CN101389787A - Multiple precursor dispensing apparatus - Google Patents
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- CN101389787A CN101389787A CNA2007800069611A CN200780006961A CN101389787A CN 101389787 A CN101389787 A CN 101389787A CN A2007800069611 A CNA2007800069611 A CN A2007800069611A CN 200780006961 A CN200780006961 A CN 200780006961A CN 101389787 A CN101389787 A CN 101389787A
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Abstract
An apparatus for dispensing multiple precursors to a manufacturing tool includes a fluidic manifold having a plurality of interconnected sub-manifolds, a plurality of tanks, each tank containing a different precursor, and wherein each of the sub-manifolds is connected to one of the tanks. A system for dispensing multiple precursors to a manufacturing tool includes a multiple precursor dispenser having a fluidic manifold and a plurality of tanks, each tank containing a different precursor and connected to a different sub-manifold of the fluidic manifold, the sub-manifolds being interconnected, a manufacturing tool fluidic processor having a plurality of canisters, each canister containing a different precursor, wherein a first dispenser tank communicates with a first tool canister having the same precursor, and wherein a second dispenser tank communicates with a second tool canister having the same precursor. Related methods are also described herein.
Description
Background technology
In the process of chemical delivery industry, complicated chemical distribution system and method be used for to fabrication tool (reactor) transmission of for example film deposition tool ultrapure, easy reaction and common deleterious liquid chemical product or precursor (parent, precursor).For example, the instrument that film is transferred to solid substrate is used for the manufacturing of semi-conductor, optical device and product and chemical-resistant resistance coating.Especially, various Liquid precursor are applied on the advanced semiconductor electron device by chemical vapor deposition (CVD) technology.Chemical distribution system will comprise that the mixture of Liquid precursor is transported to the reactor in the deposition tool so that be applied on the semiconductor device.The exemplary precursor deposition method comprises that metallorganics CVD, atomic shell CVD and those are used to use the dielectric method of high dielectric constant grid on metal gates and various blocking layers.
Needed liquid chemical product of fabrication tool or precursor are kept in jar tube.This jar tube can also be supplied with by more large-scale, isolating storage tank, makes to be convenient to recharging continuously and making minimum of interruptionization in the manufacturing processed of jar tube.Each jar tube all needs controller and gas/liquid manifold to control flowing of precursor, and whole device is contained in the casing.This special cabinet that is used for precursor canister is positioned near the clean room the reactor, and the space of this clean room is very narrow and small and limited.For the single precursor depositing operation, this layout is complete acceptable.
But the demand of industry is among the continuous variation.Little by little, along with the increase in demand of manufacturers to this product, more liquid chemical product is handled by chemical delivery system and is carried.In addition more importantly, developed the multi-element compounds laminating material that is used for depositing operation in the industry.In order to deposit the multi-element compounds laminating material, may need two kinds, three kinds, four kinds or more precursor are fed to individual tool simultaneously.In the multiple precursor each all needs independent e Foerderanlage, comprises the fluid manifold or the treater that are used to handle various precursors, may hold the special casing of various precursors and fluid processor thereof in addition.Described extra e Foerderanlage has increased the floor space and the cost of system.Being arranged on a plurality of precursor flow treaters or casing near the reactor the clean room is that the available small space can not hold the floor space that a plurality of precursor processor increase in unrealistic and undesirable-clean room.Equally, with precursor processor and clean room arranged apart also be unrealistic and undesirable because do the very big flow velocity that has reduced from the jar tube like this.The volume less relatively (for example, 1 liter) of jar tube, if distance is bigger between jar tube and instrument, a jar tube can not provide instrument required proper flow rates.Therefore, industrial needs, especially needs from multiple precursor to individual tool that supply have promoted the development of existing chemical delivery system.
Summary of the invention
In one embodiment of the invention, a kind of device that is used for multiple precursor is assigned to fabrication tool comprises the fluid manifold with the sub-manifold of a plurality of interconnection, and a plurality of storage tank, and each storage tank holds different precursors, wherein, each described sub-manifold is connected in the described storage tank one.In another embodiment of the present invention, described a kind of multiple precursor is assigned to method in the fabrication tool.
In another embodiment of the present invention, a kind of system that multiple precursor is assigned to fabrication tool comprises: the many precursor dispenser (multiple precursordispenser) with fluid manifold and a plurality of storage tanks, each storage tank holds different precursors and is connected on the different sub-manifold of fluid manifold, interconnects between the described sub-manifold; Have the fabrication tool fluid processor of a plurality of jars of tubes, each jar tube holds different precursors; Wherein, the first divider storage tank is communicated with the first Tool pot tube with same precursor; And wherein the second divider storage tank is communicated with the second Tool pot tube with same precursor.In another embodiment, a kind of relevant systems approach has been described.
Description of drawings
In order to describe the preferred embodiments of the present invention in more detail, describe below with reference to the accompanying drawings, wherein:
Figure 1A and 1B are the synoptic diagram of many precursor dispenser according to an embodiment of the invention, and wherein, Figure 1A has described the fluid manifold part of divider, and Figure 1B has described the chemical storage tanks part of divider;
Fig. 2 is the synoptic diagram of auxiliary unit according to an embodiment of the invention;
Fig. 3 is the synoptic diagram of fabrication tool fluid processor according to an embodiment of the invention;
Fig. 4 A-4D is the synoptic diagram of the optional embodiment of total system according to an embodiment of the invention, comprises many precursor dispenser of Figure 1A and 1B, the auxiliary unit of Fig. 2 and the fabrication tool fluid processor of Fig. 3.
Embodiment
Some term is used in reference to specific system component of generation in whole specification sheets and claim.This paper does not distinguish the name difference and the identical parts of function.
In following discussion and claim, term " comprises " and " comprising " uses with open limiting mode, therefore should be construed to " including, but are not limited to ... ".In addition, term " precursor " here is used in reference to for reactive material, and it becomes the part that is applied to the layer on semi-conductor or other goods by depositing operation.Precursor is to have moderate or low volatile activity and deleterious compound, and the micro-concentrations of oxygen and moisture is had high susceptibility.The chemical products that term " precursor " here more generally is used in reference in the generation depositing operation described here and stores, carries and use.Various parts described herein connect or are communicated with by pipeline or pipeline, should be appreciated that term " pipeline " or " pipeline " can comprise that pipeline, pipe or other are used for the device of delivering gas and liquid phase equivalent thereof.
With reference to Figure 1A and 1B, schematically illustrate many precursor processor of integral body (bulk) or overabsorption device 10.Overabsorption device 10 is divided into fluid manifold part (Figure 1A) and chemical storage tanks part (Figure 1B), to strengthen the visuality of schematic figures.Overabsorption device 10 can be handled the various precursors of some amount simultaneously.For example, a kind of example dispensers can be handled two kinds to five kinds precursors.In certain embodiments, divider is also handled solvent, more kinds of precursor or other chemical productss.Because its response characteristic, precursor require reliable and free of contamination mode of movement to move to point-of-use.This overabsorption device 10 can be used in the high purity liquid delivery system, and the exemplary embodiment of this system here is described with reference to figure 4A-4D.
Shown in Figure 1B, overabsorption device 10 comprises shell 12, and this shell 12 accommodates first and supplies with carrying shield tube or the female storage tank 14 and second supply carrying shield tube or the female storage tank 16.First female storage tank 14 holds first precursor, and second female storage tank 16 holds second precursor.According to the quantity of the needed different precursors of manufacturing process, divider 10 can comprise additional tanks.According to instruction given herein and those of ordinary skill in the art's knowledge, female storage tank 14,16 is configured to hold precursor material.Female storage tank also has the suitable size that is used for technology described here, and for example, scope is 15～20 gallons.
Be clearly shown that among Figure 1A that first female storage tank 14 is connected to first chemical block or sub-manifold 18, the second female storage tanks 16 of precursor are connected to second chemical block or the sub-manifold 22 of precursor.Chemical block 18 is used for female storage tank 14, will be conveyed into processing pipeline or pipeline 54 from the liquid product of female storage tank 14.Similarly, chemical block 22 is used for female storage tank 16, will be conveyed into processing pipeline 56 from the liquid product of female storage tank 16. Chemical block 18,22 is in different maintenance processes, for example gas boosting/step-down, gas and vacuum cleaned, solvent washing and with in consistent other processes of this instruction, also be used to carry out necessary fluid and switch.
Referring to Figure 1A, first female storage tank 14 is also connected to first gas block or sub-manifold 24, the second female storage tanks 16 are connected to second gas block or sub-manifold 26. Gas block 24,26 is supplied one or more gas under pressures in mode intermittently to female storage tank when needed, and is carrying the accurate setting of keeping gaseous tension the chemical products process from female storage tank.Each chemical block 18,22 and gas block 24,26 all comprise a series of pressure-regulators, pressure transmitter, vacuum breaker, trip valve, aperture and other these type of devices shown in Figure 1, and can be called the divider fluid manifold jointly.Part in these devices will be described below more fully.But some these devices can not described in detail, because these devices are known for those skilled in the art, they are described can not help embodiments of the invention described here are had more are expressly understood.In addition, the various combinations in pressure-regulator, valve and aperture can be used for embodiments of the invention described here.The present invention should not be limited to the combination of this class device described here, those skilled in the art will recognize that to the present invention includes other array modes consistent with the instruction here.
Still referring to Figure 1A, adjusted is connected to gas block 24 with filtering gas tube 28,30.Described gas block 24 also comprises pressure- regulator 36,38, discharges aperture 40, trip valve 42,44,46, and vacuum breaker 48,50,52.Operation pressure in female storage tank 14 is set separately and independently by pressure- regulator 36,38 and release aperture 40, and by trip valve 48,50,52 self-poises.Perhaps, according to needed setting pressure scope of female storage tank and precision, aperture 40 can be replaced by metering valve or mass flow controller.If serious component failure takes place the downstream in gas block 24, then vacuum breaker 48,50 makes supply gas pipeline 28,30 respectively and has any potentially contaminated of micro liquid product isolated.Vacuum breaker 52 has been avoided the possible pollution that caused by the discharge fluid from downstream chemical block 18.
Similarly, gas tube 32,34 is connected on the gas block 26, this gas block comprise with at the same device of gas block 24 described devices.Particularly, gas block 26 also comprises pressure- regulator 66,68, discharges aperture 70, trip valve 72,74,76, and vacuum breaker 78,80,82.The operation of these device series is identical with those related devices of gas block 24.Can comprise other gas block consistent with the description here in the manifold 12, this number according to the female storage tank that comprises in the overabsorption device 10 is decided.
Still referring to Figure 1A, gas block 24 is connected on the chemical block 18 by the pipeline 20 with valve 23.Chemical block 18 also comprises one group of valve 84,86,88,90,92,94,96 and aperture 98.Shown in Figure 1B, between chemical block 18 and female storage tank 14, be provided with one group of valve 99,100,102.Liquid product in female storage tank 14 is by the pipeline 104 independent superchargings of gas block 24 by having normally open valve 86,99, and valve the 84, the 88th is normally closed.By pipeline 104 is connected to pipeline 106, and then be connected to draft tube liner 108, valve 84 allows the pressure release of pipelines 104.Liquid product in female storage tank 14 is opened at valve 100, extracts by vent line 110 under the situation of valve 102 closures, and further flows in the processing pipeline 54 by the valve of opening 90.In extraction process, valve 88,92 closures.
Sometimes, female storage tank 14 evacuation of liquid product almost.The state of this almost emptying is detected by liquid level sensor, and this liquid level sensor is schematically shown by sensor indicator 51.The real sensor that uses comprises outside or internal sensor, and continuous or discrete sensor.Other liquid level sensors are known and consistent with the instruction at this to those skilled in the art.Storage tank 14 also can comprise transmitter 53,55.In the layout of transmitter 51,53,55, transmitter 53 is used to indicate storage tank 14 to change or to recharge as " low level " transmitter, but does not need to handle immediately.If necessary, the technology of instrument can be finished by remaining small amounts of precursors supply in the storage tank 14.Transmitter 51 is as " low Low Level " transmitter, and the technology that is used for marking tools must stop, because storage tank 14 does not comprise enough precursor supplies.Transmitter 55 is as " high position " transmitter, and it is full being used to indicate storage tank 14.Female storage tank 16 comprises similar transmitter layout, comprises low Low Level transmitter 57, low sensors 59 and high position sensor 61.
Process/the program that can change when needs recharge and/or change female storage tank 14 is wherein removed described storage tank from chemical block 18.System is opened to envrionment conditions can make the active precursor residue in the system be exposed to Atmospheric components, particularly oxygen and moisture.Therefore, must be before opening system from pipeline wash residue.Most of cleanings can using gas and/or vacuum finish.For the precursor remnants that does not have by these methods to remove, use the abundant flushing line of solvent.Some part that is exposed to the chemical block 18 in the active precursor adopts suitable solvent washing, solvent passes valve 92 under the situation of valve 98,100 closures, and further pass the valve of opening 102 and enter vent line 112, this vent line 112 leads to waste line 114.Solvent washing realized by solvent tank and manifold, has a detailed description and shows at the elsewhere of this paper.Waste line 114 can also be communicated with draft tube liner 108.Waste line 114 also comprises valve 116,118, and draft tube liner 108 comprises valve 120.When valve 116 is opened, and valve 118,120 is when closed, and refuse is transported to waste tank (show, and describe in further detail at the elsewhere of this paper) in Fig. 2 and Fig. 4 A.Perhaps, purge gas passes valve 88 and enters chemical block 18 and enter valve 102, and waste delivery is to waste tank or draft tube liner 108.If refuse enters draft tube liner 108 by the valve of opening 120, so, refuse is inducted into vacuum pipeline 124 by closed valve 122.Residual pressure during these evacuation procedure is by pressure transmitter 126 monitoring.
In the switching process of female storage tank 14, when storage tank is not connected on the chemical block 18, keep the introducing (bleeding) of rare gas element by the valve of opening 86,88.The permissible velocity that gas flow is restricted to hope will be introduced in aperture 98.
With reference to Figure 1A and 1B, the layout of second gas block 26, second chemical block 22 and second female storage tank 16 is similar to the layout of aforementioned first gas block 24, first chemical block 18 and first female storage tank 14 basically.More specifically, gas block 26 is connected to chemical block 22 by the pipeline 21 with valve 25.Chemical block 22 also comprises one group of valve 134,136,138,140,142 and aperture 144.Between chemical block 22 and female storage tank 16, be provided with one group of valve 148,150,152.As previously mentioned, the liquid product in female storage tank 16 is by gas block 26 independent superchargings.Liquid product in female storage tank 16 extracts and enters processing pipeline 56 by vent line 154.Pipeline 158 is connected to shares pipeline 106, and then is connected to shared draft tube liner 108.Share pipeline 106 and allow each sub-manifold of fluid processor 10 interconnection, and be communicated with single public draft tube liner 108.The additional sub-manifold that is associated with additional female storage tank can be connected in a like fashion shares pipeline 106, therefore also shares and uses public draft tube liner 108.
About as described in female storage tank 14, can repeat conversion and pipeline evacuation procedure as the front to the arbitrarily additional female storage tank that comprises in female storage tank 16 and the divider 10.Vent line 156 will be carried into from the refuse of female storage tank 16 in the aforementioned shared waste line 114.As previously mentioned, described shared waste line 114 is communicated with other parts of divider 10, and a common line is provided, and is used for discharging the refuse of the anyon manifold of the related chemical sub-manifold of various interconnection here.
In some embodiment of fluid processor 10, gas block 24,26 can be merged into an independent shared gas block, and it supports a plurality of chemical block.Referring to Figure 1A, a kind of like this common gas block looks similar with gas block 24, and difference is that the major part of gas block 26 is removed, and pipeline 21 is connected to the pipeline 20 of valve 23 tops from the top of valve 25.If fluid processor 10 is used to supply other precursor, so, the gas feedthroughs that is used for chemical block will be connected to the main gas feedthroughs of common gas block by this way.Described common gas block provides shared gas boosting subsystem for treater 10.
Referring now to Fig. 2, schematically illustrate supplementary module or unit 200.Supplementary module 200 is contained in and is arranged in the casing 202 that is spaced a distance with divider 10, and perhaps, auxiliary unit 200 is with in divider 10 is contained in identical shell or casing.Auxiliary unit 200 is communicated with divider 10 by solvent vent line 204.Usually, auxiliary unit 200 solvent tank 212 that comprises gas block 206, have the waste tank 208 of the sub-manifold 210 of the waste tank that is associated and have the sub-manifold 214 of the solvent tank that is associated.Gas block 206 has identical global design and function with aforementioned gas block 24,26.Therefore, except the place of the independent characteristic of the complete description auxiliary unit 200 of needs, do not need to describe in detail gas block 206.Wherein function of auxiliary unit 200 is to realize the aforementioned solvents flushing and the waste features of divider 10.
When needed, the solvent in the solvent tank 212 is forced by valve 216,218 by the gas that starts from gas block 206 and enters in the solvent supply pipeline 204.Solvent passes in the public solvent supply pipeline 204 that supply line 204 enters divider 10 (Figure 1A and 4B), and then, solvent passes valve 94 and enters shared divider solvent line 160, perhaps passes valve 96 and enters instrument solvent supply pipeline 204.Therefore, public solvent supply pipeline 204 allows auxiliary unit 200 to support the fluid processor 300 of divider 10 and instrument.In divider 10, all chemical block of the pipeline 160 supply dividers of sharing.
Liquid solvent pressure is by pressure transmitter 220 monitoring.When solvent tank 212 during,, then be similar to aforementioned switching process and change this solvent tank as by instructing consistent low liquid level sensor 215 and ultralow liquid level sensor 213 detect with this paper near emptying.Before solvent tank 212 disconnected, the liquid branch line of the sub-manifold 214 of solvent tank (being shown as liquid line 222 usually) cleaned and emptying with clean air.When solvent tank 212 disconnected, this liquid branch line and gas branch line (being shown as gas tube 224 usually) all were introduced into rare gas element.After new solvent tank connects and before tank valves is opened arbitrarily, two branch lines all carry out vacuum cleaned so that the micro-atmospheric polluting material in the removal pipeline at pipeline 228 places.
The different parts of divider 10 and auxiliary unit 200 and operation are controlled by controller.This controller is not concrete here to be shown or describes because this controller that can be applicable to various embodiment described here in industry extensively as seen.This controller structure becomes to be independent of other storage tanks-manifold combinations ground control each storage tank-manifold combinations (for example, female storage tank 14 and chemical block 18/ gas block 24, or solvent tank 212 and manifold 214/ gas block 206).Therefore, every kind of precursor is independent of other precursors to be handled and distributes, and provides the whole process of various precursors very flexible to fabrication tool.For example, can provide a kind of precursor at a time, multiple precursor perhaps is provided simultaneously.In addition, when supplying precursor material, other female storage tanks can change one or more female storage tanks.
Referring now to Fig. 3,, schematically illustrates and a kind ofly be used to deposit or the chemical supply system or the fluid processor 300 of fabrication tool.Fluid processor 300 comprises tool outer casing 302, and for example, it can be one or more manufacturings or production plant.Fluid processor 300 also comprises first work tank 306 with the chemical manifold 308 that is associated, has second work tank 310 of the chemical manifold 312 that is associated and the solvent day tank 314 with the chemical manifold 316 that is associated.Treater 300 can comprise more groups of work tanks and chemical manifold as required, to satisfy manufacturing process and required number of precursors thereof.Storage tank 306,310,314 is configured to consistent with the instruction at this, comprises other storage tanks described here.Storage tank 306,310,314 can be of different sizes, for example comprise littler 20 or 30 times than female storage tank 14,16, for example less than 2 liters.Female storage tank is much larger than work tank, and therefore, female storage tank can also be called source container, and work tank can also be called the quantitative pot tube.
Aforementioned many precursors allocation units 10 and auxiliary unit 200 are used for the fluid processor 300 of support tool.The combination of work tank 306 and manifold 308 is communicated with precursor chemical product line 54.The combination of work tank 310 and manifold 312 is communicated with precursor chemical product line 56.The combination of solvent day tank 314 and manifold 316 is communicated with the solvent supply pipeline of sharing 204, provides the common solvent sub between divider, auxiliary unit and the tool unit of interconnection.Common waste line 114 is supported the common waste sub-system between these three unit at all.As previously mentioned, common waste line 114 also is communicated with so that shared vacuum sub-system to be provided with the draft tube liner 226 and the vacuum pipeline 228 of auxiliary unit 200.Therefore, the fluid processor of the instrument of the multiple precursor of needs is by many precursor dispenser supply one, modular, that optimize.In the layout of describing just now, also by the solvent and the waste unit support of individual moduleization, this unit is provided with separately or is provided with divider for the fluid processor of instrument and divider.
Usually, metallorganics CVD or atomic layer deposition tool comprise the quantitative pot tube near treatment chamber, allow to control better the transmission of precursor thus.Previous embodiment of the present invention is well suited for these instruments, and avoids unnecessary and expensive quantitative pot tube.But in certain embodiments, divider 10 is suitable for comprising the quantitative pot tube 306,310,314 of instrument fluid processor 300.Dispenser housing 12 is configured to hold storage tank-manifold combinations shown in Figure 3 so that supply external object process tool or instrument continuously, modular and integrated fluid processor still is provided simultaneously, this fluid processor by the shared solvent of shared pipeline described here, refuse, vacuum and---for some embodiment---the gas boosting subsystem.
In the block of divider 10, auxiliary unit 200 and fluid processor 300 or sub-manifold and the various miscellaneous part and the connection line between them be designed to keep chemicals described here.For example, pipeline can be made by the high-purity stainless steel steel pipe.For example, trip valve described here can be that high purity does not have the spring diaphragm valve.
With reference to figure 4A-4D, schematically illustrate the integrated liquid conveying system 400 that is used for the number of chemical product.Fig. 4 A-4D has shown complete integrated system, but, and for the sake of clarity and Pagination Display.System 400 comprises aforementioned modules overabsorption device 10 (referring to Fig. 4 B and 4D), and this modularization overabsorption device 10 is connected on the modularization auxiliary unit 200 by public solvent supply pipeline 204 and common waste line 114.This system also comprises the fluid processor 300 (referring to Fig. 4 C) of instrument, and this fluid processor 300 is connected on the divider 10 by public solvent supply pipeline 204, the first precursor pipeline 54, the second precursor pipeline 56 and common waste line 114.Described divider 10 can be provided with near treater 300, for example in the clean room of adjacent tools, or is positioned at a suitable segment distance place with this processor compartment.With respect to work tank, large vol chemistry storage tank allows to keep the flow velocity of liquid product in far distance.Treater 300 also is connected to auxiliary unit 200 (referring to Fig. 4 A) by public solvent supply pipeline 204 and common waste line 114.Treater 300 is only represented the part of whole fabrication tool (not shown), and other parts of instrument are conspicuous for those skilled in the art, and is therefore optional for the complete description of embodiment here.
In operation, integrated system 400 is by the controller (not shown) control with algorithm, and this controller is controlled the connection between a plurality of unit and made integrated system complete.As previously mentioned, a plurality of unit of this system are by various shared members.The controller of any array mode and different units have parts that their are shared, and make the integrated system can be as the modular tool executable operations.This controller can be any with in the consistent various controllers of this instruction, and can be arranged on all places, for example, comprises in divider 10 or the fluid processor 300.If this controller is arranged in the fluid processor 300 of instrument or near, so, interface for users can be set in the divider 10 change storage tank in the divider 10, perhaps mutual with divider 10 or auxiliary unit 200.This controller is suitable for the various subsystem communications with system 400, and its signalling methods makes storage tank to operate independently of each other, as previously mentioned.Perhaps, if use controller separately in instrument and divider, then described controller intercoms mutually, and the instrument that makes knows/understand when change chemical storage tanks, and divider knows when instrument needs precursor.
The part of control algolithm is the algorithm that recharges, and wherein, provides indication and is arranged on precursor work tank 306,310 and solvent day tank 314 in the instrument treater to recharge separately. Female storage tank 14,16 supply precursors of divider 10, the solvent supply storage tank 212 supply process solvents of auxiliary unit 200.For each work tank, recharge by being installed on each work tank or inner suitable liquid level control transmitter startup.For example, the control transmitter can be the low liquid level indicator consistent with other transmitters described here.The pressure difference that flows by between the setting pressure of the setting pressure of female storage tank and each corresponding work tank of recharging is kept, and described setting pressure all is to control automatically.Automatically select needed pressure difference, recharge so that provide fast, simultaneously, the pressure in the work tank can multilated, particularly when chemical products by simultaneously when work tank is drawn into the processing pipeline (and the injected system that enters instrument) of instrument.
When for example high chemical liquid level indicator indication work tank of daily tank level telltale was full of, the process of recharging stopped.For example, day tank sensors comprises internal sensor, for example buoyancy, ultrasonic wave, electric capacity and differential pressure pick-up, and comprise external sensor, for example ultrasonic wave and optical pickocff.Day tank sensors also can be a successive or discrete.
The precursor in female storage tank or the residual volume of solvent are also monitored by controller algorithm.Female storage tank can be monitored continuously or discretely.For example, female storage tank comprises external sensor, for example weighs and ultrasonic transducer.Female storage tank can also comprise internal sensor, for example aforementioned those transmitters.When female tank sensor indication " low liquid level " signal, start storage tank and change process.This process comprise well known to a person skilled in the art and with in those consistent processes of this instruction.
Refuse liquid level in the waste tank 208 is by controller and 209,211 monitoring of waste tank liquid level control transmitter.Waste tank sensor is consistent with the instruction that provides herein.When waste tank sensor indication " high position " level, according to well known to a person skilled in the art and with carry out waste tank in the consistent principle of this instruction and change process.
The embodiment of overabsorption device 10 described here provides a kind of modular, integrated polyvoltine logistics body processor that is used for to target processing instrument multiple precursor without interruption.As shown in here, divider 10 can also combine with other modules being provided for storing and to the system that the fluid processor of instrument is carried precursor, thereby the worker prodigiosin successfully and continuously receives the sedimentary multiple precursor that is used for polyvoltine compound layer casting die.
Top discussion is used for illustration principle of the present invention and various embodiment.Although shown and described the preferred embodiments of the present invention and using method thereof, those skilled in the art can make amendment to it under the situation that does not break away from instruction of the present invention.Embodiment described here only is exemplary, rather than is used for restriction.A lot of variants and modifications of the present invention disclosed herein and apparatus and method all are possible, and all within the scope of the present invention.Correspondingly, protection domain is not limited to top description, but is only limited by the appended claim in back, and described scope comprises all equivalents of the theme of claim.
Claims (38)
1. one kind is distributed the device of multiple precursor to fabrication tool, comprising:
Fluid manifold with the sub-manifold of a plurality of interconnection;
A plurality of storage tanks, each storage tank holds different precursors; And
Wherein, each described sub-manifold is connected to one of them described storage tank.
2. device according to claim 1 is characterized in that, described fluid manifold also comprises the sub-manifold of precursor on each that is connected in described a plurality of storage tank, the sub-manifold interconnect of described precursor.
3. device according to claim 2 is characterized in that, the sub-manifold of described precursor is by sharing any one interconnection at least in solvent supply pipeline and the shared waste line.
4. device according to claim 2 is characterized in that, described fluid manifold also comprises the sub-manifold of pressurization gas on each that is connected in the sub-manifold of described precursor, the sub-manifold interconnect of described pressurization gas.
5. device according to claim 4 is characterized in that, the sub-manifold of described pressurization gas is by public at least draft tube liner interconnection.
6. device according to claim 2 is characterized in that, described fluid manifold also comprises the sub-manifold of single pressurization gas on each that is connected in the sub-manifold of described precursor.
7. device according to claim 1 is characterized in that, described a plurality of storage tanks comprise significantly the source container greater than the quantitative pot tube of the fluid processor of fabrication tool.
8. device according to claim 1 is characterized in that described device also comprises auxiliary unit, and this auxiliary unit comprises:
Receive the waste tank of refuse from the sub-manifold of described interconnection; And
Solvent tank to the sub-manifold supply of described interconnection solvent.
9. device according to claim 8, it is characterized in that, described waste tank also receives refuse by the waste line shared with the sub-manifold of described interconnection from the fluid processor of fabrication tool, described solvent tank also by the solvent supply pipeline shared with the sub-manifold of described interconnection to described fluid processor supply solvent.
10. device according to claim 1 is characterized in that each in the described storage tank includes at least one liquid level sensor.
11. device according to claim 10 is characterized in that, each in the described storage tank includes a plurality of liquid level sensors, and this liquid level sensor comprises low sensors, low Low Level transmitter and high position sensor.
12. device according to claim 1 is characterized in that, described device also comprise with described fluid manifold and described a plurality of storage tank in each controller in communication.
13. device according to claim 12 is characterized in that, described controller and sub-manifold are communicated by letter with in the storage tank combination each, make each described storage tank all can be independent of any other described storage tank operation.
14. a method of distributing multiple precursor to fabrication tool comprises:
Fluid manifold and a plurality of storage tank are provided, and each storage tank holds different precursors, and wherein, described fluid manifold also comprises the sub-manifold of a plurality of interconnection, and each described sub-manifold is connected to one of them described storage tank;
Low precursor liquid level in the fluid processor of detection fabrication tool; And
Be independent of any other described storage tank and from one of them described storage tank, distribute precursor.
15. method according to claim 14 is characterized in that, described method also comprises by sharing pipeline discharges fluid from the sub-manifold of described interconnection.
16. method according to claim 14 is characterized in that, described method also comprises by sharing supply line to the sub-manifold accommodating fluid of described interconnection.
17. method according to claim 15 is characterized in that, described method also comprises:
Waste gas is sent to shared draft tube liner from the sub-manifold of a plurality of interconnection pressurization gas; And
By sharing waste line waste liquid is sent to auxiliary unit from the sub-manifold of a plurality of interconnection precursors.
18. method according to claim 16 is characterized in that, described method also comprises by sharing solvent line solvent is fed to the sub-manifold of a plurality of interconnection precursors from auxiliary unit.
19. method according to claim 14 is characterized in that, described method also comprises by sharing waste line refuse is sent to auxiliary unit from fluid processor to the described fluid manifold of described fabrication tool.
20. method according to claim 19 is characterized in that, described method also comprises the high liquid level that detects described refuse and changes waste tank.
21. method according to claim 14 is characterized in that, described method also comprises by sharing solvent line solvent is fed to the fluid processor of described fluid manifold and described fabrication tool any from auxiliary unit.
22. method according to claim 14 is characterized in that, described method also comprise detect in the described storage tank at least one low liquid level and change described low liquid level storage tank.
23. method according to claim 22 is characterized in that, described method also is included in to be changed before the described low liquid level storage tank, uses the sub-manifold from the described low liquid level storage tank of the solvent washing of auxiliary unit.
24. method according to claim 14 is characterized in that, described method also comprises described fluid manifold of stepless control and described storage tank, so that supply described multiple different precursor to the fluid processor of described fabrication tool.
25. one kind is distributed the system of multiple precursor to fabrication tool, comprising:
Many precursor dispenser with fluid manifold and a plurality of storage tanks, each storage tank are held different precursors and are connected to the different sub-manifold of described fluid manifold, described sub-manifold interconnect;
Have the fabrication tool fluid processor of a plurality of jars of tubes, each jar tube holds different precursors;
Wherein, the first divider storage tank is communicated with the first Tool pot tube with same precursor; And
Wherein, the second divider storage tank is communicated with the second Tool pot tube with same precursor.
26. system according to claim 25 is characterized in that, described sub-manifold is by sharing draft tube liner, sharing any interconnection in waste line and the shared solvent line.
27. system according to claim 25 is characterized in that, described system also comprises:
Be connected to the first sub-manifold of described first divider storage tank and shared waste line;
Be connected to the second sub-manifold of described second divider storage tank and described shared waste line; And
Wherein, the described first and second sub-manifolds are sent to described divider storage tank with pressurization gas, receive the precursor from described divider storage tank, and refuse is sent to described shared waste line.
28. system according to claim 27 is characterized in that, described system also comprises the shared solvent line that is connected on the described first and second sub-manifolds.
29. system according to claim 27 is characterized in that, described system also comprises each the sub-manifold of pressurization gas that is connected in the described first and second sub-manifolds, and the sub-manifold of described pressurization gas is by sharing the draft tube liner interconnection.
30. system according to claim 25 is characterized in that, described system also comprises auxiliary unit, and this auxiliary unit comprises with in the lower device any one:
Waste tank, this waste tank receives refuse by the waste line of sharing with the sub-manifold of described interconnection from described divider and described fabrication tool fluid processor; And
Solvent tank, this solvent tank by the solvent line shared with the sub-manifold of described interconnection to described divider and described fabrication tool fluid processor supply solvent.
31. system according to claim 25 is characterized in that, described system also comprises:
At least one liquid level sensor on all described storage tanks; And
With all described sensor communications so that be independent of the controller that any other described storage tanks are handled each described storage tank.
32. a method of distributing multiple precursor to fabrication tool comprises:
Fabrication tool is provided, and this fabrication tool comprises the fluid processor with a plurality of precursor canister;
The many precursor dispenser that are connected to described fabrication tool are provided, and described divider comprises fluid manifold and a plurality of storage tank with the sub-manifold of interconnection;
Detect the low precursor liquid level in the fabrication tool;
Distribute first precursor from described divider to described fabrication tool; And
Distribute second precursor from described divider to described fabrication tool.
33. method according to claim 32 is characterized in that, described method also comprises:
, and be independent of any other precursor ground and distribute each precursor to the multiple precursor of described fabrication tool continuous dispensing from described divider.
34. method according to claim 33 is characterized in that, described method also comprises:
From described divider when described fabrication tool distributes first precursor, the storage tank that will hold described second precursor disconnects from described divider; And
Change described storage tank.
35. method according to claim 32 is characterized in that, described method also comprises by sharing pipeline discharges fluid from the sub-manifold of described interconnection.
36. method according to claim 35 is characterized in that, described method also comprises:
Transmit waste gas by sharing draft tube liner from the sub-manifold of a plurality of interconnection pressurization gas; And
By sharing waste line waste liquid is sent to auxiliary unit from sub-manifold of a plurality of interconnection precursors and described fabrication tool.
37. method according to claim 32 is characterized in that, described method also comprises by sharing pipeline to the sub-manifold accommodating fluid of described interconnection.
38., it is characterized in that described method also comprises by sharing the solvent supply pipeline and transmits solvent from auxiliary unit to sub-manifold of a plurality of interconnection precursors and described fabrication tool according to the described method of claim 37.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US76298706P | 2006-01-27 | 2006-01-27 | |
| US60/762,987 | 2006-01-27 | ||
| US11/621,419 | 2007-01-09 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN101389787A true CN101389787A (en) | 2009-03-18 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNA2007800069611A Pending CN101389787A (en) | 2006-01-27 | 2007-01-19 | Multiple precursor dispensing apparatus |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN101389787A (en) |
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2007
- 2007-01-19 CN CNA2007800069611A patent/CN101389787A/en active Pending
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