A kind ofly be used to measure the symmetric device and method of face contour
Technical field
The present invention relates to the somatic data field of measuring technique, more particularly, relate to a kind of medical science cosmetic plastic surgery that is used for and measure the symmetric device and method of face contour.
Background technology
Plastic and aesthetic surgery is the surgical operation that carries out at human body parts damage, correction deformity or beauty treatment, because physical beauty's focus mainly concentrates on people's face, so the facial plasty cosmetic surgery is the most general at cosmetic plastic surgery.
As everyone knows, symmetry is the human bearty in form rule of grasping the most for a long time, and people itself just has unique symmetrical beauty, and human body is exactly to be the symmetrical structure of axle with the midline of body, and symmetry is not only an external beauty for the people, also is needs healthy and existence.Symmetry also is the mandatory fundamentum of plastic and aesthetic surgery.But for a long time, because cosmetic plastic surgery lacks the instrument of special measurement human body symmetrical.Improve looks for facial plasty---needing most according to reason and be particular about the harmonious position of symmetry when undergoing surgery, the doctor that operates usually also can only observe by naked eyes, also can only be according to arranging with operation receiveing person " blur " before the art, " probably adding estimation " finishes operation.Because existing method is difficult to quantize symmetry data before, during and after the test and appraisal shaping position operation, therefore, has both influenced cosmetic result, easily causes doctor-patient dispute again.
The patent No. is that " 02282184.8 ", name are called the Chinese patent of " facial stereo plastotype calibrator ", by the face structure calibrator is affixed on face, measures thereby carry out face contour.
Yet because the different people facial differences is bigger, and above-mentioned face structure calibrator is relatively-stationary, and each face structure calibrator can only be suitable for a kind of shape of face.And each face structure calibrator can only use once.
In addition, above-mentioned face structure calibrator can only contrast face contour roughly, can't quantize face data, thereby can't accurately instruct facial cosmetic surgery.
Summary of the invention
The technical problem to be solved in the present invention is, lack the symmetric instrument of special measurement face contour at prior art, measure the defective that the face mask data take time and effort with other method simultaneously, a kind of symmetric device and method of face contour that is used to measure is provided.
The technical solution adopted for the present invention to solve the technical problems is: construct a kind of symmetric device of face contour that is used to measure, comprise pedestal, first gage beam and center arm, described center arm is can be installed on the described pedestal along the mode of linear slide, described pedestal includes first fixing point, described first gage beam is can be installed in described pedestal around the mode that described first fixing point rotates and first gage beam comprises first measuring junction and the first pointer end that lays respectively at the described first fixing point two ends, the edge of the outstanding described pedestal in the end of described first measuring junction, position corresponding to the first pointer end on the described pedestal is provided with first graduation mark, and the scale of described first graduation mark is consistent with the collinear distance in end and center arm place of first measuring junction.
Be used for measuring the symmetric device of face contour of the present invention, also comprise second gage beam, described pedestal also comprises second fixing point, described second fixing point and first fixing point are along described center arm symmetry, described second gage beam is can be installed in described pedestal around the mode that described second fixing point rotates and second gage beam comprises second measuring junction and the second pointer end that lays respectively at the described second fixing point two ends, the edge of the outstanding described pedestal in the end of described second measuring junction, position corresponding to the second pointer end on the described pedestal is provided with second graduation mark, and the scale of described second graduation mark is consistent with the collinear distance in end and center arm place of second measuring junction.
Be used for measuring the symmetric device of face contour of the present invention, also comprise tripod, described pedestal is fixed in the top of described tripod.
Be used for measuring the symmetric device of face contour of the present invention, described center arm is provided with the graduation mark of indication center arm end apart from the susceptor edges distance, and described center arm has and stops the slip away structure of pedestal of this center arm.
Be used for measuring the symmetric device of face contour of the present invention, described pedestal comprises the structure that stops described center arm to be slided.
Be used for measuring the symmetric device of face contour of the present invention, described pedestal is provided with level indicator.
Be used for measuring the symmetric device of face contour of the present invention, the end of first measuring junction of described first gage beam, the end of the first pointer end and first fixing point are positioned at same straight line.
Be used for measuring the symmetric device of face contour of the present invention, first measuring junction of described first gage beam is and people face curve is suitable mutually arc or broken line shape.
The present invention also provides a kind of use said apparatus to measure the symmetric method of face contour, may further comprise the steps:
(a) adjust pedestal and center arm, keep base level, make center arm aim at axis, position to be measured, and make the end of described center arm touch surface, place, facial axis;
(b) end of first gage beam, first measuring junction is touched the surface of face position to be measured;
(c) obtain the scale that the first pointer end of first gage beam on the pedestal points to.
Of the present inventionly be used to measure the symmetric device and method of face contour, can effectively measure the face contour data, and can quantize the face contour data.Therefore, the present invention can effectively assist facial cosmetic surgery.
Description of drawings
The invention will be further described below in conjunction with drawings and Examples, in the accompanying drawing:
Fig. 1 is the structural representation that the present invention is used to measure the symmetric device embodiment of face contour;
Fig. 2 is the structural representation of graduation mark among Fig. 1;
Fig. 3 is the sidepiece profile of center arm among Fig. 1;
Fig. 4 is the structural representation that is used for fixing the tripod of pedestal among Fig. 1.
The tool present embodiment
As shown in Figure 1, be a kind of structural representation that is used to measure the symmetric device embodiment of face contour of the present invention.In the present embodiment, the inventive system comprises pedestal 13, first gage beam 11, second gage beam 12 and center arm 14.Wherein first gage beam 11, second gage beam 12 and center arm 14 are installed in respectively on the pedestal 13, and first gage beam 11 and second is measured the both sides that ratio 12 is symmetricly set on center arm 14.
In the present embodiment, center arm 14 is can be installed on the pedestal 13 along the mode of linear slide with respect to pedestal 13.The end of center arm 14 is the edge of outstanding pedestal 13 slidably, and the track of center arm 14 slips is perpendicular to the edge of pedestal 13.In addition, also graduation mark can be set on center arm 14, this graduated value is consistent with the distance of the outstanding susceptor edges in end of center arm 14.
In the present embodiment, pedestal 13 is provided with mounting groove 18, and the height of mounting groove 18 is more than or equal to the height of center arm.Center arm 14 is positioned in the mounting groove 18, and uses screw that fixing head 20 is fixed on the mounting groove 18.
On pedestal 13, also be provided with the structure that stops center arm 14 relative pedestals 13 to slide, for example pass the screw 19 of fixing head 20.In addition, center arm 14 has and stops the slip away structure of pedestal 13 of this center arm 14, and for example the height at center arm 14 two ends is greater than the height of interlude, and the height at center arm 14 two ends is greater than the height of mounting groove 18, as shown in Figure 3.
Pedestal 13 is provided with first fixing point 15 and second fixing point 16, and second fixing point 16 and first fixing point 15 are along described center arm 14 symmetries.
First gage beam 11 to be can be installed on the pedestal 13 around the mode that first fixing point 15 rotates and first gage beam 11 comprises first measuring junction and the first pointer end that lays respectively at first fixing point, 15 two ends, wherein the edge of the outstanding pedestal 13 in the end of first measuring junction.Position corresponding to the first pointer end on pedestal 13 is provided with graduation mark 17, and the scale of graduation mark is consistent with the collinear distance in end and center arm 13 places of first measuring junction, as shown in Figure 2.
Second gage beam 12 to be can be installed on the pedestal 13 around the mode that second fixing point 16 rotates and second gage beam 12 comprises second measuring junction and the second pointer end that lays respectively at second fixing point, 16 two ends, wherein the edge of the outstanding pedestal 13 in the end of second measuring junction.Position corresponding to the second pointer end on pedestal 13 is provided with graduation mark 17, and the scale of graduation mark is consistent with the collinear distance in end and center arm 13 places of second measuring junction, as shown in Figure 2.
In the present embodiment, the end of the end of first measuring junction of first gage beam 11, the first pointer end and first fixing point 15 are positioned at same straight line.Similarly, the end of the end of second measuring junction of second gage beam 12, the second pointer end and second fixing point 16 are positioned at same straight line.
In addition, for more convenient measurement face mask data, first measuring junction of first gage beam 11 is and suitable mutually arc or the broken line shape of people face curve that second measuring junction of same described second gage beam 12 is and suitable mutually arc or the broken line shape of people face curve.
When stating measurement device face mask data in the use, at first adjust pedestal and center arm, keep base level, make center arm aim at axis, position to be measured, and make the end of described center arm touch surface, place, facial axis; And the first measuring junction end that makes first gage beam 11 touches the surface of face position to be measured, left side, makes the second measuring junction end of second gage beam 12 touch the surface of right side face position to be measured simultaneously; Obtain the scale that the second pointer end of the scale that the first pointer end of first gage beam 11 on the pedestal points to and second gage beam 12 points at last, thereby obtain the face mask data.
In another embodiment of the present invention, except that comprising above-mentioned parts, the pedestal 13 that is used to measure the symmetric device of face contour of the present invention is provided with level indicator, so that pedestal 13 maintenance levels.
In another embodiment of the present invention, except that comprising above-mentioned parts, of the present inventionly be used to measure the symmetric device of face contour and also comprise tripod, the top of this tripod is fixed in the bottom of pedestal 13, thereby makes pedestal 13 keep stable and level.
In another embodiment of the present invention, only comprise a gage beam, when measuring the face mask data, use this gage beam to measure left and right side face mask data respectively.