CA2221014A1 - Composes polymeres polyioniques, leur procede de preparation et leur utilisation comme photoamorceurs - Google Patents

Composes polymeres polyioniques, leur procede de preparation et leur utilisation comme photoamorceurs

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Publication number
CA2221014A1
CA2221014A1 CA 2221014 CA2221014A CA2221014A1 CA 2221014 A1 CA2221014 A1 CA 2221014A1 CA 2221014 CA2221014 CA 2221014 CA 2221014 A CA2221014 A CA 2221014A CA 2221014 A1 CA2221014 A1 CA 2221014A1
Authority
CA
Canada
Prior art keywords
group
carbon atoms
groups
chosen
perhaloalkyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CA 2221014
Other languages
English (en)
Other versions
CA2221014C (fr
Inventor
Alain Vallee
Michel Armand
Xavier Ollivrin
Christophe Michot
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hydro Quebec
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from CA002187046A external-priority patent/CA2187046A1/fr
Application filed by Individual filed Critical Individual
Priority to CA 2221014 priority Critical patent/CA2221014C/fr
Publication of CA2221014A1 publication Critical patent/CA2221014A1/fr
Application granted granted Critical
Publication of CA2221014C publication Critical patent/CA2221014C/fr
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C307/00Amides of sulfuric acids, i.e. compounds having singly-bound oxygen atoms of sulfate groups replaced by nitrogen atoms, not being part of nitro or nitroso groups
    • C07C307/02Monoamides of sulfuric acids or esters thereof, e.g. sulfamic acids
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C309/00Sulfonic acids; Halides, esters, or anhydrides thereof
    • C07C309/78Halides of sulfonic acids
    • C07C309/79Halides of sulfonic acids having halosulfonyl groups bound to acyclic carbon atoms
    • C07C309/80Halides of sulfonic acids having halosulfonyl groups bound to acyclic carbon atoms of a saturated carbon skeleton
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C311/00Amides of sulfonic acids, i.e. compounds having singly-bound oxygen atoms of sulfo groups replaced by nitrogen atoms, not being part of nitro or nitroso groups
    • C07C311/48Amides of sulfonic acids, i.e. compounds having singly-bound oxygen atoms of sulfo groups replaced by nitrogen atoms, not being part of nitro or nitroso groups having nitrogen atoms of sulfonamide groups further bound to another hetero atom
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C381/00Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
    • C07C381/12Sulfonium compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00Chemical modification by after-treatment
    • C08F8/44Preparation of metal salts or ammonium salts
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/38Polysiloxanes modified by chemical after-treatment
    • C08G77/382Polysiloxanes modified by chemical after-treatment containing atoms other than carbon, hydrogen, oxygen or silicon
    • C08G77/392Polysiloxanes modified by chemical after-treatment containing atoms other than carbon, hydrogen, oxygen or silicon containing sulfur
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/38Polysiloxanes modified by chemical after-treatment
    • C08G77/382Polysiloxanes modified by chemical after-treatment containing atoms other than carbon, hydrogen, oxygen or silicon
    • C08G77/398Polysiloxanes modified by chemical after-treatment containing atoms other than carbon, hydrogen, oxygen or silicon containing boron or metal atoms
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/039Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

Composé ionique polymère ou oligomère constitué par une partie polycationique (A+)p comprenant plusieurs unités ionium et un nombre d'anions X- suffisant pour assurer la neutralité électrique du composé, caractérisé en ce que: - les unités onium sont choisies dans le groupe constitué par les biaryliodonium, les arylsulfonium les arylacylsulfonium les diazonium, les cations organométalliques comprenant un métal de transition complexé par au moins un cycle insaturé comprenant de 4 à 12 atomes de carbone; - X- est un anion imidure ¢RFSO2NSO2R'F!- ou un anion méthylure ¢RFSO2C(Q)SO2R'F!- dans lesquels: 1) Q représente: - H-, Cl-, F-, Br- ou CN-; - un radical alkyle ayant de 1 à 30 atomes de carbone; - un radical aryle ou alkylaryle ou arylalkyle ayant de 6 à 30 atomes de carbone; - un groupe R"F ou un groupe R"FSO2; 2) RF et R'F, ainsi que R"F le cas échéant lorsque X- est un anion méthylure, sont choisis indépendamment l'un de l'autre dans le groupe constitué par le fluor, les groupements perhaloalkyles ayant de 1 à 30 atomes de carbone, les groupements (perhaloalkyl)alkyloxy, les groupements cycloaliphatiques perhalogénés ayant de 3 à 30 atomes de carbone contenant éventuellement des hétéroatomes choisis parmi O et N, et/ou portant éventuellement au moins un chaînon perhaloalkyle, les groupements aryles perhalogénés ayant de 6 à 30 atomes de carbone; ou bien 3) RF et R'F forment ensemble un radical divalent formant un cycle respectivement avec le groupe -SO2-N-SO2- ou avec le groupe - SO2-C(Q)-SO2-, ou bien, lorsque X- est un anion méthylure, R"F forme avec l'un des radicaux RF ou R'F un radical divalent formant un cycle respectivement avec le groupe -SO2-C-SO2- ou avec le groupe -SO2-C-, ledit radical divalent étant choisi parmi les radicaux alkylènes perfluorés ayant de 2 à 12 atomes de carbone, le troisième radical présent le cas échéant étant choisi parmi les radicaux monovalents cités ci-dessus en 2); 4) p représente le nombre d'unités onium. Les monomères et polymères sont utiles comme photoamorceurs pour la polymérisation ou la réticulation de monomères par voie cationique, ou pour la modification de polymères, notamment lorsqu'ils sont utilisés comme photorésists.
CA 2221014 1996-10-03 1997-10-03 Composes polymeres polyioniques, leur procede de preparation et leur utilisation comme photoamorceurs Expired - Lifetime CA2221014C (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CA 2221014 CA2221014C (fr) 1996-10-03 1997-10-03 Composes polymeres polyioniques, leur procede de preparation et leur utilisation comme photoamorceurs

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
CA002187046A CA2187046A1 (fr) 1996-10-03 1996-10-03 Sulfonylimidures et sulfonylmethylures, leur utilisation comme photoinitiateur
CA2,187,046 1996-10-03
CA 2221014 CA2221014C (fr) 1996-10-03 1997-10-03 Composes polymeres polyioniques, leur procede de preparation et leur utilisation comme photoamorceurs

Publications (2)

Publication Number Publication Date
CA2221014A1 true CA2221014A1 (fr) 1998-04-03
CA2221014C CA2221014C (fr) 2007-06-19

Family

ID=25678712

Family Applications (1)

Application Number Title Priority Date Filing Date
CA 2221014 Expired - Lifetime CA2221014C (fr) 1996-10-03 1997-10-03 Composes polymeres polyioniques, leur procede de preparation et leur utilisation comme photoamorceurs

Country Status (1)

Country Link
CA (1) CA2221014C (fr)

Also Published As

Publication number Publication date
CA2221014C (fr) 2007-06-19

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