CN100487461C - Metal capacitance microaccelerator - Google Patents
Metal capacitance microaccelerator Download PDFInfo
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- CN100487461C CN100487461C CNB2007100437460A CN200710043746A CN100487461C CN 100487461 C CN100487461 C CN 100487461C CN B2007100437460 A CNB2007100437460 A CN B2007100437460A CN 200710043746 A CN200710043746 A CN 200710043746A CN 100487461 C CN100487461 C CN 100487461C
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Abstract
A micro-accelerometer of metal capacity type is prepared as arranging top electrode plate and to stop block on top base body and bottom electrode plate and bottom stop block on bottom base body, undertaking function of intermediate electrode plate by mass block being distributed with through holes and being set between top and bottom base bodies, setting I/O lead pin on bottom base body, connecting top and bottom base bodies to each other by support column and using said support column to transmit electric signal between top base body and I/O lead pin.
Description
Technical field
The present invention relates to a kind of micro-acceleration gauge of micro-electromechanical system field, what be specifically related to is a kind of metal capacitance microaccelerator.
Background technology
Accelerometer is a kind of important sensor, is widely used in various fields such as industry, military affairs, aviation, daily life.Adopting micro fabrication, realize microminiaturization, help reducing volume and power consumption, help improving integrated and intelligent degree, help producing in enormous quantities and reducing production cost, is the development trend of current acceleration meter.By principle of work, micro-acceleration gauge can be divided into condenser type, pressure resistance type, piezoelectric type, resonant mode, optical fiber type or the like, and wherein condenser type has highly sensitive, temperature and floats advantages such as little, thereby development rapidly.The principle of work of capacitance microaccelerator is: the movable plate electrode of electric capacity is arranged on the mass, mass bears and is subjected to displacement behind the acceleration and is out of shape, thereby cause that the gap thickness between movable plate electrode and fixed plate changes, cause capacitance to change, by measuring the i.e. size of acceleration as can be known of capacitance variations value.Adopt the differential capacitance type structure, promptly sensor is made of upper and lower fixed polar plate and intermediate active pole plate, and sensitivity improves greatly, and can effectively suppress noise, improves measuring accuracy.
Find by prior art documents, the Chinese patent publication number is that CN1959417A, name are called the patent of " micro mechanical capacitance type acceleration transducer and preparation method thereof ", mention a kind of capacitance microaccelerator, this micro-acceleration gauge is made of middle plate on top crown, bottom crown, mass and the mass etc., has following shortcoming: except that pole plate adopts metallic film, all the other materials are the silicon based material, but the silicon based material enbrittles greatly, the shortcoming of easy fracture, impact resistance difference; The brace summer radical is less, only 2 brace summers is arranged respectively on four jiaos of mass, thereby load that single beam bears influences the ability that micro-acceleration gauge bears high capacity greatly, and the resonance frequency of mass-girder system system is lower.In addition, this micro-acceleration gauge constitutes middle plate by covering metal film mode on the surface of silicon based material mass, not only easily produce stray capacitance between different materials, and because the effect of temperature stress, influence combination rate between the two, vibration even resonance can take place as movable part in middle plate and mass under impact loading, then easily further peeling off phenomenon also causes stray capacitance to increase, even the complete obscission of middle plate may finally take place.
Summary of the invention
The object of the invention is to overcome the deficiencies in the prior art, and a kind of metal capacitance microaccelerator is provided, and makes it solve the above-mentioned shortcoming of capacitance microaccelerator, improve impact resistance, improve anti-high load capability, improve resonance frequency, improve range, and help the technology realization.
The present invention is achieved by the following technical solutions, the present invention includes: upper and lower matrix, upper and lower pole plate, mass, brace summer, upper and lower scotch, support column, input and output pin etc., connected mode is: top crown and last scotch are positioned on the matrix, bottom crown and following scotch are positioned on the lower substrate, be distributed with through hole on the mass, mass is supported by brace summer and between upper and lower matrix, input and output pin is positioned on the lower substrate, upper and lower matrix is connected by support column, and by the electric signal between support column transmission top crown and the input and output pin.
The present invention constitutes the differential capacitance type structure by upper and lower pole plate and mass, and mass is born the effect of middle plate simultaneously.Mass will cause the upper and lower capacitance of differential capacitance to increase after acceleration force effect bottom offset and distortion, and another person reduces, and both change in the opposite direction, and the difference of measuring upper and lower electric capacity is promptly known the size of acceleration.Differential configuration can improve sensitivity, suppresses noise, improve measuring accuracy.
It is material that described mass, brace summer and support column adopt metal.The fracture toughness of metal is far above the fracture toughness of silicon based material.The acceleration force that micro-acceleration gauge bore generally loads with the impulsive force form, is material with the metal, can prevent to a great extent that fracture from taking place, and improves impact resistance.
Described mass is middle plate, and both unite two into one.Because of mass is a metal material, so mass can be born the function of middle plate simultaneously, not only simplified processing technology, the more important thing is and to avoid, and prevent that middle plate from coming off under percussive action because of mass and middle plate are that different materials produces stray capacitance and temperature stress.
Described brace summer evenly distributes with high distribution density, and the distribution density on the mass periphery is greater than 8/mm.During design, should guarantee at first that the high density of beam evenly distributes,, determine the size of every beam then according to the intensity of material and the global stiffness requirement of toughness and beam.Brace summer is the part of the easiest generation physical disturbance in the micro-acceleration gauge, should be able to bear big stress, and guarantee that device has upper resonance frequency.Increase the number of brace summer, not only can reduce the stressed size of every brace summer, improve anti-high load capability, also can improve resonance frequency.For the high range micro-acceleration gauge, by reducing the stressed size of brace summer, mass is thin to reduce acceleration force, significantly flexural deformation will take place in mass when then working, wherein cardiac prominence goes out and will reach the limit of the position at first, mass reduces along the range of movement of direction of measurement, thereby has limited range.Adopt high distribution density brace summer, can make mass stressed more even on its periphery, the mass distortion reduces.
The present invention is integrated support column and stem.Support column adopts metal material, has both had high fracture toughness, has electric action again.Connected by support column between the upper and lower matrix, support column is born the function of stem again simultaneously, transmits the electric signal between top crown and the input and output pin.To go up matrix by welding manner is fixed on the support column.Top crown is connected to support column by the lead-in wire on the last matrix, is connected to input and output pin by the lead-in wire on the lower substrate from support column again.This structure has reduced the degree of difficulty of bonding and lead-in wire processing technology.
Described upper and lower matrix center respectively is provided with a convex scotch.Middle plate was adsorbed to upper and lower pole plate when scotch can prevent overload and wet etching.The height of scotch is greater than the pole plate height.For bearing greater impact power, be material with the metal, and and electrode plate insulation.
Be distributed with through hole on the described mass.Through hole can reduce mass suffered damping force size of when motion.Through hole also helps processing, can increase the contact area of etching liquid and sacrifice layer, and helps the release of unrelieved stress.
The present invention adopts differential capacitance structure to realize acceleration analysis, with the metal is main material, brace summer evenly distributes with high distribution density, middle plate and mass unite two into one, and are provided with scotch, compared with prior art, can improve impact resistance greatly, improve anti-high load capability, improve resonance frequency, improve range.In addition, material selection of the present invention and structural design also help the technology realization of micro-acceleration gauge.
Description of drawings
Fig. 1 is a structural front view of the present invention;
Fig. 2 is an A-A direction cut-open view shown in Figure 1;
Fig. 3 is mass of the present invention and support beam structure side view;
Fig. 4 is bottom crown of the present invention and following scotch structure side view;
Fig. 5 is bottom crown of the present invention and following scotch structure vertical view.
Embodiment
Below in conjunction with accompanying drawing embodiments of the invention are elaborated: present embodiment is being to implement under the prerequisite with the technical solution of the present invention, provided detailed embodiment and concrete operating process, but protection scope of the present invention is not limited to following embodiment.
As shown in Figure 1, in the present embodiment, comprising: go up matrix 1, lower substrate 2, bottom crown 3, mass 4, following scotch 5, brace summer 7, support column 8, input and output pin 9, top crown 10 and last scotch 11.With mass 4 is middle plate, constitutes the differential capacitor structure with top crown 10, bottom crown 3.Top crown 10 is positioned on the matrix 1, and bottom crown 3 is positioned on the lower substrate 2, and the thickness of matrix answers the thickness of specific mass piece 4 and brace summer 7 to exceed 3 more than the order of magnitude, guarantees that its rigidity is much larger than mass 4 and brace summer 7.Mass 4 is supported by brace summer 7, adds should ensure the quality of products man-hour piece 4 and top crown 10, bottom crown 3 is equidistant.
As Fig. 1, Fig. 2 and shown in Figure 3, be distributed with through hole 6 on the mass 4.Through hole 6 is advisable to adopt circle, and pore size and number should be according to decisions such as required air damping size, the used etching agent of wet etching, sacrificial layer thickness and other processing technology steps.
As shown in Figure 2, brace summer 7 evenly distributes with high distribution density, and its distribution density on the mass periphery is greater than 8/mm.。During design, should guarantee at first that the high density of beam evenly distributes,, determine the size of every beam then according to the intensity of material and the global stiffness requirement of toughness and all beams.
As shown in Figure 4 and Figure 5, the center of lower substrate 2 is provided with down scotch 5, and the center of last matrix 1 is provided with scotch 11.Last scotch 11, down scotch 5 is a material with the metal, and with top crown 10, bottom crown 3 insulation.Last scotch 11, following scotch 5 should be higher than top crown 10, bottom crown 3, and concrete height is according to the decisions such as diameter of mass 4.
As depicted in figs. 1 and 2, support column 8 adopts metal material, has both had and has supported the function that goes up matrix 1, has the function of transmitting electric signal between top crown 10 and the input and output pin 9 again.Support column 8 is evenly distributed, and its distribution density should guarantee that matrix 1 has enough rigidity.Top crown 10 is connected to support column 8 by the lead-in wire on the last matrix 1, is connected to input and output pin 9 by the lead-in wire on the lower substrate 2 from support column 8 again.Add man-hour, can make the support column 8 that finishes earlier on lower substrate 2, and offer shrinkage pool in last matrix 1, shrinkage pool is built-in with welding material, will go up matrix 1 by welding manner then and be connected with support column 8.
Under non-measurement state, mass 4 and top crown 10, bottom crown 3 are equidistant, the last capacitor that mass 4 and top crown 10 constitute, with the following capacitor capacitance equal and opposite in direction that bottom crown 3 constitutes, difference is zero.Under the measurement state, mass 4 is subjected to the effect of acceleration force, and the off-center position is subjected to displacement and is out of shape.Last matrix 1 is very big with the rigidity of lower substrate 2, and is supported by the also very big many support columns 8 of rigidity, so distance remains unchanged.The suffered acceleration force effect of the motion of mass 4 and brace summer 7 self causes brace summer 7 distortion, causes brace summer 7 to produce opposite with its deformation direction, also promptly opposite with acceleration force direction restoring force.Because be distributed with through hole 6 on the mass 4, air damping power can be ignored during motion.When acceleration force and restoring force reach balance, mass 4 and brace summer 7 stop motions, this moment, mass 4 changed with the distance of top crown 10, bottom crown 3, and caused that the capacitance of upper and lower capacitor changes.If acceleration force makes progress, then go up the capacitance of the capacitance of capacitor greater than following capacitor; Otherwise,, then go up the capacitance of the capacitance of capacitor less than following capacitor if acceleration force is downward.Utilize already the very difference of the ripe upper and lower capacitor of difference measurement commercial measurement size and positive negative direction, the size and Orientation of acceleration as can be known.
When by measuring acceleration greater than range ability, cause when mass 4 displacements and distortion surpass scope of design, mass 4 top offsets and amount of deflection maximal value place, be will collide with last scotch 11 or following scotch 5 in the center, therefore stop motions of mass 4, thus can prevent that mass 4 and top crown 10 or bottom crown 3 from colliding and be short-circuited.
Because brace summer 7, mass 4, last scotch 11, following scotch 5, support column 8 all are material with the metal, brace summer 7 distribution density height, middle plate and mass 4 unite two into one, so present embodiment can improve impact resistance, improve anti-high load capability, improve resonance frequency, improve range.
With common used material nickel in the MEMS (micro electro mechanical system) is example, and the static fracture toughness of the nickel product that employing UV-LIGA micro fabrication obtains is 52.73Mpam
1/2, the static fracture toughness of polysilicon but only is 2Mpam
1/2, and the Dynamic Fracture Toughness minimum value is 70% of a static fracture toughness, the static fracture toughness and the Dynamic Fracture Toughness of visible nickel are all much bigger than polysilicon.Micro-acceleration gauge bears the acceleration force effect, and adopting the high metal of fracture toughness is material, can prevent to a great extent that fracture from taking place, and improves impact resistance.
Following two examples are made comparisons, brace summer is totally 36 in first example, long 0.3mm, xsect is the square of length of side 0.005mm, the thick 0.02mm of mass, xsect is the square of length of side 1mm, each brace summer is positioned at the middle place of mass thickness direction and evenly distributes along the mass side, mass and brace summer and first example have same size in second example, shape and material, but brace summer is 8 and is CN1959417A by the Chinese patent publication number, name is called the patent of " micro mechanical capacitance type acceleration transducer and preparation method thereof " and arranges, by simulation analysis as can be known first example can reduce maximum stress about 80% compared to second example, improve resonance frequency more than 1 times.It is identical for the maximum stress in second example is reduced to first example, need to increase the width of brace summer in second example, the each point displacement coefficient of variation on the mass then, be the merchant of displacement standard deviation and mean value, will be bigger by about 30% than first example, mass flexural deformation degree increases, and reduces along the range of movement of direction of measurement, and range is restricted.As seen, adopt high distribution density brace summer form, can guarantee less maximum stress, higher resonance frequency and bigger range simultaneously.
The present invention also helps processing.Because mass 4 is a material with the metal, so need not make middle plate, has reduced the processing technology step.In little process, mass 4 realizes that with the gap normal open over etching sacrifice layer of top crown 10 or bottom crown 3 through hole 6 on the mass can increase the contact area of etching liquid and sacrifice layer, helps finishing of etching.In process, owing to reasons such as temperature variation can produce unrelieved stress, but by through hole release portion unrelieved stress then.In addition, last scotch 11 or following scotch 5 can prevent that the residual liquid after etching finishes from causing mass 4 to be adsorbed on top crown 10 or the bottom crown 3.
Claims (9)
1. metal capacitance microaccelerator, comprise: go up matrix (1), lower substrate (2), bottom crown (3), mass (4), following scotch (5), brace summer (7), support column (8), input and output pin (9), top crown (10) and last scotch (11), it is characterized in that: omitted middle plate, bottom crown (3), mass (4) and top crown (10) constitute differential capacitance structure, top crown (10) and last scotch (11) are positioned on the matrix (1), bottom crown (3) and following scotch (5) are positioned on the lower substrate (2), mass (4) is supported by brace summer (7) and is positioned between matrix (1) and the lower substrate (2), connected by support column (8) between last matrix (1) and the lower substrate (2), top crown (10) is connected to the input and output pin (9) that is positioned on the lower substrate (2) by support column (8);
The metal material that is of described mass (4), brace summer (7), support column (8), last scotch (11), following scotch (5) is made.
2. metal capacitance microaccelerator according to claim 1 is characterized in that: described brace summer (7) evenly distributes.
3, metal capacitance microaccelerator according to claim 2 is characterized in that: the distribution density of described brace summer (7) on the mass periphery is greater than 8/mm.
4. metal capacitance microaccelerator according to claim 1 is characterized in that: be distributed with through hole (6) on the described mass (4).
5. metal capacitance microaccelerator according to claim 1 is characterized in that: described upward scotch (11) is located at the center of matrix (1), and following scotch (5) is located at the center of lower substrate (2),
6. metal capacitance microaccelerator according to claim 1 or 5, it is characterized in that: the described scotch (11) of going up is higher than top crown (10), and following scotch (5) is higher than bottom crown (3).
7. metal capacitance microaccelerator according to claim 1 or 5 is characterized in that: described go up scotch (11), down scotch (5) respectively with top crown (10), bottom crown (3) insulation.
8. metal capacitance microaccelerator according to claim 1 is characterized in that: described support column (8) is evenly distributed.
9. metal capacitance microaccelerator according to claim 1 is characterized in that: described mass (4) and top crown (10), bottom crown (3) are equidistant.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2007100437460A CN100487461C (en) | 2007-07-12 | 2007-07-12 | Metal capacitance microaccelerator |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2007100437460A CN100487461C (en) | 2007-07-12 | 2007-07-12 | Metal capacitance microaccelerator |
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| Publication Number | Publication Date |
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| CN101089625A CN101089625A (en) | 2007-12-19 |
| CN100487461C true CN100487461C (en) | 2009-05-13 |
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| Application Number | Title | Priority Date | Filing Date |
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| CNB2007100437460A Expired - Fee Related CN100487461C (en) | 2007-07-12 | 2007-07-12 | Metal capacitance microaccelerator |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101881785A (en) * | 2010-06-22 | 2010-11-10 | 吉林大学 | Four-folding beam variable area differential capacitance structure micro-acceleration sensor and manufacture method thereof |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101865933A (en) * | 2010-06-07 | 2010-10-20 | 瑞声声学科技(深圳)有限公司 | Differential capacitance type acceleration sensor |
| CN102155987B (en) * | 2010-12-31 | 2012-06-13 | 北京遥测技术研究所 | Differential capacitor type micro-vibration sensor |
| CN103293337B (en) * | 2013-05-15 | 2015-07-29 | 中北大学 | Wireless and passive capacitive accelerometer |
| CN104360102B (en) * | 2014-11-28 | 2017-03-08 | 中北大学 | The no pressure resistance type MEMS high-range acceleration transducer of lead and its manufacture method |
| CN108344881B (en) * | 2018-02-10 | 2020-04-03 | 中国工程物理研究院电子工程研究所 | Sensitive structure of closed-loop micro-accelerometer |
| CN108490217B (en) * | 2018-03-26 | 2020-08-25 | 温州大学 | Contact mode micro-accelerometer |
| JPWO2022264796A1 (en) * | 2021-06-16 | 2022-12-22 | ||
| CN113970655B (en) * | 2021-12-23 | 2022-04-12 | 杭州麦新敏微科技有限责任公司 | MEMS accelerometer and forming method thereof |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4658647A (en) * | 1984-07-05 | 1987-04-21 | Japan Aviation Electronic Industry, Ltd. | Accelerometer |
-
2007
- 2007-07-12 CN CNB2007100437460A patent/CN100487461C/en not_active Expired - Fee Related
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4658647A (en) * | 1984-07-05 | 1987-04-21 | Japan Aviation Electronic Industry, Ltd. | Accelerometer |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101881785A (en) * | 2010-06-22 | 2010-11-10 | 吉林大学 | Four-folding beam variable area differential capacitance structure micro-acceleration sensor and manufacture method thereof |
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| CN101089625A (en) | 2007-12-19 |
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