CN100537823C - 六甲基二硅胺烷沉积装置 - Google Patents
六甲基二硅胺烷沉积装置 Download PDFInfo
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- CN100537823C CN100537823C CNB200610148808XA CN200610148808A CN100537823C CN 100537823 C CN100537823 C CN 100537823C CN B200610148808X A CNB200610148808X A CN B200610148808XA CN 200610148808 A CN200610148808 A CN 200610148808A CN 100537823 C CN100537823 C CN 100537823C
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Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CNB200610148808XA CN100537823C (zh) | 2006-12-28 | 2006-12-28 | 六甲基二硅胺烷沉积装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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CNB200610148808XA CN100537823C (zh) | 2006-12-28 | 2006-12-28 | 六甲基二硅胺烷沉积装置 |
Publications (2)
Publication Number | Publication Date |
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CN101210308A CN101210308A (zh) | 2008-07-02 |
CN100537823C true CN100537823C (zh) | 2009-09-09 |
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Application Number | Title | Priority Date | Filing Date |
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CNB200610148808XA Expired - Fee Related CN100537823C (zh) | 2006-12-28 | 2006-12-28 | 六甲基二硅胺烷沉积装置 |
Country Status (1)
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CN (1) | CN100537823C (zh) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102430495A (zh) * | 2011-07-22 | 2012-05-02 | 上海华力微电子有限公司 | 提高光刻胶膜与衬底表面粘合度的装置及其应用方法 |
JP2013115208A (ja) * | 2011-11-28 | 2013-06-10 | Tokyo Electron Ltd | 気化原料供給装置、これを備える基板処理装置、及び気化原料供給方法 |
CN105742144A (zh) * | 2016-02-26 | 2016-07-06 | 镇江乐华电子科技有限公司 | 一种监控透射电子显微镜的预警*** |
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2006
- 2006-12-28 CN CNB200610148808XA patent/CN100537823C/zh not_active Expired - Fee Related
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Publication number | Publication date |
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CN101210308A (zh) | 2008-07-02 |
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Legal Events
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C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING |
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C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20111118 Address after: 201203 Shanghai City, Pudong New Area Zhangjiang Road No. 18 Co-patentee after: Semiconductor Manufacturing International (Beijing) Corporation Patentee after: Semiconductor Manufacturing International (Shanghai) Corporation Address before: 201203 Shanghai City, Pudong New Area Zhangjiang Road No. 18 Patentee before: Semiconductor Manufacturing International (Shanghai) Corporation |
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CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20090909 Termination date: 20181228 |
|
CF01 | Termination of patent right due to non-payment of annual fee |