CN101515045A - Sub-wavelength metal polarization beam splitting grating for 1550 nanometer waveband - Google Patents
Sub-wavelength metal polarization beam splitting grating for 1550 nanometer waveband Download PDFInfo
- Publication number
- CN101515045A CN101515045A CNA2009101035420A CN200910103542A CN101515045A CN 101515045 A CN101515045 A CN 101515045A CN A2009101035420 A CNA2009101035420 A CN A2009101035420A CN 200910103542 A CN200910103542 A CN 200910103542A CN 101515045 A CN101515045 A CN 101515045A
- Authority
- CN
- China
- Prior art keywords
- grating
- nanometers
- polarization beam
- beam splitting
- sub
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Landscapes
- Diffracting Gratings Or Hologram Optical Elements (AREA)
- Polarising Elements (AREA)
Abstract
A sub-wavelength metal polarization beam splitting grating used for 1550 nanometer waveband is characterized in that the period of grating is less than 200 nanometers. The groove depth is 230 nanometers to 410 nanometers. The duty cycle of grating is 0.3. The polarization beam splitting grating only has 0-grade diffraction. The extinction ratio is larger than 20dB. The reflection diffraction rate of TE polarizing light and transmission diffraction rate of TM polarizing light are equally higher than 96%. Especially when the period of grating is 150 nanometers and the groove depth is 323 nanometers, the transmission diffraction ratio extinction ratio and reflection diffraction extinction ratio of grating respectively obtain 67dB and 23 dB, and the reflection diffraction rate of TE polarizing light and transmission diffraction rate of TM polarizing light respectively obtain 96.47% and 97.04%. The sub-wavelength metal polarization beam splitting grating of the invention is manufactured through the processes of nano-imprint, auxiliary etching of reactive ions and physical sputtering technology. The sub-wavelength metal polarization beam splitting grating of the invention also has the advantages of large-scale and low-cost production, excellent beam splitting characteristic and stable and reliable performance of manufactured grating.
Description
Technical field
This patent relates to optical fiber communication wave band polarization beam-splitting grating device, particularly a kind of sub-wavelength metal polarization beam splitting grating of 1550 nano wave lengths.
Background technology
Optical fiber communication has advantages such as high capacity, low-loss, long transmission distance, strong security as one of main pillar of modern communications, plays a part very importantly in modern communications, is the main mode of information transmission.In order to increase bandwidth, improve message capacity, to reduce crosstalking of interchannel, adopt different polarization state transmission signals usually.Polarization beam apparatus is a kind of critical optical elements in the optical fiber communication, it can be divided into light the orthogonal two bundle polarized lights (TM polarized light and TE polarized light) in polarization direction, be used to make optical modules such as photoswitch, optical circulator, optoisolator, photo-coupler, be widely used in modern optical fiber telecommunications system and the optical fiber sensing system.
In the application of polarization beam apparatus, common demanding extinction ratio and diffraction efficiency, wide angle accommodation and operation wavelength want also simultaneously that cube is little, efficient is high, easy of integration, and enough making tolerances etc. can be provided.Traditional polarization beam apparatus has dichroic material by birefringece crystal or multilayer dielectric film etc. usually and constitutes.But, utilizing the made polarization beam apparatus of birefringece crystal, volume is big, efficient is lower; And the common bandwidth of operation of multilayer dielectric film polarization beam apparatus is less, and difficulty of processing is big, and thermal stability is relatively poor, can not satisfy the requirement of optical system miniaturization, integrated and high efficiency well.Along with the continuous progress of micro-processing technology, but present fabrication cycle is less than the sub-wave length metal grating of 100 nanometers.The sub-wave length metal grating diffraction efficiency is stable, incident light can be decomposed into orthogonal two bundle polarized lights, and volume is little, efficient is high, easy of integration, can large-scale production, be the ideal element of making polarization beam apparatus, be subjected to people and more and more pay close attention to have important application prospects.
Sub-wave length metal grating is to utilize nano impression, reactive ion auxiliary etch and physical sputtering technology, processes the sub-wave length grating of grating cycle much smaller than operation wavelength in the fused quartz substrate.Because the cycle is much smaller than lambda1-wavelength (operation wavelength), so only there is 0 order diffraction in grating, has good polarization beam splitting characteristic.The computational analysis of the diffraction characteristic of sub-wave length metal grating can not be adopted scalar diffraction theory, and must adopt vector grating electromagnetic theory.Vector grating electromagnetic theory is based on Maxwell equation and in conjunction with the grating boundary condition, finds the solution accurately by Computer Simulation.People such as Moharam have provided based on the algorithm of the rigorous coupled wave theory of vector grating electromagnetic theory [formerly technology 1:Moharam MG et al., 1995 J.Opt.Soc.Am.A12 1077], can solve the diffraction problem of this class sub-wave length metal grating.Formerly technology 2[authorizes patent of invention number: 2006100234207] provided the deep erosion rectangular raster device of realizing polarization beam splitting, formerly technology 3[authorizes patent of invention number: 200710045141.5] provided silicon reflection type polarized beam splitting optical grating device based on 1550 nano wavebands.As far as we know, nobody provides sub-wavelength metal polarization beam splitting grating at 1550 nano wavebands at present.Therefore the sub-wavelength metal polarization beam splitting grating that can realize having High Extinction Ratio and diffraction efficiency, wide incident angle and operation wavelength will have important Practical significance.
Summary of the invention
The purpose of this invention is to provide a kind of 1550 novel nano waveband sub-wavelength metal polarization beam splitting gratings, this grating can be with TE, the orthogonal a branch of photolysis of two kinds of polarization modes of TM is two bunch polarized lights of TE polarization (electric vector is parallel to the grating cutting) and the different transmission directions of TM polarization (electric vector is perpendicular to the grating cutting), realize that 0 order diffraction extinction ratio is greater than 20dB, in the big ranges of incidence angles of-38 °＜θ＜38 °, the reflection diffraction rate of TE polarized light and the transmission diffraction rate of TM polarized light all are higher than 96%, in the wide lambda1-wavelength scope of 1200 nanometers＜λ＜1800 nanometers, the reflection diffraction rate of TE polarized light and the transmission diffraction rate of TM polarized light all are higher than 96%.The sub-wavelength metal polarization beam splitting grating of 1550 nano wavebands of the present invention can be in enormous quantities, produce cheaply, and the grating polarization beam splitting characteristic good after the etching is stable and reliable for performance.
Technical solution of the present invention is as follows:
A kind of sub-wavelength metal polarization beam splitting grating that is used for 1550 nano wavebands is characterized in that the cycle of this grating is that 230 nanometers-410 nanometer, grating account for wide ratio less than 200 nanometers, groove depth, and promptly the grating ridge is 0.3 with the ratio in grating cycle.
The cycle of the sub-wavelength polarization beam-splitting grating of described 1550 nano wavebands is 150 nanometers, and groove depth is 323 nanometers.
Foundation of the present invention is as follows:
Fig. 1 has shown the geometry of rectangle sub-wavelength metal polarization beam splitting grating.Zone 1 and zone 2 are respectively uniform air (refractive index n
1=1.0) and fused quartz (refractive index n
2=1.45).Between zone 1 and the zone 2 is the grating layer of periodic structure, and this routine grating ridge is a metallic aluminium.The linear polarization plane wave of TE polarization and TM polarization incides sub-wave length metal grating with angle θ, realizes 0 grade of reflection diffraction of TE polarization and 0 grade of transmission diffraction of TM polarization.
Under optical grating construction as shown in Figure 1, the present invention adopts rigorous coupled wave theory [formerly technology 1] to calculate the extinction ratio and the diffraction efficiency of sub-wavelength metal polarization beam splitting grating.Shown in Fig. 2,3, obtain the parameters optimization of High Extinction Ratio rectangle sub-wavelength metal polarization beam splitting grating according to Theoretical Calculation, promptly when the cycle of grating is 230 nanometers-410 nanometer less than 200 nanometers, etching depth, the extinction ratio of polarization beam-splitting grating is greater than 20dB, and 0 grade of reflection diffraction rate of TE polarized light and 0 grade of transmission diffraction rate of TM polarized light all are higher than 96%.Particularly the grating cycle be 150 nanometers, when etching depth is 323 nanometers, can make transmission diffraction extinction ratio and reflection diffraction extinction ratio reach 67dB and 23dB respectively, the reflection diffraction rate of TE polarized light and the transmission diffraction rate of TM polarized light reach 96.47% and 97.04% respectively.
As shown in Figure 4, the grating cycle is 150 nanometers, etching depth is 323 nanometers, incident wavelength λ=1550 nanometers, the extinction ratio of this polarization beam-splitting grating all incident angles in ° ranges of incidence angles of-38 °＜θ＜38 all can be higher than 20dB, promptly corresponding 76 ° angle bandwidth, the reflection diffraction rate of TE polarized light and the transmission diffraction rate of TM polarized light are higher than 96.47% and 96.48% respectively.
As shown in Figure 5, cycle is 150 nanometers, etching depth is 323 nanometers, incident angle θ=0 degree, the extinction ratio of this polarization beam-splitting grating all incident lights in 1200 nanometers＜λ＜1800 nanometer incident wavelength scopes all can be higher than 20dB, be the wavelength bandwidth of corresponding 600 nanometers, the reflection diffraction rate of TE polarized light and the transmission diffraction rate of TM polarized light are higher than 96.42% and 95.98% respectively.
Description of drawings
Fig. 1 is the geometry of the sub-wavelength metal polarization beam splitting grating of the present invention's 1550 nano wavebands.
Fig. 2 is optimizing under the etching depth h=323 nanometer for the sub-wavelength metal polarization beam splitting grating of the present invention's 1550 nano wavebands, and grating O order diffraction efficient is with the change curve in cycle, and incident angle θ=0 is spent, incident wavelength λ=1550 nanometers.
Fig. 3 is optimizing under grating periods lambda=150 nanometers for the sub-wavelength metal polarization beam splitting grating of the present invention's 1550 nano wavebands, and the optical grating reflection extinction ratio is with the change curve of etching depth, and incident angle θ=0 is spent, incident wavelength λ=1550 nanometers.
Fig. 4 is 150 nanometers for the sub-wavelength metal polarization beam splitting grating of the present invention's 1550 nano wavebands in the cycle, and etching depth is 323 nanometers, incident wavelength λ=1550 nanometers, and TE, TM polarization 0 order diffraction efficient are with the change curve of incident angle.
Fig. 5 is 150 nanometers for the sub-wavelength metal polarization beam splitting grating of the present invention's 1550 nano wavebands in the cycle, and etching depth is 323 nanometers, incident angle θ=0 degree, and TE, TM polarization 0 order diffraction efficient are with the change curve of lambda1-wavelength.
Embodiment
By nano impression, reactive ion auxiliary etch and physical sputtering fabrication techniques sub-wavelength metal polarization beam splitting grating.Manufacturing process is carried out according to the following steps:
At first, in the fused quartz substrate, revolve the polymethylmethacrylate (PMMA) that covers one deck 323 nanometer thickness, be heated to 200 ℃ the vitrifacation transformation temperature of polymethylmethacrylate (are higher than 105 ℃), (having the cycle is 150 nanometers with prefabricated silica template, accounting for wide ratio is 0.7, the grating pattern of dark 900 nanometers) be pressed into polymethylmethacrylate with the pressure of 15MPa size.This moment, polymethylmethacrylate was higher than 105 ℃ of its vitrifacation phase point temperatures, was similar to viscous liquid, and can be in the pressure current downflow.Keep this pressure size constant, cool to 60 ℃, (being lower than 105 ℃ of transformation temperatures) kept about 10 minutes.Because the water wettability of polymethylmethacrylate can not sticked with silica template, and template is lifted demoulding.
Then, adopt oxygen reaction type ion etching (RIE) polymethyl methacrylate layers, expose quartz substrate, just obtained the periodic pattern of polymethylmethacrylate until pocket.
At last, utilizing metallic aluminium on the physical sputtering method deposition on the periodic pattern of polymethylmethacrylate, by solution-off in acetone soln with polymethylmethacrylate and on aluminium remove, the cycle that just stayed is 150 nanometers, about 323 nanometers of groove depth account for wide ratio and are 0.3 sub-wavelength metal polarization beam splitting grating.
Grating by above step making, when 1550 nano wave lengths are worked, can make 0 grade of transmission diffraction extinction ratio and reflection diffraction extinction ratio reach 67dB and 23dB respectively, the reflection diffraction rate of TE polarized light and the transmission diffraction rate of TM polarized light are higher than 96.47% and 97.04% respectively, and extinction ratio all is higher than 20dB in incident angle-38 °＜θ＜38 ° and incident wavelength 1200 nanometers＜λ＜1800 nanometer range.
The sub-wavelength metal polarization beam splitting grating of 1550 nano wavebands of the present invention, only there is 0 order diffraction, have very high extinction ratio and diffraction efficiency, utilize nano impression, reactive ion auxiliary etch and physical sputtering fabrication techniques, can be in enormous quantities, low-cost production, the grating polarization beam splitting characteristic good of making, stable performance, reliable is a kind of important realization technology of polarization beam apparatus.
Claims (2)
1, a kind of sub-wavelength metal polarization beam splitting grating that is used for 1550 nano wavebands, the cycle that it is characterized in that this grating, groove depth was 230 nanometers-410 nanometers less than 200 nanometers, accounting for wide ratio is 0.3.
2, the sub-wavelength metal polarization beam splitting grating of 1550 nano wavebands according to claim 1, the cycle that it is characterized in that this grating is 150 nanometers, groove depth is 323 nanometers.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2009101035420A CN101515045B (en) | 2009-04-02 | 2009-04-02 | Sub-wavelength metal polarization beam splitting grating for 1550 nanometer waveband |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2009101035420A CN101515045B (en) | 2009-04-02 | 2009-04-02 | Sub-wavelength metal polarization beam splitting grating for 1550 nanometer waveband |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101515045A true CN101515045A (en) | 2009-08-26 |
| CN101515045B CN101515045B (en) | 2010-06-23 |
Family
ID=41039576
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2009101035420A Expired - Fee Related CN101515045B (en) | 2009-04-02 | 2009-04-02 | Sub-wavelength metal polarization beam splitting grating for 1550 nanometer waveband |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN101515045B (en) |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101846622A (en) * | 2010-05-14 | 2010-09-29 | 重庆文理学院 | Gas refracting index sensor based on nanometer cavity antenna array |
| CN102681215A (en) * | 2012-06-08 | 2012-09-19 | 中国科学技术大学 | Wide-spectrum all-optical switch |
| CN103364856A (en) * | 2013-07-09 | 2013-10-23 | 中国科学院上海光学精密机械研究所 | TE (Transverse Electric) polarized vertical-incidence negative-level-one high-efficiency inclined-transmission quartz grating |
| CN103557937A (en) * | 2013-10-31 | 2014-02-05 | 中国科学院半导体研究所 | Laser power monitoring assembly, laser emission module with laser power monitoring assembly used and optical amplifier with laser power monitoring assembly used |
| CN104330847A (en) * | 2014-11-19 | 2015-02-04 | 上海电力学院 | Reflective broadband 1/4 wave plate |
| CN104459853A (en) * | 2013-09-22 | 2015-03-25 | 清华大学 | Metal grating |
| US9759947B2 (en) | 2014-12-04 | 2017-09-12 | Boe Technology Group Co., Ltd. | Wire grid polarizer and manufacturing method thereof, display panel and display device |
| CN109642850A (en) * | 2016-09-19 | 2019-04-16 | 苹果公司 | Utilize the DOE defect inspection of total internal reflection |
| US10823635B1 (en) | 2013-12-19 | 2020-11-03 | Apple Inc. | Monitoring DOE performance using total internal reflection |
| CN112578490A (en) * | 2019-09-30 | 2021-03-30 | 南开大学 | Low-refractive-index large-angle deflection sparse grating for 3D printing |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100359344C (en) * | 2006-01-18 | 2008-01-02 | 中国科学院上海光学精密机械研究所 | Quartz reflection polarization beam splitting grating with 1550 nanometer wavelength |
| CN100464199C (en) * | 2007-08-22 | 2009-02-25 | 中国科学院上海光学精密机械研究所 | 1550 nm wavelength silicon reflection type polarization beam splitting grating |
| CN101290371A (en) * | 2008-05-30 | 2008-10-22 | 苏州大学 | Sub-wavelength grate structure polarizing film and its manufacture method |
-
2009
- 2009-04-02 CN CN2009101035420A patent/CN101515045B/en not_active Expired - Fee Related
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101846622A (en) * | 2010-05-14 | 2010-09-29 | 重庆文理学院 | Gas refracting index sensor based on nanometer cavity antenna array |
| CN102681215A (en) * | 2012-06-08 | 2012-09-19 | 中国科学技术大学 | Wide-spectrum all-optical switch |
| CN103364856A (en) * | 2013-07-09 | 2013-10-23 | 中国科学院上海光学精密机械研究所 | TE (Transverse Electric) polarized vertical-incidence negative-level-one high-efficiency inclined-transmission quartz grating |
| CN103364856B (en) * | 2013-07-09 | 2015-04-15 | 中国科学院上海光学精密机械研究所 | TE (Transverse Electric) polarized vertical-incidence negative-level-one high-efficiency inclined-transmission quartz grating |
| CN104459853A (en) * | 2013-09-22 | 2015-03-25 | 清华大学 | Metal grating |
| CN103557937A (en) * | 2013-10-31 | 2014-02-05 | 中国科学院半导体研究所 | Laser power monitoring assembly, laser emission module with laser power monitoring assembly used and optical amplifier with laser power monitoring assembly used |
| US10823635B1 (en) | 2013-12-19 | 2020-11-03 | Apple Inc. | Monitoring DOE performance using total internal reflection |
| CN104330847A (en) * | 2014-11-19 | 2015-02-04 | 上海电力学院 | Reflective broadband 1/4 wave plate |
| US9759947B2 (en) | 2014-12-04 | 2017-09-12 | Boe Technology Group Co., Ltd. | Wire grid polarizer and manufacturing method thereof, display panel and display device |
| CN109642850A (en) * | 2016-09-19 | 2019-04-16 | 苹果公司 | Utilize the DOE defect inspection of total internal reflection |
| CN112578490A (en) * | 2019-09-30 | 2021-03-30 | 南开大学 | Low-refractive-index large-angle deflection sparse grating for 3D printing |
Also Published As
| Publication number | Publication date |
|---|---|
| CN101515045B (en) | 2010-06-23 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN101515045B (en) | Sub-wavelength metal polarization beam splitting grating for 1550 nanometer waveband | |
| Su et al. | Silicon photonic platform for passive waveguide devices: materials, fabrication, and applications | |
| CN101515044A (en) | Optimal design method of subwavelength metal polarization beam splitting grating | |
| CN101290371A (en) | Sub-wavelength grate structure polarizing film and its manufacture method | |
| CN102879849B (en) | Sub-wavelength grating structure polarizer | |
| CN101858998B (en) | Micro-nano structure for enhancing nano slit transmission efficiency | |
| CN103364856B (en) | TE (Transverse Electric) polarized vertical-incidence negative-level-one high-efficiency inclined-transmission quartz grating | |
| CN101546002B (en) | Sub-wavelength fused silica transmission polarization light-splitting grating at 1064 nano wave band | |
| CN101592777A (en) | Method for making based on the full spectrum wide-angle condenser of nanostructured | |
| CN102289014A (en) | Metal dielectric film reflection polarization beam splitting grating for waveband of 1,053 nanometers | |
| JPWO2017150568A1 (en) | Optical element | |
| CN113933931A (en) | Annular cavity optical modulator based on vanadium dioxide nanowire | |
| CN102156315B (en) | TE polarized double-ridge fused quartz 1 x 5 beam splitting grating | |
| CN110989061A (en) | All-dielectric polarization-independent total internal reflection grating and manufacturing method thereof | |
| Shoji et al. | Hydrogenated amorphous silicon carbide optical waveguide for telecommunication wavelength applications | |
| CN104330847A (en) | Reflective broadband 1/4 wave plate | |
| CN101344604A (en) | Reflection type quartz polarization beam splitting grating based on metal layer reflection | |
| CN109870824A (en) | A kind of efficient Terahertz Meta Materials linear polarization converter | |
| CN117631146A (en) | Polarization converter based on film lithium niobate waveguide supermode evolution | |
| CN216210270U (en) | GaAs-based polarized light beam splitter | |
| CN102169207A (en) | Periodically poleddomain reverse lithium niobate optical waveguide | |
| CN101907735A (en) | Sandwich type fused quartz transmission 1X 2 beam splitting grating | |
| CN101718883A (en) | High-density deep-etching sinusoidal groove type grating polarization beam splitter | |
| CN103698847A (en) | Method for enhancing birefringence of long-chain molecule-type polymer optical waveguide in matching manner | |
| CN202735536U (en) | Undoped layer photonic crystal optical filter with filtering scope from 430 to 630nm |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C17 | Cessation of patent right | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20100623 Termination date: 20110402 |