CN105481267A - High-penetrability single-sliver low-emissivity coated glass for subsequent processing and production technology thereof - Google Patents
High-penetrability single-sliver low-emissivity coated glass for subsequent processing and production technology thereof Download PDFInfo
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3618—Coatings of type glass/inorganic compound/other inorganic layers, at least one layer being metallic
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3626—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer one layer at least containing a nitride, oxynitride, boronitride or carbonitride
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3639—Multilayers containing at least two functional metal layers
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3644—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the metal being silver
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3657—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having optical properties
- C03C17/366—Low-emissivity or solar control coatings
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/154—Deposition methods from the vapour phase by sputtering
- C03C2218/156—Deposition methods from the vapour phase by sputtering by magnetron sputtering
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Abstract
The invention discloses high-penetrability single-sliver low-emissivity coated glass for subsequent processing and a production technology thereof. In the cold Northeast region where a temperature is 10 DEG C or less in 200 days or more every year and a temperature is more than 20 DEG C in less than 90 days every year, double-sliver low-emissivity glass with a low shading coefficient increases heating energy consumption in winner and has energy saving effects poor than that of common single-sliver glass. The high-penetrability single-sliver low-emissivity coated glass comprises a glass substrate (1) which is obtained through magnetron sputtering coating deposition and the glass substrate orderly comprises a first base dielectric medium combined layer (2), a second base dielectric medium combined layer (3), a third base dielectric medium combined layer (4), an infrared reflector layer (5), a barrier layer (6), a first upper dielectric medium combined layer (7), a second upper dielectric medium combined layer (8) and a protection layer (9) from inside to outside. The invention discloses the high-penetrability single-sliver low-emissivity coated glass for subsequent processing and the production technology thereof.
Description
technical field:
the present invention relates to a kind of can the saturating single silver low-radiation coated glass of height of following process and production technique thereof.
background technology:
low emissivity (Low-E) glass is a kind of coated glass.By having the functional membrane of Low emissivity characteristic on float glass substrate plated surface, reduce the radiant ratio of glass surface thus the energy-efficient performance of raising glass.Low radiation coated glass can intercept the secondary rays heat sent after object is shined upon in summer, can reduce indoor heat same winter and outwards run off, thus play the object of heat insulation heat preservation energy-saving consumption reduction.Low emissivity glass is described as 21 century optimal building glass material with the energy-conserving and environment-protective performance of its excellence.Along with improving constantly of requiring decorating building, the usage quantity of low emissivity glass in building trade also constantly increases.Low emissivity glass common on the market is at present Dan Yin and two silver mainly.Relative to single silver products, two silver-layer low-radiation glass has lower radiant ratio, lower shading coefficient, more excellent light sun ratio; But, for 1 year more than 200 days temperature below 10 DEG C, only less than the 90 days northeast severe cold areas of temperature more than 20 DEG C, two silver-layer low-radiation glass of low shading coefficient are owing to adding heating energy consumption in the winter time, and energy-saving effect is sometimes on the contrary not as common Dan Yin.In order to meet the special weather condition of northeast severe cold further, research and develop a can following process, transmitance is high, radiant ratio is low, shading coefficient is high single silver-layer low-radiation glass imperative.
summary of the invention:
the object of this invention is to provide a kind of can the saturating single silver low-radiation coated glass of height of following process and production technique thereof.
above-mentioned object is realized by following technical scheme:
a kind of can the saturating single silver low-radiation coated glass of height of following process; its composition comprises: glass substrate; described glass substrate adopts magnetron sputtering plating process deposits, is provided with first basic unit's dielectric combination layer, second basic unit's dielectric combination layer, the 3rd basic unit's dielectric combination layer, infrared reflecting layer, blocking layer, the first upper strata dielectric combination layer, the second upper strata dielectric combination layer, protective layer from inside to outside successively.
described can the saturating single silver low-radiation coated glass of height of following process, described glass substrate is common white glass or low iron ultra-clear glasses, and thickness is 4 ~ 12mm.
described can the saturating single silver low-radiation coated glass of height of following process, first described basic unit's dielectric combination layer, second basic unit's dielectric combination layer, 3rd basic unit's dielectric combination layer, first upper strata dielectric combination layer, second upper strata dielectric combination layer is made up of metal oxide or nonmetal oxide or metal nitride or non-metal nitride, first described basic unit's dielectric combination layer, second basic unit's dielectric combination layer, the thickness of the 3rd basic unit's dielectric combination layer is 10 ~ 30nm, the thickness of the first described upper strata dielectric combination layer is 8 ~ 25nm, the thickness of the second described upper strata dielectric combination layer is 25 ~ 60nm.
described can the saturating single silver low-radiation coated glass of height of following process, described infrared reflecting layer is metal A g layer or Ag alloy layer, and the thickness of described infrared reflecting layer is 8 ~ 25nm.
described can the saturating single silver low-radiation coated glass of height of following process, described blocking layer is metal or metal oxide or metal nitride, and the thickness on described blocking layer is 0.5 ~ 1.5nm.
described can the saturating single silver low-radiation coated glass of height of following process, described protective layer is metal oxide or nonmetal oxide or several hopcalite, and the thickness of described protective layer is 2 ~ 5nm.
described can the production technique of the saturating single silver low-radiation coated glass of height of following process, the method comprises the steps:
(1) cleaned up by glass substrate, and the background vacuum of off-line magnetron sputtering equipment is arranged on 10-6mbar, linear velocity is set to 6.0m/min;
(2) glass substrate is conveyed in plated film chamber, dual rotary negative electrode, MF reactive magnetron sputtering deposit first basic unit's dielectric combination layer, to arrange power be 50 ~ 150kW for second basic unit's dielectric combination layer, the 3rd basic unit's dielectric combination layer;
(3) planar cathode or rotating cathode, direct current or direct current add pulsed magnetron sputtering deposition infrared reflecting layer, and arranging power is 5 ~ 15kW;
(4) planar cathode or rotating cathode, direct current or direct current add pulsed magnetron sputtering deposited barrier layer, and arranging power is 8 ~ 24kW;
(5) dual rotary negative electrode, MF reactive magnetron sputtering deposit the first upper strata dielectric combination layer, and arranging power is 40 ~ 120kW;
(6) dual rotary negative electrode, MF reactive magnetron sputtering deposit the second upper strata dielectric combination layer, and arranging power is 120 ~ 280kW;
(7) dual rotary negative electrode, MF reactive magnetron sputtering Deposition of protective layer, arranging power is 40 ~ 100kW.
described can the production technique of the saturating single silver low-radiation coated glass of height of following process, continue to carry out between described step (2) to (7).
described can the production technique of the saturating single silver low-radiation coated glass of height of following process, described dual rotary negative electrode, MF reactive magnetron sputtering carry out in argon nitrogen or argon oxygen environment, argon oxygen is than being 200sccm:1000sccm, argon nitrogen is than being 400sccm:800sccm, after passing into working gas, operating air pressure is 3.5 × 10-3 ~ 5.5 × 10-3mbar.
described can the production technique of the saturating single silver low-radiation coated glass of height of following process, described planar cathode or rotating cathode, direct current or direct current add that pulsed magnetron sputtering carries out in argon gas or argon nitrogen or argon oxygen environment, after passing into working gas, operating air pressure is 2.0 × 10-3 ~ 3.5 × 10-3mbar.
beneficial effect of the present invention:
1, the present invention is by controlling the particular design on blocking layer and coating growth, makes it have better provide protection to Ag layer, solves the problem that Ag layer is easily destroyed in the process of Post isothermal treatment.
, the present invention reasonably designed by metal or nonmetal oxide or layer of nitride film, make whole rete transmitance reach more than 85%, shading coefficient reaches more than 0.64.
, the present invention by appropriate design to infrared reflecting layer silver layer, make whole rete have the radiant ratio (≤0.07) lower than traditional Dan Yingeng while high permeability, very high-sunshade coefficient very much reaching.
, the present invention by controlling the design of protective layer and coating growth, make rete corrosion-resistant, wear resistance, scratch resistant performance improves greatly, is convenient to follow-up deep processing process.
, the invention provides a kind of can tempering, coated glass that transmitance is high, radiant ratio is low, shading coefficient is high severe cold area, applicable northeast uses, can the saturating single silver low-radiation coated glass outward appearance of height of following process be muted color, stable optical performance, not only there is very high transmitance, very high shading coefficient, also there is very low radiant ratio, well taken into account the energy-conservation function of winter heating and cooling in summer.
accompanying drawing illustrates:
accompanying drawing 1 is structural representation of the present invention.
accompanying drawing 2 is 300 ~ 2500nm optical transmission spectra figure of the present invention.
accompanying drawing 3 is 300 ~ 800nm optical transmission spectra figure of the embodiment of the present invention 12.
accompanying drawing 4 is 300 ~ 800nm glass surface reflectance spectrum figure of the embodiment of the present invention 12.
embodiment:
embodiment 1:
a kind of can the saturating single silver low-radiation coated glass of height of following process; its composition comprises: glass substrate; described glass substrate adopts magnetron sputtering plating process deposits, is provided with first basic unit's dielectric combination layer, second basic unit's dielectric combination layer, the 3rd basic unit's dielectric combination layer, infrared reflecting layer, blocking layer, the first upper strata dielectric combination layer, the second upper strata dielectric combination layer, protective layer from inside to outside successively.
embodiment 2:
according to embodiment 1 can the saturating single silver low-radiation coated glass of height of following process, described glass substrate is common white glass or low iron ultra-clear glasses, and thickness is 4 ~ 12mm.
embodiment 3:
according to embodiment 1 or 2 can the saturating single silver low-radiation coated glass of height of following process, first described basic unit's dielectric combination layer, second basic unit's dielectric combination layer, 3rd basic unit's dielectric combination layer, first upper strata dielectric combination layer, second upper strata dielectric combination layer is made up of metal oxide or nonmetal oxide or metal nitride or non-metal nitride, such as ZnSnOx, ZnO, AZO, SnO2, TiO2, SiO2, BiO2, Al2O3, ZnAl2O4, Nb2O5, Si3N4 etc., first described basic unit's dielectric combination layer, second basic unit's dielectric combination layer, the thickness of the 3rd basic unit's dielectric combination layer is 10 ~ 30nm, the thickness of the first described upper strata dielectric combination layer is 8 ~ 25nm, the thickness of the second described upper strata dielectric combination layer is 25 ~ 60nm.
embodiment 4:
according to embodiment ask described in 1 or 2 or 3 can the saturating single silver low-radiation coated glass of height of following process, described infrared reflecting layer is metal A g layer or Ag alloy layer, and the thickness of described infrared reflecting layer is 8 ~ 25nm.
embodiment 5:
according to embodiment 1 or 2 or 3 or 4 can the saturating single silver low-radiation coated glass of height of following process, described blocking layer is metal or metal oxide or metal nitride, such as Ti, TiOx, NiCr, NiCrOx, NiCrNx, NbNx, Nb2O5 etc., the thickness on described blocking layer is 0.5 ~ 1.5nm.
embodiment 6:
according to embodiment 1 or 2 or 3 or 4 or 5 can the saturating single silver low-radiation coated glass of height of following process; described protective layer is metal oxide or nonmetal oxide or several hopcalite; such as; TiO2, Al2O3, SiO2, ZrO2, ZrSiOxNy etc., the thickness of described protective layer is 2 ~ 5nm.
embodiment 7:
what one of embodiment 1-6 was described can the production technique of the saturating single silver low-radiation coated glass of height of following process, and the method comprises the steps:
(1) cleaned up by glass substrate, and the background vacuum of off-line magnetron sputtering equipment is arranged on 10-6mbar, linear velocity is set to 6.0m/min;
(2) glass substrate is conveyed in plated film chamber, dual rotary negative electrode, MF reactive magnetron sputtering deposit first basic unit's dielectric combination layer, to arrange power be 50 ~ 150kW for second basic unit's dielectric combination layer, the 3rd basic unit's dielectric combination layer;
(3) planar cathode or rotating cathode, direct current or direct current add pulsed magnetron sputtering deposition infrared reflecting layer, and arranging power is 5 ~ 15kW;
(4) planar cathode or rotating cathode, direct current or direct current add pulsed magnetron sputtering deposited barrier layer, and arranging power is 8 ~ 24kW;
(5) dual rotary negative electrode, MF reactive magnetron sputtering deposit the first upper strata dielectric combination layer, and arranging power is 40 ~ 120kW;
(6) dual rotary negative electrode, MF reactive magnetron sputtering deposit the second upper strata dielectric combination layer, and arranging power is 120 ~ 280kW;
(7) dual rotary negative electrode, MF reactive magnetron sputtering Deposition of protective layer, arranging power is 40 ~ 100kW.
embodiment 8:
according to embodiment 7 can the production technique of the saturating single silver low-radiation coated glass of height of following process, continue to carry out between described step (2) to (7).
embodiment 9:
according to embodiment 7 or 8 can the production technique of the saturating single silver low-radiation coated glass of height of following process, described dual rotary negative electrode, MF reactive magnetron sputtering carry out in argon nitrogen or argon oxygen environment, argon oxygen is than being 200sccm:1000sccm, argon nitrogen is than being 400sccm:800sccm, after passing into working gas, operating air pressure is 3.5 × 10-3 ~ 5.5 × 10-3mbar.
embodiment 10:
according to embodiment 7 or 8 or 9 can the production technique of the saturating single silver low-radiation coated glass of height of following process, described planar cathode or rotating cathode, direct current or direct current add that pulsed magnetron sputtering carries out in argon gas or argon nitrogen or argon oxygen environment, after passing into working gas, operating air pressure is 2.0 × 10-3 ~ 3.5 × 10-3mbar.
embodiment 11:
described can the saturating single silver low-radiation coated glass of height of following process, for visible ray (wavelength is from 380nm-780nm) transmitance between 85% ~ 89%, glass surface reflection < 6.0%; Under 6Low-E#2-12A-6C configuration, U value < 1.75, radiant ratio≤0.07, sunshade Sc > 0.64, is applicable to severe cold area, northeast and uses; Under 6C-12A-6Low-E#3 configuration, U value < 1.75, radiant ratio≤0.07, sunshade Sc > 0.72, is applicable to severe cold area, northeast and uses.
embodiment 12:
described can the saturating single silver low-radiation coated glass of height of following process, select glass substrate/Si3N4/ZnSnOx/ZnO/Ag/Nb2O5/ZnO/Si3N4/ZrO2;
wherein, the thickness of glass substrate is 6mm common white glass;
first basic unit's dielectric combination layer is silicon nitride (Si3N4), and thicknesses of layers is 20 ~ 22nm;
second basic unit's dielectric combination layer is zinc-tin oxide (ZnSnOx), and thicknesses of layers is 16 ~ 18nm;
3rd basic unit's dielectric combination layer is zinc oxide (ZnO), and thicknesses of layers is 18 ~ 20nm;
infrared reflecting layer is silver layer (Ag), and thicknesses of layers is 10 ~ 10.5nm;
blocking layer is niobium oxides (Nb2O5), and thicknesses of layers is 0.8 ~ 1.0nm;
first upper strata dielectric combination layer is zinc oxide (ZnO), and thicknesses of layers is 12 ~ 13nm;
second upper strata dielectric combination layer is silicon nitride (Si3N4), and thicknesses of layers is 44 ~ 46nm;
protective layer is zirconium white (ZrO2), and thicknesses of layers is 2.8nm.
the complete processing of above-mentioned rete is:
film plating substrate adopts 6mm common white glass, filming equipment is many negative electrodes magnetron sputtering film production line, glass substrate needs before entering plated film chamber to clean up with ultrapure water, and magnetron sputtering plating chamber base vacuum is set to 10-6mbar, and linear velocity is set to 6m/min;
all silicon nitrides (Si3N4) series of strata adopt intermediate frequency power supply to add rotating cathode sputtering sedimentation in argon nitrogen atmosphere, and argon nitrogen ratio is 400sccm:800sccm.It is 90kw that first basic unit's dielectric combination layer arranges power; It is 220kw that second upper strata dielectric combination layer arranges power;
all zinc oxide (ZnO), zinc-tin oxide (ZnSnOx) series of strata adopt intermediate frequency power supply to add rotating cathode sputtering sedimentation in argon oxygen atmosphere, argon oxygen ratio is 200sccm:1000sccm, second basic unit's dielectric combination layer arranges power 50kw, 3rd basic unit's dielectric combination layer arranges power 55kw, and it is 58kw that the first upper strata dielectric combination layer arranges power;
niobium oxides (Nb2O5) series of strata adopt intermediate frequency power supply to add rotating cathode sputtering sedimentation in argon oxygen atmosphere, and argon oxygen ratio is: 600sccm:200sccm.It is 15kw that blocking layer arranges power;
zirconium white (ZrO2) series of strata adopt intermediate frequency power supply to add rotating cathode sputtering sedimentation in argon oxygen atmosphere, and argon oxygen ratio is 600sccm:200sccm, and it is 60kw that protective layer arranges power;
infrared reflecting layer (Ag) adopts direct supply to add planar cathode sputtering sedimentation in argon atmosphere, and argon gas intake is 800sccm, and it is 9.5kw that infrared reflecting layer arranges power.
the present embodiment provide can the saturating single silver low-radiation coated glass of height (the 6mm common white glass) test result of following process as follows:
| Color value | Before tempering | After tempering |
| T | 82.0% | 87.2% |
| a*t | -2.3 | -2.2 |
| b*t | 1.1 | 1.4 |
| Rg | 5.6% | 5.2% |
| a*g | -0.5 | 1.1 |
| b*g | -7.8 | -8.0 |
| Rf | 4.3% | 4.5% |
| a*f | 0.7 | 1.2 |
| b*f | -6.5 | -7.4 |
300 ~ 800nm optical transmission spectra figure is shown in accompanying drawing 3, and glass surface reflectance spectrum figure is shown in accompanying drawing 4.Under 6Low-E#2-12A-6C configuration, visible light transmissivity is 80%, and outdoor reflectivity 12%, U value is 1.7, and shading coefficient is 0.65; Under 6C-12A-6Low-E3# configuration, visible light transmissivity is 80%, and outdoor reflectivity 12%, U value is 1.7, and shading coefficient is 0.73.
Claims (10)
1. one kind can the saturating single silver low-radiation coated glass of height of following process; its composition comprises: glass substrate; it is characterized in that: described glass substrate adopts magnetron sputtering plating process deposits, is provided with first basic unit's dielectric combination layer, second basic unit's dielectric combination layer, the 3rd basic unit's dielectric combination layer, infrared reflecting layer, blocking layer, the first upper strata dielectric combination layer, the second upper strata dielectric combination layer, protective layer from inside to outside successively.
2. according to claim 1 can the saturating single silver low-radiation coated glass of height of following process, it is characterized in that: described glass substrate is common white glass or low iron ultra-clear glasses, and thickness is 4 ~ 12mm.
3. according to claim 1 and 2 can the saturating single silver low-radiation coated glass of height of following process, it is characterized in that: first described basic unit's dielectric combination layer, second basic unit's dielectric combination layer, 3rd basic unit's dielectric combination layer, first upper strata dielectric combination layer, second upper strata dielectric combination layer is made up of metal oxide or nonmetal oxide or metal nitride or non-metal nitride, first described basic unit's dielectric combination layer, second basic unit's dielectric combination layer, the thickness of the 3rd basic unit's dielectric combination layer is 10 ~ 30nm, the thickness of described first upper strata dielectric combination layer is 8 ~ 25nm, the thickness of described second upper strata dielectric combination layer is 25 ~ 60nm.
4. according to claim 1 or 2 or 3 can the saturating single silver low-radiation coated glass of height of following process, it is characterized in that: described infrared reflecting layer is metal A g layer or Ag alloy layer, the thickness of described infrared reflecting layer is 8 ~ 25nm.
5. according to claim 1 or 2 or 3 or 4 can the saturating single silver low-radiation coated glass of height of following process, it is characterized in that: described blocking layer is metal or metal oxide or metal nitride, and the thickness on described blocking layer is 0.5 ~ 1.5nm.
6. according to claim 1 or 2 or 3 or 4 or 5 can the saturating single silver low-radiation coated glass of height of following process; it is characterized in that: described protective layer is metal oxide or nonmetal oxide or several hopcalite, and the thickness of described protective layer is 2 ~ 5nm.
7. what one of claim 1-6 was described can the production technique of the saturating single silver low-radiation coated glass of height of following process, it is characterized in that: the method comprises the steps:
(1) cleaned up by 4mm ~ 12mm glass substrate, and the background vacuum of off-line magnetron sputtering equipment is arranged on 10-6mbar, linear velocity is set to 6.0m/min;
(2) glass substrate is conveyed in plated film chamber, dual rotary negative electrode, MF reactive magnetron sputtering deposit first basic unit's dielectric combination layer, to arrange power be 50 ~ 150kW for second basic unit's dielectric combination layer, the 3rd basic unit's dielectric combination layer;
(3) planar cathode or rotating cathode, direct current or direct current add pulsed magnetron sputtering deposition infrared reflecting layer, and arranging power is 5 ~ 15kW;
(4) planar cathode or rotating cathode, direct current or direct current add pulsed magnetron sputtering deposited barrier layer, and arranging power is 8 ~ 24kW;
(5) dual rotary negative electrode, MF reactive magnetron sputtering deposit the first upper strata dielectric combination layer, and arranging power is 40 ~ 120kW;
(6) dual rotary negative electrode, MF reactive magnetron sputtering deposit the second upper strata dielectric combination layer, and arranging power is 120 ~ 280kW;
(7) dual rotary negative electrode, MF reactive magnetron sputtering Deposition of protective layer, arranging power is 40 ~ 100kW.
8. according to claim 7 can the production technique of the saturating single silver low-radiation coated glass of height of following process, it is characterized in that: continue to carry out between described step (2) to (7).
9. according to claim 7 or 8 can the production technique of the saturating single silver low-radiation coated glass of height of following process, it is characterized in that: described dual rotary negative electrode, MF reactive magnetron sputtering carry out in argon nitrogen or argon oxygen environment, argon oxygen is than being 200sccm:1000sccm, argon nitrogen is than being 400sccm:800sccm, after passing into working gas, operating air pressure is 3.5 × 10-3 ~ 5.5 × 10-3mbar.
10. according to claim 7 or 8 or 9 can the production technique of the saturating single silver low-radiation coated glass of height of following process, it is characterized in that: described planar cathode or rotating cathode, direct current or direct current add that pulsed magnetron sputtering carries out in argon gas or argon nitrogen or argon oxygen environment, after passing into working gas, operating air pressure is 2.0 × 10-3 ~ 3.5 × 10-3mbar.
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