CN101221361B - Pipeline pressure balancing system - Google Patents
Pipeline pressure balancing system Download PDFInfo
- Publication number
- CN101221361B CN101221361B CN2008100010629A CN200810001062A CN101221361B CN 101221361 B CN101221361 B CN 101221361B CN 2008100010629 A CN2008100010629 A CN 2008100010629A CN 200810001062 A CN200810001062 A CN 200810001062A CN 101221361 B CN101221361 B CN 101221361B
- Authority
- CN
- China
- Prior art keywords
- photoresist
- liquid
- discharge pipe
- pressure balancing
- balancing system
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Landscapes
- Coating Apparatus (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Pipeline Systems (AREA)
Abstract
The invention discloses a line pressure balancing system for a photoresist coating machine, comprising a nozzle component, a discharge pipeline and a first liquid sealed pressure balancing bottle, wherein nozzle is used for coating photoresist liquid; the discharge pipeline is connected to the nozzle component for discharging the photoresist liquid. The first liquid sealed pressure balancing bottle is provided with a first short pipe and a first long pipe, wherein the short pipe is connected to the discharge pipeline, while the first long pipe is communicated with the outside of the line pressure balancing system for balancing the pressure in the discharge pipeline. When negative pressure is formed in the discharge pipeline, the first long pipe supplies air form the outside of the line pressure balancing system to the discharge pipeline to discharge a photoetching glue solution. Meanwhile, the discharge pipeline can be judged as being blocked simply by an observation of the change of an isolated liquid of the first liquid sealed pressure balancing bottle.
Description
Technical field
The present invention relates to a kind of pipeline pressure balancing system, relate in particular to a kind of pipeline pressure balancing system of photoresist coating machine platform.
Background technology
Please refer to Fig. 1, the synoptic diagram of the discharge pipe of the photoresist coating machine platform of relevant prior art.Wherein, discharge pipe 12, pump drainage pipeline 14.General photoresist coating machine platform has nozzle assembly 10, and by discharge pipe valve member 22, control is led to discharge pipe 12, to discharge photoresist liquid to discharging of waste liquid end 26.And the photoresist coating machine platform is when supplying with photoresist liquid to nozzle assembly 10, and also by pump drainage pipeline valve member 24, control is led to discharge pipe 12, similarly is connected to discharging of waste liquid end 26.According to prior art, the photoresist coating machine platform utilizes terrestrial attraction, photoresist liquid is guided to discharging of waste liquid end 26, please in the lump with reference to figure 2, for relevant prior art with nozzle assembly 10, to workpiece 300 coating photoresist liquids, its discharge pipe and have the synoptic diagram that photoresist is supplied with the photoresist coating machine platform of recovery system 400.Among Fig. 2 respectively with triangle, rhombus etc. represent respectively that photoresist is supplied with, automatic 3-way valve, 3-way valve, hand valve and pneumatic valve etc. in the discharge pipe, wherein,
Represent automatic 3-way valve;
The expression 3-way valve;
The expression hand valve;
Expression pneumatic valve, photoresist coating machine platform are also controlled the supply and the discharging of photoresist in the photoresist coating machine platform by above-mentioned various valve member.
Yet the discharge pipe 12 among Fig. 1 steeps line segments for the row in the coating process, if the flowability of discharge pipe 12 is not good, can cause photoresist liquid cohesion in the discharge pipe 12, causes nozzle assembly 10 internal pressures undesired, and process abnormality takes place.Therefore will cause coating film thickness surface of the work inhomogeneous and coating to produce bubble, and then cause the decline of producing yield.Moreover, when discharge pipe 12 is arranged the bubble program,, will influence the mobility and the production capacity of photoresist coating machine platform if it can't fulfil assignment smoothly.
In addition, because of discharge pipe 12 is arranged in the photoresist coating machine platform, the board operating personnel can't inspect discharge pipe 12 in real time, therefore can't confirm effectively also whether the photoresist liquid in the discharge pipe 12 blocks, therefore make also that the board operating personnel can't real time reaction, can't carry out real-time row's bubble or maintenance process the photoresist coating machine platform.
Summary of the invention
Technical matters to be solved by this invention is to provide a kind of pipeline pressure balancing system that is used for the photoresist coating machine platform, by fluid-tight pressure equilibrium bottle, can be to the discharge pipe make-up gas, pressure in the balance discharge pipe, photoresist liquid is hedged off from the outer world, prolongs the cycle period that obstruction takes place discharge pipe.Simultaneously, by observing the liquid level of isolated liquid in the fluid-tight pressure equilibrium bottle, just can discover easily and whether block situation in the discharge pipe.
Another technical matters to be solved by this invention is to provide a kind of pipeline pressure balancing system that is used for the photoresist coating machine platform, because of allowing the photoresist liquid discharging smooth and easy, avoid photoresist liquid in discharge pipe, to condense, process abnormality takes place, and photoresist coating process yield is promoted to some extent.
For achieving the above object, pipeline pressure balancing system of the present invention is used for the coating machine platform of a photoresist, comprises nozzle assembly, discharge pipe and the first fluid-tight pressure equilibrium bottle.Nozzle assembly is arranged on the photoresist coating machine platform, in order to the coating photoresist liquid.Discharge pipe is connected to nozzle assembly, with the discharging photoresist liquid.The first fluid-tight pressure equilibrium bottle has first long tube and first short tube, has an isolated liquid in the bottle, first short tube is connected to discharge pipe, and first long tube and first short tube all stretch in the fluid-tight pressure equilibrium bottle, and first long tube more stretches in the isolated liquid, be in communication with the outside, when being negative pressure in the discharge pipe, by isolated liquid, from extraneous make-up gas to discharge pipe, pressure in can the balance discharge pipe is with smooth discharging photoresist liquid.Utilize the first fluid-tight pressure equilibrium bottle of the present invention, only need observe the liquid level of its inner isolated liquid, as change, can determine to have in the discharge pipe to block to produce.
Photoresist coating machine platform of the present invention also comprises photoresist and supplies with recovery system, in order to supply with photoresist to nozzle assembly.Photoresist is supplied with recovery system and is comprised accumulator tank, reclaims and store photoresist liquid.And pipeline pressure balancing system of the present invention also comprises reclaim line, and accumulator tank is connected to discharge pipe by reclaim line, reclaims photoresist liquid.And, pipeline pressure balancing system of the present invention further comprises the second fluid-tight pressure equilibrium bottle, have second long tube and second short tube, has an isolated liquid in the bottle, second long tube is connected to reclaim line, second short tube is supplied with the recovery system external world with photoresist and is communicated with, and utilizes and the similar principle of the first fluid-tight pressure equilibrium bottle pressure in the balance reclaim line.Supply with the photoresist coating machine platform of recovery system to having photoresist, pipeline pressure balancing system of the present invention can overcome the shortcoming of aforementioned prior art, satisfies the aforementioned need of this type of photoresist coating machine platform.
Describe the present invention below in conjunction with the drawings and specific embodiments, but not as a limitation of the invention.
Description of drawings
Fig. 1 is the synoptic diagram of the photoresist coating machine platform discharge pipe of prior art;
Fig. 2 is the discharge pipe of prior art and has the synoptic diagram that photoresist is supplied with the photoresist coating machine platform of recovery system;
Fig. 3 is the synoptic diagram of pipeline pressure balancing system of the present invention;
Fig. 4 has the synoptic diagram of the photoresist coating machine platform of pipeline pressure balancing system and manual photoresist supply recovery system for the present invention;
The synoptic diagram that Fig. 5 is connected with reclaim line for the present invention's second fluid-tight pressure equilibrium bottle;
Fig. 6 has the synoptic diagram of the photoresist coating machine platform of pipeline pressure balancing system and automatic photoresist supply recovery system for the present invention.
Wherein, Reference numeral:
10: nozzle assembly 12: discharge pipe
22: discharge pipe valve member 24: pump drainage pipeline valve member
26: discharging of waste liquid end 100: nozzle assembly
102: discharge pipe 102a: reclaim line
104: the first fluid-tight pressure equilibrium bottle 104a: the second fluid-tight pressure equilibrium bottle
108: the first short tubes of 106: the first long tubes
110: isolated liquid 106a: second long tube
108a: the second short tube 110a: isolated liquid
202: discharge pipe valve member 204: pump drainage pipeline valve member
206: discharging of waste liquid end 300: workpiece
400: photoresist is supplied with recovery system
Embodiment
Please refer to Fig. 3, the synoptic diagram of relevant pipeline pressure balancing system of the present invention.Pipeline pressure balancing system of the present invention comprises nozzle assembly 100, discharge pipe 102 and the first fluid-tight pressure equilibrium bottle 104.Nozzle assembly 100 is arranged on the photoresist coating machine platform, in order to the coating photoresist liquid.Discharge pipe 102 is connected to nozzle assembly 100, utilizes gravity water conservancy diversion photoresist liquid, in order to discharge photoresist liquid to discharging of waste liquid end 206.And the photoresist coating machine platform is when supplying with photoresist liquid to nozzle assembly 100, and also by pump drainage pipeline valve member 204 on the pump drainage pipeline 112, control is led to discharge pipe 102, similarly is connected to discharging of waste liquid end 206.In addition, the first fluid-tight pressure equilibrium bottle 104 of the present invention as shown in Figure 3, has first long tube 106, first short tube 108, has isolated liquid 110 in the bottle, wherein first long tube 106 and first short tube 108 all are inserted in the first fluid-tight pressure equilibrium bottle 104, and first long tube 106 more is inserted in the isolated liquid 110, isolated photoresist liquid contacts with the pipeline pressure balancing system external world, and first short tube 108 is connected to discharge pipe 102, but do not stretch into the isolated liquid 110 of the first fluid-tight pressure equilibrium bottle 104, when photoresist liquid flows, when discharge pipe 102 inside formed negative pressure, the first fluid-tight pressure equilibrium bottle 104 can be by first long tube 106 and the interior isolated liquid 110 of bottle, make-up gas in discharge pipe 102, with the pressure in the balance discharge pipe 102, the isolated liquid 110 of discharging photoresist liquid, and utilization smoothly is hedged off from the outer world photoresist liquid.
And, if block in the discharge pipe 102, can be because of the malleation in the discharge pipe 102, cause the liquid level of the isolated liquid 110 in the first fluid-tight pressure equilibrium bottle 104 to rise, the board operating personnel only need observe the liquid level of isolated liquid 110, just can discover easily and judge whether the obstruction situation is arranged in the discharge pipe 102.In addition, the first fluid-tight pressure equilibrium bottle 104 of the present invention also can prolong the possible time cycle that obstruction takes place discharge pipe because of photoresist liquid is completely cut off with extraneous the contact.
Please together with Fig. 3, in the lump with reference to figure 4, for the present invention utilizes nozzle assembly 100, to workpiece 300 coating photoresist liquids, it has the synoptic diagram that pipeline pressure balancing system and manual photoresist are supplied with the photoresist coating machine platform of recovery system 400.Among the embodiment of Fig. 4,
Represent automatic 3-way valve;
The expression 3-way valve;
The expression hand valve;
The expression pneumatic valve, discharge pipe 102 can be connected to discharging of waste liquid end 206, and the while also is connected to the accumulator tank that photoresist is supplied with recovery system 400, collects useless photoresist liquid.Among Fig. 4 respectively with triangle, rhombus etc. represent respectively that photoresist is supplied with, automatic 3-way valve, 3-way valve, hand valve and pneumatic valve etc. in the discharge pipe, this embodiment of the present invention controls supply, discharging and the recovery of photoresist in the photoresist coating machine platform with manual mode.As shown in Figure 4, pipeline pressure balancing system of the present invention can also further comprise photoresist supply recovery system 400, and please in the lump with reference to figure 5, shows the synoptic diagram that reclaim line 102a is connected with the second fluid-tight pressure equilibrium bottle 104a.With the first fluid-tight pressure equilibrium bottle 104 similarly, the second fluid-tight pressure equilibrium bottle 104a has one second long tube 106a and one second short tube 108a, different is, the second long tube 106a is connected to reclaim line 102a, the second short tube 108a then is communicated with the external world of photoresist supply recovery system 400, in order to the pressure in the balance reclaim line 102a.And, has an isolated liquid 110a in the second fluid-tight pressure equilibrium bottle 104a, the second long tube 106a and the second short tube 108a all are inserted in the second fluid-tight pressure equilibrium bottle 104a, and the second long tube 106a more stretches among the isolated liquid 110a, and isolated photoresist liquid is supplied with contacting of recovery system 400 external worlds with photoresist.
Pipeline pressure balancing system of the present invention utilizes being connected of the first fluid-tight pressure equilibrium bottle 104 and the second fluid-tight pressure equilibrium bottle 104a and discharge pipe 102 and reclaim line 102a, can not only balance discharge pipe 102 and reclaim line 102a in pressure, discharge photoresist liquid smoothly, also because of the contacting of isolated photoresist liquid and ambient atmos, and can prolong the possible time cycle that obstruction takes place pipeline.Especially for the photoresist coating machine platform with photoresist recovery system, the interior photoresist liquid of pipeline being flowed smoothly and be hedged off from the outer world is relevant important problem.Pipeline pressure balancing system of the present invention can overcome the shortcoming of aforementioned prior art, satisfies the aforementioned need of this type of photoresist coating machine platform.
Please refer to Fig. 6, for the present invention utilizes nozzle assembly 100, to workpiece 300 coating photoresist liquids, it has the synoptic diagram of the photoresist coating machine platform of pipeline pressure balancing system and automatic photoresist supply recovery system 400, wherein,
Represent automatic 3-way valve;
The expression 3-way valve;
The expression hand valve
The expression pneumatic valve.Discharge pipe 102 can be connected to discharging of waste liquid end 206 among Fig. 6, also is connected to the accumulator tank that photoresist is supplied with recovery system 400 simultaneously.Accumulator tank is connected to discharge pipe 102 by reclaim line 102a, collects useless photoresist liquid.As embodiment shown in Figure 4, embodiment among Fig. 6 also respectively with triangle, rhombus etc. represent respectively that photoresist is supplied with, automatic 3-way valve, 3-way valve, hand valve and pneumatic valve etc. in the discharge pipe, right this embodiment of the present invention can be with the controller (not shown) of photoresist coating machine platform, difference valve member in the control linkage pipeline, edit cooperation robotization coating process, and control supply, discharging and the recovery of photoresist in the photoresist coating machine platform with automated manner.Further improve board efficient and production capacity.
Identical with embodiment shown in Figure 4, pipeline pressure balancing system of the present invention can comprise further that also the second fluid-tight pressure equilibrium bottle 104a and photoresist supply recovery system 400, the second fluid-tight pressure equilibrium bottle 104a supply with recovery system 400 by reclaim line 102a with photoresist and are connected.Similarly, please in the lump with reference to figure 5, the second fluid-tight pressure equilibrium bottle 104a has the second long tube 106a and the second short tube 108a, the second long tube 106a is connected to reclaim line 102a, the second short tube 108a then is communicated with the external world of photoresist supply recovery system 400, pressure in can not only balance reclaim line 102a discharges photoresist liquid smoothly, also can completely cut off contacting of photoresist liquid and the external world.
Therefore, pipeline pressure balancing system of the present invention can solve the shortcoming of aforementioned prior art, and balance discharge pipe internal pressure avoids photoresist liquid to condense, and promotes the yield of photoresist coating process and improves board mobility and production capacity.
Certainly; the present invention also can have other various embodiments; under the situation that does not deviate from spirit of the present invention and essence thereof; those of ordinary skill in the art work as can make various corresponding changes and distortion according to the present invention, but these corresponding changes and distortion all should belong to the protection domain of the appended claim of the present invention.
Claims (9)
1. a pipeline pressure balancing system is used for a photoresist coating machine platform, it is characterized in that, comprising:
One nozzle assembly is arranged on this photoresist coating machine platform, in order to be coated with a photoresist liquid;
One discharge pipe is connected to this nozzle assembly, to discharge this photoresist liquid; And
One first fluid-tight pressure equilibrium bottle, have one first short tube and one first long tube, this first short tube is connected to this discharge pipe, this first long tube is communicated with this pipeline pressure balancing system is extraneous, with the pressure And in this discharge pipe of balance and, has an isolated liquid in this first fluid-tight pressure equilibrium bottle, this first long tube and this first short tube all are inserted in this first fluid-tight pressure equilibrium bottle, and this first long tube also stretches in this isolated liquid, and isolated this photoresist liquid contacts with this pipeline pressure balancing system external world.
2. pipeline pressure balancing system according to claim 1 is characterized in that, when being negative pressure in this discharge pipe, by this first long tube from the extraneous make-up gas of this pipeline pressure balancing system to this discharge pipe, to discharge this photoresist liquid.
3. pipeline pressure balancing system according to claim 1 is characterized in that, when being malleation in this discharge pipe, whether the liquid level that can observe this isolated liquid changes, judge in this discharge pipe and block.
4. pipeline pressure balancing system according to claim 1 is characterized in that, this discharge pipe utilizes this photoresist liquid of gravity water conservancy diversion.
5. pipeline pressure balancing system according to claim 1, it is characterized in that this photoresist coating machine platform also comprises a photoresist and supplies with recovery system, is connected to this nozzle assembly and this discharge pipe, in order to supplying with photoresist, or reclaim and store this photoresist liquid to this nozzle assembly.
6. pipeline pressure balancing system according to claim 5 is characterized in that, this photoresist is supplied with recovery system and also comprised an accumulator tank, reclaims and store this photoresist liquid.
7. pipeline pressure balancing system according to claim 6 is characterized in that, also comprises a reclaim line, and this accumulator tank is connected to this discharge pipe by this reclaim line, reclaims this photoresist liquid.
8. pipeline pressure balancing system according to claim 7, it is characterized in that, also comprise one second fluid-tight pressure equilibrium bottle, have one second long tube and one second short tube, this second long tube is connected to this reclaim line, this second short tube is supplied with the recovery system external world with this photoresist and is communicated with, with the pressure in this reclaim line of balance.
9. pipeline pressure balancing system according to claim 8, it is characterized in that, has an isolated liquid in this second fluid-tight pressure equilibrium bottle, this second long tube and this second short tube all are inserted in this second fluid-tight pressure equilibrium bottle, and this second long tube also stretches in this isolated liquid, and isolated this photoresist liquid is supplied with contacting of the recovery system external world with this photoresist.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2008100010629A CN101221361B (en) | 2008-01-18 | 2008-01-18 | Pipeline pressure balancing system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2008100010629A CN101221361B (en) | 2008-01-18 | 2008-01-18 | Pipeline pressure balancing system |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101221361A CN101221361A (en) | 2008-07-16 |
| CN101221361B true CN101221361B (en) | 2010-06-09 |
Family
ID=39631277
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2008100010629A Expired - Fee Related CN101221361B (en) | 2008-01-18 | 2008-01-18 | Pipeline pressure balancing system |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN101221361B (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109225072B (en) * | 2018-09-14 | 2021-04-16 | 新奥科技发展有限公司 | Synthetic reaction system and synthetic reaction method |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1266952A (en) * | 1999-03-10 | 2000-09-20 | Smc株式会社 | Pressure/flow controlling valve |
| CN1574221A (en) * | 2003-06-04 | 2005-02-02 | 大日本网目版制造株式会社 | Liquid supplying device and substrate processing device |
| CN1714426A (en) * | 2002-10-15 | 2005-12-28 | Fsi国际公司 | Spin-coating methods and apparatus for spin-coating, including pressure sensor |
| CN1987652A (en) * | 2005-12-19 | 2007-06-27 | 中芯国际集成电路制造(上海)有限公司 | Photoresist coating device and its method |
-
2008
- 2008-01-18 CN CN2008100010629A patent/CN101221361B/en not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1266952A (en) * | 1999-03-10 | 2000-09-20 | Smc株式会社 | Pressure/flow controlling valve |
| CN1519479A (en) * | 1999-03-10 | 2004-08-11 | Smc��ʽ���� | Pressure/flow control valve |
| CN1714426A (en) * | 2002-10-15 | 2005-12-28 | Fsi国际公司 | Spin-coating methods and apparatus for spin-coating, including pressure sensor |
| CN1574221A (en) * | 2003-06-04 | 2005-02-02 | 大日本网目版制造株式会社 | Liquid supplying device and substrate processing device |
| CN1987652A (en) * | 2005-12-19 | 2007-06-27 | 中芯国际集成电路制造(上海)有限公司 | Photoresist coating device and its method |
Also Published As
| Publication number | Publication date |
|---|---|
| CN101221361A (en) | 2008-07-16 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI534387B (en) | Chemical liquid supply device and supply method thereof | |
| CN101465414B (en) | Pump suction type quantitative evacuation priming device | |
| CN101221361B (en) | Pipeline pressure balancing system | |
| CN102527658B (en) | Pressure balance system of automatic ELISA (Enzyme-Linked Immunosorbent Assay) plate washer and automatic ELISA plate washer | |
| CN103190691A (en) | Purified water applying device and method and loose moisture-regaining device | |
| CN104944522A (en) | Multi-valve control water treatment system and full-chamber bed up-flow regeneration softened water treatment process | |
| CN101318150A (en) | Gas collection apparatus with water discharge method | |
| CN204456270U (en) | A kind of workshop pure water water system | |
| CN207455005U (en) | The pumping Automatic Link Establishment of mobile negative-pressure platform | |
| CN205204263U (en) | Antiseized transport solid piping installation | |
| CN211330634U (en) | Simple and easy cleaning test machine of glass bottle | |
| CN203455143U (en) | Circular vacuum chamber for testing leakage of weld seam of tank bottom | |
| CN209238649U (en) | A kind of bottle washing machine | |
| CN204981111U (en) | Liquid caustic soda uninstallation device | |
| CN202682853U (en) | Chemical liquid debubbling device | |
| CN202374691U (en) | Fertilization tank for micro-irrigation system | |
| CN203292023U (en) | Paint recycling device | |
| CN206342967U (en) | A kind of automatic back-fushing filter waste liquid recovery apparatus | |
| CN215674164U (en) | Chemical conveying pipeline | |
| CN202277694U (en) | Vacuum flash tank | |
| CN204897489U (en) | Float bed counter current regeneration demineralized water treatment process with many valve controls water processing system | |
| CN103181261A (en) | Fertilization tank for micro-irrigation system | |
| CN105864635A (en) | Chemical industry gas supply device | |
| CN203824356U (en) | Cooler used for vacuum degassing machine and vacuum degassing system | |
| CN205207286U (en) | Alkali device is unloaded in zero leakage |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20100609 Termination date: 20210118 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |