very fast, and thing followed environmental problem is serious day by day, and therefore development " low-carbon economy " is very urgent.Solar energy is inexhaustible, use not to the utmost, be very potential new forms of energy, solar energy industry is all actively being developed energetically in countries in the world.Thin film solar becomes solar energy the most potential developing direction in the industry because its distinctive advantage, and wherein with silicon-based thin film solar cell for.The silicon-based thin film solar cell industry development is quite huge in the world at present; annual economic benefit is also considerable; but a kind of like this situation has been brought entering in succession of a lot of enterprises; cause the silicon-based thin film solar cell inter-industry competition very fierce; the store financial crisis of just passing by in addition; make the sector profit straight line descend, cost has become the major issue that each silicon-based thin film solar cell producer is concerned about the most.
Current, in the silicon-based thin film solar cell industry main flow technology, radium-shine laser grooving and scribing is a very part and parcel, it is that the different retes of thin film solar cell are removed, reach a kind of effective means of solar cell internal series-connection, make the solar cell can effective integration, reach the full automation purpose.Present stage, nearly all silicon-based thin film solar cell producer all adopts three road laser grooving and scribing technologies, and wherein the first road laser uses 1064nm near infrared light, back twice process using 532nm green glow visible light.This mode causes laser equipment need select the different model laser for use, and separately independent running has increased entreprise cost virtually.How effectively reducing enterprise's production cost, reaching the scientific and reasonable laser process equipment that utilizes is current a difficult problem.
Summary of the invention
Purpose of the present invention, provide a kind of novel light-transmission type non-/ little laminated silicon-base film solar cell laser grooving and scribing technology, not only can effectively reduce the solar cell cost, and help domestic laser equipment merchant the design of these new ideas and the development of enterprise self.
The present invention is achieved through the following technical solutions: select 1064nm near-infrared small-power Nb:YVO4 semiconductor laser (buyable, as Fig. 3), coupling by frequency, electric current, realize the stable of power, realize thin film solar cell internal series-connections (as Fig. 4) to reach successively, guarantee seeing through of generating efficiency that thin film solar cell is stable and available light by different delineation technology modes.Diversely with prior art be: all laser grooving and scribing technologies of the present invention all only need a same wavelength laser 1064nm near-infrared laser process equipment to finish.
From the delineation of transparent conductive oxide (TCO) glass near-infrared laser, after laser grooving and scribing, prepare thin film solar cell semi-finished product (as shown in Figure 1), three roads delineation operation all is to delineate on the direction of Y-axis with 1064nm near-infrared laser process equipment to finish.With the thin film solar cell semi-finished product with 1064nm near-infrared laser process equipment at the X-direction of principal axis by the delineation of the 4th procedure, remove TCO+ non-/ little lamination+metal back electrode, the translucent thin-film solar cell semi-finished product that preparation is used to generate electricity.
Beneficial effect of the present invention:
(1) adopts frequency laser device of the same race, can effectively reduce the solar cell production cost;
(2) for non-/ little novel laminated battery material, this technology can reach better delineation effect, thereby guarantees the stability of solar cell delivery efficiency;
(3) help domestic laser equipment merchant to the design of these new ideas and the development of enterprise self.
Description of drawings
The technology path schematic diagram that Fig. 1 adopts for new technology among the present invention.
Fig. 2 is the technology path schematic diagram that current old technology adopts.
Fig. 3 is the internal structure substantially of 1064nm near infrared laser.
Among the figure: 1. Q-switch controller, 2. laser diode, 3. Nd-doped yttrium vanadate (Nd:YVO4) laser crystal, 4. co-deflection prism, output window, 5. output infrared laser (IR laser).
Fig. 4 is thin film solar cell internal structure and laser processing effect therein.
Among the figure: 1, ultra-white float glass, 2, transparent conductive oxide film, 3, amorphous silicon/microcrystalline silicon film, 4, the back electrode metal level.
P1, P2, P3 are respectively first, second, third road delineation operation.
Fig. 5 is a laser grooving and scribing technological effect schematic diagram of the present invention.
Among the figure: P1, P2, P3, P4 four procedures are finished by 1064nm near-infrared laser process equipment entirely.
Embodiment
Below in conjunction with accompanying drawing 1, to the novel light-transmission type of the present invention non-/ embodiment of little laminated silicon-base film solar cell laser grooving and scribing technology is described further:
1. transparent conductive oxide (TCO) glass is delineated at the Y-direction of principal axis with the 1064nm near-infrared laser, made and form insulation (P1) between baby battery and the baby battery;
2. the glass after the delineation is delivered to the non-/ little lamination absorbed layer of PECVD deposition;
3. the glass that PECVD has been deposited non-/ little lamination absorbed layer is sent to radium-shine process equipment website place, still uses 1064nm laser to delineate absorbed layer (P2) at the Y-direction of principal axis, makes and forms integrated circuit series system blank between the battery;
4.1064nm the glass after the laser grooving and scribing is delivered to PVD sputtering system sputter back of the body metal electrode again;
5. the glass after the PVD sputter is delivered to the 1064nm laser process equipment again and delineate (P3), absorbed layer and back electrode are removed, really form the perfection series connection between battery at the Y-direction of principal axis;
6. after last process was finished, product promptly can be used for generating, is the thin film solar cell semi-finished product;
With this semi-finished product with the 1064nm laser process equipment the X-direction of principal axis remove TCO+ non-/ little lamination+metal back electrode (P4), forms many printing opacity lines (as Fig. 5), the translucent thin-film solar cell semi-finished product that are used to generate electricity prepare to be finished.
8. used 1064nm near-infrared laser process equipment is a small-power Nb:YVO4 semiconductor laser.
Claims (2)
- A novel light-transmission type non-/ little laminated silicon-base film solar cell laser grooving and scribing technology, comprise transparent conductive oxide (TCO) the glass first road near-infrared laser delineation operation, the PECVO deposition absorbs the back second road laser grooving and scribing operation, the 3rd road laser grooving and scribing operation behind the PVD back reflection metal level physical sputtering is characterized in that:(1) begin preparation thin film solar cell semi-finished product after the laser grooving and scribing from transparent conductive oxide (TCO) glass near-infrared laser delineation, delineation operation in three roads all is to be that 1064nm near-infrared laser process equipment is delineated on the Y-direction of principal axis and finished with wavelength;(2) with the thin film solar cell semi-finished product with 1064nm near-infrared laser process equipment in the delineation of X-direction of principal axis, remove TCO+ non-/ little lamination+metal back electrode, the translucent thin-film solar cell semi-finished product that preparation is used to generate electricity.
- 2. a kind of novel light-transmission type according to claim 1 is non-/ little laminated silicon-base film solar cell laser grooving and scribing technology, and it is characterized in that: 1064nm near-infrared laser process equipment is a small-power Nb:YVO4 semiconductor laser.
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| CN2010101914810A CN101894883A (en) | 2010-06-03 | 2010-06-03 | Novel light-transmitting micromorph silicon-based thin film solar battery laser scribing process |
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| CN2010101914810A CN101894883A (en) | 2010-06-03 | 2010-06-03 | Novel light-transmitting micromorph silicon-based thin film solar battery laser scribing process |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102299209A (en) * | 2011-09-13 | 2011-12-28 | 上海太阳能电池研究与发展中心 | Method for manufacturing integrated film solar cell assembly |
| CN102376825A (en) * | 2011-11-11 | 2012-03-14 | 保定天威集团有限公司 | Method for manufacturing solar thin film light transmitting component |
| CN102886608A (en) * | 2011-07-20 | 2013-01-23 | 三星钻石工业股份有限公司 | Laser scribing device |
| CN113594281A (en) * | 2021-07-30 | 2021-11-02 | 成都中建材光电材料有限公司 | Hot-spot-resistant photovoltaic power generation glass and manufacturing method thereof |
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| JP2007201302A (en) * | 2006-01-30 | 2007-08-09 | Honda Motor Co Ltd | Solar cell and its manufacturing method |
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102886608A (en) * | 2011-07-20 | 2013-01-23 | 三星钻石工业股份有限公司 | Laser scribing device |
| CN102886608B (en) * | 2011-07-20 | 2015-07-08 | 三星钻石工业股份有限公司 | Laser scribing device |
| CN102299209A (en) * | 2011-09-13 | 2011-12-28 | 上海太阳能电池研究与发展中心 | Method for manufacturing integrated film solar cell assembly |
| CN102299209B (en) * | 2011-09-13 | 2013-04-10 | 上海太阳能电池研究与发展中心 | Method for manufacturing integrated film solar cell assembly |
| CN102376825A (en) * | 2011-11-11 | 2012-03-14 | 保定天威集团有限公司 | Method for manufacturing solar thin film light transmitting component |
| CN113594281A (en) * | 2021-07-30 | 2021-11-02 | 成都中建材光电材料有限公司 | Hot-spot-resistant photovoltaic power generation glass and manufacturing method thereof |
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Open date: 20101124 |