CN101452083B - Optical element and method for manufacturing same - Google Patents
Optical element and method for manufacturing same Download PDFInfo
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- CN101452083B CN101452083B CN2007102028660A CN200710202866A CN101452083B CN 101452083 B CN101452083 B CN 101452083B CN 2007102028660 A CN2007102028660 A CN 2007102028660A CN 200710202866 A CN200710202866 A CN 200710202866A CN 101452083 B CN101452083 B CN 101452083B
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Abstract
An optical element comprises a transparent substrate which is provided with a first surface and a second surface that are opposite. The first surface is provided with a first optical part and a light shading film that is plated on the first surface and surrounds the transparent area of the first optical part. The second surface is provided with an infrared blocking optical filtering film which is provided with a second optical part at the position corresponding with the first optical part. The invention also relates to a method for manufacturing the optical element, wherein the method comprises the following steps: providing the transparent substrate, forming a light blocking layer on a first surface of transparent substrate; forming an infrared blocking optical filtering film on a second surface of transparent substrate; removing one part of light blocking to form a non-optical area; forming a light shading film on the non-optical area; removing the residual light blocking to form the optical area; impressing and forming the first optical part in the optical area with an impressing mould; and impressing and forming a second optical part with the impressing mould at a position corresponding with the first optical part on the surface of infrared blocking optical filtering film.
Description
Technical field
The present invention relates to the manufacture method of a kind of optical element and optical element, relate in particular to a kind of manufacture method of optical element and optical element of imprinting moulding.
Background technology
Along with development of science and technology, portable set, the application of electronic product such as mobile phone, digital camera that for example has the camera function of taking pictures is increasingly extensive, and more and more tends to compactization.The portability of portable set and miniaturization have proposed the requirement of miniaturization to the camera module of combination with it.Yet according to this area present situation, the various piece of camera module is made respectively in making chain, for example, assembles after diaphragm, eyeglass, cutoff filter made respectively.Along with the miniaturization of each parts, assemble these parts and become difficult, make the product yield reduce.Assembling each parts also makes the volume of camera module be difficult to have the space that further dwindles.
Ejection formation and imprinting moulding are generally adopted in the moulding of eyeglass at present.
(see also Replication of microlens arrays by injection molding at ejection formation, Microsystems Technologies 10:pp.531-535,2004) in the mode, along with dwindling of lens dimension, the optical design deviate of fabrication tool is difficult to control in the mill more, to cause problems the such as for example offset of eyeglass increases, and the center thickness of eyeglass is undesirable, influence image quality then.
And (see also The Novel Fabrication Method and Optimum Tooling DesignUsed for Microlens Arrays, Proceedings of the 1 at imprinting moulding
StIEEE International Conferenceon Nano/Micro Engineered and Molecular Systems; January 18-21,2006, Zhuhai, China) in the mode, earlier liquid state or plastic yield material are coated in the substrate, again with the impressing mould imprinting moulding, because this moment, described material was in a liquid state or molten state, the pressure that described impressing mould produces when impressing described material makes described material overflow the eyeglass shaping area, solidifies the non-eyeglass shaping area in back and has stayed residual material, also greatly reduces the precision of eyeglass.
Summary of the invention
In view of this, be necessary to provide a kind of and can reduce the assembling difficulty, the optical element that volume is little and precision is high and a kind ofly can reduce operation, reduced volume and effectively improve the manufacture method of the optical element of optical element precision.
A kind of optical element, it comprises a light-transparent substrate, this light-transparent substrate has opposite first and second surface, this first surface is provided with one first optic and photomask, this photomask is plated on this first surface, and around the transparent zone of this first optic, this second surface has infrared cut-off light filtering films, and this infrared cut-off light filtering films surface is provided with second optic to position that should first optic.
A kind of manufacture method of optical element may further comprise the steps: a light-transparent substrate is provided, and it comprises opposite first and second surface; Form photoresist layer at this first surface; Form infrared cut-off light filtering films at this second surface; Utilize the method for exposure imaging to remove a part of photoresistance, make this first surface exposed portions serve surface, become non-optical zones; Form photomask in this non-optical zones; Remove residual photoresistor, form optical zone; Utilize impressing mould in this optical zone imprinting moulding first optic; Utilize this impressing mould on this infrared cut-off light filtering films surface position imprinting moulding second optic corresponding to this first optic.
A kind of manufacture method of optical element may further comprise the steps: a light-transparent substrate is provided, and it comprises opposite first and second surface; Form photoresist layer at this first surface; Form infrared cut-off light filtering films at this second surface; Utilize the method for exposure imaging to remove a part of photoresist layer, make this first surface exposed portions serve surface, become optical zone; Utilize impressing mould in this optical zone imprinting moulding first optic; Remove residual photoresistor, form non-optical zones; Form photomask in this non-optical zones; Utilize this impressing mould on this infrared cut-off light filtering films surface position imprinting moulding second optic corresponding to this first optic.
Further, the employed impressing mould of the manufacture method of this optical element has bulge-structure, the defective of having avoided traditional imprinting moulding mode to cause.
With respect to prior art, the manufacture method of this optical element is plated in photomask and infrared cut-off light filtering films in the substrate, has therefore reduced the assembling difficulty, has reduced operation, has dwindled the volume of camera module with matching.Because adopt the imprinting moulding mode of improving, the precision of this optical element is improved.This optical element combines photomask and infrared cut-off light filtering films, therefore can satisfy the miniaturization requirement well.
Description of drawings
Fig. 1 is the optical element synoptic diagram of an embodiment of the present invention.
Fig. 2 is the optical element manufacture method process flow diagram of an embodiment of the present invention.
Fig. 3 is the substrate synoptic diagram that has been coated with photoresist layer and infrared cut-off light filtering films.
Fig. 4 is the exposure synoptic diagram to photoresist layer shown in Figure 3.
Fig. 5 is to negative photoresistance development synoptic diagram.
Fig. 6 is the synoptic diagram that forms photomask at the substrate first surface.
Fig. 7 is a synoptic diagram of removing the residual negative photoresistance of substrate first surface.
Fig. 8 is the synoptic diagram that injects the material that forms first eyeglass to impressing mould.
Fig. 9 is the synoptic diagram that impressing mould and eyeglass shaping area are aimed at driving fit and carried out ultraviolet curing.
Figure 10 is a synoptic diagram of sloughing impressing mould.
Figure 11 is the synoptic diagram after the slit filling light screening material that forms after the demoulding.
Figure 12 aligns photoresistance development synoptic diagram.
Embodiment
The present invention is described in further detail below in conjunction with accompanying drawing.
In this document, " optical element " can be traditional optical mirror slip, as concavees lens, convex lens, prism etc., also can be the combination of optical mirror slip and mechanical part, for example the combination of eyeglass and diaphragm, cutoff filter etc.
The optical element that an embodiment of the present invention provides is the combination of a kind of eyeglass and diaphragm, infrared cut-off light filtering films.
Fig. 1 is the synoptic diagram of the optical element 10 that provides of an embodiment of the present invention.First optic of optical element 10 is that a surface is that sphere or aspheric first eyeglass, 161, the second optic are that a surface is sphere or aspheric second eyeglass 162.The photomask 13 of optical element 10 defines logical light quantity as diaphragm.
Fig. 2 is the manufacture method process flow diagram of the optical element 10 that provides of an embodiment of the present invention, steps of the method are:
One light-transparent substrate is provided, and it comprises opposite first and second surface;
Form photoresist layer at first surface;
Form infrared cut-off light filtering films at second surface;
Utilize the method for exposure imaging to remove a part of photoresistance, make first surface exposed portions serve surface, become apertured region;
Form diaphragm at apertured region;
Remove residual photoresistor, form the eyeglass shaping area;
Utilize impressing mould at eyeglass shaping area imprinting moulding first eyeglass;
Utilize impressing mould on the infrared cut-off light filtering films surface position imprinting moulding second eyeglass corresponding to first eyeglass.
As shown in Figure 3, at first provide a light-transparent substrate 11, the material of light-transparent substrate 11 is a kind of light transmissive materials, and glass for example preferably, can be penetrance greater than 95% optical glass.Light-transparent substrate 11 comprises two facing surfaces, i.e. first surface 11a and second surface 11b.Utilize crack coating (Slit Coat) or rotation type rubbing method or other rubbing method to form photoresist layer 12 at first surface 11a, photoresist layer 12 can be negative photoresistance, also can be positive photoresistance.Utilize coating technique on second surface 11b, for example vapour deposition method plates one deck infrared cut-off light filtering films 15.
See also Fig. 4, carry out the UV-irradiation exposure by 30 pairs of photoresist layers of light shield 12 with predetermined pattern.If use negative photoresistance, polyisoprene (polyisoprene) for example, because negative photoresistance is to the ultraviolet light sensitivity, exposed portion will be insoluble to developer.
See also Fig. 5, behind the use developer,, stay the negative photoresistance 121 that is exposed unexposed negative photoresistance dissolving.First surface 11a exposed portions serve surface forms non-optical zones 40.
See also Fig. 6, utilize existing coating technique at first surface 11a, for example sputtering method plates one deck light screening material, and for example chromium forms photomask 13.Photomask 13 limits logical light quantity as diaphragm.Photomask 13 covers non-optical zones 40 as shown in Figure 5 at least.The thickness of photomask 13 is less than the thickness of negative photoresistance 121.
See also Fig. 7, utilize the negative photoresistance of a kind of solubilized but with the unresponsive solvent of light screening material chromium, acetone soln for example, dissolving negative photoresistance 121 as shown in Figure 6 exposes eyeglass shaping area 14.
Then at eyeglass shaping area 14 imprinting mouldings first eyeglass.
Forming process sees also Fig. 8, Fig. 9 and Figure 10.As shown in Figure 8, impressing mould 20 is made by the transparent material of a kind of ultraviolet light, has forming cavity 201 and bulge-structure 202.Bulge-structure 202 surrounds into die cavity 201 edges, extends outside mould 20 from the surperficial 20a of impressing mould 20.Forming cavity 201 is used for holding liquid state or the plastic material that forms eyeglass, and bulge-structure 202 can prevent that liquid state or plastic material from overflowing the eyeglass shaping area, accurately controls the center thickness of eyeglass simultaneously.At first the forming cavity 201 to impressing mould 20 injects liquid state or the plastic material that forms eyeglass.
See also Fig. 9, impressing mould 20 and eyeglass shaping area 14 are aimed at driving fit and are carried out ultraviolet curing, form first eyeglass 161.
See also Figure 10, after curing is finished, slough impressing mould 20.Can stay the depression 131 that forms by bulge-structure 202 between first eyeglass 161 and the photomask 13.With photosensitive black resin material, for example black color material, monomer or oligomer and the light by organic or inorganic plays the black resin material that agent constitutes, and inserts depression 131, utilizes this material of ultraviolet curing then, fills up depression 131.Effect after the filling as shown in figure 11.
See also Figure 12, if use positive photoresistance, phenolics for example, exposed portion will be dissolved in developer.Use the positive photoresistance dissolving of developer with exposed portion, first surface 11a exposed portions serve surface forms eyeglass shaping area 14.
See also Fig. 8 to method for stamping shown in Figure 10, at eyeglass shaping area 14 imprinting mouldings first eyeglass.After impression is finished, remove eyeglass shaping area 14 residual positive photoresistance on every side, expose the surface of first surface 11a except that eyeglass, form non-optical zones 40, utilize existing coating technique again, for example sputtering method, at non-optical zones 40 plating light screening materials, for example chromium forms photomask 13.
Next, utilize existing technique of alignment, for example the nanometer technique of alignment in infrared cut-off light filtering films 15 surface calibrates and eyeglass shaping area 14 corresponding zones, utilizes impressing mould 20 at this zone imprinting moulding second eyeglass 162, as shown in Figure 1.
The present invention can implement in other specific modes and not exceed real protection scope of the present invention.Will be understood that previous embodiment is illustrative and not restrictive.
Claims (11)
1. optical element, it comprises a light-transparent substrate, described light-transparent substrate has opposite first and second surface, it is characterized in that: described first surface is provided with one first optic and photomask, described photomask is plated on described first surface, and around the transparent zone of described first optic, described second surface has infrared cut-off light filtering films, and the position of corresponding described first optic in described infrared cut-off light filtering films surface is provided with second optic.
2. optical element as claimed in claim 1 is characterized in that: described light-transparent substrate is a transmittance greater than 95% optical glass.
3. the manufacture method of an optical element may further comprise the steps:
One light-transparent substrate is provided, and it comprises opposite first and second surface;
Form photoresist layer at described first surface;
Form infrared cut-off light filtering films at described second surface;
Utilize the method for exposure imaging to remove a part of photoresistance, make described first surface exposed portions serve surface, become non-optical zones;
Form photomask in described non-optical zones;
Remove residual photoresistor, form optical zone;
Utilize impressing mould in described optical zone imprinting moulding first optic;
Utilize described impressing mould on described infrared cut-off light filtering films surface position imprinting moulding second optic corresponding to described first optic.
4. the manufacture method of optical element as claimed in claim 3 is characterized in that: utilize crack rubbing method or rotation type rubbing method to form described photoresist layer.
5. the manufacture method of optical element as claimed in claim 3 is characterized in that: utilize sputtering method to form photomask.
6. the manufacture method of optical element as claimed in claim 3 is characterized in that: utilize vapour deposition method to form infrared cut-off light filtering films.
7. the manufacture method of optical element as claimed in claim 3, it is characterized in that: described impressing mould comprises forming cavity, has bulge-structure around the edge of described forming cavity.
8. the manufacture method of optical element as claimed in claim 3, it is characterized in that: described impressing mould is the transparent mould of ultraviolet light.
9. the manufacture method of optical element as claimed in claim 7, it is characterized in that: the step of described imprinting moulding first optic comprises:
The liquid state or the plastic material that form first optic are poured into described forming cavity;
Described optical zone is aimed at driving fit with described forming cavity;
Solidify the liquid state or the plastic material of described formation first optic;
Slough described impressing mould.
10. the manufacture method of optical element as claimed in claim 9, it is characterized in that: described curing utilizes ultraviolet curing.
11. the manufacture method of an optical element may further comprise the steps:
One light-transparent substrate is provided, and it comprises opposite first and second surface;
Form photoresist layer at described first surface;
Form infrared cut-off light filtering films at described second surface;
Utilize the method for exposure imaging to remove a part of photoresist layer, make described first surface exposed portions serve surface, become optical zone;
Utilize impressing mould in described optical zone imprinting moulding first optic;
Remove residual photoresistor, form non-optical zones;
Form photomask in described non-optical zones;
Utilize described impressing mould on described infrared cut-off light filtering films surface position imprinting moulding second optic corresponding to described first optic.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2007102028660A CN101452083B (en) | 2007-12-06 | 2007-12-06 | Optical element and method for manufacturing same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2007102028660A CN101452083B (en) | 2007-12-06 | 2007-12-06 | Optical element and method for manufacturing same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101452083A CN101452083A (en) | 2009-06-10 |
| CN101452083B true CN101452083B (en) | 2011-09-28 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN2007102028660A Expired - Fee Related CN101452083B (en) | 2007-12-06 | 2007-12-06 | Optical element and method for manufacturing same |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105425338B (en) * | 2015-11-10 | 2019-03-08 | 武汉电信器件有限公司 | A kind of wavelength-division multiplex/demultiplexing component |
| CN109459866A (en) * | 2018-12-18 | 2019-03-12 | 长沙韶光铬版有限公司 | A kind of integration graticle and preparation method thereof |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN2763819Y (en) * | 2004-12-17 | 2006-03-08 | 鸿富锦精密工业（深圳）有限公司 | Composite lens |
| WO2006057416A1 (en) * | 2004-11-25 | 2006-06-01 | Sumitomo Osaka Cement Co., Ltd. | Optical filter |
| CN1782744A (en) * | 2004-12-03 | 2006-06-07 | 鸿富锦精密工业（深圳）有限公司 | Lens for digital camera and its producing method |
| CN1858620A (en) * | 2005-04-29 | 2006-11-08 | 鸿富锦精密工业（深圳）有限公司 | Coated optical element |
-
2007
- 2007-12-06 CN CN2007102028660A patent/CN101452083B/en not_active Expired - Fee Related
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2006057416A1 (en) * | 2004-11-25 | 2006-06-01 | Sumitomo Osaka Cement Co., Ltd. | Optical filter |
| CN1782744A (en) * | 2004-12-03 | 2006-06-07 | 鸿富锦精密工业（深圳）有限公司 | Lens for digital camera and its producing method |
| CN2763819Y (en) * | 2004-12-17 | 2006-03-08 | 鸿富锦精密工业（深圳）有限公司 | Composite lens |
| CN1858620A (en) * | 2005-04-29 | 2006-11-08 | 鸿富锦精密工业（深圳）有限公司 | Coated optical element |
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| CN101452083A (en) | 2009-06-10 |
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