CN101892015B - Fluorine-free polishing agent composition - Google Patents
Fluorine-free polishing agent composition Download PDFInfo
- Publication number
- CN101892015B CN101892015B CN 201010246593 CN201010246593A CN101892015B CN 101892015 B CN101892015 B CN 101892015B CN 201010246593 CN201010246593 CN 201010246593 CN 201010246593 A CN201010246593 A CN 201010246593A CN 101892015 B CN101892015 B CN 101892015B
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- fluorine
- weight
- polishing agent
- emulsion
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Abstract
Description
Sequence number | Form | Consumption |
1 | Deionized water | 51.20 |
2 | Tegopren 5878 | 0.10 |
3 | Tego 314XP | 0.10 |
4 | Diethylene glycol monoethyl ether | 4.00 |
5 | Three butoxy ethyl ester of phosphoric acid | 1.60 |
6 | Sunpolymer-100 | 35.00 |
7 | WE1401 | 8.00 |
Sequence number | Form | Consumption |
1 | Deionized water | 44.30 |
2 | Tegopren 5840 | 0.30 |
3 | Tego 314XP | 0.10 |
4 | Diethylene glycol monoethyl ether | 4.50 |
5 | Dipropylene glycol monomethyl ether | 2.00 |
6 | Three butoxy ethyl ester of phosphoric acid | 1.80 |
7 | Sunpolymer-300 | 45.00 |
8 | Primal 1531 | 2.00 |
Polishing agent combination A | Polishing agent combination B | Polishing agent combination C | |
Glossiness/60 ° | 82 | 86 | 81 |
Wetting levelability | Very good | Very good | Very good |
Claims (3)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN 201010246593 CN101892015B (en) | 2010-08-06 | 2010-08-06 | Fluorine-free polishing agent composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN 201010246593 CN101892015B (en) | 2010-08-06 | 2010-08-06 | Fluorine-free polishing agent composition |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101892015A CN101892015A (en) | 2010-11-24 |
CN101892015B true CN101892015B (en) | 2013-04-03 |
Family
ID=43101368
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN 201010246593 Active CN101892015B (en) | 2010-08-06 | 2010-08-06 | Fluorine-free polishing agent composition |
Country Status (1)
Country | Link |
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CN (1) | CN101892015B (en) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102643586A (en) * | 2012-05-08 | 2012-08-22 | 合众(佛山)化工有限公司 | High-solid-content quick-drying water-based white primer and preparation method thereof |
CN104974673A (en) * | 2014-12-02 | 2015-10-14 | 裴萌 | Shoe polish |
CN105538714B (en) * | 2015-12-30 | 2018-08-07 | 中山大学惠州研究院 | A kind of 3D printing product polishing agent and preparation method thereof and polishing method |
CN107541729A (en) * | 2017-09-21 | 2018-01-05 | 安徽霍山龙鑫金属科技有限公司 | A kind of high-performance environment-friendly metal polish and preparation method thereof |
CN108624238B (en) * | 2018-05-15 | 2020-09-18 | 江苏雪豹日化有限公司 | Durable wear-resistant floor polishing agent and preparation method thereof |
CN109575733B (en) * | 2018-12-06 | 2021-02-05 | 山东中佳生活服务有限公司 | Safe and environment-friendly anti-skid composition and application thereof in vehicles |
CN113322008A (en) * | 2021-05-10 | 2021-08-31 | 南京卓胜自动化设备有限公司 | Single crystal alkali polishing additive, polishing solution and polishing method |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4776269B2 (en) * | 2005-04-28 | 2011-09-21 | 株式会社東芝 | Metal film CMP slurry and method for manufacturing semiconductor device |
CN100478413C (en) * | 2007-04-25 | 2009-04-15 | 上海三瑞化学有限公司 | Low-luster polishing agent combination and preparation method thereof |
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2010
- 2010-08-06 CN CN 201010246593 patent/CN101892015B/en active Active
Also Published As
Publication number | Publication date |
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CN101892015A (en) | 2010-11-24 |
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Legal Events
Date | Code | Title | Description |
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C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: SHANGHAI SANRUI POLYMER MATERIALS CO., LTD. Free format text: FORMER OWNER: SHANGHAI SANRUI CHEMISTRY CO., LTD. Effective date: 20150522 |
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C41 | Transfer of patent application or patent right or utility model | ||
COR | Change of bibliographic data |
Free format text: CORRECT: ADDRESS; FROM: 200237 XUHUI, SHANGHAI TO: 200232 XUHUI, SHANGHAI |
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TR01 | Transfer of patent right |
Effective date of registration: 20150522 Address after: 200232 Shanghai city Xuhui District Xi Road No. 237 Building No. 17 Patentee after: SHANGHAI SANRUI HIGH-POLYMER MATERIAL CO., LTD. Patentee after: Nanjing Regal Polymer Co., Ltd. Address before: 200237 Shanghai City Jia Chuan Road No. 245 Building No. 3 8 floor Patentee before: Shanghai Sanrui Chemistry Co., Ltd. Patentee before: Nanjing Regal Polymer Co., Ltd. |
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C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20160325 Address after: 200232 Shanghai city Xuhui District Xi Road No. 237 Building No. 17 Patentee after: SHANGHAI SANRUI HIGH-POLYMER MATERIAL CO., LTD. Address before: 200232 Shanghai city Xuhui District Xi Road No. 237 Building No. 17 Patentee before: SHANGHAI SANRUI HIGH-POLYMER MATERIAL CO., LTD. Patentee before: Nanjing Regal Polymer Co., Ltd. |