CN101633565B - 一种用真空镀膜机制作自清洁玻璃的方法 - Google Patents
一种用真空镀膜机制作自清洁玻璃的方法 Download PDFInfo
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- CN101633565B CN101633565B CN2009101840068A CN200910184006A CN101633565B CN 101633565 B CN101633565 B CN 101633565B CN 2009101840068 A CN2009101840068 A CN 2009101840068A CN 200910184006 A CN200910184006 A CN 200910184006A CN 101633565 B CN101633565 B CN 101633565B
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- glass
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- cleaning
- evaporation
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- 238000007747 plating Methods 0.000 title claims abstract description 30
- 239000005348 self-cleaning glass Substances 0.000 title claims abstract description 25
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 21
- 238000000034 method Methods 0.000 title abstract description 9
- 239000011521 glass Substances 0.000 claims abstract description 46
- 238000001704 evaporation Methods 0.000 claims abstract description 40
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims abstract description 25
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims abstract description 21
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims abstract description 21
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 20
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims abstract description 17
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims abstract description 17
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 17
- 239000001301 oxygen Substances 0.000 claims abstract description 17
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 17
- 229910052786 argon Inorganic materials 0.000 claims abstract description 9
- 239000004408 titanium dioxide Substances 0.000 claims abstract description 8
- 238000010849 ion bombardment Methods 0.000 claims abstract description 6
- 230000008020 evaporation Effects 0.000 claims description 36
- 239000010937 tungsten Substances 0.000 claims description 23
- 229910052721 tungsten Inorganic materials 0.000 claims description 23
- 239000010936 titanium Substances 0.000 claims description 19
- 229910052719 titanium Inorganic materials 0.000 claims description 19
- 239000004411 aluminium Substances 0.000 claims description 17
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 15
- 238000006243 chemical reaction Methods 0.000 claims description 9
- 230000001590 oxidative effect Effects 0.000 claims description 8
- 238000006213 oxygenation reaction Methods 0.000 claims description 8
- 239000007789 gas Substances 0.000 claims description 7
- 238000001035 drying Methods 0.000 claims description 5
- 238000013022 venting Methods 0.000 claims description 3
- 238000001816 cooling Methods 0.000 claims description 2
- 239000005329 float glass Substances 0.000 claims description 2
- 230000001105 regulatory effect Effects 0.000 claims description 2
- 239000002994 raw material Substances 0.000 claims 1
- 229910052751 metal Inorganic materials 0.000 abstract description 15
- 239000002184 metal Substances 0.000 abstract description 15
- 238000004140 cleaning Methods 0.000 abstract description 9
- 238000007254 oxidation reaction Methods 0.000 abstract 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 abstract 2
- 239000010408 film Substances 0.000 description 21
- 239000012528 membrane Substances 0.000 description 8
- 239000000463 material Substances 0.000 description 5
- 238000000280 densification Methods 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- 239000000428 dust Substances 0.000 description 3
- 230000007613 environmental effect Effects 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- KRQUFUKTQHISJB-YYADALCUSA-N 2-[(E)-N-[2-(4-chlorophenoxy)propoxy]-C-propylcarbonimidoyl]-3-hydroxy-5-(thian-3-yl)cyclohex-2-en-1-one Chemical compound CCC\C(=N/OCC(C)OC1=CC=C(Cl)C=C1)C1=C(O)CC(CC1=O)C1CCCSC1 KRQUFUKTQHISJB-YYADALCUSA-N 0.000 description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 2
- FKNQFGJONOIPTF-UHFFFAOYSA-N Sodium cation Chemical compound [Na+] FKNQFGJONOIPTF-UHFFFAOYSA-N 0.000 description 2
- 238000000137 annealing Methods 0.000 description 2
- 230000003749 cleanliness Effects 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000003628 erosive effect Effects 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- -1 oxonium ion Chemical class 0.000 description 2
- 230000001699 photocatalysis Effects 0.000 description 2
- 238000007146 photocatalysis Methods 0.000 description 2
- 229910052700 potassium Inorganic materials 0.000 description 2
- 239000011591 potassium Substances 0.000 description 2
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 2
- 229910001415 sodium ion Inorganic materials 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 239000008399 tap water Substances 0.000 description 2
- 235000020679 tap water Nutrition 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 241000894006 Bacteria Species 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- 241000700605 Viruses Species 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000004134 energy conservation Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 244000005700 microbiome Species 0.000 description 1
- 239000013081 microcrystal Substances 0.000 description 1
- 235000016768 molybdenum Nutrition 0.000 description 1
- KELHQGOVULCJSG-UHFFFAOYSA-N n,n-dimethyl-1-(5-methylfuran-2-yl)ethane-1,2-diamine Chemical compound CN(C)C(CN)C1=CC=C(C)O1 KELHQGOVULCJSG-UHFFFAOYSA-N 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- SOQBVABWOPYFQZ-UHFFFAOYSA-N oxygen(2-);titanium(4+) Chemical compound [O-2].[O-2].[Ti+4] SOQBVABWOPYFQZ-UHFFFAOYSA-N 0.000 description 1
- 239000011941 photocatalyst Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 150000003384 small molecules Chemical class 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000005315 stained glass Substances 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 239000006200 vaporizer Substances 0.000 description 1
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Application Number | Priority Date | Filing Date | Title |
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CN2009101840068A CN101633565B (zh) | 2009-08-06 | 2009-08-06 | 一种用真空镀膜机制作自清洁玻璃的方法 |
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CN2009101840068A CN101633565B (zh) | 2009-08-06 | 2009-08-06 | 一种用真空镀膜机制作自清洁玻璃的方法 |
Publications (2)
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CN101633565A CN101633565A (zh) | 2010-01-27 |
CN101633565B true CN101633565B (zh) | 2011-12-07 |
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CN2009101840068A Expired - Fee Related CN101633565B (zh) | 2009-08-06 | 2009-08-06 | 一种用真空镀膜机制作自清洁玻璃的方法 |
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CN (1) | CN101633565B (zh) |
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CN114543527A (zh) * | 2022-01-19 | 2022-05-27 | 无锡德润堂贸易有限责任公司 | 一种石英管式炉及去除管壁内反应物的方法 |
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Owner name: SHANGHAI RUNXUAN GLASS CO., LTD Free format text: FORMER OWNER: QIAN ZHONGLIANG Effective date: 20130109 |
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Free format text: CORRECT: ADDRESS; FROM: 215411 SUZHOU, JIANGSU PROVINCE TO: 201202 PUDONG NEW AREA, SHANGHAI |
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Effective date of registration: 20130109 Address after: 201202, Shanghai, Pudong New Area, Sichuan Southern Highway 973, 1 Patentee after: SHANGHAI RUNXUAN GLASS CO., LTD. Address before: 501 room 38, building 215411, Taiping Village, Taicang, Jiangsu Patentee before: Qian Zhongliang |
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Granted publication date: 20111207 Termination date: 20130806 |