CN101181706A - Substrate processing apparatus - Google Patents
Substrate processing apparatus Download PDFInfo
- Publication number
- CN101181706A CN101181706A CNA2007101399076A CN200710139907A CN101181706A CN 101181706 A CN101181706 A CN 101181706A CN A2007101399076 A CNA2007101399076 A CN A2007101399076A CN 200710139907 A CN200710139907 A CN 200710139907A CN 101181706 A CN101181706 A CN 101181706A
- Authority
- CN
- China
- Prior art keywords
- gap nozzle
- stream
- treatment fluid
- coating
- substrate board
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
- B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
- B05C5/0254—Coating heads with slot-shaped outlet
- B05C5/0258—Coating heads with slot-shaped outlet flow controlled, e.g. by a valve
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67253—Process monitoring, e.g. flow or thickness monitoring
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- Nonlinear Science (AREA)
- Coating Apparatus (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
The invention relates to a substrate processing device which can measure the state of the processing liquid sprayed from a slit nozzle accurately. The invention is provided with a pipe (42) for extracting air at the secondary side of the slit nozzle (41). The pipe (42) is independent instead of directly communicating with the pipe (63) positioned at the first side of the slit nozzle (41). Besides, the pipe (42) is directly communicated with a stream (410) inside the slit nozzle (41). The pipe (42) is provided with a pressure sensor (413) so as to transfer the measure value to a control part (8). The corrosion resistance liquid is supplied to the slit nozzle (41) through a pump (61) and the pressure inside the pipe (42) at this time is measured through the pressure sensor (413).
Description
Technical field
The present invention relates to control the technology of the ejection of the treatment fluid in the slit coating machine, relate to the determination techniques that is used to correctly control in more detail.
Background technology
Known have liquid crystal with glass square substrate, semiconductor wafer, film liquid crystal with flexible base, board, base board for optical mask, filter with the surface of (being designated hereinafter simply as " substrate ") such as substrates on the applying device of treatment fluid such as coating photoresist.As applying device, for example there is the gap nozzle that uses ejection portion to carry out the slit coating machine of slit coating with slit-shaped.In the slit coating machine, because the deviation of coating thickness (coating is uneven) becomes the reason that wiring width changes, the control (uniformity) of coating thickness is the key element of particular importance.
The slit coating machine sprays resist from gap nozzle, meanwhile, with certain speed gap nozzle is moved and form uniform thickness, thereby under the situation of carrying out film thickness monitoring, be the most difficult with the film thickness monitoring that applies end position in the coating starting position.Particularly in the coating starting position, the acceleration time of the mobile acceleration time of gap nozzle and ejection flow is short more, and the unstable region of thickness is just few more.
The general coating speed of slit coating machine approximately is 200mm/ second, in order to be compressed in the 10mm at the unstable region of coating starting position, quickens and finish to move in requiring during about 0.025 second.On the other hand, because that coated thickness is subjected to from the influence of the ejection flow of gap nozzle is very big, so require in film thickness monitoring, to accurately measure the ejection flow.But, directly measure flowmeter that sprays flow and the measurement that is not suitable for (can not the accurately measure) short time, so in the so short time, can not measure value accurately in fact.
Therefore, the method that the working pressure sensor is observed the ejection state had been proposed in the past.For example, such technology has been documented in the patent documentation 1, technology is as follows proposed: a pressure sensor is arranged on the primary side (between jet pump and the gap nozzle) of gap nozzle, and sprays control in the patent documentation 1 according to pressure by the treatment fluid of this determination of pressure sensor.
[patent documentation 1] TOHKEMY 2003-181360 communique
In the technology of patent documentation 1 record, pressure sensor is arranged on the primary side of gap nozzle.
Figure 11 is illustrated in to make the structure (configuration of pipe arrangement diameter, length, pipe arrangement etc.) of supplying with stream carry out the figure of measured value of the pressure sensor of primary side under the situation of many variations, that be arranged on gap nozzle.As shown in figure 11, the measured value of pressure sensor that is arranged on the primary side of gap nozzle has many variations because of the structure of supplying with stream.That is, this is illustrated in pressure sensor is arranged under the situation of primary side of gap nozzle, and the crushing between from the jet pump to the gap nozzle is very big to the influence of measured value.
In other words, the pressure sensor of patent documentation 1 record exists undetermined to bestow the problem of the pressure of gap nozzle (in fact and fail accurately to measure state from the treatment fluid of gap nozzle ejection).Therefore just have problem as follows, that is, the pressure that is gone out by such determination of pressure sensor is the numerical value that has been subjected to the influence of time lag of first order, is being used under the situation of working control, must consider that this delay calculates.
Summary of the invention
The present invention is in view of the above problems and proposes, and its purpose is to provide a kind of and correctly determines from the substrate board treatment of the state of the treatment fluid of gap nozzle ejection.
For solving above-mentioned problem, the invention of technical scheme 1 is a kind of substrate board treatment, and it is to the coating of substrates treatment fluid, it is characterized in that, this substrate board treatment has: gap nozzle, and it is provided with the stream of treatment fluid in inside, and from the ejiction opening ejection treatment fluid of described stream via slit-shaped; Mobile device, it relatively moves the substrate and the described gap nozzle of coating treatment fluid; Liquid feeding device, it is via the described stream transport process liquid in the described gap nozzle of first-class road direction of treatment fluid; Second stream of treatment fluid, itself and described first stream are provided with independently, and directly are communicated with described stream in the described gap nozzle; Pressure measuring unit, it is arranged on described second stream; Mobile controller, its measurement result according to described pressure measuring unit is controlled described mobile device.
In addition, the invention of technical scheme 2 is as technical scheme 1 described substrate board treatment, it is characterized in that, this substrate board treatment also had before substrate is handled the pre-coated portion of coating treatment fluid, the described mobile device when described mobile controller is controlled to the coating of substrates treatment fluid according to the measurement result of the described pressure measuring unit when the described pre-coated portion coating treatment fluid.
In addition, the invention of technical scheme 3 is as technical scheme 2 described substrate board treatments, it is characterized in that this substrate board treatment also has: the liquor charging pressure measuring unit, and it measures the pressure of the treatment fluid of being sent here by liquid feeding device; The liquor charging control device, the described liquid feeding device when its measurement result according to the described liquor charging pressure measuring unit when the described pre-coated portion coating treatment fluid is controlled to the coating of substrates treatment fluid.
In addition, the invention of technical scheme 4 is as each described substrate board treatment in the technical scheme 1 to 3, it is characterized in that, described second stream is the pipe arrangement that is used for from the inside extracting air of described gap nozzle.
In the invention of technical scheme 1 to 4 record, have: liquid feeding device, it is via the stream transport process liquid in the first-class road direction gap nozzle of treatment fluid; Second stream of treatment fluid, itself and first stream are provided with independently, and directly are communicated with stream in the gap nozzle; Pressure measuring unit, it is arranged on second stream; Mobile controller, its measurement result according to pressure measuring unit is controlled mobile device, thereby can correctly measure the ejection state of treatment fluid.Therefore, can correctly control mobile device.
In the invention of technical scheme 2 records, the pre-coated portion that also has coating treatment fluid before to the processing of substrate, mobile device when mobile controller is controlled to the coating of substrates treatment fluid according to the measurement result of the described pressure measuring unit when pre-coated portion applies treatment fluid, all once measure thereby needn't handle, also can suppress the calculation process amount each coating.
In the invention of technical scheme 3 records, also have: the liquor charging pressure measuring unit, it measures the pressure of the treatment fluid of being sent here by liquid feeding device; The liquor charging control device, the liquid feeding device when its measurement result according to the liquor charging pressure measuring unit when the described pre-coated portion coating treatment fluid is controlled to the coating of substrates treatment fluid, thus can correctly control liquid feeding device.Therefore can further improve the precision in the coating processing.
In the invention of technical scheme 4 records, second stream is the pipe arrangement that is used for from the inside extracting air of gap nozzle, thereby can be also used as the extracting air pipe arrangement, needn't be provided for the stream of setting pressure determinator in addition separately.
Description of drawings
Fig. 1 is the stereogram of the summary of expression substrate board treatment of the present invention.
Fig. 2 be the expression substrate board treatment main body side section and represent the figure of the main composition key element that the coating action of liquid against corrosion relates to.
Fig. 3 is the figure of expression gap nozzle and resist feed mechanism.
Fig. 4 is illustrated in the figure that structure from the supply stream of liquid against corrosion to gap nozzle that supply with has been carried out the measured value of the pressure sensor under the situation of many variations.
Fig. 5 is arranged on the detailed figure of the nozzle initialization mechanism in the opening.
Fig. 6 is the flow chart of the action of expression substrate board treatment.
Fig. 7 is the detailed flow chart that the controlling value of expression substrate board treatment obtains processing.
Fig. 8 is the detailed flow chart that the controlling value of expression substrate board treatment obtains processing.
Fig. 9 is the ejection flow of illustration pump and the figure of the relation of the measured value of being measured respectively by pressure sensor.
Figure 10 is the figure of the measured value and the time relation of illustration pressure sensor.
Figure 11 is illustrated in to make the structure of supplying with stream carry out the figure of measured value of the pressure sensor of the primary side that is arranged on gap nozzle under the situation of many variations.
The specific embodiment
Below, explain preferred embodiment of the present invention with reference to accompanying drawing.
＜1. first embodiment 〉
Fig. 1 is the stereogram of summary of expression substrate board treatment 1 of the present invention, Fig. 2 be expression substrate board treatment 1 main body 2 side section and represent the figure of the main composition key element that the coating action of liquid against corrosion relates to.
In Fig. 1, for the ease of illustrating and explanation, be defined as: Z-direction is represented vertical, and XY represents horizontal plane in the plane, but these are not all directions of explanation below limiting all for the ease of holding the position relation and defining.For following accompanying drawing too.
The upper surface of workbench 3 is made horizontal plane, and becomes the maintenance face 30 of substrate 90.On maintenance face 30, distribute and be formed with not shown a plurality of vacuum suction mouths, during in substrate board treatment 1, substrate 90 being handled,, thus substrate 90 is remained on the given horizontal level by substrate 90 is adsorbed.Be provided with by oscilaltion a plurality of lifter pin LP freely by not shown drive unit with proper spacing on maintenance face 30, lifter pin LP is used for when taking off substrate 90 substrate 90 upwards being boosted.
The both ends that the retaining zone (zone that keeps substrate 90) of substrate 90 in clamping in maintenance face 30 are set with a pair of running rail 31 that extends in parallel on the level of approximation direction, running rail 31 constitutes line slideway, and and the both ends of bridge formation structure 4 below the not shown back-up block that fixedly installs the moving of guide bracket bridge construction 4 (moving direction is defined as given direction) together, and bridge formation structure 4 is supported on the top of maintenance face 30.
Be provided with the bridge formation structure 4 of setting up from the two side portions level of approximation of workbench 3 above workbench 3, bridge formation structure 4 mainly constitutes as the nozzle support sector 40 of aggregate and the elevating mechanism 43,44 at its two ends of supporting by strengthen resin with for example carbon fiber.
Gap nozzle 41 is installed in nozzle support sector 40.In Fig. 1, on the gap nozzle 41 that has length direction on the Y direction, connecting resist feed mechanism 6 (Fig. 2) from liquid against corrosion to gap nozzle 41 that supply with.In addition, narrate in the back about the gap nozzle 41 and the detailed content of resist feed mechanism 6.
Elevating mechanism was opened the both sides that are arranged on gap nozzle 41 in 43,44 minutes, coupled together with gap nozzle 41 by nozzle support sector 40. Elevating mechanism 43,44 mainly is made of AC servo motor 43a, 44a and not shown ball screw.Like this, elevating mechanism 43,44 makes the synchronously lifting of gap nozzle 41 integral body.In addition, elevating mechanism 43,44 also is used to adjust the posture in the YZ plane of gap nozzle 41.
Both ends in bridge formation structure 4, edge side along the both sides of workbench 3, be set with a pair of AC respectively and do not have linear motor unshakable in one's determination (hereinafter to be referred as " linear motor ") 50,51, this linear motor 50 has retaining element (stator) 50a and moving meter 50b, and this linear motor 51 has retaining element 51a and moving meter 51b.At the both ends of bridge formation structure 4, be set with linear encoder 52,53 respectively, this linear encoder 52,53 has scale portion and detecting element respectively. Linear encoder 52,53 detects the position of linear motor 50,51.
With these linear motors 50,51 and linear encoder 52,53 is the main traveling mechanism 5 that constitutes, and this traveling mechanism 5 is used for bridge formation structure 4 being guided to running rail 31 and it being moved on workbench 3.Control part 8 is according to the action of controlling linear motor 50,51 from the testing result of linear encoder 52,53, and control bridge formation structure 4 moving on workbench 3 just controlled the scanning of 41 pairs of substrates 90 of gap nozzle.
Fig. 3 is the figure of expression gap nozzle 41 and resist feed mechanism 6, and in Fig. 3, gap nozzle 41 is expressed as the section of summary.
Like this, by the composition surface of the first main part 41a and the composition surface of the second main part 41b are bonded together, thus, be formed on the stream 410 that recess on the composition surface of the first main part 41a just becomes the liquid against corrosion in gap nozzle 41 inside.The recess that is used to form stream 410 also can be formed on the second main part 41b, also can be formed on the first main part 41a and the second main part 41b on the two.
In addition, stream 410 is at (Z) direction upper shed, this opening formation ejiction opening 411.Ejiction opening 411 extends along the length direction (Y direction) of gap nozzle 41, is slit-shaped.
At the center upper portion place of gap nozzle 41, to be connected pipe arrangement 42 with the stream 410 direct modes that are communicated with, pipe arrangement 42 is to be used for extracting the bleeding of air that are trapped in the gap nozzle 41 to use pipe arrangement.As shown in Figure 3, pipe arrangement 42 is provided with independently with pipe arrangement 63, directly is communicated with on the stream 410 in gap nozzle 41.During from gap nozzle 41 extracting airs, pipe arrangement 42 extracts air with liquid against corrosion, thereby pipe arrangement 42 also constitutes the stream of liquid against corrosion.That is, pipe arrangement 42 has the function of second stream among the present invention.
In addition, on pipe arrangement 42, be equipped with according to the valve 414 that opens and closes pipe arrangement 42 from the control signal of control part 8.In coating was handled etc., during from gap nozzle 41 ejections liquid against corrosion, valve 414 was closed.
Fig. 4 is illustrated in to make to the structure that gap nozzle 41 is supplied with the supply stream of liquid against corrosion and has carried out measured value under the situation of many variations, pressure sensor 413.First structure to the, six structures shown in Figure 4 are the structures that are equivalent to first structure to the, six structures shown in Figure 11 respectively.
As shown in Figure 4, as can be known: the difference of the measured value of pressure sensor 413 in each structure is very little, even supply with the structural change of stream, its influence is also very little.Hence one can see that, and pressure sensor 413 can be measured the actual pressure that is applied on the gap nozzle 41 (stream 410).
Turn back to Fig. 3, resist feed mechanism 6 has resist bottle 60, the pump 61 of carrying liquid against corrosion of storing liquid against corrosion, pipe arrangement 62,63 and the valve 64,65 that becomes the stream of liquid against corrosion.
In addition, pipe arrangement 63 is communicated with and is connected with the stream 410 of gap nozzle 41, is opened and closed by valve 65 as required.In addition, though omitted details in Fig. 3, in the substrate board treatment 1 in the present embodiment, pipe arrangement 63 is communicated with and is connected with the both ends of the Y direction of stream 410, and pipe arrangement 63 forms the stream of the liquid against corrosion 41 from pump 61 to gap nozzle.
That is, first stream (pipe arrangement 63) that pump 61 has via liquid against corrosion is transported to function in the stream 410 in the gap nozzle 41 with liquid against corrosion, carries out the supply of liquid against corrosion to gap nozzle 41 from the both ends of Y direction.Pipe arrangement 63 and the syndeton of stream 410 were not limited in being connected of the both ends of Y direction, and for example, also can be the structures that is connected with central portion.
The valve 64 that is installed on the pipe arrangement 62 has the function that opens and closes pipe arrangement 62.Equally, the valve 65 that is installed on the pipe arrangement 63 has the function that opens and closes pipe arrangement 63.In addition, though omitted diagram, valve 64,65 all is to be used to from the control signal of control part 8 and to open and close.
According to above-mentioned formation, resist feed mechanism 6 bases are come open and close valve 64,65 from the control signal of control part 8, and driving pump 61.Thus, the liquid against corrosion that sucks out from resist bottle 60 supplies to the stream 410 of gap nozzle 41 by pipe arrangement 62,63.In addition, supply to the liquid against corrosion of gap nozzle 41 (stream 410) by of ejiction opening 411 ejections of stream 410 backs by slit-shaped.
Turn back to Fig. 1 and Fig. 2, on the maintenance face 30 of main body 2, retaining zone (X) the direction side is provided with opening 32.Opening 32 similarly has length direction with gap nozzle 41 on Y direction, and the length of the basic length direction with gap nozzle 41 of the length of this length direction is similar to identical.In addition, the inside of the main body 2 below opening 32 is provided with nozzle initialization mechanism 7.Nozzle initialization mechanism 7 use when the preliminary treatment of before substrate 90 coatings liquid against corrosion, carrying out (narration in the back).
Fig. 5 is the detailed figure that expression is arranged on the nozzle initialization mechanism 7 in the opening 32.Nozzle initialization mechanism 7 has gas supply mechanism 71, exhaust gear 72, pre-coated mechanism 73, nozzle cleaning mechanism 74 and cleaning solution supplying mechanism 75.In addition, the position of representing with solid line in Fig. 5 with gap nozzle 41 below is called " pre-coated position ".
In substrate board treatment in the past, also be provided with the mechanism (mechanism that is equivalent to nozzle initialization mechanism 7) that in the intermittence that the substrate as product is applied processing, is used for gap nozzle is carried out initialization (cleaning etc.).To describe in detail in the back, substrate board treatment 1 in the present embodiment is used for obtaining the mechanism that applies the parameter of handling by nozzle initialization mechanism 7 is also used as, when can suppress cost thus, the correct control during the realization coating is handled and the inhibition of calculation process amount.
To be never illustrated gas bombs will supply to mechanism in the pre-coated mechanism 73 as inert gases such as nitrogen via supplying tubing 710 in nozzle initialization mechanism 7.In addition, exhaust gear 72 is the mechanisms that attract exhaust via the environment in the framework 732 of 720 pairs of pre-coated mechanisms 73 of blast pipe.Can adopt existing general known mechanism as these mechanisms, for example, exhaust gear 72 can adopt vacuum generating device or compressor to realize.
Though omitted details, rotating mechanism 730 is by the rotation motor that generates rotary driving force and transmits the mechanism that the link component etc. of this rotary driving force constitutes.The rotary driving force that is generated by this rotation motor sends roller 731 to through link component, and roller 731 just rotates along the clockwise direction among Fig. 5.
As shown in Figure 5, framework 732 is the members of approximate case shape that are set to expose from above the part of roller 731.In the inside of framework 732, store an amount of cleaning fluid of the part of the applicator surface 731a that submergence roller 731 is arranged.That is, rotating mechanism 730 makes roller 731 rotations, thereby the applicator surface 731a of roller 731 is immersed in the cleaning fluid of this storage.Rotation by roller 731 makes the part that is immersed in the cleaning fluid among the applicator surface 731a come from the cleaning fluid transfer.
Like this, in pre-coated mechanism 73, be immersed in the cleaning fluid, thereby the liquid against corrosion that will be coated on the applicator surface 731a washes by applicator surface 731a with roller 731.In addition, the mechanism as cleaning applicator surface 731a is not limited thereto, and the nozzle to applicator surface 731a ejection cleaning fluid for example also can be set in framework 732.
In the inside of framework 732, be set with scraping fluid sheet 733, scraping fluid sheet 733 has along the approximate tabular scraping blade 733a uniformly of Y direction.Under the state of the applicator surface 731a of pressing to roller 731 a little, scraping blade 733a connects equably with applicator surface 731a on Y direction.Under this state, when making roller 731 rotations, scraping blade 733a and applicator surface 731a relatively move, by scraping blade 733a scanning applicator surface 731a.In addition, general, as long as scraping blade 733a to have a service portion of removing the attachment effect (part that connects with applicator surface 731a) evenly just enough in the longitudinal direction.
So, scraping blade 733a will scrape off attached to the attachment on the applicator surface 731a (remaining liquid against corrosion or cleaning fluid etc.).As mentioned above, because scraping blade 733a connects with applicator surface 731a equably along Y direction,, can improve the uniformity of the state of applicator surface 731a so under the uniform state of Y direction, can remove attachment from applicator surface 731a.In addition, scraping blade 733a is formed by the material lower than the hardness of applicator surface 731a, specifically, is formed by resin or rubber etc.
The medial surface of the length direction of framework 732 is provided with gas vent 732a, and gas vent 732a is along the approximate uniform shape of slit of the length direction of framework 732, and becomes the inboard peristome in the hole of the side members that connects framework 732.In addition, on this through hole, be communicated with and connecting the supplying tubing 710 of gas supply mechanism 71.
According to such structure, inert gas (for example Qing Jie nitrogen) supplies to framework 732 through supplying tubing 710 from gas supply mechanism 71; The nitrogen of being supplied with sprays to the applicator surface 731a of roller 731 from gas vent 732a under the uniform state along Y direction.Thus, promote, and can improve the uniformity of the drying regime of applicator surface 731a on Y direction attached to the cleaning fluid drying on the applicator surface 731a.
The internal environment of framework 732 is deflated mechanism 72 and attracts exhaust through exhaust pipe arrangement 720 from the attraction mouth 732b on the medial surface of the length direction that is arranged on framework 732.Thus, to the solvent environment exhaust promptly of cleaning fluid, thereby promotion is attached to the drying of the cleaning fluid on the applicator surface 731a of roller 731.In the inside of framework 732, near the bottom of framework 732, the concentration of the solvent environment of cleaning fluid is just high more.Therefore, as shown in Figure 5, in the substrate board treatment 1 in the present embodiment,, like this, just can discharge the solvent composition of the inside of framework 732 expeditiously with attracting a mouthful 732b to be arranged on the low position.
At roller 731 during,, produce towards gap nozzle 41 airflow flowing in the mode of the direction of rotation of following applicator surface 731a in the inside of framework 732 around axle center 731b rotation.Here, the solvent composition of the cleaning fluid that suspending in the internal environment of framework 732 or the liquid against corrosion that is removed etc. become the pollutant of the reason of particle, and this pollutant does not preferably flow to gap nozzle 41.But the substrate board treatment 1 in the present embodiment is arranged on than on the lower position of gas vent 732a by attracting a mouthful 732b, thereby in the inside of framework 732, forms along the direction airflow flowing shown in the arrow of Fig. 5.Therefore, can prevent to comprise the ambient flow of material of the reason that becomes particle to gap nozzle 41.
The catch 734 that is arranged on the top of framework 732 is with the applicator surface 731a that approaches roller 731 (near about 1mm at interval) and becomes the tabular member that the mode of level of approximation direction disposes.According to such configuration, catch 734 will expose the environment (among Fig. 5, being present in the environment of framework 732 inside left) of the not drying nest among the applicator surface 731a and near the environment of leading section of gap nozzle 41 covers.The environment that so just can more effectively prevent to comprise cleaning fluid composition brings bad influence for the leading section of gap nozzle 41.
In addition, as shown in Figure 5, in the pre-coated mechanism 73 of substrate board treatment 1 in the present embodiment, dispose gap nozzle 41, cleaning fluid reservoir and gas vent 732a along the direction of rotation (clockwise direction among Fig. 5) of the applicator surface 731a of roller 731.
Driving mechanism 740 is to make guide pad 741 along mechanism that Y direction moves.Can adopt the general straight-line motion mechanism that has used rotation motor and ball screw as driving mechanism 740.
Upper surface at standby jar 742 is provided with the inner peristome 742a of leading section insertion that is used for gap nozzle 41, in the standby process, gap nozzle 41 moves to the given position (hereinafter referred to as " position of readiness ") that further descends along Z-direction from cleaning positions.When gap nozzle 41 was in position of readiness, the leading section of gap nozzle 41 became the state that is inserted into the inside of standby jar 742 from peristome 742a, was exposed in the solvent environment, suppressed the drying of liquid against corrosion.
Turn back to Fig. 1, control part 8 has the storage part 81 according to the various operation of data of routine processes portion 80 and save routine and various data in inside, have at front surface to be used for the operator to the operating portion 82 of the necessary indication of substrate board treatment 1 input and the display 83 of the various data of demonstration.
The RAM of temporary transient storage data, reading special-purpose ROM and disk set etc. and be equivalent to storage part 81, perhaps also can be movably recording medium such as magnetooptic disk or storage card and their reading devices etc.
Button and Switch (comprising keyboard or mouse etc.) are equivalent to operating portion 82.Perhaps also can be the parts that as touch panel, have display 83 functions concurrently.LCD or various lamps etc. are equivalent to display 83.
The explanation that more than is the 26S Proteasome Structure and Function of the substrate board treatment 1 in the present embodiment is followed, and the action of substrate board treatment 1 is described.
Fig. 6 is the flow chart of the action of expression substrate board treatment 1, when connecting power supply, carries out after the given initial setting, and substrate board treatment 1 carries out pre-coated and handles (step S11).
Fig. 7 and Fig. 8 are the detailed flow charts that the controlling value of substrate board treatment 1 obtains processing.Obtain in the processing in controlling value, at first, gap nozzle 41 moves to cleaning positions, is scanned by guide pad 741 again, carries out the cleaning treatment (step S21) to gap nozzle 41.
When cleaning treatment finished, elevating mechanism 43,44 and traveling mechanism 5 made gap nozzle 41 move to the pre-coated position, and the mensuration (step S22) of pressure sensor 66 initiation pressures.
When gap nozzle 41 moved to the pre-coated position, the rotating mechanism 730 of pre-coated mechanism 73 began to drive, and roller 731 begins rotation.Carry out simultaneously with this action, the valve 64,65 of resist feed mechanism becomes opening, and driving pump 61.When pump 61 was driven, liquid against corrosion was fed into gap nozzle 41, was coated on the applicator surface 731a of roller 731 from ejiction opening 411 ejections.
By this a series of action,, measure pressure during this by pressure sensor 66, and be sent to control part 8 by pre-coated mechanism 73 beginning pre-coated (step S23).That is the movement of the pump 61 when, driving beginning by pressure sensor 66 observations.
When also passing through preset time after step S23 begins pre-coated, resist feed mechanism 6 stops pump 61 (step S24).Thus, temporarily stop pre-coated.
The controlling value (parameter) (step S25) of the pump 61 when then, control part 8 is set the driving beginning according to the measured value that is sent to from pressure sensor 66.Though omitted detailed content,, controlling value is set for and is not taken place excessively to regulate and be stabilized in desirable ejection flow with the short as far as possible time.
In the present embodiment, the actuating speed value of using pump 61 is not limited thereto certainly as controlling value.The controlling value that control part 8 bases set is controlled the pump 61 in the coating processing described later.
Like this, by the processing of execution in step S22 to step S25, thereby control part 8 is controlled the pump 61 when substrate 90 coatings liquid against corrosion according to the measurement result of the pressure sensor 66 when pre-coated mechanism 73 applies liquid against corrosion.That is, as mentioned above, control part 8 has the function as the liquor charging control device among the present invention.
Fig. 9 is the ejection flow of illustration pump 61 and the figure of the relation of the measured value of being measured by pressure sensor 413,66,67 respectively.As can be seen from Figure 9, because the measured value of pressure fluctuates because of locating, be very important so measure which position according to purpose.
Here, because pressure sensor 66 is configured near (pipe arrangement 62) of comparison near pump 61, so can correctly observe the movement of pump 61.Therefore, substrate board treatment 1 can be defined as the controlling value to pump 61 more suitably to be worth.In order to set controlling value, repeatedly repeat the processing of step S22 when also can constitute this controlling value of change to step S24.
When setting the controlling value of pump 61, beginning is measured pressure (step S31) by pressure sensor 413, and the rotating mechanism 730 of pre-coated mechanism 73 begins to drive, and roller 731 begins rotation.Carry out simultaneously with this action, the valve 64,65 of resist feed mechanism becomes opening, and according to the controlling value driving pump of setting among the step S25 61.When pump 61 was driven, liquid against corrosion just was fed into gap nozzle 41, from ejiction opening 411 ejection and be coated on the applicator surface 731a of roller 731.
By this a series of action, the pre-coated (step S32) that beginning is undertaken by pre-coated mechanism 73 is measured pressure during this by pressure sensor 413,67, and is sent to control part 8.Because the controlling value of pump 61 is the controlling value during coating is handled in the pre-coated at this moment, the movement of the reality in the coating processing is reproduced in the movement of pump 61.
When also passing through preset time after step S32 begins pre-coated, resist feed mechanism 6 stops pump 61 (step S33), and control part 8 is set the controlling value (step S34) of traveling mechanism 5 according to the measured value of the pressure sensor during this 413.
Figure 10 is the figure of the measured value and the time relation of illustration pressure sensor 413.In Figure 10,, dot the measured value of pressure sensor 67 in order to carry out reference.In example shown in Figure 10, when being begun to measure the back by pressure sensor 413 and passing through for 0.5 (second), pump 61 begins to drive.
The measured value of pressure sensor 67 that is arranged on the primary side of gap nozzle 41 drives from pump 61 and begins to postpone to begin rising behind 18 (milliseconds); On the other hand, the measured value of pressure sensor 413 that is arranged on the secondary side of gap nozzle 41 drives from pump 61 and begins to postpone to begin rising behind 38 (milliseconds).
Liquid against corrosion from the ejiction opening 411 of gap nozzle 41 begins ejection because of the pressure in the stream 410 rises.Therefore, from the example of Figure 10 as can be known,, do not begin ejection from gap nozzle 41 in this moment even begin to rise at the pressure of the primary side of gap nozzle 41 yet.This is owing to produced crushing because of the filter (not shown) of the primary side that is arranged on gap nozzle 41 or valve 65 etc. in the supply stream.
Therefore, in the past, there is such problem: under the situation of the scanning (control traveling mechanism) of controlling gap nozzle according to the measured value of the pressure in the primary side of gap nozzle, in time, controlled, thereby precise decreasing must to compensate this delay (being the delay of 20msec in the example of Figure 10) by prediction.
But, in substrate board treatment 1,,, can correctly hold the ejection state of gap nozzle 41 so can measure the approximate value that is equivalent to the pressure of stream 410 owing to pressure sensor 413 is set at the secondary side of gap nozzle.Therefore, control part 8 can suitably be set the controlling value of the traveling mechanism 5 in the coating processing.In addition, control part 8 is in the present embodiment set the controlling value of traveling mechanism 5 along the mode of the ascending curve of the measured value of pressure sensor 413 with the rate curve of traveling mechanism 5.
When setting the controlling value of traveling mechanism 5, substrate board treatment 1 is carried out nozzle initialization process (step S35) afterwards, and the finishing control value obtains processing, turns back to processing shown in Figure 6.
Though do not explain, still, so-called nozzle initialization process at first makes gap nozzle 41 move to after cleaning positions cleans, and carries out pre-coated by pre-coated mechanism 73 and handles.This pre-coated processing is to form the processing that the liquid of liquid against corrosion accumulates near the ejiction opening 411 of gap nozzle 41.And, then, make gap nozzle 41 move to position of readiness, finish the nozzle initialization process.
Turn back to Fig. 6, when controlling value obtained the processing end, substrate board treatment 1 was with regard to standby (step S12) till moving into substrate 90; When moving into substrate 90, carry out coating and handle (step S13).
When beginning coating and handle, at first, on the position that the coating that traveling mechanism 5 moves to bridge formation structure 4 to carry out on the substrate 90 is handled, and elevating mechanism 43,44 height with gap nozzle 41 are adjusted to given height.
An end is adjusted in these positions, and 6 beginnings of resist feed mechanism are supplied with liquid against corrosion to gap nozzle 41.At this moment, control part 8 is according to the controlling value control pump of setting in step S25 61.
And then traveling mechanism 5 moves bridge formation structure 4, thereby to substrate 90 coating liquid against corrosion, promptly apply processing.At this moment, control part 8 is controlled traveling mechanism 5 according to the controlling value of setting in step S34.
When the coating processing to a substrate 90 finishes, carry out nozzle initialization process (step S14) once more, and judge whether whole substrates 90 have finished processing (step S15).And then, under the situation of the substrate 90 that also is left to handle, turn back to step S12, repeat to handle; Under the situation of the processing of having finished whole substrates 90, with regard to end process.
As described above, the pipe arrangement 63 that substrate board treatment 1 and being used for is transported to liquid against corrosion gap nozzle 41 disposes independently, and with gap nozzle 41 in the pipe arrangement 42 that directly is communicated with of stream 410 on pressure sensor 413 is set, control traveling mechanism 5 according to the measurement result of this pressure sensor 413, can correctly measure the ejection state of liquid against corrosion thus.Therefore, can correctly control traveling mechanism 5.
Traveling mechanism 5 when controlling to substrate 90 coatings liquid against corrosion according to the measurement result of the pressure sensor 413 when the pre-coated mechanism 73 coating liquid against corrosion all once be measured thereby needn't handle each coating, and can suppress the calculation process amount.
In addition, owing to have the pressure sensor 66 of the pressure of the liquid against corrosion that mensuration sent here by pump 61, and the pump 61 when controlling to substrate 90 coatings liquid against corrosion, thereby control pump 61 correctly according to the measurement result of the pressure sensor 66 when the pre-coated mechanism 73 coating liquid against corrosion.Therefore, further improved the precision that applies in handling.
In addition, be used for the secondary side stream of pressure sensor 413 being set by use, so needn't be provided for the stream of setting pressure sensor 413 in addition separately from pipe arrangement 42 conducts of gap nozzle 41 inner extracting airs.
In addition, in the above-described embodiment, though describe in detail, pressure sensor 66,67 usefulness during coating is handled act on the monitoring sensor of unusual (for example pulse etc.) of testing pump 61.Thus, substrate board treatment 1 be not provided with separately in addition detecting sensor just can detect coating in handling unusually.
＜2. second embodiment 〉
In first embodiment, obtain in the operation (step S11), not only set the controlling value of pump 61, but also set the controlling value of traveling mechanism 5 in controlling value.That is, before handling, coating also preestablished the controlling value of traveling mechanism 5.
But, handle in (step S13) in coating, also can measure by pressure sensor 413 all the time, when coating begins, to control traveling mechanism 5 with regard to the mode of following this measured value.That is, when carrying out the coating processing, it is also passable to control traveling mechanism 5 according to the measurement result of pressure sensor 413.
Even according to such formation, also can access the effect same with first embodiment.
＜3. variation 〉
More than, embodiments of the present invention have been described, but the present invention is not limited to above-mentioned embodiment, and various distortion can be arranged.
For example, in the above-described embodiment, illustrated when the processing that finishes a substrate 90 and just carried out the nozzle initialization process that still, the moment of carrying out the nozzle initialization process is not limited thereto.For example, both can when the processing of the substrate 90 that finishes given number, carry out, also can when having passed through preset time, carry out.Perhaps, also can carry out according to indication from the operator.
Each represented in above-mentioned embodiment operation all is an example, is not limited to represented content and order here, as long as can obtain same effect, and also suitable changed content and in proper order.
Claims (4)
1. substrate board treatment, it is characterized in that to the coating of substrates treatment fluid this substrate board treatment comprises:
Gap nozzle, it is provided with the stream of treatment fluid in inside, and from the ejiction opening ejection treatment fluid of described stream via slit-shaped;
Mobile device, it relatively moves the substrate and the described gap nozzle of coating treatment fluid;
Liquid feeding device, it is via the described stream transport process liquid in the described gap nozzle of first-class road direction of treatment fluid;
Second stream of treatment fluid, itself and described first stream are provided with independently, and directly are communicated with described stream in the described gap nozzle;
Pressure measuring unit, it is arranged on described second stream;
Mobile controller, its measurement result according to described pressure measuring unit is controlled described mobile device.
2. substrate board treatment as claimed in claim 1 is characterized in that,
This substrate board treatment also has the pre-coated portion of coating treatment fluid before substrate is handled,
Described mobile device when described mobile controller is controlled to the coating of substrates treatment fluid according to the measurement result of the described pressure measuring unit when the described pre-coated portion coating treatment fluid.
3. substrate board treatment as claimed in claim 2 is characterized in that, this substrate board treatment also has:
The liquor charging pressure measuring unit, it measures the pressure of the treatment fluid of being sent here by liquid feeding device;
The liquor charging control device, the described liquid feeding device when its measurement result according to the described liquor charging pressure measuring unit when the described pre-coated portion coating treatment fluid is controlled to the coating of substrates treatment fluid.
4. as each described substrate board treatment in the claim 1 to 3, it is characterized in that,
Described second stream is the pipe arrangement that is used for from the inside extracting air of described gap nozzle.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006-306663 | 2006-11-13 | ||
| JP2006306663 | 2006-11-13 | ||
| JP2006306663A JP4717782B2 (en) | 2006-11-13 | 2006-11-13 | Substrate processing equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101181706A true CN101181706A (en) | 2008-05-21 |
| CN101181706B CN101181706B (en) | 2011-09-14 |
Family
ID=39447210
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2007101399076A Active CN101181706B (en) | 2006-11-13 | 2007-08-03 | Substrate processing apparatus |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP4717782B2 (en) |
| KR (1) | KR100821063B1 (en) |
| CN (1) | CN101181706B (en) |
| TW (1) | TWI325339B (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103934158A (en) * | 2014-03-28 | 2014-07-23 | 京东方科技集团股份有限公司 | Coating device and pre-discharging control method |
| CN105457836A (en) * | 2014-09-26 | 2016-04-06 | 株式会社思可林集团 | Application apparatus and application method |
| CN110252594A (en) * | 2019-06-17 | 2019-09-20 | 深圳市曼恩斯特科技有限公司 | Coating machine and its coating method |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010034309A (en) * | 2008-07-29 | 2010-02-12 | Dainippon Screen Mfg Co Ltd | Coating apparatus and substrate processing system |
| JP2010240550A (en) * | 2009-04-03 | 2010-10-28 | Dainippon Screen Mfg Co Ltd | Apparatus for treating substrate |
| WO2010146928A1 (en) * | 2009-06-19 | 2010-12-23 | タツモ株式会社 | Substrate coating apparatus |
| CN103620220B (en) * | 2011-06-01 | 2016-01-06 | 龙云株式会社 | The flow control method of pump and coating film-forming methods |
| KR101814366B1 (en) * | 2012-02-02 | 2018-01-03 | 주식회사 케이씨텍 | Substrate treating apparatus and method thoereof using same |
| KR101924486B1 (en) * | 2012-03-09 | 2018-12-03 | 엘지디스플레이 주식회사 | Photo resist Coating system and Method thereof |
| JP6295053B2 (en) * | 2013-09-27 | 2018-03-14 | 株式会社Ｓｃｒｅｅｎホールディングス | Coating apparatus and coating method |
| JP6309407B2 (en) * | 2014-09-17 | 2018-04-11 | 東レ株式会社 | Application device, application device, and application method |
| CN114100956B (en) * | 2020-08-26 | 2023-04-18 | 湖北万度光能有限责任公司 | Application of pressure sensor in slit coating system |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6274110A (en) * | 1985-09-27 | 1987-04-04 | Toyota Motor Corp | Method and device for controlling flow rate of viscous fluid |
| JPH06226181A (en) * | 1993-01-30 | 1994-08-16 | Sumitomo Metal Ind Ltd | Slot nozzle coater type coating device |
| JP3165043B2 (en) * | 1996-09-05 | 2001-05-14 | 東レエンジニアリング株式会社 | Liquid coating device |
| JP2001062368A (en) | 1999-08-27 | 2001-03-13 | Dainippon Printing Co Ltd | Coating device and coating method |
| JP4646381B2 (en) | 2000-11-13 | 2011-03-09 | 東京エレクトロン株式会社 | Coating liquid supply device and coating device |
| JP4166465B2 (en) * | 2001-12-14 | 2008-10-15 | 三菱化学株式会社 | Coating apparatus, coating method, and coated substrate manufacturing method |
| JP2003190862A (en) * | 2001-12-28 | 2003-07-08 | Dainippon Printing Co Ltd | Coating method and coating apparatus |
| JP2005034706A (en) * | 2003-07-17 | 2005-02-10 | Dainippon Printing Co Ltd | Coating apparatus and method for filling coating liquid |
| KR100543505B1 (en) * | 2003-07-21 | 2006-01-20 | 세메스 주식회사 | System for supplying fluid to slit nozzle |
| JP4315787B2 (en) * | 2003-11-18 | 2009-08-19 | 大日本スクリーン製造株式会社 | Substrate processing apparatus, and structure for determining liquid filling degree and gas mixing degree in filling object |
-
2006
- 2006-11-13 JP JP2006306663A patent/JP4717782B2/en active Active
-
2007
- 2007-07-09 TW TW096124853A patent/TWI325339B/en active
- 2007-07-23 KR KR1020070073338A patent/KR100821063B1/en active IP Right Grant
- 2007-08-03 CN CN2007101399076A patent/CN101181706B/en active Active
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103934158A (en) * | 2014-03-28 | 2014-07-23 | 京东方科技集团股份有限公司 | Coating device and pre-discharging control method |
| CN103934158B (en) * | 2014-03-28 | 2016-05-11 | 京东方科技集团股份有限公司 | A kind of apparatus for coating and tell in advance control method |
| CN105457836A (en) * | 2014-09-26 | 2016-04-06 | 株式会社思可林集团 | Application apparatus and application method |
| CN110252594A (en) * | 2019-06-17 | 2019-09-20 | 深圳市曼恩斯特科技有限公司 | Coating machine and its coating method |
Also Published As
| Publication number | Publication date |
|---|---|
| JP4717782B2 (en) | 2011-07-06 |
| TW200821047A (en) | 2008-05-16 |
| CN101181706B (en) | 2011-09-14 |
| TWI325339B (en) | 2010-06-01 |
| JP2008119607A (en) | 2008-05-29 |
| KR100821063B1 (en) | 2008-04-08 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN101181706B (en) | Substrate processing apparatus | |
| US9126280B2 (en) | Print head for stencil printer | |
| TWI399822B (en) | Substrate processing apparatus | |
| CN1321748C (en) | Substrate processing device | |
| CN102161027B (en) | Cleaning device and coating device for slit nozzle | |
| CN102671835B (en) | Coating film forming method and coating film forming device | |
| JP4809699B2 (en) | Coating method and coating apparatus | |
| TW528618B (en) | Coating apparatus | |
| JP3048789B2 (en) | Fluid coating device | |
| CN110291460B (en) | Apparatus and method for cleaning localized areas of a substrate | |
| CN108325788A (en) | Applying device and coating method | |
| JP4184124B2 (en) | Substrate processing equipment | |
| JPH09206657A (en) | Equipment and method for coating | |
| JP2005324123A (en) | Coating apparatus with cleaning device | |
| JP2013071112A (en) | Coating liquid coating apparatus | |
| JP5160953B2 (en) | Pre-coating device, coating device and cleaning method for pre-coating device | |
| JP7312204B2 (en) | NOZZLE CLEANING DEVICE, NOZZLE CLEANING METHOD, AND COATING DEVICE | |
| JP2003126749A (en) | Coating apparatus and coating method | |
| CN117427803A (en) | Control parameter adjustment method and storage medium | |
| JPH11207228A (en) | Adhesive applicator | |
| JP6110531B2 (en) | Coating liquid coating device | |
| JP2021194590A (en) | Liquid discharging device and liquid discharging method | |
| JP2004113958A (en) | Polymer film formation apparatus | |
| JP2010250199A (en) | Film forming apparatus and method of forming film | |
| JP2007330923A (en) | Solution-feeding device and feeding method |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C56 | Change in the name or address of the patentee |
Owner name: SCREEN GROUP CO., LTD. Free format text: FORMER NAME: DAINIPPON SCREEN MFG. CO., LTD. Owner name: DAINIPPON SCREEN MFG. CO., LTD. Free format text: FORMER NAME: DAINIPPON MESH PLATE MFR. CO., LTD. |
|
| CP01 | Change in the name or title of a patent holder |
Address after: Kyoto City, Kyoto, Japan Patentee after: Skilling Group Address before: Kyoto City, Kyoto, Japan Patentee before: DAINIPPON SCREEN MFG Co.,Ltd. Address after: Kyoto City, Kyoto, Japan Patentee after: DAINIPPON SCREEN MFG Co.,Ltd. Address before: Kyoto City, Kyoto, Japan Patentee before: Dainippon Screen Mfg. Co.,Ltd. |