CN100354663C - Method for producing color filter - Google Patents
Method for producing color filter Download PDFInfo
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- CN100354663C CN100354663C CNB2004100633119A CN200410063311A CN100354663C CN 100354663 C CN100354663 C CN 100354663C CN B2004100633119 A CNB2004100633119 A CN B2004100633119A CN 200410063311 A CN200410063311 A CN 200410063311A CN 100354663 C CN100354663 C CN 100354663C
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- photoresistance
- picture element
- dielectric layer
- color filter
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Abstract
The present invention relates to a method for manufacturing a color filter, which comprises the following steps that a base plate on which a dielectric layer is formed is provided, and the dielectric layer is provided with a first light resistor and carries out a first exposing and developing process so that the first light resistor becomes a plurality of first picture elements; the dielectric layer is provided with a second light resistor and carries out a second exposing and developing process so that the second light resistor becomes a plurality of second picture elements; the second picture elements are overlapped above the first picture elements at the juncture of the first picture elements and the second picture elements; the dielectric layer is provided with a third light resistor and carries out a third exposing and developing process so that the third light resistor covers the dielectric layer; the third light resistor becomes a plurality of third picture elements by a shaft body in a rolling and stretching mode. Thus, the first, the second and the third picture elements have a flat surface.
Description
Technical field
This case is meant a kind of color filter making method, refers to a kind of color filter making method that improves planarization especially.
Background technology
Progress day by day along with manufacturing technology, LCD (Liquid Crystal Display, LCD) be a kind of display element that is widely used, its principle of work mainly is to utilize electric field to control the ordered state of liquid crystal molecule, can be by the light that backlight produces by liquid crystal molecule whether to reach the display effect of light and shade on the screen, particularly be applied to the colored filter of liquid crystal panel, the usefulness of the good whether corrupt liquid crystal panel that more affected sb. closely of its process quality and give consumer's impression.
Make the program of colored filter traditionally, as shown in Figure 1, it at first is the oxide layer 102 that on silicon semiconductor substrate 101, forms layer of transparent and planarization, afterwards, on oxide layer 102, cover the blue photoresistance of one deck, behind the single exposure developing manufacture process, form blue picture element 1031, cover the green photoresistance of one deck afterwards, through the re-expose developing manufacture process, and the pattern proportion of exposure is 25% each time, carry out developing manufacture process again and form green picture element 1032, then, cover the red photoresistance of one deck, behind the single exposure developing manufacture process, form red picture element 1033, at last, on each picture element, form the oxide layer 104 of layer of transparent and planarization again, to constitute the structure of whole colored filter 100.
Yet this traditional fabrication method but has following two problems:
(1) because when making the picture element of different colours, easily have overlapping between the picture element of different colours of colored filter 100 or cover not exclusively, cause image distortion because of the processing procedure misalignment causes, and the hole between picture element also can cause the interference of interference, therefore the preparation of green picture element 1032 needs the exposure through secondary, has increased cost of manufacture; And
(2) because the coating thickness of blue photoresistance, green photoresistance and red photoresistance can be variant, make the surperficial uneven of formed blue picture element 1031, green picture element 1032 and red picture element 1033, and the picture element that causes different colours has different light velocity of propagation (photo-transmission rate), influences the quality of image.
In order to solve two above-mentioned problems, the Taiwan patent announcement has proposed a kind of color filter making method No. 00533589, it is that each forms respectively after blue picture element 1031 and the red picture element 1033 in regular turn with once exposure imaging processing procedure on oxide layer 102, make the blue picture element 1031 that covered by green photoresistance and the surface of red picture element 1033 reveal with an etch-back processing procedure again, make formed blue picture element 1031, haematochrome 1033 and green picture element 1032 have the thickness of uniformity.
Yet, the improvement method of the processing procedure of this planarization still has on the THICKNESS CONTROL of each pigment does not attain desirable part, and, though the processing procedure of green picture element 1032 has been reduced the exposure imaging processing procedure one, but increased etch process one at the back processing procedure, manufacturing cost reduces limited.
Duty is event, and this creation is through concentrated test and research in view of the disappearance of known techniques, and a spirit of working with perseverance, and creates the present invention's " color filter making method " eventually.It below is brief description of the present invention.
Summary of the invention
Fundamental purpose of the present invention provides a kind of color filter making method, is to use calendering process to remove mutual covering place of photoresistance, to reach the purpose of planarization.
According to a conception of the present invention, a kind of color filter making method is proposed, comprise the following steps: to provide a substrate, and on this substrate, form a dielectric layer; On this dielectric layer, form one first photoresistance, and carry out one first exposure imaging processing procedure, make this first photoresistance become a plurality of first picture elements; On this dielectric layer, form one second photoresistance, and carry out one second exposure imaging processing procedure, make this second photoresistance become a plurality of second picture elements, at the intersection of those first picture elements and second picture element, on overlapping those first picture elements of those second picture elements; On this dielectric layer, form one the 3rd photoresistance, and carry out one the 3rd exposure imaging processing procedure, make the 3rd photoresistance cover this dielectric layer; And make the 3rd photoresistance become a plurality of the 3rd picture elements with an axis body with the rolling stretching mode, and make those first, second, and the 3rd picture element have a flat surfaces.
According to above-mentioned conception, wherein the material of this dielectric layer is to be monox.
According to above-mentioned conception, wherein this first photoresistance is to be blue photoresistance, and this first picture element is to be blue picture element, and this second photoresistance is to be red photoresistance, and this second picture element is to be red picture element, and the 3rd photoresistance is to be green photoresistance, and the 3rd picture element is to be green picture element.
According to above-mentioned conception, wherein should blueness, redness, and green photoresistance all be to be negative photoresistance.
According to above-mentioned conception, wherein this first photoresistance is to be red photoresistance, and this first picture element is to be red picture element, and this second photoresistance is to be blue photoresistance, and this second picture element is to be blue picture element, and the 3rd photoresistance is to be green photoresistance, and the 3rd picture element is to be green picture element.
According to above-mentioned conception, wherein should blueness, redness, and green photoresistance all be to be negative photoresistance.
According to above-mentioned conception, wherein this axis body is to be a roller.
According to other conception of the present invention, a kind of color filter making method is proposed, comprise the following steps: to provide a substrate, and on this substrate, form a dielectric layer; On this dielectric layer, form one first photoresistance, and carry out one first exposure imaging processing procedure, make this first photoresistance become a plurality of first picture elements; On this dielectric layer, form one second photoresistance, and carry out one second exposure imaging processing procedure, make this second photoresistance become a plurality of second picture elements, at the intersection of those first picture elements and second picture element, on overlapping those first picture elements of those second picture elements; On this dielectric layer, form one the 3rd photoresistance, and carry out one the 3rd exposure imaging processing procedure, make the 3rd photoresistance cover this dielectric layer; And make the 3rd photoresistance become a plurality of the 3rd picture elements in a calendering mode, and make those first, second, and the 3rd picture element have a flat surfaces.
According to above-mentioned conception, wherein the material of this dielectric layer is to be monox.
According to above-mentioned conception, wherein this first photoresistance is to be blue photoresistance, and this first picture element is to be blue picture element, and this second photoresistance is to be red photoresistance, and this second picture element is to be red picture element, and the 3rd photoresistance is to be green photoresistance, and the 3rd picture element is to be green picture element.
According to above-mentioned conception, wherein should blueness, redness, and green photoresistance all be to be negative photoresistance.
According to above-mentioned conception, wherein this first photoresistance is to be red photoresistance, and this first picture element is to be red picture element, and this second photoresistance is to be blue photoresistance, and this second picture element is to be blue picture element, and the 3rd photoresistance is to be green photoresistance, and the 3rd picture element is to be green picture element.
According to above-mentioned conception, wherein should blueness, redness, and green photoresistance all be to be negative photoresistance.
According to above-mentioned conception, wherein should the calendering mode be to use a calender.
Description of drawings
This case must be by following graphic and describe in detail, in order to do a more deep understanding:
Fig. 1: the structure side view of traditional colored filter;
Fig. 2 (a) to (e): the process flow diagram of this case color filter making method one preferred embodiment; And
Fig. 3 (a)～(c): cooperate view on the middle different colours picture element of Fig. 2 (a) to (e).
Embodiment
See also Fig. 2 (a) to (e), it is the process flow diagram of this case color filter making method one preferred embodiment.
At first, earlier as Fig. 2 (a) shown in, form the dielectric layer 202 of layer of transparent and planarization on semiconductor substrate 201, the formation pattern proportion is a color picture element of 25% on dielectric layer 202 again, for example blue picture element 2031.Its formation method is the blue photoresistance of coating one deck on dielectric layer 202, it is the negative photoresistance of a kind of blue dyes (pigment), carry out single exposure processing procedure and a developing manufacture process afterwards, make the block sclerosis that has exposed, so that this blue photoresistance transfers the blue picture element 2031 of many bulks to, shown in Fig. 3 (a).
Then for another example shown in Fig. 2 (b), form pattern proportion and be another color picture element of 25%, for example red picture element 2032.Its formation method is the red photoresistance of coating one deck on dielectric layer 202 and blue picture element 2031, and this red photoresistance is a kind of negative photoresistance that contains orchil, and the preceding blue photoresistance that formed thickness can be is thick.Then, carry out single exposure processing procedure and a developing manufacture process again, make the block sclerosis that has exposed, so that this red photoresistance transfers the red picture element 2032 of many bulks to, shown in Fig. 3 (b).Wherein at the intersection of red picture element 2032 and blue picture element 2031, red picture element 2032 can partly overlap on the blue picture element 2031, avoiding misalignment (misalignment) phenomenon of processing procedure in range of allowable error, and causes color distortion.
Color filter making method that it should be noted that this case can also form red picture element 2032 earlier, forms blue picture element 2031 again.
Then, shown in Fig. 2 (C), the formation pattern proportion is 50% green picture element 2033 for another example.Its formation method is the green photoresistance of coating one deck on dielectric layer 202, blue picture element 2031 and red picture element 2032, and this green photoresistance is a kind of negative photoresistance that contains green colouring material, and the preceding red photoresistance that formed thickness can be is thick.And then carry out single exposure processing procedure and a developing manufacture process, so that green photoresistance covers whole dielectric layer 202, shown in Fig. 3 (c).
What carry out at last is the calendering processing procedure, shown in Fig. 2 (d), it is to utilize mode that a columniform axis body (as the roller among the figure 21) or a calender (not shown) stretch to roll to blue picture element 2031, red picture element 2032, and green picture element 2033 rolls, to expose the surface of blue picture element 2031 and red picture element 2032, form the blue picture element 2031 shown in Fig. 2 (e), red picture element 2032, and green picture element 2033, its Smalt picture element 2031, red picture element 2032, and green picture element 2033 do not have any overlapping situation, and forms without any the gap.Owing in the calendering processing procedure, can meticulous control roll the speed and the degree of depth, therefore can make formed blue picture element 2031, red picture element 2032 and green picture element 2033 have the surface of homogeneous.These formed blue picture elements 2031, red picture element 2032, green picture element 2033 have constituted colored filter 200 jointly with semiconductor substrate 201 and dielectric layer 202, and this colored filter 200 has homogeneous thickness and smooth surface simultaneously.
In sum, the preparation method of the colored filter of this case has following advantages at least:
(1) utilizes the surface of three kinds of picture elements of rolling process planarization, can control smooth degree to imperceptible The processing procedure performance;
(2) with respect to known techniques, reduced the processing procedure of one etch-back, can significantly reduce being made into This; And
(3) the green photoresistance of this case has been reached equally only needs one exposure manufacture process, also only needs a light shield figure Therefore case can be simplified the processing procedure of colored filter.
Hence one can see that, and the technology of this case can significantly reduce the cost of manufacture of colored filter really, and Effectively promoting the usefulness of colored filter, is one to have industry applications, novelty and progressive concurrently in fact The modification method of property.
The present invention must be thought and is to modify right neither taking off as attached as all by the personage Ren Shi craftsman who is familiar with this skill Protector that claim is wanted.
Claims (14)
1. a color filter making method comprises the following steps:
One substrate is provided, and on this substrate, forms a dielectric layer;
On this dielectric layer, form one first photoresistance, and carry out one first exposure imaging processing procedure, make this first photoresistance become a plurality of first picture elements;
On this dielectric layer, form one second photoresistance, and carry out one second exposure imaging processing procedure, make this second photoresistance become a plurality of second picture elements, at the intersection of those first picture elements and second picture element, on overlapping those first picture elements of those second picture elements;
On this dielectric layer, form one the 3rd photoresistance, and carry out one the 3rd exposure imaging processing procedure, make the 3rd photoresistance cover this dielectric layer; And
Therefore make the 3rd photoresistance become a plurality of the 3rd picture elements with an axis body with the rolling stretching mode, and remove mutual covering place of removing photoresistance, and make those first, second, and the 3rd picture element have a flat surfaces.
2. color filter making method as claimed in claim 1, wherein the material of this dielectric layer is a monox.
3. color filter making method as claimed in claim 1, wherein this first photoresistance is blue photoresistance, this first picture element is blue picture element, this second photoresistance is red photoresistance, this second picture element is red picture element, and the 3rd photoresistance is green photoresistance, and the 3rd picture element is green picture element.
4. color filter making method as claimed in claim 3, wherein should blueness, redness, and green photoresistance be all negative photoresistance.
5. color filter making method as claimed in claim 1, wherein this first photoresistance is red photoresistance, this first picture element is red picture element, this second photoresistance is blue photoresistance, this second picture element is blue picture element, and the 3rd photoresistance is green photoresistance, and the 3rd picture element is green picture element.
6. color filter making method as claimed in claim 5, wherein should blueness, redness, and green photoresistance be all negative photoresistance.
7. color filter making method as claimed in claim 1, wherein this axis body is a roller.
8. a color filter making method comprises the following steps:
One substrate is provided, and on this substrate, forms a dielectric layer;
On this dielectric layer, form one first photoresistance, and carry out one first exposure imaging processing procedure, make this first photoresistance become a plurality of first picture elements;
On this dielectric layer, form one second photoresistance, and carry out one second exposure imaging processing procedure, make this second photoresistance become a plurality of second picture elements, at the intersection of those first picture elements and second picture element, on overlapping those first picture elements of those second picture elements;
On this dielectric layer, form one the 3rd photoresistance, and carry out one the 3rd exposure imaging processing procedure, make the 3rd photoresistance cover this dielectric layer; And
Therefore make the 3rd photoresistance become a plurality of the 3rd picture elements in a calendering mode, and remove mutual covering place of removing photoresistance, and make those first, second, and the 3rd picture element have a flat surfaces.
9. color filter making method as claimed in claim 8, wherein the material of this dielectric layer is a monox.
10. color filter making method as claimed in claim 8, wherein this first photoresistance is blue photoresistance, this first picture element is blue picture element, this second photoresistance is red photoresistance, this second picture element is red picture element, and the 3rd photoresistance is green photoresistance, and the 3rd picture element is green picture element.
11. color filter making method as claimed in claim 10, wherein should blueness, redness, and green photoresistance be all negative photoresistance.
12. color filter making method as claimed in claim 8, wherein this first photoresistance is red photoresistance, and this first picture element is red picture element, this second photoresistance is blue photoresistance, this second picture element is blue picture element, and the 3rd photoresistance is green photoresistance, and the 3rd picture element is green picture element.
13. color filter making method as claimed in claim 12, wherein should blueness, redness, and green photoresistance be all negative photoresistance.
14. color filter making method as claimed in claim 8 wherein should the calendering mode be to use a calender.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2004100633119A CN100354663C (en) | 2004-07-02 | 2004-07-02 | Method for producing color filter |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2004100633119A CN100354663C (en) | 2004-07-02 | 2004-07-02 | Method for producing color filter |
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| Publication Number | Publication Date |
|---|---|
| CN1715967A CN1715967A (en) | 2006-01-04 |
| CN100354663C true CN100354663C (en) | 2007-12-12 |
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| CNB2004100633119A Expired - Fee Related CN100354663C (en) | 2004-07-02 | 2004-07-02 | Method for producing color filter |
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Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4853092A (en) * | 1987-04-24 | 1989-08-01 | Nippon Paint Co., Ltd. | Production of multicolor display |
| US5013138A (en) * | 1987-01-27 | 1991-05-07 | Agfa-Gevaert N.V. | Liquid crystal display |
| CN1130765A (en) * | 1994-10-18 | 1996-09-11 | 希普列远东股份公司 | Method for manufacturing liquid crystal display element |
| US6383694B1 (en) * | 2000-03-27 | 2002-05-07 | Sumitomo Chemical Company Limited | Method of manufacturing a color filter for a reflective liquid crystal display |
| JP2003167117A (en) * | 2001-11-23 | 2003-06-13 | Ind Technol Res Inst | Color filter of liquid crystal display panel and manufacturing method therefor |
| CN1425928A (en) * | 2001-12-13 | 2003-06-25 | 住友化学工业株式会社 | Colored light sensitive resin composition |
| JP2004144862A (en) * | 2002-10-23 | 2004-05-20 | Dainippon Printing Co Ltd | Method for manufacturing color filter and color filter manufacturing apparatus |
-
2004
- 2004-07-02 CN CNB2004100633119A patent/CN100354663C/en not_active Expired - Fee Related
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5013138A (en) * | 1987-01-27 | 1991-05-07 | Agfa-Gevaert N.V. | Liquid crystal display |
| US4853092A (en) * | 1987-04-24 | 1989-08-01 | Nippon Paint Co., Ltd. | Production of multicolor display |
| CN1130765A (en) * | 1994-10-18 | 1996-09-11 | 希普列远东股份公司 | Method for manufacturing liquid crystal display element |
| US6383694B1 (en) * | 2000-03-27 | 2002-05-07 | Sumitomo Chemical Company Limited | Method of manufacturing a color filter for a reflective liquid crystal display |
| JP2003167117A (en) * | 2001-11-23 | 2003-06-13 | Ind Technol Res Inst | Color filter of liquid crystal display panel and manufacturing method therefor |
| CN1425928A (en) * | 2001-12-13 | 2003-06-25 | 住友化学工业株式会社 | Colored light sensitive resin composition |
| JP2004144862A (en) * | 2002-10-23 | 2004-05-20 | Dainippon Printing Co Ltd | Method for manufacturing color filter and color filter manufacturing apparatus |
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| Publication number | Publication date |
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| CN1715967A (en) | 2006-01-04 |
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Granted publication date: 20071212 Termination date: 20130702 |