CH573607A5 - - Google Patents

Info

Publication number
CH573607A5
CH573607A5 CH1220773A CH1220773A CH573607A5 CH 573607 A5 CH573607 A5 CH 573607A5 CH 1220773 A CH1220773 A CH 1220773A CH 1220773 A CH1220773 A CH 1220773A CH 573607 A5 CH573607 A5 CH 573607A5
Authority
CH
Switzerland
Application number
CH1220773A
Original Assignee
Agfa Gevaert Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agfa Gevaert Ag filed Critical Agfa Gevaert Ag
Publication of CH573607A5 publication Critical patent/CH573607A5/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D211/00—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings
    • C07D211/04—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
    • C07D211/80—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members
    • C07D211/82—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D211/00—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings
    • C07D211/04—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
    • C07D211/80—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members
    • C07D211/84—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms, with at the most one bond to halogen directly attached to ring carbon atoms
    • C07D211/90—Carbon atoms having three bonds to hetero atoms with at the most one bond to halogen
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D215/00—Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems
    • C07D215/02—Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen atoms or carbon atoms directly attached to the ring nitrogen atom
    • C07D215/16—Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen atoms or carbon atoms directly attached to the ring nitrogen atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D215/48—Carbon atoms having three bonds to hetero atoms with at the most one bond to halogen
    • C07D215/54—Carbon atoms having three bonds to hetero atoms with at the most one bond to halogen attached in position 3
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Quinoline Compounds (AREA)
  • Other In-Based Heterocyclic Compounds (AREA)
  • Hydrogenated Pyridines (AREA)
CH1220773A 1972-08-26 1973-08-24 CH573607A5 (xx)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2242106A DE2242106A1 (de) 1972-08-26 1972-08-26 Lichtempfindliches photographisches material

Publications (1)

Publication Number Publication Date
CH573607A5 true CH573607A5 (xx) 1976-03-15

Family

ID=5854669

Family Applications (1)

Application Number Title Priority Date Filing Date
CH1220773A CH573607A5 (xx) 1972-08-26 1973-08-24

Country Status (9)

Country Link
US (1) US3901710A (xx)
JP (1) JPS4960733A (xx)
BE (1) BE803700A (xx)
CA (1) CA1004524A (xx)
CH (1) CH573607A5 (xx)
DE (1) DE2242106A1 (xx)
FR (1) FR2197189B1 (xx)
GB (1) GB1404297A (xx)
IT (1) IT990315B (xx)

Families Citing this family (68)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4159202A (en) * 1973-12-20 1979-06-26 Hoechst Aktiengesellschaft Photopolymer having 2-pyridone side group
US4198242A (en) * 1976-03-17 1980-04-15 E. I. Du Pont De Nemours And Company Photopolymerizable composition containing an o-nitroaromatic compound as photoinhibitor
GB1591753A (en) * 1977-03-02 1981-06-24 Agfa Gevaert Photosensitive recording material
DE2718130C2 (de) * 1977-04-23 1979-05-17 Du Pont De Nemours (Deutschland) Gmbh, 4000 Duesseldorf lichtempfindliches Aufzeichnungsmaterial
DE2758210A1 (de) * 1977-12-27 1979-06-28 Du Pont Deutschland Lichtempfindliches aufzeichnungsmaterial
DE2758209C3 (de) * 1977-12-27 1980-07-10 Du Pont De Nemours (Deutschland) Gmbh, 4000 Duesseldorf Lichtempfindliches Aufzeichnungsmaterial
US4181531A (en) * 1978-04-07 1980-01-01 E. I. Du Pont De Nemours And Company Positive non-silver systems containing nitrofuryldihydropyridine
US4269933A (en) * 1978-06-08 1981-05-26 E. I. Du Pont De Nemours And Company Methods of developing photopolymerizable compositions containing an 0-nitroaromatic compound as photoinhibitor
DE2945564A1 (de) * 1978-11-13 1980-05-22 Du Pont Verfahren zur herstellung von mehrfarbenbildern
DE3429615C1 (de) * 1984-08-11 1985-12-12 Du Pont de Nemours (Deutschland) GmbH, 4000 Düsseldorf Verfahren zur Erzeugung von aus Pulvern bestehenden Mustern
DE58908012D1 (de) * 1989-03-20 1994-08-11 Siemens Ag Lichtempfindliches Gemisch.
JP3093055B2 (ja) * 1992-07-07 2000-10-03 日東電工株式会社 耐熱性ネガ型フォトレジスト組成物および感光性基材、ならびにネガ型パターン形成方法
US5851736A (en) * 1991-03-05 1998-12-22 Nitto Denko Corporation Heat-resistant photoresist composition, photosensitive substrate, and process for forming heat-resistant positive or negative pattern
CA2080949A1 (en) * 1991-10-21 1993-04-22 Cyrus John Ohnmacht Therapeutic agents
GB9220570D0 (en) * 1991-10-21 1992-11-11 Ici Plc Therapeutic agent
JPH0954437A (ja) 1995-06-05 1997-02-25 Fuji Photo Film Co Ltd 化学増幅型ポジレジスト組成物
US6143471A (en) * 1998-03-10 2000-11-07 Mitsubishi Paper Mills Limited Positive type photosensitive composition
JP4130030B2 (ja) 1999-03-09 2008-08-06 富士フイルム株式会社 感光性組成物および１，３−ジヒドロ−１−オキソ−２ｈ−インデン誘導体化合物
US7052824B2 (en) * 2000-06-30 2006-05-30 E. I. Du Pont De Nemours And Company Process for thick film circuit patterning
US7521168B2 (en) 2002-02-13 2009-04-21 Fujifilm Corporation Resist composition for electron beam, EUV or X-ray
KR100955454B1 (ko) 2002-05-31 2010-04-29 후지필름 가부시키가이샤 포지티브 레지스트 조성물
US7771915B2 (en) 2003-06-27 2010-08-10 Fujifilm Corporation Two-photon absorbing optical recording material and two-photon absorbing optical recording and reproducing method
AU2004272078A1 (en) * 2003-09-10 2005-03-24 Synta Pharmaceuticals Corp. Dihydropyridine compounds for treating or preventing metabolic disorders
JP4452572B2 (ja) 2004-07-06 2010-04-21 富士フイルム株式会社 感光性組成物およびそれを用いた画像記録方法
DE602005007427D1 (de) 2004-07-20 2008-07-24 Fujifilm Corp Bilderzeugendes Material
JP4439409B2 (ja) 2005-02-02 2010-03-24 富士フイルム株式会社 レジスト組成物及びそれを用いたパターン形成方法
US20060204732A1 (en) 2005-03-08 2006-09-14 Fuji Photo Film Co., Ltd. Ink composition, inkjet recording method, printed material, method of producing planographic printing plate, and planographic printing plate
EP1701213A3 (en) 2005-03-08 2006-11-22 Fuji Photo Film Co., Ltd. Photosensitive composition
JP4474317B2 (ja) 2005-03-31 2010-06-02 富士フイルム株式会社 平版印刷版の作製方法
DE602006003029D1 (de) 2005-08-23 2008-11-20 Fujifilm Corp Härtbare Tinte enthaltend modifiziertes Oxetan
JP4757574B2 (ja) 2005-09-07 2011-08-24 富士フイルム株式会社 インク組成物、インクジェット記録方法、印刷物、平版印刷版の製造方法、及び、平版印刷版
US7728050B2 (en) 2005-11-04 2010-06-01 Fujifilm Corporation Curable composition, ink composition, inkjet recording method, printed matter, method for producing planographic printing plate, planographic printing plate and oxetane compound
ATE496766T1 (de) 2006-03-03 2011-02-15 Fujifilm Corp Härtbare zusammensetzung, tintenzusammensetzung, tintenstrahlaufzeichnungsverfahren und flachdruckplatte
JP5276264B2 (ja) 2006-07-03 2013-08-28 富士フイルム株式会社 インク組成物、インクジェット記録方法、印刷物、及び、平版印刷版の製造方法
JP2008189776A (ja) 2007-02-02 2008-08-21 Fujifilm Corp 活性放射線硬化型重合性組成物、インク組成物、インクジェット記録方法、印刷物、平版印刷版の作製方法、及び平版印刷版
US8541063B2 (en) 2007-02-06 2013-09-24 Fujifilm Corporation Undercoat solution, ink-jet recording method and ink-jet recording device
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JP5224699B2 (ja) 2007-03-01 2013-07-03 富士フイルム株式会社 インク組成物、インクジェット記録方法、印刷物、平版印刷版の製造方法、及び平版印刷版
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JP5243072B2 (ja) 2007-03-30 2013-07-24 富士フイルム株式会社 インク組成物、並びに、それを用いた画像記録方法及び画像記録物
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JP5265165B2 (ja) 2007-09-28 2013-08-14 富士フイルム株式会社 塗布装置及びこれを用いるインクジェット記録装置
JP4898618B2 (ja) 2007-09-28 2012-03-21 富士フイルム株式会社 インクジェット記録方法
JP5227560B2 (ja) 2007-09-28 2013-07-03 富士フイルム株式会社 インク組成物、インクジェット記録方法、印刷物、及び、成形印刷物の製造方法
US8240838B2 (en) 2007-11-29 2012-08-14 Fujifilm Corporation Ink composition for inkjet recording, inkjet recording method, and printed material
JP5254632B2 (ja) 2008-02-07 2013-08-07 富士フイルム株式会社 インク組成物、インクジェット記録方法、印刷物、及び、成形印刷物
US20090214797A1 (en) 2008-02-25 2009-08-27 Fujifilm Corporation Inkjet ink composition, and inkjet recording method and printed material employing same
JP5583329B2 (ja) 2008-03-11 2014-09-03 富士フイルム株式会社 顔料組成物、インク組成物、印刷物、インクジェット記録方法、及びポリアリルアミン誘導体
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JP5414367B2 (ja) 2008-06-02 2014-02-12 富士フイルム株式会社 顔料分散物及びそれを用いたインク組成物
JP5383133B2 (ja) 2008-09-19 2014-01-08 富士フイルム株式会社 インク組成物、インクジェット記録方法及び印刷物成形体の製造方法
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JP5980702B2 (ja) 2013-03-07 2016-08-31 富士フイルム株式会社 インクジェットインク組成物、インクジェット記録方法、及び、成型印刷物の製造方法
JP5939644B2 (ja) 2013-08-30 2016-06-22 富士フイルム株式会社 画像形成方法、インモールド成型品の製造方法、及び、インクセット
CN111253304B (zh) * 2020-03-24 2021-07-06 合肥立方制药股份有限公司 一种硝苯地平的制备方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3519424A (en) * 1966-02-25 1970-07-07 Eastman Kodak Co Photosensitive compounds and elements
US3776735A (en) * 1971-12-28 1973-12-04 Kalle Ag Light-sensitive copying composition containing a light insensitive polymer and a light sensitive heterocyclic compound

Also Published As

Publication number Publication date
BE803700A (nl) 1974-02-18
GB1404297A (en) 1975-08-28
US3901710A (en) 1975-08-26
DE2242106A1 (de) 1974-03-21
IT990315B (it) 1975-06-20
CA1004524A (en) 1977-02-01
JPS4960733A (xx) 1974-06-12
FR2197189A1 (xx) 1974-03-22
FR2197189B1 (xx) 1976-12-03

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Legal Events

Date Code Title Description
PL Patent ceased