CN101419410B - 直接图像曝光装置 - Google Patents

直接图像曝光装置 Download PDF

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Publication number
CN101419410B
CN101419410B CN2008101684332A CN200810168433A CN101419410B CN 101419410 B CN101419410 B CN 101419410B CN 2008101684332 A CN2008101684332 A CN 2008101684332A CN 200810168433 A CN200810168433 A CN 200810168433A CN 101419410 B CN101419410 B CN 101419410B
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CN
China
Prior art keywords
exposure
luminophor
photohead
image exposure
image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN2008101684332A
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English (en)
Chinese (zh)
Other versions
CN101419410A (zh
Inventor
中野幸夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ADITECH ENGINEERING Co Ltd
Adtec Engineering Co Ltd
Original Assignee
ADITECH ENGINEERING Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ADITECH ENGINEERING Co Ltd filed Critical ADITECH ENGINEERING Co Ltd
Publication of CN101419410A publication Critical patent/CN101419410A/zh
Application granted granted Critical
Publication of CN101419410B publication Critical patent/CN101419410B/zh
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70466—Multiple exposures, e.g. combination of fine and coarse exposures, double patterning or multiple exposures for printing a single feature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G03F7/70391—Addressable array sources specially adapted to produce patterns, e.g. addressable LED arrays

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Printers Or Recording Devices Using Electromagnetic And Radiation Means (AREA)
  • Facsimile Heads (AREA)
CN2008101684332A 2007-10-26 2008-10-07 直接图像曝光装置 Expired - Fee Related CN101419410B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2007278784 2007-10-26
JP2007-278784 2007-10-26
JP2007278784A JP2009109550A (ja) 2007-10-26 2007-10-26 直描露光装置

Publications (2)

Publication Number Publication Date
CN101419410A CN101419410A (zh) 2009-04-29
CN101419410B true CN101419410B (zh) 2013-12-04

Family

ID=40490470

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2008101684332A Expired - Fee Related CN101419410B (zh) 2007-10-26 2008-10-07 直接图像曝光装置

Country Status (5)

Country Link
JP (1) JP2009109550A (ja)
KR (1) KR20090042711A (ja)
CN (1) CN101419410B (ja)
DE (1) DE102008050547A1 (ja)
TW (1) TW200919122A (ja)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5165731B2 (ja) 2010-06-30 2013-03-21 東京エレクトロン株式会社 局所露光装置及び局所露光方法
JP5470236B2 (ja) * 2010-12-22 2014-04-16 東京エレクトロン株式会社 局所露光方法及び局所露光装置
JP5451798B2 (ja) * 2011-03-15 2014-03-26 東京エレクトロン株式会社 局所露光方法及び局所露光装置
DE102012016178B3 (de) 2012-08-16 2013-08-29 Forschungszentrum Jülich GmbH Verfahren zur optischen Übertragung einer Struktur in ein Aufnahmemedium
JP5298236B2 (ja) * 2012-12-19 2013-09-25 東京エレクトロン株式会社 局所露光装置及び局所露光方法
CN103331988B (zh) * 2013-06-19 2015-02-18 汪海洋 一种柔性印刷版的制版方法和主曝光设备
EP3096186A3 (de) * 2013-11-08 2017-04-12 Limata GmbH Lithografiebelichtungseinrichtung zur lithographischen belichtung durch ein- oder mehrstufige laserprojektionseinheiten mit einer oder mehreren wellenlängen
US10488762B1 (en) * 2018-06-29 2019-11-26 Applied Materials, Inc. Method to reduce data stream for spatial light modulator
CN112130422B (zh) * 2020-09-02 2022-11-18 合肥芯碁微电子装备股份有限公司 直写曝光机

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1501171A (zh) * 2002-11-15 2004-06-02 ��ʿ��Ƭ��ʽ���� 曝光装置
CN1550876A (zh) * 2003-05-06 2004-12-01 ��ʿ��Ƭ��ʽ���� 投影曝光装置
CN1766736A (zh) * 2004-04-30 2006-05-03 富士胶片株式会社 曝光方法及装置

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2075026A1 (en) 1991-08-08 1993-02-09 William E. Nelson Method and apparatus for patterning an imaging member
JPH0580524A (ja) * 1991-09-25 1993-04-02 Nikon Corp フオトレジストパターン直接描画装置
JP3052587B2 (ja) * 1992-07-28 2000-06-12 日本電気株式会社 露光装置
JPH11147326A (ja) * 1997-11-17 1999-06-02 Dainippon Screen Mfg Co Ltd 画像記録装置
JP2000093624A (ja) 1998-09-18 2000-04-04 Sanyo Electric Co Ltd パチンコ遊技システム
JP2000338432A (ja) * 1999-05-31 2000-12-08 Dainippon Screen Mfg Co Ltd レーザー露光装置及びその方法
JP2000355121A (ja) * 1999-06-15 2000-12-26 Asahi Optical Co Ltd マルチビーム作画記録装置におけるｖｆ値による光量制御方法
JP4543487B2 (ja) * 2000-03-16 2010-09-15 富士ゼロックス株式会社 光プリンタヘッドの点灯方法
TWI246382B (en) * 2000-11-08 2005-12-21 Orbotech Ltd Multi-layer printed circuit board fabrication system and method
DE10057488B4 (de) 2000-11-20 2006-05-24 Epcos Ag Kondensator
US7407252B2 (en) * 2004-07-01 2008-08-05 Applied Materials, Inc. Area based optical proximity correction in raster scan printing
JP2007033764A (ja) * 2005-07-26 2007-02-08 Fujifilm Holdings Corp パターン製造システム、露光装置、及び露光方法
JP2007079221A (ja) * 2005-09-15 2007-03-29 Sumitomo Heavy Ind Ltd 直接描画装置
JP2007079219A (ja) * 2005-09-15 2007-03-29 Sumitomo Heavy Ind Ltd 直接描画装置
JP2007171610A (ja) * 2005-12-22 2007-07-05 Fujifilm Corp パターン形成方法
JP2007298603A (ja) * 2006-04-28 2007-11-15 Shinko Electric Ind Co Ltd 描画装置および描画方法
JP4934459B2 (ja) * 2007-02-23 2012-05-16 株式会社 日立ディスプレイズ 設計装置、直描露光装置及びそれらを用いた直描露光システム

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1501171A (zh) * 2002-11-15 2004-06-02 ��ʿ��Ƭ��ʽ���� 曝光装置
CN1550876A (zh) * 2003-05-06 2004-12-01 ��ʿ��Ƭ��ʽ���� 投影曝光装置
CN1766736A (zh) * 2004-04-30 2006-05-03 富士胶片株式会社 曝光方法及装置

Also Published As

Publication number Publication date
DE102008050547A1 (de) 2009-04-30
KR20090042711A (ko) 2009-04-30
JP2009109550A (ja) 2009-05-21
CN101419410A (zh) 2009-04-29
TW200919122A (en) 2009-05-01

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