CN101004560A - Detergent composition - Google Patents
Detergent composition Download PDFInfo
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- CN101004560A CN101004560A CNA2006101687187A CN200610168718A CN101004560A CN 101004560 A CN101004560 A CN 101004560A CN A2006101687187 A CNA2006101687187 A CN A2006101687187A CN 200610168718 A CN200610168718 A CN 200610168718A CN 101004560 A CN101004560 A CN 101004560A
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- cleansing composition
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Classifications
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- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
- C11D1/66—Non-ionic compounds
- C11D1/82—Compounds containing silicon
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- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
- C11D1/88—Ampholytes; Electroneutral compounds
- C11D1/94—Mixtures with anionic, cationic or non-ionic compounds
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- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/18—Hydrocarbons
- C11D3/187—Hydrocarbons aromatic
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- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/43—Solvents
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- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- Detergent Compositions (AREA)
- Paints Or Removers (AREA)
Abstract
The present invention provides a detergent composition used for cleaning the substrates and devices attached with pigment dispersion composition. Higher cleaning effect can be obtained by using little detergent composition of the invention. One of the said detergent composition is a detergent composition for cleaning and removing pigment dispersion composition, it is characterized in that the detergent composition includes solvent with aromatic hydrocarbon and Si kinds of surface active agent. Another detergent composition is a detergent composition for cleaning and removing pigment dispersion composition, it is characterized in that the detergent composition includes surface active agent and organic solvent, and the range of the hydrogen key component delta H of the Hansen solubility parameter is 4 -10.
Description
Technical field
The present invention relates to a kind of clean-out system that is used to clean, remove the pigment-dispersing type composition.
Background technology
In the manufacturing of semiconductor element or liquid crystal display cells, use photoetching technique, wherein, utilize the photosensitive polymer combination of eurymeric or minus.
This photosensitive polymer combination is coated with the form of coating fluid on the substrates such as semiconductor substrate, glass substrate, through implementing suitable dried, forms overlay film.Further, this is carried out the selectivity exposure, carry out development treatment then, thus, form the photoresist overlay film of patterning.
As the method for photosensitive polymer combination being coated substrate, be generally rotary coating process, but, particularly in the field that the liquid crystal display cells that maximizes is gradually made, rotary coating (coat and spin) mode, non-rotating coating method etc. have been proposed.
In the painting process,, nozzle, apparatus for coating inwall, substrate periphery, substrate back, other piping system of ejection photosensitive polymer combination pollute, so must be regularly or carry out cleaning treatment at any time because being subjected to photosensitive polymer combination.
Particularly be dispersed with the material of pigment, for example, be used to form the pigment-dispersing type photosensitive polymer combination of color filter or black matrix pattern, it is difficult that its cleaning is removed.Therefore, liquid is removed in the cleaning that requires to produce the cleaning performance excellence.
In addition, as the document that the present invention relates to, patent documentation 1 and patent documentation 2 are for example arranged.
[patent documentation 1] spy opens the 2000-273370 communique
[patent documentation 2] spy opens the 2005-202363 communique
As semiconductor clean-out system in the past, for example, used propylene glycol methyl ether acetate (PGMEA) and propylene glycol monomethyl ether (PGME) solution to mix at 3: 7.But, if (for example clean the pigment-dispersing type composition with this clean-out system, pigment-dispersing type photoresists such as carbon black, pigment-dispersing type coating), then in this cleaning fluid, produce the cohesion and the sedimentation of pigment, thereby pigment is attached to such as the reason that becomes obstruction on the thin walls partly such as pipe arrangement.Thus, bring the problem of the obstruction of the reduction of operating efficiency or nozzle.
In addition, because high boiling non-proton property polar solvent N,N-dimethylacetamide polarity is strong excessively, cause the carbon cohesion and sedimentation.Therefore, produce inconvenience such as pipe arrangement obstruction.
In addition, when using the alkyl aromatic compound of single component, when mixing the amount of class alkyl aromatic compound, then can not obtain effect as if the no more than use of the amount of allocating into.
Summary of the invention
In view of the above problems, the invention provides a kind of clean-out system, when it is used to clean the pigment-dispersing type composition, use a spot of this clean-out system just can bring into play higher cleaning performance.
The cleansing composition that the present invention relates to is the cleansing composition that is used to clean, remove the pigment-dispersing type composition, it is characterized in that, it comprises solvent and the Si class surfactant with aromatic hydrocarbons.
In addition, for above-mentioned cleansing composition, it is characterized in that, it is at least a material in 8000～100000 polymkeric substance, multipolymer or the oligomer that above-mentioned Si class surfactant contains weight-average molecular weight, and described weight-average molecular weight is based on that gel permeation chromatography obtains according to polystyrene conversion.
In addition,, it is characterized in that above-mentioned Si class surfactant contains ehter bond for above-mentioned cleansing composition.
In addition,, it is characterized in that above-mentioned Si class surfactant has ester structure at least 1 molecular end for above-mentioned cleansing composition.
In addition,, it is characterized in that above-mentioned Si class surfactant is by the dibasic alcohol derived compounds for above-mentioned cleansing composition.
In addition,, it is characterized in that above-mentioned Si class surfactant contains group of being derived by ethylene glycol and the group of being derived by propylene glycol for above-mentioned cleansing composition.
In addition,, it is characterized in that above-mentioned group of being derived by propylene glycol is selected from the group shown in the following structural formula for above-mentioned cleansing composition;
-O-CH
2-CH
2-CH
2-O-
In addition,, it is characterized in that that above-mentioned Si class surfactant contains is cationic, the surfactant of anionic, both sexes or nonionic for above-mentioned cleansing composition.
In addition, for above-mentioned cleansing composition, it is characterized in that above-mentioned Si class surfactant contains the surfactant of fatty acid, linear alkyl benzene class, higher alcohols, alhpa olefin class, normal paraffin hydro carbons, induced by alkyl hydroxybenzene, amino acids, betaines, oxidation amine or quaternary ammonium salt.
In addition, for above-mentioned cleansing composition, it is characterized in that above-mentioned solvent contains the aromatics that is selected from propyl benzene, isopropyl benzene, ethyltoluene, trimethylbenzene, ethyl dimethylbenzene, durene, methyl propyl benzene, diethylbenzene, ethyl trimethylbenzene, dimethyl propyl benzene and diethyl toluene.
In addition,, it is characterized in that above-mentioned solvent contains the potpourri of nonpolar hydrocarbon kind solvent and non-polar hydrocarbon kind solvent for above-mentioned cleansing composition.
The cleansing composition that the present invention relates to is the cleansing composition that is used to clean, remove the pigment-dispersing type composition, it is characterized in that, it contains surfactant and organic solvent, and the scope of the hydrogen bond composition δ H of Hansen solubility parameter is 4～10.
In addition,, it is characterized in that above-mentioned organic solvent contains at least a kind of compound with the structural framework that is selected from aryl, allyl, alkane, alkene, alkynes, alkenyl, alcohol, ether, ester, ketone, aldehyde and carboxylic acid for above-mentioned cleansing composition.
In addition,, it is characterized in that above-mentioned organic solvent is the potpourri that has the polar solvent of hydrogen bond type and do not have the non-polar solvent of hydrogen bond type for above-mentioned cleansing composition.
In addition,, it is characterized in that above-mentioned organic solvent contains the aromatics of 5 weight %～50 weight % for above-mentioned cleansing composition.
In addition, for above-mentioned cleansing composition, it is characterized in that above-mentioned organic solvent contains at least a kind and is selected from methyl alcohol, ethanol, propyl alcohol, butanols, amylalcohol, hexanol, enanthol, octanol, hexane, heptane, octane, nonane, decane, diethyl ether, cyclohexane, cyclohexanol diox, oxetanes, cresols, xylenols, ethylene glycol, propylene glycol, propylene glycol monomethyl ether, propylene glycol methyl ether acetate, phenol, phenmethylol, acetone, 4-methyl-2 pentanone, the 2-butanone, the 2-heptanone, cyclohexanone, formic acid, acetate, propionic acid, ethyl formate, butyl formate, propyl formate, amyl formate, hexyl formate, heptyl formate, octyl formate, ethyl acetate, butyl acetate, propyl acetate, pentyl acetate, hexyl acetate, heptyl acetate, octyl acetate, ethyl lactate, butyl lactate, amyl lactate, the own ester of lactic acid, the compound of lactic acid heptyl ester and lactic acid monooctyl ester.
In addition,, it is characterized in that above-mentioned surfactant has Si for above-mentioned cleansing composition.
In addition, for above-mentioned cleansing composition, it is characterized in that it is 8000～100000 polymkeric substance, multipolymer or oligomer that above-mentioned surfactant contains weight-average molecular weight, described weight-average molecular weight is based on that gel permeation chromatography obtains according to polystyrene conversion.
In addition,, it is characterized in that above-mentioned surfactant contains ehter bond, and have ester structure at least 1 molecular end for above-mentioned cleansing composition.
The clean-out system of the application of the invention is compared with goods in the past, just can obtain equal or better cleaning performance with a spot of clean-out system.In addition, because clean-out system of the present invention is few to the burden that environment causes, and be difficult for producing cohesion, the sedimentation of pigment, so consider that from the operating efficiency aspect it also is excellent.
In addition, by containing Si class surfactant, the clean-out system that the present invention relates to promptly uses less amount also can obtain and the equal or better cleaning performance of goods in the past.
Furthermore, consider of the influence of the carbon number of alkyl to clean result, because the carbon number of the compound that is added is many more, the amount of then adding this compound is few more (promptly, it is better to add efficient), so the clean-out system of the application of the invention just can obtain and in the past the equal or better cleaning performance of goods with the addition of a spot of aromatics.
Embodiment
Below, the present invention is described in detail based on embodiment and comparative example, but these do not constitute any qualification to the present invention.
[first embodiment]
[formation of clean-out system]
The clean-out system that first embodiment of the present invention relates to contains to dissolve removes at least a solvent and the Si class surfactant that for example is attached to as the pigment-dispersing type composition on the base material of semiconductor substrate.And above-mentioned solvent contains aromatic hydrocarbons.
The solvent that is contained in the clean-out system that first embodiment of the present invention relates to, though can only constitute by a kind of solvent, but in order to satisfy cleaning, drying property, to prevent the various characteristicses such as sedimentation of the pigment that is cleaned, and use has the mixed solvent of multiple solvent, thereby can easily design the cleaning fluid of various balancing performances, consider that from this respect it is preferred using mixed solvent.
[solvent]
The solvent that is contained in the clean-out system that first embodiment of the present invention relates to is a varsol, contains at least a kind of compound with the structural framework that is selected from aryl, allyl, alkane, alkene, alkynes, alkenyl, alcohol, ether, ester, ketone, aldehyde and carboxylic acid.
For example, in the solvent that first embodiment of the present invention relates to, contain and be selected from cyclohexanone, propylene glycol methyl ether acetate (hereinafter also being designated as PGMEA), propylene glycol monomethyl ether (hereinafter also being designated as PGME), acetate (1-(3-methoxyl)-butyl ester), acetate methoxyl propyl ester, acetone, butanone, pentanone, 4-methyl-2 pentanone, the 2-butanone, the 2-heptanone, methyl alcohol, ethanol, propyl alcohol, butanols, amylalcohol, hexanol, enanthol, octanol, ethylene glycol, propylene glycol, glycol ether, glycol ester, formaldehyde, acetaldehyde, propionic aldehyde, formic acid, acetate, propionic acid, the 3-ethoxyl ethyl propionate, ethyl formate, butyl formate, propyl formate, amyl formate, hexyl formate, heptyl formate, octyl formate, ethyl acetate, butyl acetate, propyl acetate, pentyl acetate, hexyl acetate, the caproic acid heptyl ester, octyl acetate, ethyl lactate, butyl lactate, amyl lactate, the own ester of lactic acid, the lactic acid heptyl ester, the lactic acid monooctyl ester, hexane, heptane, octane, nonane, decane, diethyl ether, cyclohexane, cyclohexanol diox, oxetanes, dimethyl adipate, diethylene adipate, at least a kind of material of dimethyl succinate and diethyl succinate.Particularly preferably use propylene glycol methyl ether acetate (PGMEA) or propylene glycol monomethyl ether (PGME).
In addition, above-mentioned solvent preferably uses nonpolar hydrocarbon kind solvent and non-polar hydrocarbon solvent.
In addition, in view of the coacervation of the carbon particle that suppresses carbon black, above-mentioned solvent preferably contains aromatic hydrocarbons, more preferably contains alkyl benzene as this aromatic hydrocarbons.
The sum of the carbon atom of whole alkyl that alkyl benzene had is preferably 3～5, and further the carbon atom of whole alkyl of being had of preferred fragrance compounds of group adds up to 4.
The content of the aromatics in the clean-out system that the present invention relates to is preferably 5 weight %～50 weight %, more preferably 10 weight %～30 weight %.The carbon number of the whole alkyl in the aromatics is that the content of 4 aromatics is preferably 20 weight %～90 weight %.
For the alkyl benzene that aromatics contained, the alkyl benzene of preferred propyl benzene, isopropyl benzene, ethyltoluene, trimethylbenzene, ethyl dimethylbenzene, durene, methyl propyl benzene, diethylbenzene, ethyl trimethylbenzene, dimethyl propyl benzene, diethyl toluene.
And, except these alkyl benzenes, can also further mix at least a kind of compound in phenol, cresols, methyl phenyl ethers anisole, xylenols, phenmethylol, diphenyl ether, indane, tetramethyl-ring pentadiene, the dihydro methyl isophthalic acid H-indenes.
As the solvent that contains these alkyl benzenes, for example, can use commercially available Solvesso 100, Solvesso 150, Solvesso 200 (abovely to be trade name; Exxon chemical company system).
[surfactant]
The clean-out system that first embodiment of the present invention relates to contains Si class surfactant.
As Si class surfactant, for example, can use Additol XL-121 (trade name; The Solutia corporate system), Megaface R-08, Megaface R-60 (are trade name; Big Japanese Ink chemical industry society system), X-70-090, X-70-091, X-70-092, X-70-093 (are trade name; Chemical industry society of SHIN-ETSU HANTOTAI system), BYK-310, BYK-315 (are trade name; The BYK-Chemie corporate system) at least a kind of surfactant in.The dibasic alcohol condensation product AdditolXL-121 that particularly contains silicon is characterised in that: have ehter bond and molecular end ester bond; The weight-average molecular weight Mw that obtains based on the polystyrene conversion of gel permeation chromatography is 11000; And have polyglycol section and polypropylene glycol section in the molecule.Therefore, the preferred Additol XL-121 that uses in the clean-out system that the present invention relates to.
And, except these Si class surfactants, can also mix various anionic surface active agent, cationic surfactant, amphoteric surfactant and non-ionics and use.
As anionic surface active agent, can use fatty acid (negative ion), linear alkyl benzene class, higher alcohols (negative ion), alhpa olefin class or normal paraffin hydro carbons.In the clean-out system that the present invention relates to, for example, can use senior soaps such as soap, second level higher fatty acid salt, higher alkyl sulfates, the senior alkyl ether sulfate, higher alkyl esters sulfate, senior aryl ether sulfate, higher alcohol sulfate salt, second level higher alcohol sulfate salt, first order senior alkyl sulfonate, second level senior alkyl sulfonic acid, the senior alkyl arylsulphonate, the senior alkyl disulfonate, the sulfonation higher fatty acid salt, sulphation fat and soap, the senior alkyl phosphate ester salt, the sulfuric acid of high-grade aliphatic ester, the sulfonate of high-grade aliphatic ester, the sulfonate of higher alcohol-ether, the alkylate sulfonate of higher fatty acid salt acid amides and sulfosuccinate ester salt, alkyl benzene sulfonate, alkylphenol sulfonate, alkylnaphthalene sulfonate, naphthenate, resinate, resin acid alcohol sulfuric acid, alkylphosphonic, polyethylene oxide alkyl ethers phosphate, alkylaryl ether phosphate or sulfosuccinate.
As cationic surfactant, can use quaternary ammonium salt.In the clean-out system that the present invention relates to, for example, can use alkyl quaternary ammonium salts, alkyl benzyl quaternary ammonium salt, have the quaternary ammonium salt of azo-cycle.In addition, also can use for example organic siloxane polymer KP341 (trade name; SHIN-ETSU HANTOTAI's chemical industry system), (methyl) acrylic compounds (being total to) polymer P OLY FLOW No.75, No.90, No.95 (are trade name; Common prosperity society oil chemistry industry system), W001 (trade name; Abundant merchant's system) commercially available product such as.
As amphoteric surfactant, can use amino acids, betaines or oxidation amine.In the clean-out system that the present invention relates to, for example, can use alkyl amino soap, alkyl betaine, alkyl amine oxide.
As non-ionics, can use fatty acid (nonionic), higher alcohols (nonionic) or induced by alkyl hydroxybenzene.In the clean-out system that the present invention relates to, for example, can use the sorbitan of pentaerythritol ester, higher fatty acid of glycol ester, the higher fatty acid of glyceride, the higher fatty acid of sucrose fatty ester, sorbitan fatty acid ester, polyethylene oxide sorbitan fatty acid ester, fatty acid alkanol amides, polyethylene oxide alkyl ethers, higher fatty acid and mannitan ester, higher alcohol condensation product, higher fatty acid condensation product, polypropyleneoxide condensation product.
The content of the Si class surfactant in the clean-out system that the present invention relates to is preferably 0.001 weight %～1 weight %, more preferably 0.01 weight %～0.1 weight %.
[second embodiment]
[formation of clean-out system]
The clean-out system that second embodiment of the present invention relates to contains to dissolve and removes at least a kind of solvent and the surfactant that for example is attached to as the pigment-dispersing type composition on the base material of semiconductor substrate.
In addition, the clean-out system that relates to of second embodiment of the present invention is that 60 ℃～300 ℃ solvent constitutes by boiling point under the normal pressure preferably.
Though the solvent that is contained in the clean-out system that second embodiment of the present invention relates to can only be made of a kind of solvent, but in order to satisfy cleaning, drying property, to prevent the various characteristicses such as sedimentation of the pigment that is cleaned, and use has the mixed solvent of multiple solvent, thereby can easily design the cleaning fluid of various balancing performances, consider that from this respect it is preferred using mixed solvent.
The clean-out system that second embodiment of the present invention relates to is preferably the colloidal solution that contains solid or gelling material, and its content is preferably 0.001 weight %～1 weight %, more preferably 0.01 weight %～0.1 weight %.
In addition, change,, mix so also and can adjust drying property so when selective solvent, consider higher boiling or lower boiling compound owing to the composition of adjusting clean-out system makes the azeotropic point of clean-out system.
[solvent]
For the clean-out system that second embodiment of the present invention relates to, the hydrogen bond composition δ H of Hansen solubility parameter is 4～10, is preferably 6～8.Consider when therefore, solvent uses that solvent δ H separately is more satisfactory.
The hydrogen bond composition δ H of the Hansen solubility parameter of mixed solvent
MinValue try to achieve by following formula in theory;
δH
mix＝(δH
A×a)+(δH
B×b)+(δH
c×a)+……
Wherein, the δ H in the formula
A, δ H
B, δ H
c... be the δ H of each solvent of being mixed, a, b, c ... for each solvent of being mixed for all weight ratios.
δ H for each solvent can use " Industrial Solvents Handbook ", MarcelDeeker Inc., 1996, the value of being put down in writing among the pp.35-68.
As an example, as described below, the δ H that can be used in the solvent in the clean-out system that the present invention relates to is as shown in table 1.
[table 1]
| The solvent name | δH |
| Propylene glycol methyl ether acetate (PGMEA) | 6.6 |
| Propylene glycol monomethyl ether (PGME) | 13.6 |
| Dimethylbenzene | 2.5 |
| Toluene | 2 |
| Ethylbenzene | 1.4 |
| Methyl phenyl ethers anisole | 6.7 |
| Solvesso 100 | 2 |
In addition, the solvent that is contained in the clean-out system that relates to for second embodiment of the present invention preferably uses nonpolar hydrocarbon kind solvent and non-polar hydrocarbon solvent.With nonpolar hydrocarbon kind solvent and non-polar hydrocarbon solvent, can further improve cleanup action by so.
The solvent that is contained in the clean-out system that second embodiment of the present invention relates to is a varsol, and is as this varsol, identical with first embodiment.
In addition, in view of the coacervation of the carbon particle that suppresses carbon black, above-mentioned solvent preferably contains aromatic hydrocarbons, more preferably contains alkyl benzene as this aromatic hydrocarbons.
The sum of the carbon atom of whole alkyl that alkyl benzene had is preferably 3～5, and further the carbon atom of whole alkyl of being had of preferred fragrance compounds of group adds up to 4.
The content of the aromatics in the clean-out system that the present invention relates to is preferably 5 weight %～50 weight %, more preferably 10 weight %～30 weight %.The carbon number of the whole alkyl in the aromatics is that the content of 4 aromatics is preferably 20 weight %～90 weight %.
The alkyl benzene that aromatics contained can use the alkyl benzene identical with first embodiment.
[surfactant]
The clean-out system that second embodiment of the present invention relates to preferably contains surfactant, especially preferably contains the surfactant with Si.Compare with goods in the past, by having the surfactant of Si, the clean-out system that second embodiment of the present invention relates to promptly uses less amount also can obtain equal or better cleaning performance.
As surfactant, identical with first embodiment with Si.
And, except these have the surfactant of Si, can also mix various anionic surface active agent, cationic surfactant, amphoteric surfactant and non-ionics and use.As these surfactants, can use the surfactant identical with first embodiment.
The content of the surfactant with Si in the clean-out system that second embodiment of the present invention relates to is preferably 0.001 weight %～1 weight %, more preferably 0.01 weight %～0.1 weight %.
[cleaning object of clean-out system]
Pigment-dispersing type composition for being suitable as the cleaning object that can use the clean-out system that the present invention relates to has so far: can be used in the eurymeric, minus, chemical amplification type of semiconductor, liquid crystal, color filter etc., the pigment-dispersing type photosensitive polymer combination of amplification type non-chemically.Photosensitive polymer combination contains photographic compositions such as resinous principle and Photoepolymerizationinitiater initiater basically as necessary composition, in addition, also may contain various monomer components, surfactant, sour composition, organic compounds containing nitrogen, pigment, solvent etc.
The photosensitive polymer combination that the clean-out system that the present invention relates to can be brought into play its cleaning performance especially is the photosensitive polymer combination that is dispersed with pigment, the color filter of more preferably red (R), green (G), blue (B) forms uses photosensitive composite, and black matrix pattern forms uses photosensitive polymer combination.
As above-mentioned resinous principle, for example can enumerate, be selected from acrylic acid, methacrylic acid etc. have carboxyl monomer at least a kind of monomer be selected from methyl acrylate, methyl methacrylate, ethyl acrylate, Jia Jibingxisuanyizhi, acrylic acid 2-hydroxy methacrylate, 2-hydroxyethyl methacrylate, methacrylic acid 2-hydroxy propyl ester, n-butyl acrylate, n-BMA, isobutyl acrylate, isobutyl methacrylate, the acrylic acid benzene methyl, the methacrylic acid benzene methyl, the phenoxy group acrylate, the phenoxymethyl acrylate, isobornyl acrylate, isobornyl methacrylate, epihydric alcohol methylpropenoic acid ester, styrene, acrylamide, the multipolymer of at least a kind of monomer of vinyl cyanide etc.; Phenol phenolic epoxy acrylate polymer; Phenol phenolic epoxy methacrylate polymers; Cresols phenolic epoxy acrylate polymer; Cresols phenolic epoxy methacrylate polymers; The bisphenol-a epoxy acrylate polymkeric substance; Resins such as bisphenol S type epoxy acrylic ester polymer.
As above-mentioned Photoepolymerizationinitiater initiater; can enumerate; the 1-hydroxycyclohexylphenylketone; 2-hydroxy-2-methyl-1-phenyl-propane-1-ketone; 1-[4-(2-hydroxyl-oxethyl) phenyl]-2-hydroxy-2-methyl-1-propane-1-ketone; 1-(4-isopropyl phenyl)-2-hydroxy-2-methyl propane-1-ketone; 1-(4-dodecylphenyl)-2-hydroxy-2-methyl propane-1-ketone; 2; 2-dimethoxy-1; 2-diphenylethane-1-ketone; two (4-dimethylamino phenyl) ketone; 2-methyl isophthalic acid-[4-(methyl mercapto) phenyl]-2-morpholino propane-1-ketone; 2-benzyl-2-dimethylamino-1-(4-morpholino phenyl)-butane-1-ketone; 2; 4; 6-trimethylbenzoyl diphenyl phosphine oxide; 4-benzoyl-4 '-methyl dimethoxy base sulfide; the 4-dimethylaminobenzoic acid; 4-dimethylaminobenzoic acid methyl esters; the 4-dimethyl ethyl aminobenzoate; 4-dimethylaminobenzoic acid butyl ester; 4-dimethylamino-2-ethylhexyl benzoic acid; 4-dimethylamino-2-isoamyl benzene formic acid; benzyl-'beta '-methoxy ethyl acetals; benzyl dimethyl ketal; 1-phenyl-1; 2-propanedione-2-(adjacent carbethoxyl group) oxime; o-benzoyl yl benzoic acid methyl esters; 2; the 4-diethyl thioxanthone; the 2-clopenthixal ketone; 2; 4-dimethyl thioxanthones; 1-chloro-4-propoxyl group thioxanthones; thioxanthene; 2-diuril ton; 2; 4-diethyl thioxanthene; 2-methyl thioxanthene; 2-isopropyl thioxanthene; the 2-EAQ; the prestox anthraquinone; 1; 2-benzo anthraquinone; 2; 3-diphenyl anthraquinone; azo two (isobutyronotrile); benzoyl peroxide; cumene peroxide; 2-mercaptobenzimidazole; the 2-mercaptobenzoxazole; 2-mercaptobenzothiazole; 2-(Chloro-O-Phenyl)-4; 5-two (-methoxyphenyl) the imidazole radicals dipolymer; benzophenone; the 2-chlorobenzophenone; p; p '-two (dimethylamino) benzophenone; 4; 4 '-two (lignocaine) benzophenone; 4; 4 '-dichloro benzophenone; 3; 3-dimethyl-4-methoxy benzophenone; benzil; benzoin; benzoin methyl ether; the benzoin ethylether; the benzoin isopropyl ether; the benzoin isobutyl ether; the benzoin butyl ether; acetophenone; 2; the 2-diethoxy acetophenone; to dimethyl acetophenone; to the dimethylamino propiophenone; dichloroacetophenone; trichloroacetophenone; p-tert.-butyl acetophenone; to the dimethylamino acetophenone; to tert-butyl group trichloroacetophenone; to tert-butyl group dichloroacetophenone; α; α-Er Lv-4-Ben Yangjibenyitong; thioxanthones; 2-methyl thioxanthones; the 2-isopropyl thioxanthone; Dibenzosuberone; amyl group-4-dimethylaminobenzoic acid ester; the 9-phenylacridine; 1; 7-two-(9-acridinyl) heptane; 1; 5-two-(9-acridinyl) pentane; 1; 3-two (9-acridinyl) propane; to the methoxyl triazine; 2; 4; 6-three (trichloromethyl)-s-triazine; 2-methyl-4; 6-two (trichloromethyl)-s-triazine; 2-[2-(5-methylfuran-2-yl) vinyl]-4; 6-two (trichloromethyl)-s-triazine; 2-[2-(furans-2-yl) vinyl]-4; 6-two (trichloromethyl)-s-triazine; 2-[2-(4-lignocaine-2-aminomethyl phenyl) vinyl]-4; 6-two (trichloromethyl)-s-triazine; 2-[2-(3; the 4-Dimethoxyphenyl) vinyl]-4; 6-two (trichloromethyl)-s-triazine; 2-(4-methoxyphenyl)-4; 6-two (trichloromethyl)-s-triazine; 2-(4-ethoxybenzene vinyl)-4; 6-two (trichloromethyl)-s-triazine; 2-(4-n-butoxy phenyl)-4; 6-two (trichloromethyl)-s-triazine; 2; 4-two (trichloromethyl)-6-(3-bromo-4-methoxyl) phenyl-s-triazine; 2; 4-two (trichloromethyl)-6-(2-bromo-4-methoxyl) phenyl-s-triazine; 2; 4-two (trichloromethyl)-6-(3-bromo-4-methoxyl) styryl phenyl-s-triazine; 2,4-two (trichloromethyl)-6-(2-bromo-4-methoxyl) styryl phenyl-s-triazine etc.
As above-mentioned pigment, for example can enumerate,
C.I.Pigment Yellow 11、24、31、53、83、99、108、109、139、150、151、154、167、180、185、193；
C.I.Pigment Orange 36、38、43；
C.I.Pigment Red 105、122、149、150、155、171、175、176、177、209、224、254、264；
C.I.Pigment Violet 19、23、32、39；
C.I.Pigment Blue 1、2、15:1、15:2、15:3、16、22、60、66；
C.I.Pigment Green 7、36、37；
C.I.Pigment Brown 25、28；
C.I.Pigment Black 1、7；
Carbon black etc.
Form the photosensitive polymer combination of usefulness or the existing a lot of motions of photosensitive polymer combination that black matrix pattern forms usefulness for this color filter, for example, preferably use the special 2004-69754 communique, spy opened to open flat 11-231523 communique, spy and open flat 11-84125 communique, spy and open flat 10-221843 communique, spy and open flat 9-269401 communique, spy and open the photosensitive material put down in writing in the flat 10-90516 communique etc. etc.
And this clean-out system for example, can be used for removing the above-mentioned photosensitive polymer combination at least 1 position of nozzle, priming paint roller (rotation roller) or nozzle cleaning of photosensitive polymer combination being coated the apparatus for coating of semiconductor substrate etc.
In addition, change,, so also can adjust drying property so when selecting aromatics or solvent, should consider the mixing of higher boiling or lower boiling compound owing to the composition of adjusting clean-out system makes the azeotropic point of clean-out system.
In addition, as other pigment-dispersing type composition, pigment-dispersing type coating and pigment-dispersing type colorant are arranged.
[embodiment]
Below, embodiments of the invention are described, but scope of the present invention is not limited by these embodiment.
Among the following embodiment, be the glass tube of 10mm, carry color filter (to be trade name with liquid form respectively with pigment-dispersing type photoresist CFPR GH-1004 (green), CFPRBK-5005SL (black) by internal diameter; Chemical industry society system is answered in Tokyo), be used for color filter with the printing ink (Epson's system) of ink-jet.Then, fill above-mentioned glass tube, the cohesion and the sedimentation of observation pigment with cleansing composition.
[embodiment 1]
With the PGME of 20 mass parts, the PGMEA of 60 mass parts, the Solvesso100 (trade name of 20 mass parts; Exxon chemical company system) mixes,, add the Additol XL-121 (trade name of 0.005 mass parts with respect to whole solvents of 100 mass parts; The Solutia corporate system), and mixes modulation cleansing composition (A).
When in the glass tube of carrying CFPR GH-1004 with liquid form, filling cleansing composition (A), do not observe the cohesion and the sedimentation of pigment.
When in the glass tube of carrying CFPR BK-5005SL with liquid form, filling cleansing composition (A), do not observe the cohesion and the sedimentation of pigment.
Carrying with liquid form when being used for filling cleansing composition (A) in the glass tube of color filter with the printing ink of ink-jet, do not observing the cohesion and the sedimentation of pigment.
[comparative example 1]
With the PGME of 20 mass parts, the PGMEA of 60 mass parts, the Solvesso100 (trade name of 20 mass parts; Exxon chemical company system) mixes modulation cleansing composition (B).
When in the glass tube of carrying CFPR GH-1004 with liquid form, filling cleansing composition (B), observe the cohesion and the sedimentation of pigment.
When in the glass tube of carrying CFPR BK-5005SL with liquid form, filling cleansing composition (B), observe the cohesion and the sedimentation of pigment.
Carrying with liquid form when being used for filling cleansing composition (B) in the glass tube of color filter with the printing ink of ink-jet, observing the cohesion and the sedimentation of pigment.
[comparative example 2]
The PGME of 70 mass parts, the PGMEA of 30 mass parts are mixed modulation cleansing composition (C).
When in the glass tube of carrying CFPR GH-1004 with liquid form, filling cleansing composition (C), observe the cohesion and the sedimentation of pigment.
When in the glass tube of carrying CFPR BK-5005SL with liquid form, filling cleansing composition (C), observe the cohesion and the sedimentation of pigment.
Carrying with liquid form when being used for filling cleansing composition (C) in the glass tube of color filter with the printing ink of ink-jet, observing the cohesion and the sedimentation of pigment.
[comparative example 3]
With the PGME of 20 mass parts, the PGMEA of 60 mass parts, the Solvesso100 (trade name of 20 mass parts; Exxon chemical company system) mixes,, add the Additol XL-121 (trade name of 10 mass parts with respect to whole solvents of 100 mass parts; The Solutia corporate system), and mixes modulation cleansing composition (D).
When in the glass tube of carrying CFPR GH-1004 with liquid form, filling cleansing composition (D), observe the cohesion and the sedimentation of pigment.
When in the glass tube of carrying CFPR BK-5005SL with liquid form, filling cleansing composition (D), observe the cohesion and the sedimentation of pigment.
Carrying with liquid form when being used for filling cleansing composition (D) in the glass tube of color filter with the printing ink of ink-jet, observing the cohesion and the sedimentation of pigment.
The constituent of used cleansing composition is than as shown in table 2 in each example.
Above observed result is concluded as shown in table 3.
[table 2]
| The composition of cleansing composition (mass parts) | ||||
| PGME | PGMEA | Solvesso 100 | ADDITOL XL-121 | |
| Embodiment 1 | 20 | 60 | 20 | 0.005 |
| Comparative example 1 | 20 | 60 | 20 | - |
| Comparative example 2 | 70 | 30 | - | - |
| Comparative example 3 | 20 | 60 | 20 | 10 |
[table 3]
| Unpigmented sedimentation and cohesion are arranged | ||||
| CFPR GH-1004 | CFPR BK-5005SL | Be used for the printing ink of color filter with ink-jet | ||
| Embodiment 1 | Cleansing composition (A) | Do not have | Do not have | Do not have |
| Comparative example 1 | Cleansing composition (B) | Have | Have | Have |
| Comparative example 2 | Cleansing composition (C) | Have | Have | Have |
| Comparative example 3 | Cleansing composition (D) | Have | Have | Have |
[embodiment 2]
With the PGME of 20 mass parts, the PGMEA of 60 mass parts, the Solvesso100 (trade name of 20 mass parts; Exxon chemical company system) mixes,, add the Additol XL-121 (trade name of 0.005 mass parts with respect to whole solvents of 100 mass parts; The Solutia corporate system), and mixes modulation cleansing composition (A).
When in the glass tube of carrying CFPR GH-1004 with liquid form, filling cleansing composition (A), do not observe the cohesion and the sedimentation of pigment.
When in the glass tube of carrying CFPR BK-5005SL with liquid form, filling cleansing composition (A), do not observe the cohesion and the sedimentation of pigment.
Carrying with liquid form when being used for filling cleansing composition (A) in the glass tube of color filter with the printing ink of ink-jet, do not observing the cohesion and the sedimentation of pigment.
[comparative example 4]
The PGME of 70 mass parts, the PGMEA of 30 mass parts are mixed modulation cleansing composition (B).
When in the glass tube of carrying CFPR GH-1004 with liquid form, filling cleansing composition (B), observe the cohesion and the sedimentation of pigment.
When in the glass tube of carrying CFPR BK-5005SL with liquid form, filling cleansing composition (B), observe the cohesion and the sedimentation of pigment.
Carrying with liquid form when being used for filling cleansing composition (B) in the glass tube of color filter with the printing ink of ink-jet, observing the cohesion and the sedimentation of pigment.
[comparative example 5]
With respect to the PGME of 100 mass parts, add the Additol XL-121 (trade name of 0.005 mass parts; The Solutia corporate system), and mixes modulation cleansing composition (C).
When in the glass tube of carrying CFPR GH-1004 with liquid form, filling cleansing composition (C), observe the cohesion and the sedimentation of pigment.
When in the glass tube of carrying CFPR BK-5005SL with liquid form, filling cleansing composition (C), observe the cohesion and the sedimentation of pigment.
Carrying with liquid form when being used for filling cleansing composition (C) in the glass tube of color filter with the printing ink of ink-jet, observing the cohesion and the sedimentation of pigment.
The constituent of used cleansing composition is than as shown in table 4 in each example.
The conclusion of above observed result is as shown in table 5.
[table 4]
| The composition of cleansing composition (mass parts) | ||||
| PGME | PGMEA | Solvesso 100 | ADDITOL XL-121 | |
| Embodiment 2 | 20 | 60 | 20 | 0.005 |
| Comparative example 4 | 70 | 30 | - | - |
| Comparative example 5 | 100 | - | - | 0.005 |
[table 5]
| Unpigmented sedimentation-cohesion is arranged | ||||
| CFPR GH-1004 | CFPR BK-5005 SL | Be used for the printing ink of color filter with ink-jet | ||
| Embodiment 2 | Cleansing composition (A) | Do not have | Do not have | Do not have |
| Comparative example 4 | Cleansing composition (B) | Have | Have | Have |
| Comparative example 5 | Cleansing composition (C) | Have | Have | Have |
The result shows, does not observe the sedimentation and the cohesion of pigment among the embodiment of the clean-out system that the present invention relates to, and on the other hand, observes the sedimentation and the cohesion of pigment in the comparative example.
Claims (21)
1. cleansing composition, it is the cleansing composition that is used to clean, remove the pigment-dispersing type composition, it is characterized in that, described cleansing composition comprises solvent and the Si class surfactant with aromatic hydrocarbons.
2. cleansing composition as claimed in claim 1, it is characterized in that, it is at least a material in 8000～100000 polymkeric substance, multipolymer or the oligomer that described Si class surfactant contains weight-average molecular weight, and described weight-average molecular weight is based on that gel permeation chromatography obtains according to polystyrene conversion.
3. cleansing composition as claimed in claim 1 or 2 is characterized in that, described Si class surfactant contains ehter bond.
4. cleansing composition as claimed in claim 1 is characterized in that, described Si class surfactant has ester structure at least 1 molecular end.
5. cleansing composition as claimed in claim 1 is characterized in that, described Si class surfactant is by the dibasic alcohol derived compounds.
6. cleansing composition as claimed in claim 1 is characterized in that, described Si class surfactant contains group of being derived by ethylene glycol and the group of being derived by propylene glycol.
7. cleansing composition as claimed in claim 6 is characterized in that, described group of being derived by propylene glycol is to be selected from the group shown in the following structural formula;
-O-CH
2-CH
2-CH
2-O-
8. cleansing composition as claimed in claim 1 is characterized in that, that described Si class surfactant contains is cationic, the surfactant of anionic, both sexes or nonionic.
9. cleansing composition as claimed in claim 1, it is characterized in that described Si class surfactant is the surfactant that contains fatty acid, linear alkyl benzene class, higher alcohols, alhpa olefin class, normal paraffin hydro carbons, induced by alkyl hydroxybenzene, amino acids, betaines, oxidation amine or quaternary ammonium salt.
10. cleansing composition as claimed in claim 1, it is characterized in that described solvent contains the aromatics that is selected from propyl benzene, isopropyl benzene, ethyltoluene, trimethylbenzene, ethyl dimethylbenzene, durene, methyl propyl benzene, diethylbenzene, ethyl trimethylbenzene, dimethyl propyl benzene and diethyl toluene.
11. cleansing composition as claimed in claim 1 is characterized in that, described solvent contains the potpourri of nonpolar hydrocarbon kind solvent and non-polar hydrocarbon kind solvent.
12. cleansing composition, it is the cleansing composition that is used to clean, remove the pigment-dispersing type composition, it is characterized in that described cleansing composition contains surfactant and organic solvent, and the scope of the hydrogen bond composition δ H of Hansen solubility parameter is 4～10.
13. cleansing composition as claimed in claim 12, it is characterized in that described organic solvent contains at least a kind of compound with the structural framework that is selected from aryl, allyl, alkane, alkene, alkynes, alkenyl, alcohol, ether, ester, ketone, aldehyde and carboxylic acid.
14., it is characterized in that described organic solvent is the potpourri that has the polar solvent of hydrogen bond type and do not have the non-polar solvent of hydrogen bond type as claim 12 or 13 described cleansing compositions.
15. cleansing composition as claimed in claim 12 is characterized in that, described organic solvent contains aromatics.
16. cleansing composition as claimed in claim 15 is characterized in that, described organic solvent contains the aromatics of 5 weight %～50 weight %.
17. as claim 15 or 16 described cleansing compositions, it is characterized in that described aromatics is selected from propyl benzene, isopropyl benzene, ethyltoluene, trimethylbenzene, ethyl dimethylbenzene, durene, methyl propyl benzene, diethylbenzene, ethyl trimethylbenzene, dimethyl propyl benzene and diethyl toluene and their potpourri.
18. cleansing composition as claimed in claim 12, it is characterized in that described organic solvent contains at least a kind and is selected from methyl alcohol, ethanol, propyl alcohol, butanols, amylalcohol, hexanol, enanthol, octanol, hexane, heptane, octane, nonane, decane, diethyl ether, cyclohexane, cyclohexanol diox, oxetanes, cresols, xylenols, ethylene glycol, propylene glycol, propylene glycol monomethyl ether, propylene glycol monomethyl ether, phenol, phenmethylol, acetone, 4-methyl-2 pentanone, the 2-butanone, the 2-heptanone, cyclohexanone, formic acid, acetate, propionic acid, ethyl formate, butyl formate, propyl formate, amyl formate, hexyl formate, heptyl formate, octyl formate, ethyl acetate, butyl acetate, propyl acetate, pentyl acetate, hexyl acetate, heptyl acetate, octyl acetate, ethyl lactate, butyl lactate, amyl lactate, the own ester of lactic acid, the compound of lactic acid heptyl ester and lactic acid monooctyl ester.
19. cleansing composition as claimed in claim 12 is characterized in that, described surfactant has Si.
20. cleansing composition as claimed in claim 12, it is characterized in that, it is 8000～100000 polymkeric substance, multipolymer or oligomer that described surfactant contains weight-average molecular weight, and described weight-average molecular weight is based on that gel permeation chromatography obtains according to polystyrene conversion.
21. cleansing composition as claimed in claim 12 is characterized in that, described surfactant contains ehter bond, and has ester structure at least 1 molecular end.
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006009311 | 2006-01-17 | ||
| JP2006009311A JP2007191525A (en) | 2006-01-17 | 2006-01-17 | Detergent composition |
| JP2006009309 | 2006-01-17 | ||
| JP2006009309A JP2007191524A (en) | 2006-01-17 | 2006-01-17 | Detergent composition |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN101004560A true CN101004560A (en) | 2007-07-25 |
Family
ID=38501331
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNA2006101687187A Pending CN101004560A (en) | 2006-01-17 | 2006-12-19 | Detergent composition |
Country Status (4)
| Country | Link |
|---|---|
| JP (2) | JP2007191525A (en) |
| KR (1) | KR100830063B1 (en) |
| CN (1) | CN101004560A (en) |
| TW (1) | TW200728457A (en) |
Cited By (6)
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| CN103555452A (en) * | 2013-10-30 | 2014-02-05 | 合肥市华美光电科技有限公司 | Emulsion type cleaning agent for printed circuit board and preparation method for emulsion type cleaning agent |
| CN104928692A (en) * | 2015-06-05 | 2015-09-23 | 柳州立洁科技有限公司 | Steel part cleaning agent |
| CN105121168A (en) * | 2013-04-17 | 2015-12-02 | 东洋油墨Sc控股株式会社 | Maintenance solution for active energy ray curable inkjet ink |
| CN106773562A (en) * | 2016-12-23 | 2017-05-31 | 昆山艾森半导体材料有限公司 | A kind of removal AZ photoresists remove glue |
| CN108787651A (en) * | 2017-04-28 | 2018-11-13 | 安徽嘉朋特环保科技服务有限公司 | A kind of cleaning method of useless pail pack |
| CN115725201A (en) * | 2021-08-27 | 2023-03-03 | 京瓷办公信息***株式会社 | Cleaning liquid and liquid set for ink jet recording apparatus |
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| JP5628138B2 (en) * | 2011-11-17 | 2014-11-19 | 豊田化学工業株式会社 | Water-based paint cleaning solution |
| JP2014080490A (en) * | 2012-10-16 | 2014-05-08 | Seiko Epson Corp | Cleaning fluid for inkjet applications |
| JP6630603B2 (en) * | 2016-03-15 | 2020-01-15 | 石原ケミカル株式会社 | Cleaning liquid and cleaning method |
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| JP7154955B2 (en) * | 2018-11-01 | 2022-10-18 | 株式会社東芝 | Stripping solution, stripping method, and method for manufacturing electronic component |
| KR102103154B1 (en) * | 2019-03-21 | 2020-04-22 | 이덕우 | Industrial cleaning composition comprising methanol and method of manufacturing the same |
| JP7497511B2 (en) * | 2022-11-04 | 2024-06-10 | 花王株式会社 | Semiconductor substrate processing solution |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11100600A (en) | 1997-09-26 | 1999-04-13 | Care Techno:Kk | Antifogging detergent |
| KR100286860B1 (en) * | 1998-12-31 | 2001-07-12 | 주식회사 동진쎄미켐 | Photoresist Remover Composition |
| JP4115790B2 (en) * | 2002-09-19 | 2008-07-09 | 株式会社ジャパンエナジー | Hydrocarbon cleaning liquid composition |
| JP4596894B2 (en) | 2003-12-16 | 2010-12-15 | 昭和電工株式会社 | Photosensitive composition remover |
-
2006
- 2006-01-17 JP JP2006009311A patent/JP2007191525A/en not_active Withdrawn
- 2006-01-17 JP JP2006009309A patent/JP2007191524A/en not_active Withdrawn
- 2006-10-18 TW TW095138417A patent/TW200728457A/en unknown
- 2006-11-21 KR KR1020060114992A patent/KR100830063B1/en not_active IP Right Cessation
- 2006-12-19 CN CNA2006101687187A patent/CN101004560A/en active Pending
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| CN105121168A (en) * | 2013-04-17 | 2015-12-02 | 东洋油墨Sc控股株式会社 | Maintenance solution for active energy ray curable inkjet ink |
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| CN103555452A (en) * | 2013-10-30 | 2014-02-05 | 合肥市华美光电科技有限公司 | Emulsion type cleaning agent for printed circuit board and preparation method for emulsion type cleaning agent |
| CN104928692A (en) * | 2015-06-05 | 2015-09-23 | 柳州立洁科技有限公司 | Steel part cleaning agent |
| CN106773562A (en) * | 2016-12-23 | 2017-05-31 | 昆山艾森半导体材料有限公司 | A kind of removal AZ photoresists remove glue |
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| CN115725201A (en) * | 2021-08-27 | 2023-03-03 | 京瓷办公信息***株式会社 | Cleaning liquid and liquid set for ink jet recording apparatus |
| CN115725201B (en) * | 2021-08-27 | 2023-12-29 | 京瓷办公信息***株式会社 | Cleaning liquid and liquid set for ink jet recording apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| KR100830063B1 (en) | 2008-05-19 |
| JP2007191524A (en) | 2007-08-02 |
| TW200728457A (en) | 2007-08-01 |
| KR20070076396A (en) | 2007-07-24 |
| JP2007191525A (en) | 2007-08-02 |
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