US4021243A
(en)
*
|
1970-08-20 |
1977-05-03 |
Hoechst Aktiengesellschaft |
Diazo light-sensitive copying composition and process of using in the manufacture of screen printing stencils
|
US3890153A
(en)
*
|
1971-03-13 |
1975-06-17 |
Philips Corp |
Positive-acting napthoquinone diazide photosensitive composition
|
US3790382A
(en)
*
|
1971-04-16 |
1974-02-05 |
Minnesota Mining & Mfg |
Fluorinated polyamide-diazo resin coating composition
|
GB1347759A
(en)
*
|
1971-06-17 |
1974-02-27 |
Howson Algraphy Ltd |
Light sensitive materials
|
US3847614A
(en)
*
|
1971-09-13 |
1974-11-12 |
Scott Paper Co |
Diazo photopolymer composition and article comprising carboxylated resin
|
BE789196A
(fr)
*
|
1971-09-25 |
1973-03-22 |
Kalle Ag |
Matiere a copier photosensible
|
US4131466A
(en)
*
|
1972-03-05 |
1978-12-26 |
Somar Manufacturing Co., Ltd. |
Photographic method of making relief member with negative dye image
|
US3891438A
(en)
*
|
1972-11-02 |
1975-06-24 |
Polychrome Corp |
Aqueous developing composition for lithographic diazo printing plates
|
US3891439A
(en)
*
|
1972-11-02 |
1975-06-24 |
Polychrome Corp |
Aqueous developing composition for lithographic diazo printing plates
|
US4147545A
(en)
*
|
1972-11-02 |
1979-04-03 |
Polychrome Corporation |
Photolithographic developing composition with organic lithium compound
|
GB1427932A
(en)
*
|
1972-11-03 |
1976-03-10 |
Ici Ltd |
Diazotype materials
|
FR2208183B1
(fr)
*
|
1972-11-25 |
1978-02-24 |
Hoechst Ag |
|
US4164421A
(en)
*
|
1972-12-09 |
1979-08-14 |
Fuji Photo Film Co., Ltd. |
Photocurable composition containing an o-quinonodiazide for printing plate
|
US3890149A
(en)
*
|
1973-05-02 |
1975-06-17 |
American Can Co |
Waterless diazo planographic printing plates with epoxy-silane in undercoat and/or overcoat layers
|
US4113497A
(en)
*
|
1973-06-11 |
1978-09-12 |
American Can Company |
Compositions with organohalogen compound and diazonium salts as photoinitiators of epoxy compounds in photo-polymerization
|
US3923522A
(en)
*
|
1973-07-18 |
1975-12-02 |
Oji Paper Co |
Photosensitive composition
|
JPS527364B2
(fr)
*
|
1973-07-23 |
1977-03-02 |
|
|
US4093465A
(en)
*
|
1973-08-14 |
1978-06-06 |
Polychrome Corporation |
Photosensitive diazo condensate compositions
|
US4099973A
(en)
*
|
1973-10-24 |
1978-07-11 |
Hitachi, Ltd. |
Photo-sensitive bis-azide containing composition
|
JPS5740501B2
(fr)
*
|
1973-10-24 |
1982-08-27 |
|
|
US4019907A
(en)
*
|
1973-10-24 |
1977-04-26 |
Hodogaya Chemical Co., Ltd. |
Photosensitive azido color-forming element
|
GB1488005A
(en)
*
|
1974-01-25 |
1977-10-05 |
Ici Ltd |
Diazotype materials
|
US3951769A
(en)
*
|
1974-03-01 |
1976-04-20 |
American Can Company |
Epoxide photopolymerizable compositions containing cyclic amides as gelation inhibitor and methods of polymerizing
|
US3997349A
(en)
*
|
1974-06-17 |
1976-12-14 |
Minnesota Mining And Manufacturing Company |
Light-sensitive development-free driographic printing plate
|
US3958994A
(en)
*
|
1974-08-26 |
1976-05-25 |
American Hoechst Corporation |
Photosensitive diazo steel lithoplate structure
|
JPS5236697B2
(fr)
*
|
1974-09-09 |
1977-09-17 |
|
|
GB1523762A
(en)
*
|
1975-02-25 |
1978-09-06 |
Oce Van Der Grinten Nv |
Photocopying materials
|
US4486529A
(en)
*
|
1976-06-10 |
1984-12-04 |
American Hoechst Corporation |
Dialo printing plate made from laser
|
JPS533216A
(en)
*
|
1976-06-28 |
1978-01-12 |
Fuji Photo Film Co Ltd |
Diazo photosensitive composition
|
DE2652304C2
(de)
*
|
1976-11-17 |
1987-04-23 |
Hoechst Ag, 6230 Frankfurt |
Negativ arbeitendes lichtempfindliches Gemisch und damit hergestellte lichtempfindliche Flachdruckplatte
|
US4171974A
(en)
*
|
1978-02-15 |
1979-10-23 |
Polychrome Corporation |
Aqueous alkali developable negative working lithographic printing plates
|
DE2822887A1
(de)
*
|
1978-05-26 |
1979-11-29 |
Hoechst Ag |
Lichtempfindliches aufzeichnungsmaterial und verfahren zur herstellung von reliefaufzeichnungen
|
JPS5567214U
(fr)
*
|
1978-10-30 |
1980-05-09 |
|
|
US4248959A
(en)
*
|
1978-12-07 |
1981-02-03 |
American Hoechst Corporation |
Preparation of diazo printing plates using laser exposure
|
US4414315A
(en)
*
|
1979-08-06 |
1983-11-08 |
Howard A. Fromson |
Process for making lithographic printing plate
|
US4408532A
(en)
*
|
1980-04-30 |
1983-10-11 |
Minnesota Mining And Manufacturing Company |
Lithographic printing plate with oleophilic area of radiation exposed adduct of diazo resin and sulfonated polymer
|
US4401743A
(en)
*
|
1980-04-30 |
1983-08-30 |
Minnesota Mining And Manufacturing Company |
Aqueous developable photosensitive composition and printing plate
|
CA1153611A
(fr)
*
|
1980-04-30 |
1983-09-13 |
Minnesota Mining And Manufacturing Company |
Compose photosensible developpable dans l'eau et plaque d'impression
|
US4482489A
(en)
*
|
1980-11-18 |
1984-11-13 |
James River Graphics, Inc. |
Light-sensitive diazonium trifluoromethane sulfonates
|
US4403028A
(en)
*
|
1981-01-26 |
1983-09-06 |
Andrews Paper & Chemical Co., Inc. |
Light sensitive diazonium salts and diazotype materials
|
EP0061150B1
(fr)
*
|
1981-03-20 |
1986-10-15 |
American Hoechst Corporation |
Produit de polycondensation photosensible, procédé pour sa préparation et matériau d'enregistrement photosensible le contenant
|
US4436804A
(en)
|
1981-03-20 |
1984-03-13 |
American Hoechst Corporation |
Light-sensitive polymeric diazonium condensates and reproduction compositions and materials therewith
|
DE3135804A1
(de)
*
|
1981-09-10 |
1983-03-24 |
Hoechst Ag, 6000 Frankfurt |
Lichtempfindliches, diazoniumgruppen enthaltendes polykondensationsprodukt und damit hergestelltes lichtempfindliches aufzeichnungsmaterial
|
US4491629A
(en)
*
|
1982-02-22 |
1985-01-01 |
Tokyo Shibaura Denki Kabushiki Kaisha |
Water soluble photoresist composition with bisazide, diazo, polymer and silane
|
US4446218A
(en)
*
|
1982-03-18 |
1984-05-01 |
American Hoechst Corporation |
Sulfur and/or amide-containing exposure accelerators for light-sensitive coatings with diazonium compounds
|
US4729935A
(en)
*
|
1982-03-18 |
1988-03-08 |
Hoechst Celanese Corporation |
Process for the production of photographic images utilizing a negative working diazo contact film
|
US4533619A
(en)
*
|
1982-03-18 |
1985-08-06 |
American Hoechst Corporation |
Acid stabilizers for diazonium compound condensation products
|
EP0096326B1
(fr)
*
|
1982-06-03 |
1986-07-30 |
American Hoechst Corporation |
Composition photosensible développable par l'eau et matériau à copier photosensible ainsi produit
|
US4469772A
(en)
*
|
1982-06-03 |
1984-09-04 |
American Hoechst Corporation |
Water developable dye coating on substrate with two diazo polycondensation products and water soluble polymeric binder
|
US4436807A
(en)
|
1982-07-15 |
1984-03-13 |
American Hoechst Corporation |
Developer composition with sodium, lithium and/or potassium salts for developing negative working imaged photographic material
|
US4501806A
(en)
*
|
1982-09-01 |
1985-02-26 |
Tokyo Shibaura Denki Kabushiki Kaisha |
Method for forming pattern and photoresist used therein
|
US4526854A
(en)
*
|
1982-09-01 |
1985-07-02 |
Tokyo Shibaura Denki Kabushiki Kaisha |
Photoresist composition with water soluble bisazide and diazo compound
|
US4937170A
(en)
*
|
1982-11-19 |
1990-06-26 |
Hoechst Celanese Corporation |
Coupling agents for photographic elements
|
JPS59101644A
(ja)
*
|
1982-12-01 |
1984-06-12 |
Fuji Photo Film Co Ltd |
感光性組成物
|
DE3311435A1
(de)
*
|
1983-03-29 |
1984-10-04 |
Hoechst Ag, 6230 Frankfurt |
Lichtempfindliches, diazoniumgruppen enthaltendes polykondensationsprodukt, verfahren zu seiner herstellung und lichtempfindliches aufzeichnungsmaterial, das dieses polykondensationsprodukt enthaelt
|
JPS6061288A
(ja)
*
|
1983-09-13 |
1985-04-09 |
Fuji Photo Film Co Ltd |
感熱記録材料
|
JPS59222842A
(ja)
*
|
1983-06-01 |
1984-12-14 |
Fuji Photo Film Co Ltd |
平版印刷版用感光性組成物
|
JPS603632A
(ja)
*
|
1983-06-21 |
1985-01-10 |
Fuji Photo Film Co Ltd |
感光性平版印刷版
|
US4543315A
(en)
*
|
1983-09-30 |
1985-09-24 |
Minnesota Mining And Manufacturing Company |
Storage-stable photosensitive composition and article with adduct of diazo resin and amorphous sulfopolyester
|
EP0151191A1
(fr)
*
|
1984-01-25 |
1985-08-14 |
American Hoechst Corporation |
Matériel photosensible pour la fabrication d'originaux
|
DE3417645A1
(de)
*
|
1984-05-12 |
1985-11-14 |
Hoechst Ag, 6230 Frankfurt |
Lichtempfindliches aufzeichnungsmaterial fuer die herstellung von flachdruckplatten
|
DE3418111A1
(de)
*
|
1984-05-16 |
1985-11-21 |
Hoechst Ag, 6230 Frankfurt |
Verfahren zur nachbehandlung von aluminiumoxidschichten mit phosphoroxo-anionen enthaltenden waessrigen loesungen und deren verwendung bei der herstellung von offsetdruckplattentraegern
|
DE3425328A1
(de)
*
|
1984-07-10 |
1986-01-16 |
Hoechst Ag, 6230 Frankfurt |
Lichtempfindliches gemisch und damit hergestelltes lichtempfindliches aufzeichnungsmaterial
|
US4785062A
(en)
*
|
1984-07-31 |
1988-11-15 |
W. R. Grace & Co.-Conn. |
Reaction product of O-epoxyalkylated tetrakis(hydroxyphenyl)ethane resin and phenol with product having no remaining epoxy groups
|
JPH0782236B2
(ja)
*
|
1984-10-12 |
1995-09-06 |
三菱化学株式会社 |
感光性組成物
|
US4618562A
(en)
*
|
1984-12-27 |
1986-10-21 |
American Hoechst Corporation |
Aqueous developable lithographic printing plates containing an admixture of diazonium salts and polymers and composition therefor
|
DE3504658A1
(de)
*
|
1985-02-12 |
1986-08-14 |
Hoechst Ag, 6230 Frankfurt |
Lichtempfindliches gemisch und damit hergestelltes aufzeichnungsmaterial
|
US4851319A
(en)
*
|
1985-02-28 |
1989-07-25 |
Hoechst Celanese Corporation |
Radiation polymerizable composition, photographic element, and method of making element with diazonium salt, and monofunctional and polyfunctional acrylic monomers
|
US4946373A
(en)
*
|
1985-02-28 |
1990-08-07 |
Hoechst Celanese Corporation |
Radiation-polymerizable composition
|
US4634652A
(en)
*
|
1985-07-25 |
1987-01-06 |
American Hoechst Corporation |
Overlay light-sensitive proofing film with transparent aluminum oxide and transparent magnesium fluoride layers therein
|
US5120772A
(en)
*
|
1985-08-02 |
1992-06-09 |
Walls John E |
Radiation-polymerizable composition and element containing a photopolymerizable mixture
|
US4822720A
(en)
*
|
1985-08-02 |
1989-04-18 |
Hoechst Celanese Corporation |
Water developable screen printing composition
|
US4780392A
(en)
*
|
1985-08-02 |
1988-10-25 |
Hoechst Celanese Corporation |
Radiation-polymerizable composition and element containing a photopolymerizable acrylic monomer
|
US4707437A
(en)
*
|
1985-08-02 |
1987-11-17 |
Hoechst Celanese Corporation |
Radiation-polymerizable composition and element containing a photopolymer composition
|
US4652604A
(en)
*
|
1985-08-02 |
1987-03-24 |
American Hoechst Corporation |
Radiation-polymerizable composition and element containing a photopolymer composition
|
US4692397A
(en)
*
|
1985-11-27 |
1987-09-08 |
American Hoechst Corporation |
Process for developing an aqueous alkaline development diazo photographic element
|
US5290666A
(en)
*
|
1988-08-01 |
1994-03-01 |
Hitachi, Ltd. |
Method of forming a positive photoresist pattern utilizing contrast enhancement overlayer containing trifluoromethanesulfonic, methanesulfonic or trifluoromethaneacetic aromatic diazonium salt
|
US5200291A
(en)
*
|
1989-11-13 |
1993-04-06 |
Hoechst Celanese Corporation |
Photosensitive diazonium resin, element made therefrom, method of preparing the resin and method for producing negative lithographic image utilizing the resin
|
US5206349A
(en)
*
|
1990-08-10 |
1993-04-27 |
Toyo Gosei Kogy Co., Ltd. |
Aromatic diazo compounds and photosensitive compositions using the same
|
JP2944296B2
(ja)
|
1992-04-06 |
1999-08-30 |
富士写真フイルム株式会社 |
感光性平版印刷版の製造方法
|
US5275907A
(en)
|
1992-07-23 |
1994-01-04 |
Eastman Kodak Company |
Photosensitive compositions and lithographic printing plates containing acid-substituted ternary acetal polymer and copolyester with reduced propensity to blinding
|
IT1264010B
(it)
*
|
1993-04-06 |
1996-09-06 |
|
Policondensato fotosensibile per lastre litografiche negative
|
DE4414897A1
(de)
*
|
1994-04-28 |
1995-11-02 |
Hoechst Ag |
Aromatische Diazoniumsalze und deren Verwendung in strahlungsempfindlichen Gemischen
|
CA2191055A1
(fr)
|
1995-12-04 |
1997-06-05 |
Major S. Dhillon |
Substance photosensible negative developpable a l'eau a contraste ameliore
|
EP0778292A3
(fr)
|
1995-12-04 |
1998-11-04 |
Bayer Corporation |
Méthode pour préparer des acétals polyvinyliques modifiés par des anhydrides utilisables dans des compositions photosensibles
|
US6458503B1
(en)
|
2001-03-08 |
2002-10-01 |
Kodak Polychrome Graphics Llc |
Fluorinated aromatic acetal polymers and photosensitive compositions containing such polymers
|
CN101813888B
(zh)
*
|
2010-04-14 |
2012-02-01 |
东莞长联新材料科技有限公司 |
一种重氮感光胶热稳定性和光化学活性的调控方法
|