CN101616951B - Fluorene-based resin polymer and method for preparing thereof - Google Patents
Fluorene-based resin polymer and method for preparing thereof Download PDFInfo
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- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
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Abstract
The present invention relates to a fluorene-based resin polymer having a repeating unit of Formula 1 and a method for preparing the same. The fluorene-based resin polymer has a high molecular weight and low acid value, and has an excellent developing property, adhesive property, and stability.
Description
Technical field
The present invention relates to a kind of resinous polymer based on fluorenes and preparation method thereof.The application requires the right of priority of the korean patent application submitted at KIPO on February 20th, 2007 10-2007-17080 number, and its disclosure all is incorporated herein by reference at this.
Background technology
Usually, based on the structure of the resin of fluorenes be the polycondensation preparation of diol compound by containing fluorenyl and acid dianhydride.Therefore, be difficult to and become to have low acid number and high molecular weight polymers based on the resins of fluorenes.
This resin based on fluorenes is being used under the situation of negative-type photosensitive resin composition, and this negative-type photosensitive resin composition has good binding property to substrate.But the problem of existence is that it has high acid value and lower molecular weight, becomes fragile thus in developing process.
Summary of the invention
Technical problem
Therefore, in order to address the above problem, to the purpose of this invention is to provide and have low acid number and high molecular, keep resinous polymer simultaneously, and prepare this method based on the resinous polymer of fluorenes based on fluorenes to the excellent adhesiveness of substrate.
Technical scheme
Resinous polymer for the repeating unit of realizing this purpose, the invention provides having following general formula 1 based on fluorenes:
[general formula 1]
Wherein, X is selected from a kind of in alkylidene group, ethylene oxide (ethylene oxide) and the propylene oxide (propylene oxide) with 1～3 carbon atom, and Y is selected from hexanaphthene, tetrahydrobenzene, benzene and has a kind of in the alkylidene group of 3～10 carbon atoms.
And then, the invention provides the method for a kind of preparation based on the resinous polymer of fluorenes, wherein, the diepoxides and the diacid compounds that will contain fluorenyl are mixed, the structure of described diacid compounds is replaced by two acid by a kind of two ends that are selected from benzene, hexanaphthene, tetrahydrobenzene, norbornylene and have in the alkane of 3～10 carbon atoms, carries out the resinous polymer based on fluorenes that polycondensation obtains having the repeating unit of general formula 1 then.
Beneficial effect
Resinous polymer based on fluorenes according to the present invention has high molecular and low acid number, and has excellent development, binding property and stability.
Description of drawings
Fig. 1 is the NMR collection of illustrative plates of embodiment 1;
Fig. 2 is the NMR collection of illustrative plates of embodiment 2; With
Fig. 3 is the NMR collection of illustrative plates of embodiment 3.
Embodiment
Below will describe the present invention in detail.
General formula 1 can be by 2 expressions of following structural formula.
[structural formula 2]
Described resinous polymer based on fluorenes can prepare as follows: will a) contain the diepoxides and the b of fluorenyl) the diacid compounds mixing, the structure of described diacid compounds is replaced by two acid by a kind of two ends that are selected from benzene, hexanaphthene, tetrahydrobenzene, norbornylene and have in the alkane of 3～10 carbon atoms, carries out polycondensation then.
Known resinous polymer based on fluorenes is by the prepared in reaction of diol compound and acid dianhydride.Therefore, the molecular weight of resulting polymkeric substance is high more, and the acid number of prepared polymkeric substance is just high more.So, have the known resinous polymer of high-molecular weight and be suitable for the negative photosensitive composition based on fluorenes.Simultaneously, along with glycol group and acid dianhydride group react each other, produced more acidic-group, this has excessively increased its acid number.The result make with negative-type photosensitive resin composition in the consistency of other compound aspect or have problems aspect the development.
Therefore, in order to improve the problems referred to above, the inventor has prepared a kind of novel resinous polymer based on fluorenes, and it has high molecular and low acid number, wherein uses diepoxides and diacid compounds to react to prevent the generation of acidic-group.
In order to increase the molecular weight by the polymkeric substance of polycondensation preparation, two kinds of monomeric uses using in reaction are than being about 1: 1 usually, and these two kinds of monomers are reacted under the top condition of for example catalyzer and temperature each other to realize that 100% reacts.
But in the preparation of known resinous polymer based on fluorenes, the ratio of acid dianhydride and diol compound is 1: 0.8.This is that then molecular weight and acid number all can increase because if overreact is carried out.That is to say, be more than 120 if its acid number becomes, and then this photosensitive composition is not preferred just.In addition, the solvability of acid dianhydride in reaction solvent (for example PGMEA (propylene glycol methyl ether acetate)) is bad.Therefore, if ratio is more than 0.8, then can not complete reaction and be residual be white solid to acid dianhydride.
Simultaneously, in the preparation according to the resinous polymer based on fluorenes of the present invention, even its molecular weight increases, its acid number can not increase yet.Therefore, can increase its molecular weight as required.In addition, because epoxy compounds and diacid compounds have good solubility, compare to obtain the having high-molecular weight adhesive resin so can increase the reaction of these two kinds of compounds.
In the preparation of known resinous polymer based on fluorenes, even after reaction is finished, the acid dianhydride that uses in reaction also can small amount of residual, the problem that this stability that can cause comprising the negative-type photosensitive resin composition of this residual acid dianhydride reduces.
On the contrary, in preparation according to the resinous polymer based on fluorenes of the present invention, do not use anhydride group, therefore resulting resinous polymer based on fluorenes itself is stable, and comprises this negative-type photosensitive resin composition based on the resinous polymer of fluorenes and also have satisfactory stability.
In addition, when known resinous polymer based on fluorenes is used for negative-type photosensitive resin composition, should have with respect to low-molecular-weight higher acid value based on the resinous polymer of fluorenes, for example with respect to about 4,000～7, the acid number of the molecular weight of 000g/mol about 120 is not easy to control development thus, and has the problem that bottom portion is swiped in developing process.
On the contrary, when the resinous polymer based on fluorenes according to the present invention is used for negative-type photosensitive resin composition, compare with known resin based on fluorenes, the resinous polymer based on fluorenes according to the present invention has the molecular weight of low acid number and Geng Gao.Therefore, can reach suitable development.
In addition, under situation about using, can improve the scraping of the bottom portion that the exposure back takes place in developing process according to the resinous polymer based on fluorenes of the present invention.The bottom that the scraping of bottom portion refers to pattern is developed the solution scraping, and warp is baking step later, and sink and form the stair shape pattern in the top of pattern then.In addition, the resinous polymer based on fluorenes according to the present invention has binding property (this is based on an advantage of the compound of fluorenes) to substrate, and also has good development.Therefore, its binding property in developing process is excellent.About this point, the binding property in developing process refer to experience during development step pattern adhere to suprabasil performance.Usually, compare with other compound, known compound based on fluorenes can adhere in the substrate in developing process well.Can adhere in the substrate well by these known polymers based on the compound of fluorenes.But because its high acid value, the problem of existence is to be swiped in the bottom of pattern.
As mentioned above, the present invention is devoted to the synthetic resinous polymer based on fluorenes with the excellent binding property to substrate, high molecular and low acid number and the development that improves and stability.
Resinous polymer based on fluorenes according to the present invention is can be polymerized by the diepoxides that contains fluorenyl of following general formula 3 expressions by using.
[general formula 3]
Wherein, X is selected from a kind of in alkylidene group, ethylene oxide and the propylene oxide with 1～3 carbon atom.
For example, the X in general formula 3 is under the situation of propylene oxide, and it can be represented by following structural formula 4:
[structural formula 4]
In addition, resinous polymer based on fluorenes according to the present invention is polymerized by using diacid compounds, described diacid compounds has a kind of two ends in the alkane that is selected from benzene, hexanaphthene, tetrahydrobenzene, norbornylene and has 3～10 carbon atoms by two structures that acid replaced, and preferably have have cyclic group compound to improve the binding property in developing process.
The example of described diacid compounds preferably includes suitable-4-tetrahydrobenzene-1, the 2-dicarboxylic acid, suitable-the 5-norbornylene-Nei type-2,3-dicarboxylic acid, succsinic acid, m-phthalic acid, phthalic acid, 1,2-cyclohexane dicarboxylic acid, 1,2-phenylene-diacetic acid, 1,2-phenylene dioxydiacetic acid and 1, the 4-cyclohexane dicarboxylic acid, it can be represented by following compounds:
According to the preferred weight-average molecular weight of the resinous polymer based on fluorenes of the present invention is 1,000～50,000.
And then, the invention provides the method for a kind of preparation based on the resinous polymer of fluorenes, wherein, diacid compounds and the diepoxides that contains fluorenyl are mixed, the structure of described diacid compounds is replaced by two acid by a kind of two ends that are selected from benzene, hexanaphthene, tetrahydrobenzene, norbornylene and have in the alkane of 3～10 carbon atoms, carries out the resinous polymer based on fluorenes that polycondensation obtains having the repeating unit of general formula 1 then.The present invention can be undertaken by known polycondensation in association area.
Can prepare and comprise the negative-type photosensitive resin composition of described resinous polymer based on fluorenes as alkali soluble resins.
Usually, described negative-type photosensitive resin composition can comprise alkali soluble resins, have the polymerizable compound of ethylenic unsaturated link(age), Photoepolymerizationinitiater initiater and solvent, but is not limited to these.
Preferred described negative-type photosensitive resin composition is as the sensitive materials of sensitive materials, protective membrane or the cylindricality spacer (column spacer) of colored filter.
Embodiment
Hereinafter, will describe the present invention in detail with reference to embodiments of the invention.Embodiments of the invention can improve to be permitted different ways, and should not be interpreted as being limited to the embodiment that illustrates here.On the contrary, it is for thorough and intactly openly the present invention that embodiments of the invention are provided, and makes those of skill in the art fully understand design of the present invention.
＜embodiment 1〉synthetic based on the resinous polymer of fluorenes
With 9 of 122g, the 4-tetrahydrobenzene-1 of 9-bisphenol fluorene diglycidylether (bisphenolfluorenediglycidylether) and 45g, the 2-dicarboxylic acid mixes stirring with the propylene glycol methyl ether acetate of 150g.When in reactor, feeding nitrogen, reactor is heated to 110 ℃.After 10 hours, finish reaction, and the reaction solvent of adding 200g obtains the resinous polymer based on fluorenes.The result is presented at (solid content: 29.19 weight % in the NMR collection of illustrative plates of Fig. 1; Acid number: 25; Molecular weight: 13000).
＜embodiment 2 〉
With 9 of 124g, the phthalic acid of 9-bisphenol fluorene diglycidylether and 44g mixes stirring with the propylene glycol methyl ether acetate of 150g.When in reactor, feeding nitrogen, reactor is heated to 110 ℃.After 10 hours, finish reaction, and the reaction solvent of adding 200g obtains the resinous polymer based on fluorenes.The result is presented at (solid content: 28.80 weight % in the NMR collection of illustrative plates of Fig. 2; Acid number: 32; Molecular weight: 10300).
＜embodiment 3 〉
With 9 of 107g, the 5-norbornylene-2 of 9-bisphenol fluorene diglycidylether and 42g, the 3-dicarboxylic acid mixes stirring with the propylene glycol methyl ether acetate of 150g.When in reactor, feeding nitrogen, reactor is heated to 110 ℃.After 10 hours, finish reaction, and the reaction solvent of adding 200g obtains the resinous polymer based on fluorenes.The result is presented at (solid content: 31.65 weight % in the NMR collection of illustrative plates of Fig. 3; Acid number: 25; Molecular weight: 4000).
Claims (8)
1. resinous polymer based on fluorenes, it has the repeating unit of following general formula 1:
[general formula 1]
Wherein, X is selected from a kind of in alkylidene group, ethylene oxide and the propylene oxide with 1～3 carbon atom, and Y is selected from hexanaphthene, tetrahydrobenzene, benzene, norbornylene and has a kind of in the alkylidene group of 3～10 carbon atoms.
2. the resinous polymer based on fluorenes according to claim 1, wherein, the weight-average molecular weight of described resinous polymer based on fluorenes is 1,000～50,000.
3. the resinous polymer based on fluorenes according to claim 1, wherein, described resinous polymer based on fluorenes is the polycondensation preparation by following compound: a) by the diepoxides that contains fluorenyl of following general formula 3 expressions; And b) diacid compounds, its structure is replaced by two acid by a kind of two ends that are selected from benzene, hexanaphthene, tetrahydrobenzene, norbornylene and have in the alkane of 3～10 carbon atoms:
[general formula 3]
Wherein, X is selected from a kind of in alkylidene group, ethylene oxide and the propylene oxide with 1～3 carbon atom.
4. the resinous polymer based on fluorenes according to claim 3, wherein, described diacid compounds comprises at least a compound that is selected from the following compound: suitable-4-tetrahydrobenzene-1, the 2-dicarboxylic acid, suitable-the 5-norbornylene-Nei type-2,3-dicarboxylic acid, succsinic acid, m-phthalic acid, phthalic acid, 1,2-cyclohexane dicarboxylic acid, 1,2-phenylene-diacetic acid, 1,2-phenylene dioxydiacetic acid and 1,4-cyclohexane dicarboxylic acid.
5. method for preparing based on the resinous polymer of fluorenes, wherein, the diepoxides and the diacid compounds that will contain fluorenyl are mixed, the structure of this diacid compounds is replaced by two acid by a kind of two ends that are selected from benzene, hexanaphthene, tetrahydrobenzene, norbornylene and have in the alkane of 3～10 carbon atoms, carries out the resinous polymer based on fluorenes that polycondensation obtains having the repeating unit of general formula 1 then:
[general formula 1]
Wherein, X is selected from a kind of in alkylidene group, ethylene oxide and the propylene oxide with 1～3 carbon atom, and
Y is selected from hexanaphthene, tetrahydrobenzene, benzene, norbornylene and has a kind of in the alkylidene group of 3～10 carbon atoms.
6. preparation according to claim 5 is based on the method for the resinous polymer of fluorenes, and wherein, the weight-average molecular weight of described resinous polymer based on fluorenes is 1,000～50,000.
7. preparation according to claim 5 is based on the method for the resinous polymer of fluorenes, and wherein, the described diepoxides that contains fluorenyl is represented by following general formula 3:
[general formula 3]
Wherein, X is selected from a kind of in alkylidene group, ethylene oxide and the propylene oxide with 1～3 carbon atom.
8. preparation according to claim 5 is based on the method for the resinous polymer of fluorenes, wherein, described diacid compounds is at least a compound that is selected from the following compound: suitable-4-tetrahydrobenzene-1, the 2-dicarboxylic acid, suitable-the 5-norbornylene-Nei type-2,3-dicarboxylic acid, succsinic acid, m-phthalic acid, phthalic acid, 1,2-cyclohexane dicarboxylic acid, 1,2-phenylene-diacetic acid, 1,2-phenylene dioxydiacetic acid and 1,4-cyclohexane dicarboxylic acid.
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR10-2007-0017080 | 2007-02-20 | ||
| KR1020070017080A KR100970837B1 (en) | 2007-02-20 | 2007-02-20 | Fluorene-based resin polymer and negative photo-sensitive resin composition including the same |
| KR1020070017080 | 2007-02-20 | ||
| PCT/KR2008/000365 WO2008102953A1 (en) | 2007-02-20 | 2008-01-21 | Fluorene-based resin polymer and method for preparing thereof |
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| CN101616951A CN101616951A (en) | 2009-12-30 |
| CN101616951B true CN101616951B (en) | 2011-12-28 |
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| US (1) | US8338559B2 (en) |
| JP (1) | JP5198473B2 (en) |
| KR (1) | KR100970837B1 (en) |
| CN (1) | CN101616951B (en) |
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| KR101226406B1 (en) * | 2010-12-28 | 2013-01-24 | 주식회사 포스코 | Black resin coating compositions with improved compatibility to coloring additives and its coated black resin steel |
| TR201906940T4 (en) * | 2012-10-30 | 2019-06-21 | Jain Irrigation Systems Ltd | Motion control system and method with energy harvesting. |
| KR101661673B1 (en) * | 2014-02-12 | 2016-09-30 | 제일모직 주식회사 | Photosensitive resin composition, light blocking layer using the same and color filter |
| JP6435226B2 (en) * | 2015-04-01 | 2018-12-05 | 大阪ガスケミカル株式会社 | Epoxy resin having fluorene skeleton and method for producing the same |
| KR102054045B1 (en) * | 2017-03-03 | 2019-12-09 | 주식회사 엘지화학 | Polymer resion compound and photosensitive resin composition for black bank |
| KR102420415B1 (en) | 2017-10-17 | 2022-07-15 | 덕산네오룩스 주식회사 | Adhesion enhanced photo sensitive resin composition and light blocking layer using the same |
| KR102227606B1 (en) | 2018-04-06 | 2021-03-12 | 주식회사 엘지화학 | Cardo-based binder resin, photo-sensitive resin composition comprising the same, black matrix, color filter and display device |
| CN109100917A (en) * | 2018-07-19 | 2018-12-28 | 江苏博砚电子科技有限公司 | A kind of chromatic photosensitivity resin combination and preparation method thereof |
| KR20210081032A (en) * | 2019-12-23 | 2021-07-01 | 주식회사 엘지화학 | Polymer resin compound, method for preparing same and photosensitive resin composition comprising same |
| CN111471286B (en) * | 2020-04-07 | 2022-03-08 | 宁波坚锋新材料有限公司 | Friction-resistant stain-resistant fluorenyl polyester master batch and high-transparency scratch-resistant antibacterial high-performance polycarbonate composite material |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6379590B1 (en) * | 1994-12-02 | 2002-04-30 | Alliedsignal Inc. | Method for making unsymmetrically substituted fluorenyl compounds for nonlinear optical applications |
| CN1564951A (en) * | 2002-06-27 | 2005-01-12 | 帝人株式会社 | Polycarbonate-based oriented film and retardation film |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE69027295T2 (en) * | 1990-01-19 | 1997-01-23 | Minnesota Mining & Mfg | Thermosetting composition |
| JP2878486B2 (en) * | 1991-05-31 | 1999-04-05 | 日本化薬株式会社 | Resin composition, solder resist resin composition and cured product thereof |
| US5354511A (en) | 1992-11-27 | 1994-10-11 | Alliedsignal Inc. | Unsymmetrically substituted fluorenes for non-linear optical applications |
| JP3799743B2 (en) * | 1997-05-23 | 2006-07-19 | Ｊｓｒ株式会社 | Sulphonyloxyphenyl group-containing fluorene compound |
| US5852163A (en) * | 1997-09-10 | 1998-12-22 | The Dow Chemical Company | Process for preparing hydroxy-functionalized polyesters |
| JP2001196366A (en) | 2000-01-07 | 2001-07-19 | Osaka Gas Co Ltd | Layer insulating film |
| JP2003147076A (en) * | 2001-11-16 | 2003-05-21 | Toyobo Co Ltd | Sulfonated fluorine-containing polymer, resin composition containing the same and polymer electrolyte membrane |
| JP4408599B2 (en) * | 2001-11-16 | 2010-02-03 | 東洋紡績株式会社 | Aromatic polyarylene ether compounds containing sulfonic acid groups and polymer electrolyte membranes |
| JP4035420B2 (en) | 2002-03-25 | 2008-01-23 | 大阪瓦斯株式会社 | Vinyl ester resin |
| JP2004002635A (en) * | 2002-03-25 | 2004-01-08 | Osaka Gas Co Ltd | Resin composition for lining |
| JP4575680B2 (en) * | 2004-02-23 | 2010-11-04 | 大阪瓦斯株式会社 | New fluorene compounds |
| KR20060022366A (en) * | 2004-09-07 | 2006-03-10 | 주식회사 엘지화학 | Novel 9,9-bis(4-hydroxyphenyl)fluorene compound containing sulfonic acid salt |
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2007
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Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6379590B1 (en) * | 1994-12-02 | 2002-04-30 | Alliedsignal Inc. | Method for making unsymmetrically substituted fluorenyl compounds for nonlinear optical applications |
| CN1564951A (en) * | 2002-06-27 | 2005-01-12 | 帝人株式会社 | Polycarbonate-based oriented film and retardation film |
Non-Patent Citations (3)
| Title |
|---|
| JP特开2001-253960A 2001.09.18 |
| JP特开2003-147074A 2003.05.21 |
| JP特开平10-101786A 1998.04.21 |
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| US20100029892A1 (en) | 2010-02-04 |
| KR20080077480A (en) | 2008-08-25 |
| KR100970837B1 (en) | 2010-07-16 |
| JP2010519378A (en) | 2010-06-03 |
| US8338559B2 (en) | 2012-12-25 |
| TWI393729B (en) | 2013-04-21 |
| CN101616951A (en) | 2009-12-30 |
| JP5198473B2 (en) | 2013-05-15 |
| TW200840832A (en) | 2008-10-16 |
| WO2008102953A1 (en) | 2008-08-28 |
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