CN101378107B - Method for forming organic luminous layer of OLED display device - Google Patents
Method for forming organic luminous layer of OLED display device Download PDFInfo
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- CN101378107B CN101378107B CN2008101511460A CN200810151146A CN101378107B CN 101378107 B CN101378107 B CN 101378107B CN 2008101511460 A CN2008101511460 A CN 2008101511460A CN 200810151146 A CN200810151146 A CN 200810151146A CN 101378107 B CN101378107 B CN 101378107B
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Abstract
The invention provides a formation method for organic luminescent layers of OLED displays. One face of an ITO anode on the substrate and a glass-made mask layer are face-to-face attached with each other; a black part and a white part are arranged on the glass-made mask; the black part needs a part which corresponds to the substrate and is evaporated with the luminescent layer, while the white part does not need the part which corresponds to the substrate and is evaporated with the luminescent layer; a condenser lens and an infrared radiation resource are arranged at the lower part of the glass-made mask; the condenser lens leads the light from the light resource converged to form spots which are radiated on the surface of the mask layer; the black part on the surface of the mask absorbs the energy of the spots, thus rising the temperature more quickly; the organic luminescent materials on the surface of the black part are evaporated and settled on the surface of the ITO anode; the white part on the surface of the mask is weak in light absorption, so the organic luminescent materials on the surface of the white part are not evaporated. By leading the spots to scan the whole mask, the film plating of the luminescent layer in the whole area is realized. With high efficiency as well as firm and durable plated film, the formation method for organic luminescent layers of OLED displays can be used in the large-area film plating of the luminescent layers of the OLED displays.
Description
Technical field
The invention belongs to the photoelectric display technical field, be specifically related to a kind of OLED display device organic luminous layer formation method.
Background technology
OLED is a kind of novel display device, the display performance with a lot of excellences, and development is very fast at present.Typical organic light emitting display is OLED, and its OLED device architecture as shown in Figure 1.Glass substrate is provided with the anode that ITO is a tin indium oxide, is coated with one deck organic luminous layer on the ito anode surface, is coated with the negative electrode of low work function again at the organic light emission laminar surface.Apply voltage on anode and negative electrode, holoe carrier is injected luminescent layer from anode, and electronics injects luminescent layer from negative electrode, and holoe carrier and electronics are at the compound generation exciton of luminescent layer, and the exciton de excitation gives off visible light when sending out.The very thin thickness of luminescent layer is generally about tens nm.
Traditional OLED display device organic luminous layer evaporation coating method as shown in Figure 2, glass substrate is placed on the metal shadow mask top, ito anode is relative with metal shadow mask to fit together, metal shadow mask is that a very thin metal film is tightened on the metal framework, thickness of metal film is tens of microns, the part of not perforate and the part of perforate are arranged on the metal film, perforate partly with on the substrate needs the position of evaporation organic luminous layer corresponding, there is crucible the shadow mask below, wherein be placed with luminescent material, to the crucible heating, luminous organic material promptly is evaporated, and the perforate position finally is deposited on the place that needs depositing light emitting layer on the luminous organic material vapour transmission shadow mask.This plated film mode requires the shadow mask metal film need stretch tight very tightly, and the shadow mask mid portion can not have saggingly, otherwise luminous organic material will be deposited on unwanted place through the space between substrate and the metal shadow mask.These characteristics make the area of shadow mask can not do too greatly, and production efficiency is lower, is not suitable for larger-size display, and metallic diaphragm is very thin, clean to be difficult for, and damage easily.
Summary of the invention:
Large-area coating film problem at large scale OLED display device organic luminous layer, the present invention proposes a kind of OLED display device organic luminous layer film plating process, the one side of ito anode is relative with the glass mask on the substrate fits together, the glass mask is provided with black part and white portion, the position of wanting the evaporation luminescent layer on the black part counterpart substrate, do not need the position of evaporation luminescent layer on the white portion counterpart substrate, luminescent material is placed on the upper surface of glass mask.Glass mask below is provided with collector lens, and the collector lens below is placed with infra red radiation light source, also can be with laser as light source.Collector lens pools hot spot with the light that light source sends, shine the glass mask surface, the black of mask surface partially absorbs the energy that shines on it, temperature raises rapidly, make its surperficial organic light emission source material evaporation, be deposited on the surface of ito anode, and the white portion of mask surface because to the absorbability of light relatively a little less than, temperature rising degree is limited, its surperficial luminous organic material can not evaporate, by making hot spot, just can realize the luminescent layer plated film in the Zone Full in the enterprising line scanning of whole mask.The black part is general makes of atraments such as chromium oxide, cuprous oxide, and white portion can use the strong materials of light reflex such as aluminium or silver.
It is big that this luminescent layer film plating process that the present invention proposes has a plated film area, can be used for large-area OLED display device luminescent layer plated film, efficient height, glass mask easy cleaning, advantage such as sturdy and durable.
Description of drawings
Fig. 1 is the OLED structural representation.
Fig. 2 is traditional OLED luminescent layer evaporation schematic diagram.
Fig. 3 is the floor map of metal shadow mask.
Fig. 4 is an OLED luminescent layer film plating process schematic diagram of the present invention.
Fig. 5 is the floor map of the employed mask of OLED of the present invention.
Embodiment
The invention will be further described with reference to the accompanying drawings below:
A kind of organic luminous layer formation method of OLED display device, with ito anode 2 on the substrate 1 and glass mask 11 relative fitting together, luminescent material 9 is placed on the upper surface of glass mask 11, glass mask 11 belows are provided with collector lens 14, collector lens 14 belows are provided with infra red radiation light source 15, collector lens 14 pools hot spot with the light that light source 15 sends, shine the surface of glass mask 11, the black part 12 on mask 11 surfaces absorbs the energy that shines on it, temperature raises rapidly, make its surperficial organic light emission source material 9 evaporations, be deposited on the surface of ito anode 2, and the white portion 13 on mask 11 surfaces because to the absorbability of light a little less than, temperature raises less, its surperficial luminous organic material 9 can not evaporate, and the scanning by hot spot carries out on whole mask 11 just can realize the luminescent layer plated film in the Zone Full.
Described glass mask 11 is provided with black part 12 and white portion 13, and black part 12 is corresponding to the part of wanting the evaporation luminescent layer on the substrate 1, and white portion is corresponding to the part that does not need the evaporation luminescent layer on the substrate 1.
Light source under the described collector lens 14 is an infra red radiation light source 15, perhaps with laser as light source.
Need the part of evaporation luminescent layer corresponding on the described glass mask 11 on black part 12 and the substrate 1, do not need the part of evaporation luminescent layer corresponding on white portion and the substrate 1.
Below the Reference numeral in the accompanying drawing is done an explanation: 1 is glass substrate, 2 is ito anode, 3 is luminescent layer, 4 is negative electrode, 5 is the framework of metal shadow mask, 6 is the part of not perforate of metal shadow mask, 7 is metal shadow mask perforate part, 8 for loading luminescent layer material and to its crucible that heats, and 9 for being loaded in the luminescent material in the crucible 8, and 10 is the luminescent layer material steam that is evaporated, 11 is the mask glass substrate, 12 is the black part on the mask 11, needs the position of evaporation luminescent layer on the corresponding OLED device, and 13 is white portion on the mask 11, the position that does not need the evaporation luminescent layer on the corresponding OLED device, 14 is collector lens, and 15 is the radiation heating light source, and 16 scan the direction of advancing for hot spot on mask.
As shown in Figure 4 and Figure 5, make the mask graph of black and white on glass substrate 11, the material of black graphics part 12 is a chromium oxide, and thickness is 1～2 micron, and white visuals 13 materials are aluminium film, and thickness is 1～2 micron.The part that needs the depositing light-emitting layer material on mask graph black part 12 counterpart substrates 1 does not need the part of depositing light-emitting layer material on white portion 13 counterpart substrates 1.
During plated film, earlier deposit one deck luminous organic material 9 at mask surface comprehensively, thickness is between 100nm～200nm, relative the fitting to together of a side of ito anode 2 will be provided with then on the side that deposit luminescent material 9 on the mask plate 11 and the substrate 1, the mask plate 11 and the substrate 1 that then will fit to together are placed in the vacuum chamber together, and vacuum degree remains on 10 in the vacuum chamber
-5More than the Pa, use the laser beam irradiation mask plate of wavelength then as 1064nm, utilize collector lens 14 beam focus to be accumulated on the plane of black graphics part 12 of mask plate, black material absorbing light beam energy, temperature is increased to the fusing point of luminescent material 9 or more than the boiling point, make its distillation or evaporation, finally be deposited on the surface of ito anode, the degree that the black portion temperature raises is determined by the kind difference of luminescent material, can regulate the black portion temperature by size of regulating beam focus and the speed that light beam moves.Do not need the white portion 13 on the corresponding mask plate 11 of part of evaporation luminescent material on the substrate 1, this a part of material is strong to the albedo of light beam, beam energy is absorbed few, and temperature raises few, and distillation or evaporation can not take place luminescent material.Therefore substrate 1 surface does not need the part of depositing light-emitting material not have the luminescent material deposition.By laser beam is scanned on the mask plate surface comprehensively, promptly can be implemented in the deposition that comprehensive luminous organic material rete is carried out on substrate 1 surface.
Claims (4)
1. OLED display device organic luminous layer formation method is characterized in that:
Substrate (1) is gone up ito anode (2) and relative the fitting together of glass mask (11), luminescent material (9) is arranged on the upper surface of glass mask (11), glass mask (11) below is provided with collector lens (14), collector lens (14) below is provided with infra red radiation light source (15), collector lens (14) pools hot spot with the light that light source (15) sends, shine the glass mask surface, the black part (12) on mask (11) surface absorbs the energy that shines on it, temperature is elevated on the luminous organic material fusing point, make its surperficial organic light emission source material (9) evaporation, be deposited on the surface of ito anode (2), the white portion (13) on mask (11) surface with respect to the black part to the absorbability of light a little less than, the amount that temperature raises is less than black part (12), adjust the power of illumination beam, make the fusing point of white portion (13) temperature less than luminous organic material (9), its surperficial luminous organic material (9) can not evaporate, make hot spot in the enterprising line scanning of whole mask (11), just can realize the luminescent layer plated film in the Zone Full.
2. OLED display device organic luminous layer formation method according to claim 1, it is characterized in that: the white portion of setting is gone up corresponding to the position that does not need the evaporation luminescent layer on the substrate (1) in the position that the black part (12) that described glass mask (11) upward is provided with goes up luminescent layer to be deposited corresponding to substrate (1), described glass mask (11).
3. OLED display device organic luminous layer formation method according to claim 1, it is characterized in that: the light source under the described collector lens (14) is infra red radiation light source (15), or with laser as light source.
4. OLED display device organic luminous layer formation method according to claim 2, it is characterized in that: described glass mask (11) is gone up black part (12) for constituting with chromium oxide or cuprous oxide atrament, and white portion (13) constitutes for using the strong material of aluminium or silver-colored light reflex.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
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| CN2008101511460A CN101378107B (en) | 2008-09-27 | 2008-09-27 | Method for forming organic luminous layer of OLED display device |
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| Application Number | Priority Date | Filing Date | Title |
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| CN2008101511460A CN101378107B (en) | 2008-09-27 | 2008-09-27 | Method for forming organic luminous layer of OLED display device |
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| CN101378107A CN101378107A (en) | 2009-03-04 |
| CN101378107B true CN101378107B (en) | 2010-08-11 |
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Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
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| KR101695293B1 (en) * | 2010-10-04 | 2017-01-16 | 엘지디스플레이 주식회사 | Laser pattern mask and method for fabrication the same |
| CN102021517A (en) * | 2010-10-29 | 2011-04-20 | 陕西科技大学 | Screen mesh type evaporating source in OLED preparing process and evaporating method |
| CN106978598B (en) * | 2017-04-11 | 2019-03-05 | 京东方科技集团股份有限公司 | Monitoring device and method and film vapor deposition device and method is deposited |
| CN110692147A (en) * | 2017-12-13 | 2020-01-14 | 深圳市柔宇科技有限公司 | Mask plate for vacuum evaporation, evaporation method, display device and evaporation equipment |
| CN108598132A (en) * | 2018-05-23 | 2018-09-28 | 京东方科技集团股份有限公司 | The production method of display base plate, the production method of mask plate, display device |
| US10923687B2 (en) | 2018-11-28 | 2021-02-16 | Wuhan China Star Optoelectronics Semiconductor Display Technology Co., Ltd. | Manufacturing method of display panel and display panel |
| CN109560196B (en) * | 2018-11-28 | 2020-08-04 | 武汉华星光电半导体显示技术有限公司 | Preparation method of display panel and display panel |
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