CN101767939B - High-permeability, tempered and low-radiation coated glass and manufacturing method thereof - Google Patents
High-permeability, tempered and low-radiation coated glass and manufacturing method thereof Download PDFInfo
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- CN101767939B CN101767939B CN2009101566631A CN200910156663A CN101767939B CN 101767939 B CN101767939 B CN 101767939B CN 2009101566631 A CN2009101566631 A CN 2009101566631A CN 200910156663 A CN200910156663 A CN 200910156663A CN 101767939 B CN101767939 B CN 101767939B
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Abstract
The invention relates to high-permeability and low-radiation glass, in particular to high-permeability, tempered and low-radiation coated glass with good sequent heat treatment effect and a manufacturing method thereof. The high-permeability, tempered and low-radiation coated glass comprises a glass substrate which is sequentially plated with an anti-reflection film layer, a high-temperature resisting and flame-retardant film layer, a metal isolating film layer, a low-radiation functional film layer, a metal isolating film layer, an anti-reflection film layer, a high-temperature resisting and flame-retardant film layer and a protection layer outwards. The high-permeability, tempered and low-radiation coated glass can carry out tempering and hot-bending treatment under the conditions of 680 to 710 DEG C and has the advantages of firm film layers before and after tempering, stable optical property, prolonged service life of the film layers, and the like. The invention successfully solves the appearance defects of the high-permeability, tempered and low-radiation coated glass, such as instable and muddy color after the tempering, weak visible effect, easy demoulding and oxidation before and after the tempering, and the like.
Description
Technical field
The present invention relates to high low emissivity glass, high-permeability, tempered and low-radiation coated glass and the method for manufacture thereof that especially a kind of subsequent heat treatment is effective of passing through.
Background technology
The residence energy saving double glazing more is to adopt highly to pass through glass, and high-permeability, tempered and low-radiation coated glass, in promoting the use of in recent years, has problems always:
1, color is unstable behind the glass tempering, makes glass in following process, in use have a bigger quality risk.
2, product colour is muddy behind the tempering, and visual effect is poor, has influenced promoting the use of of product.
3, before the tempering, macroscopic irregularity is many behind the tempering, is prone to oxidation etc. like demoulding, rete, makes product in follow-up use, causes a large amount of waste products, bring bigger financial loss for the user and the producer, and influenced company's reputation.
Problems such as 4, radiant ratio raises above 0.15 behind the glass tempering, surpasses national standard, and energy-saving effect is undesirable.
Because the existence of above problem is promoted high-permeability, tempered and low-radiation coated glass and run into bigger obstacle, a lot of clients dare not continue to promote the use of after using once.External product is seized the opportunity and has been captured market.Domestic coated glass company has only and has solved the above problem that high-permeability, tempered and low-radiation exists, and could promote the popularization of residence energy saving low emissivity glass better, dominate the market better, and be client, the better benefit of society's creation better.
Summary of the invention
The present invention is directed to the deficiency of above-mentioned existing high-permeability, tempered and low-radiation coated glass; Better high-permeability, tempered and low-radiation coated glass of a kind of resistance toheat and method of manufacture thereof are provided; This glass can carry out tempering under the temperature condition between 680 ℃～710 ℃, and rete is firm behind the tempering, colour stable; Product thickness from before be no more than 8mm, bring up to 12mm.
To achieve these goals, the technical scheme that the present invention adopted is:
A kind of high-permeability, tempered and low-radiation coated glass; Comprise glass substrate, said glass substrate outwards has been coated with antireflection rete, heat-resistant fireproof rete, metal separating film layer, low radiation functions rete, metal separating film layer, antireflection rete, heat-resistant fireproof rete, resist successively.
A kind of method of manufacture of high-permeability, tempered and low-radiation coated glass comprises cleaning, oven dry, plated film, the packing of glass substrate, and said coating process adopts the vacuum magnetic-control sputtering mode, is 5 * 10 in vacuum tightness
-6In the environment below the mbar, outwards be coated with successively from glass substrate by following order,
(1), on glass substrate, be coated with the antireflection rete: utilize rotating cathode, under the control of intermediate frequency power supply, the ZnSn target is sputtering sedimentation under oxygen atmosphere, and power is 60Kw, and depositional coating thickness is 55～60nm.Prepared antireflection rete is zinc-tin oxide (ZnSnOx).
(2), be coated with the heat-resistant fireproof rete: utilize rotating cathode, under the control of intermediate frequency power supply, the Sb target is sputtering sedimentation under oxygen atmosphere, and power is 60Kw, and depositional coating thickness is 45～50nm.Prepared heat-resistant fireproof rete is weisspiessglanz (SbOx).
(3), be coated with the metal separating film layer: utilize planar cathode, under the control of direct supply, the NiCr target is in the argon oxygen atmosphere, and wherein oxygen proportion is 5%, and sputtering sedimentation, power are 5Kw, and depositional coating thickness is 4～5nm.Prepared metal separating film layer is pyrolic alloy (NiCrOx).
(4), be coated with the low radiation functions rete: utilize planar cathode, under the control of direct supply, the Ag target is in argon atmospher, and sputtering sedimentation, power are 4Kw, and depositional coating thickness is 8nm.Prepared low radiation functions rete is argent (Ag).
(5), be coated with the metal separating film layer: utilize planar cathode, under the control of direct supply, the NiCr target is in the argon oxygen atmosphere, and wherein oxygen proportion is 5%, and sputtering sedimentation, power are 5Kw, and depositional coating thickness is 5～6nm.Prepared metal separating film layer is pyrolic alloy (NiCrOx).
(6), be coated with the antireflection rete: utilize rotating cathode, under the control of intermediate frequency power supply, the ZnSn target is sputtering sedimentation under oxygen atmosphere, and power is 60Kw, and depositional coating thickness is 55～60nm.Prepared antireflection rete is zinc-tin oxide (ZnSnOx).
(7), be coated with the heat-resistant fireproof rete: utilize rotating cathode, under the control of intermediate frequency power supply, the Sb target is sputtering sedimentation under oxygen atmosphere, and power is 60Kw, and depositional coating thickness is 45～50nm.Prepared heat-resistant fireproof rete is weisspiessglanz (SbOx).
(8), be coated with resist, utilize rotating cathode, under the control of intermediate frequency power supply, the Si target is sputtering sedimentation under oxygen atmosphere, power is 60Kw, depositional coating thickness is 35～40nm.Prepared resist is silicon oxide (SiOx).
The method of manufacture of high-permeability, tempered and low-radiation coated glass of the present invention, its coating process adopts the vacuum magnetic-control sputtering mode, is 5 * 10 in vacuum tightness
-6In the environment below the mbar, utilize the high pressure ionization process gas, the bombardment target material surface, the target ion deposition of acquisition is on glass surface, and thicknesses of layers is usually in several nanometers～tens nanometer range.
Principle of design of the present invention is following:
The present invention selects for use the more excellent Coating Materials of performance as protecting materials, has improved the resistant to elevated temperatures ability of product, and the low radiation functions layer has been played the better protection effect.
Early stage media protection material is selected SnOx, ZnOx, TiOx usually for use; Because its microtexture is the cylinder vesicular structure; Airborne water and sulfide there are very strong perviousness and diffusion effect, thereby cause the weather resistance of film, resistance to elevated temperatures to be degenerated, often cause rete to be prone to oxidation.Corrosion-resistant, wear no resistance, rete and glass surface loss of adhesion causes the work-ing life of product short, performance deficiency such as color instability behind the tempering.
Select the more superior plated film media protection material of performance for use, as: ZnSnOx, SbOx, because its material structure is fine and close, level and smooth, novel material has better physicals and resist chemical performance.Plate out the rete that comes and have very strong anticorrosive, anti-machinery scuffing, the performance of high temperature resistance, thus the properties for follow and the work-ing life of having improved product.
Adopt pure oxygen that the media protection material is carried out sputter, guaranteed the purity of film material, reduced the adulterated impurity of rete, make film layer structure more complete, bonding force is higher, has guaranteed the density of rete effectively, has guaranteed the stability of products production effectively.
Because Structure with Surface Coatings is fine and close, level and smooth, has improved the resistant to elevated temperatures ability of product, the forward and backward rete of tempering is firm, and the low radiation functions layer has been played the better protection effect, and low radiation functions layer Ag is difficult for oxidation behind the tempering.Thereby before having improved the product tempering, the stability of the color behind the tempering, and permeability is higher behind the product tempering, and product colour is limpider, it is beautiful more to dazzle, lifting glass curtain wall exterior quality.
In addition, the metal separating film layer pyrolic alloy (NiCrOx) on low-radiation film layer both sides is in heat-processed; Oxygen to the part infiltration has avidity preferably; Effectively caught oxygen molecule, better protection low radiation functions layer Ag, in addition since the part close with oxidation; Form the visible light transmissivity that NiCrOx has improved product effectively, improved the permeability of product.
Owing to use the fire retardant material weisspiessglanz as Coating Materials; Improved the resistant to elevated temperatures impact capacity of rete; Improved the protective capability of rete, made its resistance toheat be superior to traditional Coating Materials, solved the bigger problem of high-permeability, tempered Low-E tempering front and back colour-change functional layer Ag; The many problems of macroscopic irregularity behind the tempering; The problem that the glass radiant ratio is higher.
Below in conjunction with accompanying drawing and embodiment the present invention is described further.
Description of drawings
Fig. 1 is the structural representation of high-permeability, tempered and low-radiation coated glass of the present invention.
Embodiment
Through specific embodiment the present invention is described further below, but the present invention is not limited by following examples.
Each embodiment sees also accompanying drawing 1.
Embodiment 1:
High-permeability, tempered and low-radiation coated glass of the present invention; Comprise glass substrate 1, glass substrate 1 outwards has been coated with antireflection rete 2, heat-resistant fireproof rete 3, metal separating film layer 4, low radiation functions rete 5, metal separating film layer 6, antireflection rete 7, heat-resistant fireproof rete 8, resist 9 successively.
The method of manufacture of high-permeability, tempered and low-radiation coated glass of the present invention is following:
One, the cleaning of glass substrate 1, oven dry.
Two, on glass substrate 1, carry out plated film.This coating process adopts the vacuum magnetic-control sputtering mode, is 5 * 10 in vacuum tightness
-6In the environment below the mbar, outwards be coated with successively from glass substrate 1 by following order:
(1), on glass substrate 1, be coated with antireflection rete 2: utilize rotating cathode, under the control of intermediate frequency power supply, the ZnSn target is sputtering sedimentation under oxygen atmosphere, and power is 60Kw, and depositional coating thickness is 55nm.Prepared antireflection rete 2 is ZnSnO
3
(2), on antireflection rete 2, be coated with heat-resistant fireproof rete 3: utilize rotating cathode, under the control of intermediate frequency power supply, the Sb target is sputtering sedimentation under oxygen atmosphere, and power is 60Kw, and depositional coating thickness is 50nm.Prepared heat-resistant fireproof rete 3 is Sb
2O
3
(3), on heat-resistant fireproof rete 3, be coated with metal separating film layer 4: utilize planar cathode, under the control of direct supply, the NiCr target is in the argon oxygen atmosphere, and wherein oxygen proportion is 5%, and sputtering sedimentation, power are 5Kw, and depositional coating thickness is 5nm.Prepared metal separating film layer 4 is NiCrO
3, and NiCrO
3Partially oxidation.
(4), on metal separating film layer 4, be coated with low radiation functions rete 5: utilize planar cathode, under the control of direct supply, the Ag target is in argon atmospher, and sputtering sedimentation, power are 4Kw, and depositional coating thickness is 8nm.Prepared low radiation functions rete 5 is metal A g.
(5), on low radiation functions rete 5, be coated with metal separating film layer 6: utilize planar cathode, under the control of direct supply, the NiCr target is in the argon oxygen atmosphere, and wherein oxygen proportion is 5%, and sputtering sedimentation, power are 5Kw, and depositional coating thickness is 6nm.Prepared metal separating film layer 6 is NiCrO
3, and NiCrO
3Partially oxidation.
(6), on metal separating film layer 6, be coated with antireflection rete 7: utilize rotating cathode, under the control of intermediate frequency power supply, the ZnSn target is sputtering sedimentation under oxygen atmosphere, and power is 60Kw, and depositional coating thickness is 60nm.Prepared antireflection rete 7 is ZnSnO
3
(7), on antireflection rete 7, be coated with heat-resistant fireproof rete 8: utilize rotating cathode, under the control of intermediate frequency power supply, the Sb target is sputtering sedimentation under oxygen atmosphere, and power is 60Kw, and depositional coating thickness is 50nm.Prepared heat-resistant fireproof rete 8 is Sb
2O
3
(8), on heat-resistant fireproof rete 8, be coated with resist 9, utilize rotating cathode, under the control of intermediate frequency power supply, the Si target is sputtering sedimentation under oxygen atmosphere, power is 60Kw, depositional coating thickness is 40nm.Prepared resist 9 is SiO
2
Three, inspection after construction, packing.
Embodiment 2:
High-permeability, tempered and low-radiation coated glass of the present invention; Comprise glass substrate 1, glass substrate 1 outwards has been coated with antireflection rete 2, heat-resistant fireproof rete 3, metal separating film layer 4, low radiation functions rete 5, metal separating film layer 6, antireflection rete 7, heat-resistant fireproof rete 8, resist 9 successively.
The method of manufacture of high-permeability, tempered and low-radiation coated glass of the present invention is following:
One, the cleaning of glass substrate 1, oven dry.
Two, on glass substrate 1, carry out plated film.This coating process adopts the vacuum magnetic-control sputtering mode, is 5 * 10 in vacuum tightness
-6In the environment below the mbar, outwards be coated with successively from glass substrate 1 by following order:
(1), on glass substrate 1, be coated with antireflection rete 2: utilize rotating cathode, under the control of intermediate frequency power supply, the ZnSn target is sputtering sedimentation under oxygen atmosphere, and power is 60Kw, and depositional coating thickness is 60nm.Prepared antireflection rete 2 is ZnSnO
4
(2), on antireflection rete 2, be coated with heat-resistant fireproof rete 3: utilize rotating cathode, under the control of intermediate frequency power supply, the Sb target is sputtering sedimentation under oxygen atmosphere, and power is 60Kw, and depositional coating thickness is 45nm.Prepared heat-resistant fireproof rete 3 is Sb
2O
5
(3), on heat-resistant fireproof rete 3, be coated with metal separating film layer 4: utilize planar cathode, under the control of direct supply, the NiCr target is in the argon oxygen atmosphere, and wherein oxygen proportion is 5%, and sputtering sedimentation, power are 5Kw, and depositional coating thickness is 4nm.Prepared metal separating film layer 4 is NiCrO
4, and NiCrO
4Partially oxidation.
(4), on metal separating film layer 4, be coated with low radiation functions rete 5: utilize planar cathode, under the control of direct supply, the Ag target is in argon atmospher, and sputtering sedimentation, power are 4Kw, and depositional coating thickness is 8nm.Prepared low radiation functions rete 5 is metal A g.
(5), on low radiation functions rete 5, be coated with metal separating film layer 6: utilize planar cathode, under the control of direct supply, the NiCr target is in the argon oxygen atmosphere, and wherein oxygen proportion is 5%, and sputtering sedimentation, power are 5Kw, and depositional coating thickness is 5nm.Prepared metal separating film layer 6 is NiCrO
4, and NiCrO
4Partially oxidation.
(6), on metal separating film layer 6, be coated with antireflection rete 7: utilize rotating cathode, under the control of intermediate frequency power supply, the ZnSn target is sputtering sedimentation under oxygen atmosphere, and power is 60Kw, and depositional coating thickness is 55nm.Prepared antireflection rete 7 is ZnSnO
4
(7), on antireflection rete 7, be coated with heat-resistant fireproof rete 8: utilize rotating cathode, under the control of intermediate frequency power supply, the Sb target is sputtering sedimentation under oxygen atmosphere, and power is 60Kw, and depositional coating thickness is 45nm.Prepared heat-resistant fireproof rete 8 is Sb
2O
5
(8), on heat-resistant fireproof rete 8, be coated with resist 9, utilize rotating cathode, under the control of intermediate frequency power supply, the Si target is sputtering sedimentation under oxygen atmosphere, power is 60Kw, depositional coating thickness is 35nm.Prepared resist 9 is SiO
3
Three, inspection after construction, packing.
Embodiment 3:
High-permeability, tempered and low-radiation coated glass of the present invention; Comprise glass substrate 1, glass substrate 1 outwards has been coated with antireflection rete 2, heat-resistant fireproof rete 3, metal separating film layer 4, low radiation functions rete 5, metal separating film layer 6, antireflection rete 7, heat-resistant fireproof rete 8, resist 9 successively.
The method of manufacture of high-permeability, tempered and low-radiation coated glass of the present invention is following:
One, the cleaning of glass substrate 1, oven dry.
Two, on glass substrate 1, carry out plated film.This coating process adopts the vacuum magnetic-control sputtering mode, is 5 * 10 in vacuum tightness
-6In the environment below the mbar, outwards be coated with successively from glass substrate 1 by following order:
(1), on glass substrate 1, be coated with antireflection rete 2: utilize rotating cathode, under the control of intermediate frequency power supply, the ZnSn target is sputtering sedimentation under oxygen atmosphere, and power is 60Kw, and depositional coating thickness is 56nm.Prepared antireflection rete 2 is ZnSnO
4, ZnSnO
3Mixture.
(2), on antireflection rete 2, be coated with heat-resistant fireproof rete 3: utilize rotating cathode, under the control of intermediate frequency power supply, the Sb target is sputtering sedimentation under oxygen atmosphere, and power is 60Kw, and depositional coating thickness is 49nm.Prepared heat-resistant fireproof rete 3 is Sb
2O
5, Sb
2O
3Mixture.
(3), on heat-resistant fireproof rete 3, be coated with metal separating film layer 4: utilize planar cathode, under the control of direct supply, the NiCr target is in the argon oxygen atmosphere, and wherein oxygen proportion is 5%, and sputtering sedimentation, power are 5Kw, and depositional coating thickness is 4.7nm.Prepared metal separating film layer 4 is NiCrO
4, NiCrO
3Mixture, and NiCrO
4, NiCrO
3Partially oxidation.
(4), on metal separating film layer 4, be coated with low radiation functions rete 5: utilize planar cathode, under the control of direct supply, the Ag target is in argon atmospher, and sputtering sedimentation, power are 4Kw, and depositional coating thickness is 8nm.Prepared low radiation functions rete 5 is metal A g.
(5), on low radiation functions rete 5, be coated with metal separating film layer 6: utilize planar cathode, under the control of direct supply, the NiCr target is in the argon oxygen atmosphere, and wherein oxygen proportion is 5%, and sputtering sedimentation, power are 5Kw, and depositional coating thickness is 5.8nm.Prepared metal separating film layer 6 is NiCrO
4, NiCrO
3Mixture, and NiCrO
4, NiCrO
3Partially oxidation.
(6), on metal separating film layer 6, be coated with antireflection rete 7: utilize rotating cathode, under the control of intermediate frequency power supply, the ZnSn target is sputtering sedimentation under oxygen atmosphere, and power is 60Kw, and depositional coating thickness is 59nm.Prepared antireflection rete 7 is ZnSnO
4, ZnSnO
3Mixture.
(7), on antireflection rete 7, be coated with heat-resistant fireproof rete 8: utilize rotating cathode, under the control of intermediate frequency power supply, the Sb target is sputtering sedimentation under oxygen atmosphere, and power is 60Kw, and depositional coating thickness is 46nm.Prepared heat-resistant fireproof rete 8 is Sb
2O
5, Sb
2O
3Mixture.
(8), on heat-resistant fireproof rete 8, be coated with resist 9, utilize rotating cathode, under the control of intermediate frequency power supply, the Si target is sputtering sedimentation under oxygen atmosphere, power is 60Kw, depositional coating thickness is 37nm.Prepared resist 9 is SiO
3, SiO
2Mixture.
Three, inspection after construction, packing.
Embodiment 4:
High-permeability, tempered and low-radiation coated glass of the present invention; Comprise glass substrate 1, glass substrate 1 outwards has been coated with antireflection rete 2, heat-resistant fireproof rete 3, metal separating film layer 4, low radiation functions rete 5, metal separating film layer 6, antireflection rete 7, heat-resistant fireproof rete 8, resist 9 successively.
The method of manufacture of high-permeability, tempered and low-radiation coated glass of the present invention is following:
One, the cleaning of glass substrate 1, oven dry.
Two, on glass substrate 1, carry out plated film.This coating process adopts the vacuum magnetic-control sputtering mode, is 5 * 10 in vacuum tightness
-6In the environment below the mbar, outwards be coated with successively from glass substrate 1 by following order:
(1), on glass substrate 1, be coated with antireflection rete 2: utilize rotating cathode, under the control of intermediate frequency power supply, the ZnSn target is sputtering sedimentation under oxygen atmosphere, and power is 60Kw, and depositional coating thickness is 57nm.Prepared antireflection rete 2 is ZnSnO
4
(2), on antireflection rete 2, be coated with heat-resistant fireproof rete 3: utilize rotating cathode, under the control of intermediate frequency power supply, the Sb target is sputtering sedimentation under oxygen atmosphere, and power is 60Kw, and depositional coating thickness is 48nm.Prepared heat-resistant fireproof rete 3 is Sb
2O
5
(3), on heat-resistant fireproof rete 3, be coated with metal separating film layer 4: utilize planar cathode, under the control of direct supply, the NiCr target is in the argon oxygen atmosphere, and wherein oxygen proportion is 5%, and sputtering sedimentation, power are 5Kw, and depositional coating thickness is 4.2nm.Prepared metal separating film layer 4 is NiCrO
3, and NiCrO
3Partially oxidation.
(4), on metal separating film layer 4, be coated with low radiation functions rete 5: utilize planar cathode, under the control of direct supply, the Ag target is in argon atmospher, and sputtering sedimentation, power are 4Kw, and depositional coating thickness is 8nm.Prepared low radiation functions rete 5 is metal A g.
(5), on low radiation functions rete 5, be coated with metal separating film layer 6: utilize planar cathode, under the control of direct supply, the NiCr target is in the argon oxygen atmosphere, and wherein oxygen proportion is 5%, and sputtering sedimentation, power are 5Kw, and depositional coating thickness is 5.5nm.Prepared metal separating film layer 6 is NiCrO
4, and NiCrO
4Partially oxidation.
(6), on metal separating film layer 6, be coated with antireflection rete 7: utilize rotating cathode, under the control of intermediate frequency power supply, the ZnSn target is sputtering sedimentation under oxygen atmosphere, and power is 60Kw, and depositional coating thickness is 57nm.Prepared antireflection rete 7 is ZnSnO
3
(7), on antireflection rete 7, be coated with heat-resistant fireproof rete 8: utilize rotating cathode, under the control of intermediate frequency power supply, the Sb target is sputtering sedimentation under oxygen atmosphere, and power is 60Kw, and depositional coating thickness is 48nm.Prepared heat-resistant fireproof rete 8 is Sb
2O
3
(8), on heat-resistant fireproof rete 8, be coated with resist 9, utilize rotating cathode, under the control of intermediate frequency power supply, the Si target is sputtering sedimentation under oxygen atmosphere, power is 60Kw, depositional coating thickness is 38nm.Prepared resist 9 is SiO
2
Three, inspection after construction, packing.
Embodiment 5:
High-permeability, tempered and low-radiation coated glass of the present invention; Comprise glass substrate 1, glass substrate 1 outwards has been coated with antireflection rete 2, heat-resistant fireproof rete 3, metal separating film layer 4, low radiation functions rete 5, metal separating film layer 6, antireflection rete 7, heat-resistant fireproof rete 8, resist 9 successively.
The method of manufacture of high-permeability, tempered and low-radiation coated glass of the present invention is following:
One, the cleaning of glass substrate 1, oven dry.
Two, on glass substrate 1, carry out plated film.This coating process adopts the vacuum magnetic-control sputtering mode, is 5 * 10 in vacuum tightness
-6In the environment below the mbar, outwards be coated with successively from glass substrate 1 by following order:
(1), on glass substrate 1, be coated with antireflection rete 2: utilize rotating cathode, under the control of intermediate frequency power supply, the ZnSn target is sputtering sedimentation under oxygen atmosphere, and power is 60Kw, and depositional coating thickness is 58nm.Prepared antireflection rete 2 is ZnSnO
4, ZnSnO
3Mixture.
(2), on antireflection rete 2, be coated with heat-resistant fireproof rete 3: utilize rotating cathode, under the control of intermediate frequency power supply, the Sb target is sputtering sedimentation under oxygen atmosphere, and power is 60Kw, and depositional coating thickness is 47nm.Prepared heat-resistant fireproof rete 3 is Sb
2O
3
(3), on heat-resistant fireproof rete 3, be coated with metal separating film layer 4: utilize planar cathode, under the control of direct supply, the NiCr target is in the argon oxygen atmosphere, and wherein oxygen proportion is 5%, and sputtering sedimentation, power are 5Kw, and depositional coating thickness is 4.5nm.Prepared metal separating film layer 4 is NiCrO
4, NiCrO
3Mixture, and NiCrO
4, NiCrO
3Partially oxidation.
(4), on metal separating film layer 4, be coated with low radiation functions rete 5: utilize planar cathode, under the control of direct supply, the Ag target is in argon atmospher, and sputtering sedimentation, power are 4Kw, and depositional coating thickness is 8nm.Prepared low radiation functions rete 5 is metal A g.
(5), on low radiation functions rete 5, be coated with metal separating film layer 6: utilize planar cathode, under the control of direct supply, the NiCr target is in the argon oxygen atmosphere, and wherein oxygen proportion is 5%, and sputtering sedimentation, power are 5Kw, and depositional coating thickness is 5.3nm.Prepared metal separating film layer 6 is NiCrO
3, and NiCrO
3Partially oxidation.
(6), on metal separating film layer 6, be coated with antireflection rete 7: utilize rotating cathode, under the control of intermediate frequency power supply, the ZnSn target is sputtering sedimentation under oxygen atmosphere, and power is 60Kw, and depositional coating thickness is 58nm.Prepared antireflection rete 7 is ZnSnO
4
(7), on antireflection rete 7, be coated with heat-resistant fireproof rete 8: utilize rotating cathode, under the control of intermediate frequency power supply, the Sb target is sputtering sedimentation under oxygen atmosphere, and power is 60Kw, and depositional coating thickness is 47nm.Prepared heat-resistant fireproof rete 8 is Sb
2O
5, Sb
2O
3Mixture.
(8), on heat-resistant fireproof rete 8, be coated with resist 9, utilize rotating cathode, under the control of intermediate frequency power supply, the Si target is sputtering sedimentation under oxygen atmosphere, power is 60Kw, depositional coating thickness is 39nm.Prepared resist 9 is SiO
3, SiO
2Mixture.
Three, inspection after construction, packing.
The optical property and the thermal property of the high-permeability, tempered and low-radiation coated glass that the employing aforesaid method is made are following:
Radiant ratio is low≤and 0.12, visible light transmissivity is 70～85% behind the tempering, and visible reflectance is 11%, and product structure is that the heat transfer coefficient U value of 6Low-E+12A+6 is 1.75, and product has good effect of heat insulation.
This high-permeability, tempered and low-radiation coated glass also has: the forward and backward rete of tempering is firm, and the low radiation functions layer has been played the better protection effect, and low radiation functions layer Ag is difficult for oxidation behind the tempering.Thereby before having improved the product tempering, the stability of the color behind the tempering, and permeability is higher behind the product tempering, and product colour is limpider, it is beautiful more to dazzle, and lifting glass curtain wall exterior quality has extraordinary promotion prospect.
In a word, the present invention adopts the unique film layer structure, novel flame-retardant film material weisspiessglanz (SbOx); Improved the resistance and high temperature resistance property of rete product; The high-permeability, tempered and low-radiation product that produces can carry out tempering, hot bending processing under 680 ℃～710 ℃ condition, rete is firm before and after the tempering; Optical property is stable, advantages such as rete raising in work-ing life.Color is unstable after successfully having solved high-permeability, tempered and low-radiation product glass tempering; Product colour is muddy behind the tempering, and visual effect is poor; Macroscopic irregularitys such as the forward and backward easy demoulding of tempering, oxidation.
Claims (2)
1. high-permeability, tempered and low-radiation coated glass; Comprise glass substrate, it is characterized in that: said glass substrate outwards has been coated with antireflection rete, heat-resistant fireproof rete, metal separating film layer, low radiation functions rete, metal separating film layer, antireflection rete, heat-resistant fireproof rete, resist successively; Outwards be coated with successively from glass substrate in order: the antireflection rete is zinc-tin oxide ZnSnOx, and thicknesses of layers is 55～60nm; The heat-resistant fireproof rete is weisspiessglanz SbOx, and thicknesses of layers is 45～50nm; Metal separating film layer between heat-resistant fireproof rete and low radiation functions rete is pyrolic alloy NiCrOx, and thicknesses of layers is 4～5nm; The low radiation functions rete is argent Ag, and thicknesses of layers is 8nm; Metal separating film layer between low radiation functions rete and antireflection rete is pyrolic alloy NiCrOx, and thicknesses of layers is 5～6nm; The antireflection rete is zinc-tin oxide ZnSnOx, and thicknesses of layers is 55～60nm; The heat-resistant fireproof rete is weisspiessglanz SbOx, and thicknesses of layers is 45～50nm; Resist is silicon oxide sio x, and thicknesses of layers is 35～40nm.
2. method of manufacture of high-permeability, tempered and low-radiation coated glass according to claim 1 comprises cleaning, oven dry, plated film, the packing of glass substrate, and it is characterized in that: said coating process adopts the vacuum magnetic-control sputtering mode, is 5 * 10 in vacuum tightness
-6In the environment below the mbar, outwards be coated with successively from glass substrate by following order,
(1), on glass substrate, be coated with the antireflection rete: utilize rotating cathode, under the control of intermediate frequency power supply, the ZnSn target is sputtering sedimentation under oxygen atmosphere, and power is 60Kw, and depositional coating thickness is 55～60nm; Prepared antireflection rete is zinc-tin oxide ZnSnOx;
(2), be coated with the heat-resistant fireproof rete: utilize rotating cathode, under the control of intermediate frequency power supply, the Sb target is sputtering sedimentation under oxygen atmosphere, and power is 60Kw, and depositional coating thickness is 45～50nm; Prepared heat-resistant fireproof rete is weisspiessglanz SbOx;
(3), be coated with the metal separating film layer: utilize planar cathode, under the control of direct supply, the NiCr target is in the argon oxygen atmosphere, and wherein oxygen proportion is 5%, and sputtering sedimentation, power are 5Kw, and depositional coating thickness is 4～5nm; Prepared metal separating film layer is pyrolic alloy NiCrOx;
(4), be coated with the low radiation functions rete: utilize planar cathode, under the control of direct supply, the Ag target is in argon atmospher, and sputtering sedimentation, power are 4Kw, and depositional coating thickness is 8nm; Prepared low radiation functions rete is argent Ag;
(5), be coated with the metal separating film layer: utilize planar cathode, under the control of direct supply, the NiCr target is in the argon oxygen atmosphere, and wherein oxygen proportion is 5%, and sputtering sedimentation, power are 5Kw, and depositional coating thickness is 5～6nm; Prepared metal separating film layer is pyrolic alloy NiCrOx;
(6), be coated with the antireflection rete: utilize rotating cathode, under the control of intermediate frequency power supply, the ZnSn target is sputtering sedimentation under oxygen atmosphere, and power is 60Kw, and depositional coating thickness is 55～60nm; Prepared antireflection rete is zinc-tin oxide ZnSnOx;
(7), be coated with the heat-resistant fireproof rete: utilize rotating cathode, under the control of intermediate frequency power supply, the Sb target is sputtering sedimentation under oxygen atmosphere, and power is 60Kw, and depositional coating thickness is 45～50nm; Prepared heat-resistant fireproof rete is weisspiessglanz SbOx;
(8), be coated with resist, utilize rotating cathode, under the control of intermediate frequency power supply, the Si target is sputtering sedimentation under oxygen atmosphere, power is 60Kw, depositional coating thickness is 35～40nm; Prepared resist is silicon oxide sio x.
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| CN104724950A (en) * | 2014-07-15 | 2015-06-24 | 北京冠华东方玻璃科技有限公司 | Low-radiation glass |
| CN105781350A (en) * | 2016-04-25 | 2016-07-20 | 江苏齐光玻璃科技有限公司 | Novel hollow thermal-insulation glass |
| CN105753339A (en) * | 2016-04-25 | 2016-07-13 | 江苏齐光玻璃科技有限公司 | Hollow thermal insulation glass |
| CN106995281A (en) * | 2017-04-01 | 2017-08-01 | 佛山市翔硕宇玻璃科技有限公司 | One kind can tempering oxidation and corrosion color metallized glass |
| CN108774006A (en) * | 2018-07-31 | 2018-11-09 | 吴江南玻华东工程玻璃有限公司 | A kind of high transparency can the energy-saving glass that uses of monolithic |
| CN109052990A (en) * | 2018-07-31 | 2018-12-21 | 吴江南玻华东工程玻璃有限公司 | Through color it is neutral can temperable di-silver low-emissivity coated glass and preparation method thereof |
| CN108996919A (en) * | 2018-07-31 | 2018-12-14 | 吴江南玻华东工程玻璃有限公司 | Through color it is neutral can tempering list silver low-radiation coated glass and preparation method thereof |
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| CN110510891A (en) * | 2019-09-24 | 2019-11-29 | 咸宁南玻节能玻璃有限公司 | A kind of high light blue bendable steel Three-silver-layer low-radiation coated glass and preparation method |
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| GB2403731A (en) * | 2003-07-11 | 2005-01-12 | Pilkington Plc | Solar control glazing |
| CN201250184Y (en) * | 2008-08-18 | 2009-06-03 | 洛阳新晶润工程玻璃有限公司 | Low radiation coated glass capable of being toughened |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| GB2403731A (en) * | 2003-07-11 | 2005-01-12 | Pilkington Plc | Solar control glazing |
| CN201250184Y (en) * | 2008-08-18 | 2009-06-03 | 洛阳新晶润工程玻璃有限公司 | Low radiation coated glass capable of being toughened |
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