CN101316791A - System and method for producing carbon nanotubes - Google Patents

System and method for producing carbon nanotubes Download PDF

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Publication number
CN101316791A
CN101316791A CNA2006800445827A CN200680044582A CN101316791A CN 101316791 A CN101316791 A CN 101316791A CN A2006800445827 A CNA2006800445827 A CN A2006800445827A CN 200680044582 A CN200680044582 A CN 200680044582A CN 101316791 A CN101316791 A CN 101316791A
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Prior art keywords
synthetic substrate
reative cell
substrate
catalyst
synthetic
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CNA2006800445827A
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Chinese (zh)
Inventor
金成洙
黄湖水
金泂硕
张硕元
崔硕珉
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Semes Co Ltd
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Semes Co Ltd
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    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00—Carbon; Compounds thereof
    • C01B32/15—Nano-sized carbon materials
    • C01B32/158—Carbon nanotubes
    • C01B32/16—Preparation
    • C01B32/164—Preparation involving continuous processes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82B—NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS; MANUFACTURE OR TREATMENT THEREOF
    • B82B3/00—Manufacture or treatment of nanostructures by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
    • B82B3/0004—Apparatus specially adapted for the manufacture or treatment of nanostructural devices or systems or methods for manufacturing the same
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00—Carbon; Compounds thereof
    • C01B32/15—Nano-sized carbon materials
    • C01B32/158—Carbon nanotubes
    • C01B32/16—Preparation
    • C01B32/162—Preparation characterised by catalysts

Abstract

A system for producing carbon nanotubes includes a reaction chamber in which a process is performed for producing a carbon nanotube on a synthetic substrate; a station part disposed at one side of the reaction chamber and provided with a first transporter for loading/unloading the synthetic substrate to/from the reaction chamber; a first transporter installed inside the station part for loading/unloading synthetic substrates to/from the reaction chamber; a substrate accommodating part in which a substrate to be loaded to the reaction chamber is accommodated or a synthetic substrate unloaded from the reaction chamber waits; a retrieve part for drawing out a synthetic substrate from the substrate accommodating part to retrieve a carbon nanotube produced on the synthetic substrate; a catalyst coating unit configured for coating a synthetic substrate with a catalyst before the synthetic substrate is accommodated in the substrate accommodating part of the station part; and a second transporter for transporting a synthetic substrate between the retrieve part and the substrate accommodating part and between the catalyst coating unit and the substrate accommodating part.

Description

Be used to produce the system and method for CNT
Technical field
The present invention relates to be used to produce the system and method for CNT.
Background technology
The hollow cylinder of CNT for constituting by carbon atom.Their outward appearance is the shape of the coiling pipe that is made of graphite, and their wall is hexagonal carbocyclic ring like this, and they form with the form of big bundle usually.
Owing to have and corresponding metallic conductivity of structure and semiconductor electric conductivity, the carbon current nanotube is the best candidate that is applied to the multiple technologies fields such as electrode (for example, battery or ultracapacitor), electro-magnetic shielding cover, Field Emission Display or gas sensor such as the electrochemistry storage facility.
Summary of the invention
Technical problem
Usually since comprise to/from the step of the synthetic substrate of reaction tube load/unload CNT and from reaction tube unloading substrate with most of production stage of the step of therefrom regaining CNT still by manual control, the output of CNT (CNTs) is very little.Therefore, be difficult to carry out continuous technology and large-scale production.
Technical scheme
Exemplary embodiment of the present invention relates to a kind of system that is used to produce CNT.In one exemplary embodiment, this system can be included in and wherein be implemented in the reative cell of producing the technology of CNT in the synthetic substrate; Be arranged in a side of described reative cell and be provided be used for to/from the station part of first conveyer of the synthetic substrate of described reative cell load/unload; And hold the synthetic substrate that to be loaded onto the substrate of reative cell or from reative cell, to unload substrate holding portion therein in this wait.
In another exemplary embodiment, this system can be included in and wherein be implemented in the reative cell of producing the technology of CNT in the synthetic substrate; Be arranged in a side of described reative cell and have be used for to/from the station part of first conveyer of the synthetic substrate of reative cell load/unload; Be installed in the described station part be used for to/from first conveyer of the synthetic substrate of reative cell load/unload; Hold the synthetic substrate that to be loaded onto the substrate of reative cell or from reative cell, to unload substrate holding portion therein in this wait; Be used for extracting the withdrawal part of synthetic substrate out with the CNT that is retracted in synthetic substrate and produces from the substrate holding portion; The catalyst-coated unit that is synthesizing coated catalysts in the substrate before being configured in synthetic substrate is contained in station substrate holding portion partly; Be used for regaining between part and the substrate holding portion and second conveyer of carrying synthetic substrate between catalyst-coated unit and the substrate holding portion.
Exemplary embodiment of the present invention also relates to a kind of method that is used to produce CNT.In one exemplary embodiment, this method can comprise and utilizes catalyst-coated to synthesize substrate; The substrate that is coated with catalyst is loaded in the reative cell; Supply source gas in the reative cell, with synthesizing carbon nanotubes and synthetic substrate; The substrate of handling is unloaded from reative cell; The synthetic substrate of cooling unloading below predetermined temperature; And from cooled synthetic substrate withdrawal CNT.
Beneficial effect
By above description as can be known, the present invention has the following advantages: (1) can automatically produce CNT; (2) can produce CNT on a large scale; (3) because the technology in the reative cell is kept continuously, and the CNT of therefore synthetic substrate is synthesized continuously, to improve system's operating rate; (4) catalyst is automatically accurately supplied with, to improve reliability of technology; And (5) CNT automatically regained, with calculated productivity accurately.
Description of drawings
Fig. 1 shows according to the present invention and is used to utilize reative cell to produce the system of CNT;
Fig. 2 shows the cooling pipeline that is configured for cooling off the O type ring that is installed in the reative cell place;
Fig. 3 shows the heating unit that is configured for heating reaction tube;
Fig. 4 illustrates the profile that support frame is installed in an example of reative cell wherein;
Fig. 5 illustrates the profile that support frame is installed in another example of reative cell wherein;
Fig. 6 is the structural map of the catalyst-coated unit shown in Fig. 1;
Fig. 7 is the top plan view along the section of the intercepting of the line A-A ' among Fig. 6;
Fig. 8 to Figure 10 shows the catalyst-coated step at place, catalyst-coated unit;
Figure 11 is the top plan view of the substrate holding portion shown in Fig. 1 and first conveyer;
Figure 12 is the side view of substrate holding portion;
Figure 13 is the perspective view of first conveyer;
Figure 14 is the perspective view of the casing of substrate holding portion;
Figure 15 shows the cooling component that is configured for cooling off the arm shown in Figure 14;
Figure 16 is the perspective view of the blade shown in Figure 15 (or blade);
Figure 17 to Figure 19 shows the different embodiment of the projection that forms on blade;
Figure 20 is a perspective view of regaining part;
Figure 21 is the top plan view of the withdrawal part shown in Figure 20;
Figure 22 shows and is regaining the step that the part place regains CNT;
Figure 23 illustrates to utilize a system to produce the flow chart of the step of CNT.
The specific embodiment
Below with reference to accompanying drawings the present invention is described in more detail, wherein, in these accompanying drawings, has shown the preferred embodiments of the present invention.But the present invention can implement by multiple different form, and not should be understood to be confined to embodiment given here.On the contrary, these embodiment are provided, and with for the content that exposes will be comprehensive and complete, and will fully scope of the present invention be conveyed to those skilled in the art.In the accompanying drawings, for clarity sake, the thickness in some layers and zone is exaggerated.In whole specification, identical Reference numeral is represented components identical.
An example of system 1 that is used to produce CNT is shown in Figure 1.This system 1 comprises synthetic substrate 10, reative cell 100 and in advance/subsequent treatment chamber.
Synthetic substrate 10 is used as the wherein substrate of synthesizing carbon nanotubes (CNT).The synthetic substrate of CNT can be silicon wafer, indium tin oxide (ITO) substrate, the glass that is coated with ITO, soda-lime glass, healthy and free from worry (heat-resisting) glass or aluminium oxide.But,, also can adopt other material as long as it has enough big intensity with synthetic (growth is produced) CNT.
Reative cell 100 is provided, to be implemented in the technology of producing CNT in the synthetic substrate 10.In advance/the subsequent treatment chamber is provided, with implement to be used for synthetic substrate to/anticipate technology and subsequent treatment process from reative cell 100 load/unloads.Anticipate technology and subsequent treatment process and comprise the technology (process) that catalyst 20 is coated in synthetic suprabasil technology and is retracted in the CNT that forms in the synthetic substrate.In advance/the subsequent treatment chamber comprises station part 200, first conveyer 300, substrate holding portion 400, catalyst-coated unit 500, regains the part 600 and second conveyer 700.
Station part 200 is provided, and is exposed to the air from the synthetic substrate of reative cell 100 unloading preventing.First conveyer 300 to/from the synthetic substrate of reative cell 100 load/unloads.Substrate holding portion 400 is provided, with hold to/from the synthetic substrate of reative cell 100 load/unloads.Catalyst-coated unit 500 is provided, before being loaded onto on the reative cell 100 in synthetic substrate 20 catalyst 20 is coated in the synthetic substrate 20.Regain part 600 and be provided, to regain CNT from synthetic substrate 10, wherein this CNT produces in the synthetic substrate 10 of unloading from reative cell 100.Second conveyer 700 is at substrate holding portion 400 and catalyst-coated unit 500 and substrate holding portion 400 and regain the synthetic substrate 10 of conveying between the part 600.
In one exemplary embodiment, station part 200 is with reative cell 100 and put.Station part 200 has the first area 240 that is arranged to contiguous reative cell 100 and is arranged to the second area 260 relative with first area 240.Substrate holding portion 400 is arranged in the first area 240, and first conveyer 300 is arranged in the second area 260.Reative cell 100 and second area 260 are in line and arrange (conllinear).First area 240 has top area 242 and bottom section 244.Top area 242 is in line with reative cell 100 and second area 260 and arranges (conllinear).Bottom section 244 extends from top area 244 along the first direction 44 vertical with second direction 42.First area 240 and second area 260 have rectangular shape respectively.Because said structure, station part 200 have on the whole "
Figure A20068004458200111
" shape of shape.Catalyst-coated unit 500, regain that part 600 and second conveyer 700 are arranged to contiguous station part 200 and on the basis of the top area 242 of first area 240 along the direction parallel with second area direction 42 in the position relative and put with bottom section 244.Second conveyer 700 is arranged in the position relative with the first area 240 of station part 200.In addition, second conveyer 700 is clamped in catalyst-coated unit 500 and regains between the part 600.Different with aforementioned content, the layout of the shape of station part 200 and station part 200, first conveyer 700, catalyst-coated unit 500, withdrawal part 600 can be carried out different modifications.
To the element according to system of the present invention be described in detail below.
With reference to Fig. 1, reative cell 100 comprises reaction tube 120, first and second flanges 132 and 134, heating unit 140, cooling component 150, boat 160.Reaction tube 120 is made by the heat proof material of for example quartz or graphite.Usually, reaction tube 120 has cylindrical shape.In a kind of technology, reative cell 120 can remain in 500 degrees centigrade-1000 degrees centigrade the temperature range by heating unit 140.
First flange 132 is a disk-shaped flange, and its front end with reative cell 120 is connected.Second flange 134 is connected with the rear end of reative cell 120.Gas supply member 180 links to each other with first flange 132, supplies source gas in the reaction tube 120 being used to.Gas supply member 180 comprises gas supply source 182, gas supply pipe 184 and heating unit 186.Gas supply pipe 184 is connected with first flange 132, and source gas is supplied in the reaction tube 120 from gas supply source 182.Source gas can be at least a gas of selecting from the group that is made of acetylene, ethene, methane, benzene, dimethylbenzene, carbon monoxide and carbon dioxide.Valve 184a is installed on the gas supply pipe 184, with the flow velocity (flow) of the internal path that is used for switching gas supply pipe 184 or control source gas.Heating unit 186 is installed on the gas supply pipe 184, before being used in supplying source gas into reaction tube 120 source gas is heated to given temperature.Because heating unit 186, the required time of source gas in the activating reaction pipe 120 can be reduced.Like this, the entire process time can be reduced.After being activated by pyrolytic, source gas and the catalyst reaction that is coated in the synthetic substrate 10 are to produce CNT.Exhaust line 189 is connected with second flange 134, to be used to discharge the gas that residues in the reaction tube 120 after reaction.
Containment member 132a and 134a are installed in the contact surface place of contact surface and second flange 134 and the reaction tube 120 of first flange 132 and reaction tube 120 respectively, with inside and the extraneous seal isolation with sealed reaction tube 120.Among containment member 132a and the 134a each can be cooled off for O type ring and by cooling component.Cooling component comprises cooling pipeline 152, cooling water supply pipe 156 and sensor 158.Cooling pipeline 152 forms in first and second flanges 132,134.Cooling fluid flows along cooling pipeline 152.Cooling fluid is a cooling water.Alternatively, cooling fluid can be inert gas.Water quench containment member 132a and 134a along cooling pipeline 152 flows are damaged by the heat of reaction tube 120 inside to prevent containment member 132a and 134a.
With reference to Fig. 2, cooling water supply pipe 156 is connected with cooling pipeline 152 with cooling water recurrent canal (not shown).Valve 156a is installed on the cooling water supply pipe 156, the flow velocity of the cooling water that flows along internal path with the internal path that is used for switch cooling water supply pipe 156 or control.Sensor 158 is installed on the cooling water supply pipe 156, to be used to measure flow velocity or the temperature along the mobile cooling water of the internal path of cooling water supply pipe 156.The signal that sensor 158 is measured is transported to controller 159, with the control whole system.Controller 159 is analyzed the signal of carrying from sensor 158.When analysis result is the flow velocity of cooling water or temperature when not being in the given range in preset time, controller 159 suspends these systems or by display or alarm song this fact is notified to the user.Even this makes cooling water temporarily not flow by cooling water supply pipe 156 with given flow velocity or given temperature, containment member 132a and 134a also can implement a technology continuously in the preset time section.Be required time and definite when having considered to make when cooling water can not continue to supply with reposefully containment member 132a and 134a to work preset time above-mentioned.
Heating unit 140 is with an inside of handling (technology) temperature heating reaction tube 120.Heating unit 140 is installed into the outer wall that surrounds reaction tube 120.Heating reaction tube 120 can be finished by heater coil or heating lamp.
Fig. 3 shows the reative cell 100 that comprises heating unit 140 according to one exemplary embodiment of the present invention.For ease of describing, first and second flanges 132 in the contiguous reaction tube 120 and 134 zone are known as fringe region 122a and 122b respectively.In addition, the zone between fringe region 122a and the 122b is known as central area 124.When the whole zone of reaction tube 120 was heated by a heating unit, the heating-up temperature of fringe region 122a and 122b was lower than the temperature of central area 124.This is because fringe region 122a and 122b are subjected to being installed in the influence of the cooling pipeline 152 at flange 132 and 134 places.Therefore, because synthetic substrate must only offer the central area 124 of reaction tube 120 so that implement the technology of synthetic substrate 10 under identical temperature, reaction tube 120 is long.
As shown in Figure 3, heating unit 140 comprises edge heater 142, central heater 144 and heater controller 146.Edge heater 142 heating fringe region 122a and 122b, central heater 144 heated center region 124.Heater controller 146 is control centre's heater 144 and edge heater 142 independently.Edge heater 142 is with the temperature heating reaction tube 120 higher than central heater 144, thereby makes identical temperature is provided in reaction tube 120.Edge heater 142 comprises the primary heater 142a of the fringe region 122a that is used to add thermal proximity first flange 132 and is used to add the secondary heater 142b of the fringe region 122b of thermal proximity second flange 134, and this is favourable for the situation that has temperature difference between the fringe region 122a of reaction tube 120 and 122b.In this case, heater controller 146 is controlled primary heater 142a and secondary heater 142b independently.
At least one boat 160 can be provided for the inside of reaction tube 120.Boat 160 has enough sizes, so that a plurality of synthetic substrate 10 can be loaded on the boat 160 along the length direction (second direction 42 above-mentioned) of reaction tube 120.Alternatively, boat 160 can be dimensioned and be configured to vertically and deasil to support a plurality of synthetic substrates 10.For example, boat 160 is dimensioned and is configured to longitudinally to support two synthetic substrates 10, and deasil supports two synthetic substrates 10.These boats 160 can be provided, to install regularly or load/unload in reaction tube 120.
Replacedly, boat 160 can be dimensioned, to support a synthetic substrate 10.In the case, can provide at least one boat 160.Under the situation that a plurality of boats 160 are provided, they are arranged or can be stacked along the direction vertical with first direction 42 along the length direction (second direction 42 above-mentioned) of reaction tube 120.
Alternatively, support frame 160 ' can be installed in the inside of reaction tube 120 rather than boat 160.Synthetic substrate 10 is loaded onto on the support frame 160 '.Fig. 4 and Fig. 5 are respectively the profile of the reaction tube 120 that support frame 160 ' is installed therein.With reference to Fig. 4, support frame 160 ' comprises that two are set to inwall along the length direction of reaction tube 120 from reaction tube 120 to the inwardly outstanding frameworks 162 and 164 of reaction tube 120.First and second frameworks 162 and 164 are relatively arranged respectively, to support the edge of synthetic substrate 10.Guiding projection 162a that projects upwards and 164a are provided for the end of first and second frameworks 162 and 164 respectively, stably to support synthetic substrate 10.Outstanding downwards joint (hook) 10a can be provided, to connect (hook) on guiding projection 162a and 164a.
First framework 162 and second framework 164 can long enoughs, load a plurality of synthetic substrates thereon with the length direction along reaction tube 120.One or more support frames 160 ' can be configured to separate each other along the vertical direction.Be configured to have under the situation of circular section at reaction tube 120, two support frames 160 ' can be installed up and down.Alternatively, by the support frame 160 ' with central part wideer than the edge is provided, can provide three support frames at least.Replacedly, as shown in Figure 5, reaction tube 140a can be configured to have rectangular section, and the support frame 160 ' of a plurality of stacked (stacked) can be provided.
In this embodiment, described the reative cell 100 that adopts the pyrolytic of hydrocarbon, wherein hydrocarbon is thermal decomposited, to produce CNT 30.But this only is exemplary, and employing laser deposition, plasma activated chemical vapour deposition (plasma CVD), heat chemistry CVD, framework synthesize and the differential responses chamber of arc discharge also can be used.
Get back to Fig. 1, station part 200 comprises the chamber 200a with external isolation.First gate valve 222 is installed between station part 200 and the reative cell 100, synthesizes substrate 10 along its path that moves with switch.Second gate valve 224 is installed between the station part 200 and second conveyer 700, synthesizes substrate 10 along its path that moves with switch.
Gas supply member 280 is installed on the station part 200, to be used for supplying with inert gas, for example nitrogen and argon gas in station part 200.Inert gas is supplied to, and remains in the inert gas atmosphere with the air (particularly oxygen) in the removal station part 200 with the inside of station part 200.This makes and can prevent to be exposed to the oxygen when synthesizing the pyrocarbon nanotube 30 that produces in synthetic substrate 10 when the reative cell 100 of substrate 10 from station part 200 inside unloads.Gas supply part divides 280 to be provided for the first area 240 that substrate holding portion 400 is installed therein.
Be arranged under the situation of contiguous reative cell 100 at first gate valve 222, it may be owing to the radiant heat that produces in the reative cell 100 is compromised.Therefore, reative cell 100 has enough length, is compromised to prevent first gate valve 222, and this allows the difference between the heating unit 140 and first gate valve 222 to be kept fully.Yet the enough big length of reative cell 100 causes scaling up of system 1.
In this embodiment, heat shield member 180 is installed between first gate valve 222 and the reative cell 100, is subjected to photothermal infringement with first gate valve 222 that scales up and prevent that is used for inhibition system 1.The heat that heat shield member 190 shieldings are carried from reative cell 100.Heat shield member 190 comprises that the low-thermal conductivity barricade 192 of aluminium oxide for example is used to drive the driver 194 of barricade 192.Replacedly, barricade 192 can be made of typical metal.In the case, the cooling component (not shown) can be configured to prevent that barricade 192 is subjected to the infringement of the heat in the reative cell 120 and improves shield effectiveness.
Except first gate valve 222, barricade 190 is arranged in the front of first gate valve, is subjected to the infringement of heat to prevent first gate valve 222.When first gate valve 222 was opened, barricade 190 moved to the position of the progress path that does not stop synthetic substrate 10.
Before synthetic substrate 10 was loaded onto on the reative cell 160, catalyst (metal level) 20 was applied on the reative cell 160 from catalyst-coated unit 500.Fig. 6 shows the structure in the catalyst-coated unit 500 shown in Fig. 1, and Fig. 7 is the top plan view along the section of the intercepting of the line A-A ' among Fig. 6.
With reference to Fig. 6 and Fig. 7, catalyst-coated unit 500 comprises catalyst storage tank (funnel) 520, weight feed part 560, brush unit 580 and stand 590.In a technical process, synthetic substrate 10 is loaded onto on the stand 590.Catalyst storage tank 520 is arranged on the stand 590 and has and is configured to delivery outlet 526a that the catalyst 20 of specified rate (predetermined amount) is supplied with to the top surface of synthetic substrate 10.Brush unit 580 brushes are wiped the catalyst 20 of the top surface that offers synthetic substrate 10, so that catalyst 20 has homogeneous thickness on the top surface of synthetic substrate 10.
Stand 590 comprises with the intervals of rule so that synthetic substrate 10 location and the side plate 592 that faces with each other and a plurality ofly be mounted to towards the inwardly outstanding of separately side plate 592 and support the supporting projections 594 at the edge of synthetic substrate 10.A plurality of supporting projections 594 can be installed on separately the side plate 592.
Brush unit 580 comprises guide rail 584, applies brush 587 and movable body 588.Guide rail 584 is vertically installed in the both sides that synthetic substrate 10 is loaded onto the stand 590 on it.Movable body 588 is installed to movably on the guide rail 584 and by linearly moving driver 586 linearities and moves.The linearity of movable body 588 moves the driving method that adopts routine, and for example linear motor driven method, cylinder driving method and motor driving method are finished.Apply brush 587 and be arranged on the stand 590, wipe catalyst to be used for brush, thereby make catalyst on the whole surface of synthetic substrate 10, have homogeneous thickness.Link to each other with movable body 587 owing to apply the two ends of brush 587, apply brush 587 and move slidably with movable body 588.Applying brush 587 can be metal or the non-metal board that has specific inclined side with respect to direction of advance.
Apply brush 587 and move up and down, thereby can regulate the height that applies brush 587 by vertical motion unit 589.This makes the thickness that supplies to the catalyst 20 on the top surface that synthesizes substrate 10 to be conditioned.Vertical motion unit 589 comprises the top board 589a fixedly connected with the top surface of movable body 588, fixedly connected with base plate 589b and vertical the layout to be connected the axis of guide 589c of top board 589a and base plate 589b in the face of top board 589a with the basal surface of movable body 588.Carriage 589d is installed on the axis of guide 589c.Carriage 589d moves up and down along axis of guide 589c linearly by the driver (not shown).Applying brush 587 is fixedly installed on the carriage 589d.
Catalyst storage tank 520 supplies to the catalyst of storing 20 in the synthetic substrate 10.Catalyst storage tank 520 has top surface 522, side surface 524 and forms the basal surface 526 of delivery outlet 526a thereon.Side surface 524 comprise approximate vertical top 524a, extend downwards and aduncate middle part 524b and the bottom 524c that roughly vertically extends from middle part 524b from top 524a.Because said structure, the amount of the catalyst in the space that the amount that is stored in the catalyst 20 in the space that is limited by top 524a limits than the bottom 524c that is stored in by equal height is big.The shape of middle part 524b makes the catalyst 20 that is stored in the space that is limited by top 524a supply to reposefully in the space that is limited by bottom 524c.
Weight feed part 560 is installed on the catalyst storage tank 520, to be used for quantitative catalyst 20 is supplied to the top surface of synthetic substrate 10.Dosing unit 560 comprises and is configured to limit top shield plate 564 and the bottom shield plate 562 that quantitative catalyst 20 is dumped into quantity space wherein.Top and bottom shield plate 564 and 562 are provided for bottom 524c.Quantity space 568 is arranged on the delivery outlet 526a of catalyst storage tank 520.Top shield plate 564 is arranged on the top of quantity space 568, and bottom shield plate 562 is provided with thereunder.Top and bottom shield plate 564 and 562 are by drive unit, 566 operations of for example cylinder.When top shield plate 564 closed that simultaneously bottom shield plate 562 is closed, quantity space 568 was limited and is full of the catalyst 20 of specified rate again between bottom and top shield plate 562 and 564.
When bottom shield plate 562 was opened, the catalyst 20 that is poured onto in the quantity space 568 was fed on the top surface of synthetic substrate 10 by delivery outlet 526a.Agitator 540 is installed to the middle part 542b of catalyst storage tank 520, to be used to stir catalyst 20.The agitator 542 of agitator 540 rotated before catalyst 20 is supplied to quantity space 568, thereby had eliminated the vacant space in the catalyst storage tank 520 and catalyst 20 is supplied in the quantity space 568 naturally.
With reference to Fig. 8 to Figure 10 the catalyst-coated step of catalyst-coated unit 500 is described below.When synthetic substrate 10 was loaded onto on the stand 590 by second conveyer 700, bottom shield plate 562 was by cylinder 566 operations, with the bottom of opening quantity space when the edge is displaced sideways.The catalyst 20 that is poured onto the specified rate in the quantity space 568 is fallen on the top surface of synthetic substrate 10 (see figure 8)s.The whole surface of synthetic substrate 10 is coated on catalyst 20, and this catalyst 20 accumulates on the top surface of substrate 10 by brush unit 580 (seeing Fig. 9 and Figure 10).That is to say, when the end from synthetic substrate 10 slides into the other end, apply brush 587 conformals coated catalysts 20 on the whole surface of synthetic substrate 10 (or conformal).For coated catalysts 20 conformally, the vibrator (not shown) can be installed, apply brush 587 or synthetic substrate 10 to be used for small vibration is applied to.
Catalyst 20 can be for by with transition metal (for example iron, platinum, cobalt, nickel, yttrium or its composition) and porous mass (for example MgO, Al 2O 3Or SiO 2) powder that is mixed and made into.Replacedly, catalyst 20 can be for comprising the liquid catalyst of material above-mentioned.At catalyst 20 is under the situation of liquid catalyst, and system can comprise catalyst storage tank, service, be installed to the weight feed pump on the service and be configured to liquid catalyst is supplied to the supply nozzle of the top surface of synthetic substrate.
According to top embodiment, when on its top surface, moving, apply brush 587 coated catalysts 20 on the top surface of synthetic substrate 10 conformally.Different with this situation, apply brush 587 and be fixed, and stand 590 can move.Preferably, apply brush 587 and move, to reduce the space of catalyst-coated unit 500.
And according to top embodiment, catalyst 20 is coated in the synthetic substrate 10 independently by catalyst-coated unit 500, produces in the synthetic substrate 10 that is coated with catalyst 20 of CNT 30 in reative cell 100.Different with this situation, the catalyst-coated unit can be removed, and catalyst gas and source gas can be supplied to, and produces CNT on the top surface with coated catalysts and the synthetic substrate in reative cell.
Figure 11 is the top plan view of the substrate holding portion 400 and first conveyer 300, and Figure 12 is the side view of substrate holding portion 400.Substrate holding portion 400 comprises the casing 420 that is configured for holding synthetic substrate 10, vertical track 442, horizontal rail 444 and removable framework 446.Vertically track 442 is arranged in the corner of first area 240.Vertically each in the track 442 has the shape of vertical stock, to be used to guide moving up and down of removable framework 446.Carriage 448 is connected with separately vertical track 442 and moves up and down along vertical track 442 by vertical driver (not shown).Each removable framework 446 vertically is provided with and arranges with facing with each other along first direction 42.Removable framework 446 and carriage 448 engagements are to move up and down linearly with carriage 448 along vertical track 442.Horizontal rail 444 is fixedly secured on the removable framework 446.Each horizontal rail 444 vertically is provided with and arranges with facing with each other along second direction 44.Horizontal rail 444 is provided with on whole first area 240.Casing is installed on the horizontal rail 444, can be along second direction 44 along horizontal rail 444 to move.
As shown in figure 11, casing 420 moves horizontally between holding fix X1 that is illustrated by the broken lines and load/unload position X2 (just in time being positioned at the front of first gate valve that links to each other with reative cell).Holding fix X1 is present in the bottom section 244 of first area 240, and load/unload position X2 is present in the top area 242.When synthetic substrate 10 to/during from reative cell 100 load/unloads and when synthetic substrate 10 is carried by second conveyer 700, casing 420 moves to load/unload position X2.And when wait was reduced to the temperature of synthetic substrate 10, casing 420 moved to holding fix X1.
Figure 13 is the perspective view of casing 420.The synthetic substrate 10 that is loaded onto the synthetic substrate of reative cell 100 and unload from reative cell 100 is accommodated in the casing 420.With reference to Figure 13, casing 420 comprises support 422, top board 424, base plate 426 and vertical axes 428.Top board and base plate 424 and 426 rectangular slab for facing with each other.Vertical axes 428 interconnects the corresponding turning of top board and base plate 424 and 426.Therefore, provide four vertical axes 428.Support 422 is installed on vertical axes 428, collects and is contained in the casing 420 will synthesize substrate 10.In the support 422 each has four back-up blocks 423, to be used to support the corner part of synthetic substrate 10.Support 422 is divided into two groups, and first group comprises the first support 422a, and second group comprises the second support 422b.The first support 422a supports the synthetic substrate 10 that synthetic substrate 10, the second support 422b that will be loaded onto in the reative cell 10 support unloading from reative cell 10.In one exemplary embodiment, four first support 422a and four second support 422b are provided, and the first support 422a is arranged in the top of the second support 422b.
Space between the second support 422b is bigger than the space between the first support 422a, this makes and can reduce the whole height of casing 420 and enough spaces are provided, with the contiguous synthetic substrate 10 of CNT 30 contacts that prevents to produce on the whole surface of the synthetic substrate that unloads from reative cell 100.
The synthetic substrate 10 of collecting at the first support 422a place of casing 420 is loaded onto in the reative cell 100 by first conveyer.Four synthetic substrates 10 are loaded onto on the boat 160 of reative cell 100.First conveyer 300 one by one to/from the synthetic substrate of reative cell 100 load/unloads.
If finished the loading of synthetic substrate 10, in reative cell 100, implement to produce the technology of CNT 30.In this technical process, behind the catalyst, other four synthetic substrates 10 are waited at the first support 422a place of casing 420 coated.
Finish in reative cell 100 if be used to produce the technology of CNT 30, the synthetic substrate 10 of high temperature by first conveyer 300 from reative cell 100 unloadings, to be collected in the second support 422b place of casing.The synthetic substrate 10 of high temperature is sentenced the preset time cooling at the second support 422b.The synthetic substrate 10 of cooling down high-temperature is undertaken by the mode of cooling naturally.Replacedly, cooling can adopt for example type of cooling pressure of cooling water to carry out.
When the synthetic substrate 10 that produces CNT 30 thereon by promptly when reative cell 100 is extracted out (not being cooled to predetermined temperature), wait for that at the first support 422a place of casing 420 four synthetic substrates 10 of (with production CNT 30) are loaded onto in the reative cell 100.Similarly, in reative cell 100, when the temperature of reaction tube 120 was maintained at processing (technology) temperature, synthetic substrate 10 was promptly loaded, to omit the step of reaction tube 120 being brought up to treatment temperature.
The synthetic substrate that produces CNT 30 is thereon waited on the second support 422b of casing 420, up to being reduced to below the predetermined temperature.The casing 420 that synthetic substrate 10 is waited for thereon is arranged in the station part 200.Because the inside of station part 200 is full of inert gas, the synthetic substrate of waiting in casing 10 10 can not contact extraneous gas (particularly air).When the synthetic substrate of handling in reative cell 10 is reduced to predetermined temperature when following, no problem generation.But if the synthetic substrate 10 of high temperature is exposed in the air of room temperature, the CNT 30 that produces on the surface of synthetic substrate 10 also will be out of shape with airborne oxygen reaction.In order to suppress the distortion of CNT 30, the station part 200 that is full of inert gas is provided, to prevent the synthetic substrate 10 contact oxygen from reative cell 10 unloadings.
The synthetic substrate 10 of waiting for the scheduled time on the second support 422b of casing 420 is transported to withdrawal part 600 by second conveyer 700 by second gate valve 224.After passing through catalyst-coated unit 500 coated catalysts 20, the synthetic substrate 10 of withdrawal is collected on the first support 422a of casing.
In system according to the present invention, eight synthetic substrates are divided into two groups, and alternately stand the technology of synthesizing carbon nanotubes 30 in reative cell.Like this, treating capacity can improve, to obtain large-scale production.
Figure 14 is the perspective view of first conveyer 300.First conveyer 300 comprises arm 320, blade (or blade) 340 and driver 360.Driver 360 comprises vertical track 362, horizontal rail 364, removable framework 366 and removable 368.Vertically track 362 is arranged in the corner part of second area 260.Vertically each in the track 362 has the shape of vertical stock, to guide moving up and down of removable framework 366.Carriage 365 is connected with in the vertical track 362 each and moves up and down by vertical driver (not shown).Removable framework 366 is configured to its length along second direction 44, to face with each other.Removable framework 366 and carriage 365 engagements are to move up and down linearly with carriage 365 along vertical track 362.In the removable framework 366 each has along second direction 44 and is fixedly secured to two ends on the carriage of facing 365, and removable framework 366 moves up and down with carriage 365.Horizontal rail 364 is fixedly secured to the top of removable framework 366.In the horizontal rail 364 each is set to its length along first direction 42.Horizontal rail 364 is provided with on whole second area 260, is installed on the horizontal rail 364 for removable 368, can be along second direction 44 along horizontal rail 364 to move.Arm 320 be fixedly secured on removable 368 and its length along first direction.Blade 340 is installed to the end of arm 320, to be used to support synthetic substrate 10.
First conveyer 300 is included as the cooling component 330 that cooling arm 320 provides.Under the very long situation of reaction tube 120, long-armed 320 are used for the synthetic substrate 10 of load/unload.But because the inside of reaction tube 120 remains on very high temperature, in the time of in arm 320 enters reaction tube 120, reaction tube 120 expands by heat.Therefore, synthetic substrate 10 is not in given position but the deviation position on blade 340 is loaded.When the given position of blade 340 was carried, behind given position deviation, it may depart from or be loaded on the casing 420 from blade 340 in synthetic substrate 340.
Arm 320 was damaged by heat when cooling component 330 was configured to prevent in arm 320 enters reaction tube 120.First conveyer 300 that provides for cooling component 330 is provided Figure 15.Cooling component 330 comprises cooling pipeline 332, cooling water supply pipe 334 and cooling water recurrent canal 336.Cooling pipeline 332 is provided in the arm 320 along the length direction of arm 320.Cooling water supply pipe 334 links to each other with a end to cooling pipeline 332, and to be used for supplying with cooling waters to cooling pipeline 332, cooling water recurrent canal 336 links to each other with its other end, to be used for returning cooling water from cooling off pipeline 332.Valve 334a is installed on the cooling water supply pipe 334, with internal path that is used to open or close pipe 334 or the flow velocity of controlling cooling water.
The synthetic substrate 10 of Chu Liing at high temperature is heated fully.When in the heated synthetic substrate of waiting on the station part 200 10 of blade 340 contacts with will heated synthetic substrate 10 during from reaction tube 120 unloadings, synthetic substrate 10 possibilities are owing to the rapid variation of temperature is compromised.Therefore, the contact area between blade 340 and the synthetic substrate 10 should be reduced.
Figure 16 is the perspective view of blade 340 shown in Figure 15.Blade 340 comprises that the plate 342 with smooth top surface projects upwards to contact the protuberance 344 of synthetic substrate 10 with slave plate 342.Plate 342 is made of super heat proof material, because it enters in technical process in the reaction tube 120 with the synthetic substrate 10 of load/unload.Protuberance 344 is offered the corner region or the whole zone of plate 342 equably, to be used to reduce the contact area between blade and the synthetic substrate.
Shown in Figure 17 and 19, each protuberance 344a has the shape of hemisphere or many cones, to carry out contacting with synthetic substrate 10.Replacedly, as shown in figure 19, each protuberance 344a has the shape of round platform (frustum of a cone) or polygon prism, contacts to carry out face with synthetic substrate 10.
The shape of protuberance 344 can be modified or change, and is not limited to previous embodiment.Protuberance 344 is provided, and is compromised by the rapid variation of temperature to prevent synthetic substrate 10.Protuberance 344 can carry out different variations on shape, quantity and layout.
The synthetic substrate of cooling preset time is transported to by second conveyer 700 and regains part 600 on second support 444 of casing 420.
Figure 20 and Figure 21 are respectively perspective view and the top plan views of regaining part 600.Figure 22 is the schematic diagram that the withdrawal program of regaining the CNT 30 in the part is shown.
Get back to Figure 20 and Figure 22, regain part 600 and comprise the stand that loads synthetic substrate 10 thereon.Below stand 620, be furnished with and regain container 660, the CNT of regaining from synthetic substrate 10 30 is stored in wherein.Regain unit 640 and be arranged on the stand 620, regain in the container 660 to be used for the CNT brush being clipped from the top surface of synthetic substrate 10.Regain unit 640 and be provided with the guide rail of installing along the length direction of synthetic substrate 10 646.Movable body 644 is installed on the guide rail 646.Regain brush 642 and be installed on the movable body 644, clip and regain in the container 660 to be used for CNT 30 brushes on the top surface that will synthesize substrate 10 along its length from a side of synthetic substrate 10 when mobile slidably.Regaining the height of brush 642 can regulate on movable body 644.
In the above embodiments, the catalyst of regaining in the synthetic substrate 10 of brush 642 brush wipings has been described when moving.Replacedly, regaining brush 642 can be fixed, and stand can move.Preferably, regain brush 642 and move, to reduce to regain the space of part 600.
Being stored in the quantity of regaining the CNT 30 in the container 660 can measure by being arranged on the measure portion of regaining below the container 660 690, and display part 692 demonstrations of quantity by linking to each other with measure portion 690 of the CNT of measuring by measure portion 690 30.
The synthetic substrate 10 that is retracted of CNT 30 thereon is provided for catalyst-coated unit 500 by second conveyer 700, to stand above-described coating procedure.The synthetic substrate 10 that is coated with catalyst is collected on the first support 422a of casing 420.
With reference to Figure 23, the system that is used for the above-described CNT 30 of large-scale production implements catalyst-coated technology (S110), produces the technology (S120) of CNT 30, waits for (cooling) technology/process (S130) and regain technology (S140).In catalyst-coated technology S110, when the catalyst 20 of doses when catalyst storage tank 520 is applied to the top surface of synthetic substrate 10, the coating brush 587 of brush unit 580 conformally is assigned to catalyst 20 on the top surface when moving.The synthetic substrate 10 that is coated with catalyst 20 is collected in the casing 420 of the substrate holding portion 400 that is installed on the station part 200 by first conveyer 300.The synthetic substrate 10 after the processing after reative cell 100 unloading soon, the synthetic substrate 10 that is collected on the first support 422a of casing 420 is loaded onto on the boat 160 of reative cell 100 immediately by first conveyer 300.When the loading of synthetic substrate is finished, produce the technology of CNT 30 and in reative cell 100, implement (S120).Be collected on the second support 422b of casing 420 in synthetic substrate 10 after from reative cell 100 unloading, their preset times that is cooled
(S130)。After preset time, synthetic substrate 10 is extracted out from station part 400, regains part 600 (S140) to be transported to.CNT 30 is recovered to the synthetic substrate 10 of regaining in the part 600 is transported to catalyst-coated part 500, to be collected in behind the coated catalysts 20 on the first support 422a of casing 420.After on collecting the second support 422b of casing 420, the synthetic substrate of handling in reative cell 100 10 repeatedly stands technology above-mentioned.
Industrial applicibility
Can find out that from the above description the present invention has the following advantages: (1) can automatically produce CNT; (2) can produce on a large scale CNT; (3) because the processing quilt in the reative cell Keep continuously, the CNT of therefore synthetic substrate is synthesized continuously, with raising system operation speed Rate; (4) catalyst is automatically accurately supplied with, to improve reliability of technology; And (5) carbon nanometer Pipe is automatically regained, with calculated productivity accurately.

Claims (38)

1. system that is used to produce CNT comprises:
Reative cell, in described reative cell, the technology of producing CNT in synthetic substrate is implemented;
Station part, it is arranged in a side of described reative cell, and be provided be used for to/from first conveyer of the described synthetic substrate of described reative cell load/unload; And
The substrate holding portion in described substrate holding portion, is being waited for the synthetic substrate that the synthetic substrate that is loaded onto in the described reative cell is received or unloads from described reative cell.
2. the system as claimed in claim 1 is characterized in that, the described station partly comprises:
Contact the chamber of oxygen with external isolation to prevent the synthetic substrate that from described reative cell, unloads.
3. system as claimed in claim 2 is characterized in that, described station part also comprises:
Be configured for supplying with the gas supply member of inert gas to the inner space of described reative cell.
4. the system as claimed in claim 1 is characterized in that, described substrate holding portion comprises:
Casing, it has first support and second support, and the synthetic substrate that wherein will be loaded onto in the described reative cell is contained in described first support, and the synthetic substrate that unloads from described reative cell is contained in described second support.
5. system as claimed in claim 4 is characterized in that, described first shelf layer is stacked on the second stacked support, and the space between described second support is bigger than the space between described first support.
6. system as claimed in claim 4 is characterized in that the height of described casing is adjustable.
7. the system as claimed in claim 1 is characterized in that, also comprises:
Be configured to before described synthetic substrate is contained in the substrate holding portion of the described station part catalyst-coated unit of coated catalysts on the top surface in described synthetic substrate.
8. system as claimed in claim 7 is characterized in that, described catalyst-coated unit comprises:
Has the catalyst storage tank of delivery outlet that is configured to supply with the catalyst of scheduled volume to the top surface of described synthetic substrate; And be used to brush the wiping catalyst so that supply to the catalyst of the top surface of described synthetic substrate has homogeneous thickness on the whole surface of described synthetic substrate brush unit.
9. system as claimed in claim 8 is characterized in that, described catalyst storage tank comprises:
The catalyst supply of predetermined amount is given to the weight feed part of the top surface of described synthetic substrate.
10. system as claimed in claim 9, it is characterized in that, described weight feed partly provides quantity space, and comprise movably top shield plate and bottom shield plate, wherein at described quantity space place, the catalyst of predetermined amount is dumped into the top of the delivery outlet of described catalyst storage tank; And
Wherein, when described top shield plate was opened, the catalyst that pours into was fed into the top surface of described synthetic substrate by described delivery outlet.
11. system as claimed in claim 9 is characterized in that, described brush unit comprises:
The guide rail of installing along the length direction of described synthetic substrate;
Be mounted to the movable body that can move along described guide rail; And
Apply brush, it is arranged in the stand top, wipes catalyst to be used for brush, thereby makes catalyst have homogeneous thickness on the whole surface of described synthetic substrate, and move slidably by described movable body;
Wherein, the height of described coating brush is adjustable.
12. the system as claimed in claim 1 is characterized in that, also comprises:
Be configured for accepting through synthetic substrate of handling and in described substrate holding portion, waiting for and the withdrawal part that is retracted in CNT synthetic in the described synthetic substrate.
13. system as claimed in claim 12 is characterized in that, described withdrawal part comprises:
Regain container, the CNT of regaining from described synthetic substrate is stored in the described withdrawal container; And
Be used for CNT is clipped from the top surface brush of described synthetic substrate the withdrawal unit of described withdrawal container.
14. system as claimed in claim 13 is characterized in that, described withdrawal unit comprises:
Regain brush, be used for when the end from the top surface of described synthetic substrate moves to the other end slidably brush and wipe CNT on the top surface of described synthetic substrate.
15. the system as claimed in claim 1 is characterized in that, also comprises:
Be configured for connecting first gate valve of described station part and described reative cell; And
Be installed between described first gate valve and the described reative cell to prevent that the heat delivery in the described reative cell from arriving the heat shield member of described first gate valve.
16. the system as claimed in claim 1 is characterized in that, described reative cell comprises:
Be configured for being provided at the reaction tube in the space that wherein holds synthetic substrate, described reaction tube has front-end and back-end, and each in the described front-end and back-end links to each other with a flange;
Be arranged on the containment member between described flange and the described reaction tube;
Be used for described reaction tube is heated to the heating unit of predetermined temperature; And
Be used to cool off the cooling component of described containment member,
Wherein, described heating unit comprises:
Be used to heat the central heater of the central area of described reaction tube;
Be used to add the edge heater of fringe region of the front-end and back-end of the described reaction tube of thermal proximity;
Be used for controlling independently the heater controller of described central heater and described edge heater.
17. system as claimed in claim 16 is characterized in that, described edge heater comprises:
Be used to add the primary heater of fringe region of the reaction tube of the flange that thermal proximity links to each other with the front end of described reaction tube; And
Be used to add the secondary heater of fringe region of the reaction tube of the flange that thermal proximity links to each other with the rear end of described reaction tube,
Wherein, described heater controller is controlled described primary heater and described secondary heater independently.
18. the system as claimed in claim 1 is characterized in that, described first conveyer comprises:
Be configured for supporting the blade of described synthetic substrate; And
Being connected with described vanes fixed also can be by the linear arm that moves of a driver, and wherein, described blade comprises:
Plate; And
Project upwards to contact a plurality of protuberances of described synthetic substrate from described plate.
19. the system as claimed in claim 1 is characterized in that, described first conveyer comprises:
Be configured for the blade of described synthetic substrate;
Being connected with described vanes fixed also can be by the linear arm that moves of a driver; And
Be used for when described arm enters described reative cell, cooling off the cooling component of described arm with the thermal deformation that prevents described arm.
20. the system as claimed in claim 1 is characterized in that, described reative cell comprises:
Be configured to be provided at the reaction tube in the space that wherein holds synthetic substrate, described reaction tube has front-end and back-end, and each in the described front-end and back-end links to each other with a flange;
Be used for described reaction tube is heated to the heating unit of predetermined temperature; And
Be arranged in the described reaction tube supporting the support frame of described synthetic substrate, described support frame comprise inwall from described reaction tube towards described reaction tube inwardly outstanding and along the vertical direction each interval to support a plurality of frameworks of a plurality of synthetic substrates.
21. the system as claimed in claim 1 is characterized in that, described reative cell comprises:
Produce the reaction tube of CNT therein;
Be used to heat the heating unit of described reaction tube;
Be configured for the gas supply pipe of supply source gas in described reaction tube; And
The heater member that is used for the described source of heating gas before described source gas is fed in the described reaction tube.
22. a system that is used to produce CNT comprises:
Reative cell, in described reative cell, the technology of producing CNT in synthetic substrate is implemented;
Station part, it links to each other with a side of described reative cell, and has with external isolation and contact the inner space of oxygen to prevent the synthetic substrate that unloads from described reative cell;
First conveyer, it is installed in the inside of described station part, be used for to/from the described synthetic substrate of described reative cell load/unload;
The substrate holding portion in described substrate holding portion, is being waited for the synthetic substrate that the substrate that is loaded onto in the described reative cell is received or unloads from described reative cell;
Regain part, it is used for extracting described synthetic substrate out from described substrate holding portion, to be retracted in the CNT of producing in the described synthetic substrate;
The catalyst-coated unit, coated catalysts on the top surface in described synthetic substrate before it is configured in described synthetic substrate is contained in described station substrate holding portion partly; And
Second conveyer, it is used for carrying described synthetic substrate between described withdrawal part and described substrate holding portion and between described catalyst-coated unit and the described substrate holding portion.
23. the system as claimed in claim 22 is characterized in that, described substrate holding portion comprises:
Casing, it has first support and second support, and the synthetic substrate that wherein will be loaded onto in the described reative cell is contained in described first support, and the synthetic substrate that unloads from described reative cell is contained in described second support.
24. system as claimed in claim 23 is characterized in that, the space between described second support is bigger than the space between described first support.
25. the system as claimed in claim 22 is characterized in that, the described station partly comprises:
Contact the chamber of oxygen with external isolation to prevent the synthetic substrate that from described reative cell, unloads; And
Be configured for supplying with the gas supply member of inert gas to the inner space of described reative cell.
26. the system as claimed in claim 22 is characterized in that, this system also comprises:
Be configured for connecting first gate valve of described station part and described reative cell; And
Be installed between described first gate valve and the described reative cell to prevent that the heat delivery in the described reative cell from arriving the heat shield member of described first gate valve.
27. the system as claimed in claim 22 is characterized in that, the described station partly comprises:
The first area, it is arranged to contiguous described reative cell, and wherein said substrate holding portion is arranged in the described first area; And
Second area, it is arranged to based on described first area at position relative with described reative cell and described reative cell conllinear, and wherein said first conveyer is arranged in the described second area,
Wherein, described first area comprises:
Be arranged to upper area with described reative cell and described substrate holding portion conllinear; And
Along the lower area of the direction vertical from described upper area extension with described conllinear direction,
Wherein, described substrate holding portion comprises:
Be used to hold the casing that described synthetic substrate also can be moved between described upper area and described lower area.
28. system as claimed in claim 27 is characterized in that, described catalyst-coated unit, described second conveyer and described withdrawal partly are arranged in the outside of described station part,
Wherein, described second conveyer is relatively arranged based on the upper area and the described lower area of described first area, and is arranged between described catalyst-coated unit and the described withdrawal part.
29. a method that is used to produce CNT comprises:
Utilize catalyst-coated to synthesize substrate;
The substrate that is coated with catalyst is loaded in the reative cell;
Supply source gas in the described reative cell, with synthesizing carbon nanotubes and synthetic substrate;
The substrate of handling is unloaded from described reative cell;
Synthetic substrate after the unloading of cooling below the predetermined temperature; And
Regain CNT from cooled synthetic substrate.
30. method as claimed in claim 29 is characterized in that, the synthetic substrate after the cooling unloading is carried out under inert gas atmosphere, with the synthetic substrate contact oxygen after preventing to unload.
31. method as claimed in claim 29 is characterized in that, after the synthetic substrate of handling unloaded from described reative cell, the synthetic substrate that is coated with catalyst was loaded onto in the described reative cell immediately, with synthesizing carbon nanotubes in described reative cell.
32. method as claimed in claim 29 is characterized in that, the synthetic substrate that unloads from described reative cell is accommodated in the casing in the space that is arranged in inert gas atmosphere, and
When CNT was synthetic in described reative cell, the synthetic substrate that is coated with catalyst was waited in described casing.
33. method as claimed in claim 29 is characterized in that, utilizes the synthetic substrate of catalyst-coated to comprise:
The catalyst supply of scheduled volume is given on the top surface of described synthetic substrate;
Brush is wiped the catalyst that is supplied to, to have homogeneous thickness on the whole surface of described synthetic substrate.
34. method as claimed in claim 29 is characterized in that, regains CNT and comprises:
CNT on the top surface of the described synthetic substrate of brush wiping is regained in the container so that it is stored in.
35. method as claimed in claim 29 is characterized in that, a plurality of synthetic substrates one by one to/in described reative cell load/unload, in described reative cell, be handled simultaneously.
36. method as claimed in claim 29 is characterized in that, the cooling reative cell is undertaken by natural cooling means.
37. method as claimed in claim 29 is characterized in that, described source gas is fed in the described reative cell after the external heat of described reative cell.
38. method as claimed in claim 29 is characterized in that, when described synthetic substrate unloaded from described reative cell, the arm that enters a conveyer of described reative cell was cooled.
CNA2006800445827A 2005-11-29 2006-11-29 System and method for producing carbon nanotubes Pending CN101316791A (en)

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KR100936774B1 (en) 2007-08-01 2010-01-15 세메스 주식회사 Method and apparatus of providing catalyst particles and apparatus of collecting carbon nano tube having the same

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