CN101661220A - Liquid crystal display panel and mask plate - Google Patents
Liquid crystal display panel and mask plate Download PDFInfo
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- CN101661220A CN101661220A CN200810119136A CN200810119136A CN101661220A CN 101661220 A CN101661220 A CN 101661220A CN 200810119136 A CN200810119136 A CN 200810119136A CN 200810119136 A CN200810119136 A CN 200810119136A CN 101661220 A CN101661220 A CN 101661220A
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CN2008101191369A CN101661220B (en) | 2008-08-27 | 2008-08-27 | Liquid crystal display panel and mask plate |
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CN2008101191369A CN101661220B (en) | 2008-08-27 | 2008-08-27 | Liquid crystal display panel and mask plate |
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CN101661220A true CN101661220A (en) | 2010-03-03 |
CN101661220B CN101661220B (en) | 2013-03-13 |
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Cited By (15)
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CN102650819A (en) * | 2011-08-03 | 2012-08-29 | 京东方科技集团股份有限公司 | Photo mask and positioning method of photo mask |
CN102789126A (en) * | 2011-03-02 | 2012-11-21 | 株式会社东芝 | Photomask and method for manufacturing the same |
CN102831850A (en) * | 2011-06-15 | 2012-12-19 | 广东中显科技有限公司 | Device for detecting IGZO (Indium Gallium Zinc Oxide)-TFT (Thin Film Transistor) drive characteristics |
CN102867823A (en) * | 2012-09-27 | 2013-01-09 | 合肥京东方光电科技有限公司 | Array substrate and manufacturing method and display device thereof |
CN103499902A (en) * | 2013-08-15 | 2014-01-08 | 京东方科技集团股份有限公司 | Method and device for adjusting and controlling total pitch of substrate |
CN103744214A (en) * | 2013-12-31 | 2014-04-23 | 深圳市华星光电技术有限公司 | Exposure method of glass substrate of LCD (Liquid Crystal Display) |
CN104317158A (en) * | 2014-11-14 | 2015-01-28 | 京东方科技集团股份有限公司 | Mask, mask group, colored film substrate and display device |
WO2015010415A1 (en) * | 2013-07-24 | 2015-01-29 | 京东方科技集团股份有限公司 | Substrate, display screen, splicing screen and alignment method for splicing screens |
CN104570611A (en) * | 2013-10-21 | 2015-04-29 | 合肥京东方光电科技有限公司 | Mask plate and method for reducing splicing exposure mula phenomenon |
CN105759564A (en) * | 2016-03-17 | 2016-07-13 | 京东方科技集团股份有限公司 | Mask and manufacturing method thereof |
CN106502060A (en) * | 2017-01-03 | 2017-03-15 | 京东方科技集团股份有限公司 | A kind of display base plate, display floater and display device |
CN107195639A (en) * | 2017-06-27 | 2017-09-22 | 京东方科技集团股份有限公司 | A kind of preparation method of array base palte motherboard, array base palte motherboard and detection method |
CN107505754A (en) * | 2017-09-20 | 2017-12-22 | 深圳市华星光电技术有限公司 | Liquid crystal display panel and liquid crystal display |
CN108254955A (en) * | 2016-12-29 | 2018-07-06 | 乐金显示有限公司 | Display device and its manufacturing method |
CN110716359A (en) * | 2019-10-14 | 2020-01-21 | 深圳市华星光电技术有限公司 | Array substrate, manufacturing method thereof and alignment precision detection method |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
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CN103176306A (en) * | 2013-03-22 | 2013-06-26 | 京东方科技集团股份有限公司 | Colorized film substrate, manufacturing method thereof, liquid crystal panel and display device |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100816340B1 (en) * | 2001-08-27 | 2008-03-24 | 삼성전자주식회사 | Exposure mask for fabricating liquid crystal display and method for exposing substrate in fabricating liquid crystal display using the mask |
US7113256B2 (en) * | 2004-02-18 | 2006-09-26 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method with feed-forward focus control |
-
2008
- 2008-08-27 CN CN2008101191369A patent/CN101661220B/en active Active
Cited By (30)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102789126A (en) * | 2011-03-02 | 2012-11-21 | 株式会社东芝 | Photomask and method for manufacturing the same |
CN102789126B (en) * | 2011-03-02 | 2016-04-13 | 株式会社东芝 | Photomask and manufacture method thereof |
CN102831850A (en) * | 2011-06-15 | 2012-12-19 | 广东中显科技有限公司 | Device for detecting IGZO (Indium Gallium Zinc Oxide)-TFT (Thin Film Transistor) drive characteristics |
CN102650819B (en) * | 2011-08-03 | 2014-07-02 | 京东方科技集团股份有限公司 | Photo mask and positioning method of photo mask |
CN102650819A (en) * | 2011-08-03 | 2012-08-29 | 京东方科技集团股份有限公司 | Photo mask and positioning method of photo mask |
CN102867823A (en) * | 2012-09-27 | 2013-01-09 | 合肥京东方光电科技有限公司 | Array substrate and manufacturing method and display device thereof |
CN102867823B (en) * | 2012-09-27 | 2015-05-27 | 合肥京东方光电科技有限公司 | Array substrate and manufacturing method and display device thereof |
WO2015010415A1 (en) * | 2013-07-24 | 2015-01-29 | 京东方科技集团股份有限公司 | Substrate, display screen, splicing screen and alignment method for splicing screens |
CN103499902A (en) * | 2013-08-15 | 2014-01-08 | 京东方科技集团股份有限公司 | Method and device for adjusting and controlling total pitch of substrate |
WO2015021717A1 (en) * | 2013-08-15 | 2015-02-19 | 京东方科技集团股份有限公司 | Total pitch adjustment method and apparatus for substrate |
CN103499902B (en) * | 2013-08-15 | 2015-12-23 | 京东方科技集团股份有限公司 | A kind of range regulate and control method of substrate and device |
CN104570611A (en) * | 2013-10-21 | 2015-04-29 | 合肥京东方光电科技有限公司 | Mask plate and method for reducing splicing exposure mula phenomenon |
CN104570611B (en) * | 2013-10-21 | 2016-06-08 | 合肥京东方光电科技有限公司 | Mask plate and improvement splicing exposure nurse thereof draw the method for phenomenon |
CN103744214A (en) * | 2013-12-31 | 2014-04-23 | 深圳市华星光电技术有限公司 | Exposure method of glass substrate of LCD (Liquid Crystal Display) |
WO2015100775A1 (en) * | 2013-12-31 | 2015-07-09 | 深圳市华星光电技术有限公司 | Method for exposing glass substrate of liquid crystal display |
CN103744214B (en) * | 2013-12-31 | 2016-08-17 | 深圳市华星光电技术有限公司 | A kind of exposure method of the glass substrate of liquid crystal display |
CN104317158A (en) * | 2014-11-14 | 2015-01-28 | 京东方科技集团股份有限公司 | Mask, mask group, colored film substrate and display device |
CN104317158B (en) * | 2014-11-14 | 2018-05-22 | 京东方科技集团股份有限公司 | A kind of mask plate, mask plate group, color membrane substrates and display device |
CN105759564B (en) * | 2016-03-17 | 2020-04-17 | 京东方科技集团股份有限公司 | Mask plate and manufacturing method thereof |
CN105759564A (en) * | 2016-03-17 | 2016-07-13 | 京东方科技集团股份有限公司 | Mask and manufacturing method thereof |
CN108254955A (en) * | 2016-12-29 | 2018-07-06 | 乐金显示有限公司 | Display device and its manufacturing method |
CN108254955B (en) * | 2016-12-29 | 2021-03-30 | 乐金显示有限公司 | Display device and method for manufacturing the same |
CN106502060B (en) * | 2017-01-03 | 2018-09-18 | 京东方科技集团股份有限公司 | A kind of display base plate, display panel and display device |
CN106502060A (en) * | 2017-01-03 | 2017-03-15 | 京东方科技集团股份有限公司 | A kind of display base plate, display floater and display device |
CN107195639B (en) * | 2017-06-27 | 2020-04-03 | 京东方科技集团股份有限公司 | Preparation method of array substrate mother board, array substrate mother board and detection method |
CN107195639A (en) * | 2017-06-27 | 2017-09-22 | 京东方科技集团股份有限公司 | A kind of preparation method of array base palte motherboard, array base palte motherboard and detection method |
US10847554B2 (en) | 2017-06-27 | 2020-11-24 | Beijing Boe Display Technology Co., Ltd. | Method for fabricating array substrate motherboard, array substrate motherboard and detection method |
CN107505754A (en) * | 2017-09-20 | 2017-12-22 | 深圳市华星光电技术有限公司 | Liquid crystal display panel and liquid crystal display |
CN110716359A (en) * | 2019-10-14 | 2020-01-21 | 深圳市华星光电技术有限公司 | Array substrate, manufacturing method thereof and alignment precision detection method |
WO2021072930A1 (en) * | 2019-10-14 | 2021-04-22 | Tcl华星光电技术有限公司 | Array substrate, fabrication method and alignment accuracy detection method therefor, and liquid crystal display panel |
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Owner name: BEIJING BOE PHOTOELECTRICITY SCIENCE + TECHNOLOGY Effective date: 20150623 Owner name: JINGDONGFANG SCIENCE AND TECHNOLOGY GROUP CO., LTD Free format text: FORMER OWNER: BEIJING BOE PHOTOELECTRICITY SCIENCE + TECHNOLOGY CO., LTD. Effective date: 20150623 |
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Effective date of registration: 20150623 Address after: 100015 Jiuxianqiao Road, Beijing, No. 10, No. Patentee after: BOE Technology Group Co., Ltd. Patentee after: Beijing BOE Photoelectricity Science & Technology Co., Ltd. Address before: 100176 Beijing economic and Technological Development Zone, West Central Road, No. 8 Patentee before: Beijing BOE Photoelectricity Science & Technology Co., Ltd. |
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Effective date of registration: 20201201 Address after: 215200 No. 1700, Wujiang economic and Technological Development Zone, Suzhou, Jiangsu, Zhongshan North Road Patentee after: Gaochuang (Suzhou) Electronics Co.,Ltd. Patentee after: BOE TECHNOLOGY GROUP Co.,Ltd. Address before: 100015 Jiuxianqiao Road, Beijing, No. 10, No. Patentee before: BOE TECHNOLOGY GROUP Co.,Ltd. Patentee before: BEIJING BOE OPTOELECTRONICS TECHNOLOGY Co.,Ltd. |