CN101013264A - 放射线敏感性组合物、滤色器和液晶显示元件 - Google Patents
放射线敏感性组合物、滤色器和液晶显示元件 Download PDFInfo
- Publication number
- CN101013264A CN101013264A CNA2007100061683A CN200710006168A CN101013264A CN 101013264 A CN101013264 A CN 101013264A CN A2007100061683 A CNA2007100061683 A CN A2007100061683A CN 200710006168 A CN200710006168 A CN 200710006168A CN 101013264 A CN101013264 A CN 101013264A
- Authority
- CN
- China
- Prior art keywords
- methyl
- acid
- phenyl
- pigment
- paratonere
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/22—Absorbing filters
- G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Optics & Photonics (AREA)
- Materials For Photolithography (AREA)
- Optical Filters (AREA)
- Liquid Crystal (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006023505A JP4882396B2 (ja) | 2006-01-31 | 2006-01-31 | 着色層形成用感放射線性組成物、カラーフィルタおよび液晶表示素子 |
JP2006023505 | 2006-01-31 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN101013264A true CN101013264A (zh) | 2007-08-08 |
Family
ID=38485809
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNA2007100061683A Pending CN101013264A (zh) | 2006-01-31 | 2007-01-31 | 放射线敏感性组合物、滤色器和液晶显示元件 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP4882396B2 (ko) |
KR (1) | KR101407774B1 (ko) |
CN (1) | CN101013264A (ko) |
SG (1) | SG134295A1 (ko) |
TW (1) | TWI418937B (ko) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5546801B2 (ja) * | 2008-06-10 | 2014-07-09 | 富士フイルム株式会社 | 紫外光レーザー露光用感光性樹脂組成物、パターン形成方法、その方法を用いて製造したカラーフィルタ、カラーフィルタの製造方法および液晶表示装置 |
JP2010175878A (ja) * | 2009-01-30 | 2010-08-12 | Fujifilm Corp | 着色感光性組成物、カラーフィルタ、および液晶表示装置 |
JP5317809B2 (ja) * | 2009-04-20 | 2013-10-16 | 富士フイルム株式会社 | 着色硬化性組成物、着色パターンの形成方法、カラーフィルタ、および液晶表示装置 |
JP5554223B2 (ja) * | 2009-12-14 | 2014-07-23 | 富士フイルム株式会社 | 着色感光性組成物、カラーフィルタの製造方法、カラーフィルタ、及び液晶表示装置 |
JP6252001B2 (ja) * | 2012-07-25 | 2017-12-27 | 東レ株式会社 | 着色剤組成物、カラーフィルター基板及び液晶表示装置 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3860170B2 (ja) | 2001-06-11 | 2006-12-20 | チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド | 組み合わされた構造を有するオキシムエステルの光開始剤 |
JP4484482B2 (ja) * | 2003-09-25 | 2010-06-16 | 東洋インキ製造株式会社 | 感光性着色組成物およびカラーフィルタ |
JP2005202252A (ja) * | 2004-01-16 | 2005-07-28 | Dainippon Printing Co Ltd | 固体撮像素子カラーフィルター用感光性着色組成物、固体撮像素子カラーフィルター、固体撮像素子、及び固体撮像素子カラーフィルターの製造方法 |
JP2005300994A (ja) * | 2004-04-13 | 2005-10-27 | Jsr Corp | 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示パネル |
JP4448381B2 (ja) * | 2004-05-26 | 2010-04-07 | 東京応化工業株式会社 | 感光性組成物 |
JP4428151B2 (ja) * | 2004-06-23 | 2010-03-10 | Jsr株式会社 | 着色層形成用感放射線性組成物およびカラーフィルタ |
JP5140903B2 (ja) * | 2004-07-02 | 2013-02-13 | 三菱化学株式会社 | 着色樹脂組成物、カラーフィルタ及び液晶表示装置 |
JP2007041493A (ja) * | 2004-10-20 | 2007-02-15 | Mitsubishi Chemicals Corp | 感光性組成物、及び青紫色レーザー用感光性組成物並びにそれを用いた画像形成材料、画像形成材、及び画像形成方法 |
-
2006
- 2006-01-31 JP JP2006023505A patent/JP4882396B2/ja active Active
-
2007
- 2007-01-29 SG SG200700658-8A patent/SG134295A1/en unknown
- 2007-01-29 TW TW096103175A patent/TWI418937B/zh active
- 2007-01-30 KR KR1020070009279A patent/KR101407774B1/ko active IP Right Grant
- 2007-01-31 CN CNA2007100061683A patent/CN101013264A/zh active Pending
Also Published As
Publication number | Publication date |
---|---|
TW200745751A (en) | 2007-12-16 |
TWI418937B (zh) | 2013-12-11 |
JP2007206268A (ja) | 2007-08-16 |
KR101407774B1 (ko) | 2014-06-17 |
SG134295A1 (en) | 2007-08-29 |
KR20070079007A (ko) | 2007-08-03 |
JP4882396B2 (ja) | 2012-02-22 |
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C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C12 | Rejection of a patent application after its publication | ||
RJ01 | Rejection of invention patent application after publication |
Application publication date: 20070808 |