CN100368299C - 氧化铈粉末 - Google Patents
氧化铈粉末 Download PDFInfo
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- CN100368299C CN100368299C CNB2004100574252A CN200410057425A CN100368299C CN 100368299 C CN100368299 C CN 100368299C CN B2004100574252 A CNB2004100574252 A CN B2004100574252A CN 200410057425 A CN200410057425 A CN 200410057425A CN 100368299 C CN100368299 C CN 100368299C
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- Prior art keywords
- oxide powder
- dispersion
- ceria oxide
- aggregate
- diameter
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- 239000000843 powder Substances 0.000 title claims abstract description 87
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 title claims abstract description 45
- 229910000420 cerium oxide Inorganic materials 0.000 title claims abstract description 44
- 239000011164 primary particle Substances 0.000 claims abstract description 28
- 239000007789 gas Substances 0.000 claims abstract description 13
- 239000000443 aerosol Substances 0.000 claims abstract description 11
- 239000001257 hydrogen Substances 0.000 claims abstract description 9
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 9
- 239000000126 substance Substances 0.000 claims abstract description 9
- 239000007787 solid Substances 0.000 claims abstract description 5
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 claims description 73
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 claims description 73
- 239000006185 dispersion Substances 0.000 claims description 60
- 238000000034 method Methods 0.000 claims description 44
- 238000006243 chemical reaction Methods 0.000 claims description 35
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 15
- 239000001301 oxygen Substances 0.000 claims description 15
- 229910052760 oxygen Inorganic materials 0.000 claims description 15
- 230000003647 oxidation Effects 0.000 claims description 14
- 238000007254 oxidation reaction Methods 0.000 claims description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 14
- 150000001785 cerium compounds Chemical class 0.000 claims description 13
- 230000008569 process Effects 0.000 claims description 13
- 239000000203 mixture Substances 0.000 claims description 12
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims description 11
- 229910052708 sodium Inorganic materials 0.000 claims description 11
- 239000011734 sodium Substances 0.000 claims description 11
- 239000003795 chemical substances by application Substances 0.000 claims description 10
- 239000011541 reaction mixture Substances 0.000 claims description 9
- 238000012935 Averaging Methods 0.000 claims description 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 7
- 229910052799 carbon Inorganic materials 0.000 claims description 7
- 238000005498 polishing Methods 0.000 claims description 6
- 150000001875 compounds Chemical class 0.000 claims description 5
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- 239000000463 material Substances 0.000 claims description 5
- 239000011148 porous material Substances 0.000 claims description 5
- 230000008859 change Effects 0.000 claims description 4
- 239000011149 active material Substances 0.000 claims description 2
- 150000001412 amines Chemical class 0.000 claims description 2
- 239000003945 anionic surfactant Substances 0.000 claims description 2
- 229910052751 metal Inorganic materials 0.000 claims description 2
- 239000002184 metal Substances 0.000 claims description 2
- 229920000620 organic polymer Polymers 0.000 claims description 2
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- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims 2
- 239000003054 catalyst Substances 0.000 claims 1
- 238000000926 separation method Methods 0.000 claims 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract description 3
- 239000002245 particle Substances 0.000 description 23
- 238000009826 distribution Methods 0.000 description 14
- 229910052684 Cerium Inorganic materials 0.000 description 13
- 238000002360 preparation method Methods 0.000 description 9
- 239000000243 solution Substances 0.000 description 9
- OBETXYAYXDNJHR-SSDOTTSWSA-M (2r)-2-ethylhexanoate Chemical compound CCCC[C@@H](CC)C([O-])=O OBETXYAYXDNJHR-SSDOTTSWSA-M 0.000 description 8
- OBETXYAYXDNJHR-UHFFFAOYSA-N alpha-ethylcaproic acid Natural products CCCCC(CC)C(O)=O OBETXYAYXDNJHR-UHFFFAOYSA-N 0.000 description 8
- HSJPMRKMPBAUAU-UHFFFAOYSA-N cerium(3+);trinitrate Chemical compound [Ce+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O HSJPMRKMPBAUAU-UHFFFAOYSA-N 0.000 description 8
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 description 7
- 239000002243 precursor Substances 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 6
- 239000013078 crystal Substances 0.000 description 5
- 239000003960 organic solvent Substances 0.000 description 5
- 150000002431 hydrogen Chemical class 0.000 description 4
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 3
- 230000002349 favourable effect Effects 0.000 description 3
- 239000002609 medium Substances 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 238000004062 sedimentation Methods 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 2
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N argon Substances [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- -1 argon ion Chemical class 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 238000001354 calcination Methods 0.000 description 2
- 230000003197 catalytic effect Effects 0.000 description 2
- VGBWDOLBWVJTRZ-UHFFFAOYSA-K cerium(3+);triacetate Chemical compound [Ce+3].CC([O-])=O.CC([O-])=O.CC([O-])=O VGBWDOLBWVJTRZ-UHFFFAOYSA-K 0.000 description 2
- GHLITDDQOMIBFS-UHFFFAOYSA-H cerium(3+);tricarbonate Chemical compound [Ce+3].[Ce+3].[O-]C([O-])=O.[O-]C([O-])=O.[O-]C([O-])=O GHLITDDQOMIBFS-UHFFFAOYSA-H 0.000 description 2
- 239000011362 coarse particle Substances 0.000 description 2
- 239000000567 combustion gas Substances 0.000 description 2
- 238000002485 combustion reaction Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- 239000010419 fine particle Substances 0.000 description 2
- 230000006698 induction Effects 0.000 description 2
- 238000010849 ion bombardment Methods 0.000 description 2
- 239000007791 liquid phase Substances 0.000 description 2
- 239000012074 organic phase Substances 0.000 description 2
- 238000002186 photoelectron spectrum Methods 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 238000000197 pyrolysis Methods 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000011877 solvent mixture Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- CMCBDXRRFKYBDG-UHFFFAOYSA-N 1-dodecoxydodecane Chemical compound CCCCCCCCCCCCOCCCCCCCCCCCC CMCBDXRRFKYBDG-UHFFFAOYSA-N 0.000 description 1
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 1
- RFVNOJDQRGSOEL-UHFFFAOYSA-N 2-hydroxyethyl octadecanoate Chemical compound CCCCCCCCCCCCCCCCCC(=O)OCCO RFVNOJDQRGSOEL-UHFFFAOYSA-N 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- 239000012695 Ce precursor Substances 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 1
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical class CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- 239000000908 ammonium hydroxide Substances 0.000 description 1
- BTBJBAZGXNKLQC-UHFFFAOYSA-N ammonium lauryl sulfate Chemical compound [NH4+].CCCCCCCCCCCCOS([O-])(=O)=O BTBJBAZGXNKLQC-UHFFFAOYSA-N 0.000 description 1
- 229940063953 ammonium lauryl sulfate Drugs 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- 239000012736 aqueous medium Substances 0.000 description 1
- 230000002902 bimodal effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- BTANRVKWQNVYAZ-UHFFFAOYSA-N butan-2-ol Chemical class CCC(C)O BTANRVKWQNVYAZ-UHFFFAOYSA-N 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- XQTIWNLDFPPCIU-UHFFFAOYSA-N cerium(3+) Chemical class [Ce+3] XQTIWNLDFPPCIU-UHFFFAOYSA-N 0.000 description 1
- ZMZNLKYXLARXFY-UHFFFAOYSA-H cerium(3+);oxalate Chemical compound [Ce+3].[Ce+3].[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O ZMZNLKYXLARXFY-UHFFFAOYSA-H 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- AOLMPVPUFVWGPN-UHFFFAOYSA-N diazanium;1-dodecoxydodecane;sulfate Chemical compound [NH4+].[NH4+].[O-]S([O-])(=O)=O.CCCCCCCCCCCCOCCCCCCCCCCCC AOLMPVPUFVWGPN-UHFFFAOYSA-N 0.000 description 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000012634 fragment Substances 0.000 description 1
- 230000014509 gene expression Effects 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 238000010191 image analysis Methods 0.000 description 1
- 238000001095 inductively coupled plasma mass spectrometry Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 239000003595 mist Substances 0.000 description 1
- 238000007557 optical granulometry Methods 0.000 description 1
- 238000010951 particle size reduction Methods 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 238000000634 powder X-ray diffraction Methods 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- 238000012216 screening Methods 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000005118 spray pyrolysis Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 150000005622 tetraalkylammonium hydroxides Chemical class 0.000 description 1
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
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- C01F17/20—Compounds containing only rare earth metals as the metal element
- C01F17/206—Compounds containing only rare earth metals as the metal element oxide or hydroxide being the only anion
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- C01F17/235—Cerium oxides or hydroxides
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Abstract
Description
本发明的实施例 | 对比例 | |||||||||
实施例 | 1 | 2 | 3 | 4 | 5<sup>c)</sup> | 6 | 7 | 8 | 9 | |
铈的含量质量流 | 重量%g/h | 121200 | 121200 | 121400 | 101200 | 151300 | 121200 | 121200 | 121300 | 121500 |
气体体积流氢气一次空气二次空气雾化空气 | m<sup>3</sup>/hm<sup>3</sup>/hm<sup>3</sup>/hm<sup>3</sup>/h | 1010205 | 1010205 | 1010205 | 1010205 | 4.4410204 | 103005 | 7.65113 | 810255 | 810223 |
限流器的长度温度1<sup>a)</sup>2<sup>b)</sup> | mm℃℃ | 1501200800 | 1501185820 | 501220900 | 3001150785 | -751623 | 1501200800 | 15014501080 | 1001006750 | 501200840 |
λ | 1.47 | 1.47 | 1.47 | 1.47 | 2.82 | 1.47 | 1.05 | 2.09 | 1.47 | |
速度喷嘴的流出速度反应室 | m/sm/s | 741.362.43 | 741.362.43 | 741.362.44 | 741.362.38 | 259.460.47 | 741.362.43 | 99.990.19 | 741.362.43 | 99.990.19 |
保留时间反应室 | s | 0.8 | 0.8 | 0.8 | 0.7 | 4.2 | 0.8 | n.d. | n.d. | n.d. |
本发明的实施例 | 对比例 | |||||||||
粉末<sup>a)</sup> | P1 | P2 | P3 | P4 | P5 | P6 | P7 | P8 | P9 | |
细/粗比例 | 100/0 | 100/0 | 100/0 | 100/0 | 26/74 | 81/19 | 70/30 | 77/23 | 60/40 | |
比表面 | m<sup>2</sup>/g | 93 | 104 | 71 | 134 | 19 | 101 | 66 | 101 | 76 |
平均直径 | ||||||||||
初级粒子 | nm | 10.10 | 9.82 | 12.80 | 6.88 | 40.05 | 10.01 | 28.07 | 12.54 | 25.12 |
聚集体 | nm | 40.40 | 37.39 | 46.40 | 30.20 | 5.04/87.84 | 10.01/106.02 | 8.60/93.80 | 10.10/87.50 | 8.06/90.20 |
钠 | ppm | 53 | 58 | 53 | 50 | 49 | 50 | 52 | 48 | 51 |
碳 | 重量% | 0.03 | 0.05 | 0.03 | 0.01 | 0.4 | 0.12 | 2.06 | 1.08 | 0.51 |
中孔体积 | ml/g | 0.55 | 0.48 | 0.54 | n.d. | 0.05 | n.d. | n.d. | n.d. | n.d. |
压实密度 | g/l | 100 | 87 | 105 | 80 | 1098 | 706 | 560 | 406 | 620 |
比重 | g/cm<sup>3</sup> | 6.69 | 6.18 | 6.58 | n.d. | n.d. | 6.5 | 6.55 | 6.4 | 6.45 |
PH值<sup>b)</sup> | 4.58 | 4.72 | 4.56 | 6.5 | 3.51 | 4.6 | 4.8 | 4.6 | 5 |
分散体 | D1 | D2 | D3 | D4 | |
平均 | nm | 156 | 147 | 114 | 130 |
90%小于 | nm | 237 | 236 | 203 | 205 |
95%小于 | nm | 280 | 277 | 237 | 249 |
Claims (36)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10337199A DE10337199A1 (de) | 2003-08-13 | 2003-08-13 | Ceroxidpulver |
DE10337199.0 | 2003-08-13 |
Publications (2)
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CN1579945A CN1579945A (zh) | 2005-02-16 |
CN100368299C true CN100368299C (zh) | 2008-02-13 |
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CNB2004100574252A Expired - Fee Related CN100368299C (zh) | 2003-08-13 | 2004-08-12 | 氧化铈粉末 |
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Country | Link |
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US (1) | US7264787B2 (zh) |
EP (1) | EP1506940B1 (zh) |
JP (1) | JP4215692B2 (zh) |
KR (1) | KR100604298B1 (zh) |
CN (1) | CN100368299C (zh) |
AT (1) | ATE538071T1 (zh) |
DE (1) | DE10337199A1 (zh) |
IL (1) | IL163462A (zh) |
SG (1) | SG109540A1 (zh) |
TW (1) | TWI294409B (zh) |
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DE10337199A1 (de) | 2003-08-13 | 2005-03-10 | Degussa | Ceroxidpulver |
KR100630691B1 (ko) | 2004-07-15 | 2006-10-02 | 삼성전자주식회사 | 산화세륨 연마 입자 및 그 제조 방법과 cmp용 슬러리조성물 및 그 제조 방법과 이들을 이용한 기판 연마 방법 |
DE102005029542A1 (de) | 2005-02-05 | 2006-08-10 | Degussa Ag | Verfahren zur Herstellung von Metalloxidpulvern |
EP1724012A1 (en) * | 2005-05-21 | 2006-11-22 | Degussa AG | Catalyst containing gold on ceria-manganes oxide |
EP1904072A4 (en) * | 2005-06-27 | 2009-06-17 | Edward Via Virginia College Of | ANTI-INFLAMMATORY, RADIOPROTECTIVE CERTIFICATE OXIDE NANOPARTICLE CAPACITIES AND ENHANCING LONGEVITY |
KR100782258B1 (ko) * | 2005-08-12 | 2007-12-04 | 데구사 게엠베하 | 산화 세륨 분말 및 산화 세륨 분산액 |
US7553465B2 (en) | 2005-08-12 | 2009-06-30 | Degussa Ag | Cerium oxide powder and cerium oxide dispersion |
DE102005038136A1 (de) * | 2005-08-12 | 2007-02-15 | Degussa Ag | Ceroxid-Pulver und Ceroxid-Dispersion |
KR100725699B1 (ko) * | 2005-09-02 | 2007-06-07 | 주식회사 엘지화학 | 일액형 cmp 슬러리용 산화 세륨 분말, 그 제조방법,이를 포함하는 일액형 cmp 슬러리 조성물, 및 상기슬러리를 사용하는 얕은 트랜치 소자 분리방법 |
JP4917098B2 (ja) * | 2005-09-20 | 2012-04-18 | エルジー・ケム・リミテッド | 炭酸セリウム粉末及び製法、これから製造された酸化セリウム粉末及び製法、これを含むcmpスラリー |
US8361419B2 (en) * | 2005-09-20 | 2013-01-29 | Lg Chem, Ltd. | Cerium carbonate powder, method for preparing the same, cerium oxide powder made therefrom, method for preparing the same, and CMP slurry comprising the same |
JP5090920B2 (ja) * | 2005-10-14 | 2012-12-05 | エルジー・ケム・リミテッド | Cmpスラリー用酸化セリウム粉末の製造方法及びこれを用いたcmp用スラリー組成物の製造方法 |
CN100565813C (zh) * | 2005-12-16 | 2009-12-02 | Jsr株式会社 | 化学机械研磨用水系分散体和化学机械研磨方法、以及用于调制化学机械研磨用水系分散体的试剂盒 |
CN100357362C (zh) * | 2005-12-26 | 2007-12-26 | 内蒙古科技大学 | 一种抛光用超细氧化铈的制备方法 |
US20100172994A1 (en) * | 2006-11-22 | 2010-07-08 | University Of Florida Research Foundation, Inc. | Nanoparticles for Protection of Cells from Oxidative Stress |
US8084529B2 (en) * | 2006-12-28 | 2011-12-27 | Dow Corning Toray Co., Ltd. | Thermosetting silicone rubber composition |
JP5379351B2 (ja) * | 2007-01-17 | 2013-12-25 | 三井金属鉱業株式会社 | セリウム系研摩材 |
US8491682B2 (en) * | 2007-12-31 | 2013-07-23 | K.C. Tech Co., Ltd. | Abrasive particles, method of manufacturing the abrasive particles, and method of manufacturing chemical mechanical polishing slurry |
CN101970347A (zh) * | 2008-02-08 | 2011-02-09 | 尤米科尔公司 | 具有受控形态的掺杂二氧化铈研磨剂及其制备 |
FR2931471B1 (fr) * | 2008-05-20 | 2011-01-14 | Commissariat Energie Atomique | Systeme de production autonome d'hydrogene pour un systeme embarque |
US9585840B1 (en) | 2009-07-10 | 2017-03-07 | University Of Central Florida Research Foundation, Inc. | Redox active cerium oxide nanoparticles and associated methods |
US8187562B2 (en) * | 2010-05-13 | 2012-05-29 | Korea Institute Of Geoscience And Mineral Resources (Kigam) | Method for producing cerium dioxide nanopowder by flame spray pyrolysis and cerium dioxide nanopowder produced by the method |
US8877207B2 (en) | 2010-09-17 | 2014-11-04 | University Of Central Florida Research Foundation, Inc. | Nanoparticles of cerium oxide targeted to an amyloid-beta antigen of Alzheimer's disease and associated methods |
TWI607969B (zh) * | 2014-09-12 | 2017-12-11 | 台灣積體電路製造股份有限公司 | 二氧化鈰粉體的製造方法及二氧化鈰粉體 |
KR102561087B1 (ko) * | 2015-03-18 | 2023-07-27 | 피너지 엘티디. | 금속 산화물 입자 및 이의 제조 방법 |
CN105017972B (zh) * | 2015-07-20 | 2018-05-04 | 林州市清华·红旗渠新材料产业化发展中心 | 一种铈基抛光粉的制备方法 |
JP6827318B2 (ja) * | 2016-12-28 | 2021-02-10 | 花王株式会社 | 酸化セリウム砥粒 |
KR102275429B1 (ko) * | 2017-12-11 | 2021-07-12 | 주식회사 케이씨텍 | Cmp용 슬러리 조성물 및 이에 포함된 연마입자 |
CN109015341B (zh) * | 2018-08-03 | 2020-08-11 | 成都时代立夫科技有限公司 | 一种基于多孔氧化铈的cmp抛光层及其制备方法 |
CN109534383B (zh) * | 2019-01-18 | 2022-10-11 | 江西师范大学 | 一种二氧化铈纳米片的合成方法 |
EP3689851A1 (en) | 2019-02-04 | 2020-08-05 | Evonik Operations GmbH | Salt-free production of methionine from methionine nitrile |
JP7425074B2 (ja) | 2019-02-04 | 2024-01-30 | エボニック オペレーションズ ゲーエムベーハー | メチオニンの製造方法 |
JP2022536170A (ja) | 2019-06-13 | 2022-08-12 | エボニック オペレーションズ ゲーエムベーハー | メチオニンの製造方法 |
WO2022189598A1 (en) * | 2021-03-12 | 2022-09-15 | Rhodia Operations | Cerium oxide particles, making process thereof and use thereof in chemical mechanical polishing |
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- 2003-08-13 DE DE10337199A patent/DE10337199A1/de not_active Withdrawn
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2004
- 2004-05-29 EP EP04012835A patent/EP1506940B1/de not_active Expired - Lifetime
- 2004-05-29 AT AT04012835T patent/ATE538071T1/de active
- 2004-07-12 US US10/887,819 patent/US7264787B2/en active Active
- 2004-07-29 SG SG200404340A patent/SG109540A1/en unknown
- 2004-08-10 JP JP2004233631A patent/JP4215692B2/ja not_active Expired - Fee Related
- 2004-08-11 IL IL163462A patent/IL163462A/en not_active IP Right Cessation
- 2004-08-11 TW TW093124078A patent/TWI294409B/zh not_active IP Right Cessation
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Publication number | Publication date |
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EP1506940B1 (de) | 2011-12-21 |
JP2005060222A (ja) | 2005-03-10 |
TWI294409B (en) | 2008-03-11 |
SG109540A1 (en) | 2005-03-30 |
CN1579945A (zh) | 2005-02-16 |
KR100604298B1 (ko) | 2006-07-28 |
KR20050018754A (ko) | 2005-02-28 |
EP1506940A1 (de) | 2005-02-16 |
ATE538071T1 (de) | 2012-01-15 |
US7264787B2 (en) | 2007-09-04 |
JP4215692B2 (ja) | 2009-01-28 |
DE10337199A1 (de) | 2005-03-10 |
IL163462A (en) | 2008-08-07 |
TW200510251A (en) | 2005-03-16 |
US20050036928A1 (en) | 2005-02-17 |
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