CN101047091A - Filter, plasma display device including the same and method of manufacturing the filter - Google Patents

Filter, plasma display device including the same and method of manufacturing the filter Download PDF

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Publication number
CN101047091A
CN101047091A CNA2007100914370A CN200710091437A CN101047091A CN 101047091 A CN101047091 A CN 101047091A CN A2007100914370 A CNA2007100914370 A CN A2007100914370A CN 200710091437 A CN200710091437 A CN 200710091437A CN 101047091 A CN101047091 A CN 101047091A
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China
Prior art keywords
filter
layer
light absorption
absorption units
focus
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Pending
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CNA2007100914370A
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Chinese (zh)
Inventor
车准圭
裵宰佑
文东建
许相烈
吴浣锡
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Samsung SDI Co Ltd
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Samsung SDI Co Ltd
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Publication of CN101047091A publication Critical patent/CN101047091A/en
Pending legal-status Critical Current

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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/22Absorbing filters
    • G02B5/223Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/0001Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems
    • G02B6/0011Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems the light guides being planar or of plate-like form
    • G02B6/0013Means for improving the coupling-in of light from the light source into the light guide
    • G02B6/0023Means for improving the coupling-in of light from the light source into the light guide provided by one optical element, or plurality thereof, placed between the light guide and the light source, or around the light source
    • G02B6/003Lens or lenticular sheet or layer
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133526Lenses, e.g. microlenses or Fresnel lenses
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J11/00Gas-filled discharge tubes with alternating current induction of the discharge, e.g. alternating current plasma display panels [AC-PDP]; Gas-filled discharge tubes without any main electrode inside the vessel; Gas-filled discharge tubes with at least one main electrode outside the vessel
    • H01J11/20Constructional details
    • H01J11/34Vessels, containers or parts thereof, e.g. substrates
    • H01J11/44Optical arrangements or shielding arrangements, e.g. filters, black matrices, light reflecting means or electromagnetic shielding means
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J17/00Gas-filled discharge tubes with solid cathode
    • H01J17/38Cold-cathode tubes
    • H01J17/48Cold-cathode tubes with more than one cathode or anode, e.g. sequence-discharge tube, counting tube, dekatron
    • H01J17/49Display panels, e.g. with crossed electrodes, e.g. making use of direct current
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/09Use of materials for the conductive, e.g. metallic pattern
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2211/00Plasma display panels with alternate current induction of the discharge, e.g. AC-PDPs
    • H01J2211/20Constructional details
    • H01J2211/34Vessels, containers or parts thereof, e.g. substrates
    • H01J2211/44Optical arrangements or shielding arrangements, e.g. filters or lenses
    • H01J2211/444Means for improving contrast or colour purity, e.g. black matrix or light shielding means
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2211/00Plasma display panels with alternate current induction of the discharge, e.g. AC-PDPs
    • H01J2211/20Constructional details
    • H01J2211/34Vessels, containers or parts thereof, e.g. substrates
    • H01J2211/44Optical arrangements or shielding arrangements, e.g. filters or lenses
    • H01J2211/446Electromagnetic shielding means; Antistatic means

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Electromagnetism (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Gas-Filled Discharge Tubes (AREA)

Abstract

A filter including a base film, a plurality of light absorption units spaced apart from one another at regular intervals in the base film, and a focusing layer on the base film. The focusing layer may include a plurality of longitudinal crests or microlenses aligned with the light absorption units.

Description

Filter and manufacture method thereof and comprise the plasma display panel device of filter
Technical field
The present invention relates to filter, comprise the manufacture method of the plasma display panel device and the filter of filter.Particularly, filter involved in the present invention can improve interior lights brightness, and minimizes external light reflection.
Background technology
Usually, plasma display system belongs to panel display apparatus, can utilize the gas discharge phenomenon display image, therefore, compare with traditional display unit, first-class indicating characteristic is provided, for example high brightness and contrast, few afterimage, wide visual angle and thin display structure.
Traditional plasma display system can comprise the filter that has a plurality of thin layers.Traditional filter can be connected to the prebasal plate of plasma display system and control the transmission of light, and therefore improves the picture quality and the definition of plasma display system.Traditional filter can comprise toughened glass filter (tempered glass filter), forms the uniform thickness of about 3mm with the material that is different from the plasma display system prebasal plate.
Yet the thickness of toughened glass filter can increase the weight and the manufacturing cost of traditional plasma display system noticeablely.What is more important is used to form the toughened glass filter of plasma display system and the differences in materials of prebasal plate and can produces double reflection owing to reflecting, and has therefore reduced the picture quality of plasma display system.In addition, traditional toughened glass filter can show not enough light-room contrast, and comprises complicated manufacture method, and this is that promptly Zu He filter is carried out its various functions owing to complicated structure.
Therefore, existing for plasma display panel device provides a kind of and can increase brightness and light-room contrast (bright room contrast) and minimize the needs of the filter of light reflection.
Summary of the invention
Therefore, present invention is directed at filter and plasma display system, it has overcome one or more shortcomings of correlation technique basically.
Therefore, the feature of the embodiment of the invention is that the filter that is provided can improve brightness and light-room contrast, and minimizes the light reflection.
Therefore, another feature of the embodiment of the invention is that the filter that is provided has alleviated weight.
Another feature of the embodiment of the invention is that the filter that is provided has simple structure, and is compatible mutually with the low cost manufacturing.
Another feature of the embodiment of the invention is that the plasma display system that is provided has the filter that shows one or more top features.
The manufacture method of the filter of one or more features above also feature of the embodiment of the invention provides and shows.
The present invention above-mentioned with other feature and advantage at least one can be achieved by filter is provided, it comprises: basement membrane; A plurality of light absorption units uniformly-spaced separate in basement membrane each other; With in epilamellar focus layer, this focus layer has the front surface that has a plurality of shape for lugs.
The width of light absorption units can be about 0.1 to about 3.0 times of its height.Each light absorption units can be corresponding to the center of each shape for lugs of focus layer.The front surface of each light absorption units can be coupled with focus layer (in communication with).Basic unit can comprise colouring agent or pigment
The projection of focus layer can be long ridge.As selection, the projection of focus layer can be hemisphere.
This filter can also comprise anti-reflecting layer.Anti-reflecting layer can comprise hard coating material.As selection, filter can be included in the hard coating material on the anti-reflecting layer.In addition, filter can comprise electromagnetic wave proof layer, at least one adhesive phase, near-infrared shielding, color correction layer or their combination.
In another aspect of the present invention, plasma display system is provided, it comprises plasma display panel, at the underframe on the plasma display panel rear surface, on rear surface, underframe basis and be electrically connected at least one drive circuit board of plasma display panel and the filter on the plasma display panel front surface, wherein filter comprises basement membrane, a plurality of light absorption units that uniformly-spaced separate each other and in epilamellar focus layer, this focus layer has the front surface that has a plurality of shape for lugs in basement membrane.The shape for lugs of focus layer can be long ridge.As selection, the shape for lugs of focus layer can be hemisphere.
Of the present invention aspect another in, the manufacture method of filter is provided, it comprises: the photoresist layer is set having on the substrate of conductivity, in the photoresist layer, form application pattern, depositing metal layers in application pattern, remove the photoresist layer, metal oxide layer is to form light absorption units, the focus layer that will have a plurality of luminous ray focusing units is adhered to light absorption units, separated light absorptive unit from the substrate, and the base membrane layer of formation and light absorption units and the coupling of focus layer rear surface.
Forming application pattern can comprise and partly expose the photoresist layer.Form application pattern and can be included in the bar-shaped trough that formation uniformly-spaced separates each other on the photoresist layer.As selection, form application pattern and can comprise the vertical clearance gap of formation with predetermined diameter, this vertical clearance gap uniformly-spaced separates on the photoresist layer each other.
Depositing metal layers can comprise employing copper.Metal oxide layer can be included in and immerse metal level in the alkaline solution.
The luminous ray focusing unit can by fusing transparent resin in mould and exert pressure or resin by extruding heating in the decorative pattern roller die by the focus layer upper surface uniformly-spaced to form.The luminous ray focusing unit can form long ridge.The luminous ray focusing unit can form a plurality of lenticules.Bonding focus layer can be included in to light absorption units adhesive phase is set therebetween.Bonding focus layer can comprise that to light absorption units bonding each light absorption units arrives the center of luminous ray focusing unit separately.
This method can also be included in colouring agent and pigment are set in the basement membrane.In addition, this method can comprise formation anti-reflecting layer, electromagnetic wave proof layer, adhesive phase, near-infrared shielding, color correction layer or their combination.
Description of drawings
With reference to accompanying drawing, by describing one exemplary embodiment wherein in detail, for those of ordinary skill in the art, will becoming with other features and advantage that the present invention is above-mentioned more becomes apparent, wherein:
Fig. 1 illustrates the fragmentary, perspective view according to the filter of the embodiment of the invention;
Fig. 2 illustrates that the II-II line cuts open the sectional view of getting in Fig. 1;
Fig. 3 illustrates the fragmentary, perspective view of filter according to another embodiment of the present invention;
Fig. 4 illustrates that the IV-IV line cuts open the sectional view of getting in Fig. 3;
Fig. 5 illustrates the sectional view according to the filter optical facilities of the embodiment of the invention;
Fig. 6 illustrates the sectional view of filter according to another embodiment of the present invention;
Fig. 7 illustrates the decomposition diagram according to the plasma display system with filter of the embodiment of the invention;
Fig. 8 illustrates that the IIIV-IIIV line cuts open the sectional view of getting in Fig. 7;
Fig. 9-16 illustrates the sectional view of sequential steps during making according to the filter of the embodiment of the invention.
Embodiment
The Korean Patent 10-2006-0028134 that on March 28th, 2006 filed an application in Korea S Department of Intellectual Property and 10-2006-0028135 number, exercise question is introduced at this in full for " filter, comprise the manufacture method (Filter, Plasma Display Device Includingthe Same and Method of Manufacturing the Filter) of the plasma display panel device and the filter of filter ".
Hereinafter, describe the present invention with reference to the accompanying drawings all sidedly, wherein illustrate embodiments of the invention.Yet the present invention can be implemented with different forms, is not confined to embodiment set forth herein and should not be construed to.On the contrary, provide these embodiment, thereby make this announcement thorough and complete, and will be to the comprehensive exchange of paper scope of invention of those skilled in the art.
For graphic clear for the purpose of, the size in figure middle level and district can be exaggerated.Should also be understood that when layer or element be called another layer or substrate " on " when (" on "), can perhaps also can there be an intercalation in it directly on other layers or substrate.In addition, should also be understood that when one deck be called another layer " under " when (" under "), it can be directly below, and also can have one or more intercalations.In addition, should also be understood that when one deck be called two-layer " between " when (" between "), it can be between this is two-layer layer only to be arranged, and perhaps can also have one or more intercalations.Identical reference marker refers to components identical in the whole text.
One exemplary embodiment according to filter of the present invention can be installed on the front panel of plasma display system (PDP), and will be described in detail as follows referring to Fig. 1-2.As shown in Figure 1, the filter 10 according to the embodiment of the invention can comprise basement membrane 30, a plurality of light absorption units 11a and focus layer 21.
Basement membrane 30 according to the filter 10 of the embodiment of the invention can have flat shape, and is for example tabular.Basement membrane 30 can be flexible, and thickness is that about 50 μ m are to about 500 μ m.Preferably, the thickness of basement membrane 30 can be that about 80 μ m are to about 400 μ m.Thickness below about 50 μ m may be not enough to impact and the scattering protection of PDP.Thickness more than about 500 μ m may reduce the efficient of lamination.
The rear surface of basement membrane 30 can be connected to the front panel of PDP, this be it should be noted, as used herein with respect to " back " and " preceding " of element orientation, be meant respectively to element of living in away from near outside surface, promptly with respect to the physiognomy of watching PDP apart from the far away of distance and near, as shown in Figure 1.Basement membrane 30 can be by can transmitting visible light and be adhered to glass or any softness, the material transparent of plastics are made, and plastics are for for example: polyethers (PES), acrylate (PAR), Polyetherimide (PEI), PEN (PEN), polyester (PET), polyphenylene sulfide (PPS), poly-rare propyl ester (polyallylate), polyimides, terephthalate (PET), Triafol T (TAC), acetate-cellulose propionate (CAP) etc.Preferably, can adopt PC, PET, TAC and PEN.Basement membrane 30 can also comprise the material that can protect near infrared ray or neon light.
Basement membrane 30 can also comprise the material of color correction.Basement membrane 30 can have predetermined color, so that control transmission is by the light of filter 10 easily, promptly controls via the color adjuster of basement membrane 30.For example, the formation of dark basement membrane 30 can reduce the light of transmission by filter 10.According to the embodiment of the invention, the color of basement membrane 30 can form the pattern corresponding to each sub-pixel of the PDP with filter of the present invention.Light absorption units 11a according to the filter 10 of the embodiment of the invention can vertically be arranged on the front surface of basement membrane 30, and each other basically uniformly-spaced to separate, shown in Fig. 1-2.Particularly, light absorption units 11a can be arranged to vertical pattern along the x-axle, makes the front surface of light absorption units 11a and the front surface of basement membrane 30 to aim at, and promptly forms consistent surface.Light absorption units 11a can be formed by the dark material that represents high light absorption, to strengthen the absorption of light at this.
The width of light absorption units 11a can be w, promptly along the z-axle measure distance, it equals height about 0.1 to about 3.0 times of h, h promptly along its y-axle measure distance.The width w of light absorption units 11a is during less than its height about 0.1 times of h, and its exterior light that provides absorbs may be not enough, therefore increased the light reflection.The width w of light absorption units 11a may cause the interior lights that absorbs too much from the PDP emission during greater than its height 3.0 times of h, therefore brightness is reduced.
The focus layer 21 of filter 10 according to an embodiment of the invention can be arranged on the front surface of basement membrane 30, and is coupled with light absorption units 11a, makes basement membrane 30 can be arranged between the prebasal plate and focus layer 21 of PDP.Focus layer 21 can be made by the material that can transmit visible light, and method is pressed the epoxy resin of fusing for for example in mould, and the heating ring epoxy resins is exerted pressure to it in knurling rolls then in extruder, and epoxy resin exposes under ultraviolet ray and local solidification, or the like.
Focus layer 21 can form lens arrangement (lenticular structure).This lens arrangement can comprise a plurality of long ridge 21a, and it has the semi-circular section on the y-z plane, and is the square-section at x-z and x-y plane, as shown in Figure 1.Long ridge 21a can be arranged in the layer, and uniformly-spaced separates each other.A plurality of groove 21b can be formed between the long ridge 21a, and promptly a groove 21b can be formed between per two long ridge 21a, make groove 21b, long ridge 21a and basement membrane 30 length promptly the x-axle measure distance equate.The width of each groove 21b can be shorter than the width of each long ridge 21a basically, as shown in Figure 1.The long ridge 21a of focus layer 21 can be formed in its front surface, makes that the rear surface of focus layer 21 can be consistent plane, and is coupled with basement membrane 30 and light absorption units 11a, also as shown in Figure 1.Light absorption units 11a can with the centrally aligned of each semi-circular section of focus layer 21, promptly on identical vertical axis.
According to another embodiment of the present invention, filter 50 as shown in Figure 3-4 can comprise basement membrane 30, a plurality of light absorption patterns unit 11b and focus layer 22.
The basement membrane 30 of filter 50 can be identical with reference to the basement membrane 30 of the filter 10 of Fig. 1-2 description with the front, therefore is not described in detail at this.
Light absorption units 11b according to the filter 50 of the embodiment of the invention can be arranged in the front surface of basement membrane 30, and uniformly-spaced separates basically each other.Particularly, as shown in Figure 3-4, the vertical of predetermined diameter that have that light absorption units 11b can form in basement membrane 30 makes the front surface of light absorption units 11b and the front surface of basement membrane 30 to aim at promptly along the rod of y-axle, promptly forms consistent surface.Light absorption pattern unit 11b can be made by the dark material that presents light absorption, to strengthen light absorption at this.
The width of light absorption pattern unit 11b can equal about 0.1 to about 3.0 times of its height.The width of light absorption units 11b may cause not enough exterior light to absorb during less than about 0.1 times of its height, has therefore increased the light reflection.The width of light absorption units 11b may cause the interior lights that absorbs too much from PDP emission during greater than about 3.0 times of its height, therefore reduces brightness.
Focus layer 22 according to the filter 50 of the embodiment of the invention can be arranged on the front surface of basement membrane 30, and with light absorption units 11b coupling, make basement membrane 30 can be arranged between the prebasal plate and focus layer 22 of PDP.Focus layer 22 can be made by the material that can transmit visible light, its method is pressed the epoxy resin of fusing for for example in mould, the heating ring epoxy resins is exerted pressure to it in knurling rolls then in extruder, epoxy resin is exposed and local solidification under ultraviolet ray, or the like.
Focus layer 22 can comprise a plurality of lenticule 22a, and it is shaped to the protrusion of hemispherical projections, and each lenticule has the semi-circular section in y-z and the x-y plane, and the circular cross-section in the x-z plane, as shown in Figure 3.The pattern that lenticule 22a can be arranged to be scheduled to, for example matrix makes that the interval 22b between per two lenticule 22a can be less than the width of each lenticule 22a, as shown in Figure 3.The lenticule 22a of focus layer 22 can be formed in its front surface, makes that the rear surface of focus layer 22 can be consistent plane, and is coupled with basement membrane 30 and light absorption units 11b, also as shown in Figure 3.Light absorption units 11b can with each centrally aligned of the lenticule 22a of focus layer 22, promptly on identical vertical axis.
Describe optical facilities according to the filter of the embodiment of the invention in more detail with reference to Fig. 5 below, promptly light reflects therein and transmits.It should be noted that in the following description, " filter " can be meant filter 10 or the filter 50 that the front is described with reference to Fig. 1-4.Similarly, " light absorption units " can be meant light absorption units 11a or 11b, and " focus layer " can be meant focus layer 21 or focus layer 22.
In PDP, produce and from the light of wherein emission can be from the front panel of PDP towards filter basement membrane 30 projections.The L1 of first of institute's projection light can be incident on the light absorption units, therefore is absorbed therein.The second portion of institute's projection light and third part L2 and L3 can transmit towards focus layer by basement membrane 30.On the interface between focus layer and the outside, the second portion L2 of institute's projection light can be incident on the surface that is parallel to basement membrane 30, therefore penetrates from filter perpendicular to focus layer ground.The third part L3 of institute's projection light can be incident on the surface that is not parallel to basement membrane 30, and therefore promptly long ridge 21a or lenticule 22a are refracted, and with predetermined direction focusing.As shown in Figure 5, focus in one direction by a plurality of light beams of a long ridge 21a or a lenticule 22a projection from PDP, this direction can with the central shaft overlaid along the vertical direction of each long ridge 21a or lenticule 22a, and with central shaft overlaid along the vertical direction of each light absorption units.On the other hand, being incident on the filter front surface is the long ridge 21a of focus layer or the exterior light (not shown) on the lenticule 22a, can pass through the focus layer scattering.The part of exterior light can be transmitted by focus layer, and absorbs by light absorption units.
According to another embodiment of the present invention, as shown in Figure 6, filter 60 can be similar to the filter 10 described with reference to Fig. 1-2 the front or front with reference to the filter 50 that Fig. 3-4 describes, and can comprise a plurality of functional layers that are deposited on the filter 60 in addition except filter 60.Particularly, filter 60 can comprise electromagnetic wave proof layer 41 and anti-reflecting layer 42.Electromagnetic wave proof layer 41 and anti-reflecting layer 42 can be deposited on before the filter 60 face or after filter 60 face, as shown in Figure 6.
Electromagnetic wave proof layer 41 can form by at least one metal level of deposition on metal oxide layer, thereby metal oxide layer can reduce the oxidation or the degeneration of metal level.As selection, electromagnetic wave proof layer 41 can be formed by multilayer, and for example about five to eleventh floor, so that adjust the transmission of sheet resistance and control visible light.Select as another kind, electromagnetic wave proof layer 41 can form conductive metal mesh.Therefore unwanted electromagnetic wave and near infrared light that electromagnetic wave proof layer 41 can provide protection to be produced by the PDP with filter have reduced the potential risk to human health, and have reduced the fault of peripheral electronic device.
The metal level of electromagnetic wave proof layer 41 can comprise palladium, copper, platinum, rhodium, aluminium, iron, cobalt, nickel, zinc, ruthenium, tin, tungsten, iridium, lead, silver or their combination.The metal oxide layer of electromagnetic wave proof layer 41 can comprise tin oxide, indium oxide, antimony oxide, zinc oxide, zirconia, titanium oxide, magnesium oxide, silica, aluminium oxide, metal alkoxide, tin indium oxide or antimony tin.Electromagnetic wave proof layer 41 can be formed on the filter by methods such as sputter, vacuum moulding machine, ion plating, chemical vapor deposition (CVD) or physical vapour deposition (PVD)s, for example on the rear surface of basement membrane 30.Can be formed on that the back forms electromagnetic wave proof layer 41 on basement membrane 30 rear surfaces of Fig. 6 at rete 43, promptly rete 43 can be arranged between electromagnetic wave proof layer 41 and the basement membrane 30.
Anti-reflecting layer 42 can be scattered in filter 60 lip-deep incident lights and can reduce the light reflection.To this, it should be noted that can not form anti-reflecting layer in traditional toughened glass filter, this is because the slit between the rear surface of the front panel of PDP and traditional toughened glass may reduce image definition.Yet, can be favourable according to the filter 60 of the embodiment of the invention, this is owing to directly filter 60 is connected or is adhered to the possibility of the front panel of display unit, has therefore kept suitable image definition, and the feasible anti-reflecting layer 42 that adopts easily.
Anti-reflecting layer 42 can comprise hard coating material, to reduce the infringement of external impact, and for example scratch.As selection, hard coated film (not shown) can form the individual course on anti-reflecting layer 42.Hard coating material can comprise the polymer as bonding agent.For example, the polymer bonding agent can comprise acrylate, urethane fat, epoxy resin, siloxane polymer, or ultraviolet curable resin, as oligomer.In addition, filler for example silica can add in the hard coating material, to increase its hardness.
Anti-reflecting layer 42 can be arranged on the basement membrane 30 of filter 60, and thickness is extremely about 7.0 μ m of about 2.0 μ m, and presents the hardness of about 2H to about 3H pencil.
Filter 60 according to the embodiment of the invention can also comprise adhesive phase 44.Adhesive phase 44 can be formed between electromagnetic wave proof layer 41 and the anti-reflecting layer 42, to improve therebetween bonding.Adhesive phase 44 can by thermoplastics, ultraviolet curable resin for example acrylate or pressure sensitive adhesive form, the formation method is dip coated, air knife coating, roller coat cloth, the coating of line rod, gravure coating (gravure coating) etc.Adhesive phase 44 can also comprise the compound of absorption near infrared ray, for example copper based compound, phosphorio compound, sulfur-coated urea derivative (THIO urea derivative), tungsten based compound and cyanine base (cyanine-based) compound.In addition, for by shielding neon light correction of color, adhesive phase 44 can comprise can absorb the extremely color material of about 700nm light of about 400nm, for example colouring agent or pigment, as cyanine (cyanine), The sour cyanines in sideDyestuff (squarylium), azomethine (azomethine), oxa-green onion (xanthene), oxonol dyestuff and azo-based compound (azo compound).Color material can be included in the adhesive phase 44 with the form of diffusion particle.
The additional adhesive layers (not shown) can be formed on the anti-reflecting layer 42, for example as the skin on the rear surface of filter 60, so that the bonding force of enhancing between filter 60 and PDP front.Additional adhesive layers can be similar to adhesive phase 44.To this, it should be noted that the difference between the refractive index of additional adhesive layers and display panel cannot surpass scheduled volume, for example about 0.1%, so that reduce double reflection.
Filter 60 according to the embodiment of the invention can also comprise near-infrared shielding (not shown) and/or color correction layer (not shown).Electromagnetic wave proof layer 41, adhesive phase 44 and additional adhesive layers can shield near infrared ray.Yet, shield the protection that near infrared extra play can provide reinforcement.When comprising that display unit institute visible light emitted colorimetric purity according to the filter of the embodiment of the invention is low or requiring to adjust colour temperature, can use color correction layer.
Filter 60 according to the embodiment of the invention can present about light transmission more than 30.0%, and haze (haze) is less than 5.0%.
According to further embodiment of this invention, shown in Fig. 7-8, plasma display system 100 can comprise that the front is with reference to the described filter 10 of Fig. 1-3.Particularly, plasma display system 100 can comprise PDP150, underframe 130, a plurality of drive circuit board 140 and the filter 10 that has front panel 151 connected to one another and rear board 152.Yet, it should be noted that be connected although plasma display system 100 is described as with filter 10, other forms of filter for example filter 50 and filter 60 is not precluded within outside the scope of the present invention.
Filter 10 can be connected to the front panel 151 of PDP by the adhesive phase (not shown).Filter 10 and can reduce electromagnetic wave and the infrared light that PDP produces being connected of PDP150, and reduced the double reflection of image basically at this.In addition, compare, in PDP150, adopt the filter assembly 10 can weight reduction, and reduce manufacturing cost with the traditional PD P that has toughened glass filter (tempered glassfilter).
Underframe 130 can by adhesive bonding method for example two-sided tape 154 be connected to the rear board 152 of PDP150, so that support structure to be provided thereon.Underframe 130 can be formed by rigid metal such as aluminium, iron or metalloid or plastics.Heat Conduction Material 153 can be arranged between underframe 130 and the PDP150, so that distribute the heat that PDP150 produces.
Drive circuit board 140 can be arranged on the rear surface of underframe 130, promptly makes underframe 130 can be arranged between PDP150 and the circuit board 140, to drive PDP150.Particularly, drive circuit board 140 can transmit the signal of telecommunication to PDP150 with any suitable transfer mode as one of ordinary skill in the identified, and for example flexible print cable (FPC), band carry and encapsulate on (TCP) and the film chip (COF) etc.For example, each horizontal side that can comprise the FPC161 on a plurality of each vertical side that is arranged on underframe 130 and be arranged on underframe 130 according to the plasma display system 100 of the embodiment of the invention is the TCP160 on the upper and lower, as the signal transfer mode.
In the present invention, described plasma display system is as the example of employing according to the display unit of the filter of the embodiment of the invention.Yet other display unit is not precluded within outside the scope of the present invention.
According to an embodiment more of the present invention, shown in Fig. 9-16, as follows according to the manufacture method of the filter of the embodiment of the invention.
At first, photoresist layer 80 can be formed on the metal substrate 70, as shown in Figure 9.Next, photoresist layer 80 can stand partial exposure and development, and to form application pattern 81 wherein, as shown in figure 10, width equals about 0.1 to about 3.0 times of its height.To this, it should be noted that if the focus layer of filter comprises lens arrangement, then application pattern 81 can form the bar-shaped trough that uniformly-spaced separates each other.As selection, if the focus layer of filter is a plurality of lenticules, then application pattern 81 can form the vertical clearance gap that has predetermined diameter and uniformly-spaced separate each other.
Subsequently, as shown in figure 11, the metal level that presents high light absorption for example copper can be arranged in the application pattern 81, promptly between the part of photoresist 80, to form a plurality of light absorption units 11a or 11b.Formed metal level, promptly a plurality of light absorption units 11a or 11b can have higher length diameter ratio (slenderness) than the metal level that forms with film process.
Next, can remove photoresist layer 80, as shown in figure 12.By for example a plurality of light absorption units 11a or 11b being immersed in the alkaline solution, as shown in figure 13, a plurality of light absorption units 11a or 11b can be oxidized to and present dark colour.
Next, by between focus layer and metal level adhesive phase being set, focus layer can bond on the metal level, as shown in figure 14.Focus layer can be processed into the focusing unit that forms luminous ray therein.In other words, a plurality of long ridges or lenticule can and be exerted pressure or push the resin that heats in the embossing roller die and equally spaced be formed at the upper surface of focus layer by fusing transparent resin in mould.Focus layer 21 or 22 can have for example lens arrangement or matrix of microlenses structure.
The luminous ray focusing unit is that a plurality of long ridge or the lenticule of focus layer can form, make its sweep can with coupled outside.In addition, the luminous ray focusing unit can form corresponding to light absorption units 11a or 11b separately.More particularly, if focus layer comprises lens arrangement (lenticularstructure), then each light absorption units 11a can be corresponding to the center of separately long ridge 21a.As selection, if focus layer comprises a plurality of lenticule 22a, then each light absorption units 11b can be corresponding to the center of separately lenticule 22a.
Next, substrate 70 can divide with light absorption units 11a or 11b to be left, as shown in figure 15.Subsequently, basement membrane 30 can form the rear surface coupling with focus layer and light absorption units 11a or 11b, as shown in figure 16, so that finish the formation of filter 10 or 50.
To this, it should be noted, above can be corresponding to filter 10 shown in Fig. 1-4 and 50 formation with reference to the manufacture method of the described filter of Fig. 9-16.Yet, the formation of filter 60 shown in Figure 6 can also be included in and dose colouring agent or pigment in the basement membrane 30, so that the control of color and transmittance, and comprise process deposition of antiglare layer, electromagnetic wave proof layer, near-infrared shielding, color correction layer or their combination.
According to the filter of the embodiment of the invention with comprise that in the plasma display system of filter, filter can be directly connected to the front panel of PDP, therefore reduced double reflection, and strengthened its brightness.Particularly,, can reduce external light reflection, therefore further improve the light-room contrast owing to adopted dark light absorption units.Brightness can strengthen, and this is because the focus layer that is adopted can be focused into a direction to the PDP visible light emitted.In addition, filter can adopt the basement membrane of relative thin to form, and therefore alleviates its gross weight, and strengthens its transmissivity.
In manufacture method according to the filter of the embodiment of the invention, have the filter that improves the light-room contrast and reduce double reflection because it is simple in structure, manufacturing can reduce cost.
Disclosed one exemplary embodiment of the present invention at this, although adopted specific term, they are the explanation of general description meaning normally and only, rather than the purpose of restriction.Therefore, what will be understood by those skilled in the art that is, can carry out in form and the variation on the details it, and not break away from as the spirit and scope of the present invention as illustrated in the claims.

Claims (27)

1, a kind of filter comprises:
Basement membrane;
A plurality of light absorption units uniformly-spaced separate in this basement membrane each other; With
Focus layer, on this basement membrane, this focus layer has the front surface that has a plurality of shape for lugs.
2, filter as claimed in claim 1, wherein the width of this light absorption units be its height about 0.1 to about 3.0 times.
3, filter as claimed in claim 1, wherein each light absorption units is corresponding to the center of the shape for lugs separately of this focus layer.
4, filter as claimed in claim 1, the wherein front surface of each light absorption units and this focus layer coupling.
5, filter as claimed in claim 1, wherein this shape for lugs of this focus layer is long ridged.
6, filter as claimed in claim 1, wherein this shape for lugs of this focus layer is a hemisphere.
7, filter as claimed in claim 1, wherein this basement membrane comprises colouring agent or pigment.
8, filter as claimed in claim 1 also comprises anti-reflecting layer.
9, filter as claimed in claim 8, wherein this reflector comprises hard coating material.
10, filter as claimed in claim 8 also is included in the hard coating material on this reflector.
11, filter as claimed in claim 1 also comprises electromagnetic wave proof layer, at least one adhesive phase, near-infrared shielding, color correction layer or their combination.
12, a kind of plasma display system comprises:
Plasma display panel;
Underframe is on the rear surface of this plasma display panel;
At least one drive circuit board on the rear surface of this underframe, and is electrically connected to this plasma display panel; With
Filter, on the front surface of this plasma display panel, wherein this filter comprise basement membrane, in this basement membrane each other with a plurality of light absorption units of uniformly-spaced separating with in this epilamellar focus layer, this focus layer has the front surface that has a plurality of shape for lugs.
13, plasma display system as claimed in claim 12, wherein this shape for lugs of this focus layer is long ridged.
14, plasma display system as claimed in claim 12, wherein this shape for lugs of this focus layer is a hemisphere.
15, a kind of method of making filter comprises:
Has deposition photoresist layer on the substrate of conductivity;
In this photoresist layer, form application pattern;
Depositing metal layers in this application pattern;
Remove this photoresist layer;
This metal level of oxidation is to form light absorption units;
The focus layer that will have a plurality of luminous ray focusing units is adhered to this light absorption units;
This light absorption units is separated from this substrate; And
The base membrane layer of the rear surface coupling of formation and this light absorption units and this focus layer.
16, method as claimed in claim 15 wherein forms application pattern and comprises this photoresist layer of partial exposure.
17, method as claimed in claim 15 wherein forms this application pattern and is included in the bar-shaped trough that formation uniformly-spaced separates each other in this photoresist layer.
18, method as claimed in claim 15 wherein forms this application pattern and comprises the vertical clearance gap that forms predetermined diameter, and this vertical clearance gap uniformly-spaced separates on this photoresist layer each other.
19, method as claimed in claim 15 wherein deposits this metal level and comprises copper layer.
20, method as claimed in claim 15, wherein this metal of oxidation comprises this metal is immersed in the alkaline solution.
21, method as claimed in claim 15, wherein this luminous ray focusing unit by fusing transparent resin in mould and exert pressure or resin by extruding heating in the embossing roller die by the upper surface of focus layer uniformly-spaced to form.
22, method as claimed in claim 21, wherein this luminous ray focusing unit forms long ridge.
23, method as claimed in claim 21, wherein this luminous ray focusing unit forms a plurality of lenticules.
24, method as claimed in claim 15 wherein is adhered to this focus layer this light absorption units and is included in deposit binder layer therebetween.
25, method as claimed in claim 15 wherein is adhered to this focus layer this light absorption units and comprises each light absorption units is adhered to corresponding luminous ray focusing unit.
26, method as claimed in claim 15 also is included in deposition colouring agent or pigment in this basement membrane.
27, method as claimed in claim 15 also is included in and forms anti-reflecting layer, electromagnetic wave proof layer, adhesive phase, near-infrared shielding, color correction layer or their combination on this filter.
CNA2007100914370A 2006-03-28 2007-03-28 Filter, plasma display device including the same and method of manufacturing the filter Pending CN101047091A (en)

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102466833A (en) * 2010-11-10 2012-05-23 三星电子株式会社 Display device having color filter
CN102509729A (en) * 2011-11-21 2012-06-20 中国科学院苏州纳米技术与纳米仿生研究所 Preparation method for adjustable thermo-optic band pass filter pixel array
CN102792228A (en) * 2009-09-16 2012-11-21 Asml荷兰有限公司 Spectral purity filter, lithographic apparatus, method for manufacturing a spectral purity filter and method of manufacturing a device using lithographic apparatus
CN105700261A (en) * 2016-04-18 2016-06-22 深圳市华星光电技术有限公司 Array substrate, manufacturing method thereof and liquid crystal displayer

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102792228A (en) * 2009-09-16 2012-11-21 Asml荷兰有限公司 Spectral purity filter, lithographic apparatus, method for manufacturing a spectral purity filter and method of manufacturing a device using lithographic apparatus
CN102466833A (en) * 2010-11-10 2012-05-23 三星电子株式会社 Display device having color filter
CN102466833B (en) * 2010-11-10 2015-11-04 三星电子株式会社 There is the display device of color filter
CN102509729A (en) * 2011-11-21 2012-06-20 中国科学院苏州纳米技术与纳米仿生研究所 Preparation method for adjustable thermo-optic band pass filter pixel array
CN102509729B (en) * 2011-11-21 2014-02-05 中国科学院苏州纳米技术与纳米仿生研究所 Preparation method for adjustable thermo-optic band pass filter pixel array
CN105700261A (en) * 2016-04-18 2016-06-22 深圳市华星光电技术有限公司 Array substrate, manufacturing method thereof and liquid crystal displayer
WO2017181463A1 (en) * 2016-04-18 2017-10-26 深圳市华星光电技术有限公司 Array substrate and method for manufacturing same, and display device

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