The manufacture method of conductor track structure
Technical field
The present invention relates to non-conductive loading material technical field, specifically a kind of manufacture method of conductor track structure.
Background technology
The domestic patent No.: 02812609.2 discloses a kind of manufacture method of conductor track structure, this conductor track structure by the metal nucleus and follow-up on metal core, apply metal layer constitute, wherein the metal nucleus forms by the meticulous fracture that is included in the non conducting metallized compound in the loading material of electromagnetic irradiation realization with distributing, non conducting metallized compound by highly heat-staple in moisture acidity or alkalinous metal electrolyte stable and undissolved inorganic oxide constitute, these oxides are the higher-order oxides with spinel structure, or simple d-metal oxide or its mixture or the mixed-metal compounds of the same clan with spinel structure, and described oxide remains unchanged in not irradiated zone.
Summary of the invention
Be to solve the restriction of original technology (patent No. ZL 02812609.2) to loading material order of the present invention; By the change and the process optimization of flow process, solved the metallization problem of all non-conductive loading materials, overcome the deficiency of original method.
For achieving the above object, design a kind of manufacture method of conductor track structure, it is characterized in that described manufacturing approach craft step is as follows: a. injection mo(u)lding, adopt common plastics ABS, squeeze out the ABS plastic goods with extruder, b. laser treatment, with laser radiation ABS plastic product surface, realize the different of irradiation area and non-irradiation area, form micro-rough at material surface, have the surface of microcellular structure, the c. chemical activation, according to the material surface structure, configuration palladium solution or silver-colored solution, a certain amount of precious metal atom of irradiation area surface adsorption is as the basis of selective chemical plating, d. selective metallization, the ABS plastic goods of above-mentioned processing are put into common electronation copper plating solution, realize the selective metallization film, the e. conductor rail forms, according to the needs of conductor rail, adopt chemical reduction method or electrolysis metallized film to be thickeied the thickness of needs.
Described chemical activation processing step is as follows: a. is degreasing 5-10min under 40 ℃ of-60 ℃ of temperature, b. washing 1-2 time, and c. preimpregnation 3-5min, d. activates 3-6min, e. washing 1-2 time.
Comprise in the described chemical activation technology and adopt fast metallization processes.
The present invention compared with prior art, non-conductive loading material applicable surface is wider, application is unrestricted; Owing to need not add extra material,, make that the original characteristic of non-conductive loading material is well kept such as non conducting metallized compound; Simultaneously, adopting does not have the special common material of handling, and makes cost have significantly and reduces.
Description of drawings
The present invention is further described below in conjunction with drawings and Examples.
Fig. 1 is a process chart of the present invention.
Appointment Fig. 1 is a Figure of abstract
Embodiment
1, common plastics ABS is adopted in injection mo(u)lding, squeezes out the ABS plastic goods with extruder.
2, laser treatment with laser radiation ABS plastic product surface, realizes the different of irradiation area and non-irradiation area, forms micro-rough at material surface, has the surface of microcellular structure, for different surface textures is created in the subsequent chemistry activation
3, chemical activation, according to the material surface structure, configuration palladium solution or silver-colored solution are realized a certain amount of precious metal atom of irradiation area surface adsorption, as the basis of selective chemical plating.
4, selective metallization is put into common electronation copper plating solution with the ABS plastic goods of above-mentioned processing, realizes the selective metallization film.
5, conductor rail forms, and according to the needs of conductor rail, adopts chemical reduction method or electrolysis metallized film to be thickeied the thickness of needs.
Non-conductive loading material is taken from present existing technology and material, comprises existing plastics, pottery etc., and they do not need to add special material, use said method just can realize selective metallization; Adopt the mode of laser radiation, realize the different of irradiation area and non-irradiation area; By the mode of chemical activation,, make follow-up chemistry redox reaction to cause with the microcellular structure absorption of active component and plastics irradiation area.The structure of this micropore can guarantee more firm combination and lasting riveted.
Adhesion between conductor rail and the plastics improves, it is more firm in mechanical properties to utilize the goods of common ABS plastic forming materials relatively to add the goods of plastic shaping of non conducting metallized compound, toughness is better, the copper conductor interorbital heat-conductivity conducting performance difference of common ABS plastic and embedding is more remarkable, more possesses advantage at the anti-interference demanding electronics of some electromagnetism and field of wireless communication.