JP2005324123A - Coating apparatus with cleaning device - Google Patents

Coating apparatus with cleaning device Download PDF

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JP2005324123A
JP2005324123A JP2004144669A JP2004144669A JP2005324123A JP 2005324123 A JP2005324123 A JP 2005324123A JP 2004144669 A JP2004144669 A JP 2004144669A JP 2004144669 A JP2004144669 A JP 2004144669A JP 2005324123 A JP2005324123 A JP 2005324123A
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cleaning
nozzle
slit
fluid
coating
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JP4487628B2 (en
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Yasuhiro Mitsui
康裕 三井
Hideo Awakawa
英生 淡河
Takashi Yamaguchi
剛史 山口
Takeshi Ikeda
武司 池田
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Toppan Inc
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Toppan Printing Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a coating apparatus with a cleaning device in which dried stuck foreign matter on the tip of a lip is completely removed with a small quantity of a cleaning liquid chemical and longitudinal stripe irregularity caused by the residue of the cleaning liquid chemical is not caused. <P>SOLUTION: In the coating apparatus with the cleaning device, the cleaning device is provided with: a cleaning head composed of a cleaning part in which two lines of two fluid cleaning nozzle arrangements 20' for jetting two fluids of the cleaning liquid chemicals 60 and 62 mixed with an inert gas 44 to the outside of the tips 16 of both side lips is adjacently arranged parallel in the width direction across the outside of the tips of both side lips and an exhaust part 26 for forcibly exhausting produced cleaning mist; and a driving part 70 for moving the cleaning head in the width direction of a slit like nozzle. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明は、液晶ディスプレイ用のカラーフィルタのような、角型ガラス基板に高精度の塗布膜を形成するためのダイヘッドを構成するスリット状ノズルの両側リップの先端を洗浄する洗浄装置を具備する洗浄装置付塗布装置に関する。   The present invention provides a cleaning device including a cleaning device for cleaning the tip of both lips of a slit-like nozzle constituting a die head for forming a highly accurate coating film on a square glass substrate, such as a color filter for a liquid crystal display. The present invention relates to a coating apparatus with a device.

例えば、液晶ディスプレイなどに用いられるカラーフィルタの製造方法の一つに、以下に述べる顔料分散法がある。この製造方法は、まず、ウェット洗浄したガラス基板上に、予め顔料を分散させた感光性材料を塗布する。次いで、減圧乾燥・プレベーク等を行いある程度塗布膜を乾燥させる。次いで、一定のパターンを有するフォトマスクを介して一定波長の光を照射して塗布膜に露光する。次いで、ガラス基板を現像液に浸漬させて一定のパターンを形成し、最終的にポストベーク装置にて形成したパターンを硬化させる。以上の工程を数回繰り返す事で、数色のカラーパターンを有するカラーフィルタを得る、といった製造方法である。   For example, one of the methods for producing a color filter used for a liquid crystal display or the like is a pigment dispersion method described below. In this manufacturing method, first, a photosensitive material in which a pigment is dispersed in advance is applied onto a wet-cleaned glass substrate. Next, the coating film is dried to some extent by drying under reduced pressure, pre-baking or the like. Next, the coating film is exposed by irradiating light of a certain wavelength through a photomask having a certain pattern. Next, the glass substrate is immersed in a developer to form a certain pattern, and finally the pattern formed by the post-baking apparatus is cured. This is a manufacturing method in which a color filter having several color patterns is obtained by repeating the above steps several times.

上記製造方法において、感光性材料をガラス基板上に塗布する方式として、従来は基板中央に感光性材料を一定量滴下し、その後基板を一定速度で回転させることで液を薄く均一に塗り広げる、所謂スピンコート方式が一般的であった。しかしながら、この方式は材料を多量に使用するという点や、回転時に遠心力の小さい基板中心部が厚膜化するという点で問題となっていた。そこで、それらの欠点を補い、且つ基板の大型化にも対応しやすい塗布方式として近年主流になりつつあるのが、ダイヘッドのスリット状ノズルを用いて基板全面をある程度の膜厚で塗布し、その後回転させて所望の膜厚を得るスリットダイ＆スピン方式や、ダイヘッドのスリット状ノズルを用いて基板全面に所望の膜厚を直接、薄膜に塗布するスリットダイ方式である。   In the above manufacturing method, as a method of applying the photosensitive material on the glass substrate, conventionally, a certain amount of the photosensitive material is dropped on the center of the substrate, and then the substrate is rotated at a constant speed to spread the liquid thinly and uniformly. A so-called spin coating method was common. However, this method has a problem in that a large amount of material is used and the central part of the substrate having a small centrifugal force is thickened during rotation. Therefore, in recent years, as a coating method that compensates for these drawbacks and is easy to cope with an increase in the size of the substrate, the entire surface of the substrate is coated with a certain thickness using the slit-shaped nozzle of the die head, and thereafter There are a slit die & spin method in which a desired film thickness is obtained by rotating, and a slit die method in which a desired film thickness is directly applied to a thin film using a slit-like nozzle of a die head.

しかしながら、上記方式において、基板上に塗布する際にスリット状ノズルのリップ先端部に感光性材料が乾燥して固着し、それが塗布と同時に剥がれ落ちて基板上に異物となって残ってしまったり、その乾燥固着した異物が原因で塗布時に縦筋状のムラが発生してしまうといったことが大きな問題となっていた。
上記問題の解決策として、長方形状の噴出口から洗浄薬液と不活性ガスを混合した２流体が扇状に噴出する洗浄ノズルを複数個配列した洗浄ヘッドを用いて、スリット状ノズルのリップの先端全幅を一度に洗浄する方法がある（例えば、特許文献１参照）。また、洗浄薬液のみの１流体を噴出する洗浄ノズルを持つ洗浄ブロックを、スリット状ノズル幅方向に移動させながら洗浄する方法がある（例えば、特許文献２参照）。
特開２００２−３５５５９６号公報 特開平１１−７４１７９号公報 However, in the above system, the photosensitive material dries and adheres to the lip tip of the slit-shaped nozzle when applied on the substrate, and it peels off at the same time as the application and remains as a foreign substance on the substrate. A major problem is that vertical streaks occur during application due to the dried and adhered foreign matter.
As a solution to the above problem, using a cleaning head in which a plurality of cleaning nozzles in which two fluids mixed with a cleaning chemical and inert gas are ejected in a fan shape from a rectangular outlet, the entire width of the tip of the lip of the slit nozzle There is a method of cleaning at a time (for example, see Patent Document 1). There is also a method of cleaning a cleaning block having a cleaning nozzle that ejects only one cleaning chemical solution while moving it in the slit-shaped nozzle width direction (see, for example, Patent Document 2).
JP 2002-355596 A JP-A-11-74179

しかしながら、前記２流体による洗浄方式では洗浄ヘッドがスリット状ノズル幅方向に長いため、洗浄ノズルの位置によって洗浄薬液と不活性ガスのバランスが微妙に変化してしまい、洗浄が不均一になってしまう。また、２流体の噴出口が長方形状のため洗浄打力がやや弱く、従ってスリット状ノズルのリップ先端の乾燥固着異物を完全に除去するためには洗浄薬液が大量に必要である。このために乾燥性が悪くなり、それが塗布時に洗浄薬液残りに起因する縦筋ムラを発生させる原因となる。   However, in the cleaning method using the two fluids, since the cleaning head is long in the slit-shaped nozzle width direction, the balance between the cleaning chemical and the inert gas slightly changes depending on the position of the cleaning nozzle, resulting in uneven cleaning. . In addition, since the two-fluid jet outlet is rectangular, the cleaning hitting force is slightly weak. Therefore, a large amount of cleaning chemical is required to completely remove the dry fixed foreign matter at the lip end of the slit nozzle. For this reason, the drying property is deteriorated, and this causes the vertical stripe unevenness due to the remaining cleaning chemical at the time of application.

また、前記１流体による洗浄方式では、移動式であるためスリット状ノズル幅方向の洗浄の均一性は高いものの、洗浄薬液のみの１流体による洗浄のため、やはり洗浄打力が弱く、従ってスリット状ノズルのリップ先端の乾燥固着異物を完全に除去するためには洗浄薬液が大量に必要であり、上記２流体による洗浄方式と同様に乾燥性が悪くなる。   In addition, although the cleaning method using one fluid is movable, the cleaning uniformity in the slit-shaped nozzle width direction is high, but the cleaning hitting force is still weak because of the cleaning using only one cleaning chemical solution. A large amount of cleaning chemical is required to completely remove the dry fixed foreign matter at the tip of the lip of the nozzle, and the drying property is deteriorated as in the cleaning method using the two fluids.

本発明は、かかる従来技術の問題点を解決するものであり、その課題とするところは、ダイヘッドのスリット状ノズルの両側リップ先端を洗浄する装置を具備する洗浄装置付塗布装置において、スリット状ノズルの幅方向で洗浄の均一性を高く、洗浄打力を強く洗浄を行い、従って少量の洗浄薬液でリップ先端の乾燥固着異物を完全に除去することができ、且つ乾燥性の非常に良い洗浄を行い、洗浄薬液残りに起因する縦筋ムラが発生することのない洗浄装置付塗布装置を提供することにある。
この洗浄装置付塗布装置を用いることにより、製品の歩留まり向上、及び洗浄薬液の使用量の削減を図ることが可能となり大幅なコストダウンに寄与する。 The present invention solves the problems of the prior art, and the object of the present invention is to provide a slit-shaped nozzle in a coating device with a cleaning device including a device for cleaning both lip tips of the slit-shaped nozzle of a die head. Highly uniform cleaning in the width direction, strong cleaning force, and therefore, a small amount of cleaning chemicals can completely remove dry fixed foreign matter from the tip of the lip. It is an object of the present invention to provide a coating apparatus with a cleaning device that does not cause vertical stripe unevenness due to the cleaning chemical liquid residue.
By using this coating device with a cleaning device, it is possible to improve the yield of products and reduce the amount of cleaning chemicals used, which contributes to a significant cost reduction.

本発明は、ダイヘッドを構成するスリット状ノズルの両側リップの先端を洗浄する洗浄装置を具備する洗浄装置付塗布装置において、該洗浄装置は、前記両側リップの先端外側に洗浄薬液と不活性ガスを混合した２流体を噴出する複数個の２流体洗浄ノズルを前記スリット状ノズルの幅方向に配列されてなる、２流体洗浄ノズル配列の２配列が、前記両側リップの先端外側を挟みこむようにスリット状ノズルの幅方向に平行に近設されている洗浄部と、該洗浄部の下方に発生した洗浄ミストを強制排気する排気部とで構成される洗浄ヘッドと、該洗浄ヘッドを前記スリット状ノズルの幅方向に移動させる駆動部を具備することを特徴とする洗浄装置付塗布装置である。   The present invention relates to a coating apparatus with a cleaning device comprising a cleaning device for cleaning the tips of both side lips of a slit-shaped nozzle constituting a die head, wherein the cleaning device applies a cleaning chemical solution and an inert gas to the outside of the tips of both side lips. A plurality of two-fluid cleaning nozzles that eject two mixed fluids are arranged in the width direction of the slit-shaped nozzles, and two arrays of two-fluid cleaning nozzles are slit-shaped so as to sandwich the outer ends of the lips on both sides. A cleaning head composed of a cleaning unit arranged in parallel with the width direction of the nozzle, and an exhaust unit for forcibly exhausting the cleaning mist generated below the cleaning unit; A coating device with a cleaning device, comprising a drive unit that moves in a width direction.

また、本発明は、上記発明による洗浄装置付塗布装置において、前記洗浄ヘッドが、少なくとも前記洗浄部の逆前進方向側に、前記スリット状ノズルの幅方向を短手方向とする不活性ガスを噴出するパ−ジスリットを持つ乾燥部を有することを特徴とする洗浄装置付塗布装置である。   In the coating apparatus with a cleaning device according to the present invention, the cleaning head injects an inert gas having a width direction of the slit-like nozzle as a short direction at least on the reverse advance side of the cleaning unit. A coating device with a cleaning device, comprising a drying section having a purge slit.

また、本発明は、上記発明による洗浄装置付塗布装置において、前記２流体洗浄ノズルには、２流体洗浄ノズルの配列位置によって複数種類の異なる洗浄薬液を供給することが可能であることを特徴とする洗浄装置付塗布装置である。   Further, the present invention is characterized in that in the coating apparatus with a cleaning device according to the above invention, the two-fluid cleaning nozzle can be supplied with a plurality of different types of cleaning chemicals depending on the arrangement position of the two-fluid cleaning nozzle. It is a coating device with a cleaning device.

また、本発明は、上記発明による洗浄装置付塗布装置において、前記２流体洗浄ノズルの噴出口の形状は円形で、その直径は１ｍｍ〜２ｍｍの範囲であり、噴出角度は１０°〜１５°の範囲であることを特徴とする洗浄装置付塗布装置である。   Further, the present invention is the coating apparatus with a cleaning device according to the above invention, wherein the shape of the jet port of the two-fluid cleaning nozzle is circular, the diameter is in the range of 1 mm to 2 mm, and the jet angle is 10 ° to 15 °. It is a coating device with a cleaning device characterized by being in a range.

以上詳細に記述してきたように、本発明による洗浄装置付塗布装置によれば、以下のような効果を得ることができる。
すなわち、前記請求項１の発明によれば、ダイヘッドのスリット状ノズルのリップ先端を洗浄薬液と不活性ガスを混合した２流体を噴出しつつスリット状ノズル幅方向に移動させながら洗浄するため、非常に均一性が高く、更に打力の強い洗浄が可能となる。従って、少量の洗浄薬液でもスリット状ノズルのリップ先端の乾燥固着異物を完全に除去する事ができるため、洗浄薬液の使用量を削減する事ができる。 As described above in detail, according to the coating apparatus with a cleaning device of the present invention, the following effects can be obtained.
That is, according to the first aspect of the invention, the lip tip of the slit nozzle of the die head is cleaned while being moved in the slit nozzle width direction while ejecting two fluids mixed with a cleaning chemical and an inert gas. In addition, it is possible to perform cleaning with high uniformity and higher striking force. Accordingly, the dry fixed foreign matter at the lip end of the slit-like nozzle can be completely removed even with a small amount of the cleaning chemical solution, so that the amount of the cleaning chemical solution used can be reduced.

また、前記請求項２の発明によれば、前記洗浄ヘッドの片端若しくは両端に設けたスリットより不活性ガスを噴出しながら洗浄を行う事により、洗浄後のスリット状ノズルのリップ先端の乾燥性を格段に良くする事ができ、洗浄薬液残りに起因する塗布時の縦筋ムラ
を無くす事ができる。 Further, according to the invention of claim 2, by performing cleaning while jetting an inert gas from a slit provided at one or both ends of the cleaning head, the drying property of the lip tip of the slit-shaped nozzle after cleaning is improved. It can be remarkably improved, and vertical stripe unevenness at the time of application due to the remaining cleaning chemical solution can be eliminated.

また、前記請求項３の発明によれば、例えばスリット状ノズルを先に洗浄する配列位置にある２流体洗浄ノズルには洗浄能力の高い洗浄薬液を接続し、後から洗浄する配列位置にある２流体洗浄ノズルには乾燥性の高い洗浄薬液を接続する事によって、乾燥性の非常に良い洗浄を行う事ができ、洗浄薬液残りに起因する塗布時の縦筋ムラを無くす事ができる。   According to the third aspect of the present invention, for example, the two-fluid cleaning nozzle in the arrangement position where the slit-shaped nozzle is first cleaned is connected to the cleaning chemical solution having a high cleaning capability, and the second cleaning position is in the arrangement position where cleaning is performed later. By connecting a cleaning chemical solution having high drying property to the fluid cleaning nozzle, it is possible to perform cleaning with very good drying property, and it is possible to eliminate vertical stripe unevenness at the time of application due to the remaining cleaning chemical solution.

また、前記請求項４の発明によれば、２流体洗浄ノズルの噴出口を直径１ｍｍ〜２ｍｍの範囲の円形状で、尚且つ噴出時にその角度が１０°〜１５°の範囲に設定することで、洗浄打力が強く、且つ周囲に２流体ミストが飛散せず汚染の少ない洗浄を行う事ができる。   According to the fourth aspect of the present invention, the jet outlet of the two-fluid cleaning nozzle has a circular shape with a diameter of 1 mm to 2 mm, and the angle thereof is set within a range of 10 ° to 15 ° at the time of jetting. The cleaning striking force is strong, and the two-fluid mist does not scatter around and can be cleaned with little contamination.

以下に、本発明の実施形態を一実施例により詳細に説明する。
図１は、本発明による洗浄装置付塗布装置の一実施例における洗浄装置と、スリット状ノズルを示した説明図である。また、図２は、洗浄装置を構成する洗浄ヘッドの説明図である。 Hereinafter, an embodiment of the present invention will be described in detail by way of an example.
FIG. 1 is an explanatory view showing a cleaning device and a slit nozzle in an embodiment of a coating apparatus with a cleaning device according to the present invention. Moreover, FIG. 2 is explanatory drawing of the washing | cleaning head which comprises a washing | cleaning apparatus.

図１に示すように、洗浄装置は、洗浄ヘッド（２１）と駆動部としての直動ユニット（７０）で構成され、スリット状ノズル（１）の下方に設けられている。洗浄ヘッド（２１）はモーター駆動による直動ユニット（７０）に固定されている。洗浄ヘッド（２１）は、直動ユニット（７０）の駆動により、白太矢印で示すスリット状ノズル（１）の幅方向を図１中、符号Ｉで示す位置から符号Ｊで示す位置へ移動しながら、洗浄薬液と不活性ガスを混合した２流体を噴出させスリット状ノズルの両側リップの先端を洗浄する。   As shown in FIG. 1, the cleaning apparatus includes a cleaning head (21) and a linear motion unit (70) as a drive unit, and is provided below the slit-like nozzle (1). The cleaning head (21) is fixed to a linear motion unit (70) driven by a motor. The cleaning head (21) moves the width direction of the slit-like nozzle (1) indicated by the white thick arrow from the position indicated by the symbol I in FIG. 1 to the position indicated by the symbol J by driving the linear motion unit (70). Then, two fluids mixed with a cleaning chemical and an inert gas are jetted to clean the tips of both lips of the slit nozzle.

図２に示す一実施例においては、洗浄ヘッド（２１）は、２流体洗浄ノズル配列（２０’）の２配列からなる洗浄部と、一対の乾燥部（２８）と、排気部とで構成されている。２流体洗浄ノズル配列（２０’）には３個の２流体洗浄ノズル（２０）が配列されている。
２流体洗浄ノズル（２０）の配列は、スリット状ノズルの幅方向に平行に、両側リップの先端外側に近接して、その先端外側を挟みこむように配列されている。 In the embodiment shown in FIG. 2, the cleaning head (21) is composed of a cleaning section comprising two arrays of two-fluid cleaning nozzle arrays (20 ′), a pair of drying sections (28), and an exhaust section. ing. Three two-fluid cleaning nozzles (20) are arranged in the two-fluid cleaning nozzle array (20 ′).
The two-fluid cleaning nozzle (20) is arranged in parallel with the width direction of the slit-like nozzle so as to be close to the outer ends of the lips on both sides and sandwich the outer ends thereof.

また、この一実施例で示す洗浄ヘッド（２１）の乾燥部（２８）は、台座（２９）の斜め切欠部のある側壁に内蔵されており、パ−ジスリット（２２）から不活性ガスを噴出する。
また、洗浄ヘッド（２１）は、洗浄部の下方に発生した洗浄ミストを強制排気する排気部として排気ダクト（２６）を備えている。尚、符号２７は２流体噴出口を示している。 Further, the drying section (28) of the cleaning head (21) shown in this embodiment is built in the side wall of the pedestal (29) with the oblique cutout, and the inert gas is ejected from the purge slit (22). To do.
Further, the cleaning head (21) includes an exhaust duct (26) as an exhaust unit for forcibly exhausting the cleaning mist generated below the cleaning unit. Reference numeral 27 denotes a two-fluid ejection port.

図３に示すように、スリット状ノズル（１）には塗布液を貯留しておくためのマニホールド（２）が設けられており、塗布液（１３）はスリット（３）を通過して外部に吐出される。塗布液（１３）をスリット状ノズル（１）に供給するための塗布液タンク（１２）はボールバルブ（１０）を開く事で、クリーンエアー（１１）により加圧される。クリーンエアー（１１）の圧力の調整は減圧弁（９）と圧力計（８）によって行い、圧力計（８）と塗布液タンク（１２）の間には異物を捕集するためのフィルター（７）が設けられている。   As shown in FIG. 3, the slit-like nozzle (1) is provided with a manifold (2) for storing a coating solution, and the coating solution (13) passes through the slit (3) to the outside. Discharged. The coating liquid tank (12) for supplying the coating liquid (13) to the slit nozzle (1) is pressurized by clean air (11) by opening the ball valve (10). The pressure of the clean air (11) is adjusted by the pressure reducing valve (9) and the pressure gauge (8), and a filter (7 for collecting foreign matter between the pressure gauge (8) and the coating liquid tank (12) (7). ) Is provided.

塗布液（１３）は、エアーオペレートバルブ（５）を開く事でスリット状ノズル（１）へ供給される。塗布液タンク（１２）とエアーオペレートバルブ（５）との間には、異物を捕集するための１次フィルター（６）が、エアーオペレートバルブ（５）とスリット状
ノズル（１）の間には、２次フィルター（４）がそれぞれ設けられている。
塗布液（１３）をスリット（３）から外部に吐出する際に、リップ先端（１６）には塗布液（１３）が回り込んで付着し、これが乾燥固化して異物（１４）となる。また、この異物（１４）を洗浄除去する際に乾燥性が悪いと毛細管現象によりスリット（３）内部に洗浄薬液（１５）が進入し、これが塗布する際に塗布液に混入して縦筋ムラが発生する。 The coating liquid (13) is supplied to the slit nozzle (1) by opening the air operated valve (5). Between the coating liquid tank (12) and the air operated valve (5), a primary filter (6) for collecting foreign matter is interposed between the air operated valve (5) and the slit-like nozzle (1). Are each provided with a secondary filter (4).
When the coating liquid (13) is discharged from the slit (3) to the outside, the coating liquid (13) wraps around and adheres to the lip tip (16), which is dried and solidified to become foreign matter (14). Further, when the foreign matter (14) is washed and removed, if the drying property is poor, the cleaning chemical solution (15) enters the slit (3) due to a capillary phenomenon, and when this is applied, the cleaning chemical solution (15) is mixed into the coating solution and becomes uneven in vertical stripes. Occurs.

図４に示すように、本発明の洗浄ヘッド（２１）は、洗浄薬液供給口（２３）と２流体用不活性ガス供給口（２５）と２流体噴出口（２７）を持つ２流体洗浄ノズル（２０）を３個配列した２流体洗浄ノズル配列（２０’）を、スリット状ノズル（１）の幅方向に対向して２配列有し、また、台座（２９）の斜め切欠部のある側壁には乾燥部（２８）が内蔵され、斜め切欠部面には洗浄後のリップ先端を乾燥させるための、スリット状ノズルの幅方向を短手方向とする不活性ガスを噴出するパージスリット（２２）が設けられている。
更に下方には２流体ミストを排出するための排気ダクト（２６）を排気部として備えている。パージスリット（２２）は側壁に内蔵した乾燥部（２８）及びパージ用不活性ガス供給口（２４）に接続されている。 As shown in FIG. 4, the cleaning head (21) of the present invention has a two-fluid cleaning nozzle having a cleaning chemical solution supply port (23), a two-fluid inert gas supply port (25), and a two-fluid ejection port (27). (2) Two-fluid cleaning nozzle array (20 ') in which three (20) are arrayed are arranged opposite to each other in the width direction of the slit-shaped nozzle (1), and the side wall having the oblique cutout portion of the base (29) Has a built-in drying section (28), and a purge slit (22) for injecting an inert gas with the width direction of the slit-shaped nozzle as a short direction for drying the lip tip after cleaning on the oblique notch surface. ) Is provided.
Further below, an exhaust duct (26) for discharging the two-fluid mist is provided as an exhaust part. The purge slit (22) is connected to a drying section (28) built in the side wall and a purge inert gas supply port (24).

２流体洗浄ノズル（２０）への不活性ガス（４４）の供給は、ボールバルブ（４５）を開き、且つエアーオペレートバルブ（４３）を開く事によってなされる。流量の調整は流量調整バルブ（４２）によって行い、その時の流量値は流量計（４１）に表示される。
パージ用不活性ガス供給口（２４）への不活性ガス（４４）の供給は、ボールバルブ（４５）を開き且つエアーオペレートバルブ（４０）を開く事によってなされる。流量の調整は流量調整バルブ（３９）によって行い、その時の流量値は流量計（３８）に表示される。２流体洗浄ノズル（２０）及びパージスリット（２２）へ供給する不活性ガス（４４）の圧力は、減圧弁（４６）によって調整し、その時の圧力値は圧力計（４７）に表示される。エアーオペレートバルブ（４０）及び（４３）と圧力計（４７）の間には異物を捕集するためのフィルター（４８）が設けられている。 The inert gas (44) is supplied to the two-fluid cleaning nozzle (20) by opening the ball valve (45) and opening the air operated valve (43). The flow rate is adjusted by the flow rate adjusting valve (42), and the flow rate value at that time is displayed on the flow meter (41).
The inert gas (44) is supplied to the purge inert gas supply port (24) by opening the ball valve (45) and opening the air operated valve (40). The flow rate is adjusted by the flow rate adjusting valve (39), and the flow rate value at that time is displayed on the flow meter (38). The pressure of the inert gas (44) supplied to the two-fluid cleaning nozzle (20) and the purge slit (22) is adjusted by the pressure reducing valve (46), and the pressure value at that time is displayed on the pressure gauge (47). A filter (48) for collecting foreign substances is provided between the air operated valves (40) and (43) and the pressure gauge (47).

洗浄ヘッド（２１）の内部に溜まったミスト状排液は、強制排気装置（５０）によって排気ダクト（２６）を通って外部に排出される。排出されたミスト排液は１次排液トラップタンク（４９）にて捕集され、更に強制排気装置（５０）内部を通って、２次排液トラップタンク（５１）にて再度完全に捕集される。
図４で示すように、例えば、スリット状ノズル（１）の幅方向に３個づつ並列に対向して２流体洗浄ノズル（２０）が配列されている場合、スリット状ノズル（１）のリップ先端部を先に洗浄する配列位置にある２つの洗浄ノズルからは洗浄性の高い洗浄薬液（６２）と不活性ガス（４４）を混合した２流体を噴出し、スリット状ノズル（１）を後から洗浄する配列位置にある１つの２流体洗浄ノズルからは乾燥性の高い洗浄薬液（６０）と不活性ガス（４４）を混合した２流体を噴出するようにする。 The mist-like drainage liquid accumulated in the cleaning head (21) is discharged to the outside through the exhaust duct (26) by the forced exhaust device (50). The discharged mist drainage is collected in the primary drainage trap tank (49), and further completely collected again in the secondary drainage trap tank (51) through the forced exhaust device (50). Is done.
As shown in FIG. 4, for example, when two fluid cleaning nozzles (20) are arranged in parallel in the width direction of the slit nozzle (1), three lip tips of the slit nozzle (1) The two cleaning nozzles at the position where the part is cleaned first ejects two fluids, which are a mixture of a cleaning chemical solution (62) and an inert gas (44) with high cleaning properties, and the slit nozzle (1) is later Two fluids, which are a mixture of a cleaning chemical solution (60) having a high drying property and an inert gas (44), are ejected from one two-fluid cleaning nozzle located at the cleaning position.

洗浄性の高い洗浄薬液（６２）を２流体洗浄ノズル（２０）へ供給するための洗浄薬液タンク（６１）はボールバルブ（５３）を開き、エアーオペレートバルブ（５８）を開く事で、クリーンエアー（５２）により加圧され、エアーオペレートバルブ（３３）を開く事で２流体洗浄ノズル（２０）へ供給される。洗浄性の高い洗浄薬液（６２）の流量の調整は流量調整バルブ（３１）によって行い、その時の流量値は流量計（３０）に表示される。流量調整バルブ（３１）とエアーオペレートバルブ（３３）の間には異物を捕集するためのフィルター（３２）が設けられている。   The cleaning chemical liquid tank (61) for supplying the cleaning chemical liquid (62) having a high detergency to the two-fluid cleaning nozzle (20) opens the ball valve (53) and opens the air operated valve (58). The air is pressurized by (52) and is supplied to the two-fluid cleaning nozzle (20) by opening the air operated valve (33). The flow rate of the cleaning chemical solution (62) having high detergency is adjusted by the flow rate adjusting valve (31), and the flow rate value at that time is displayed on the flow meter (30). A filter (32) for collecting foreign substances is provided between the flow rate adjusting valve (31) and the air operated valve (33).

乾燥性の高い洗浄薬液（６０）を２流体洗浄ノズル（２０）へ供給するための洗浄薬液タンク（５９）はボールバルブ（５３）を開き、エアーオペレートバルブ（５７）を開く事で、クリーンエアー（５２）により加圧され、エアーオペレートバルブ（３７）を開く
事で２流体洗浄ノズル（２０）へ供給される。乾燥性の高い洗浄薬液（６０）の流量の調整は流量調整バルブ（３５）によって行い、その時の流量値は流量計（３４）に表示される。流量調整バルブ（３５）とエアーオペレートバルブ（３７）の間には異物を捕集するためのフィルター（３６）が設けられている。 The cleaning chemical solution tank (59) for supplying the cleaning chemical solution (60) having high drying property to the two-fluid cleaning nozzle (20) opens the ball valve (53) and opens the air operated valve (57), thereby providing clean air. The air is pressurized by (52) and supplied to the two-fluid cleaning nozzle (20) by opening the air operated valve (37). The flow rate of the cleaning chemical solution (60) having a high drying property is adjusted by the flow rate adjusting valve (35), and the flow rate value at that time is displayed on the flow meter (34). A filter (36) for collecting foreign substances is provided between the flow rate adjusting valve (35) and the air operated valve (37).

洗浄薬液タンク（５９）と洗浄薬液タンク（６１）を加圧するためのクリーンエアー（５２）の圧力は、減圧弁（５４）によって調整し、その時の圧力値は圧力計（５５）に表示される。エアーオペレートバルブ（５７）及び（５８）と圧力計（５５）の間には異物を捕集するためのフィルター（５６）が設けられている。   The pressure of clean air (52) for pressurizing the cleaning chemical liquid tank (59) and the cleaning chemical liquid tank (61) is adjusted by the pressure reducing valve (54), and the pressure value at that time is displayed on the pressure gauge (55). . A filter (56) for collecting foreign matter is provided between the air operated valves (57) and (58) and the pressure gauge (55).

以下に、本発明の洗浄装置付塗布装置を用いた塗布作業の実施例を詳細に説明する。
液晶ディスプレイ用カラーフィルタの製造工程において、感光性材料をダイヘッドのスリット状ノズルにより塗布した際に、スリット状ノズルの両側リップ先端を洗浄する場合を説明する。
塗布する感光性材料は樹脂ブラックレジストを用い、洗浄性の高い洗浄薬液としてＮＭＰ（Ｎ−メチル−２−ピロリドン）を、乾燥性の高い洗浄薬液としてアセトンを使用した。また、２流体及びパージ用の不活性ガスは窒素を使用した。塗布膜を形成するガラス基板として、サイズ６８０ｍｍ×８８０ｍｍ、厚さ０．７ｍｍのものを用いた。 Below, the Example of the application | coating operation | work using the coating device with a washing | cleaning apparatus of this invention is described in detail.
In the manufacturing process of the color filter for liquid crystal display, a case will be described in which when the photosensitive material is applied by the slit-like nozzle of the die head, both lip tips of the slit-like nozzle are washed.
As the photosensitive material to be applied, a resin black resist was used, NMP (N-methyl-2-pyrrolidone) was used as a cleaning chemical solution having a high cleaning property, and acetone was used as a cleaning chemical solution having a high drying property. Nitrogen was used for the two fluids and the inert gas for purging. A glass substrate having a size of 680 mm × 880 mm and a thickness of 0.7 mm was used as the glass substrate on which the coating film was formed.

２流体洗浄ノズルは表１で示す様に、様々な形状のものを取り付けて事前に評価を行った。表１中、洗浄性における○印は目視によるスリット状ノズルのリップ先端の汚染が全くない状態を示す。また、△印はリップの先端がやや汚染されている状態を示す。ミスト飛散における○印は目視による２流体ミストの周囲への飛散が全くない状態を示す。また、△印は周囲への飛散が若干ある状態を示す。   As shown in Table 1, the two-fluid cleaning nozzle was installed in various shapes and evaluated in advance. In Table 1, the mark “◯” in the cleaning property indicates a state where there is no contamination of the lip end of the slit-like nozzle by visual observation. Further, Δ marks indicate a state where the tip of the lip is slightly contaminated. The ◯ mark in the mist scattering indicates a state where there is no scattering around the two-fluid mist visually. Further, Δ marks indicate a state where there is some scattering to the surroundings.

Figure 2005324123
２流体洗浄ノズルの噴出口の形状は、図７で示す通り（ａ）円形状口（１００）、（ｂ）長方形状口（１０１）、（ｃ）円周形状口（１０２）の３形状を評価し、その結果、円形状口（１００）が尤も洗浄性が良い事がわかった。また、その直径（１０３）は１ｍｍ〜２ｍｍの間であれば洗浄性が良く、尚且つミスト飛散の全く無い洗浄ができる事がわかった。更にまた、噴出角度（１０４）は１０°〜１５°の間であれば洗浄性が良く、尚且つミスト飛散の全く無い洗浄ができる事がわかった。
上記結果を踏まえ、２流体洗浄ノズルは直径が１．５ｍｍで、噴出角度が１２°の円形状口を有するものを使用した。
Figure 2005324123
 As shown in FIG. 7, the shape of the jet of the two-fluid cleaning nozzle has three shapes: (a) a circular mouth (100), (b) a rectangular mouth (101), and (c) a circumferential mouth (102). As a result, it was found that the circular mouth (100) has good cleaning properties. Further, it was found that if the diameter (103) is between 1 mm and 2 mm, the cleaning performance is good and cleaning without any mist scattering can be performed. Furthermore, it was found that if the ejection angle (104) is between 10 ° and 15 °, the cleaning performance is good and cleaning with no mist scattering can be performed.
Based on the above results, a two-fluid cleaning nozzle having a circular mouth with a diameter of 1.5 mm and an ejection angle of 12 ° was used.

以下に実際の動作を詳細に説明する。
図６で示すように、ローダーユニット（８０）に投入されたガラス基板（７６）は搬送ロボット（８１）によって洗浄装置付塗布装置（８２）の塗布ステージ（７３）上に載置され真空吸着される。図３、４で示すボールバルブ（１０）、（４５）、（５３）及びエアーオペレートバルブ（５７）、（５８）は予め開いておき、塗布液タンク（１２）及び洗浄薬液タンク（５９）、（６１）は常時加圧しておく。 The actual operation will be described in detail below.
As shown in FIG. 6, the glass substrate (76) put in the loader unit (80) is placed on the coating stage (73) of the coating device (82) with a cleaning device by the transfer robot (81) and is vacuum-sucked. The The ball valves (10), (45), (53) and the air operated valves (57), (58) shown in FIGS. 3 and 4 are opened in advance, and the coating solution tank (12) and the cleaning chemical solution tank (59), (61) is always pressurized.

スリット状ノズル（１）は、図５で示す待機位置（Ａ）にて有機溶剤（７２）の雰囲気状態にある待機ポッド（７１）の中にリップ先端を格納した状態で待機しており、ガラス基板（７６）が塗布ステージ（７３）上に載置されると、待機上位置（Ｂ）に上昇し、次いで塗布開始上位置（Ｃ）に平行移動する。次いで塗布開始位置（Ｄ）に下降し、この状態でエアーオペレートバルブ（５）を開いて塗布ビード（７４）を形成した後、樹脂ブラックレジストを吐出しながら塗布膜（７５）を形成しつつ塗布終了位置（Ｅ）に平行移動する。スリット状ノズル（１）が塗布終了位置（Ｅ）に移動すると、エアーオペレートバ
ルブ（５）を閉じ、樹脂ブラックレジストの吐出を停止する。次いで塗布終了上位置（Ｆ）に上昇し、次いで洗浄上位置（Ｇ）に平行移動し、次いで洗浄位置（Ｈ）に下降する。 The slit-like nozzle (1) is in a standby state in which the lip tip is stored in the standby pod (71) in the atmosphere of the organic solvent (72) at the standby position (A) shown in FIG. When the substrate (76) is placed on the coating stage (73), it rises to the standby upper position (B) and then translates to the coating start upper position (C). Next, it is lowered to the coating start position (D), and in this state, the air operated valve (5) is opened to form a coating bead (74), and then a coating film (75) is formed while discharging a resin black resist. Translate to end position (E). When the slit nozzle (1) moves to the coating end position (E), the air operated valve (5) is closed and the discharge of the resin black resist is stopped. Next, the coating finishes ascending to the upper position (F), then translates to the cleaning upper position (G), and then descends to the cleaning position (H).

洗浄ヘッド（２１）は、図１で示す洗浄ヘッド待機位置（Ｉ）にて待機しており、洗浄位置（Ｈ）にスリット状ノズル（１）の移動が完了すると同時に、図４で示す強制排気装置（５０）が作動して排気を開始し、次いでエアーオペレートバルブ（４０）が開いてパージ用窒素がパージスリット（２２）から噴出され、次いでエアーオペレートバルブ（４３）が開いて２流体用窒素が２流体洗浄ノズル（２０）に供給され、次いでエアーオペレートバルブ（３３）と（３７）が開いてＮＭＰとアセトンが２流体洗浄ノズル（２０）に供給され、２流体洗浄ノズル（２０）内部で混合された２流体ミストが噴出される。   The cleaning head (21) stands by at the cleaning head standby position (I) shown in FIG. 1, and at the same time as the movement of the slit nozzle (1) to the cleaning position (H) is completed, forced exhaust shown in FIG. The apparatus (50) is activated to start evacuation, then the air operated valve (40) is opened and purge nitrogen is ejected from the purge slit (22), and then the air operated valve (43) is opened and nitrogen for two fluids is opened. Is supplied to the two-fluid cleaning nozzle (20), then the air operated valves (33) and (37) are opened, and NMP and acetone are supplied to the two-fluid cleaning nozzle (20). The mixed two-fluid mist is ejected.

２流体ミストが安定して噴出された時点で、図１及び図６で示す直動ユニット（７０）が駆動し、洗浄ヘッド（２１）はスリット状ノズル（１）の幅方向に沿って平行移動しながら洗浄を開始する。洗浄ヘッド（２１）が洗浄ヘッド洗浄終了位置（Ｊ）に移動すると、直動ユニット（７０）が停止し、スリット状ノズル（１）は図５で示す洗浄上位置（Ｇ）に再び上昇する。次いで待機上位置（Ｂ）に平行移動し、次いで待機位置（Ａ）に下降して、再び待機ポッド（７１）の中にリップ先端を格納した状態で待機する。   When the two-fluid mist is stably ejected, the linear motion unit (70) shown in FIGS. 1 and 6 is driven, and the cleaning head (21) is translated along the width direction of the slit-like nozzle (1). Start cleaning. When the cleaning head (21) moves to the cleaning head cleaning end position (J), the linear motion unit (70) stops and the slit-like nozzle (1) rises again to the cleaning upper position (G) shown in FIG. Next, the robot moves in parallel to the standby upper position (B), then descends to the standby position (A), and waits again with the lip tip stored in the standby pod (71).

スリット状ノズル（１）が洗浄上位置（Ｇ）に上昇すると同時に、直動ユニット（７０）が駆動し、洗浄ヘッド（２１）は洗浄ヘッド待機位置（Ｉ）に平行移動を開始し、同時にエアーオペレートバルブ（３３）と（３７）を閉じＮＭＰとアセトンの供給を停止し、次いでエアーオペレートバルブ（４３）を閉じ２流体用窒素の供給を停止し、次いでエアーオペレートバルブ（４０）を閉じパージ用窒素の供給を停止し、その後洗浄ヘッド（２１）内部のミスト状排液が完全に外部に排出された時点で強制排気装置（５０）を停止する。洗浄ヘッド（２１）が洗浄ヘッド待機位置（Ｉ）に移動すると直動ユニット（７０）は停止する。   At the same time that the slit-like nozzle (1) rises to the cleaning upper position (G), the linear motion unit (70) is driven, and the cleaning head (21) starts parallel movement to the cleaning head standby position (I), and at the same time air The operation valves (33) and (37) are closed and the supply of NMP and acetone is stopped, then the air operation valve (43) is closed and the supply of nitrogen for two fluids is stopped, and then the air operation valve (40) is closed and purge is performed. The supply of nitrogen is stopped, and then the forced exhaust device (50) is stopped when the mist-like drainage liquid inside the cleaning head (21) is completely discharged to the outside. When the cleaning head (21) moves to the cleaning head standby position (I), the linear motion unit (70) stops.

一方、図６に示すように、洗浄装置付塗布装置（８２）にて樹脂ブラックレジストを塗布したガラス基板（７６）は搬送ロボット（８３）により減圧乾燥ユニット（８４）に搬送される。減圧乾燥工程が終了するとガラス基板（７６）は搬送ロボット（８７）によりアンローダーユニット（８９）に搬出される。   On the other hand, as shown in FIG. 6, the glass substrate (76) coated with the resin black resist by the coating device with a cleaning device (82) is transported to the vacuum drying unit (84) by the transport robot (83). When the vacuum drying process is completed, the glass substrate (76) is carried out to the unloader unit (89) by the transfer robot (87).

また、スリット状ノズルによりレジストをある程度の膜厚で塗布した後、更に回転工程により所望の膜厚を得る所謂スリットダイ＆スピン方式の場合は以下の通りとなる。すなわち、洗浄装置付塗布装置（８２）にて樹脂ブラックレジストを塗布した基板（７６）は搬送ロボット（８３）により回転ユニット（８６）に搬送される。回転工程が終了すると搬送ロボット（８５）により減圧乾燥ユニット（８４）に搬送される。減圧乾燥工程が終了するとガラス基板（７６）は搬送ロボット（８７）により端面現像ユニット（８８）に搬送される。端面現像工程が終了するとガラス基板（７６）は再び搬送ロボット（８７）によりアンローダーユニット（８９）に搬出される。   In the case of a so-called slit die & spin method in which a resist is applied with a certain thickness by a slit-like nozzle and then a desired film thickness is obtained by a rotating process. That is, the substrate (76) coated with the resin black resist by the coating device with a cleaning device (82) is transported to the rotating unit (86) by the transport robot (83). When the rotation process is completed, the robot is transported to the vacuum drying unit (84) by the transport robot (85). When the vacuum drying process is completed, the glass substrate (76) is transferred to the end face developing unit (88) by the transfer robot (87). When the end face development process is completed, the glass substrate (76) is again carried out to the unloader unit (89) by the transfer robot (87).

以上の動作にて、スリットダイ方式と、スリットダイ＆スピン方式のそれぞれで基板を連続塗布し、且つ毎回洗浄を行った。その結果、目視においてスリット状ノズル洗浄後のリップ先端の乾燥性が非常に良くなり、洗浄薬液残りに起因する縦筋ムラの発生が無くなった。また、連続塗布後もリップ先端は非常に清浄に保たれており、塗布後の基板の異物検査においても乾燥固着に起因する異物は発生していなかった。更に、洗浄薬液量は従来のリップ先端全幅を一度に洗浄する方式の１／１０程度となった。   With the above operation, the substrate was continuously applied by the slit die method and the slit die & spin method, and washed each time. As a result, the dryness of the lip tip after the slit-shaped nozzle cleaning was very good visually, and the occurrence of vertical stripe unevenness due to the remaining cleaning liquid was eliminated. Further, the tip of the lip was kept very clean even after continuous application, and no foreign matter due to dry adhesion was generated in the foreign matter inspection of the substrate after coating. Furthermore, the amount of the cleaning chemical solution is about 1/10 of the conventional method for cleaning the entire width of the lip tip at once.

本発明による洗浄装置付塗布装置の一実施例における洗浄装置と、スリット状ノズルを示した説明図である。It is explanatory drawing which showed the washing | cleaning apparatus and slit-shaped nozzle in one Example of the coating device with a washing | cleaning apparatus by this invention. 洗浄装置を構成する洗浄ヘッドの説明図である。It is explanatory drawing of the washing | cleaning head which comprises a washing | cleaning apparatus. 本発明に係わるスリット状ノズルの側断面と、塗布液の供給系統を表した説明図である。It is explanatory drawing showing the side cross section of the slit-shaped nozzle concerning this invention, and the supply system of a coating liquid. 本発明に係わる洗浄ヘッドの斜視と、洗浄薬液及び不活性ガスの供給系統を表した説明図である。It is explanatory drawing showing the perspective view of the cleaning head concerning this invention, and the supply system of a cleaning chemical | medical solution and an inert gas. 本発明に係わる洗浄装置付塗布装置のスリット状ノズルの動作を側面で表した説明図である。It is explanatory drawing which represented the operation | movement of the slit-shaped nozzle of the coating device with a washing | cleaning apparatus concerning this invention by the side surface. 本発明に係わる洗浄装置付塗布装置を含む一連の基板処理ラインを平面で表した説明図である。It is explanatory drawing which represented the series of substrate processing lines containing the coating apparatus with a washing | cleaning apparatus concerning this invention with the plane. 本発明に係わる２流体噴出口の形状を斜視で表した説明図であり、（Ａ）は円形状口、（Ｂ）は長方形状口、（Ｃ）は円周形状口をそれぞれ表している。It is explanatory drawing which represented the shape of the 2 fluid jet nozzle concerning this invention by the perspective view, (A) represents the circular shaped mouth, (B) represents the rectangular shaped mouth, and (C) represents the circumferential shaped mouth.

符号の説明Explanation of symbols

１・・スリット状ノズル
２・・マニホールド
３・・スリット
４・・２次フィルター
５・・エアーオペレートバルブ
６・・１次フィルター
７・・フィルター
８、４７、５５・・圧力計
９、４６、５４・・減圧弁
１０・・ボールバルブ
１１・・クリーンエアー
１２・・塗布液タンク
１３・・塗布液
１４・・異物
１５・・洗浄薬液
１６・・リブ先端
２０・・２流体洗浄ノズル
２０’・・２流体洗浄ノズル配列
２１・・洗浄ヘッド
２２・・パージスリット
２３・・洗浄薬液供給口
２４・・パージ用不活性ガス供給口
２５・・２流体用不活性ガス供給口
２６・・排気ダクト
２７・・２流体噴出口
２８・・乾燥部
２９・・台座
３０、３４、３８、４１・・流量計
３１、３５、３９、４２・・流量調整バルブ
３２、３６、４８、５６・・フィルター
３３、３７、４０、４３、５７・・エアーオペレートバルブ
４４・・不活性ガス
４５、５３・・ボールバルブ
４９・・１次排液トラップタンク
５０・・強制排気装置
５１・・２次排液トラップタンク
５２・・クリーンエアー
５９・・洗浄薬液タンク
６０・・乾燥性の高い洗浄薬液
６１・・洗浄薬液タンク
６２・・洗浄性の高い洗浄薬液
７０・・直動ユニット
７１・・待機ポッド
７２・・有機溶剤
７３・・塗布ステージ
７４・・塗布ビード
７５・・塗布膜
７６・・ガラス基板
８０・・ローダーユニット
８１、８３、８５、８７・・搬送ロボット
８２・・洗浄装置付塗布装置
８４・・減圧乾燥ユニット
８６・・回転ユニット
８８・・端面現像ユニット
８９・・アンローダーユニット
１００・・円形状口
１０１・・長方形状口
１０２・・円周形状口
１０３・・直径
１０４・・噴出角度
Ａ・・待機位置
Ｂ・・待機上位置
Ｃ・・塗布開始上位置
Ｄ・・塗布開始位置
Ｅ・・塗布終了位置
Ｆ・・塗布終了上位置
Ｇ・・洗浄上位置
Ｈ・・洗浄位置
Ｉ・・洗浄ヘッド待機位置
Ｊ・・洗浄ヘッド洗浄終了位置 1..Slit-like nozzle 2..Manifold 3..Slit 4..Secondary filter 5..Air operated valve 6..Primary filter 7..Filters 8, 47, 55..Pressure gauges 9, 46, 54. · · Pressure reducing valve 10 · · Ball valve 11 · · Clean air 12 · · Coating liquid tank 13 · · Coating solution 14 · · Foreign matter 15 · · Cleaning chemical solution 16 · · Rib tip 20 · · 2 fluid cleaning nozzle 20 '· · 2-fluid cleaning nozzle array 21 .. cleaning head 22 .. purge slit 23 .. cleaning chemical supply port 24 .. purging inert gas supply port 25 .. 2 fluid inert gas supply port 26 .. exhaust duct 27・ Two fluid jets 28 ・ ・ Drying part 29 ・ ・ Pedestals 30, 34, 38, 41 ・ ・ Flow meters 31, 35, 39, 42 ・ ・ Flow control valves 32, 36, 48, 56 ・ ・ Filters 33 and 37 40, 43, 57 ·· Air operated valve 44 · · Inert gas 45 and 53 · · Ball valve 49 · · Primary drainage trap tank 50 · · Forced exhaust device 51 · · Secondary drainage trap tank 52 · · Clean air 59 · · Cleaning chemical solution tank 60 · · Highly dry cleaning chemical solution 61 · · Cleaning chemical solution tank 62 · · High cleaning chemical solution 70 · · Direct acting unit 71 · · Standby pod 72 · · Organic solvent 73 ..Coating stage 74..Coating bead 75..Coating film 76..Glass substrate 80..Loader unit 81, 83, 85, 87..Conveying robot 82..Coating apparatus 84 with cleaning device. ..Rotating unit 88..End surface developing unit 89..Unloader unit 100..Circular port 101.Rectangular port 102.Circular port 103. Diameter 104 ·· Blowing angle A · · Standby position B · · Standby upper position C · · Application start upper position D · · Application start position E · · Application end position F · · Application end upper position G · · Cleaning upper position H・ ・ Cleaning position I ・ ・ Cleaning head standby position J ・ ・ Cleaning head cleaning end position

Claims (4)

ダイヘッドを構成するスリット状ノズルの両側リップの先端を洗浄する洗浄装置を具備する洗浄装置付塗布装置において、該洗浄装置は、前記両側リップの先端外側に洗浄薬液と不活性ガスを混合した２流体を噴出する複数個の２流体洗浄ノズルを前記スリット状ノズルの幅方向に配列されてなる、２流体洗浄ノズル配列の２配列が、前記両側リップの先端外側を挟みこむようにスリット状ノズルの幅方向に平行に近設されている洗浄部と、該洗浄部の下方に発生した洗浄ミストを強制排気する排気部とで構成される洗浄ヘッドと、該洗浄ヘッドを前記スリット状ノズルの幅方向に移動させる駆動部を具備することを特徴とする洗浄装置付塗布装置。   In a coating apparatus with a cleaning device comprising a cleaning device for cleaning the tip of both lips of a slit-shaped nozzle constituting a die head, the cleaning device includes two fluids in which a cleaning chemical and an inert gas are mixed outside the tip of the both lips. The two-fluid cleaning nozzle array in which a plurality of two-fluid cleaning nozzles are arranged in the width direction of the slit-shaped nozzles so that the two nozzles of the two-fluid cleaning nozzles sandwich the outer ends of the lips on both sides. A cleaning head composed of a cleaning unit arranged in parallel to the cleaning unit and an exhaust unit for forcibly exhausting the cleaning mist generated below the cleaning unit, and moving the cleaning head in the width direction of the slit nozzle An applicator with a cleaning device, characterized in that it comprises a driving unit. 前記洗浄ヘッドが、少なくとも前記洗浄部の逆前進方向側に、前記スリット状ノズルの幅方向を短手方向とする不活性ガスを噴出するパ−ジスリットを持つ乾燥部を有することを特徴とする請求項１に記載の洗浄装置付塗布装置。   The said cleaning head has a drying part which has a purge slit which ejects the inert gas which makes the width direction of the said slit-shaped nozzle a transversal direction at least in the reverse advance direction side of the said cleaning part. Item 12. A coating apparatus with a cleaning device according to Item 1. 前記２流体洗浄ノズルには、２流体洗浄ノズルの配列位置によって複数種類の異なる洗浄薬液を供給することが可能であることを特徴とする請求項１又は請求項２に記載の洗浄装置付塗布装置。   The coating device with a cleaning device according to claim 1 or 2, wherein the two-fluid cleaning nozzle can be supplied with a plurality of different types of cleaning chemicals depending on the arrangement position of the two-fluid cleaning nozzle. . 前記２流体洗浄ノズルの噴出口の形状は円形で、その直径は１ｍｍ〜２ｍｍの範囲であり、噴出角度は１０°〜１５°の範囲であることを特徴とする請求項１、請求項２、又は請求項３に記載の洗浄装置付塗布装置。   The shape of the jet outlet of the two-fluid cleaning nozzle is circular, the diameter thereof is in the range of 1 mm to 2 mm, and the jet angle is in the range of 10 ° to 15 °. Or the coating device with a washing | cleaning apparatus of Claim 3.
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JP2006281101A (en) * 2005-03-31 2006-10-19 Toppan Printing Co Ltd Coater with cleaning device
KR100688142B1 (en) * 2006-05-02 2007-03-02 주식회사 케이씨텍 Device for washing nozzle and method
JP2007294907A (en) * 2006-03-22 2007-11-08 Toray Ind Inc Method and aparatus of coating machine, method and apparatus of coating, and method of manufacturing member of liquid crystal display
JP2009136756A (en) * 2007-12-05 2009-06-25 Tokyo Ohka Kogyo Co Ltd Nozzle cleaning device, nozzle cleaning method, coating device and coating method
KR101222972B1 (en) 2006-05-26 2013-01-17 엘지디스플레이 주식회사 Printing Apparatus, Patterning Method and Method of manufacturing Liquid Crystal Display Device using the same
JP2013243283A (en) * 2012-05-22 2013-12-05 Sokudo Co Ltd Developing apparatus
US9927760B2 (en) 2012-05-22 2018-03-27 Screen Semiconductor Solutions Co., Ltd. Development processing device
US20180315625A1 (en) * 2015-11-10 2018-11-01 SCREEN Holdings Co., Ltd. Film processing unit and substrate processing apparatus

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006281101A (en) * 2005-03-31 2006-10-19 Toppan Printing Co Ltd Coater with cleaning device
JP2007294907A (en) * 2006-03-22 2007-11-08 Toray Ind Inc Method and aparatus of coating machine, method and apparatus of coating, and method of manufacturing member of liquid crystal display
KR100688142B1 (en) * 2006-05-02 2007-03-02 주식회사 케이씨텍 Device for washing nozzle and method
KR101222972B1 (en) 2006-05-26 2013-01-17 엘지디스플레이 주식회사 Printing Apparatus, Patterning Method and Method of manufacturing Liquid Crystal Display Device using the same
JP2009136756A (en) * 2007-12-05 2009-06-25 Tokyo Ohka Kogyo Co Ltd Nozzle cleaning device, nozzle cleaning method, coating device and coating method
JP2013243283A (en) * 2012-05-22 2013-12-05 Sokudo Co Ltd Developing apparatus
US9927760B2 (en) 2012-05-22 2018-03-27 Screen Semiconductor Solutions Co., Ltd. Development processing device
US10960426B2 (en) 2012-05-22 2021-03-30 Screen Semiconductor Solutions Co., Ltd. Development processing device
US20180315625A1 (en) * 2015-11-10 2018-11-01 SCREEN Holdings Co., Ltd. Film processing unit and substrate processing apparatus
US11004702B2 (en) * 2015-11-10 2021-05-11 SCREEN Holdings Co., Ltd. Film processing unit and substrate processing apparatus

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