AT385058B
(de)
*
|
1946-07-17 |
1988-02-10 |
Vni Instrument Inst |
Verfahren zur verfestigung von schneidwerkzeugen
|
JPS51115286A
(en)
*
|
1975-04-03 |
1976-10-09 |
Anelva Corp |
Ornament
|
US4022947A
(en)
*
|
1975-11-06 |
1977-05-10 |
Airco, Inc. |
Transparent panel having high reflectivity for solar radiation and a method for preparing same
|
DE3030149C3
(de)
*
|
1979-08-09 |
1996-12-19 |
Mitsubishi Materials Corp |
Schneidplättchen und Verfahren zu seiner Herstellung
|
JPS5656636A
(en)
*
|
1979-10-13 |
1981-05-18 |
Mitsubishi Electric Corp |
Processing method of fine pattern
|
GB2075069B
(en)
*
|
1979-12-03 |
1984-09-12 |
Atomic Energy Authority Uk |
Wear resistance of metals
|
US4364969A
(en)
*
|
1979-12-13 |
1982-12-21 |
United Kingdom Atomic Energy Authority |
Method of coating titanium and its alloys
|
JPS5779169A
(en)
*
|
1980-11-06 |
1982-05-18 |
Sumitomo Electric Ind Ltd |
Physical vapor deposition method
|
US4645715A
(en)
*
|
1981-09-23 |
1987-02-24 |
Energy Conversion Devices, Inc. |
Coating composition and method
|
US4532149A
(en)
*
|
1981-10-21 |
1985-07-30 |
The United States Of America As Represented By The United States Department Of Energy |
Method for producing hard-surfaced tools and machine components
|
GB2123039B
(en)
*
|
1982-03-23 |
1985-10-23 |
Atomic Energy Authority Uk |
Coatings for cutting implements
|
AT381268B
(de)
*
|
1982-05-05 |
1986-09-25 |
Ver Edelstahlwerke Ag |
Werkzeug und verfahren zu dessen herstellung
|
GB2125442B
(en)
*
|
1982-05-24 |
1986-02-19 |
Atomic Energy Authority Uk |
A procedure for the hardening of materials
|
US4486247A
(en)
*
|
1982-06-21 |
1984-12-04 |
Westinghouse Electric Corp. |
Wear resistant steel articles with carbon, oxygen and nitrogen implanted in the surface thereof
|
US4751100A
(en)
*
|
1983-06-20 |
1988-06-14 |
Matsushita Electric Industrial Co., Ltd. |
Magnetic recording medium and method for making the same
|
JPS6115967A
(ja)
*
|
1984-06-29 |
1986-01-24 |
Sumitomo Electric Ind Ltd |
表面処理方法
|
GB8423255D0
(en)
*
|
1984-09-14 |
1984-10-17 |
Atomic Energy Authority Uk |
Surface treatment of metals
|
GB8512542D0
(en)
*
|
1985-05-17 |
1985-06-19 |
Atomic Energy Authority Uk |
Improved cutting edges
|
US5250327A
(en)
*
|
1986-04-28 |
1993-10-05 |
Nissin Electric Co. Ltd. |
Composite substrate and process for producing the same
|
US4737234A
(en)
*
|
1986-08-18 |
1988-04-12 |
Westinghouse Electric Corp. |
Method and apparatus for permanently recording high neutron fluence
|
US4744938A
(en)
*
|
1986-08-18 |
1988-05-17 |
Westinghouse Electric Corp. |
Method and apparatus for producing ultralowmass fissionable deposits for reactor neutron dosimetry by recoil ion-implantation
|
AT388394B
(de)
*
|
1987-01-09 |
1989-06-12 |
Vni Instrument Inst |
Verfahren zur herstellung von schneidwerkzeug
|
US4764394A
(en)
*
|
1987-01-20 |
1988-08-16 |
Wisconsin Alumni Research Foundation |
Method and apparatus for plasma source ion implantation
|
US5088202A
(en)
*
|
1988-07-13 |
1992-02-18 |
Warner-Lambert Company |
Shaving razors
|
GB2227755B
(en)
*
|
1988-12-08 |
1993-03-10 |
Univ Hull |
A process for improving the wear and corrosion resistance of metallic components
|
US5061512A
(en)
*
|
1989-02-21 |
1991-10-29 |
General Electric Company |
Method of producing lubricated bearings
|
US5242741A
(en)
*
|
1989-09-08 |
1993-09-07 |
Taiho Kogyo Co., Ltd. |
Boronized sliding material and method for producing the same
|
JP2786283B2
(ja)
*
|
1989-12-22 |
1998-08-13 |
株式会社日立製作所 |
表面改質方法およびその装置並びに表面改質基材
|
US5139876A
(en)
*
|
1990-03-05 |
1992-08-18 |
Cleveland State University |
Ceramic article having wear resistant coating
|
US5167725A
(en)
*
|
1990-08-01 |
1992-12-01 |
Ultracision, Inc. |
Titanium alloy blade coupler coated with nickel-chrome for ultrasonic scalpel
|
CA2065581C
(en)
|
1991-04-22 |
2002-03-12 |
Andal Corp. |
Plasma enhancement apparatus and method for physical vapor deposition
|
US5393573A
(en)
*
|
1991-07-16 |
1995-02-28 |
Microelectronics And Computer Technology Corporation |
Method of inhibiting tin whisker growth
|
FR2681472B1
(fr)
|
1991-09-18 |
1993-10-29 |
Commissariat Energie Atomique |
Procede de fabrication de films minces de materiau semiconducteur.
|
JP3221892B2
(ja)
*
|
1991-09-20 |
2001-10-22 |
帝国ピストンリング株式会社 |
ピストンリング及びその製造法
|
WO1993010275A1
(en)
*
|
1991-11-21 |
1993-05-27 |
Nisshin Steel Co., Ltd. |
Method of forming layer of evaporation coating
|
US5224249A
(en)
*
|
1992-01-21 |
1993-07-06 |
Grumman Aerospace Corporation |
Corrosion prevention of honeycomb core panel construction using ion implantation
|
US5301431A
(en)
*
|
1992-12-01 |
1994-04-12 |
Etm Corporation |
Hand-held cutting tool
|
US5347887A
(en)
*
|
1993-03-11 |
1994-09-20 |
Microsurgical Techniques, Inc. |
Composite cutting edge
|
US5445689A
(en)
*
|
1994-08-23 |
1995-08-29 |
Northrop Grumman Corporation |
Pulsed ion beam surface treatment process for aluminum honeycomb panels to improve corrosion resistance
|
FR2748851B1
(fr)
*
|
1996-05-15 |
1998-08-07 |
Commissariat Energie Atomique |
Procede de realisation d'une couche mince de materiau semiconducteur
|
SE506949C2
(sv)
*
|
1996-07-19 |
1998-03-09 |
Sandvik Ab |
Hårdmetallverktyg med borerad ytzon och användning av detta för kallbearbetningsoperationer
|
US6033974A
(en)
|
1997-05-12 |
2000-03-07 |
Silicon Genesis Corporation |
Method for controlled cleaving process
|
US6162705A
(en)
*
|
1997-05-12 |
2000-12-19 |
Silicon Genesis Corporation |
Controlled cleavage process and resulting device using beta annealing
|
US20070122997A1
(en)
|
1998-02-19 |
2007-05-31 |
Silicon Genesis Corporation |
Controlled process and resulting device
|
US6291313B1
(en)
|
1997-05-12 |
2001-09-18 |
Silicon Genesis Corporation |
Method and device for controlled cleaving process
|
US6027988A
(en)
*
|
1997-05-28 |
2000-02-22 |
The Regents Of The University Of California |
Method of separating films from bulk substrates by plasma immersion ion implantation
|
US6077572A
(en)
*
|
1997-06-18 |
2000-06-20 |
Northeastern University |
Method of coating edges with diamond-like carbon
|
US6548382B1
(en)
|
1997-07-18 |
2003-04-15 |
Silicon Genesis Corporation |
Gettering technique for wafers made using a controlled cleaving process
|
FR2773261B1
(fr)
|
1997-12-30 |
2000-01-28 |
Commissariat Energie Atomique |
Procede pour le transfert d'un film mince comportant une etape de creation d'inclusions
|
US6291326B1
(en)
|
1998-06-23 |
2001-09-18 |
Silicon Genesis Corporation |
Pre-semiconductor process implant and post-process film separation
|
DE19827803A1
(de)
*
|
1998-06-23 |
1999-12-30 |
Bortec Gmbh |
Verfahren zur Herstellung von Bornitridschichten auf metallischen und nichtmetallischen Werkstoffoberflächen und Schneidwerkzeugen
|
DE19840950A1
(de)
*
|
1998-09-08 |
2000-03-09 |
Jagenberg Papiertech Gmbh |
Messer zum Schneiden laufender Materialbahnen
|
US6338879B1
(en)
*
|
1998-12-09 |
2002-01-15 |
Nachi-Fujikoshi Corp. |
Solid lubricant film for coated cutting tool and method for manufacturing same
|
US6200649B1
(en)
*
|
1999-07-21 |
2001-03-13 |
Southwest Research Institute |
Method of making titanium boronitride coatings using ion beam assisted deposition
|
US6500732B1
(en)
|
1999-08-10 |
2002-12-31 |
Silicon Genesis Corporation |
Cleaving process to fabricate multilayered substrates using low implantation doses
|
JP2003506883A
(ja)
|
1999-08-10 |
2003-02-18 |
シリコン ジェネシス コーポレイション |
低打ち込みドーズ量を用いて多層基板を製造するための劈開プロセス
|
US6263941B1
(en)
|
1999-08-10 |
2001-07-24 |
Silicon Genesis Corporation |
Nozzle for cleaving substrates
|
US6221740B1
(en)
|
1999-08-10 |
2001-04-24 |
Silicon Genesis Corporation |
Substrate cleaving tool and method
|
RU2161661C1
(ru)
*
|
1999-08-16 |
2001-01-10 |
Падеров Анатолий Николаевич |
Способ нанесения износостойких покрытий и повышения долговечности деталей
|
US7229675B1
(en)
*
|
2000-02-17 |
2007-06-12 |
Anatoly Nikolaevich Paderov |
Protective coating method for pieces made of heat resistant alloys
|
US7064491B2
(en)
*
|
2000-11-30 |
2006-06-20 |
Semequip, Inc. |
Ion implantation system and control method
|
EP1347804A4
(de)
*
|
2000-11-30 |
2009-04-22 |
Semequip Inc |
Ionenimplantationssystem und kontrollverfahren
|
FR2823599B1
(fr)
|
2001-04-13 |
2004-12-17 |
Commissariat Energie Atomique |
Substrat demomtable a tenue mecanique controlee et procede de realisation
|
US6723177B2
(en)
|
2001-07-09 |
2004-04-20 |
Southwest Research Institute |
Life extension of chromium coating and chromium alloys
|
US20040112476A1
(en)
*
|
2001-07-09 |
2004-06-17 |
Geoffrey Dearnaley |
Life extension of chromium coatings and chromium alloys
|
US6933509B1
(en)
*
|
2001-09-11 |
2005-08-23 |
Allasso Industries, Inc. |
Apparatus and method using fractionated irradiation to harden metal
|
DE10222453A1
(de)
*
|
2002-05-22 |
2003-12-04 |
Voith Paper Patent Gmbh |
Verfahren zur Oberflächenbehandlung eines Rakelelementes
|
US20050100673A1
(en)
*
|
2002-05-22 |
2005-05-12 |
Ulrich Schoof |
Method for the surface treatment of a doctor element
|
US6686595B2
(en)
|
2002-06-26 |
2004-02-03 |
Semequip Inc. |
Electron impact ion source
|
KR100864048B1
(ko)
*
|
2002-06-26 |
2008-10-17 |
세미이큅, 인코포레이티드 |
이온 소스
|
US20040002202A1
(en)
*
|
2002-06-26 |
2004-01-01 |
Horsky Thomas Neil |
Method of manufacturing CMOS devices by the implantation of N- and P-type cluster ions
|
US20050246904A1
(en)
*
|
2002-08-21 |
2005-11-10 |
Koninklijke Philips Electronics N.V. |
Cutting member having a superlattice coating
|
US8187377B2
(en)
|
2002-10-04 |
2012-05-29 |
Silicon Genesis Corporation |
Non-contact etch annealing of strained layers
|
FR2848336B1
(fr)
|
2002-12-09 |
2005-10-28 |
Commissariat Energie Atomique |
Procede de realisation d'une structure contrainte destinee a etre dissociee
|
FR2856844B1
(fr)
|
2003-06-24 |
2006-02-17 |
Commissariat Energie Atomique |
Circuit integre sur puce de hautes performances
|
FR2857953B1
(fr)
|
2003-07-21 |
2006-01-13 |
Commissariat Energie Atomique |
Structure empilee, et procede pour la fabriquer
|
FR2861497B1
(fr)
|
2003-10-28 |
2006-02-10 |
Soitec Silicon On Insulator |
Procede de transfert catastrophique d'une couche fine apres co-implantation
|
GB0407531D0
(en)
*
|
2004-04-02 |
2004-05-05 |
Univ Loughborough |
An alloy
|
FR2889887B1
(fr)
|
2005-08-16 |
2007-11-09 |
Commissariat Energie Atomique |
Procede de report d'une couche mince sur un support
|
US8993410B2
(en)
|
2006-09-08 |
2015-03-31 |
Silicon Genesis Corporation |
Substrate cleaving under controlled stress conditions
|
US9362439B2
(en)
|
2008-05-07 |
2016-06-07 |
Silicon Genesis Corporation |
Layer transfer of films utilizing controlled shear region
|
US7811900B2
(en)
|
2006-09-08 |
2010-10-12 |
Silicon Genesis Corporation |
Method and structure for fabricating solar cells using a thick layer transfer process
|
US8293619B2
(en)
|
2008-08-28 |
2012-10-23 |
Silicon Genesis Corporation |
Layer transfer of films utilizing controlled propagation
|
CN1966761B
(zh)
*
|
2006-11-03 |
2010-09-22 |
广东世创金属科技有限公司 |
离子镀稀土改性涂层中稀土的加入方法
|
FR2910179B1
(fr)
|
2006-12-19 |
2009-03-13 |
Commissariat Energie Atomique |
PROCEDE DE FABRICATION DE COUCHES MINCES DE GaN PAR IMPLANTATION ET RECYCLAGE D'UN SUBSTRAT DE DEPART
|
CA2680858A1
(en)
*
|
2007-03-22 |
2008-09-25 |
Skaff Corporation Of America, Inc. |
Mechanical parts having increased wear-resistance
|
US20090018644A1
(en)
*
|
2007-07-13 |
2009-01-15 |
Jan Weber |
Boron-Enhanced Shape Memory Endoprostheses
|
GB2450933A
(en)
*
|
2007-07-13 |
2009-01-14 |
Hauzer Techno Coating Bv |
Method of providing a hard coating
|
JP2009120405A
(ja)
*
|
2007-11-09 |
2009-06-04 |
Canon Inc |
紫外光用ガラス組成物及びそれを用いた光学装置
|
FR2925221B1
(fr)
|
2007-12-17 |
2010-02-19 |
Commissariat Energie Atomique |
Procede de transfert d'une couche mince
|
US20090200494A1
(en)
*
|
2008-02-11 |
2009-08-13 |
Varian Semiconductor Equipment Associates, Inc. |
Techniques for cold implantation of carbon-containing species
|
AU2009244489B2
(en)
*
|
2008-05-05 |
2015-05-07 |
Edgewell Personal Care Brands, Llc |
Razor blade and method of manufacture
|
US8330126B2
(en)
|
2008-08-25 |
2012-12-11 |
Silicon Genesis Corporation |
Race track configuration and method for wafering silicon solar substrates
|
US8329557B2
(en)
|
2009-05-13 |
2012-12-11 |
Silicon Genesis Corporation |
Techniques for forming thin films by implantation with reduced channeling
|
FR2947098A1
(fr)
|
2009-06-18 |
2010-12-24 |
Commissariat Energie Atomique |
Procede de transfert d'une couche mince sur un substrat cible ayant un coefficient de dilatation thermique different de celui de la couche mince
|
RU2447194C1
(ru)
*
|
2010-08-03 |
2012-04-10 |
Федеральное государственное образовательное учреждение высшего профессионального образования "Алтайский государственный аграрный университет" (АГАУ) |
Способ химико-термической обработки режущей кромки стального рабочего органа почвообрабатывающего орудия
|
US20140003959A1
(en)
*
|
2012-06-27 |
2014-01-02 |
General Electric Company |
Modified rotor component and method for modifying a wear characteristic of a rotor component in a turbine system
|
CN103540945B
(zh)
*
|
2013-10-21 |
2015-07-01 |
哈尔滨东安发动机(集团)有限公司 |
薄壁零件氮化变形控制方法
|
CN106521444B
(zh)
*
|
2016-10-21 |
2018-10-02 |
清华大学 |
处理M50NiL轴承钢的方法、强化M50NiL轴承钢以及轴承
|
CN106521406B
(zh)
*
|
2016-10-21 |
2018-10-02 |
清华大学 |
处理m50轴承钢的方法、强化m50轴承钢以及轴承
|
JP1624793S
(de)
*
|
2018-07-24 |
2019-02-18 |
|
|
CN110042339B
(zh)
*
|
2019-06-05 |
2021-07-06 |
哈尔滨工程大学 |
一种降温增速的真空渗碳方法
|
CN111893431B
(zh)
*
|
2020-08-17 |
2022-12-20 |
中国人民解放军陆军装甲兵学院 |
一种具有高抗接触疲劳性能的20Cr2Ni4A渗碳钢及其制备方法
|