CN101723373A - 一种带有氮气保护的三氯氢硅或四氯化硅工艺***的控制管路 - Google Patents
一种带有氮气保护的三氯氢硅或四氯化硅工艺***的控制管路 Download PDFInfo
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- CN101723373A CN101723373A CN200810225009A CN200810225009A CN101723373A CN 101723373 A CN101723373 A CN 101723373A CN 200810225009 A CN200810225009 A CN 200810225009A CN 200810225009 A CN200810225009 A CN 200810225009A CN 101723373 A CN101723373 A CN 101723373A
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Priority Applications (1)
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CN2008102250097A CN101723373B (zh) | 2008-10-23 | 2008-10-23 | 一种带有氮气保护的三氯氢硅或四氯化硅工艺***的控制管路 |
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CN2008102250097A CN101723373B (zh) | 2008-10-23 | 2008-10-23 | 一种带有氮气保护的三氯氢硅或四氯化硅工艺***的控制管路 |
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CN101723373A true CN101723373A (zh) | 2010-06-09 |
CN101723373B CN101723373B (zh) | 2011-12-14 |
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Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102616723A (zh) * | 2011-10-27 | 2012-08-01 | 内蒙古神舟硅业有限责任公司 | 小型液态四氯化硅定量供料***及其控制方法 |
CN103372557A (zh) * | 2012-04-23 | 2013-10-30 | 至砾机电设备(上海)有限公司 | 一种吹扫净化方法及其装置 |
CN104583736A (zh) * | 2012-08-13 | 2015-04-29 | 株式会社Adeka | 液体用容器和使用该液体用容器的液面高度的测量方法 |
CN105439067A (zh) * | 2015-11-24 | 2016-03-30 | 南京国盛电子有限公司 | 适于8英寸硅外延工艺***的三氯氢硅供应装置 |
CN110529736A (zh) * | 2019-09-05 | 2019-12-03 | 广东先导先进材料股份有限公司 | 一种化学气相沉积***及供气装置和供气方法 |
CN111101111A (zh) * | 2019-12-09 | 2020-05-05 | 金瑞泓微电子(衢州)有限公司 | 一种可稳定硅源浓度的自动控制***及其控制方法 |
CN113233468A (zh) * | 2021-07-09 | 2021-08-10 | 江苏鑫华半导体材料科技有限公司 | 一种三氯氢硅质量检测方法、提纯控制方法及装置 |
CN114505084A (zh) * | 2022-01-18 | 2022-05-17 | 石河子大学 | 一种氯化亚铜催化剂的预处理方法 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5653807A (en) * | 1996-03-28 | 1997-08-05 | The United States Of America As Represented By The Secretary Of The Air Force | Low temperature vapor phase epitaxial system for depositing thin layers of silicon-germanium alloy |
CN1242248A (zh) * | 1998-02-27 | 2000-01-26 | 液体空气乔治洛德方法利用和研究有限公司 | 连续的气体饱和***及方法 |
-
2008
- 2008-10-23 CN CN2008102250097A patent/CN101723373B/zh active Active
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102616723A (zh) * | 2011-10-27 | 2012-08-01 | 内蒙古神舟硅业有限责任公司 | 小型液态四氯化硅定量供料***及其控制方法 |
CN102616723B (zh) * | 2011-10-27 | 2017-07-11 | 内蒙古神舟硅业有限责任公司 | 小型液态四氯化硅定量供料***及其控制方法 |
CN103372557A (zh) * | 2012-04-23 | 2013-10-30 | 至砾机电设备(上海)有限公司 | 一种吹扫净化方法及其装置 |
CN104583736A (zh) * | 2012-08-13 | 2015-04-29 | 株式会社Adeka | 液体用容器和使用该液体用容器的液面高度的测量方法 |
CN105439067A (zh) * | 2015-11-24 | 2016-03-30 | 南京国盛电子有限公司 | 适于8英寸硅外延工艺***的三氯氢硅供应装置 |
CN105439067B (zh) * | 2015-11-24 | 2018-06-29 | 南京国盛电子有限公司 | 适于8英寸硅外延工艺***的三氯氢硅供应装置 |
CN110529736A (zh) * | 2019-09-05 | 2019-12-03 | 广东先导先进材料股份有限公司 | 一种化学气相沉积***及供气装置和供气方法 |
CN111101111A (zh) * | 2019-12-09 | 2020-05-05 | 金瑞泓微电子(衢州)有限公司 | 一种可稳定硅源浓度的自动控制***及其控制方法 |
CN111101111B (zh) * | 2019-12-09 | 2022-05-27 | 金瑞泓微电子(衢州)有限公司 | 一种可稳定硅源浓度的自动控制***及其控制方法 |
CN113233468A (zh) * | 2021-07-09 | 2021-08-10 | 江苏鑫华半导体材料科技有限公司 | 一种三氯氢硅质量检测方法、提纯控制方法及装置 |
CN114505084A (zh) * | 2022-01-18 | 2022-05-17 | 石河子大学 | 一种氯化亚铜催化剂的预处理方法 |
CN114505084B (zh) * | 2022-01-18 | 2023-09-12 | 石河子大学 | 一种氯化亚铜催化剂的预处理方法 |
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CN101723373B (zh) | 2011-12-14 |
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Address after: 101300 south side of Shuanghe Road, Linhe Industrial Development Zone, Shunyi District, Beijing Patentee after: Youyan semiconductor silicon materials Co.,Ltd. Address before: 101300 south side of Shuanghe Road, Linhe Industrial Development Zone, Shunyi District, Beijing Patentee before: GRINM SEMICONDUCTOR MATERIALS Co.,Ltd. |