CN101013264A - 放射线敏感性组合物、滤色器和液晶显示元件 - Google Patents

放射线敏感性组合物、滤色器和液晶显示元件 Download PDF

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Publication number
CN101013264A
CN101013264A CNA2007100061683A CN200710006168A CN101013264A CN 101013264 A CN101013264 A CN 101013264A CN A2007100061683 A CNA2007100061683 A CN A2007100061683A CN 200710006168 A CN200710006168 A CN 200710006168A CN 101013264 A CN101013264 A CN 101013264A
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CN
China
Prior art keywords
methyl
acid
phenyl
pigment
paratonere
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CNA2007100061683A
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English (en)
Chinese (zh)
Inventor
龙恭一郎
长塚富雄
槙平勇
小原浩挥
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
JSR Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by JSR Corp filed Critical JSR Corp
Publication of CN101013264A publication Critical patent/CN101013264A/zh
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)
CNA2007100061683A 2006-01-31 2007-01-31 放射线敏感性组合物、滤色器和液晶显示元件 Pending CN101013264A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2006023505A JP4882396B2 (ja) 2006-01-31 2006-01-31 着色層形成用感放射線性組成物、カラーフィルタおよび液晶表示素子
JP2006023505 2006-01-31

Publications (1)

Publication Number Publication Date
CN101013264A true CN101013264A (zh) 2007-08-08

Family

ID=38485809

Family Applications (1)

Application Number Title Priority Date Filing Date
CNA2007100061683A Pending CN101013264A (zh) 2006-01-31 2007-01-31 放射线敏感性组合物、滤色器和液晶显示元件

Country Status (5)

Country Link
JP (1) JP4882396B2 (ko)
KR (1) KR101407774B1 (ko)
CN (1) CN101013264A (ko)
SG (1) SG134295A1 (ko)
TW (1) TWI418937B (ko)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5546801B2 (ja) * 2008-06-10 2014-07-09 富士フイルム株式会社 紫外光レーザー露光用感光性樹脂組成物、パターン形成方法、その方法を用いて製造したカラーフィルタ、カラーフィルタの製造方法および液晶表示装置
JP2010175878A (ja) * 2009-01-30 2010-08-12 Fujifilm Corp 着色感光性組成物、カラーフィルタ、および液晶表示装置
JP5317809B2 (ja) * 2009-04-20 2013-10-16 富士フイルム株式会社 着色硬化性組成物、着色パターンの形成方法、カラーフィルタ、および液晶表示装置
JP5554223B2 (ja) * 2009-12-14 2014-07-23 富士フイルム株式会社 着色感光性組成物、カラーフィルタの製造方法、カラーフィルタ、及び液晶表示装置
JP6252001B2 (ja) * 2012-07-25 2017-12-27 東レ株式会社 着色剤組成物、カラーフィルター基板及び液晶表示装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3860170B2 (ja) 2001-06-11 2006-12-20 チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド 組み合わされた構造を有するオキシムエステルの光開始剤
JP4484482B2 (ja) * 2003-09-25 2010-06-16 東洋インキ製造株式会社 感光性着色組成物およびカラーフィルタ
JP2005202252A (ja) * 2004-01-16 2005-07-28 Dainippon Printing Co Ltd 固体撮像素子カラーフィルター用感光性着色組成物、固体撮像素子カラーフィルター、固体撮像素子、及び固体撮像素子カラーフィルターの製造方法
JP2005300994A (ja) * 2004-04-13 2005-10-27 Jsr Corp 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示パネル
JP4448381B2 (ja) * 2004-05-26 2010-04-07 東京応化工業株式会社 感光性組成物
JP4428151B2 (ja) * 2004-06-23 2010-03-10 Ｊｓｒ株式会社 着色層形成用感放射線性組成物およびカラーフィルタ
JP5140903B2 (ja) * 2004-07-02 2013-02-13 三菱化学株式会社 着色樹脂組成物、カラーフィルタ及び液晶表示装置
JP2007041493A (ja) * 2004-10-20 2007-02-15 Mitsubishi Chemicals Corp 感光性組成物、及び青紫色レーザー用感光性組成物並びにそれを用いた画像形成材料、画像形成材、及び画像形成方法

Also Published As

Publication number Publication date
TW200745751A (en) 2007-12-16
TWI418937B (zh) 2013-12-11
JP2007206268A (ja) 2007-08-16
KR101407774B1 (ko) 2014-06-17
SG134295A1 (en) 2007-08-29
KR20070079007A (ko) 2007-08-03
JP4882396B2 (ja) 2012-02-22

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Application publication date: 20070808