CA2072702A1 - Aqueous photosensitive resin composition and print obtained by using the same - Google Patents

Aqueous photosensitive resin composition and print obtained by using the same

Info

Publication number: CA2072702A1
Authority: CA; Canada
Prior art keywords: resin composition; photosensitive resin; aqueous; carboxyl group; water
Prior art date: 1991-07-12
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Abandoned

Application number

CA002072702A

Other languages

English (en)

French (fr)

Inventor

Yoshichi Hagiwara

Hiroshi Samukawa

Katsue Nishikawa

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

P T Sub Inc

Original Assignee

Individual

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1991-07-12

Filing date

1992-06-29

Publication date

1993-01-13

Family has litigation

First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=15938352&utm_source=***_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=CA2072702(A1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.

1992-06-29 Application filed by Individual filed Critical Individual

1993-01-13 Publication of CA2072702A1 publication Critical patent/CA2072702A1/en

Status Abandoned legal-status Critical Current

Links

239000011342 resin composition Substances 0.000 title claims description 44
229920005989 resin Polymers 0.000 claims abstract description 49
239000011347 resin Substances 0.000 claims abstract description 49
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 35
-1 amine compound Chemical class 0.000 claims description 33
238000000034 method Methods 0.000 claims description 32
239000000243 solution Substances 0.000 claims description 29
125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 24
239000011248 coating agent Substances 0.000 claims description 23
238000000576 coating method Methods 0.000 claims description 23
LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 18
125000004018 acid anhydride group Chemical group 0.000 claims description 18
150000001875 compounds Chemical class 0.000 claims description 18
238000005530 etching Methods 0.000 claims description 16
239000003999 initiator Substances 0.000 claims description 14
239000000203 mixture Substances 0.000 claims description 12
239000003960 organic solvent Substances 0.000 claims description 11
229910052751 metal Inorganic materials 0.000 claims description 8
239000002184 metal Substances 0.000 claims description 8
239000012670 alkaline solution Substances 0.000 claims description 7
238000001035 drying Methods 0.000 claims description 7
239000003112 inhibitor Substances 0.000 claims description 7
238000006116 polymerization reaction Methods 0.000 claims description 7
239000002253 acid Substances 0.000 claims description 6
230000002378 acidificating effect Effects 0.000 claims description 6
150000003335 secondary amines Chemical class 0.000 claims description 6
239000000758 substrate Substances 0.000 claims description 6
PYSRRFNXTXNWCD-UHFFFAOYSA-N 3-(2-phenylethenyl)furan-2,5-dione Chemical compound O=C1OC(=O)C(C=CC=2C=CC=CC=2)=C1 PYSRRFNXTXNWCD-UHFFFAOYSA-N 0.000 claims description 5
229920000147 Styrene maleic anhydride Polymers 0.000 claims description 5
150000003141 primary amines Chemical class 0.000 claims description 5
239000002904 solvent Substances 0.000 claims description 4
238000002156 mixing Methods 0.000 claims description 3
238000007142 ring opening reaction Methods 0.000 claims description 3
230000001678 irradiating effect Effects 0.000 claims description 2
HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 15
235000019441 ethanol Nutrition 0.000 description 13
ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 9
VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 8
150000001412 amines Chemical class 0.000 description 8
ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 8
RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 7
239000011889 copper foil Substances 0.000 description 7
VVJKKWFAADXIJK-UHFFFAOYSA-N Allylamine Chemical compound NCC=C VVJKKWFAADXIJK-UHFFFAOYSA-N 0.000 description 6
LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 6
238000006243 chemical reaction Methods 0.000 description 6
NWVVVBRKAWDGAB-UHFFFAOYSA-N hydroquinone methyl ether Natural products COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 5
QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 4
QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 4
CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 4
IPRJXAGUEGOFGG-UHFFFAOYSA-N N-butylbenzenesulfonamide Chemical compound CCCCNS(=O)(=O)C1=CC=CC=C1 IPRJXAGUEGOFGG-UHFFFAOYSA-N 0.000 description 4
CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 4
229960003280 cupric chloride Drugs 0.000 description 4
PAFZNILMFXTMIY-UHFFFAOYSA-N cyclohexylamine Chemical compound NC1CCCCC1 PAFZNILMFXTMIY-UHFFFAOYSA-N 0.000 description 4
239000011888 foil Substances 0.000 description 4
QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 4
229910052753 mercury Inorganic materials 0.000 description 4
OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 3
150000001252 acrylic acid derivatives Chemical class 0.000 description 3
150000001298 alcohols Chemical class 0.000 description 3
239000012965 benzophenone Substances 0.000 description 3
230000003247 decreasing effect Effects 0.000 description 3
UAOMVDZJSHZZME-UHFFFAOYSA-N diisopropylamine Chemical compound CC(C)NC(C)C UAOMVDZJSHZZME-UHFFFAOYSA-N 0.000 description 3
239000006185 dispersion Substances 0.000 description 3
238000004070 electrodeposition Methods 0.000 description 3
239000004014 plasticizer Substances 0.000 description 3
238000002360 preparation method Methods 0.000 description 3
KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 2
JKNCOURZONDCGV-UHFFFAOYSA-N 2-(dimethylamino)ethyl 2-methylprop-2-enoate Chemical compound CN(C)CCOC(=O)C(C)=C JKNCOURZONDCGV-UHFFFAOYSA-N 0.000 description 2
HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 2
NJBCRXCAPCODGX-UHFFFAOYSA-N 2-methyl-n-(2-methylpropyl)propan-1-amine Chemical compound CC(C)CNCC(C)C NJBCRXCAPCODGX-UHFFFAOYSA-N 0.000 description 2
NJWGQARXZDRHCD-UHFFFAOYSA-N 2-methylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC=C3C(=O)C2=C1 NJWGQARXZDRHCD-UHFFFAOYSA-N 0.000 description 2
VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 2
ZWAPMFBHEQZLGK-UHFFFAOYSA-N 5-(dimethylamino)-2-methylidenepentanamide Chemical compound CN(C)CCCC(=C)C(N)=O ZWAPMFBHEQZLGK-UHFFFAOYSA-N 0.000 description 2
KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 2
QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 2
UEEJHVSXFDXPFK-UHFFFAOYSA-N N-dimethylaminoethanol Chemical compound CN(C)CCO UEEJHVSXFDXPFK-UHFFFAOYSA-N 0.000 description 2
244000028419 Styrax benzoin Species 0.000 description 2
235000000126 Styrax benzoin Nutrition 0.000 description 2
PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
235000008411 Sumatra benzointree Nutrition 0.000 description 2
DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 2
WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
238000013019 agitation Methods 0.000 description 2
150000003973 alkyl amines Chemical class 0.000 description 2
XXROGKLTLUQVRX-UHFFFAOYSA-N allyl alcohol Chemical compound OCC=C XXROGKLTLUQVRX-UHFFFAOYSA-N 0.000 description 2
229910021529 ammonia Inorganic materials 0.000 description 2
AYJRCSIUFZENHW-UHFFFAOYSA-L barium carbonate Chemical compound [Ba+2].[O-]C([O-])=O AYJRCSIUFZENHW-UHFFFAOYSA-L 0.000 description 2
TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 2
RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 2
229960002887 deanol Drugs 0.000 description 2
ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 2
HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 2
WOLATMHLPFJRGC-UHFFFAOYSA-N furan-2,5-dione;styrene Chemical compound O=C1OC(=O)C=C1.C=CC1=CC=CC=C1 WOLATMHLPFJRGC-UHFFFAOYSA-N 0.000 description 2
235000019382 gum benzoic Nutrition 0.000 description 2
239000012948 isocyanate Substances 0.000 description 2
239000000178 monomer Substances 0.000 description 2
231100000989 no adverse effect Toxicity 0.000 description 2
XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
229920000642 polymer Polymers 0.000 description 2
WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 2
238000011084 recovery Methods 0.000 description 2
229910000029 sodium carbonate Inorganic materials 0.000 description 2
239000004094 surface-active agent Substances 0.000 description 2
239000008399 tap water Substances 0.000 description 2
235000020679 tap water Nutrition 0.000 description 2
CNHDIAIOKMXOLK-UHFFFAOYSA-N toluquinol Chemical compound CC1=CC(O)=CC=C1O CNHDIAIOKMXOLK-UHFFFAOYSA-N 0.000 description 2
229920001567 vinyl ester resin Polymers 0.000 description 2
125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
239000011345 viscous material Substances 0.000 description 2
150000005206 1,2-dihydroxybenzenes Chemical class 0.000 description 1
MSAHTMIQULFMRG-UHFFFAOYSA-N 1,2-diphenyl-2-propan-2-yloxyethanone Chemical compound C=1C=CC=CC=1C(OC(C)C)C(=O)C1=CC=CC=C1 MSAHTMIQULFMRG-UHFFFAOYSA-N 0.000 description 1
DKEGCUDAFWNSSO-UHFFFAOYSA-N 1,8-dibromooctane Chemical compound BrCCCCCCCCBr DKEGCUDAFWNSSO-UHFFFAOYSA-N 0.000 description 1
IMDHDEPPVWETOI-UHFFFAOYSA-N 1-(4-tert-butylphenyl)-2,2,2-trichloroethanone Chemical compound CC(C)(C)C1=CC=C(C(=O)C(Cl)(Cl)Cl)C=C1 IMDHDEPPVWETOI-UHFFFAOYSA-N 0.000 description 1
PIZHFBODNLEQBL-UHFFFAOYSA-N 2,2-diethoxy-1-phenylethanone Chemical compound CCOC(OCC)C(=O)C1=CC=CC=C1 PIZHFBODNLEQBL-UHFFFAOYSA-N 0.000 description 1
FDUFQLNPPGRIKX-UHFFFAOYSA-N 2,2-dimethylpropane-1,3-diol prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.CC(C)(CO)CO FDUFQLNPPGRIKX-UHFFFAOYSA-N 0.000 description 1
BRKORVYTKKLNKX-UHFFFAOYSA-N 2,4-di(propan-2-yl)thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C(C)C)=CC(C(C)C)=C3SC2=C1 BRKORVYTKKLNKX-UHFFFAOYSA-N 0.000 description 1
OPLCSTZDXXUYDU-UHFFFAOYSA-N 2,4-dimethyl-6-tert-butylphenol Chemical compound CC1=CC(C)=C(O)C(C(C)(C)C)=C1 OPLCSTZDXXUYDU-UHFFFAOYSA-N 0.000 description 1
LCHAFMWSFCONOO-UHFFFAOYSA-N 2,4-dimethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC(C)=C3SC2=C1 LCHAFMWSFCONOO-UHFFFAOYSA-N 0.000 description 1
SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
KOTFYSVFYYKCRA-UHFFFAOYSA-N 2-(diethylamino)-1-phenylethanone Chemical compound CCN(CC)CC(=O)C1=CC=CC=C1 KOTFYSVFYYKCRA-UHFFFAOYSA-N 0.000 description 1
SJIXRGNQPBQWMK-UHFFFAOYSA-N 2-(diethylamino)ethyl 2-methylprop-2-enoate Chemical compound CCN(CC)CCOC(=O)C(C)=C SJIXRGNQPBQWMK-UHFFFAOYSA-N 0.000 description 1
XOGPDSATLSAZEK-UHFFFAOYSA-N 2-Aminoanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(N)=CC=C3C(=O)C2=C1 XOGPDSATLSAZEK-UHFFFAOYSA-N 0.000 description 1
XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
DZZAHLOABNWIFA-UHFFFAOYSA-N 2-butoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCCCC)C(=O)C1=CC=CC=C1 DZZAHLOABNWIFA-UHFFFAOYSA-N 0.000 description 1
POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
ZCDADJXRUCOCJE-UHFFFAOYSA-N 2-chlorothioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(Cl)=CC=C3SC2=C1 ZCDADJXRUCOCJE-UHFFFAOYSA-N 0.000 description 1
WWMQIJFJSHVMDM-UHFFFAOYSA-N 2-ethenoxycarbonylbenzoic acid Chemical compound OC(=O)C1=CC=CC=C1C(=O)OC=C WWMQIJFJSHVMDM-UHFFFAOYSA-N 0.000 description 1
KMNCBSZOIQAUFX-UHFFFAOYSA-N 2-ethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)C(=O)C1=CC=CC=C1 KMNCBSZOIQAUFX-UHFFFAOYSA-N 0.000 description 1
SJEBAWHUJDUKQK-UHFFFAOYSA-N 2-ethylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC=C3C(=O)C2=C1 SJEBAWHUJDUKQK-UHFFFAOYSA-N 0.000 description 1
CKKQLOUBFINSIB-UHFFFAOYSA-N 2-hydroxy-1,2,2-triphenylethanone Chemical compound C=1C=CC=CC=1C(C=1C=CC=CC=1)(O)C(=O)C1=CC=CC=C1 CKKQLOUBFINSIB-UHFFFAOYSA-N 0.000 description 1
RZCDMINQJLGWEP-UHFFFAOYSA-N 2-hydroxy-1,2-diphenylpent-4-en-1-one Chemical compound C=1C=CC=CC=1C(CC=C)(O)C(=O)C1=CC=CC=C1 RZCDMINQJLGWEP-UHFFFAOYSA-N 0.000 description 1
DIVXVZXROTWKIH-UHFFFAOYSA-N 2-hydroxy-1,2-diphenylpropan-1-one Chemical compound C=1C=CC=CC=1C(O)(C)C(=O)C1=CC=CC=C1 DIVXVZXROTWKIH-UHFFFAOYSA-N 0.000 description 1
OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 1
YICILWNDMQTUIY-UHFFFAOYSA-N 2-methylidenepentanamide Chemical compound CCCC(=C)C(N)=O YICILWNDMQTUIY-UHFFFAOYSA-N 0.000 description 1
UMWZLYTVXQBTTE-UHFFFAOYSA-N 2-pentylanthracene-9,10-dione Chemical compound C1=CC=C2C(=O)C3=CC(CCCCC)=CC=C3C(=O)C2=C1 UMWZLYTVXQBTTE-UHFFFAOYSA-N 0.000 description 1
125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
JIGUICYYOYEXFS-UHFFFAOYSA-N 3-tert-butylbenzene-1,2-diol Chemical compound CC(C)(C)C1=CC=CC(O)=C1O JIGUICYYOYEXFS-UHFFFAOYSA-N 0.000 description 1
239000004925 Acrylic resin Substances 0.000 description 1
229920000178 Acrylic resin Polymers 0.000 description 1
NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
NLZUEZXRPGMBCV-UHFFFAOYSA-N Butylhydroxytoluene Chemical compound CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 NLZUEZXRPGMBCV-UHFFFAOYSA-N 0.000 description 1
GAWIXWVDTYZWAW-UHFFFAOYSA-N C[CH]O Chemical group C[CH]O GAWIXWVDTYZWAW-UHFFFAOYSA-N 0.000 description 1
241000272470 Circus Species 0.000 description 1
LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 1
239000004593 Epoxy Substances 0.000 description 1
JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
150000008062 acetophenones Chemical class 0.000 description 1
125000005396 acrylic acid ester group Chemical group 0.000 description 1
239000000654 additive Substances 0.000 description 1
239000001361 adipic acid Substances 0.000 description 1
235000011037 adipic acid Nutrition 0.000 description 1
125000000129 anionic group Chemical group 0.000 description 1
239000003945 anionic surfactant Substances 0.000 description 1
150000004056 anthraquinones Chemical class 0.000 description 1
WURBFLDFSFBTLW-UHFFFAOYSA-N benzil Chemical compound C=1C=CC=CC=1C(=O)C(=O)C1=CC=CC=C1 WURBFLDFSFBTLW-UHFFFAOYSA-N 0.000 description 1
229960002130 benzoin Drugs 0.000 description 1
150000008366 benzophenones Chemical class 0.000 description 1
AJCHRUXIDGEWDK-UHFFFAOYSA-N bis(ethenyl) butanedioate Chemical compound C=COC(=O)CCC(=O)OC=C AJCHRUXIDGEWDK-UHFFFAOYSA-N 0.000 description 1
238000009835 boiling Methods 0.000 description 1
235000010354 butylated hydroxytoluene Nutrition 0.000 description 1
150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
239000003054 catalyst Substances 0.000 description 1
125000002091 cationic group Chemical group 0.000 description 1
239000003093 cationic surfactant Substances 0.000 description 1
239000003795 chemical substances by application Substances 0.000 description 1
150000001851 cinnamic acid derivatives Chemical class 0.000 description 1
239000004927 clay Substances 0.000 description 1
229910052570 clay Inorganic materials 0.000 description 1
239000003086 colorant Substances 0.000 description 1
229920001577 copolymer Polymers 0.000 description 1
229940043279 diisopropylamine Drugs 0.000 description 1
125000002147 dimethylamino group Chemical group [H]C([H])([H])N(*)C([H])([H])[H] 0.000 description 1
239000003822 epoxy resin Substances 0.000 description 1
230000007717 exclusion Effects 0.000 description 1
238000004880 explosion Methods 0.000 description 1
239000000945 filler Substances 0.000 description 1
239000012530 fluid Substances 0.000 description 1
125000000524 functional group Chemical group 0.000 description 1
230000009477 glass transition Effects 0.000 description 1
238000010438 heat treatment Methods 0.000 description 1
PYGSKMBEVAICCR-UHFFFAOYSA-N hexa-1,5-diene Chemical group C=CCCC=C PYGSKMBEVAICCR-UHFFFAOYSA-N 0.000 description 1
150000002500 ions Chemical class 0.000 description 1
239000007788 liquid Substances 0.000 description 1
238000012423 maintenance Methods 0.000 description 1
239000000463 material Substances 0.000 description 1
229910001507 metal halide Inorganic materials 0.000 description 1
150000005309 metal halides Chemical class 0.000 description 1
239000002736 nonionic surfactant Substances 0.000 description 1
RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 description 1
150000002989 phenols Chemical class 0.000 description 1
IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
229920000647 polyepoxide Polymers 0.000 description 1
239000003505 polymerization initiator Substances 0.000 description 1
125000000075 primary alcohol group Chemical group 0.000 description 1
229940079877 pyrogallol Drugs 0.000 description 1
230000009257 reactivity Effects 0.000 description 1
150000003333 secondary alcohols Chemical class 0.000 description 1
229910052814 silicon oxide Inorganic materials 0.000 description 1
238000005507 spraying Methods 0.000 description 1
239000000126 substance Substances 0.000 description 1
239000000454 talc Substances 0.000 description 1
229910052623 talc Inorganic materials 0.000 description 1
239000013008 thixotropic agent Substances 0.000 description 1
OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
229910052724 xenon Inorganic materials 0.000 description 1
FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

Physics & Mathematics (AREA)
Chemical & Material Sciences (AREA)
Chemical Kinetics & Catalysis (AREA)
Spectroscopy & Molecular Physics (AREA)
General Physics & Mathematics (AREA)
Manufacturing Of Printed Circuit Boards (AREA)
Compositions Of Macromolecular Compounds (AREA)
Polymerisation Methods In General (AREA)
Macromonomer-Based Addition Polymer (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Processes Of Treating Macromolecular Substances (AREA)
Graft Or Block Polymers (AREA)

CA002072702A 1991-07-12 1992-06-29 Aqueous photosensitive resin composition and print obtained by using the same Abandoned CA2072702A1 (en)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
JP3172247A JP3040202B2 (ja)	1991-07-12	1991-07-12	水系感光性樹脂組成物及びそれを用いたプリント回路板の製造方法
JP172247/91		1991-07-12

Publications (1)

Publication Number	Publication Date
CA2072702A1 true CA2072702A1 (en)	1993-01-13

Family

ID=15938352

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
CA002072702A Abandoned CA2072702A1 (en)	1991-07-12	1992-06-29	Aqueous photosensitive resin composition and print obtained by using the same

Country Status (6)

Country	Link
JP (1)	JP3040202B2 (ja)
CA (1)	CA2072702A1 (ja)
GB (1)	GB2257711B (ja)
HK (1)	HK22696A (ja)
TW (1)	TW236071B (ja)
ZA (1)	ZA924998B (ja)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPH06258832A (ja) *	1992-11-17	1994-09-16	W R Grace & Co	感光性樹脂組成物
US5445919A (en) *	1993-06-14	1995-08-29	Fuji Photo Film Co., Ltd.	Photopolymerizable composition
AU661438B1 (en) *	1994-01-25	1995-07-20	Morton International, Inc.	Waterborne photoresists having polysiloxanes
US5364737A (en) *	1994-01-25	1994-11-15	Morton International, Inc.	Waterbone photoresists having associate thickeners
AU660881B1 (en) *	1994-01-25	1995-07-06	Morton International, Inc.	Waterborne photoresists having binders neutralized with amino acrylates
AU660882B1 (en) *	1994-01-25	1995-07-06	Morton International, Inc.	Waterborne photoresists having non-ionic fluorocarbon surfactants
JPH08289942A (ja) *	1995-04-25	1996-11-05	Yukio Tsunoda	ゴルフクラブ
US5512607A (en) *	1995-06-06	1996-04-30	W. R. Grace & Co.-Conn.	Unsaturated epoxy ester with quaternary ammonium and phosphate groups
WO1996041240A1 (en) *	1995-06-07	1996-12-19	W.R. Grace & Co.-Conn.	Water photoresist emulsions and methods of preparation thereof
JPH0915857A (ja) *	1995-06-29	1997-01-17	Hitachi Chem Co Ltd	着色画像形成材料、これを用いた感光液、感光性エレメント及びカラーフィルタの製造法
US20040265730A1 (en) *	2001-12-03	2004-12-30	Hiroshi Takahashi	Photosensitive composition and production processes for photosensitive film and printed wiring board
DE60322278D1 (de)	2002-05-06	2008-08-28	Sun Chemical Corp	Einphasige energiehärtbare Zusammensetzungen auf Wasserbasis
US7226959B2 (en)	2003-11-06	2007-06-05	Sun Chemical Corporation	Water soluble energy curable stereo-crosslinkable ionomer compositions
JP5624288B2 (ja) *	2009-06-30	2014-11-12	互応化学工業株式会社	スルーホール付きプリント配線板の製造方法
DE112011101165T5 (de)	2010-03-29	2013-03-28	Mitsubishi Paper Mills Limited	Fotoempfindliche Zusammensetzung und fotoempfindliches lithographisches Druckplattenmaterial
JP7181775B2 (ja) *	2017-12-12	2022-12-01	三洋化成工業株式会社	水性（共）重合体組成物
CN115197381B (zh) *	2022-09-16	2022-11-25	广州鹿山新材料股份有限公司	一种不饱和sma树脂改性聚丙烯及其制备方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DD250593A1 (de) *	1984-04-03	1987-10-14	Wolfen Filmfab Veb	Fotopolymerisierbares material
PT85756A (pt) *	1986-09-22	1988-10-14	Napp Systems Inc	Processo para a preparacao de chapas fotossensiveis e revelaveis com agua
EP0287019A3 (en) *	1987-04-16	1990-07-11	W.R. Grace & Co.-Conn.	Aqueous developable, radiation curable composition
EP0295944A3 (en) *	1987-06-18	1989-09-06	Napp Systems (Usa) Inc.	Photosensitive resin composition and printing plate prepared therefrom
US5403698A (en) *	1990-10-16	1995-04-04	Hitachi Chemical Company, Ltd.	Negative type photosensitive electrodepositing resin composition

1991
- 1991-07-12 JP JP3172247A patent/JP3040202B2/ja not_active Expired - Lifetime
1992
- 1992-06-29 CA CA002072702A patent/CA2072702A1/en not_active Abandoned
- 1992-07-06 ZA ZA924998A patent/ZA924998B/xx unknown
- 1992-07-13 GB GB9214858A patent/GB2257711B/en not_active Expired - Fee Related
- 1992-07-21 TW TW081105764A patent/TW236071B/zh active
1996
- 1996-02-08 HK HK22696A patent/HK22696A/xx not_active IP Right Cessation

Also Published As

Publication number	Publication date
JP3040202B2 (ja)	2000-05-15
GB2257711B (en)	1995-09-20
HK22696A (en)	1996-02-16
TW236071B (ja)	1994-12-11
GB2257711A (en)	1993-01-20
GB9214858D0 (en)	1992-08-26
ZA924998B (en)	1994-09-26
JPH0527437A (ja)	1993-02-05

Legal Events

Date	Code	Title	Description
1999-06-23	EEER	Examination request
2003-05-15	FZDE	Dead

Publication	Publication Date	Title
CA2072702A1 (en)	1993-01-13	Aqueous photosensitive resin composition and print obtained by using the same
US5393643A (en)	1995-02-28	Waterborne photoresists having binders neutralized with amino acrylates
CN101183217B (zh)	2011-08-03	感光性组合物
JP3771714B2 (ja)	2006-04-26	感光性樹脂組成物及びプリント配線板製造用フォトソルダーレジストインク
JP3511146B2 (ja)	2004-03-29	光重合性組成物
JPH11258797A (ja)	1999-09-24	感光性樹脂組成物及びプリント配線板製造用フォトレジストインク
JPH06258830A (ja)	1994-09-16	レジストインク組成物、それを用いたレジスト膜及びプリント回路基板
CN101410757A (zh)	2009-04-15	光固化性热固化性树脂组合物及其固化物以及使用其所得到的印刷电路板
JP2938959B2 (ja)	1999-08-25	液状レジストインク組成物
JPH09309944A (ja)	1997-12-02	感光性樹脂組成物
JP4150236B2 (ja)	2008-09-17	感光性樹脂組成物、及びそれらを用いたスペーサー又はカラーフィルターの形成方法
US5925499A (en)	1999-07-20	Epoxy-containing waterborne photoimageable composition
JP2900137B2 (ja)	1999-06-02	光硬化性樹脂
US6007966A (en)	1999-12-28	Negative-type photosensitive composition
JP2938960B2 (ja)	1999-08-25	液状レジストインク組成物
JP2756623B2 (ja)	1998-05-25	光重合性組成物
JP3335405B2 (ja)	2002-10-15	液状レジストインク組成物
US6060214A (en)	2000-05-09	Photopolymerizable, coatable plastisol
EP0546768A1 (en)	1993-06-16	Water-borne photoimageable compositions
JPH11228640A (ja)	1999-08-24	セルロース誘導体系化合物及び感光性組成物並びにフォトレジストインク
JPH0767008B2 (ja)	1995-07-19	ソルダーレジストパターン形成方法
JP3072811B2 (ja)	2000-08-07	液状レジストインク組成物及びプリント回路基板
JP3335418B2 (ja)	2002-10-15	感光性樹脂及びそれを用いた感光性樹脂組成物
JPH11172177A (ja)	1999-06-29	光硬化型印刷インク及びプリント配線板製造用インク
KR20010051082A (ko)	2001-06-25	유연한 올리고머를 함유하는 광이미지성 조성물