CA2221014A1 - Composes polymeres polyioniques, leur procede de preparation et leur utilisation comme photoamorceurs - Google Patents
Composes polymeres polyioniques, leur procede de preparation et leur utilisation comme photoamorceursInfo
- Publication number
- CA2221014A1 CA2221014A1 CA 2221014 CA2221014A CA2221014A1 CA 2221014 A1 CA2221014 A1 CA 2221014A1 CA 2221014 CA2221014 CA 2221014 CA 2221014 A CA2221014 A CA 2221014A CA 2221014 A1 CA2221014 A1 CA 2221014A1
- Authority
- CA
- Canada
- Prior art keywords
- group
- carbon atoms
- groups
- chosen
- perhaloalkyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 125000004432 carbon atom Chemical group C* 0.000 abstract 7
- -1 organometallic cations Chemical class 0.000 abstract 5
- 125000003118 aryl group Chemical group 0.000 abstract 2
- 150000001875 compounds Chemical class 0.000 abstract 2
- 229910052731 fluorine Inorganic materials 0.000 abstract 2
- 239000000178 monomer Substances 0.000 abstract 2
- 229920000642 polymer Polymers 0.000 abstract 2
- 229910005143 FSO2 Inorganic materials 0.000 abstract 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 abstract 1
- 125000003545 alkoxy group Chemical group 0.000 abstract 1
- 125000002877 alkyl aryl group Chemical group 0.000 abstract 1
- 125000005410 aryl sulfonium group Chemical group 0.000 abstract 1
- 125000002091 cationic group Chemical group 0.000 abstract 1
- 238000004132 cross linking Methods 0.000 abstract 1
- 239000012954 diazonium Substances 0.000 abstract 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-O diazynium Chemical compound [NH+]#N IJGRMHOSHXDMSA-UHFFFAOYSA-O 0.000 abstract 1
- 239000011737 fluorine Substances 0.000 abstract 1
- 125000005842 heteroatom Chemical group 0.000 abstract 1
- 229920000831 ionic polymer Polymers 0.000 abstract 1
- 230000004048 modification Effects 0.000 abstract 1
- 238000012986 modification Methods 0.000 abstract 1
- 229920002120 photoresistant polymer Polymers 0.000 abstract 1
- 238000006116 polymerization reaction Methods 0.000 abstract 1
- 229910052723 transition metal Inorganic materials 0.000 abstract 1
- 150000003624 transition metals Chemical class 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C307/00—Amides of sulfuric acids, i.e. compounds having singly-bound oxygen atoms of sulfate groups replaced by nitrogen atoms, not being part of nitro or nitroso groups
- C07C307/02—Monoamides of sulfuric acids or esters thereof, e.g. sulfamic acids
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
- C07C309/78—Halides of sulfonic acids
- C07C309/79—Halides of sulfonic acids having halosulfonyl groups bound to acyclic carbon atoms
- C07C309/80—Halides of sulfonic acids having halosulfonyl groups bound to acyclic carbon atoms of a saturated carbon skeleton
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C311/00—Amides of sulfonic acids, i.e. compounds having singly-bound oxygen atoms of sulfo groups replaced by nitrogen atoms, not being part of nitro or nitroso groups
- C07C311/48—Amides of sulfonic acids, i.e. compounds having singly-bound oxygen atoms of sulfo groups replaced by nitrogen atoms, not being part of nitro or nitroso groups having nitrogen atoms of sulfonamide groups further bound to another hetero atom
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
- C07C381/12—Sulfonium compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/44—Preparation of metal salts or ammonium salts
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/38—Polysiloxanes modified by chemical after-treatment
- C08G77/382—Polysiloxanes modified by chemical after-treatment containing atoms other than carbon, hydrogen, oxygen or silicon
- C08G77/392—Polysiloxanes modified by chemical after-treatment containing atoms other than carbon, hydrogen, oxygen or silicon containing sulfur
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/38—Polysiloxanes modified by chemical after-treatment
- C08G77/382—Polysiloxanes modified by chemical after-treatment containing atoms other than carbon, hydrogen, oxygen or silicon
- C08G77/398—Polysiloxanes modified by chemical after-treatment containing atoms other than carbon, hydrogen, oxygen or silicon containing boron or metal atoms
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Polymerisation Methods In General (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Abstract
Composé ionique polymère ou oligomère constitué par une partie polycationique (A+)p comprenant plusieurs unités ionium et un nombre d'anions X- suffisant pour assurer la neutralité électrique du composé, caractérisé en ce que: - les unités onium sont choisies dans le groupe constitué par les biaryliodonium, les arylsulfonium les arylacylsulfonium les diazonium, les cations organométalliques comprenant un métal de transition complexé par au moins un cycle insaturé comprenant de 4 à 12 atomes de carbone; - X- est un anion imidure ¢RFSO2NSO2R'F!- ou un anion méthylure ¢RFSO2C(Q)SO2R'F!- dans lesquels: 1) Q représente: - H-, Cl-, F-, Br- ou CN-; - un radical alkyle ayant de 1 à 30 atomes de carbone; - un radical aryle ou alkylaryle ou arylalkyle ayant de 6 à 30 atomes de carbone; - un groupe R"F ou un groupe R"FSO2; 2) RF et R'F, ainsi que R"F le cas échéant lorsque X- est un anion méthylure, sont choisis indépendamment l'un de l'autre dans le groupe constitué par le fluor, les groupements perhaloalkyles ayant de 1 à 30 atomes de carbone, les groupements (perhaloalkyl)alkyloxy, les groupements cycloaliphatiques perhalogénés ayant de 3 à 30 atomes de carbone contenant éventuellement des hétéroatomes choisis parmi O et N, et/ou portant éventuellement au moins un chaînon perhaloalkyle, les groupements aryles perhalogénés ayant de 6 à 30 atomes de carbone; ou bien 3) RF et R'F forment ensemble un radical divalent formant un cycle respectivement avec le groupe -SO2-N-SO2- ou avec le groupe - SO2-C(Q)-SO2-, ou bien, lorsque X- est un anion méthylure, R"F forme avec l'un des radicaux RF ou R'F un radical divalent formant un cycle respectivement avec le groupe -SO2-C-SO2- ou avec le groupe -SO2-C-, ledit radical divalent étant choisi parmi les radicaux alkylènes perfluorés ayant de 2 à 12 atomes de carbone, le troisième radical présent le cas échéant étant choisi parmi les radicaux monovalents cités ci-dessus en 2); 4) p représente le nombre d'unités onium. Les monomères et polymères sont utiles comme photoamorceurs pour la polymérisation ou la réticulation de monomères par voie cationique, ou pour la modification de polymères, notamment lorsqu'ils sont utilisés comme photorésists.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CA 2221014 CA2221014C (fr) | 1996-10-03 | 1997-10-03 | Composes polymeres polyioniques, leur procede de preparation et leur utilisation comme photoamorceurs |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CA002187046A CA2187046A1 (fr) | 1996-10-03 | 1996-10-03 | Sulfonylimidures et sulfonylmethylures, leur utilisation comme photoinitiateur |
CA2,187,046 | 1996-10-03 | ||
CA 2221014 CA2221014C (fr) | 1996-10-03 | 1997-10-03 | Composes polymeres polyioniques, leur procede de preparation et leur utilisation comme photoamorceurs |
Publications (2)
Publication Number | Publication Date |
---|---|
CA2221014A1 true CA2221014A1 (fr) | 1998-04-03 |
CA2221014C CA2221014C (fr) | 2007-06-19 |
Family
ID=25678712
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA 2221014 Expired - Lifetime CA2221014C (fr) | 1996-10-03 | 1997-10-03 | Composes polymeres polyioniques, leur procede de preparation et leur utilisation comme photoamorceurs |
Country Status (1)
Country | Link |
---|---|
CA (1) | CA2221014C (fr) |
-
1997
- 1997-10-03 CA CA 2221014 patent/CA2221014C/fr not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
CA2221014C (fr) | 2007-06-19 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
EEER | Examination request | ||
MKEX | Expiry |
Effective date: 20171003 |