CN101013680A - 划片方法和划片装置 - Google Patents
划片方法和划片装置 Download PDFInfo
- Publication number
- CN101013680A CN101013680A CNA200710086039XA CN200710086039A CN101013680A CN 101013680 A CN101013680 A CN 101013680A CN A200710086039X A CNA200710086039X A CN A200710086039XA CN 200710086039 A CN200710086039 A CN 200710086039A CN 101013680 A CN101013680 A CN 101013680A
- Authority
- CN
- China
- Prior art keywords
- dicing
- shell
- cooling water
- dicing blade
- cutting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims description 29
- 239000000498 cooling water Substances 0.000 claims abstract description 47
- 239000004065 semiconductor Substances 0.000 claims abstract description 39
- 238000005520 cutting process Methods 0.000 claims abstract description 24
- 238000001816 cooling Methods 0.000 abstract description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 7
- 238000005336 cracking Methods 0.000 abstract description 2
- 238000007599 discharging Methods 0.000 abstract description 2
- 208000037656 Respiratory Sounds Diseases 0.000 description 5
- 239000000843 powder Substances 0.000 description 5
- 239000013078 crystal Substances 0.000 description 4
- 230000007812 deficiency Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- 230000007423 decrease Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 239000008400 supply water Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
- B28D5/0076—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for removing dust, e.g. by spraying liquids; for lubricating, cooling or cleaning tool or work
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Dicing (AREA)
- Processing Of Stones Or Stones Resemblance Materials (AREA)
Abstract
Description
Claims (6)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006022739 | 2006-01-31 | ||
JP2006-022739 | 2006-01-31 | ||
JP2006022739A JP4885553B2 (ja) | 2006-01-31 | 2006-01-31 | ダイシング方法及びダイシング装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101013680A true CN101013680A (zh) | 2007-08-08 |
CN101013680B CN101013680B (zh) | 2012-01-18 |
Family
ID=38320790
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN200710086039XA Expired - Fee Related CN101013680B (zh) | 2006-01-31 | 2007-01-31 | 划片方法和划片装置 |
Country Status (5)
Country | Link |
---|---|
US (1) | US7557016B2 (zh) |
JP (1) | JP4885553B2 (zh) |
KR (1) | KR20070079011A (zh) |
CN (1) | CN101013680B (zh) |
TW (1) | TWI405255B (zh) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108724503A (zh) * | 2018-07-25 | 2018-11-02 | 胡才春 | 一种切割机机头壳 |
CN113498545A (zh) * | 2019-03-07 | 2021-10-12 | 三菱电机株式会社 | 半导体芯片制造装置以及半导体芯片制造方法 |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20090024408A (ko) * | 2007-09-04 | 2009-03-09 | 삼성전자주식회사 | 스크라이브 래인 내의 금속 버를 제거하는 노즐을 갖는웨이퍼 소잉 장치, 웨이퍼 소잉 방법 및 이를 이용하여제작된 반도체 패키지 |
JP5183264B2 (ja) * | 2008-03-24 | 2013-04-17 | 株式会社ディスコ | 切削装置及びチップの生産方法 |
US20100175834A1 (en) * | 2009-01-13 | 2010-07-15 | Shin-Kan Liu | Wafer splitting laminate mechanism |
KR101739943B1 (ko) * | 2010-07-07 | 2017-05-25 | 삼성전자주식회사 | 웨이퍼 다이싱 블레이드 및 이를 포함하는 웨이퍼 다이싱 장비 |
JP2012114196A (ja) * | 2010-11-24 | 2012-06-14 | Disco Abrasive Syst Ltd | 切削装置 |
FI10501U1 (fi) * | 2013-02-26 | 2014-05-27 | Nurmeksen Työstö Ja Tarvike Oy | Kivisaha |
JP6101140B2 (ja) * | 2013-04-18 | 2017-03-22 | 株式会社ディスコ | 切削装置 |
JP6267977B2 (ja) * | 2014-01-30 | 2018-01-24 | 株式会社ディスコ | 切削方法 |
JP6134998B1 (ja) * | 2016-06-08 | 2017-05-31 | 株式会社 資生堂 | 目元用化粧料組成物 |
JP6846214B2 (ja) * | 2017-01-20 | 2021-03-24 | 株式会社ディスコ | 切削装置 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3228481A1 (de) * | 1982-07-30 | 1984-02-02 | VEG-Gasinstituut N.V., 7300 Apeldoorn | Reaktionsmasse, verfahren zu ihrer herstellung und deren verwendung |
JPS5942042U (ja) * | 1982-09-13 | 1984-03-17 | 松下電器産業株式会社 | 基板加工装置 |
JPH01278310A (ja) * | 1988-04-28 | 1989-11-08 | Nec Corp | 半導体ウェハーのダイシング方法 |
JPH06275712A (ja) * | 1993-03-24 | 1994-09-30 | Nec Kansai Ltd | ダイシング装置 |
JPH07256479A (ja) * | 1994-03-23 | 1995-10-09 | Nippondenso Co Ltd | レーザ加工装置およびレーザ加工方法 |
JPH11124815A (ja) * | 1997-10-17 | 1999-05-11 | Masashi Ejima | 舗装路面切断機の円盤型カッター用キャスター付きカバー |
US6253757B1 (en) * | 1998-05-06 | 2001-07-03 | Walter J. Benson | Stone and tile table saw apparatus |
JP2000223445A (ja) * | 1999-01-29 | 2000-08-11 | Mitsubishi Electric Corp | Lsiダイシング装置及びダイシング方法 |
JP2003151924A (ja) * | 2001-08-28 | 2003-05-23 | Tokyo Seimitsu Co Ltd | ダイシング方法およびダイシング装置 |
JP2004103857A (ja) * | 2002-09-10 | 2004-04-02 | Tokyo Electron Ltd | ダイシング装置およびダイシング方法 |
TWI240965B (en) * | 2003-02-28 | 2005-10-01 | Toshiba Corp | Semiconductor wafer dividing method and apparatus |
-
2006
- 2006-01-31 JP JP2006022739A patent/JP4885553B2/ja not_active Expired - Fee Related
-
2007
- 2007-01-26 TW TW096103040A patent/TWI405255B/zh not_active IP Right Cessation
- 2007-01-30 US US11/699,794 patent/US7557016B2/en not_active Expired - Fee Related
- 2007-01-30 KR KR1020070009316A patent/KR20070079011A/ko not_active Application Discontinuation
- 2007-01-31 CN CN200710086039XA patent/CN101013680B/zh not_active Expired - Fee Related
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108724503A (zh) * | 2018-07-25 | 2018-11-02 | 胡才春 | 一种切割机机头壳 |
CN108724503B (zh) * | 2018-07-25 | 2023-09-08 | 胡才春 | 一种切割机机头壳 |
CN113498545A (zh) * | 2019-03-07 | 2021-10-12 | 三菱电机株式会社 | 半导体芯片制造装置以及半导体芯片制造方法 |
Also Published As
Publication number | Publication date |
---|---|
JP4885553B2 (ja) | 2012-02-29 |
US20070175466A1 (en) | 2007-08-02 |
US7557016B2 (en) | 2009-07-07 |
TWI405255B (zh) | 2013-08-11 |
JP2007207865A (ja) | 2007-08-16 |
CN101013680B (zh) | 2012-01-18 |
TW200741844A (en) | 2007-11-01 |
KR20070079011A (ko) | 2007-08-03 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20160323 Address after: Chiba County, Japan Patentee after: SEIKO INSTR INC Address before: Chiba, Chiba, Japan Patentee before: Seiko Instruments Inc. |
|
CP01 | Change in the name or title of a patent holder | ||
CP01 | Change in the name or title of a patent holder |
Address after: Chiba County, Japan Patentee after: EPPs Lingke Co. Ltd. Address before: Chiba County, Japan Patentee before: SEIKO INSTR INC |
|
CF01 | Termination of patent right due to non-payment of annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20120118 Termination date: 20210131 |